JPH11140698A - Plating apparatus - Google Patents

Plating apparatus

Info

Publication number
JPH11140698A
JPH11140698A JP9302889A JP30288997A JPH11140698A JP H11140698 A JPH11140698 A JP H11140698A JP 9302889 A JP9302889 A JP 9302889A JP 30288997 A JP30288997 A JP 30288997A JP H11140698 A JPH11140698 A JP H11140698A
Authority
JP
Japan
Prior art keywords
plating
electrode
scum
receiving plate
pantograph
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9302889A
Other languages
Japanese (ja)
Inventor
Masahiro Ibe
雅博 伊部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OITA NIPPON DENKI KK
Original Assignee
OITA NIPPON DENKI KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OITA NIPPON DENKI KK filed Critical OITA NIPPON DENKI KK
Priority to JP9302889A priority Critical patent/JPH11140698A/en
Publication of JPH11140698A publication Critical patent/JPH11140698A/en
Pending legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)

Abstract

PROBLEM TO BE SOLVED: To prevent scum from falling into a plating cell and to prevent the deterioration of the plating quality of an article to be plated by providing the apparatus with an electrode and a scum receiver disposed in the lower part of the sliding surface of a pantagraph. SOLUTION: In electroplating, the article 5 to be plated is mounted at a receiving plate 2 and while the article is immersed into the plating liquid in the plating cell, the article 5 to be plated is subjected to energizing. The pantagraph 3 is disposed between the electrode 1 and the receiving plate 2 for the purpose of the energization. The article 5 to be plated moves together with the receiving plate 2 and the pantagraph 3 to the next treating vessel for washing, etc., during or after the end of the plating. At this time, the electrode 1 and the pantagraph 3 slide and, therefore, the scum which is oxides, etc., of these surfaces falls into the scum rest 4. As a result, the scum falls into the plating liquid in the plating cell and the adhesion of the scum existing on the surface of the plating liquid and within the liquid to the article 5 to be plated is prevented.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はめっき装置に関し、
特に半田めっき等の電解めっき用のめっき装置に関す
る。
The present invention relates to a plating apparatus,
In particular, it relates to a plating apparatus for electrolytic plating such as solder plating.

【0002】[0002]

【従来の技術】一般にIC等に用いられる部品に半田め
っき等の電解めっきを施すには、図6に示す様に、被め
っき物5を保持する受け板2と電極1の間にパンタグラ
フ3を設けて導通させている。この被めっき物5は、次
の処理槽へ受け板2と共に移動する為、電極1とパンタ
グラフ3は接点を保ちながら摺動する。この際、めっき
液等の雰囲気により電極1とパンタグラフ3に発生した
酸化物等のカスがはがれてめっき槽に落下する。
2. Description of the Related Art In general, in order to apply electrolytic plating such as solder plating to a component used for an IC or the like, a pantograph 3 is placed between an electrode 1 and a receiving plate 2 holding an object 5 as shown in FIG. Provided for conduction. Since the plating object 5 moves together with the receiving plate 2 to the next processing tank, the electrode 1 and the pantograph 3 slide while keeping the contact point. At this time, scraps such as oxides generated on the electrode 1 and the pantograph 3 due to the atmosphere of the plating solution or the like are peeled off and fall into the plating tank.

【0003】このカスを除去する為に、例えば特開平5
−239604号公報に記載されている様に、上下方向
及び横方向に自動で動くヘラを用いて除去する方法があ
る。
In order to remove the scum, for example, Japanese Patent Application Laid-Open
As described in JP-A-239604, there is a method of removing using a spatula that automatically moves vertically and horizontally.

【0004】[0004]

【発明が解決しようとする課題】第1の問題点は、従来
の技術において、酸化物等のカスにより被めっき物のめ
っき品質が劣化することである。
The first problem is that, in the prior art, the plating quality of the object to be plated deteriorates due to scum such as oxide.

