JPH11142603A - Antireflection film - Google Patents
Antireflection filmInfo
- Publication number
- JPH11142603A JPH11142603A JP9301931A JP30193197A JPH11142603A JP H11142603 A JPH11142603 A JP H11142603A JP 9301931 A JP9301931 A JP 9301931A JP 30193197 A JP30193197 A JP 30193197A JP H11142603 A JPH11142603 A JP H11142603A
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- Prior art keywords
- film
- index transparent
- refractive
- antireflection
- transparent film
- Prior art date
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- Surface Treatment Of Optical Elements (AREA)
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- Gas-Filled Discharge Tubes (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は反射防止フィルムに
係り、特に、光透過性に優れ、高透明性で色調の良い反
射防止フィルムに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an antireflection film, and more particularly to an antireflection film having excellent light transmittance, high transparency and good color tone.
【０００２】[0002]
【従来の技術】ＯＡ機器のＰＤＰ（プラズマディスプレ
イパネル）や液晶板、車輌ないし特殊建築物の窓材には
光の反射を防止して高い光透過性を確保するために反射
防止フィルムが適用されている。2. Description of the Related Art An anti-reflection film is applied to PDPs (plasma display panels) of OA equipment, liquid crystal panels, and windows of vehicles or special buildings to prevent reflection of light and ensure high light transmittance. ing.
【０００３】従来、この種の用途に用いられる反射防止
フィルムは、ＴｉＯ2，ＳｉＯ2，ＩＴＯ，ＳｎＯ2，Ｍ
ｇＦ2等の透明膜を有機フィルム上に積層した構成とさ
れている。Conventionally, antireflection films used for this kind of application are made of TiO 2 , SiO 2 , ITO, SnO 2 , M
It has a configuration in which a transparent film such as gF 2 is laminated on an organic film.
【０００４】この反射防止フィルムでは、一般には紫外
線カット性をも兼備することが要求されている。[0004] In general, this antireflection film is required to also have an ultraviolet cut property.
【０００５】[0005]
【発明が解決しようとする課題】有機フィルム上に透明
膜を積層する方式の従来の反射防止フィルムでは、材料
に十分な透明性がなく、特に４００ｎｍ付近から短い波
長での光の透過率が急激に下がってしまう。そのため、
反射防止フィルムが黄色味がかって見えるという欠点が
ある。透明性の高い材料も提案されてはいるが、成膜速
度が著しく遅い、或いは、３５０ｎｍ付近よりも波長の
短い紫外線に対してかなりの光透過があるため、紫外線
カット性が得られないという欠点があった。In a conventional antireflection film of a system in which a transparent film is laminated on an organic film, the material does not have sufficient transparency, and in particular, the light transmittance at a short wavelength from about 400 nm is sharp. Will fall. for that reason,
There is a disadvantage that the antireflection film looks yellowish. Although a material having high transparency has been proposed, a drawback that the ultraviolet ray cut property cannot be obtained because the film formation rate is extremely slow or there is considerable light transmission for ultraviolet rays having a wavelength shorter than about 350 nm. was there.
【０００６】本発明は上記従来の問題点を解決し、光透
過性に優れ、高透明性で色調の良い反射防止フィルムを
提供することを目的とする。An object of the present invention is to solve the above-mentioned conventional problems and to provide an antireflection film having excellent light transmittance, high transparency and good color tone.
【０００７】本発明はまた、高速成膜が可能で生産性に
優れ、また、紫外線カット性も備える反射防止フィルム
を提供することを目的とする。Another object of the present invention is to provide an antireflection film capable of forming a film at a high speed, having excellent productivity, and also having an ultraviolet cut property.
【０００８】[0008]
【課題を解決するための手段】本発明の反射防止フィル
ムは、有機フィルムの表面に、高屈折率透明膜と低屈折
率透明膜との積層膜よりなる反射防止膜が形成されてい
ることを特徴とする。According to the antireflection film of the present invention, an organic film is provided with an antireflection film comprising a laminated film of a high refractive index transparent film and a low refractive index transparent film formed on the surface thereof. Features.
