JPH11142884A - Color liquid crystal panel and its manufacturing method - Google Patents

Color liquid crystal panel and its manufacturing method

Info

Publication number
JPH11142884A
JPH11142884A JP30478597A JP30478597A JPH11142884A JP H11142884 A JPH11142884 A JP H11142884A JP 30478597 A JP30478597 A JP 30478597A JP 30478597 A JP30478597 A JP 30478597A JP H11142884 A JPH11142884 A JP H11142884A
Authority
JP
Japan
Prior art keywords
transparent insulating
electrode
forming
opening
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP30478597A
Other languages
Japanese (ja)
Other versions
JP3107778B2 (en
Inventor
Kiyohiro Kawasaki
清弘 川崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP30478597A priority Critical patent/JP3107778B2/en
Publication of JPH11142884A publication Critical patent/JPH11142884A/en
Application granted granted Critical
Publication of JP3107778B2 publication Critical patent/JP3107778B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Optical Filters (AREA)

Abstract

PROBLEM TO BE SOLVED: To increase the numerical aperture and to obtain the color liquid crystal panel without using a color filter by forming pixel electrodes on top of coloring layers including intermediate electrodes and on top of black color coloring layers. SOLUTION: The panel is provided with a thick first transparent insulating layer 27, which is formed on a first transparent insulating substrate 2, grid- shaped optical shielding electrodes, which are formed at least over scanning lines and signal lines through the layer 27 and intermediate electrodes 30 which are formed by including first opening sections formed on the layer 27 over the drain electrodes of the insulated gate type transistors on the substrate 2. Moreover, coloring layers 19 are formed in a stripe shape on the layer 27 including a portion of the optical shield electrode for each of the colors (R, G and B) and pixel electrodes 14 are formed on the layers 19. Furthermore, the active substrate 2 and a second transparent insulating substrate, on which a transparent and electrically conductive layer is formed on one main surface, are pasted together to make the panel.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、カラー画像表示機
能を有する液晶パネルおよびその製造方法に関するもの
である。
[0001] 1. Field of the Invention [0002] The present invention relates to a liquid crystal panel having a color image display function and a method of manufacturing the same.

【0002】[0002]

【従来の技術】近年の微細加工技術、液晶材料技術およ
び実装技術などの進歩により、5〜50cm対角の液晶
パネルでCRTと比較しても遜色の無いテレビジョン画
像や各種の画像表示が商用ベースで提供されている。ま
た、液晶パネルを構成する2枚のガラス基板の一方に
R,G,Bの三色の着色層を形成しておくことにより、
カラー表示も容易に実現している。特にスイッチング素
子を絵素毎に内蔵させた、いわゆるアクティブ型の液晶
パネルでは、クロストークも少なくかつ高速応答で高い
コントラスト比を有する画像が保証されている。
2. Description of the Related Art Recent advances in microfabrication technology, liquid crystal material technology, packaging technology, and the like have led to the commercialization of television images and various image displays on a 5 to 50 cm diagonal liquid crystal panel that are comparable to CRTs. Offered on a base. By forming three colored layers of R, G, and B on one of two glass substrates constituting the liquid crystal panel,
Color display is also easily realized. In particular, in a so-called active type liquid crystal panel in which a switching element is incorporated for each picture element, an image having little crosstalk, high-speed response, and a high contrast ratio is guaranteed.

【0003】これらの液晶パネルは、走査線としては1
00〜1000本、信号線としては200〜2000本
程度のマトリクス編成が一般的であるが、最近は大画面
化と高精細化が同時に進行している。
[0003] These liquid crystal panels have one scanning line.
Generally, a matrix organization of about 100 to 1000 lines and about 200 to 2,000 signal lines is used, but recently, a large screen and high definition have been simultaneously advanced.

【0004】図8は液晶パネルへの実装状態を示し、液
晶パネル1を構成する一方の透明絶縁基板、例えばガラ
ス基板2の上に形成された走査線の電極端子群6に駆動
信号を供給する半導体集積回路チップ3を直接に接続す
るCOG(Chip-On-Glass)方式や、例えばポリイミド
系樹脂薄膜をベースとし、金メッキされた銅箔の端子
(図示せず)を有するTCPフィルム4を信号線の電極
端子群5に導電性媒体を含む適当な接着剤で圧接して固
定するTCP方式などの実装手段によって、電気信号が
画像表示部に供給される。ここでは便宜上二つの実装方
式を同時に図示しているが、実際には何れかの方式が適
宜選択されることは言うまでもない。
FIG. 8 shows a state of mounting on a liquid crystal panel, in which a drive signal is supplied to one of the transparent insulating substrates constituting the liquid crystal panel 1, for example, a scanning line electrode terminal group 6 formed on a glass substrate 2. A COG (Chip-On-Glass) method for directly connecting the semiconductor integrated circuit chip 3 or a TCP film 4 having gold-plated copper foil terminals (not shown) based on, for example, a polyimide resin thin film and a signal line. An electrical signal is supplied to the image display unit by a mounting means such as a TCP system which is fixed to the electrode terminal group 5 by pressing with a suitable adhesive containing a conductive medium. Here, for the sake of convenience, two mounting schemes are shown at the same time, but it goes without saying that one of the two schemes is actually selected as appropriate.

【0005】7,8は液晶パネル1の画像表示部と信号
線および走査線の電極端子群5,6との間を接続する配
線路で、必ずしも電極端子群5,6と同一の導電材で構
成される必要はない。9は全ての液晶セルに共通の透明
導電性の対向電極を有するもう1枚の透明絶縁基板であ
るガラス基板で、液晶パネル1を構成する2枚のガラス
基板2,9は樹脂性のファイバやビーズなどのスペーサ
材によって数μm程度の所定の距離を隔てて形成され、
その間隙(ギャップ)は、ガラス基板2,9の周縁部に
おいて、有機性樹脂よりなるシール材と封口材とで封止
された閉空間になっており、この閉空間に液晶が充填さ
れている。
Reference numerals 7 and 8 denote wiring paths for connecting the image display portion of the liquid crystal panel 1 to the electrode terminals 5 and 6 for the signal lines and the scanning lines, and are necessarily made of the same conductive material as the electrode terminals 5 and 6. No need to be configured. Reference numeral 9 denotes a glass substrate which is another transparent insulating substrate having a transparent conductive counter electrode common to all liquid crystal cells, and two glass substrates 2 and 9 constituting the liquid crystal panel 1 are made of resinous fibers or It is formed at a predetermined distance of about several μm by a spacer material such as beads,
The gap (gap) is a closed space sealed with a sealing material and a sealing material made of an organic resin at the peripheral portion of the glass substrates 2 and 9, and the closed space is filled with liquid crystal. .

【0006】カラー表示を実現する場合には、ガラス基
板9の閉空間側に着色層と称する染料または顔料のいず
れか一方もしくは両方を含む厚さ1〜2μm程度の有機
薄膜が被着されて色表示機能が与えられるので、その場
合にはガラス基板9は別名カラーフィルタと呼称され
る。そして液晶材料の性質によってはガラス基板9の上
面またはガラス基板2の下面のいずれかもしくは両面上
に偏光板が貼付され、液晶パネル1は電気光学素子とし
て機能する。
In order to realize a color display, an organic thin film having a thickness of about 1 to 2 μm containing one or both of a dye and a pigment called a colored layer is deposited on the closed space side of the glass substrate 9 to form a color. Since a display function is provided, in that case, the glass substrate 9 is also called a color filter. Then, depending on the properties of the liquid crystal material, a polarizing plate is stuck on one or both of the upper surface of the glass substrate 9 and the lower surface of the glass substrate 2, and the liquid crystal panel 1 functions as an electro-optical element.

【0007】図9は、スイッチング素子として例えば薄
膜の絶縁ゲート型トランジスタを絵素毎に配置したアク
ティブ型液晶パネルの等価回路図である。実線で描かれ
た素子は一方のガラス基板であるアクティブ基板2の上
に、そして破線で描かれた素子はもう一方のガラス基板
9の上に形成されている。走査線11と信号線12は、
例えば非晶質シリコンを半導体層とし、シリコン窒化層
をゲート絶縁層とするTFT(薄膜トランジスタ)10
の形成と同時にアクティブ基板2(一方のガラス基板)
の上に作製される。
FIG. 9 is an equivalent circuit diagram of an active liquid crystal panel in which, for example, a thin-film insulated gate transistor is arranged as a switching element for each picture element. The elements drawn in solid lines are formed on the active substrate 2 which is one glass substrate, and the elements drawn in broken lines are formed on the other glass substrate 9. The scanning line 11 and the signal line 12
For example, a TFT (thin film transistor) 10 using amorphous silicon as a semiconductor layer and a silicon nitride layer as a gate insulating layer
Active substrate 2 (one glass substrate) simultaneously with the formation of
Fabricated on

【0008】液晶セル13はアクティブ基板2の上に形
成された透明導電性の絵素電極14と、カラーフィルタ
9(もう一方のガラス基板)の上に形成された同じく透
明導電性の対向電極15と、2枚のガラス基板2,9で
構成された閉空間を満たす液晶16とで構成され、電気
的にはコンデンサと同じ扱いで良い。液晶セル13の時
定数を大きくするための蓄積容量の構成に関しては幾つ
かの選択が可能で、例えば図9では蓄積容量17は全絵
素電極に共通の共通電極18と絵素電極14とが、絶縁
ゲート型トランジスタのゲート絶縁層などの絶縁層を介
して構成される。
The liquid crystal cell 13 includes a transparent conductive picture element electrode 14 formed on the active substrate 2 and a transparent conductive counter electrode 15 formed on the color filter 9 (the other glass substrate). And a liquid crystal 16 which fills a closed space formed by the two glass substrates 2 and 9, and may be electrically treated the same as a capacitor. There are several choices regarding the configuration of the storage capacitor for increasing the time constant of the liquid crystal cell 13. For example, in FIG. 9, the storage capacitor 17 includes a common electrode 18 and a pixel electrode 14 that are common to all the pixel electrodes. And an insulating layer such as a gate insulating layer of an insulated gate transistor.

