JPH1164882A - Reflection type liquid crystal panel and its production - Google Patents

Reflection type liquid crystal panel and its production

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Publication number
JPH1164882A
JPH1164882A JP21688897A JP21688897A JPH1164882A JP H1164882 A JPH1164882 A JP H1164882A JP 21688897 A JP21688897 A JP 21688897A JP 21688897 A JP21688897 A JP 21688897A JP H1164882 A JPH1164882 A JP H1164882A
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liquid crystal
substrate
insulating layer
crystal panel
transparent
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JP21688897A
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Kiyohiro Kawasaki
清弘 川崎
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Matsushita Electric Ind Co Ltd
松下電器産業株式会社
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Priority to JP21688897A priority Critical patent/JPH1164882A/en
Publication of JPH1164882A publication Critical patent/JPH1164882A/en
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Abstract

PROBLEM TO BE SOLVED: To obviate the generation of irregularly reflected light from scanning lines and signal lines and to improve the contrast of display images by embedding the circumferences of reflection electrodes with black insulating layers. SOLUTION: Elements, such as insulated gate type transistors TFTs, including the scanning lines, the signal lines 12 and simultaneously layers 28 are formed on one main surface of an insulating substrate 2 and the black insulating layers 30 are made to selectively remain and are formed to a grid shape. Next, a photosensitive transparent insulating layer 26 is applied on an active substrate 2 and the one main surface side of the active substrate 2 is polished by mechanical polishing using a polishing material and water, by which the active substrate surface is subjected to planarization. Apertures 27 are thereafter formed at the transparent planarized insulating layer 26 by photoetching using UV as a light source to expose part of the drain electrodes 23 of the TFTs 10 which are switching elements. A metal having high reflectivity, for example, aluminum, is deposited by using a vacuum film making device, such as sputtering, on the one main surface of the planarized active substrate 2 and the reflection electrodes 25 are formed by a fine processing technique. The circumference of the reflection electrodes 25 are thus embedded with the black insulating layers 30.

Description

【発明の詳細な説明】 DETAILED DESCRIPTION OF THE INVENTION

【0001】 [0001]

【発明の属する技術分野】本発明は、反射型の画像表示機能を有する液晶パネルおよびその製造方法に関するものである。 BACKGROUND OF THE INVENTION The present invention relates to a liquid crystal panel and a manufacturing method thereof having a reflective type image display function.

【0002】 [0002]

【従来の技術】近年の微細加工技術、液晶材料技術および実装技術などの進歩により、5〜50cm対角の液晶パネルで実用上支障の無いテレビジョン画像や各種の画像表示が商用ベースで実現している。 In recent years microfabrication techniques, Advances in liquid crystal material technology and mounting technology, image display of practical problem-free television picture and various are achieved commercial basis in the liquid crystal panel 5~50cm diagonal ing. また、液晶パネルを構成する2枚のガラス基板の一方にRGBの着色層を形成しておくことにより、カラー表示も容易に実現している。 Further, by forming an RGB coloring layer on one of two glass substrates constituting the liquid crystal panel, it is also easily realized color display. 特にスイッチング素子を絵素毎に内蔵させた、いわゆるアクティブ型の液晶パネルでは、クロストークも少なくかつ高速応答で高いコントラスト比を有する画像が保証されている。 Particularly was built switching element for each picture element, the so-called active liquid crystal panel, an image having a high contrast ratio even less and high-speed response crosstalk is guaranteed.

【0003】これらの液晶パネルは、走査線としては1 [0003] These liquid crystal panels, as the scanning lines 1
00〜1000本、信号線としては200〜2000本程度のマトリクス編成が一般的である。 00-1000 present, matrix organization of about this 200 to 2000 as the signal line are common. 図4は液晶パネルへの実装状態を示し、液晶パネル1を構成する一方の透明絶縁基板、例えばガラス基板2上に形成された走査線の電極端子群6に駆動信号を供給する半導体集積回路チップ3を直接に接続するCOG(Chip-On-Glass)方式や、例えばポリイミド系樹脂薄膜をベースとし、金メッキされた銅箔の端子(図示せず)を有する接続フィルム4を信号線の電極端子群5に適当な接着剤で圧接して固定するTCP方式などの実装手段によって、電気信号が画像表示部に供給される。 Figure 4 shows a mounting state of the liquid crystal panel, one transparent insulating substrate, a semiconductor integrated circuit chip for supplying a driving signal for example, the electrode terminals 6 of the scanning lines formed on the glass substrate 2 of the liquid crystal panel 1 3 directly or COG (Chip-on-Glass) method for connecting, for example, a polyimide resin film as a base, the electrode terminals of the connecting film 4 a signal line having a gold-plated copper terminals (not shown) implementation means such as TCP method of fixing by pressure contact by a suitable adhesive to 5, the electrical signal is supplied to the image display unit. ここでは便宜上二つの実装方式を同時に図示しているが、実際には何れかの方式が適宜選択されることは言うまでもない。 Although here is illustrated for convenience the two mounting method simultaneously, in practice it is selected either method appropriate course.

【0004】7,8は液晶パネル1の画像表示部と信号線および走査線の電極端子群5,6との間を接続する配線路で、必ずしも電極端子群5,6と同一の導電材で構成される必要はない。 [0004] 7,8 wiring path connecting between the image display unit and the signal line and the electrode terminals of the scanning lines 5 and 6 of the liquid crystal panel 1, necessarily to the conductive material and the electrode terminals 5 and 6 there is no need to be configured.

【0005】9は、全ての液晶セルに共通の透明導電性の対向電極を有するもう1枚の透明絶縁基板であるガラス基板で、液晶パネル1を構成する2枚のガラス基板2,9は樹脂性のファイバやビーズなどのスペーサ材によって数μm程度の所定の距離を隔てて形成され、その間隙(ギャップ)はガラス基板2,9の周縁部において、有機性樹脂よりなるシール材と封口材とで封止された閉空間になっており、この閉空間に液晶が充填されている。 [0005] 9, a glass substrate is another one transparent insulating substrate having a common transparent conductive counter electrode to all the liquid crystal cells, two glass substrates 2 and 9 constituting the liquid crystal panel 1 resin It is formed at a predetermined distance of about several μm by a spacer material, such as sexual fibers or beads, the gap (gap) at the periphery of the glass substrate 2 and 9, the sealant and the sealing member made of an organic resin in has become between sealed closed space, the liquid crystal is filled in the closed space.