【０００９】高屈折率透明膜と低屈折率透明膜との積層
膜であれば、その積層構造による光の干渉作用で光の反
射を効果的に防止し、光透過性に優れ、高透明性で色調
の良い反射防止フィルムを実現できる。In the case of a laminated film of a high-refractive-index transparent film and a low-refractive-index transparent film, light reflection is effectively prevented by the light interference effect of the laminated structure, and excellent light transmittance and high transparency are achieved. Thus, an antireflection film having a good color tone can be realized.
【００１０】この積層膜の高屈折率透明膜の材料として
４００ｎｍ付近の光の透過性が高く、３５０ｎｍ付近及
びそれ以下の光の吸収が多い材料を用いることにより、
より一層優れた可視光透過性と紫外線カット性とを兼備
する反射防止フィルムを実現できる。また、成膜速度の
速い材料を用いることで、生産性を高めることができ
る。By using a material having a high light transmittance near 400 nm and a large light absorption near 350 nm and below as a material of the high refractive index transparent film of the laminated film,
It is possible to realize an antireflection film having both more excellent visible light transmittance and ultraviolet cut properties. Further, by using a material with a high film formation rate, productivity can be increased.
【００１１】酸化亜鉛（ＺｎＯ）は、４００ｎｍ付近の
光の透過性が高く、３５０ｎｍ付近及びそれ以下の光の
吸収が多い材料であり、かつ、成膜速度の速い材料であ
るため、高屈折率透明膜の材料として酸化亜鉛を用いる
ことにより、優れた可視光透過性と紫外線カット性とを
兼備し、しかも生産性も良好な反射防止フィルムを提供
することができる。Zinc oxide (ZnO) is a material having a high light transmittance near 400 nm, a large amount of light absorption near 350 nm and below, and a material having a high film formation rate, and therefore has a high refractive index. By using zinc oxide as the material of the transparent film, it is possible to provide an antireflection film having both excellent visible light transmittance and ultraviolet cut properties, and also having good productivity.
【００１２】この酸化亜鉛膜は、好ましくは金属亜鉛を
ターゲットとする反応性スパッタ法、特に好ましくは、
酸素ガス雰囲気又は酸素を４０％以上含む酸素−アルゴ
ンガス雰囲気中における反応性スパッタ法で形成され
る。This zinc oxide film is preferably formed by a reactive sputtering method using zinc metal as a target.
It is formed by a reactive sputtering method in an oxygen gas atmosphere or an oxygen-argon gas atmosphere containing 40% or more of oxygen.
【００１３】本発明において、反射防止膜は高屈折率透
明膜と低屈折率透明膜とを交互に積層した多層膜である
ことが好ましい。In the present invention, the antireflection film is preferably a multilayer film in which high-refractive-index transparent films and low-refractive-index transparent films are alternately laminated.
【００１４】[0014]
【発明の実施の形態】以下に図面を参照して本発明の反
射防止フィルムの実施の形態を詳細に説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the antireflection film of the present invention will be described below in detail with reference to the drawings.
【００１５】図１は本発明の反射防止フィルムの実施の
形態を示す模式的な断面図である。FIG. 1 is a schematic sectional view showing an embodiment of the antireflection film of the present invention.
【００１６】図示の如く、本発明の反射防止フィルム１
は、有機フィルム２上に、高屈折率透明膜４と低屈折率
透明膜３との積層膜よりなる反射防止膜５を形成したも
のである。As shown, the antireflection film 1 of the present invention
Is an organic film 2 on which an antireflection film 5 composed of a laminated film of a high refractive index transparent film 4 and a low refractive index transparent film 3 is formed.
【００１７】本発明において、有機フィルム２として
は、ポリエステル、ポリエチレンテレフタレート（ＰＥ
Ｔ）、ポリブチレンテレフタレート、ポリメチルメタア
クリレート（ＰＭＭＡ）、アクリル、ポリカーボネート
（ＰＣ）、ポリスチレン、トリアセテート、ポリビニル
アルコール、ポリ塩化ビニル、ポリ塩化ビニリデン、ポ
リエチレン、エチレン−酢酸ビニル共重合体、ポリウレ
タン、セロファン等、好ましくはＰＥＴ、ＰＣ、ＰＭＭ
Ａの透明フィルムが挙げられる。In the present invention, as the organic film 2, polyester, polyethylene terephthalate (PE)
T), polybutylene terephthalate, polymethyl methacrylate (PMMA), acrylic, polycarbonate (PC), polystyrene, triacetate, polyvinyl alcohol, polyvinyl chloride, polyvinylidene chloride, polyethylene, ethylene-vinyl acetate copolymer, polyurethane, cellophane Etc., preferably PET, PC, PMM
A transparent film.