【0009】図10はカラー表示用液晶パネルの要部断
面図である。染色された感光性ゼラチンまたは着色性感
光性樹脂などよりなる着色層19は先述したように、カ
ラーフィルタ9の閉空間側で絵素電極14に対応してR
GBの三原色で所定の配列にしたがって配置されてい
る。全ての絵素電極14に共通の対向電極15は着色層
19の介在による液晶セル内での電圧配分の損失を回避
するためには図示したように着色層19の上に形成され
る。液晶16に接して2枚のガラス基板2,9の上に被
着された、例えば0.1μm程度の膜厚のポリイミド系
樹脂薄膜層20は液晶分子を決められた方向に揃えるた
めの配向膜である。加えて液晶16にツイスト・ネマチ
ック(TN)型のものを用いる場合には上下に2枚の偏
光板21を必要とする。
FIG. 10 is a sectional view of a main part of a liquid crystal panel for color display. As described above, the colored layer 19 made of dyed photosensitive gelatin or colored photosensitive resin is disposed on the closed space side of the color filter 9 corresponding to the pixel electrode 14.
The three primary colors of GB are arranged according to a predetermined arrangement. The counter electrode 15 common to all the pixel electrodes 14 is formed on the colored layer 19 as shown in order to avoid loss of voltage distribution in the liquid crystal cell due to the interposition of the colored layer 19. A polyimide resin thin film layer 20 having a thickness of, for example, about 0.1 μm, which is adhered on the two glass substrates 2 and 9 in contact with the liquid crystal 16, is an alignment film for aligning liquid crystal molecules in a predetermined direction. It is. In addition, when a twisted nematic (TN) type liquid crystal is used, two polarizing plates 21 are required on the upper and lower sides.

【0010】R,G,Bの着色層19の境界に低反射性
の不透明膜22を配置すると、アクティブ基板2の上の
信号線12などの配線層からの反射光を防止できて画像
のコントラスト比が向上し、またスイッチング素子であ
るTFT10の外部光照射によるOFF動作時のリーク
電流の増大が防げて強い外光の下でも液晶パネルを動作
させることが可能となり、既にブラックマトリクス(B
M)として実用化されている。BMの構成も多数考えら
れるが、隣り合った着色層の境界における段差の発生と
光の透過率などを考慮するとコスト的には不利である
が、0.1μm程度の膜厚の金属薄膜、例えばCr薄膜
が簡便でかつ合理的である。
When a low-reflection opaque film 22 is disposed at the boundary between the R, G, and B colored layers 19, reflected light from a wiring layer such as the signal line 12 on the active substrate 2 can be prevented, and image contrast can be reduced. The ratio is improved, and the leakage current at the time of the OFF operation of the switching element TFT 10 due to external light irradiation can be prevented from increasing, so that the liquid crystal panel can be operated even under strong external light.
M). Although many configurations of the BM are conceivable, it is disadvantageous in terms of cost in consideration of the occurrence of a step at the boundary between adjacent colored layers and light transmittance, but a metal thin film having a thickness of about 0.1 μm, for example, A Cr thin film is simple and reasonable.

【0011】なお、図10において理解を簡単にするた
め、TFT10,走査線11および蓄積容量17に加え
て裏面光源やスペーサなどの構成要素も省略している。
23は絵素電極14とTFT10のドレインとを接続す
るための導電性薄膜で、一般的には信号線12と同一の
部材で同時に形成されドレイン配線(電極)と称され
る。ここでは図示しなかったが、対向電極15は画像表
示部より僅かに外よりの外周部で適当な導電性ペースト
を介してTFT10を有するアクティブ基板2の上の適
当な導電性パターンに接続され、電極端子群5,6の一
部に組み込まれて電気的接続が与えられている。
In FIG. 10, for simplicity of understanding, in addition to the TFT 10, the scanning line 11, and the storage capacitor 17, components such as a back light source and a spacer are omitted.
Reference numeral 23 denotes a conductive thin film for connecting the pixel electrode 14 and the drain of the TFT 10, and is generally formed simultaneously with the same member as the signal line 12 and is called a drain wiring (electrode). Although not shown here, the counter electrode 15 is connected to an appropriate conductive pattern on the active substrate 2 having the TFT 10 via an appropriate conductive paste at an outer peripheral portion slightly outside the image display portion, Electrical connection is provided by being incorporated in a part of the electrode terminal groups 5 and 6.

【0012】図11は従来の液晶パネル1の走査線側の
周縁部における断面図を示し、アクティブ基板2とカラ
ーフィルタ9とを接着性の樹脂シール24で封止した状
態図を示す。樹脂シール24の形状は、幅は0.5〜
1.2mm程度で、高さは液晶セルのギャツプ量の数μ
mであり、小型の液晶パネルではスクリーン印刷で効率
よく、また大型の液晶パネルではシール描画機を用いて
異物の転写が無いように形成される。
FIG. 11 is a sectional view of a peripheral portion of the conventional liquid crystal panel 1 on the scanning line side, and shows a state in which the active substrate 2 and the color filter 9 are sealed with an adhesive resin seal 24. The width of the shape of the resin seal 24 is 0.5 to
The height is about 1.2 mm and the height is several μ
m, which is efficiently formed by screen printing on a small liquid crystal panel, and formed by using a seal drawing machine so as not to transfer foreign matter on a large liquid crystal panel.

【0013】画像表示部の周辺は液晶パネルを斜めから
見た時に裏面からの不要な光が漏洩してこないように、
所定の配列数以上の着色層19'とBM22'とが配置さ
れている。なお、25はゲート絶縁層、26はパシベー
ション絶縁層である。
In order to prevent unnecessary light from leaking from the back side when the liquid crystal panel is viewed obliquely around the image display section,
The colored layers 19 'and the BMs 22' are arranged in a predetermined number or more. Note that 25 is a gate insulating layer, and 26 is a passivation insulating layer.

【0014】最新の液晶パネルは狭額縁化、すなわち画
像表示部外の領域は出来るだけ小さく設計して表示機器
の軽量化と小型化を推進中であり、そのためシール24
も出来るだけ画像表示部に近づけて配置される。この結
果、シール24の上にはBM22'を配置せざるを得な
くなる。
The latest liquid crystal panel is designed to have a narrower frame, that is, the area outside the image display unit is designed to be as small as possible to promote the reduction of the weight and size of the display device.
It is also arranged as close to the image display as possible. As a result, the BM 22 'must be arranged on the seal 24.

【0015】それと同時に、対角25cm以上の大型パ
ネルにおいても表示容量と表示画質の向上のために高精
細化が同時に進行し、開口率の確保も要求される結果、
BM幅を細くすると同時に液晶パネルを構成する2枚の
ガラス基板2,9の貼り合せ精度向上が俄かに技術的課
題となってきた。具体的には貼り合せ精度が、従来は数
μmで十分であったが、開口率を80%以上に高めるた
めには2μm以下の高精度を要求されるようになってき
た。
At the same time, even in a large-sized panel having a diagonal width of 25 cm or more, high definition is simultaneously promoted in order to improve display capacity and display image quality, and as a result, it is required to secure an aperture ratio.
Improving the bonding accuracy of the two glass substrates 2 and 9 constituting the liquid crystal panel at the same time as reducing the BM width has suddenly become a technical problem. Specifically, the pasting accuracy of several μm was sufficient in the past, but in order to increase the aperture ratio to 80% or more, high accuracy of 2 μm or less has come to be required.

【0016】液晶パネルの貼り合せ精度は、アクティブ
基板とカラーフィルタの加工精度および貼り合せ工程に
おける上記二つの基板の貼り合せ精度の総和であり、当
然のことではあるが液晶パネルが大きい程、ガラス基板
が大きい程、ガラス基板の反りやウネリも加算されて精
度は低下する。
The bonding accuracy of the liquid crystal panel is the sum of the processing accuracy of the active substrate and the color filter and the bonding accuracy of the two substrates in the bonding process. As the substrate is larger, the warpage and undulation of the glass substrate are also added, and the accuracy is reduced.

【0017】貼り合せ時に2枚のガラス基板を精度1〜
2μmで重ねることは、大型基板の高精度露光機の機構
や実力から考えてもさほど困難なことではないが、シー
ル24の硬化工程で上記したガラス基板の反りもあいま
って実用上確保できる精度は数μmに低下してしまうの
が現状である。
At the time of bonding, two glass substrates are attached with an accuracy of 1 to
It is not too difficult to overlap at 2 μm in view of the mechanism and ability of a high-precision exposure machine for large substrates, but the accuracy that can be practically secured due to the warpage of the glass substrate in the curing process of the seal 24 is At present, it is reduced to several μm.

【0018】[0018]

【発明が解決しようとする課題】硬化工程の中でも、特
に重要なことは温度の均一性に関わる問題である。ガラ
ス基板の膨張係数は1℃あたり数ppmもあるので、例
えば10℃の温度差が30cmの大きさの2枚のガラス
基板間にあると10〜20μmの伸縮差が生じてしまう
ことになる。このため、硬化工程における加熱・冷却は
徐熱・徐冷が必須であるが、余りに時間をかけて生産性
を低下させるわけにもいかない。
Among the curing steps, one of the most important is the problem of temperature uniformity. Since the expansion coefficient of a glass substrate is several ppm per 1 ° C., for example, if a temperature difference of 10 ° C. exists between two glass substrates having a size of 30 cm, a difference in expansion and contraction of 10 to 20 μm occurs. Therefore, gradual heating and gradual cooling are indispensable for heating and cooling in the curing step, but it cannot be reduced too much time to reduce productivity.

【0019】シール樹脂の熱硬化に当たり100℃以下
の低温化も検討されているが、一般的に硬化温度が低く
なると、気密性と密着性の低下は免れない。またシール
樹脂中の残留溶剤が液晶に溶け込んで液晶セルの保持率
が低下し、高温および長期動作時に液晶パネルの表示特
性が劣化することも避けられない。紫外線硬化型のシー
ル樹脂を用いて室温でシール硬化を行う試みも材料面の
相性からまだ実用化されていないようである。
Attempts have been made to lower the temperature to 100 ° C. or less in the heat curing of the sealing resin. However, generally, when the curing temperature is lowered, the airtightness and the adhesion are inevitably reduced. In addition, it is inevitable that the residual solvent in the sealing resin dissolves in the liquid crystal and the retention of the liquid crystal cell is reduced, and the display characteristics of the liquid crystal panel are deteriorated at high temperatures and during long-term operation. Attempts to cure the seal at room temperature using an ultraviolet-curable seal resin have not yet been put to practical use due to the compatibility of the materials.