【0006】カラー表示を実現する場合には、ガラス基板9の閉空間側に着色層と称する染料または顔料のいずれか一方もしくは両方を含む有機薄膜が被着されて色表示機能が与えられるので、その場合にはガラス基板9は別名カラーフィルタと呼称される。 [0006] When realizing a color display, since the organic thin film containing one or both of the dye or pigment called color layer closed space side of the glass substrate 9 is deposited color display function is provided, glass substrate 9 is referred to as alias color filter in that case. そして液晶材料の性質によってはガラス基板9の上面またはガラス基板2の下面のいずれかもしくは両面上に偏光板が貼付され、液晶パネル1は電気光学素子として機能する。 And depending on the nature of the liquid crystal material is attached is a polarizing plate on either or both sides of the lower surface of the upper surface or the glass substrate 2 of the glass substrate 9, the liquid crystal panel 1 functions as an electro-optical element.

【0007】図5はスイッチング素子として例えば薄膜の絶縁ゲート型トランジスタを絵素毎に配置したアクティブ型液晶パネルの等価回路である。 [0007] FIG. 5 is an equivalent circuit of an active-type liquid crystal panel disposed insulated gate transistor, for example a thin film as a switching element for each picture element. 実線で描かれた素子は一方のガラス基板であるアクティブ基板2上に形成され、破線で描かれた素子はもう一方のガラス基板9上に形成されている。 The elements depicted in a solid line is formed on the active substrate 2 is one of the glass substrates, the element depicted by broken lines are formed on the other glass substrate 9. 走査線11(8)と信号線12 Scan line 11 (8) and the signal line 12
(7)は、例えば非晶質シリコンを半導体層とし、シリコン窒化層をゲート絶縁層とするTFT(薄膜トランジスタ)10の形成と同時にアクティブ基板2(一方のガラス基板)上に作製される。 (7), for example an amorphous silicon as a semiconductor layer is fabricated on the TFT to the silicon nitride layer and the gate insulating layer (thin film transistor) 10 formed between the simultaneously active substrate 2 (one of the glass substrates). 液晶セル13はアクティブ基板2上に形成された透明導電性の絵素電極14と、カラーフィルタ9(もう一方のガラス基板)上に形成された同じく透明導電性の対向電極15と、2枚のガラス基板2,9で構成された閉空間を満たす液晶16とで構成され、電気的にはコンデンサと同じ扱いで良い。 A liquid crystal cell 13 is a transparent conductive pixel electrode 14 formed on the active substrate 2, a color filter 9 (the other glass substrate) opposing electrode 15 also of the transparent conductive formed on, the two is composed of a liquid crystal 16 that meets a closed space that is constituted by a glass substrate 2, 9, electrically be the same treatment as the capacitor. 液晶セル13の時定数を大きくするための蓄積容量の構成に関しては幾つかの構成の中から選択が可能で、例えば図5 With respect to configuration of the storage capacitor for increasing the time constant of the liquid crystal cell 13 can be selected from among several configurations, e.g., FIG. 5
では蓄積容量22は全ての絵素電極14に共通な共通電極17と絵素電極14とが、絶縁ゲート型トランジスタのゲート絶縁層などの絶縁層を介して構成されている。 In the storage capacitor 22 the common common electrode 17 All of the picture element electrode 14 and the pixel electrode 14 is configured with an insulating layer such as a gate insulating layer of the insulated gate transistor.

【0008】図6はカラー表示用パネルの要部断面図である。 [0008] FIG. 6 is a fragmentary cross-sectional view of a color display panel. 染色された感光性ゼラチンまたは着色性感光性樹脂などよりなる着色層18は先述したように、カラーフィルタ9の閉空間側で絵素電極14に対応してRGBの三原色で所定の配列にしたがって配置されている。 Colored layer 18 made of such dyed photosensitive gelatin or colored photosensitive resin, as previously described, arranged according to a predetermined arrangement in the three primary colors of RGB corresponding to the picture element electrode 14 in the closed space side of the color filter 9 It is. 全ての絵素電極14に共通の対向電極15は着色層18の介在による液晶セル内での電圧配分損失を回避するためには図示したように着色層18上に形成される。 All common counter electrode 15 to the pixel electrode 14 is formed on the colored layer 18 as shown in order to avoid voltage distribution losses in the liquid crystal cells by intervention of the colored layer 18. 液晶16 The liquid crystal 16
に接して2枚のガラス基板2,9上に被着された、例えば0.1μm程度の膜厚のポリイミド系樹脂薄膜層19 To the deposited on two glass substrates 2 and 9 in contact with, for example, 0.1μm about the thickness of a polyimide resin thin film layer 19
は液晶分子を決められた方向に揃えるための配向膜である。 Is the alignment layer to align the direction of a predetermined liquid crystal molecules. 加えて液晶16にツイスト・ネマチック(TN)型のものを用いる場合には上下に2枚の偏光板20を必要とする。 In addition to requiring two polarizing plates 20 vertically in the case to use a twisted nematic (TN) type liquid crystal 16.

【0009】RGBの着色層18の境界に低反射性の不透明膜21を配置すると、アクティブ基板2上の信号線12などの配線層からの反射光を防止できて画像のコントラスト比が向上し、またスイッチング素子であるTF [0009] Placing the RGB colored layers 18 low reflective opaque layer 21 to the boundary of, and improve the contrast ratio of the image is possible to prevent the light reflected from the wiring layer such as the signal line 12 on the active substrate 2, TF also is a switching element
T10の外部光照射によるOFF動作時のリーク電流の増大が防げて強い外光の下でも液晶パネルを動作させることが可能となり、既にブラックマトリクス(BM)として実用化されている。 T10 also becomes possible to operate the liquid crystal panel under the OFF Operation increase prevented by strong external light leak current due to external beam irradiation, it has already been put to practical use as a black matrix (BM). BM材の構成も多数考えられるが、隣り合った着色層の境界における段差の発生と光の透過率を考慮するとコスト的には不利であるが、0.1 Configuration of BM material is also conceivable number, but it is the basis to consider the generation and transmission of light in the step at the boundary of the adjacent color layer and the cost is disadvantageous, 0.1
μm程度の膜厚のCr薄膜が合理的である。 Cr thin film having a thickness of about μm is reasonable.