【0005】その理由は、表面を浮遊するカスはヘラ等
を用いて除去できるが、めっき液内に入り込んだカスは
除去できないからである。
[0005] The reason is that, while the residue floating on the surface can be removed using a spatula or the like, the residue that has entered the plating solution cannot be removed.

【0006】本発明の目的は、発生したカスがめっき槽
に落ちるのを防止し、被めっき物のめっき品質が劣化す
ることのないめっき装置を提供することにある。
[0006] An object of the present invention is to provide a plating apparatus that prevents generated scum from falling into a plating tank and does not deteriorate the plating quality of an object to be plated.

【0007】[0007]

【課題を解決するための手段】本発明のめっき装置は、
電極と、被めっき物を下方に保持する導電性材料からな
る受け板と、前記受け板の上部に設けられ前記電極を摺
動し導通をとるためのパンタグラフと、前記電極と前記
パンタグラフの摺動面の下部に設けられたカス受けとを
含むことを特徴とするものである。そして特にカス受け
の断面形状は凹状となっているものである。
The plating apparatus of the present invention comprises:
An electrode, a receiving plate made of a conductive material for holding an object to be plated below, a pantograph provided on the receiving plate to slide the electrode and establish conduction, and sliding of the electrode and the pantograph And a scrap receiver provided at a lower portion of the surface. In particular, the cross-sectional shape of the residue is concave.

【0008】電極とパンタグラフが摺動する事で発生し
たカスは、カス受けが受けるため、めっき槽内に落下す
ることはなくなる。
[0008] The scum generated by the sliding of the electrode and the pantograph is received by the scum receptacle, so that it does not fall into the plating tank.

【0009】[0009]

【発明の実施の形態】次に本発明について図面を参照し
て説明する。図1は本発明の第1の実施の形態を説明す
る為のパンタグラフ近傍の斜視図、図2(a),(b)
はパンタグラフと電極の上面図及びA−A線断面図であ
り、特に断面図にはカス受け及びめっき槽を示してあ
る。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described with reference to the drawings. FIG. 1 is a perspective view showing a vicinity of a pantograph for explaining a first embodiment of the present invention, and FIGS. 2 (a) and 2 (b).
FIG. 1 is a top view of a pantograph and an electrode and a cross-sectional view taken along line AA. In particular, the cross-sectional view shows a waste receptacle and a plating tank.

【0010】図1及び図2(a),(b)を参照すると
第1の実施の形態のめっき装置は、電極1と、リードフ
レーム等の被めっき物5をクリップピン等によりはさん
で保持するステンレス等からなる受け板2と、この受け
板2の上部にボルト等により接続され電極1を摺動する
パンタグラフ3と、電極1とパンタグラフ3の摺動面の
下部に設けられた断面形状が凹状のカス受け4とを含ん
で構成される。
Referring to FIGS. 1 and 2 (a) and 2 (b), the plating apparatus according to the first embodiment holds an electrode 1 and an object 5 such as a lead frame with a clip pin or the like. A receiving plate 2 made of stainless steel or the like, a pantograph 3 connected to an upper portion of the receiving plate 2 by a bolt or the like, and sliding on the electrode 1, and a cross-sectional shape provided below a sliding surface of the electrode 1 and the pantograph 3 It is configured to include a concave waste receptacle 4.

【0011】次に、本発明の第1の実施の形態の動作に
ついて図2を参照して詳細に説明する。
Next, the operation of the first embodiment of the present invention will be described in detail with reference to FIG.

【0012】電解めっきを行う場合、被めっき物5を受
け板2に取り付け、めっき槽7内のめっき液8に浸しな
がら、被めっき物5に電気を通すことでめきを行う。な
お電気を被めっき物5に通すため、電極1と受け板2の
間にパンタグラフ3が設けられている。
When performing electrolytic plating, plating is performed by passing electricity through the plating object 5 while attaching the plating object 5 to the receiving plate 2 and immersing it in the plating solution 8 in the plating tank 7. Note that a pantograph 3 is provided between the electrode 1 and the receiving plate 2 in order to pass electricity through the object 5 to be plated.