【0020】カラーフィルタの作製に関しても、コスト
的な観点から使用される露光機はプロキシミテイ方式の
ものが大半で、精度的にはトータルピッチ2μm程度が
量産の限界であり、高精度の貼り合せには色々と課題が
多い。
Regarding the production of color filters, most of the exposure apparatuses used from the viewpoint of cost are of the proximity type, and the total pitch of about 2 μm is the limit of mass production. Has many issues.

【0021】本発明はかかる現状に鑑みなされたもの
で、色表示機能を有する着色層をアクティブ基板の上に
形成することにより、従来の貼り合わせに関連する諸課
題を回避せんとするものである。
The present invention has been made in view of the above situation, and aims to avoid various problems related to the conventional bonding by forming a colored layer having a color display function on an active substrate. .

【0022】[0022]

【課題を解決するための手段】本発明のカラー液晶パネ
ルは、第1の透明絶縁基板の上に、絶縁ゲート型トラン
ジスタのドレイン電極の上に第1の開口部を有する厚い
透明絶縁層が形成され、この厚い透明絶縁層の上に少な
くとも走査線の上と信号線の上に光シールド電極が形成
されるとともに、第1の開口部を含んで形成された中間
電極の上に第2の開口部を有する着色層が色毎に光シー
ルド電極の一部を含んで形成され、着色層間に位置する
光シールド電極に電着法により黒色着色層が形成され、
中間電極を含んで着色層の上と黒色着色層の上とに絵素
電極が形成されたアクティブ基板を備え、このアクティ
ブ基板と、一主面の上に透明導層を有する第2の透明絶
縁基板とを、その間に液晶を充填してパネル化したもの
である。
According to the color liquid crystal panel of the present invention, a thick transparent insulating layer having a first opening on a drain electrode of an insulated gate transistor is formed on a first transparent insulating substrate. A light shield electrode is formed on at least the scanning line and the signal line on the thick transparent insulating layer, and a second opening is formed on the intermediate electrode including the first opening. A colored layer having a portion is formed including a part of the light shield electrode for each color, a black colored layer is formed on the light shield electrode located between the colored layers by an electrodeposition method,
An active substrate having a pixel electrode formed on the colored layer and the black colored layer including the intermediate electrode, and a second transparent insulating layer having the active substrate and a transparent conductive layer on one main surface; A substrate is formed into a panel by filling a liquid crystal between them.

【0023】[0023]

【発明の実施の形態】請求項1に記載の液晶パネルは、
第1の透明絶縁基板の一主面の上に複数本の走査線を有
し、少なくとも一層以上の絶縁層を介して前記走査線と
概ね直交する複数の信号線を有し、前記走査線と信号線
との交点毎に少なくとも一つの絶縁ゲート型トランジス
タと透明導電性の絵素電極を有し、前記絵素電極下に顔
料を含む着色層を有して形成されたアクティブ基板と、
一主面の上に透明導電層を有し前記アクティブ基板と対
向する第2の透明絶縁基板との間に充填された液晶とを
備えた液晶パネルであって、前記絶縁ゲート型トランジ
スタのドレイン電極の上に第1の開口部を有し第1の透
明絶縁基板の上に形成された厚い第1の透明絶縁層を介
して少なくとも前記走査線の上と信号線の上に格子状の
光シールド電極と第1の開口部を含んで中間電極が形成
され、前記中間電極の上に第2の開口部を有する着色層
が色毎(R,G,B)に光シールド電極の一部を含んで
ストライプ状または島(ドット)状に形成されるととも
に、前記着色層間の光シールド電極の上に染料または顔
料の何れかもしくは両方を含む黒色着色層が形成され、
前記中間電極を含んで着色層の上と黒色着色層の上とに
絵素電極が形成されていることを特徴とする。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The liquid crystal panel according to claim 1 is
A plurality of scanning lines are provided on one main surface of the first transparent insulating substrate, and a plurality of signal lines that are substantially orthogonal to the scanning lines via at least one or more insulating layers. An active substrate having at least one insulated gate transistor and a transparent conductive picture element electrode at each intersection with a signal line, and having a colored layer containing a pigment under the picture element electrode,
A liquid crystal panel having a transparent conductive layer on one main surface and a liquid crystal filled between the active substrate and a second transparent insulating substrate facing the active substrate, wherein a drain electrode of the insulated gate transistor is provided. Having a first opening above the first transparent insulating substrate and a grid-like light shield at least above the scanning lines and the signal lines via a thick first transparent insulating layer formed on the first transparent insulating substrate An intermediate electrode is formed including the electrode and the first opening, and a colored layer having a second opening on the intermediate electrode includes a part of the light shield electrode for each color (R, G, B). And a black colored layer containing one or both of a dye and a pigment is formed on the light shielding electrode between the colored layers,
A picture element electrode is formed on the colored layer including the intermediate electrode and on the black colored layer.

【0024】請求項2に記載の液晶パネルは、第1の透
明絶縁基板の一主面の上に複数本の走査線を有し、少な
くとも一層以上の絶縁層を介して前記走査線と概ね直交
する複数の信号線を有し、前記走査線と信号線との交点
毎に少なくとも一つの絶縁ゲート型トランジスタと透明
導電性の絵素電極を有し、前記絵素電極下に顔料を含む
着色層を有して形成されたアクティブ基板と、一主面の
上に透明導電層を有し前記アクティブ基板と対向する第
2の透明絶縁基板との間に充填された液晶とを備えた液
晶パネルであって、前記絶縁ゲート型トランジスタのド
レイン電極の上に第1の開口部を有し第1の透明絶縁基
板の上に形成された厚い第1の透明絶縁層を介して少な
くとも前記走査線の上と信号線の上とに格子状の光シー
ルド電極と第1の開口部を含んで中間電極が形成され、
前記中間電極の上に第2の開口部を有する着色層が色毎
(R,G,B)に光シールド電極の一部を含んでストラ
イプ状または島(ドット)状に形成されるとともに、前
記着色層間の光シールド電極の上に染料または顔料の何
れかもしくは両方を含む黒色着色層が形成され、前記中
間電極を含んで着色層の上と黒色着色層の上とに絵素電
極が形成され、前記絵素電極の上と着色層の上と黒色着
色層の上に薄い第2の透明絶縁層が形成されていること
を特徴とする。
A liquid crystal panel according to a second aspect has a plurality of scanning lines on one main surface of the first transparent insulating substrate, and is substantially orthogonal to the scanning lines via at least one or more insulating layers. A colored layer containing at least one insulated gate transistor and a transparent conductive pixel electrode at each intersection of the scanning line and the signal line, and a pigment under the pixel electrode And a liquid crystal panel having a transparent conductive layer on one main surface and a liquid crystal filled between a second transparent insulating substrate facing the active substrate. A first opening on a drain electrode of the insulated gate transistor, at least over the scanning line via a thick first transparent insulating layer formed on a first transparent insulating substrate; A grid-shaped light shield electrode and a first The intermediate electrode is formed to include a mouth,
On the intermediate electrode, a colored layer having a second opening is formed in a stripe shape or an island (dot) shape including a part of the light shield electrode for each color (R, G, B). A black colored layer containing one or both of a dye and a pigment is formed on the light shield electrode between the colored layers, and a pixel electrode is formed on the colored layer and the black colored layer including the intermediate electrode. A thin second transparent insulating layer is formed on the picture element electrode, on the coloring layer, and on the black coloring layer.

【0025】請求項3に記載の液晶パネルは、第1の透
明絶縁基板の一主面の上に複数本の走査線を有し、少な
くとも一層以上の絶縁層を介して前記走査線と概ね直交
する複数の信号線を有し、前記走査線と信号線との交点
毎に少なくとも一つの絶縁ゲート型トランジスタと透明
導電性の絵素電極を有し、前記絵素電極下に顔料を含む
着色層を有して形成されたアクティブ基板と、一主面の
上に透明導電層を有し前記アクティブ基板と対向する第
2の透明絶縁基板との間に充填された液晶とを備えた液
晶パネルであって、前記絶縁ゲート型トランジスタのド
レイン電極の上に第1の開口部を有し第1の透明絶縁基
板の上に形成された厚い第1の透明絶縁層を介して少な
くとも前記走査線の上と信号線の上とに格子状の光シー
ルド電極と第1の開口部を含んで中間電極が形成され、
前記中間電極の上に第2の開口部を有する着色層が色毎
(R,G,B)に光シールド電極の一部を含んでストラ
イプ状または島(ドット)状に形成されるとともに、前
記着色層間の光シールド電極の上に染料または顔料の何
れかもしくは両方を含む黒色着色層が形成され、第1の
透明絶縁基板の上で第2の開口部の上に第3の開口部を
有する薄い第2の透明絶縁層が形成され、第3の開口部
内の中間電極を含んで着色層の上と黒色着色層の上の第
2の透明絶縁層の上に絵素電極が形成されていることを
特徴とする。
A liquid crystal panel according to a third aspect has a plurality of scanning lines on one main surface of the first transparent insulating substrate, and is substantially orthogonal to the scanning lines via at least one or more insulating layers. A colored layer containing at least one insulated gate transistor and a transparent conductive pixel electrode at each intersection of the scanning line and the signal line, and a pigment under the pixel electrode And a liquid crystal panel having a transparent conductive layer on one main surface and a liquid crystal filled between a second transparent insulating substrate facing the active substrate. A first opening on a drain electrode of the insulated gate transistor, at least over the scanning line via a thick first transparent insulating layer formed on a first transparent insulating substrate; A grid-shaped light shield electrode and a first The intermediate electrode is formed to include a mouth,
On the intermediate electrode, a colored layer having a second opening is formed in a stripe shape or an island (dot) shape including a part of the light shield electrode for each color (R, G, B). A black colored layer containing either or both of a dye and a pigment is formed on the light shield electrode between the colored layers, and has a third opening on the second opening on the first transparent insulating substrate. A thin second transparent insulating layer is formed, and a picture element electrode is formed on the colored layer including the intermediate electrode in the third opening and on the second transparent insulating layer on the black colored layer. It is characterized by the following.