【００１８】有機フィルム２の厚さは得られる反射防止
フィルムの用途による要求特性（例えば、強度、薄膜
性）等によって適宜決定されるが、通常の場合、１μｍ
〜１０ｍｍの範囲とされる。The thickness of the organic film 2 is appropriately determined according to the required characteristics (for example, strength and thin film properties) depending on the use of the obtained antireflection film.
It is in the range of 10 to 10 mm.
【００１９】高屈折率透明膜４としては、ＩＴＯ（スズ
インジウム酸化物）又はＺｎＯ、ＡｌをドープしたＺｎ
Ｏ、ＴｉＯ2、ＳｎＯ2、ＺｒＯ等の屈折率１．８以上の
薄膜を採用することができるが、前述の如く、高屈折率
透明膜４の材料としては、４００ｎｍ付近の光の透過性
が高く、３５０ｎｍ付近及びそれ以下の光の吸収が多い
材料であって、成膜速度の速い材料を用いるのが好まし
い。このような材料として、特に、ＺｎＯが好適であ
る。The high refractive index transparent film 4 is made of ITO (tin indium oxide), ZnO or Al-doped Zn.
Although a thin film having a refractive index of 1.8 or more, such as O, TiO 2 , SnO 2 , or ZrO, can be employed, as described above, as a material for the high refractive index transparent film 4, light transmittance near 400 nm is required. It is preferable to use a material which is high and absorbs a lot of light near 350 nm or less and has a high film formation rate. As such a material, ZnO is particularly preferable.
【００２０】一方、低屈折率透明膜３としてはＳｉ
Ｏ2、ＭｇＦ2、Ａｌ2Ｏ3等の屈折率が１．６以下の低屈
折率材料よりなる薄膜を採用することができる。これら
高屈折率透明膜３及び低屈折率透明膜４の膜厚は光の干
渉で可視光領域での反射率を下げるため、膜構成、膜
種、中心波長により異なってくるが、図１に示すような
４層構造の場合、有機フィルム２側の第１層（高屈折率
透明膜４）が５〜５０ｎｍ、第２層（低屈折率透明膜
３）が５〜５０ｎｍ、第３層（高屈折率透明膜４）が５
０〜１５０ｎｍ、第４層（低屈折率透明膜３）が５０〜
１５０ｎｍ程度の膜厚で形成するのが好ましい。On the other hand, the low refractive index transparent film 3 is made of Si
A thin film made of a low-refractive-index material having a refractive index of 1.6 or less, such as O 2 , MgF 2 , or Al 2 O 3, can be used. The thicknesses of the high-refractive-index transparent film 3 and the low-refractive-index transparent film 4 are different depending on the film configuration, the film type, and the center wavelength in order to reduce the reflectance in the visible light region due to light interference. In the case of a four-layer structure as shown, the first layer (high-refractive-index transparent film 4) on the organic film 2 side is 5 to 50 nm, the second layer (low-refractive-index transparent film 3) is 5 to 50 nm, and the third layer ( High refractive index transparent film 4) is 5
0 to 150 nm, fourth layer (low refractive index transparent film 3) 50 to 50 nm
It is preferable to form the film with a thickness of about 150 nm.
【００２１】このような高屈折率透明膜４及び低屈折率
透明膜３は、蒸着、スパッタリング、イオンプレーティ
ング、ＣＶＤ法等により形成することができるが、特
に、高屈折率透明膜としての酸化亜鉛膜は、金属亜鉛を
ターゲットとする反応性スパッタ法で形成するのが好ま
しい。この場合、スパッタ条件は、Ｏ2１００％又はＯ2
−ＡｒでＯ2４０％以上の雰囲気条件とするのが好まし
い。The high-refractive-index transparent film 4 and the low-refractive-index transparent film 3 can be formed by vapor deposition, sputtering, ion plating, CVD, or the like. The zinc film is preferably formed by a reactive sputtering method using metal zinc as a target. In this case, the sputtering conditions are O 2 100% or O 2
Preferably with O 2 40% or more ambient conditions in -ar.
