JPH11142637A - Light shieldable photosensitive resin composition and color filter using the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a light shieldable photosensitive resin compsn. having high light shieldability and excellent image formability and a color filter formed by using the light shieldable photosensitive resin compsn. SOLUTION: The absorbance OD550 at a wavelength 550 nm for each 1 μm of a film thickness of the light shieldable photosensitive resin compsn. contg. a light shieldable color material is >=3 and the ratio (OD365 /OD550 ) of the absorbance OD365 at a wavelength 365 nm to the OD550 is 1.00 to 1.65. A black matrix consisting of such light shieldable photosensitive resin compsn. is formed on a transparent substrate, by which the color filter is formed.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a light-shielding photosensitive resin composition having high light-shielding properties and excellent image forming properties, and a color filter using the light-shielding photosensitive resin composition. A light-shielding photosensitive resin composition for forming a black matrix of an optical color filter used for a color television, a liquid crystal display device, a solid-state imaging device, a camera, and the like, and a black matrix comprising the light-shielding photosensitive resin composition The present invention relates to a color filter formed on a transparent substrate.

[0002]

2. Description of the Related Art A black matrix in an optical color filter used for a color television, a liquid crystal display device, a solid-state imaging device, a camera, and the like is usually formed on a transparent substrate such as a glass or plastic sheet by forming red, green, blue ( RGB) or the like, and are formed in a lattice, stripe, mosaic, or the like between three or more different color patterns, thereby improving the contrast by suppressing color mixture between the colors and driving elements (for example, TFT) to prevent malfunction. For this reason, a high light-shielding property is required for the black matrix.

Conventionally, a black matrix is formed by a method of forming a deposited film of a metal such as chromium on a transparent substrate and etching the metal film through a photolithography process. Although light-shielding properties can be obtained with high precision, there is a problem that the manufacturing process is long and the productivity is inferior, and also there are environmental problems such as treatment of an etching waste liquid.

On the other hand, a method of forming a black matrix using a light-shielding photosensitive resin composition containing a light-shielding colorant has been energetically studied and proposed (for example, Japanese Patent Application Laid-Open No. 6-51499). In this method, it is necessary to increase the content of the light-shielding coloring material in the resin composition or to increase the film thickness in order to exhibit the same light-shielding property as a conventional metal film such as chromium. was there. However, when the content of the light-shielding coloring material is increased, the sensitivity, the developing property, the resolution, the adhesion to the substrate, and the like of the photosensitive resin are reduced, and a problem occurs in the performance itself as a color filter.
Further, when the film thickness is increased, the flatness of the RGB colored pixels as a color filter is impaired due to the unevenness of the black matrix, causing the liquid crystal cell gap to become non-uniform and the liquid crystal orientation to be disturbed, thereby deteriorating the display performance. And a problem such as disconnection of a transparent electrode (for example, ITO) film is likely to occur. Therefore, a method of forming a black matrix using the photosensitive resin composition has not yet been put to practical use. is the current situation.

[0005]

SUMMARY OF THE INVENTION In view of the above-mentioned prior art, the present invention solves the above-mentioned problem in a method of forming a black matrix using a light-shielding photosensitive resin composition containing a light-shielding color material. Accordingly, the present invention provides a light-shielding photosensitive resin composition having high light-shielding properties and excellent image-forming properties, and a color filter using the light-shielding photosensitive resin composition. The purpose is to do.

[0006]

Means for Solving the Problems The present inventors have conducted intensive studies in order to solve the above-mentioned problems, and as a result, the content of carbon black and the like as the light-shielding coloring material in the light-shielding photosensitive resin composition is the same. Even so, the light absorption characteristics vary depending on the dispersion state, and by controlling the dispersion state, the absorbance in the visible light region and the absorbance in the ultraviolet light region can be controlled to specific ranges, thereby increasing the absorbance in the visible light region. The present inventors have found that, while exhibiting high light-shielding properties as a black matrix of a color filter and increasing the light transmittance in the ultraviolet region, it can also exhibit excellent image-forming properties as a black matrix, and completed the present invention. a is, i.e., the present invention is, in a light-shielding photosensitive resin composition containing a light shielding colorant absorbance OD ₅₅₀ at a wavelength 550nm per thickness 1μm is 3 or more, One, the ratio of the absorbance OD ₃₆₅ at a wavelength of 365nm for the OD ₅₅₀ (OD ₃₆₅ / O
D ₅₅₀₎ is light-blocking photosensitive resin composition is 1.00 to 1.65, and, on a transparent substrate, the light-shielding photosensitive color filter black matrix comprising the resin composition is formed, the gist And