【0026】請求項4に記載の液晶パネルの製造方法
は、請求項1に記載の液晶パネルの製造方法であって、
第1の透明絶縁基板の上に走査線、信号線、および絶縁
ゲート型トランジスタを形成する工程と、絶縁ゲート型
トランジスタのドレイン電極の上に第1の開口部を有す
る厚い第1の透明絶縁層を第1の透明絶縁基板の上に形
成する工程と、第1の透明絶縁層の上に第1の開口部を
含んで中間電極と少なくとも前記走査線の上と信号線の
上とに格子状の光シールド電極とを形成する工程と、中
間電極の上に第2の開口部を有し顔料を含む着色層を光
シールド電極の一部を含んで色毎(R,G,B)にスト
ライプ状または島(ドット)状に形成する工程と、電着
によって着色層間の光シールド電極の上に染料または顔
料の何れかもしくは両方を含む黒色着色層を形成する工
程と、第2の開口部を含んで着色層と黒色着色層の上と
に絵素電極を形成する工程とを有することを特徴とす
る。
A method for manufacturing a liquid crystal panel according to a fourth aspect is the method for manufacturing a liquid crystal panel according to the first aspect,
Forming a scanning line, a signal line, and an insulated gate transistor on a first transparent insulating substrate; and a thick first transparent insulating layer having a first opening on a drain electrode of the insulated gate transistor Forming on a first transparent insulating substrate, a grid-like pattern including an intermediate electrode including at least a first opening on the first transparent insulating layer, and at least on the scanning line and on the signal line. Forming a light-shielding electrode, and forming a colored layer having a second opening on the intermediate electrode and containing a pigment in stripes for each color (R, G, B) including a part of the light-shielding electrode. Forming a black colored layer containing either or both of a dye and a pigment on the light shield electrode between the colored layers by electrodeposition, and forming the second opening Form pixel electrodes on the colored layer and on the black colored layer And having a that step.

【0027】請求項5に記載の液晶パネルの製造方法
は、請求項2に記載の液晶パネルの製造方法であって、
第1の透明絶縁基板の上に走査線、信号線、および絶縁
ゲート型トランジスタを形成する工程と、絶縁ゲート型
トランジスタのドレイン電極の上に第1の開口部を有す
る厚い第1の透明絶縁層を第1の透明絶縁基板の上に形
成する工程と、第1の透明絶縁層の上に第1の開口部を
含んで中間電極と少なくとも前記走査線の上と信号線の
上とに格子状の光シールド電極とを形成する工程と、中
間電極の上に第2の開口部を有し顔料を含む着色層を光
シールド電極の一部を含んで色毎(R,G,B)にスト
ライプ状または島(ドット)状に形成する工程と、電着
によって着色層間の光シールド電極の上に染料または顔
料の何れかもしくは両方を含む黒色着色層を形成する工
程と、第2の開口部を含んで着色層と黒色着色層の上に
絵素電極を形成する工程と、第1の透明絶縁基板の上に
薄い第2の透明絶縁層を形成する工程とを有することを
特徴とする。
A method of manufacturing a liquid crystal panel according to a fifth aspect is the method of manufacturing a liquid crystal panel according to the second aspect,
Forming a scanning line, a signal line, and an insulated gate transistor on a first transparent insulating substrate; and a thick first transparent insulating layer having a first opening on a drain electrode of the insulated gate transistor Forming on a first transparent insulating substrate, a grid-like pattern including an intermediate electrode including at least a first opening on the first transparent insulating layer, and at least on the scanning line and on the signal line. Forming a light-shielding electrode, and forming a colored layer having a second opening on the intermediate electrode and containing a pigment in stripes for each color (R, G, B) including a part of the light-shielding electrode. Forming a black colored layer containing either or both of a dye and a pigment on the light shield electrode between the colored layers by electrodeposition, and forming the second opening To form a pixel electrode on the colored layer and the black colored layer And having a step, and forming a thin second transparent insulating layer on the first transparent insulating substrate.

【0028】請求項6に記載の液晶パネルの製造方法
は、請求項3に記載の液晶パネルの製造方法であって、
第1の透明絶縁基板の上に走査線、信号線、および絶縁
ゲート型トランジスタを形成する工程と、絶縁ゲート型
トランジスタのドレイン電極の上に第1の開口部を有す
る厚い第1の透明絶縁層を第1の透明絶縁基板の上に形
成する工程と、第1の透明絶縁層の上に第1の開口部を
含んで中間電極と少なくとも前記走査線の上と信号線の
上とに格子状の光シールド電極とを形成する工程と、中
間電極の上に第2の開口部を有し顔料を含む着色層を光
シールド電極の一部を含んで色毎(R,G,B)にスト
ライプ状または島(ドット)状に形成する工程と、電着
によって着色層間の光シールド電極の上に染料または顔
料の何れかもしくは両方を含む黒色着色層を形成する工
程と、第2の開口部の上に第3の開口部を有する薄い第
2の透明絶縁層を形成する工程と、第3の開口部を含ん
で着色層と黒色着色層の上の第2の透明絶縁層の上に絵
素電極を形成する工程とを有することを特徴とする。
According to a sixth aspect of the present invention, there is provided a method of manufacturing a liquid crystal panel, comprising the steps of:
Forming a scanning line, a signal line, and an insulated gate transistor on a first transparent insulating substrate; and a thick first transparent insulating layer having a first opening on a drain electrode of the insulated gate transistor Forming on a first transparent insulating substrate, a grid-like pattern including an intermediate electrode including at least a first opening on the first transparent insulating layer, and at least on the scanning line and on the signal line. Forming a light-shielding electrode, and forming a colored layer having a second opening on the intermediate electrode and containing a pigment in stripes for each color (R, G, B) including a part of the light-shielding electrode. Forming a black colored layer containing one or both of a dye and a pigment on the light shield electrode between the colored layers by electrodeposition; A thin second transparent insulating layer having a third opening thereon A step of forming, characterized by a step of forming a pixel electrode on the third colored layer include openings of the black coloring layer second transparent insulating layer over.

【0029】請求項1によれば、色表示機能を有する着
色層が絵素電極下に、またBM機能を有する黒色着色層
が厚い透明絶縁層を介して信号線の上と走査線の上とに
形成された光にシールド電極に、それぞれ高精度で形成
されているので、開口率を高めることができ、カラーフ
ィルタを用いることなくカラー液晶パネルが得られる。
According to the first aspect, the colored layer having the color display function is provided below the picture element electrode, and the black colored layer having the BM function is provided above the signal line and the scanning line via the thick transparent insulating layer. Since the formed light is formed on the shield electrode with high precision, the aperture ratio can be increased, and a color liquid crystal panel can be obtained without using a color filter.

【0030】請求項2によれば、着色層と黒色着色層と
絵素電極の上が透明絶縁層で覆われるので、請求項1と
同じ作用に加えて着色層と黒色着色層からの不純物の溶
出やガス成分の放出が抑制される。
According to the second aspect, the colored layer, the black colored layer, and the pixel electrode are covered with the transparent insulating layer. Elution and release of gas components are suppressed.

【0031】請求項3によれば、着色層と黒色着色層と
が透明絶縁層で覆われ、絵素電極が第1の透明絶縁基板
の最上層に形成されるので、請求項2と同じ作用に加え
て液晶セルの駆動に当たって電圧損失が発生せず、液晶
セルの電圧利用効率が向上する。
According to the third aspect, the colored layer and the black colored layer are covered with the transparent insulating layer, and the pixel electrode is formed on the uppermost layer of the first transparent insulating substrate. In addition, no voltage loss occurs when driving the liquid crystal cell, and the voltage use efficiency of the liquid crystal cell is improved.

【0032】請求項4のカラー液晶パネルの製造方法に
よれば、パネル製造に際し、厚い透明絶縁層を介して信
号線の上または信号線の上と走査線の上と形成された光
シールド電極の上に黒色着色層が電着で形成されるの
で、黒色着色層の厚みを着色層と揃えることで着色層と
黒色着色層との段差が解消され、請求項1と同じ作用に
加えて配向処理が容易となり、表示画質が向上する作用
がある。
According to the method for manufacturing a color liquid crystal panel of the present invention, in manufacturing the panel, the light shielding electrode formed on the signal line or on the signal line and the scanning line via the thick transparent insulating layer is formed. Since the black colored layer is formed by electrodeposition on the upper side, the step between the colored layer and the black colored layer is eliminated by adjusting the thickness of the black colored layer to the thickness of the colored layer. And the display image quality is improved.

【0033】請求項5のカラー液晶パネルの製造方法に
よれば、さらに着色層と黒色着色層と絵素電極の上が透
明絶縁層で覆われるので、請求項4と同じ作用に加えて
加えて着色層と黒色着色層からの不純物の溶出やガス成
分の放出が抑制され、液晶パネルの信頼性が向上する作
用がある。
According to the method of manufacturing a color liquid crystal panel of the fifth aspect, the colored layer, the black colored layer, and the pixel electrode are covered with the transparent insulating layer. Elution of impurities and release of gas components from the coloring layer and the black coloring layer are suppressed, and the reliability of the liquid crystal panel is improved.

【0034】請求項6のカラー液晶パネルの製造方法に
よれば、パネル製造に際し、中間電極の上の着色層に形
成された第2の開口部を覆って第2の透明絶縁層が被着
され、さらに第2の透明絶縁層に第3の開口部が形成さ
れて中間電極が露出するので、第2の透明絶縁層の上に
絵素電極が形成されても絵素電極が段切れしにくくな
る。
According to the method of manufacturing a color liquid crystal panel of the present invention, a second transparent insulating layer is applied to cover the second opening formed in the colored layer above the intermediate electrode in manufacturing the panel. Further, since the third opening is formed in the second transparent insulating layer and the intermediate electrode is exposed, even if the pixel electrode is formed on the second transparent insulating layer, the pixel electrode is hardly disconnected. Become.

【0035】以下、本発明の各実施の形態について図1
〜図7を用いて説明する。なお、従来例と同一の機能を
有する部位については同じ符号を付することにする。
Hereinafter, each embodiment of the present invention will be described with reference to FIG.
This will be described with reference to FIGS. Parts having the same functions as those of the conventional example are denoted by the same reference numerals.