【００２２】なお、図１に示す反射防止フィルム１の反
射防止膜５は、有機フィルム２上に高屈折率透明膜４、
低屈折率透明膜３、高屈折率透明膜４、低屈折率透明膜
３の順で各膜が２層ずつ交互に合計４層積層された多層
膜とされたものであるが、この反射防止膜５の高屈折率
透明膜と低屈折率透明膜との積層構造は、図示のものの
他、次のようなものであっても良い。The anti-reflection film 5 of the anti-reflection film 1 shown in FIG.
Each of the low-refractive-index transparent film 3, the high-refractive-index transparent film 4, and the low-refractive-index transparent film 3 is a multilayer film in which two layers are alternately laminated in total in a total of four layers. The laminated structure of the high-refractive-index transparent film and the low-refractive-index transparent film of the film 5 may be the following in addition to the illustrated one.
【００２３】（ａ） 高屈折率透明膜と低屈折率透明膜
を１層ずつ合計２層に積層したもの （ｂ） 中屈折率透明膜／高屈折率透明膜／低屈折率透
明膜の順で１層ずつ、合計３層に積層したもの （ｃ） 高屈折率透明膜／低屈折率透明膜の順で各層を
交互に３層ずつ、合計６層に積層したもの なお、本発明の反射防止フィルムは、必要に応じて、表
面の耐汚染性を高めるために、更に反射防止膜上に汚染
防止膜を形成しても良い。この場合、汚染防止膜として
は、フッ素系薄膜、シリコン系薄膜等よりなる膜厚１〜
１０００ｎｍ程度の薄膜が好ましい。(A) A high-refractive-index transparent film and a low-refractive-index transparent film are laminated in a total of two layers each. (B) In order of medium-refractive-index transparent film / high-refractive-index transparent film / low-refractive-index transparent film. (C) A layer in which three layers are alternately laminated in order of a high refractive index transparent film / a low refractive index transparent film to form a total of six layers. The anti-reflection film may be further provided with an anti-reflection film, if necessary, on the anti-reflection film in order to increase the surface's resistance to contamination. In this case, as the contamination prevention film, a film thickness of 1 to 1 made of a fluorine-based thin film, a silicon-based thin film, or the like
A thin film of about 1000 nm is preferred.
【００２４】このような本発明の反射防止フィルムは、
ＯＡ機器のＰＤＰや液晶板の前面フィルタ、或いは、車
輌や特殊建築物の窓材に適用することで、良好な光透過
性を確保することができる。Such an antireflection film of the present invention comprises:
By applying to a PDP of OA equipment, a front filter of a liquid crystal plate, or a window material of a vehicle or a special building, good light transmittance can be secured.
【００２５】[0025]
【実施例】以下に実施例及び比較例を挙げて本発明をよ
り具体的に説明する。The present invention will be described more specifically below with reference to examples and comparative examples.
【００２６】実施例１、比較例１，２ 有機フィルムとしてＰＥＴフィルム（膜厚１００μｍ）
を用い、このフィルムの表面に表１に示す構成の反射防
止膜を反応性スパッタ法により形成し、その光透過率と
可視光反射率、色調及び成膜速度を下記方法で調べ、結
果を表１に示した。Example 1, Comparative Examples 1 and 2 PET film (100 μm thick) as organic film
On the surface of this film, an antireflection film having the composition shown in Table 1 was formed by a reactive sputtering method, and its light transmittance, visible light reflectance, color tone, and film formation rate were examined by the following methods. 1 is shown.
【００２７】［光透過率（％），可視光反射率（％）］
日立製可視紫外光分光測定装置（Ｕ−４０００）を用
い、表１に示す波長付近の平均透過率と可視光反射率を
求めた。[Light transmittance (%), visible light reflectance (%)]
The average transmittance and the visible light reflectance near the wavelengths shown in Table 1 were determined using a Hitachi Ultraviolet Spectrophotometer (U-4000).