[0007]

BEST MODE FOR CARRYING OUT THE INVENTION As the photosensitive resin in the light-shielding photosensitive resin composition of the present invention, a photopolymerizable photosensitive resin obtained by combining an acrylic resin, an acrylic monomer and a photopolymerization initiator, a novolak resin or the like can be used. Photodimerization-type photosensitivity such as a chemically amplified photosensitive resin in which a crosslinking agent and a photoacid generator are combined with a polyvinylphenol resin or the like, a photosensitive resin using an azide or diazo resin, or a resin containing a cinnamic acid group or a chalcone group. And known resins such as a photosensitive resin obtained by combining a naphthoquinonediazide and an alkali-soluble resin.

Among these, in the present invention, a photopolymerizable photosensitive resin obtained by combining an acrylic resin, an acrylic monomer, and a photopolymerization initiator is preferable. As the acrylic resin, for example, (meth) Acrylic acid (in addition,
Here, (meth) acrylic acid means acrylic acid and methacrylic acid. ), Methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate,
(Meth) acrylates such as 2-ethylhexyl (meth) acrylate, hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate, benzyl (meth) acrylate, hydroxyphenyl (meth) acrylate, and methoxyphenyl (meth) acrylate; (Meth) acrylonitrile, homopolymers or copolymers of monomers such as other derivatives of (meth) acrylic acid such as (meth) acrylamide, the monomers described above,
Styrene, α-methylstyrene, vinyl aromatic monomers such as vinyltoluene, copolymers with unsaturated carboxylic acid monomers such as maleic acid, maleic anhydride, fumaric acid, itaconic acid, and cinnamic acid, And allyl glycidyl ether, glycidyl (meth)
Acrylate, α-ethylglycidyl (meth) acrylate, 3,4-epoxycyclohexylmethyl (meth)
Epoxy group-containing ethylenically unsaturated compounds such as acrylate, glycidyl crotonate, glycidyl isocrotonate, crotonyl glycidyl ether, monoalkyl monoglycidyl itaconate, monoalkyl monoglycidyl fumarate, and monoalkyl monoglycidyl maleate. The reacted modified polymer, the monomer described above, allyl (meth) acrylate, 3
-Allyloxy-2-hydroxypropyl (meth) acrylate, cinnamyl (meth) acrylate, crotonyl (meth) acrylate, methallyl (meth) acrylate, N, N-diallyl (meth) acrylamide, vinyl (meth) acrylate, 1-chlorovinyl (Meth) acrylate, 2-phenylvinyl (meth) acrylate,
1-propenyl (meth) acrylate, vinyl (meth)
Copolymers with two or more compounds having an ethylenically unsaturated group such as acrylamide, etc., among which are preferred those having an ethylenically unsaturated bond in a side chain, and an acid value Is preferably in the range of 5 to 200 mgKOH / g in terms of alkali developability, and those having a molecular weight in the range of 1,000 to 500,000 in terms of GPC in terms of polystyrene are preferable in terms of coatability.

The acrylic monomers include, for example, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, 1,9-nonanediol di (meth) acrylate,
Neopentyl glycol di (meth) acrylate, ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, Tripropylene glycol di (meth) acrylate, trimethylolethane tri (meth) acrylate, trimethylolpropane tri (meth) acrylate, glycerol di (meth) acrylate, glycerol tri (meth) acrylate, pentaerythritol di (meth) acrylate, penta Erythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol tetra (meth) acryl Dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, hydroquinone di (meth) acrylate, resorcinol di (meth) acrylate, pyrogallol tri (meth) acrylate, bisphenol A / ethylene oxide adduct (Meth) acrylate, trimethylolpropane / ethylene oxide adduct tri (meth) acrylate, glycerin / propylene oxide adduct tri (meth) acrylate, (meth) acryloyloxyethyl phosphate, bis ((meth) acryloyloxyethyl) phosphate,
Examples thereof include those having two or more acryloyl groups in the molecule, such as tris ((meth) acryloyloxyethyl) phosphate, and among them, those having three or more acryloyl groups are preferable.