【0036】(実施の形態1)図1は本発明の(実施の
形態1)によるアクティブ基板の平面図を示し、図2
(a)〜(c)、図3(a),(b)、図4は図1のA
−A'線上の工程断面図を示し、図5は本発明の(実施
の形態1)によるアクティブ基板の他の平面図を示す。
(Embodiment 1) FIG. 1 is a plan view of an active substrate according to (Embodiment 1) of the present invention, and FIG.
(A) to (c), FIGS. 3 (a), (b), and FIG.
FIG. 5 is a sectional view taken along the line A-A ′, and FIG. 5 is another plan view of the active substrate according to the first embodiment of the present invention.

【0037】図1において、27は第1の透明絶縁基板
2の上に形成された厚い第1の透明絶縁層、29は第1
の透明絶縁層27を介して少なくとも走査線の上と信号
線の上(共に図示せず)とに形成された格子状の光シー
ルド電極、30は第1の透明絶縁基板2の上の絶縁ゲー
ト型トランジスタのドレイン電極(図示せず)の上で、
第1の透明絶縁層27に形成された第1の開口部(後
述)を含んで形成された中間電極である。また、着色層
19は色毎(R,G,B)に光シールド電極29の一部
を含んでストライプ状に第1の透明絶縁層27の上に形
成され、絵素電極14は着色層19の上に形成されてい
る。
In FIG. 1, reference numeral 27 denotes a thick first transparent insulating layer formed on the first transparent insulating substrate 2;
A grid-shaped light shield electrode 30 formed at least on the scanning lines and on the signal lines (both not shown) via the transparent insulating layer 27, is an insulated gate on the first transparent insulating substrate 2. On the drain electrode (not shown) of the type transistor,
An intermediate electrode including a first opening (described later) formed in the first transparent insulating layer 27. The coloring layer 19 is formed on the first transparent insulating layer 27 in a stripe shape including a part of the light shield electrode 29 for each color (R, G, B). Is formed on.

【0038】(実施の形態1)における工程では、ま
ず、図2(a)に示されたように、第1の透明絶縁基板
2の一主面の上に少なくともスイッチング素子である絶
縁ゲート型トランジスタ10と走査線11(共に図示せ
ず)、信号線12およびドレイン電極23を逐次形成し
て第1の透明絶縁基板2をアクティブ化する。25は上
述したようにゲート絶縁層などの透明な絶縁層であり、
走査線11と信号線12との間の短絡確率を低下させる
ため異種類の絶縁層で積層化されることも多い。
In the process of the first embodiment, first, as shown in FIG. 2A, an insulated gate transistor which is at least a switching element is provided on one main surface of the first transparent insulating substrate 2. 10 and scanning lines 11 (both not shown), signal lines 12 and drain electrodes 23 are sequentially formed to activate the first transparent insulating substrate 2. 25 is a transparent insulating layer such as a gate insulating layer as described above,
In order to reduce the probability of a short circuit between the scanning line 11 and the signal line 12, they are often stacked with different types of insulating layers.

【0039】次に、図2(b)に示したように、第1の
透明絶縁基板2の上に厚い第1の透明絶縁層27を形成
し、表面を平坦化する。第1の透明絶縁層27としては
感光性の例えば、日本合成ゴム(株)製の商品名オプト
マーPC302を用いると、ドレイン電極23の上への
第1の開口部28の形成と、図示はしないが信号線12
と走査線11の端子電極5,6の上への開口部形成とが
同時に行えて合理的である。
Next, as shown in FIG. 2B, a thick first transparent insulating layer 27 is formed on the first transparent insulating substrate 2, and the surface is flattened. When the photosensitive material, for example, Optmer PC302 (trade name, manufactured by Nippon Synthetic Rubber Co., Ltd.) is used as the first transparent insulating layer 27, the first opening 28 is formed on the drain electrode 23 and not shown. Is the signal line 12
And the formation of openings on the terminal electrodes 5 and 6 of the scanning lines 11 can be performed simultaneously, which is reasonable.

【0040】引き続き、図2(c)に示したように、第
1の透明絶縁層27の上で好ましくは絶縁ゲート型トラ
ンジスタ10の上も含んで走査線11の上と信号線12
の上に光シールド電極29と、第1の開口部28を含ん
で中間電極30とを共に導電性の薄膜、例えばCr,T
i,Moなどを膜厚0.1〜0.3μm程度で形成する。絶縁
ゲート型トランジスタ10は図示はしないが、信号線1
2とドレイン電極23との間に半導体層を有するので、
絶縁ゲート型トランジスタ10の上に形成された光シー
ルド電極29(後の工程で黒色着色層が積層される)が
絶縁ゲート型トランジスタ10を外部光から遮蔽するこ
とになる。
Subsequently, as shown in FIG. 2C, on the first transparent insulating layer 27, preferably on the scanning line 11 including also on the insulated gate transistor 10, and on the signal line 12
A light shielding electrode 29 and an intermediate electrode 30 including the first opening 28 are both formed on a conductive thin film such as Cr, T
i, Mo, etc. are formed with a film thickness of about 0.1 to 0.3 μm. Although the insulated gate transistor 10 is not shown, the signal line 1
2 and the drain electrode 23,
The light shield electrode 29 (on which a black colored layer is laminated in a later step) formed on the insulated gate transistor 10 shields the insulated gate transistor 10 from external light.

【0041】第1の透明絶縁層27を厚く、少なくとも
1μm好ましくは2〜3μmの膜厚で形成すると良い理
由は、第1の透明絶縁層27の平坦化に加えて、光シー
ルド電極29が第1の透明絶縁層27を介して走査線1
1や信号線12と構成する静電容量をできるだけ小さく
したいからである。なぜなら、これらの静電容量は走査
線11や信号線12の電気的な負荷を重くして液晶パネ
ルの消費電力を増大させるし、応答速度を低下させた
り、クロストークなどの画質低下をもたらすからであ
る。
The reason why the first transparent insulating layer 27 is preferably formed to have a large thickness of at least 1 μm, preferably 2 to 3 μm is that, in addition to the planarization of the first transparent insulating layer 27, Scanning line 1 via the first transparent insulating layer 27
This is because it is desired to reduce the capacitance formed with the signal lines 1 and the signal lines 12 as much as possible. This is because these capacitances increase the electrical load on the scanning lines 11 and the signal lines 12 to increase the power consumption of the liquid crystal panel, reduce the response speed, and lower the image quality such as crosstalk. It is.

【0042】光シールド電極29の形成後、図1と図3
(a)とに示したように、第1の透明絶縁基板2の上に
顔料を分散させた感光性樹脂を用いて写真食刻法で顔料
を含む着色層19を、中間電極30の上に第2の開口部
31を有するように、信号線12の上の光シールド電極
29の一部を含んで色毎(R,G,B)にストライプ
(縦縞)状に形成する。または図5に示したように信号
線12と走査線11の上の光シールド電極29の一部を
含んで絵素毎に島(ドット)状に形成しても良い。
After the formation of the light shield electrode 29, FIGS.
As shown in (a), the coloring layer 19 containing the pigment is formed on the first transparent insulating substrate 2 by photolithography using a photosensitive resin in which the pigment is dispersed, and the coloring layer 19 is formed on the intermediate electrode 30. A stripe (vertical stripe) is formed for each color (R, G, B) including a part of the light shield electrode 29 above the signal line 12 so as to have the second opening 31. Alternatively, as shown in FIG. 5, each pixel may be formed in an island (dot) shape including a part of the light shield electrode 29 on the signal line 12 and the scanning line 11.

【0043】この後、図3(b)に示したように、電着
法により信号線12の上の光シールド電極29の上に、
または島状の着色層19の周囲の光シールド電極29の
上に、黒い染料または顔料の何れかもしくは両方を含む
黒色着色層32を析出させる。そのためには、光シール
ド電極29のパターンをアクティブ基板2の周縁部に延
長して配置して適当な電位供給個所とし、電位供給個所
にクリップなどの冶具を用いて直流電位を与え、絶縁容
器中の黒い染料また顔料の何れかもしくは両方を含む電
着液中にアクティブ基板2を浸漬させることで電着が実
施されるが、ここでは詳細は省略する。この時、光シー
ルド電極29と中間電極30とは電気的には絶縁されて
いるので、第2の開口部31内に露出している中間電極
30の上に黒色着色層32が析出することはない。
Thereafter, as shown in FIG. 3B, the light shielding electrode 29 on the signal line 12 is
Alternatively, a black colored layer 32 containing one or both of a black dye and a pigment is deposited on the light shield electrode 29 around the island-shaped colored layer 19. For this purpose, the pattern of the light shield electrode 29 is extended and arranged on the peripheral edge of the active substrate 2 to provide an appropriate potential supply location, and a DC potential is applied to the potential supply location using a jig such as a clip, so that the potential in the insulating container is reduced. The electrodeposition is performed by immersing the active substrate 2 in an electrodeposition solution containing either or both of the black dye and the pigment, but the details are omitted here. At this time, since the light shield electrode 29 and the intermediate electrode 30 are electrically insulated, the black colored layer 32 is not deposited on the intermediate electrode 30 exposed in the second opening 31. Absent.

【0044】黒色着色層32の厚みは着色層19と同じ
になるようにして、着色層19と黒色着色層32とがほ
ぼ平坦となるようにする。もちろん、3色(R,G,
B)の着色層19も厚みが揃うように顔料の分散度と透
過率を考慮しておくことが望ましい。
The thickness of the black colored layer 32 is made the same as that of the colored layer 19 so that the colored layer 19 and the black colored layer 32 are substantially flat. Of course, three colors (R, G,
It is desirable to consider the degree of dispersion and transmittance of the pigment so that the thickness of the colored layer 19 of B) is also uniform.

【0045】アクティブ基板として最後の工程は、図4
に示したように、スパッタなどの真空製膜装置を用いて
アクティブ基板2の全面に透明導電性のITO薄膜を被
着し、微細加工技術により中間電極30の上の第2の開
口部31を含んで着色層19の上と黒色着色層32の一
部の上に絵素電極14を形成することである。
The last step as an active substrate is shown in FIG.
As shown in (1), a transparent conductive ITO thin film is deposited on the entire surface of the active substrate 2 by using a vacuum film forming apparatus such as sputtering, and the second opening 31 on the intermediate electrode 30 is formed by a fine processing technique. That is, the pixel electrode 14 is formed on the coloring layer 19 and on a part of the black coloring layer 32.