【0010】なお、図6において理解を簡単にするため、TFT10,走査線11および蓄積容量22に加えて裏面光源やスペーサなどの構成要素も省略している。 [0010] In order to simplify the understanding in FIG. 6, TFT 10, components such as the rear surface light source or a spacer in addition to the scanning lines 11 and the storage capacitor 22 is also omitted.
23は絵素電極14とTFT10のドレインとを接続するための導電性薄膜で、一般的には信号線12と同一の部材で同時に形成されドレイン配線と称される。 23 is referred to as the pixel electrode 14 with a conductive film for connecting the drain of the TFT 10, and generally are formed simultaneously by the same member and the signal line 12 drain wiring. ここでは図示しなかったが、対向電極15は画像表示部より僅かに外よりの外周部で適当な導電性ペーストを介してT Here Although not illustrated, the counter electrode 15 via a suitable conductive paste on the outer peripheral portion of the slightly more outside than the image display unit T
FT10を有するアクティブ基板2上の適当な導電性パターンに接続され、電極端子群5,6の一部に組み込まれて電気的接続が与えられている。 Is connected to a suitable electrically conductive pattern on the active substrate 2 having FT10, incorporated into a part of the electrode terminals 5 and 6 electrically connected are given.

【0011】上記した透過型の液晶パネルでは、当然であるが裏面からの光源が必要であるが、携帯型のパソコンや情報端末機器では電池の長寿命化への対応が困難なこともあいまって、反射型カラー液晶パネルを望む気運が急激に高まってきた。 [0011] In the liquid crystal panel of the transmission type as described above, it is necessary to light from Naturally backside, together can be difficult to respond to long battery life in portable personal computers and information terminals , the momentum overlooking the reflection type color liquid crystal panel has been growing rapidly.

【0012】図7は最近発表された反射型カラー液晶パネルの要部断面図を示す。 [0012] Figure 7 shows a fragmentary cross-sectional view of the recently published reflective type color liquid crystal panel. このパネルは、1枚の偏光板を用いることで輝度の向上を図ったもので、液晶材にはTN系のものが使用可能であり、反射型液晶パネルの場合には使用する液晶の性質によって反射電極の表面は鏡面か拡散面が必要であるが、ここでは鏡面が選ばれている。 This panel, which was improved in luminance by using one polarizing plate, the liquid crystal material may be used those TN system, the nature of the liquid crystal used in the case of a reflective liquid crystal panel the surface of the reflecting electrode may be a required mirror surface or diffusing surface, wherein the mirror is chosen.

【0013】図7において、図6の透過型との差異は、 [0013] In FIG 7, the difference between the transmission of Figure 6,
偏光板20が1枚で良いこと、散乱板24が必要なこと、アクティブ基板2上の絵素電極が透明電極ではなく、光を反射する主として金属薄膜よりなる反射電極2 Polarizer 20 may be one, scattering plate 24 is required, rather than the pixel electrode is a transparent electrode on the active substrate 2, a reflective electrode mainly composed of a metal thin film for reflecting light 2
5であることの3点である。 Is the three points it 5 is. その他構成および材料は同一である。 Other configurations and materials are the same. 位相差板40は特に無彩色表示時に色付きを防止し色純度を高める目的で導入されるので、図6では記載されていないが透過型の液晶パネルにおいても最近は導入が積極的に進められている。 Since the retardation plate 40 are introduced in particular the purpose of increasing the preventing color purity colored when achromatic display, even recently introduced in the liquid crystal panel is a transmission type is not described in FIG. 6 is being aggressively there.

【0014】スイッチング素子であるTFT10の外部光照射によるOFF動作時のリーク電流の増大を防ぐのは反射型の場合は比較的簡単で、反射電極25をTFT [0014] prevent increase in leakage current during OFF operation by external beam irradiation TFT10 is a switching element is relatively simple in the case of reflection type, TFT reflective electrode 25
10上に配置すればよく、そのために必要な絶縁層が平坦化絶縁層26である。 May be placed on 10, the insulating layer required for this is a planarizing insulating layer 26. この絶縁層は下地のアクティブ基板2上に存在する走査線11、信号線12およびTF Scanning lines 11 the insulating layer is present on the active substrate 2 of the base, the signal lines 12 and TF
T10などの素子が構成する段差を吸収するために少なくとも1μm以上、好ましくは2〜3μmの膜厚が必要であり、このような厚い膜形成を真空製膜装置を用いて形成するのは、その生産性や膜応力などの観点から現実的ではなく、塗布形成が可能な有機樹脂が用いられる。 At least 1μm or more for element such as T10 absorbs a step forming, preferably requires a film thickness of 2 to 3 [mu] m, to form such a thick film formed by a vacuum film forming apparatus, the impractical from the viewpoint of productivity and film stress, the organic resin is employed which can be applied and formed.
具体的には、日本合成ゴム製の商品名オプトマーPC3 Specifically, trade name of Japan Synthetic Rubber OPTMER PC3
02がその一例として挙げられる。 02 is mentioned as an example. オプトマーPC30 OPTMER PC30
2は透明度の高い樹脂で、通常の感光性樹脂の2倍程度の露光エネルギーが必要であるが感光性であり、ドレイン電極23との接続とのために必要な透明性絶縁層への開口部27の形成も容易に行え、しかも製造工程の短縮も同時に実現する利点がある。 2 is a highly transparent resin is a normal it is necessary exposure energy of about 2-fold photosensitive photosensitive resin, the opening of the transparent insulating layer required for the connection between the drain electrode 23 27 formed also easy to, yet also shorten the manufacturing process has the advantage of simultaneously realized.