As the photopolymerization initiator, for example,
2- (4-methoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-methoxynaphthyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4 -Ethoxynaphthyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-
Halomethylated s-triazine derivatives such as ethoxycarbonylnaphthyl) -4,6-bis (trichloromethyl) -s-triazine and 2- (4-methoxystyryl) -4,6-bis (trichloromethyl) -s-triazine; 2-
(4-methoxyphenyl) -5-trichloromethyl-
Halomethylated 1,3,4-oxadiazole derivatives such as 1,3,4-oxadiazole and 2- (4-methoxystyryl) -5-trichloromethyl-1,3,4-oxadiazole; 2'-bis (o-chlorophenyl)-
4,4 ′, 5,5′-tetraphenylbiimidazole,
2,2′-bis (o-chlorophenyl) -4,4 ′,
5,5′-tetra (m, m-dimethoxyphenyl) biimidazole, 2,2′-bis (o-fluorophenyl)
-4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (o-methoxyphenyl) -4,
4 ', 5,5'-tetraphenylbiimidazole, 2,
2'-bis (p-methoxyphenyl) -4,4 ', 5
Biimidazole derivatives such as 5'-tetraphenylbiimidazole, benzoin derivatives such as benzoin methyl ether, benzoin isopropyl ether, benzoin isobutyl ether and benzoin phenyl ether;
Methylanthraquinone, 2-ethylanthraquinone, 2
Anthraquinone derivatives such as -t-butylanthraquinone and 1-chloroanthraquinone, anthrone derivatives such as benzuanthrone, benzophenone, 2-methylbenzophenone, 3-methylbenzophenone, 4-methylbenzophenone, 2-chlorobenzophenone, 4-bromobenzophenone, -Carboxybenzophenone, Michler's ketone, benzophenone derivatives such as 4,4'-bis (diethylamino) benzophenone, 2,2-dimethoxy-
2-phenylacetophenone, 2,2-diethoxyacetophenone, 1-hydroxycyclohexylphenyl ketone, α-hydroxy-2-methylphenylpropanone, 1-hydroxy-1-methylethyl- (p-isopropylphenyl) ketone, 1- Hydroxy-1-methylethyl- (p-dodecylphenyl) ketone, 2-methyl- (p-methylthiophenyl) -2-morpholino-1-
Acetophenone derivatives such as propanone, 1,1,1-trichloromethyl- (p-butylphenyl) ketone, thioxanthone, 2-ethylthioxanthone, 2-isopropylthioxanthone, 2-chlorothioxanthone, 2,
Thioxanthone derivatives such as 4-dimethylthioxanthone, 2,4-diethylthioxanthone and 2,4-diisopropylthioxanthone; benzoic acid ester derivatives such as ethyl p-dimethylaminobenzoate and ethyl p-diethylaminobenzoate; 9-phenylacridine; − (P−
Acridine derivatives such as methoxyphenyl) acridine,
Phenazine derivatives such as 9,10-dimethylbenzphenazine, dicyclopentadienyltitanium dichloride, dicyclopentadienyltitanium bisphenyl,
Dicyclopentadienyl titanium bis (2,4-difluorophenyl), dicyclopentadienyl titanium bis (2,6-difluorophenyl), dicyclopentadienyl titanium bis (2,4,6-trifluorophenyl) , Dicyclopentadienyl titanium bis (2,3,5,6-tetrafluorophenyl), dicyclopentadienyl titanium bis (2,3,4,5,6
-Pentafluorophenyl), di (methylcyclopentadienyl) titanium bis (2,6-difluorophenyl), di (methylcyclopentadienyl) titanium bis (2,3,4,5,6-pentafluorophenyl) ,
Titanocene derivatives such as dicyclopentadienyltitanium bis (2,6-difluoro-3- (1-pyrrolyl) phenyl); and the like. -Oxadiazole derivatives and biimidazole derivatives are preferred.

In the photopolymerizable photosensitive resin, 10 to 200 parts by weight of the acrylic monomer and 0.5 to 0.5 parts by weight of the photopolymerization initiator are added to 100 parts by weight of the acrylic resin.
Those prepared in the range of 20 parts by weight are particularly preferably used.