【0013】被めっき物5は、めっきを行いながら、も
しくはめっきが終了すると、受け板2及びパンタグラフ
3とともに次の洗浄等の処理槽へ移動する。すなわち電
極1とパンタグラフ3は摺動する事になる。この際、電
極1またはパンタグラフ3表面の酸化物等であるカス6
が、カス受け4の中に落下する。このカス受け4がない
場合、カス6がめっき槽7内のめっき液8中に落下し、
めっき液8表面もしくは内部に存在するため、被めっき
物5にカス6が付着し、品質が劣化する。
The plating object 5 moves to a processing tank for the next washing or the like together with the receiving plate 2 and the pantograph 3 while plating is performed or when plating is completed. That is, the electrode 1 and the pantograph 3 slide. At this time, a residue 6 such as an oxide on the surface of the electrode 1 or the pantograph 3 is formed.
Falls into the waste receptacle 4. If there is no dregs receiver 4, dregs 6 fall into plating solution 8 in plating tank 7,
Since the plating solution 8 is present on the surface or inside, the scum 6 adheres to the plating object 5 and the quality is deteriorated.

【0014】図3は本発明の第2の実施の形態を説明す
る為の断面図であり、カス6がカス受け4Aと電極1の
すきまから落ちない様にカス受け4Aを電極の下面の幅
より大きく拡げたものである。
FIG. 3 is a cross-sectional view for explaining a second embodiment of the present invention. It is a larger one.

【0015】図4は本発明の第3の実施の形態を説明す
るための断面図であり、第2の実施の形態と同様の効果
を得るため、電極1とカス受け4Bを連結したものであ
る。
FIG. 4 is a cross-sectional view for explaining a third embodiment of the present invention. In order to obtain the same effect as that of the second embodiment, the electrode 1 is connected to the waste receiver 4B. is there.

【0016】これらのカス受け4A,4Bは、受け板2
とは隙間を開けて設けており、摺動する際の干渉によ
り、被めっき物5の落下等の発生を防止するようにして
ある。
These scrap receivers 4A and 4B are connected to the receiving plate 2
Are provided with a gap therebetween to prevent the plated object 5 from dropping or the like due to interference when sliding.

【0017】図5は本発明の第4の実施の形態を説明す
る為の電極とパンタグラフ近傍の斜視図である。
FIG. 5 is a perspective view showing the vicinity of an electrode and a pantograph for explaining a fourth embodiment of the present invention.

【0018】この第4の実施の形態では、パンタグラフ
3Aと電極1の接点部を、受け板2と反対側に設け、そ
れに伴いカス受け4Cも反対側にして電極の下面に固定
している。これにより、カスがカス受け4Cと電極1の
隙間から落ちる事がなく、かつカス受け4Cと受け板2
の隙間から落ちる事がない。
In the fourth embodiment, the contact portion between the pantograph 3A and the electrode 1 is provided on the side opposite to the receiving plate 2, and accordingly, the waste receptacle 4C is also set on the opposite side and fixed to the lower surface of the electrode. Thereby, the waste does not fall from the gap between the waste receiver 4C and the electrode 1 and the waste receiver 4C and the receiving plate 2
Never fall from the gap.

【0019】[0019]

【発明の効果】第1の効果は、電極及びパンタグラフ表
面の酸化膜等のカスがめっき槽に落下しないということ
である。これにより被めっき物にカスが付着してめっき
品質が劣化することがなくなる。
The first effect is that scum such as an oxide film on the surface of the electrode and the pantograph does not fall into the plating tank. As a result, the quality of plating does not deteriorate due to the adhesion of scum to the object to be plated.