【0015】しかしながら、透明性が高いために、図8 [0015] However, due to the high transparency, and FIG. 8
に示したように反射電極25の隙間に存在する走査線1 Present in the gap of the reflective electrode 25, as shown in the scanning line 1
1や信号線12からの乱反射を抑制することができない。 It can not be suppressed irregular reflection from 1 and the signal line 12. このため、従来と同様にカラーフィルタ9側にブラックマトリクス(BM)21が必要となる。 Accordingly, a black matrix (BM) 21 in conventional manner to a color filter 9 side is required.

【0016】なお、図8は反射電極25をアクティブ基板2の最上層に形成した反射型カラー液晶パネルのアクティブ基板2の平面配置図で、28はTFTのチャネルを構成する半導体層を模式的に表現したものであり、図8のA−A′線上の断面図が図7の要部断面図に対応している。 [0016] FIG. 8 is a plan layout view of an active substrate 2 of the reflective type color liquid crystal panel forming the reflective electrode 25 on the uppermost layer of the active substrate 2, 28 is schematically a semiconductor layer constituting a channel of a TFT and a representation, sectional view of the a-a 'line of FIG. 8 corresponds to the sectional view of a main portion in FIG 7.

【0017】厚い平坦化絶縁層26に透明性の低い、例えば黒色顔料を含んだ感光性のものを用いようとしても、後述するように開口部27の形成が困難であり、平坦化絶縁層には透明度の高い樹脂が選ばれる。 The low transparency thick planarizing insulating layer 26, for example, including a black pigment even attempts to use those of photosensitivity, it is difficult to form the opening 27 as described later, the planarization insulating layer is highly transparent resin selected is.

【0018】 [0018]

【発明が解決しようとする課題】液晶パネルの画面の高精細化は時代の趨勢で、携帯型の対角15cm(6型) [0007] The high resolution of the screen of the liquid crystal panel is in the trend of the times, a portable diagonal 15cm (6-inch)
程度のものにおいても、VGA対応の水平方向640 Even to the extent of those, VGA compatible horizontal 640
本、垂直方向480本の解像度が必要とされている。 This, in the vertical direction 480 lines of resolution are needed. このような高精細になると画素内の表示に寄与しない走査線、信号線、TFTなどの素子の単位絵素内に占める割合が高くなり、結局は開口率が低下して暗い画像しか得られなくなる。 Such becomes a high-definition If not contribute to display in the pixel scanning lines, signal lines, the higher the percentage of the unit pixel of the element such as TFT, eventually opening ratio can not be obtained only a dark image decreases .

【0019】平坦化樹脂の導入により反射電極を平坦化樹脂の上に形成することで開口率の低下は回避できるものの、ブラックマトリクスが必要と言うことになると、 [0019] Although the decrease in aperture ratio by forming on the planarizing resin reflective electrode by the introduction of flattening resin can be avoided, when it comes to say a black matrix required,
ブラックマトリクスによる開口率の低下と、カラーフィルタとアクティブ基板との貼り合せ精度による開口率の低下とが俄かに顕在化してくる。 And decrease in aperture ratio due to the black matrix, and reduction in the aperture ratio comes manifested in sudden or by bonding accuracy between the color filter and the active substrate. 具体的には、貼り合せ精度が従来は数μmで十分であったが、反射型で開口率を90%以上に高めるためには2μm以下の高精度を要求されるようになってきた。 Specifically, alignment accuracy paste is conventionally was sufficient several [mu] m, in order to increase the aperture ratio of 90% or more reflective type has come to be required the following precision 2 [mu] m.

【0020】液晶パネルの貼り合せ精度は、アクティブ基板とカラーフィルタの加工精度および貼り合せ工程における二つの基板の貼り合せ精度の総和であり、当然のことではあるが液晶パネルが大きい程、ガラス基板が大きい程、ガラス基板の反りやウネリも加算されて精度は低下する。 The bonding accuracy of the liquid crystal panel is the sum of the two bonding accuracy of the substrate in the active board and the machining accuracy and bonding step of the color filter, as of course, be dependent on a large liquid crystal panel, a glass substrate the greater, the glass substrate warpage and undulation be summed accuracy decreases.

【0021】貼り合せに当たり、2枚のガラス基板を機械的に精度1〜2μmに合せることは、大型基板の高精度露光機の機構や実力から考えてもさほど困難なことではないが、2枚のガラス基板を接着剤で貼り合わすシールの硬化工程で、上記したガラス基板の反りもあいまって実用上確保できる精度は数μmに低下してしまうのが現状である。 [0021] Paste hit in together, it is to align the two glass substrates of the mechanical precision 1~2μm, but not so much difficult thing be considered from the mechanism and the ability of the large substrate high-precision exposure machine, two the glass substrate with the curing process of bonding match sealed with adhesive, the above accuracy warping of the glass substrate can be secured even combined practice has is at present, decreases in several [mu] m.

【0022】その主な理由は、シールの硬化に関して温度の均一性に関わる問題である。 [0022] The main reason is a problem in uniformity of the temperature with respect to the curing of the seal. ガラス基板の膨張係数は1℃あたり数ppmもあるので、例えば10℃の温度差が30cmの大きさの2枚のガラス基板間にあると1 Since expansion coefficient of the glass substrate is also the number per 1 ° C. ppm, for example a temperature difference of 10 ° C. is between two glass substrates of the size of 30cm when 1
0〜20μmの伸縮差が生じてしまうことになる。 So that the expansion difference of 0~20μm occurs. このため、シール硬化工程における加熱・冷却は徐熱・徐冷が必須であるが、余りに時間をかけて生産性を低下させるわけにもいかず、高精度の貼り合せには色々と課題が多い。 Therefore, the heating and cooling of the sealing curing process is slow heating-gradual cooling is required, Ikazu also not decrease the productivity over too long, the variously there are many problems in the bonding precision.

【0023】シール樹脂の硬化に当たり室温程度の低温化を可能にする紫外線硬化型のものも検討されているが、一般的に硬化温度が低くなると、気密性と密着性の低下は免れない。 [0023] Although also studied as ultraviolet curable to enable low temperature of about room temperature Upon curing of the sealing resin, Generally curing temperature is lowered, inevitably a decrease in adhesion to the airtightness. またシール樹脂中の残留溶剤が液晶に溶け込んで、液晶セルの保持率が低下し、高温および長期動作時に液晶パネルの表示特性が劣化することも避けられない。 The merges residual solvent in the sealing resin to the liquid crystal, lowered retention of the liquid crystal cell is not also inevitable that the display characteristics of the liquid crystal panel is deteriorated at high temperatures and long-term operation.