【００２８】［色調］目視により観察し、ほぼ無色透明
のものを○、黄色味がかったものを×とした。[Color Tone] Observed visually, a colorless and transparent one was rated as ○, and a yellowish one was rated as x.
【００２９】［成膜速度］全反射防止膜の膜厚を全成膜
時間で除して、単位厚さ当りの平均成膜時間を算出し
た。[Film forming rate] The average film forming time per unit thickness was calculated by dividing the total antireflection film thickness by the total film forming time.
【００３０】[0030]
【表１】 [Table 1]
【００３１】表１より、実施例の反射防止フィルムは、
可視光透過率（可視光反射防止性）、紫外線カット性に
優れ、色調も良好で高速成膜が可能であることがわか
る。これに対して、比較例１の反射防止フィルムでは色
調が悪く、３５０ｎｍの光を透過する。また、比較例２
の反射防止フィルムでは３５０ｎｍの光を透過し、成膜
速度が遅い。According to Table 1, the antireflection films of the examples are
It can be seen that the film has excellent visible light transmittance (visible light antireflection property), excellent ultraviolet light cut property, good color tone, and high-speed film formation. On the other hand, the antireflection film of Comparative Example 1 has poor color tone and transmits light of 350 nm. Comparative Example 2
In the anti-reflection film, the light of 350 nm is transmitted, and the film formation speed is low.
【００３２】[0032]
【発明の効果】以上詳述した通り、本発明の反射防止フ
ィルムによれば、光透過性に優れ、高透明性で色調の良
い反射防止フィルムが提供される。As described above in detail, according to the antireflection film of the present invention, an antireflection film having excellent light transmittance, high transparency and good color tone is provided.
【００３３】特に、請求項２〜４の反射防止フィルムに
よれば、高速成膜が可能で生産性に優れ、また、紫外線
カット性も備える反射防止フィルムが提供される。In particular, according to the antireflection film of the second to fourth aspects, an antireflection film which can be formed at a high speed, is excellent in productivity, and has an ultraviolet cut property is provided.
【００３４】請求項５の反射防止フィルムによれば、よ
り一層優れた反射防止性能を有する反射防止フィルムが
提供される。According to the antireflection film of claim 5, an antireflection film having more excellent antireflection performance is provided.
【図１】図１は本発明の反射防止フィルムの実施の形態
を示す模式的な断面図である。FIG. 1 is a schematic sectional view showing an embodiment of the antireflection film of the present invention.
１ 反射防止フィルム ２ 有機フィルム ３ 低屈折率透明膜 ４ 高屈折率透明膜 ５ 反射防止膜 DESCRIPTION OF SYMBOLS 1 Antireflection film 2 Organic film 3 Low refractive index transparent film 4 High refractive index transparent film 5 Antireflection film
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 ＦＩ Ｇ０２Ｆ 1/1335 Ｇ０２Ｆ 1/1335 Ｈ０１Ｊ 11/02 Ｈ０１Ｊ 11/02 Ｚ ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 6 Identification code FI G02F 1/1335 G02F 1/1335 H01J 11/02 H01J 11/02 Z
Claims (5)
と低屈折率透明膜との積層膜よりなる反射防止膜が形成
されていることを特徴とする反射防止フィルム。1. An anti-reflection film, wherein an anti-reflection film comprising a laminated film of a high-refractive-index transparent film and a low-refractive-index transparent film is formed on the surface of the organic film.
化亜鉛膜であることを特徴とする反射防止フィルム。2. The antireflection film according to claim 1, wherein the high refractive index transparent film is a zinc oxide film.
亜鉛をターゲットとする反応性スパッタ法により形成さ
れた被膜であることを特徴とする反射防止フィルム。3. The anti-reflection film according to claim 2, wherein the zinc oxide film is a film formed by a reactive sputtering method using metal zinc as a target.
酸素ガス雰囲気又は酸素を４０％以上含む酸素−アルゴ
ンガス雰囲気中で行うことを特徴とする反射防止フィル
ム。4. The reactive sputtering according to claim 3, wherein
An antireflection film, which is performed in an oxygen gas atmosphere or an oxygen-argon gas atmosphere containing 40% or more of oxygen.