【0046】色表示機能を有する着色層19とBM機能
を有する黒色着色層32とを形成されたアクティブ基板
2は、この後、透明導電層を一主面の上に形成された第
2の透明絶縁基板と貼り合わせられてパネル化され、
(実施の形態1)によるカラー液晶パネルが完成する。
After the active substrate 2 on which the colored layer 19 having the color display function and the black colored layer 32 having the BM function are formed, a transparent conductive layer is formed on one main surface of the second transparent substrate. It is laminated with an insulating substrate to form a panel,
A color liquid crystal panel according to Embodiment 1 is completed.

【0047】(実施の形態2)図6は本発明の(実施の
形態2)によるアクティブ基板の工程断面図を示す。
(実施の形態2)においても図2(a)〜(c)と図3
(a),(b)と図4に示したように、絵素電極14の
形成までは(実施の形態1)と同一の製造工程で進行
し、引き続き、図6に示したように、アクティブ基板2
の画像表示領域に第2の透明絶縁層33を形成する。そ
の厚みは0.1から0.3μmと比較的、薄く形成するとよ
い。
(Embodiment 2) FIG. 6 is a process sectional view of an active substrate according to (Embodiment 2) of the present invention.
Also in (Embodiment 2), FIGS. 2 (a) to 2 (c) and FIG.
As shown in FIGS. 4A and 4B and FIG. 4, the steps up to the formation of the pixel electrode 14 proceed in the same manufacturing process as in the first embodiment, and subsequently, as shown in FIG. Substrate 2
The second transparent insulating layer 33 is formed in the image display area of FIG. The thickness should be relatively thin, from 0.1 to 0.3 μm.

【0048】第2の透明絶縁層33を、アクティブ基板
2の全面に形成すると良い理由は、一つには電着法で形
成される黒色着色層32からの好ましからざるイオン性
不純物の液晶中への溶出を防止することであり、二つに
は着色層19と黒色着色層32からの好ましからざるガ
ス放出を防止することである。これらの溶出または放出
成分は液晶中に溶け込んで液晶を劣化させる障害をもた
らし易く、特に高温時の動作では留意せねばならない事
項であり、従来のカラーフィルタにおいてもOC(オー
バーコート)保護膜として周知の技術である。
The reason why the second transparent insulating layer 33 is preferably formed on the entire surface of the active substrate 2 is that, in part, the undesired ionic impurities from the black colored layer 32 formed by the electrodeposition method are introduced into the liquid crystal. The second is to prevent undesired gas release from the colored layer 19 and the black colored layer 32. These eluted or released components are likely to dissolve into the liquid crystal and cause obstacles to degrade the liquid crystal. This is a matter to be noted particularly in operation at high temperatures, and is known as an OC (overcoat) protective film even in a conventional color filter. Technology.

【0049】以上で(実施の形態2)によるアクティブ
基板2が完成する。そして透明導電層を一主面の上に形
成された第2の透明絶縁基板と貼り合わせられてパネル
化され、(実施の形態2)によるカラー液晶パネルが完
成する。
Thus, the active substrate 2 according to (Embodiment 2) is completed. Then, the transparent conductive layer is bonded to a second transparent insulating substrate formed on one main surface to form a panel, and a color liquid crystal panel according to Embodiment 2 is completed.

【0050】(実施の形態2)においては、アクティブ
基板2の画像表示領域に第2の透明絶縁層33を形成さ
れているため、絵素電極14の上にも第2の透明絶縁層
33が存在する。そのため、液晶セルの電圧利用効率が
低下したり、第2の透明絶縁層33の材質によっては電
荷の蓄積によって残像の発生する恐れがある。そこで
(実施の形態3)においては絵素電極14の上に第2の
透明絶縁層33を形成することなく、着色層19と黒色
着色層32の上に第2の透明絶縁層33を形成すること
を考慮したものである。
In the second embodiment, since the second transparent insulating layer 33 is formed in the image display area of the active substrate 2, the second transparent insulating layer 33 is also formed on the pixel electrode 14. Exists. Therefore, there is a possibility that the voltage use efficiency of the liquid crystal cell is reduced, or an afterimage is generated due to accumulation of electric charges depending on the material of the second transparent insulating layer 33. Therefore, in (Embodiment 3), the second transparent insulating layer 33 is formed on the colored layer 19 and the black colored layer 32 without forming the second transparent insulating layer 33 on the pixel electrode 14. This is taken into account.

【0051】(実施の形態3)図7は本発明の(実施の
形態3)によるアクティブ基板の工程断面図である。
(実施の形態3)においても図2(a)〜(c)と図3
(a),(b)に示したように、着色層19と黒色着色
層32の形成までは(実施の形態1)と同一の製造工程
で進行し、引き続き、図7(a)に示したように、アク
ティブ基板2の全面に第2の透明絶縁層33を被着形成
し、第2の開口部31の上には第3の開口部34を形成
する。第2の透明絶縁層33としては先述した第1の透
明絶縁層27と同じように感光性のものを用いると第2
の透明絶縁層33の形成と第3の開口部34の形成が同
時に行え合理的である。
(Embodiment 3) FIG. 7 is a process sectional view of an active substrate according to (Embodiment 3) of the present invention.
Also in (Embodiment 3), FIGS. 2 (a) to 2 (c) and FIG.
As shown in (a) and (b), the steps up to the formation of the colored layer 19 and the black colored layer 32 proceed in the same manufacturing steps as in (Embodiment 1), and subsequently shown in FIG. As described above, the second transparent insulating layer 33 is formed on the entire surface of the active substrate 2, and the third opening 34 is formed on the second opening 31. If the photosensitive material is used as the second transparent insulating layer 33 in the same manner as the first transparent insulating layer 27 described above,
The formation of the transparent insulating layer 33 and the formation of the third opening 34 can be simultaneously performed, which is reasonable.

【0052】また、図示はしないが第2の開口部31の
断面形状が逆テーパであっても、第3の開口部34の開
口の大きさを第2の開口部31のそれよりも小さく設定
すれば第2の透明絶縁層33で開口部31内の側面が埋
められて断面形状が正テーパ化し易い。
Although not shown, the size of the third opening 34 is set smaller than that of the second opening 31 even if the cross-sectional shape of the second opening 31 is reversely tapered. Then, the side surface inside the opening 31 is filled with the second transparent insulating layer 33, and the cross-sectional shape is easily tapered.

【0053】第2の透明絶縁層33の形成後、図7
(b)に示したように、スパッタなどの真空製膜装置を
用いてアクティブ基板2の全面に透明導電性のITO薄
膜を被着し、微細加工技術により中間電極30の上の第
3の開口部34を含んで第2の透明絶縁層33の上に絵
素電極14を形成して、(実施の形態3)によるアクテ
ィブ基板2が完成する。そして透明導電層を一主面の上
に形成された第2の透明絶縁基板と貼り合わせられてパ
ネル化され、(実施の形態3)によるカラー液晶パネル
が完成する。
After the formation of the second transparent insulating layer 33, FIG.
As shown in (b), a transparent conductive ITO thin film is deposited on the entire surface of the active substrate 2 using a vacuum film forming apparatus such as sputtering, and a third opening on the intermediate electrode 30 is formed by a fine processing technique. The picture element electrode 14 is formed on the second transparent insulating layer 33 including the portion 34, and the active substrate 2 according to the third embodiment is completed. Then, the transparent conductive layer is bonded to a second transparent insulating substrate formed on one main surface to form a panel, and a color liquid crystal panel according to Embodiment 3 is completed.

【0054】[0054]

【発明の効果】以上のように本発明のカラー液晶パネル
によれば、色表示機能を有する着色層が絵素電極下に、
またBM機能を有する黒色着色層が光シールド電極の上
に高精度で形成されたアクティブ基板と、一主面の上に
透明導電層を有する対向基板とが貼り合わされているの
で、着色層と液晶セルとの相対的な位置精度が向上して
開口率が向上し、従来のようにパネル化工程における貼
り合わせ精度で開口率が左右されなくなる。
As described above, according to the color liquid crystal panel of the present invention, a colored layer having a color display function is provided below the pixel electrode.
Further, since the active substrate in which the black colored layer having the BM function is formed with high precision on the light shield electrode and the opposing substrate having the transparent conductive layer on one principal surface are bonded, the colored layer and the liquid crystal The aperture ratio is improved by improving the relative positional accuracy with respect to the cell, and the aperture ratio is no longer influenced by the bonding accuracy in the paneling process as in the related art.

【0055】また、本発明のカラー液晶パネルによれ
ば、上記と同様に開口率の高い液晶パネルが得られるだ
けでなく、着色層と黒色着色層とが透明絶縁層で覆われ
るので、着色層と黒色着色層からの不純物の溶出やガス
成分の放出が抑制され、液晶パネルの信頼性が向上す
る。あるいは着色層と黒色着色層の材料純度に特に配慮
する必要がなくなり、材料コストが低下する。
According to the color liquid crystal panel of the present invention, not only a liquid crystal panel having a high aperture ratio as described above can be obtained, but also the colored layer and the black colored layer are covered with the transparent insulating layer. Elution of impurities and emission of gas components from the black colored layer are suppressed, and the reliability of the liquid crystal panel is improved. Alternatively, it is not necessary to particularly consider the material purity of the colored layer and the black colored layer, and the material cost is reduced.

【0056】さらに本発明のカラー液晶パネルによれ
ば、上記と同様に開口率と信頼性が高い液晶パネルが得
られるだけでなく、絵素電極がアクティブ基板の最上層
に形成されるので、液晶セルの駆動に当たって電圧損失
が発生しない。
Further, according to the color liquid crystal panel of the present invention, not only a liquid crystal panel having a high aperture ratio and high reliability as described above can be obtained, but also the pixel electrodes are formed on the uppermost layer of the active substrate. No voltage loss occurs in driving the cell.