【0024】本発明は、表示画像のコントラスト比が向上し、また、カラーフィルタの貼り合せ精度が緩和される構造の反射型液晶パネルを提供することを目的とする。 The invention improves the contrast ratio of the display image, also aims to provide a reflective liquid crystal panel structure bonding accuracy of the color filter is reduced.

【0025】 [0025]

【課題を解決するための手段】本発明は、かかる現状に鑑みなされたもので、絶縁性基板上に形成された格子状の黒色絶縁層と前記黒色絶縁層の間を埋める透明絶縁層とを平坦化するとともに、前記黒色絶縁層の一部を含んで透明絶縁層上に反射電極を形成し、前記透明絶縁層に形成された開口部を通して前記反射電極をスイッチング素子に接続したものである。 Means for Solving the Problems The present invention has been made in view of such circumstances, and a transparent insulating layer filling between the black insulating layer and lattice-shaped black insulating layer formed on an insulating substrate with flattening, the include some of the black insulating layer reflective electrode formed on the transparent insulating layer, the reflective electrode through an opening formed in the transparent insulating layer which are connected to the switching element.

【0026】 [0026]

【発明の実施の形態】本発明の請求項1に記載の発明は、絶縁性基板の一主面上に複数本の走査線を有し、少なくとも一層以上の絶縁層を介して前記走査線と概ね直交する複数の信号線を有し、前記走査線と前記信号線との交点毎に少なくとも一つのスイッチング素子と反射電極とを有するアクティブ基板と、一主面上に少なくとも透明導電性の対向電極を有して前記アクティブ基板に対向するカラーフィルタとの間に充填された液晶とを備えた液晶パネルであって、前記絶縁性基板上に形成された格子状の黒色絶縁層と前記黒色絶縁層の間を埋める透明絶縁層とが平坦化されて形成されるとともに、前記黒色絶縁層の一部を含んで透明絶縁層上には反射電極が形成され、前記透明絶縁層に形成された開口部を通して前記反射電極がスイッチ DETAILED DESCRIPTION OF THE INVENTION According to a first aspect of the present invention has a plurality of scanning lines on one principal surface of the insulating substrate, and the scanning lines via at least one layer of the insulating layers generally it has a plurality of signal lines perpendicular to an active substrate having a at least one switching element reflective electrode in each intersection between the signal line and the scanning line, at least a transparent conductive counter electrode on one principal surface a liquid crystal panel having a liquid crystal filled between the color filter facing the active substrate a, the black insulating layer and the lattice black insulating layer formed on an insulating substrate with a transparent insulating layer is formed is planarized to fill between the black insulating layer transparent insulating layer include some of the reflective electrodes are formed, the opening formed in the transparent insulating layer the reflective electrode is switched through グ素子に接続されていることを特徴とするものである。 And it is characterized in that it is connected to the grayed element.

【0027】この構成によれば、反射電極の周囲を黒色絶縁層で埋められており、アクティブ基板上の走査線や信号線に外光が届いて余分な反射光を生じない。 According to this configuration, the periphery of the reflective electrodes are filled with black insulating layer, no extra reflected light received external light to the scanning lines and signal lines on the active substrate. このため、ブラックマトリクスは不要となる。 For this reason, the black matrix is ​​not required.

【0028】本発明の請求項2に記載の発明は、絶縁性基板の一主面上に複数本の走査線を有し、少なくとも一層以上の絶縁層を介して前記走査線と概ね直交する複数の信号線を有し、前記走査線と前記信号線との交点毎に少なくとも一つのスイッチング素子と反射電極とを有するアクティブ基板と、一主面上に少なくとも透明導電性の対向電極を有して前記アクティブ基板に対向するカラーフィルタとの間に充填された液晶とを備えた液晶パネルの製造方法であって、前記絶縁性基板上に走査線、信号線、スイッチング素子を形成した後、前記絶縁性基板上に感光性黒色樹脂を格子状に形成する工程と、さらにその上に感光性透明樹脂を塗布する工程と、研磨によって前記絶縁性基板上を平坦化する工程と、写真食刻により前記感光性透明 The invention described in claim 2 of the present invention has a plurality of scanning lines on one principal surface of the insulating substrate, a plurality of substantially orthogonal to the scanning lines via at least one layer of the insulating layers having a signal line, and an active substrate having a at least one switching element reflective electrode in each intersection between the signal line and the scanning line, having at least a transparent conductive counter electrode on one principal surface a manufacturing method of a liquid crystal panel and a liquid crystal filled between the color filter facing the active substrate, scanning lines on the insulating substrate, the signal line, after the formation of the switching element, the insulation forming a photosensitive black resin on gender substrate in a grid pattern, further comprising the steps of applying a photosensitive transparent resin thereon, a step of planarizing the insulating upper substrate by polishing, the by photolithography photosensitive transparent 脂層に開口部を形成して前記スイッチング素子の一部を露出する工程と、前記感光性黒色樹脂の一部を含んで前記感光性透明上に反射電極を形成する工程とからなるものである。 It is made of a step of exposing a portion of the switching element to form an opening in the fat layer, and forming a reflective electrode on the photosensitive transparent comprise a portion of the photosensitive black resin .

【0029】この製造方法によれば、反射電極の下地は研磨で平坦化されているので反射電極の表面を鏡面に形成することが容易となる。 According to this manufacturing method, the base of the reflective electrode becomes easy to form the surface of the reflective electrode because it is flattened by polishing to a mirror. (実施の形態1)本発明の一実施の形態を図1に基づいて説明する。 An embodiment of the present invention (Embodiment 1) will be described with reference to FIG. すなわち、この液晶パネルは、反射電極の周囲を黒色の絶縁層で形成させたものであり、図1はアクティブ基板上のパターン配置図を示し、同図のA− That is, the liquid crystal panel, the periphery of the reflective electrodes are those which has an insulating layer of black, Figure 1 shows a pattern layout on the active substrate, in FIG A-
A′線上のアクティブ基板の製造工程断面図を図2に示し、本発明によって得られる反射型カラー液晶パネルの要部断面図を図3に示す。 The manufacturing process sectional view of the active substrate A 'line shown in FIG. 2, a cross sectional view of a reflective type color liquid crystal panel obtained by the present invention shown in FIG. 以下の説明に当たり、従来と同一の機能を有する部位については同じ符号を付すことにする。 Per the following description, the portion having the conventional same function will be denoted by the same reference numerals.