The light-shielding photosensitive resin composition of the present invention basically comprises the above-mentioned photosensitive resin and carbon black as a light-shielding coloring material, and is prepared by blending a carbon black ink with the photosensitive resin and drying. It was prepared.
Here, carbon black ink is obtained by adding a dispersant and a solvent to carbon black, for example, a dispersing machine such as a paint shaker, a sand grinder, a ball mill, a roll mill, a stone mill, a jet mill, and a homogenizer. It is prepared by performing a dispersion treatment at a temperature of 100 ° C. or less using beads such as zirconia beads.

As the carbon black as the light-shielding color material, commercially available carbon black is used. For example, "MA7", "MA8", "MA11",
"MA100", "MA220", "MA230",
"$ 52", "$ 50", "$ 47", "$ 45",
"$ 2700", "$ 2650", "$ 2200",
"Printex95", "Prix95", "$ 1000", "$ 990", "$ 900"
ntex90 ”,“ Printex85 ”,“ Prin ”
tex75 ”,“ Printex55 ”,“ Print
ex45 ”,“ Printex40 ”,“ Printe ”
x30 "," Printex3 "," Printex "
A "," PrintexG "," SpecialBla "
ck550 "," SpecialBlack350 ",
"SpecialBlack250", "Specia
lBlack100 ”and other product names from Cabot Corporation,
"Monarch 460", "Monarch 43
0 "," Monarch280 "," Monarch1 "
20 "," Monarch800 "," Monarch "
4630 "," REGAL99 "," REGAL99 "
R "," REGAL415 "," REGAL415
R "," REGAL250 "," REGAL250 "
R "," REGAL330 "," BLACK PEAR "
LS480 ”,“ BLACK PEARLS130 ”
Such as "RAVE"
N11 "," RAVE15 "," RAVE30 ",
“RAVE35”, “RAVE40”, “RAVE”
N410 "," RAVEN420 "," RAVEN45 "
0 "," RAVEN500 "," RAVEN780 ",
“Raven850”, “Raven890H”, “R”
AVEN1000 "," RAVEN1020 "," RA
VEN1040 "and the like. Among them, those having an average primary particle size of 30 nm or more, particularly 35 nm or more are preferable from the viewpoint of obtaining desired light absorption and transmission characteristics.

Examples of the dispersant include a surfactant, a pigment derivative, and a polymer compound having an affinity for carbon black. Among them, the polymer compound obtains desired light absorption and transmission characteristics. Preferred above.

The solvent is not particularly limited as long as it can dissolve the photosensitive resin.
Organic solvents in the range of 190 ° C., for example, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate, dipropylene glycol dimethyl ether A propylene glycol-based solvent such as described above is preferable in that the dispersion of carbon black is easily controlled and the desired absorption and transmission characteristics are obtained.

The light-shielding photosensitive resin composition of the present invention comprises the photosensitive resin and the carbon black ink, and the light-shielding photosensitive resin composition has a carbon black content of 35 to 70.
%, Particularly preferably 40 to 65% by weight.

The light-shielding photosensitive resin composition of the present invention is prepared by the above method, and has a wavelength of 550 nm per 1 μm of film thickness.
absorbance OD ₅₅₀ of 3 or more in m, preferably 3 to 6
And the ratio of the absorbance OD ₃₆₅ at a wavelength of 365 nm per 1 μm of film thickness to the OD _{550 (} OD ₅₅₀₎ .
₃₆₅ / OD ₅₅₀ ) shows a specific absorbance of 1.00 to 1.65, preferably 1.05 to 1.60. If the OD ₅₅₀ is less than 3, high light-shielding properties cannot be obtained.
If D ₃₆₅ / OD ₅₅₀ is less than 1.00, it is necessary to use a light-shielding coloring material other than carbon black in combination, and high light-shielding properties cannot be obtained. If D ₃₆₅ / OD ₅₅₀ exceeds 1.65, image forming properties are poor. Become.

The light absorption characteristics in the present invention are obtained by controlling the dispersion state of carbon black. However, since the light absorption and transmission characteristics are affected by the pigment particle size, the particle size of the carbon black aggregates Although it is conceivable that it shows a specific absorbance reflecting the above, at present, there is no means to actually measure the aggregate particle size of the light-shielding photosensitive resin film in which carbon black is mixed at a high concentration, and confirmation has been made. Have difficulty. Therefore, in setting appropriate dispersion conditions, it is a practical method to confirm and set the light absorption characteristics of the carbon black ink or the resin composition with a spectrophotometer.