【0057】本発明のカラー液晶パネルの製造方法によ
れば、黒色着色層が電着で形成されるので、着色層と黒
色着色層との段差を解消して配向処理を容易とすること
ができ、表示画質が向上する。さらに着色層と黒色着色
層からの不純物の溶出やガス成分の放出が抑制されるこ
とで、長時間あるいは高温度状態での使用に対して信頼
性の高い液晶パネルが得られる。
According to the method of manufacturing a color liquid crystal panel of the present invention, since the black colored layer is formed by electrodeposition, the step between the colored layer and the black colored layer can be eliminated to facilitate the alignment treatment. The display quality is improved. Further, since the elution of impurities and the release of gas components from the colored layer and the black colored layer are suppressed, a liquid crystal panel having high reliability for use for a long time or in a high temperature state can be obtained.

【0058】また本発明のカラー液晶パネルの製造方法
によれば、着色層と、黒色着色層の上の第2の透明絶縁
層の上に絵素電極が形成されても、絵素電極が段切れし
にくくなって絵素電極と中間電極との電気的接触が確実
になり、液晶パネルの信頼性が向上する等の優れた効果
が得られる。
According to the method of manufacturing a color liquid crystal panel of the present invention, even if a pixel electrode is formed on the colored layer and the second transparent insulating layer on the black colored layer, the pixel electrode is not stepped. It is difficult to cut, and the electrical contact between the picture element electrode and the intermediate electrode is ensured, so that excellent effects such as improvement of the reliability of the liquid crystal panel can be obtained.

【0059】以上述べたように、本発明の要件は、ドレ
イン電極の上に第1の開口部を有する厚い第1の透明絶
縁層と、第1の透明絶縁層の上に形成されたドレイン電
極を含む中間電極および光シールド電極と、中間電極の
上に第2の開口部を有する顔料を含む着色層と,着色層
間の光シールド電極を電着法により染料または顔料の何
れかもしくは両方を含む黒色着色層で埋めてアクティブ
基板の表面を平坦化し、平坦化されたアクティブ基板の
表面に透明導電性の絵素電極を形成したカラー液晶パネ
ルであって、絶縁ゲート型トランジスタなどのスイッチ
ング素子の構成や材料による差異、および電極線である
走査線や信号線の構成や材料による差異があっても、当
然本発明に含まれることは言うまでも無いだろう。
As described above, the requirements of the present invention include a thick first transparent insulating layer having a first opening on the drain electrode, and a drain electrode formed on the first transparent insulating layer. An intermediate electrode and a light shielding electrode, a coloring layer containing a pigment having a second opening on the intermediate electrode, and a light shielding electrode between the coloring layers containing one or both of a dye and a pigment by an electrodeposition method. A color liquid crystal panel in which the surface of the active substrate is flattened by filling it with a black colored layer, and a transparent conductive pixel electrode is formed on the flattened surface of the active substrate, and the configuration of switching elements such as insulated gate transistors It is needless to say that the present invention is naturally included in the present invention even if there is a difference due to the configuration or material of the scanning line or the signal line which is an electrode line, or a difference due to the material.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の(実施の形態1)にかかるアクティブ
基板の平面図
FIG. 1 is a plan view of an active substrate according to a first embodiment of the present invention.

【図2】本発明の(実施の形態1)にかかるアクティブ
基板の工程断面図
FIG. 2 is a process cross-sectional view of the active substrate according to the first embodiment of the present invention.

【図3】本発明の(実施の形態1)にかかるアクティブ
基板のその後の工程断面図
FIG. 3 is a sectional view of the active substrate according to the first embodiment of the present invention after the process.

【図4】本発明の(実施の形態1)にかかるアクティブ
基板のさらに最終工程断面図
FIG. 4 is a sectional view of a further final step of the active substrate according to the first embodiment of the present invention;

【図5】本発明の(実施の形態1)にかかるアクティブ
基板の他の平面図
FIG. 5 is another plan view of the active substrate according to the first embodiment of the present invention.

【図6】本発明の(実施の形態2)にかかるアクティブ
基板の最終工程断面図
FIG. 6 is a sectional view of a final step of the active substrate according to the second embodiment of the present invention.

【図7】本発明の(実施の形態2)にかかるアクティブ
基板の工程断面図
FIG. 7 is a process sectional view of the active substrate according to the second embodiment of the present invention;

【図8】液晶パネルの実装状態を示す斜視図FIG. 8 is a perspective view showing a mounting state of a liquid crystal panel.

【図9】アクティブ型液晶パネルの等価回路図FIG. 9 is an equivalent circuit diagram of an active liquid crystal panel.

【図10】従来のアクティブ型液晶パネルの要部断面図FIG. 10 is a sectional view of a main part of a conventional active liquid crystal panel.

【図11】従来のカラー液晶パネルの走査線側の周縁部
における断面図
FIG. 11 is a cross-sectional view of a peripheral portion on the scanning line side of a conventional color liquid crystal panel.

【符号の説明】[Explanation of symbols]

2 アクティブ基板(第1の透明絶縁基板) 9 カラーフィルタ 12 信号線 14 絵素電極 19 顔料を含む着色層(R,G,B) 23 ドレイン電極 27 第1の(厚い)透明絶縁層 28 ドレイン電極の上の第1の開口部 29 光シールド電極 30 中間電極 31 中間電極の上の第2の開口部 32 黒色着色層 33 第2の(薄い)透明絶縁層 34 第2の開口部の上の第3の開口部 Reference Signs List 2 Active substrate (first transparent insulating substrate) 9 Color filter 12 Signal line 14 Pixel electrode 19 Colored layer (R, G, B) containing pigment 23 Drain electrode 27 First (thick) transparent insulating layer 28 Drain electrode First opening 29 above light shield electrode 30 Intermediate electrode 31 Second opening above intermediate electrode 32 Black colored layer 33 Second (thin) transparent insulating layer 34 Second above second opening 3 openings