【0030】まず、図2(a)に示したように、絶縁基板2の一主面上に走査線11,信号線12,半導体層2 First, as shown in FIG. 2 (a), one main scanning line on 11 of the insulating substrate 2, the signal line 12, the semiconductor layer 2
8を含む絶縁ゲート型トランジスタTFT10などの素子を形成し、黒色絶縁層30を選択的に残して格子状に形成する。 Elements such as insulated gate transistors TFT10 containing 8 to form, the black insulating layer 30 selectively left to form a grid. このためには黒色顔料を含む感光性樹脂、例えば東京応化製の商品名CFPR,BK505を用いて写真食刻技術で簡便に形成することを勧める。 Photosensitive resin for this purpose, including a black pigment, recommended to conveniently formed by photoetching techniques using, for example, a trade name CFPR, BK505 Tokyo Ohka. 黒色絶縁層30の厚みとしては、例えば2.5μm程度に選ばれる。 The thickness of the black insulating layer 30 is selected to, for example, about 2.5 [mu] m. 感光性黒色絶縁層は透明度が低く、写真食刻時にマスク合せが光学的な方法では容易ではなく、例えばアライメントマークを基板の上方からでなく下方から合わせるなどの工夫が必要となるが、反射電極がTFTを光遮蔽する機能を失わない程度、すなわち単位絵素の半分程度の数10μmと、格子状の黒色絶縁層30の合わせ精度はそんなに高くないので光学的マスク合わせ以外にも合わせ方法は考えられよう。 Photosensitive black insulating layer has low transparency, mask alignment at the time of photoetching is not easy in the optical method, for example, an alignment mark becomes necessary to devise such fit from below rather than from above the substrate, the reflective electrode I thought extent, i.e. the number 10μm of about half of the unit pixel, the alignment accuracy of the lattice-like black insulating layer 30 is not so high fit in addition to the optical mask alignment method but does not lose its ability to light shield the TFT Rareyo it.

【0031】次に、図2(b)に示したように感光性の透明な絶縁層26として例えば、日本合成ゴム製の商品名オプトマPC302をアクティブ基板2上に、例えば3μm程度の膜厚で塗布し、プリベークを行い溶剤を蒸発させる。 Next, as a photosensitive transparent insulating layer 26 as shown in FIG. 2 (b) for example, the trade name Optoma PC302 manufactured by Japan Synthetic Rubber on the active substrate 2, for example, about 3μm film thickness coated, the solvent is evaporated prebaked.

【0032】そして、研磨材と水による機械的な研磨でアクティブ基板2の一主面側を研磨し、例えば2μm程度の高さで平坦化する。 [0032] Then, by polishing the one principal surface of the active substrate 2 by a mechanical polishing using abrasive material and water, planarized, for example, 2μm about height. その結果、格子状の黒色絶縁層30の周囲が透明な絶縁層26で埋められて表面が平坦になる。 As a result, the periphery of the grid-like black insulating layer 30 is buried in the surface becomes flat with a transparent insulating layer 26. この後、紫外線を光源とする写真食刻により透明な平坦化絶縁層26に開口部27を形成し、スイッチング素子であるTFT10のドレイン電極23の一部を露出した状態が図2(c)に示されている。 Thereafter, ultraviolet rays an opening 27 is formed on a transparent planarization insulating layer 26 by photolithography as a light source, state of exposing a portion was of TFT10 the drain electrode 23 as a switching element in FIG. 2 (c) It is shown.

【0033】アクティブ基板形成の最終工程は図2 The final step of the active substrate forming the figure 2
(d)に示したように、平坦化されたアクティブ基板2 As shown (d), the active substrate 2 is flattened
の一主面上にスパッタなどの真空製膜装置を用いて0. Using a vacuum film forming apparatus such as a sputtering on one principal surface of the 0.
2μm程度の膜厚の反射率の高い金属、例えばアルミニウムを被着し、微細加工技術により反射電極25を形成することである。 2μm about thickness metal having high reflectance, such as aluminum is deposited, it is to form a reflective electrode 25 by microfabrication techniques. 反射電極25はTFT10を光遮蔽するような位置におかれ、黒色絶縁層30の一部を含んで形成されることは言うまでもない。 Reflective electrode 25 is placed in a position such that the light shielding TFT 10, it is needless to say that is formed including a part of the black insulating layer 30.

【0034】図3は以上述べた製造工程を経て得られたアクティブ基板2とカラーフィルタ9とを所定の工程を経て貼り合せ、パネル化したものの要部断面図を示す。 [0034] FIG. 3 is bonded through the above-described manufacturing process through a predetermined process and active substrate 2 and the color filter 9 obtained shows a cross sectional view though the panelized.
図7に示した従来の反射型カラー液晶パネルと比べると、反射電極25の周囲が黒色絶縁層30で埋められていることが理解されよう。 Compared to conventional reflection type color liquid crystal panel shown in FIG. 7, it will be appreciated that the periphery of the reflective electrode 25 is filled with black insulating layer 30. そして、カラーフィルタ9にはブラックマトリクス21が形成されていない。 Then, no black matrix 21 is formed on the color filter 9.

【0035】さらに本発明の液晶パネルの製造方法によれば、反射電極が形成されるアクティブ基板の一主面上の平坦度が極めて高く、したがって反射率の高い反射電極を形成することが容易となり明るい画像が得られるだけでなく、配向膜の配向処理時に非配向や逆ドメイン等が発生する恐れは極度に抑制され、コントラスト比の向上への貢献度は高い。 [0035] Furthermore, according to the manufacturing method of the liquid crystal panel of the present invention, the flatness on the main surface of the active substrate reflection electrodes are formed is very high, thus it is easy to form a high reflectance reflective electrode not only a bright image can be obtained, a possibility that non-alignment or reverse domain such as the alignment treatment of the alignment layer is generated is extremely suppressed, contribution to improvement of the contrast ratio is high.