【0020】その理由は、カスがめっき槽に落下しない
様にカス受けを設けたからである。
The reason is that a waste receptacle is provided so that the waste does not fall into the plating tank.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の第1の実施の形態を説明する為のパン
タグラフ近傍の斜視図。
FIG. 1 is a perspective view of a vicinity of a pantograph for explaining a first embodiment of the present invention.

【図2】本発明の第1の実施の形態を説明する為のパン
タグラフと電極の上面図及び断面図。
FIG. 2 is a top view and a cross-sectional view of a pantograph and electrodes for describing a first embodiment of the present invention.

【図3】本発明の第2の実施の形態を説明する為の断面
図。
FIG. 3 is a cross-sectional view for explaining a second embodiment of the present invention.

【図4】本発明の第3の実施の形態を説明する為の断面
図。
FIG. 4 is a cross-sectional view for explaining a third embodiment of the present invention.

【図5】本発明の第4の実施の形態を説明する為の電極
とパンタグラフ近傍の斜視図。
FIG. 5 is a perspective view showing the vicinity of an electrode and a pantograph for explaining a fourth embodiment of the present invention.

【図6】従来のめっき装置の電極とパンタグラフ近傍の
斜視図。
FIG. 6 is a perspective view of the vicinity of an electrode and a pantograph of a conventional plating apparatus.

【符号の説明】[Explanation of symbols]

1 電極 2 受け板 3.3A パンタグラフ 4,4A〜4C カス受け 5 被めっき物 6 カス 7 めっき槽 8 めっき液 DESCRIPTION OF SYMBOLS 1 Electrode 2 Receiving plate 3.3A Pantograph 4, 4A-4C Scrap receiver 5 Plated object 6 Scrap 7 Plating tank 8 Plating solution

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 電極と、被めっき物を下方に保持する導
電性材料からなる受け板と、前記受け板の上部に設けら
れ前記電極を摺動し導通をとるためのパンタグラフと、
前記電極と前記パンタグラフの摺動面の下部に設けられ
たカス受けとを含むことを特徴とするめっき装置。
An electrode, a receiving plate made of a conductive material for holding an object to be plated downward, a pantograph provided on an upper portion of the receiving plate for sliding the electrode to establish conduction.
A plating apparatus comprising: the electrode; and a dregs receiver provided below a sliding surface of the pantograph.
【請求項2】 パンタグラフが摺動する電極の面は受け
板側である請求項1記載のめっき装置。
2. The plating apparatus according to claim 1, wherein the surface of the electrode on which the pantograph slides is on the receiving plate side.
【請求項3】 パンタグラフが摺動する電極の面は受け
板側と反対側である請求項1記載のめっき装置。
3. The plating apparatus according to claim 1, wherein the surface of the electrode on which the pantograph slides is opposite to the side of the receiving plate.
【請求項4】 カス受けは断面形状が凹状である請求項
1〜3のいずれか記載のめっき装置。
4. The plating apparatus according to claim 1, wherein the waste receptacle has a concave cross-sectional shape.
【請求項5】 カス受けは電極の下面に取り付けられて
いる請求項1〜4のいずれか記載のめっき装置。
5. The plating apparatus according to claim 1, wherein the waste receptacle is attached to a lower surface of the electrode.
JP9302889A 1997-11-05 1997-11-05 Plating apparatus Pending JPH11140698A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9302889A JPH11140698A (en) 1997-11-05 1997-11-05 Plating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9302889A JPH11140698A (en) 1997-11-05 1997-11-05 Plating apparatus

Publications (1)

Publication Number Publication Date
JPH11140698A true JPH11140698A (en) 1999-05-25

Family

ID=17914331

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9302889A Pending JPH11140698A (en) 1997-11-05 1997-11-05 Plating apparatus

Country Status (1)

Country Link
JP (1) JPH11140698A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012046782A (en) * 2010-08-25 2012-03-08 Almex Pe Inc Surface treatment apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012046782A (en) * 2010-08-25 2012-03-08 Almex Pe Inc Surface treatment apparatus

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