Further, the light-shielding photosensitive resin composition of the present invention comprises:
As a light-shielding color material, other than carbon black, for example, a pigment or a dye such as a phthalocyanine derivative may be contained.However, in order to obtain a specific absorbance in the present invention, a material consisting of only carbon black is preferable. "Consisting essentially of carbon black" in the invention
The expression means that a small amount of a pigment or a dye other than carbon black is contained within a range where the specific absorbance in the present invention can be obtained. In addition, the resin composition of the present invention, in addition to the above components, for example, various commonly used additives such as a coating improver, a developability improver, an adhesion improver, a sensitivity improver, and a sensitizer. Further, it may be contained.

The light-shielding photosensitive resin composition of the present invention is applied as a light-shielding photosensitive resin composition solution containing the above-mentioned light-shielding coloring material on a transparent substrate and dried to form a light-shielding photosensitive resin composition. After being formed as a layer, the layer is image-exposed through a photomask, cured and developed as necessary, thereby forming a black matrix. This operation is further repeated for each of the three colors RGB, and A filter is manufactured.

As the transparent substrate, for example, saturated polyester such as polyethylene terephthalate, polyolefin such as polypropylene or polyethylene, thermoplastic resin such as polycarbonate, polymethyl methacrylate, polysulfone, epoxy resin, unsaturated polyester resin, poly ( Examples thereof include thermosetting resins such as (meth) acrylic resins, and various types of glass plates. In particular, glass plates and heat-resistant plastics are preferably used from the viewpoint of heat resistance.
Incidentally, these transparent substrates may be previously subjected to a corona discharge treatment, an ozone treatment, an undercoat treatment with a silane coupling agent, a urethane polymer or the like in order to improve the adhesiveness of the surface.

The coating method is not particularly limited. For example, the film thickness of the dried resin composition is measured using a coating device such as a spin coater, a wire bar, a flow coater, a die coater, a roll coater, or a spray coater. Is preferably 0.1 to 2 μm, particularly preferably 0.1 to 1.
The coating is performed so as to have a thickness of 5 μm, more preferably 0.1 to 1 μm. Drying is performed using a hot plate, an IR oven, a convention oven, or the like, for 40 to 150 days.
The temperature is about 10 ° C. for about 10 seconds to about 60 minutes.

As a light source for image exposure, for example,
Lamp light sources such as xenon lamps, halogen lamps, tungsten lamps, metal halide lamps, ultra-high pressure mercury lamps, high pressure mercury lamps, medium pressure mercury lamps, low pressure mercury lamps, and laser light sources such as argon ion laser, YAG laser, excimer laser, and nitrogen laser are used. Can be
When only specific irradiation light is used, an optical filter may be used.

As the developing solution, an organic solvent capable of dissolving the unexposed resist film, for example, acetone, methylene chloride, trichlene, cyclohexanone and the like can be used.
An aqueous solution of an inorganic alkali agent such as sodium silicate, potassium silicate, sodium hydroxide and potassium hydroxide, or an organic alkali agent such as diethanolamine, triethanolamine, and tetraalkylammonium hydroxide salt is preferable.

If necessary, the latter alkali developer may contain, for example, an anionic surfactant having a sodium naphthalenesulfonate group or a sodium benzenesulfonate group, or a nonionic surfactant having a polyalkyleneoxy group. , A surfactant such as a cationic surfactant having a tetraalkylammonium group, a water-soluble organic solvent,
A low molecular weight compound having a hydroxyl group or a carboxylic acid group can be contained. In particular, a surfactant is effective for improving developability, resolution, background stain, and the like. Development is immersion development,
Usually, it is preferably carried out at a temperature of about 10 to 50 ° C, particularly about 15 to 45 ° C, by spray development, brush development, ultrasonic development or the like.

[0026]

EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples, but the present invention is not limited to the following examples unless it exceeds the gist of the present invention.

Preparation of dispersant for preparing carbon black ink
Concrete tolylene diisocyanate trimer (solid content 50 wt%
Butyl acetate solution, manufactured by Mitsubishi Chemical Corporation, "Mytec GP7
50A "), 32 g of dibutyltin dilaurate as a catalyst and 0.02 g of a catalyst were dissolved in 47 g of propylene glycol monomethyl ether acetate (PGMEA), and polyethylene glycol (a methoxy group at one end, molecular weight 1000, manufactured by NOF Corporation," Uniox "was stirred. M-100
0 ") and polypropylene glycol (molecular weight 1000, Sanyo Kasei Kogyo Co., Ltd.," SANNIX PP-1 ").
000 ") at 70 g.
Allowed to react for hours. Subsequently, 1 g of N, N-dimethylamino-1,3-propanediamine was added, and the mixture was further reacted at 40 ° C. for 1 hour. The amine value of the obtained resin by neutralization titration was 14 mgKOH / g, and the solid content concentration was 40% by weight.