【0036】なお、上記の各実施の形態おいて、本発明の要旨は反射電極の下地が平坦化されていることと、反射電極の周囲が黒色絶縁層で埋められていることであり、スイッチング素子としては絶縁ゲート型トランジスタに限られず、またスイッチング素子を構成する材料による差異も何ら影響を受けないことは言うまでもない。 It should be noted, keep the respective embodiments described above, the gist of the present invention and that the base of the reflective electrode is flattened is that the periphery of the reflective electrode are filled with black insulating layer, the switching the element is not limited to the insulated gate transistor, also it goes without saying that even differences by the material constituting the switching element is not affected at all.
これは蓄積容量やパシベーション等の材料や構成に関しても全く同様である。 This is exactly the same applies to the material or structure, such as the storage capacity and passivation.

【0037】 [0037]

【発明の効果】以上のように本発明の液晶パネルによれば、反射電極の周囲が黒色絶縁層で埋められているため、走査線や信号線からの乱反射光が発生せず表示画像のコントラスト比が向上する。 According to the liquid crystal panel of the present invention as described above, according to the present invention, since the periphery of the reflective electrode are filled with black insulating layer, the contrast of the display image irregularly reflected light from the scanning lines and signal lines is not generated the ratio can be improved. またカラーフィルタにブラックマトリクスが不要となってブラックマトリクスからの反射光も無く、さらにコントラスト比が向上するだけでなく、ブラックマトリクスが不要なことからカラーフィルタの貼り合せ精度が緩和されるという著しい効果が得られる。 Also without reflected light from the black matrix black matrix in the color filter becomes unnecessary, further not only the contrast ratio is improved, significant effect that bonding precision of the color filter from the black matrix to be unnecessary is alleviated It is obtained. これは従来のカラーフィルタでは、ブラックマトリクスがカラーフィルタの精度と開口率を支配していたのに対して、本発明ではブラックマトリクスがアクティブ基板上に高精度で作製されるためである。 This is the conventional color filter, whereas the black matrix ruled the accuracy and the aperture ratio of the color filters, the present invention is because the black matrix is ​​made with high precision on the active substrate.

【0038】さらに本発明の液晶パネルの製造方法によれば、反射電極が形成されるアクティブ基板の一主面上の平坦度が極めて高く、したがって、反射率の高い反射電極を形成することが容易となり明るい画像が得られるだけでなく、配向膜の配向処理時に非配向や逆ドメイン等が発生する恐れは極度に抑制され、コントラスト比の向上への貢献度は高い。 [0038] Furthermore, according to the manufacturing method of the liquid crystal panel of the present invention, the flatness on the main surface of the active substrate reflection electrodes are formed is very high, therefore, easy to form a high reflectance reflective electrode next well bright image is obtained, a possibility that non-alignment or reverse domain such as the alignment treatment of the alignment layer is generated is extremely suppressed, contribution to improvement of the contrast ratio is high.

【図面の簡単な説明】 BRIEF DESCRIPTION OF THE DRAWINGS

【図1】本発明の一実施の形態のアクティブ基板のパターン配置図 Pattern layout view of an active substrate of an embodiment of the present invention; FIG

【図2】本発明の一実施の形態のアクティブ基板の製造工程断面図 Manufacturing step sectional view of the active board according to an embodiment of the present invention; FIG

【図3】本発明の一実施の形態による反射型カラー液晶パネルの要部断面図 Cross sectional view of a reflective type color liquid crystal panel according to an embodiment of the present invention; FIG

【図4】液晶パネルの実装状態を示す斜視図 Figure 4 is a perspective view showing a mounting state of the liquid crystal panel

【図5】アクティブ型液晶パネルの等価回路図 Figure 5 is an equivalent circuit diagram of an active-type liquid crystal panel

【図6】アクティブ型液晶パネルの要部断面図 [6] cross sectional view of an active type liquid crystal panel

【図7】従来の反射型カラー液晶パネルの要部断面図 7 cross sectional view of a conventional reflection type color liquid crystal panel

【図8】従来のアクティブ基板のパターン配置図 [8] pattern arrangement diagram of a conventional active substrate

【符号の説明】 DESCRIPTION OF SYMBOLS

2 アクティブ基板 9 カラーフィルタ(対向基板) 11 走査線 12 信号線 14 絵素電極(透明電極) 15 対向電極 16 液晶 20 偏光板 21 ブラックマトリクス 23 ドレイン配線 24 散乱板 25 絵素電極(反射電極) 26 平坦化絶縁層 27 開口部 28 TFTのチャネルを構成する半導体層 30 黒色絶縁層 40 位相差板 2 active substrate 9 color filter (opposite substrate) 11 scan line 12 signal line 14 pixel electrode (transparent electrode) 15 counter electrode 16 liquid crystal 20 polarizer 21 black matrix 23 drain wiring 24 scattering plate 25 the pixel electrode (reflective electrode) 26 the semiconductor layer 30 black insulating layer 40 retardation plate constituting the channel of the planarization insulating layer 27 openings 28 TFT

Claims (2)