て、該反射防止膜は高屈折率透明膜と低屈折率透明膜と
を交互に積層した多層膜であることを特徴とする反射防
止フィルム。5. The anti-reflection film according to claim 1, wherein the anti-reflection film is a multilayer film in which high-refractive-index transparent films and low-refractive-index transparent films are alternately laminated. the film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9301931A JPH11142603A (en) | 1997-11-04 | 1997-11-04 | Antireflection film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9301931A JPH11142603A (en) | 1997-11-04 | 1997-11-04 | Antireflection film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH11142603A true JPH11142603A (en) | 1999-05-28 |
Family
ID=17902838
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9301931A Pending JPH11142603A (en) | 1997-11-04 | 1997-11-04 | Antireflection film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11142603A (en) |
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| JP2002311207A (en) * | 2001-04-17 | 2002-10-23 | Sony Corp | Antireflection film |
| JP2004163460A (en) * | 2002-11-08 | 2004-06-10 | Seiko Instruments Inc | Liquid crystal display device |
| EP1437609A1 (en) * | 2001-10-18 | 2004-07-14 | Bridgestone Corporation | Optical element and production method therefor, and band pass filter, near infrared cut filter and anti-reflection film |
| JP2009265593A (en) * | 2008-04-21 | 2009-11-12 | Lg Display Co Ltd | Liquid crystal display device |
| US8582045B2 (en) | 2008-04-21 | 2013-11-12 | Lg Display Co., Ltd. | Liquid crystal display device |
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1997
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2002031701A (en) * | 2000-07-17 | 2002-01-31 | Konica Corp | Optical element and ophthalmic lens |
| JP4524877B2 (en) * | 2000-07-17 | 2010-08-18 | コニカミノルタホールディングス株式会社 | Eyeglass lenses |
| JP4701528B2 (en) * | 2001-04-17 | 2011-06-15 | ソニー株式会社 | Antireflection film |
| JP2002311207A (en) * | 2001-04-17 | 2002-10-23 | Sony Corp | Antireflection film |
| EP1437609A1 (en) * | 2001-10-18 | 2004-07-14 | Bridgestone Corporation | Optical element and production method therefor, and band pass filter, near infrared cut filter and anti-reflection film |
| EP1437609A4 (en) * | 2001-10-18 | 2004-11-17 | Bridgestone Corp | Optical element and production method therefor, and band pass filter, near infrared cut filter and anti-reflection film |
| JP2004163460A (en) * | 2002-11-08 | 2004-06-10 | Seiko Instruments Inc | Liquid crystal display device |
| US8582045B2 (en) | 2008-04-21 | 2013-11-12 | Lg Display Co., Ltd. | Liquid crystal display device |
| JP2009265593A (en) * | 2008-04-21 | 2009-11-12 | Lg Display Co Ltd | Liquid crystal display device |
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| JP2017097364A (en) * | 2010-12-10 | 2017-06-01 | エシロール アテルナジオナール カンパニー ジェネラーレ デ オプティックＥｓｓｉｌｏｒ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｃｏｍｐａｇｎｉｅ Ｇｅｎｅｒａｌｅ Ｄ’ Ｏｐｔｉｑｕｅ | Optical article with anti-reflection coating having low reflectivity both in ultraviolet and visible regions |
| US10073279B2 (en) | 2010-12-10 | 2018-09-11 | Essilor International | Optical article comprising an antireflective coating with a low reflection both in the ultraviolet region and in the visible region |
| US10649232B2 (en) | 2010-12-10 | 2020-05-12 | Essilor International | Optical article comprising an antireflective coating with a low reflection both in the ultraviolet region and in the visible region |
| US9458264B2 (en) | 2011-09-26 | 2016-10-04 | Fujifilm Corporation | Barrier laminate and novel polymer compound |
| WO2019058831A1 (en) * | 2017-09-22 | 2019-03-28 | デクセリアルズ株式会社 | Optical body and window material |
| CN110079764A (en) * | 2018-01-25 | 2019-08-02 | 福建省辉锐材料科技有限公司 | A kind of adjustable PVD film plating process of Film color |
| CN108660418A (en) * | 2018-05-31 | 2018-10-16 | 维沃移动通信有限公司 | A kind of substrate processing regimens and target substrate, electronic equipment |
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