Preparation of binder resin for photosensitive resin 20 g of styrene-acrylic acid copolymer resin (acid value 200, molecular weight 5000), p-methoxyphenol 0.2
g, dodecyltrimethylammonium chloride 0.2
g, 40 g of PGMEA were charged into a flask, 7.6 g of 3,4-epoxycyclohexylmethyl acrylate was added dropwise, and reacted at 100 ° C. for 30 hours. The reaction solution was reprecipitated in water and dried to obtain a resin. The acid value of the obtained resin is 8
It was 0 mgKOH / g.

Examples 1 to 4 and Comparative Examples 1 and 2 50 parts by weight of carbon black shown in Table 1 and 5 parts by weight (solid content) of the dispersant resin obtained in the above Production Example were mixed with a solid content of 5 parts by weight.
PGMEA was added to a concentration of 0% by weight, premixed with a stirrer, and then mixed with a paint shaker.
A dispersion treatment was performed at -45 ° C for 6 hours to prepare a carbon black ink. The beads were zirconia beads having a diameter of 0.5 mm in the same amount as the dispersion, and after the dispersion was completed, the beads were separated and removed by a filter. Using this carbon black ink, 50 g of carbon black as a light-shielding coloring material, 5 g of a dispersant resin, 25 g of an acrylic resin as a binder resin obtained in the above production example, 15 g of dipentaerythritol hexaacrylate as an acrylic monomer, 2,2′-bis (o-chlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole 2 g, 4,4′-bis (diethylamino) benzophenone 1 g, pentaerythritol tetrakisthio as photopolymerization initiator 2 g of propionate and 300 g of PGMEA as a solvent
Were added to each other so as to obtain the mixing ratio, and the mixture was stirred and dissolved with a stirrer to prepare a light-shielding photosensitive resin composition solution.

The light-shielding photosensitive resin composition solution was applied to a glass substrate (Corning Co., Ltd., “705”) using a spin coater.
9 ") and dried on a hot plate at 80 ° C. for 1 minute. The film thickness of the dried resist was measured with a stylus-type film thickness meter (manufactured by Tencor, "α-step").
μm. The absorption spectrum of this resin composition film was measured with a spectrophotometer (“U-3500” manufactured by Hitachi, Ltd.), and the absorbance OD ₃₆₅ at a wavelength of ₃₆₅ nm and the absorbance OD ₅₅₀ at a wavelength of 550 nm were read. the results to calculate the ₃₆₅ / OD ₅₅₀ is shown in Table 1. Subsequently, after exposure through a step tablet with a high-pressure mercury lamp at an exposure amount of 150 mj / cm ² , the film was immersed and developed in a 0.05% -concentration aqueous solution of potassium hydroxide at a temperature of 25 ° C. for 1 minute to form an image. And the sensitivity was evaluated. The results are shown in Table 1.

[0031]

[Table 1]

[0032]

According to the present invention, a light-shielding photosensitive resin composition having high light-shielding properties and excellent image-forming properties, and thus capable of reducing the content of light-shielding coloring materials and reducing the thickness thereof, By using a light-shielding photosensitive resin composition for a black matrix, a color filter having high-quality liquid crystal display capability can be provided.

Claims (3)

[Claims] 1. A light-shielding photosensitive resin containing a light-shielding color material.
A composition, having a wavelength of 550 nm per 1 μm of film thickness.
Absorbance OD₅₅₀Is 3 or more and its OD₅₅₀
Absorbance OD at a wavelength of 365 nm with respect to₃₆₅Ratio
(OD₃₆₅/ OD ₅₅₀) Is 1.00 to 1.65
A light-shielding photosensitive resin composition comprising: 2. The light-shielding photosensitive resin composition according to claim 1, wherein the light-shielding color material is substantially composed of only carbon black. 3. A color filter, comprising a black matrix comprising the light-shielding photosensitive resin composition according to claim 1 formed on a transparent substrate.