    【特許請求の範囲】 [The claims]
  1. 【請求項1】 絶縁性基板の一主面上に複数本の走査線を有し、少なくとも一層以上の絶縁層を介して前記走査線と概ね直交する複数の信号線を有し、前記走査線と前記信号線との交点毎に少なくとも一つのスイッチング素子と反射電極とを有するアクティブ基板と、一主面上に少なくとも透明導電性の対向電極を有して前記アクティブ基板に対向するカラーフィルタとの間に充填された液晶とを備えた液晶パネルであって、 前記絶縁性基板上に形成された格子状の黒色絶縁層と前記黒色絶縁層の間を埋める透明絶縁層とが平坦化されて形成されるとともに、 前記黒色絶縁層の一部を含んで透明絶縁層上には反射電極が形成され、 前記透明絶縁層に形成された開口部を通して前記反射電極がスイッチング素子に接続されていることを特徴とす [Claim 1 further comprising a plurality of scanning lines on one principal surface of the insulating substrate, a plurality of signal lines substantially orthogonal to the scanning lines via at least one layer of the insulating layer, the scan lines and the active substrate having a at least one switching element reflective electrode in each intersection between the signal lines, the color filter which faces the active substrate having at least a transparent conductive counter electrode on one principal surface a liquid crystal panel having a liquid crystal filled between the formation and the insulating transparent insulating layer substrate is formed in a lattice-like black insulating layer filling between the black insulating layer is planarized while being, that said black insulating layer transparent insulating layer include some of the reflective electrode is formed, the reflective electrode through an opening formed in the transparent insulating layer is connected to the switching element It is a feature る反射型液晶パネル。 That the reflective liquid crystal panel.
  2. 【請求項2】 絶縁性基板の一主面上に複数本の走査線を有し、少なくとも一層以上の絶縁層を介して前記走査線と概ね直交する複数の信号線を有し、前記走査線と前記信号線との交点毎に少なくとも一つのスイッチング素子と反射電極とを有するアクティブ基板と、一主面上に少なくとも透明導電性の対向電極を有して前記アクティブ基板に対向するカラーフィルタとの間に充填された液晶とを備えた液晶パネルの製造方法であって、 前記絶縁性基板上に走査線、信号線、スイッチング素子を形成した後、前記絶縁性基板上に感光性黒色樹脂を格子状に形成する工程と、 さらにその上に感光性透明樹脂を塗布する工程と、 研磨によって前記絶縁性基板上を平坦化する工程と、 写真食刻により前記感光性透明樹脂層に開口部を形成して前記 Wherein a plurality of scanning lines on one principal surface of the insulating substrate, a plurality of signal lines substantially orthogonal to the scanning lines via at least one layer of the insulating layer, the scan lines and the active substrate having a at least one switching element reflective electrode in each intersection between the signal lines, the color filter which faces the active substrate having at least a transparent conductive counter electrode on one principal surface a method of manufacturing a liquid crystal panel and a liquid crystal filled between the insulating substrate on the scanning lines, signal lines, after forming the switching element, a photosensitive black resin on the insulating substrate grating forming and forming the Jo, further comprising the steps of applying a photosensitive transparent resin thereon, a step of planarizing the insulating upper substrate by polishing, an opening in the photosensitive transparent resin layer by photolithography to the イッチング素子の一部を露出する工程と、 前記感光性黒色樹脂の一部を含んで前記感光性透明上に反射電極を形成する工程とからなる反射型液晶パネルの製造方法。 A step of exposing a portion of the switching element, the method of manufacturing the reflection type liquid crystal panel and a step of forming a reflective electrode on the photosensitive transparent comprise a portion of the photosensitive black resin.
JP21688897A 1997-08-12 1997-08-12 Reflection type liquid crystal panel and its production Pending JPH1164882A (en)

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JP2002107743A (en) * 2000-09-25 2002-04-10 Koninkl Philips Electronics Nv Reflection type liquid crystal display device
JP2006259244A (en) * 2005-03-17 2006-09-28 Seiko Epson Corp Liquid crystal display device, manufacturing method for liquid crystal display device, and electronic equipment
KR100632935B1 (en) 1999-04-16 2006-10-11 삼성전자주식회사 Method of forming black matrix pattern for LCD pannel
JP2010156971A (en) * 2008-12-26 2010-07-15 Lg Display Co Ltd Array substrate for electrophoresis type display device and method of manufacturing the same, method of repairing line of the same
US8094362B2 (en) 2004-03-06 2012-01-10 Qualcomm Mems Technologies, Inc. Method and system for color optimization in a display
US8848294B2 (en) 2010-05-20 2014-09-30 Qualcomm Mems Technologies, Inc. Method and structure capable of changing color saturation
US8872085B2 (en) 2006-10-06 2014-10-28 Qualcomm Mems Technologies, Inc. Display device having front illuminator with turning features
US9019183B2 (en) 2006-10-06 2015-04-28 Qualcomm Mems Technologies, Inc. Optical loss structure integrated in an illumination apparatus
US9019590B2 (en) 2004-02-03 2015-04-28 Qualcomm Mems Technologies, Inc. Spatial light modulator with integrated optical compensation structure
US9025235B2 (en) 2002-12-25 2015-05-05 Qualcomm Mems Technologies, Inc. Optical interference type of color display having optical diffusion layer between substrate and electrode

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100632935B1 (en) 1999-04-16 2006-10-11 삼성전자주식회사 Method of forming black matrix pattern for LCD pannel
JP2002107743A (en) * 2000-09-25 2002-04-10 Koninkl Philips Electronics Nv Reflection type liquid crystal display device
US9025235B2 (en) 2002-12-25 2015-05-05 Qualcomm Mems Technologies, Inc. Optical interference type of color display having optical diffusion layer between substrate and electrode
US9019590B2 (en) 2004-02-03 2015-04-28 Qualcomm Mems Technologies, Inc. Spatial light modulator with integrated optical compensation structure
US8094362B2 (en) 2004-03-06 2012-01-10 Qualcomm Mems Technologies, Inc. Method and system for color optimization in a display
JP2006259244A (en) * 2005-03-17 2006-09-28 Seiko Epson Corp Liquid crystal display device, manufacturing method for liquid crystal display device, and electronic equipment
JP4665571B2 (en) * 2005-03-17 2011-04-06 セイコーエプソン株式会社 Method of manufacturing a liquid crystal device, a liquid crystal device, and electronic apparatus
US8872085B2 (en) 2006-10-06 2014-10-28 Qualcomm Mems Technologies, Inc. Display device having front illuminator with turning features
US9019183B2 (en) 2006-10-06 2015-04-28 Qualcomm Mems Technologies, Inc. Optical loss structure integrated in an illumination apparatus
JP2010156971A (en) * 2008-12-26 2010-07-15 Lg Display Co Ltd Array substrate for electrophoresis type display device and method of manufacturing the same, method of repairing line of the same
US8848294B2 (en) 2010-05-20 2014-09-30 Qualcomm Mems Technologies, Inc. Method and structure capable of changing color saturation

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