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】第1の透明絶縁基板の一主面の上に複数本
の走査線を有し、少なくとも一層以上の絶縁層を介して
前記走査線と概ね直交する複数の信号線を有し、前記走
査線と信号線との交点毎に少なくとも一つの絶縁ゲート
型トランジスタと透明導電性の絵素電極を有し、前記絵
素電極下に顔料を含む着色層を有して形成されたアクテ
ィブ基板と、一主面の上に透明導電層を有し前記アクテ
ィブ基板と対向する第2の透明絶縁基板との間に充填さ
れた液晶とを備えた液晶パネルであって、 前記絶縁ゲート型トランジスタのドレイン電極の上に第
1の開口部を有し第1の透明絶縁基板の上に形成された
厚い第1の透明絶縁層を介して少なくとも前記走査線の
上と信号線の上に格子状の光シールド電極と第1の開口
部を含んで中間電極が形成され、 前記中間電極の上に第2の開口部を有する着色層が色毎
(R,G,B)に光シールド電極の一部を含んでストラ
イプ状または島(ドット)状に形成されるとともに、前
記着色層間の光シールド電極の上に染料または顔料の何
れかもしくは両方を含む黒色着色層が形成され、 前記中間電極を含んで着色層の上と黒色着色層の上とに
絵素電極を形成したカラー液晶パネル。
A first transparent insulating substrate having a plurality of scanning lines on one principal surface thereof, and a plurality of signal lines substantially orthogonal to the scanning lines via at least one or more insulating layers; Having at least one insulated gate transistor and a transparent conductive pixel electrode at each intersection of the scanning line and the signal line; and an active layer formed having a colored layer containing a pigment under the pixel electrode. A liquid crystal panel comprising: a substrate; and a liquid crystal which has a transparent conductive layer on one main surface and is filled between a second transparent insulating substrate facing the active substrate, wherein the insulated gate transistor Having a first opening above the drain electrode of the first transparent insulating substrate, and having a grid-like shape over at least the scanning line and the signal line via a thick first transparent insulating layer formed on the first transparent insulating substrate. An intermediate electrode is formed including the light shield electrode and the first opening. A colored layer having a second opening on the intermediate electrode is formed in a stripe shape or an island (dot) shape including a part of the light shield electrode for each color (R, G, B); A black colored layer containing one or both of a dye and a pigment is formed on the light shield electrode between the colored layers, and a pixel electrode is formed on the colored layer including the intermediate electrode and on the black colored layer. Color LCD panel.
【請求項2】第1の透明絶縁基板の一主面の上に複数本
の走査線を有し、少なくとも一層以上の絶縁層を介して
前記走査線と概ね直交する複数の信号線を有し、前記走
査線と信号線との交点毎に少なくとも一つの絶縁ゲート
型トランジスタと透明導電性の絵素電極を有し、前記絵
素電極の下に顔料を含む着色層を有して形成されたアク
ティブ基板と、 一主面の上に透明導電層を有し前記アクティブ基板と対
向する第2の透明絶縁基板との間に充填された液晶とを
備えた液晶パネルであって、 前記絶縁ゲート型トランジスタのドレイン電極の上に第
1の開口部を有し第1の透明絶縁基板の上に形成された
厚い第1の透明絶縁層を介して少なくとも前記走査線の
上と信号線の上とに格子状の光シールド電極と第1の開
口部を含んで中間電極が形成され、 前記中間電極の上に第2の開口部を有する着色層が色毎
(R,G,B)に光シールド電極の一部を含んでストラ
イプ状または島(ドット)状に形成されるとともに、 前記着色層間の光シールド電極の上に染料または顔料の
何れかもしくは両方を含む黒色着色層が形成され、 前記中間電極を含んで着色層の上と黒色着色層の上とに
絵素電極が形成され、 前記絵素電極の上と着色層の上と黒色着色層の上に薄い
第2の透明絶縁層を形成したカラー液晶パネル。
2. A semiconductor device comprising: a plurality of scanning lines on one main surface of a first transparent insulating substrate; and a plurality of signal lines substantially orthogonal to the scanning lines via at least one or more insulating layers. Having at least one insulated gate transistor and a transparent conductive pixel electrode at each intersection of the scanning line and the signal line, and having a colored layer containing a pigment under the pixel electrode. A liquid crystal panel comprising: an active substrate; and a liquid crystal that has a transparent conductive layer on one main surface and is filled between a second transparent insulating substrate facing the active substrate. A first opening on the drain electrode of the transistor, at least over the scanning line and over the signal line via a thick first transparent insulating layer formed on the first transparent insulating substrate; The intermediate electrode includes a lattice-shaped light shield electrode and a first opening. A colored layer having a second opening is formed on the intermediate electrode in a stripe shape or an island (dot) shape including a part of the light shield electrode for each color (R, G, B). A black colored layer containing one or both of a dye and a pigment is formed on the light shield electrode between the colored layers, and a pixel electrode is formed on the colored layer including the intermediate electrode and on the black colored layer. A color liquid crystal panel formed, wherein a thin second transparent insulating layer is formed on the picture element electrode, the coloring layer, and the black coloring layer.
【請求項3】第1の透明絶縁基板の一主面の上に複数本
の走査線を有し、少なくとも一層以上の絶縁層を介して
前記走査線と概ね直交する複数の信号線を有し、前記走
査線と信号線との交点毎に少なくとも一つの絶縁ゲート
型トランジスタと透明導電性の絵素電極を有し、前記絵
素電極下に顔料を含む着色層を有して形成されたアクテ
ィブ基板と、 一主面の上に透明導電層を有し前記アクティブ基板と対
向する第2の透明絶縁基板との間に充填された液晶とを
備えた液晶パネルであって、 前記絶縁ゲート型トランジスタのドレイン電極の上に第
1の開口部を有し第1の透明絶縁基板の上に形成された
厚い第1の透明絶縁層を介して少なくとも前記走査線の
上と信号線の上とに格子状の光シールド電極と第1の開
口部を含んで中間電極が形成され、 前記中間電極の上に第2の開口部を有する着色層が色毎
(R,G,B)に光シールド電極の一部を含んでストラ
イプ状または島(ドット)状に形成されるとともに、前
記着色層間の光シールド電極の上に染料または顔料の何
れかもしくは両方を含む黒色着色層が形成され、 第1の透明絶縁基板の上で第2の開口部の上に第3の開
口部を有する薄い第2の透明絶縁層が形成され、 第3の開口部内の中間電極を含んで着色層の上と黒色着
色層の上の第2の透明絶縁層の上に絵素電極を形成した
カラー液晶パネル。
3. A first transparent insulating substrate having a plurality of scanning lines on one principal surface thereof, and a plurality of signal lines substantially orthogonal to the scanning lines via at least one insulating layer. Having at least one insulated gate transistor and a transparent conductive pixel electrode at each intersection of the scanning line and the signal line; and an active layer formed having a colored layer containing a pigment under the pixel electrode. A liquid crystal panel comprising: a substrate; and a liquid crystal which has a transparent conductive layer on one main surface and is filled between a second transparent insulating substrate facing the active substrate. Having a first opening above the drain electrode of the first transparent insulating substrate and having a first transparent insulating layer formed on the first transparent insulating substrate, at least over the scanning lines and the signal lines via a thick first transparent insulating layer. Forming an intermediate electrode including a light shield electrode and a first opening A colored layer having a second opening is formed on the intermediate electrode in a stripe shape or an island (dot) shape including a part of the light shield electrode for each color (R, G, B). A black colored layer containing either or both of a dye and a pigment is formed on the light shield electrode between the colored layers, and a third opening is formed on the second opening on the first transparent insulating substrate. Forming a thin second transparent insulating layer having a pixel electrode on the colored layer including the intermediate electrode in the third opening and on the second transparent insulating layer on the black colored layer. Color LCD panel.
【請求項4】請求項1に記載の液晶パネルの製造方法で
あって、 第1の透明絶縁基板の上に走査線,信号線,および絶縁
ゲート型トランジスタを形成する工程と、 絶縁ゲート型トランジスタのドレイン電極の上に第1の
開口部を有する厚い第1の透明絶縁層を第1の透明絶縁
基板の上に形成する工程と、 第1の透明絶縁層の上に第1の開口部を含んで中間電極
と少なくとも前記走査線の上と信号線の上とに格子状の
光シールド電極とを形成する工程と、 中間電極の上に第2の開口部を有し顔料を含む着色層を
光シールド電極の一部を含んで色毎(R,G,B)にス
トライプ状または島(ドット)状に形成する工程と、 電着によって着色層間の光シールド電極の上に染料また
は顔料の何れかもしくは両方を含む黒色着色層を形成す
る工程と、 第2の開口部を含んで着色層と黒色着色層の上とに絵素
電極を形成する工程とを有するカラー液晶パネルの製造
方法。
4. A method for manufacturing a liquid crystal panel according to claim 1, wherein: forming a scanning line, a signal line, and an insulated gate transistor on the first transparent insulating substrate; Forming a thick first transparent insulating layer having a first opening on the first transparent insulating substrate on the first transparent insulating layer; and forming the first opening on the first transparent insulating layer. Forming a grid-shaped light shielding electrode on the intermediate electrode and at least on the scanning line and on the signal line; and forming a colored layer containing a pigment having a second opening on the intermediate electrode. A step of forming a stripe or an island (dot) for each color (R, G, B) including a part of the light shield electrode; and either a dye or a pigment on the light shield electrode between the colored layers by electrodeposition. Forming a black colored layer containing or both Method of manufacturing a color liquid crystal panel and a step of forming a pixel electrode on the upper of the colored layer and the black color layer comprises a second opening.
【請求項5】請求項2に記載の液晶パネルの製造方法で
あって、 第1の透明絶縁基板の上に走査線,信号線,および絶縁
ゲート型トランジスタを形成する工程と、 絶縁ゲート型トランジスタのドレイン電極の上に第1の
開口部を有する厚い第1の透明絶縁層を第1の透明絶縁
基板の上に形成する工程と、 第1の透明絶縁層の上に第1の開口部を含んで中間電極
と少なくとも前記走査線の上と信号線の上とに格子状の
光シールド電極とを形成する工程と、 中間電極の上に第2の開口部を有し顔料を含む着色層を
光シールド電極の一部を含んで色毎(R,G,B)にス
トライプ状または島(ドット)状に形成する工程と、 電着によって着色層間の光シールド電極の上に染料また
は顔料の何れかもしくは両方を含む黒色着色層を形成す
る工程と、 第2の開口部を含んで着色層と黒色着色層の上に絵素電
極を形成する工程と、 第1の透明絶縁基板の上に薄い第2の透明絶縁層を形成
する工程とを有するカラー液晶パネルの製造方法。
5. The method of manufacturing a liquid crystal panel according to claim 2, wherein: forming a scanning line, a signal line, and an insulated gate transistor on the first transparent insulating substrate; Forming a thick first transparent insulating layer having a first opening on the first transparent insulating substrate on the first transparent insulating layer; and forming the first opening on the first transparent insulating layer. Forming a grid-shaped light shielding electrode on the intermediate electrode and at least on the scanning line and on the signal line; and forming a colored layer containing a pigment having a second opening on the intermediate electrode. A step of forming a stripe or an island (dot) for each color (R, G, B) including a part of the light shield electrode; and either a dye or a pigment on the light shield electrode between the colored layers by electrodeposition. Forming a black colored layer containing or both A color including a step of forming a picture element electrode on the colored layer and the black colored layer including the second opening, and a step of forming a thin second transparent insulating layer on the first transparent insulating substrate Liquid crystal panel manufacturing method.
【請求項6】請求項3に記載の液晶パネルの製造方法で
あって、 第1の透明絶縁基板の上に走査線,信号線,および絶縁
ゲート型トランジスタを形成する工程と、 絶縁ゲート型トランジスタのドレイン電極の上に第1の
開口部を有する厚い第1の透明絶縁層を第1の透明絶縁
基板の上に形成する工程と、 第1の透明絶縁層の上に第1の開口部を含んで中間電極
と少なくとも前記走査線の上と信号線の上とに格子状の
光シールド電極とを形成する工程と、 中間電極の上に第2の開口部を有し顔料を含む着色層を
光シールド電極の一部を含んで色毎(R,G,B)にス
トライプ状または島(ドット)状に形成する工程と、 電着によって着色層間の光シールド電極の上に染料また
は顔料の何れかもしくは両方を含む黒色着色層を形成す
る工程と、 第2の開口部の上に第3の開口部を有する薄い第2の透
明絶縁層を形成する工程と、 第3の開口部を含んで着色層と黒色着色層の上の第2の
透明絶縁層の上に絵素電極を形成する工程とを有するカ
ラー液晶パネルの製造方法。
6. A method for manufacturing a liquid crystal panel according to claim 3, wherein: forming a scanning line, a signal line, and an insulated gate transistor on the first transparent insulating substrate; Forming a thick first transparent insulating layer having a first opening on the first transparent insulating substrate on the first transparent insulating layer; and forming the first opening on the first transparent insulating layer. Forming a grid-shaped light shielding electrode on the intermediate electrode and at least on the scanning line and on the signal line; and forming a colored layer containing a pigment having a second opening on the intermediate electrode. A step of forming a stripe or an island (dot) for each color (R, G, B) including a part of the light shield electrode; and either a dye or a pigment on the light shield electrode between the colored layers by electrodeposition. Forming a black colored layer containing or both Forming a thin second transparent insulating layer having a third opening on the second opening; and forming a second transparent insulating layer on the colored layer and the black colored layer including the third opening. Forming a pixel electrode on the layer.
JP30478597A 1997-11-07 1997-11-07 Color liquid crystal panel and manufacturing method thereof Expired - Fee Related JP3107778B2 (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000298208A (en) * 1999-04-13 2000-10-24 Toppan Printing Co Ltd Color filter and production thereof, and el display and liquid crystal display using the same
JP2002148656A (en) * 2000-11-10 2002-05-22 Nec Corp Tft liquid crystal display device
US6731366B1 (en) 2000-08-02 2004-05-04 Allied Material Technology Corp. Liquid crystal display structures and methods of forming the same
CN100414356C (en) * 2004-08-13 2008-08-27 富士通株式会社 Substrate for liquid crystal display device and liquid crystal display device having the same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000298208A (en) * 1999-04-13 2000-10-24 Toppan Printing Co Ltd Color filter and production thereof, and el display and liquid crystal display using the same
US6731366B1 (en) 2000-08-02 2004-05-04 Allied Material Technology Corp. Liquid crystal display structures and methods of forming the same
US6917401B2 (en) 2000-08-02 2005-07-12 Allied Material Technology Corp. Liquid crystal display structures
JP2002148656A (en) * 2000-11-10 2002-05-22 Nec Corp Tft liquid crystal display device
CN100414356C (en) * 2004-08-13 2008-08-27 富士通株式会社 Substrate for liquid crystal display device and liquid crystal display device having the same

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