JPH11140687A - Method of plating cylindrical member for eddy current type decelerating device, and its device - Google Patents
Method of plating cylindrical member for eddy current type decelerating device, and its deviceInfo
- Publication number
- JPH11140687A JPH11140687A JP30179397A JP30179397A JPH11140687A JP H11140687 A JPH11140687 A JP H11140687A JP 30179397 A JP30179397 A JP 30179397A JP 30179397 A JP30179397 A JP 30179397A JP H11140687 A JPH11140687 A JP H11140687A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- cylindrical member
- eddy current
- current type
- friction roller
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electroplating Methods And Accessories (AREA)
- Dynamo-Electric Clutches, Dynamo-Electric Brakes (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、自動車に設置され
る渦電流式減速装置の回転子の円筒部材内表面をめっき
する方法およびその装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and apparatus for plating an inner surface of a cylindrical member of a rotor of an eddy current type reduction gear installed in an automobile.
【0002】[0002]
【従来の技術】自動車の制動装置としては、主ブレーキ
であるフットブレーキ、補助ブレーキである排気ブレー
キのほかに長い坂道の降坂時などで安定した減速を行
い、かつフットブレーキの焼損を防止するために渦電流
式減速装置(以下、これを「リターダ」と記載する)が
使用されている。このリターダには、磁石として電磁石
を使用するものと永久磁石を使用するものとがある。永
久磁石を使用するリターダの構造については、既にいく
つかの例が本出願人らによって提案されている(たとえ
ば、特開平1-234043号公報、特開平1-234045号公報、特
開平1-298948号公報等参照)。2. Description of the Related Art In addition to a foot brake serving as a main brake and an exhaust brake serving as an auxiliary brake, a braking device for a vehicle performs stable deceleration on a downhill on a long slope and prevents burnout of the foot brake. For this purpose, an eddy current type reduction gear (hereinafter referred to as "retarder") is used. This retarder includes one using an electromagnet as a magnet and one using a permanent magnet. Some examples of the structure of a retarder using a permanent magnet have already been proposed by the present applicant (for example, Japanese Patent Application Laid-Open Nos. 1-234043, 1-234045, 1-298948). Reference).
【0003】図2は、永久磁石を使用したリターダの一
例を示す縦断面図である。FIG. 2 is a longitudinal sectional view showing an example of a retarder using a permanent magnet.
【0004】リターダは、トランスミッションなどの回
転軸6に取り付けられた回転子Rとトランスミッションケ
ースなどに取り付けられたステータSとから構成されて
いる。[0004] The retarder includes a rotor R attached to a rotating shaft 6 of a transmission and the like, and a stator S attached to a transmission case and the like.
【0005】回転子Rは、強磁性材からなる円筒部材1、
スポーク2、ディスク3およびフィン4から構成され、ブ
ラケット5を介して回転軸6の片側端部にボルトによって
取り付けられている。円筒部材1は、その端部をディス
ク3に挿入されたスポーク2の先端部に片持ち梁状に溶接
によって接合されている。The rotor R includes a cylindrical member 1 made of a ferromagnetic material,
It is composed of spokes 2, discs 3 and fins 4, and is attached to one end of the rotating shaft 6 via a bracket 5 with bolts. The cylindrical member 1 has its end joined to the tip of the spoke 2 inserted into the disk 3 by welding in a cantilever manner.
【0006】ステータSは、複数個の永久磁石7が隣接す
る外周表面の極性を逆向きに周設された支持リング8、
ポールピース9、ケーシング10、案内棒11、駆動装置1
2、およびピストンロッドから構成され、前記回転子Rの
円筒部材1の内側に設けられている。永久磁石7を備えた
支持リング8は、中空リング状に形成されたケーシング1
0の内部に、案内棒11(同図下半分を参照)によって支
持されて組み込まれ、駆動装置12のピストンロッド13に
よって前記案内棒に沿って回転軸の軸方向に往復運動で
きるように組み込まれている。[0006] The stator S has a support ring 8 around which a plurality of permanent magnets 7 are provided with the polarity of the outer peripheral surface adjacent thereto being reversed.
Pole piece 9, casing 10, guide rod 11, drive unit 1
2, and a piston rod, and is provided inside the cylindrical member 1 of the rotor R. The support ring 8 with the permanent magnet 7 is a casing 1 formed in the shape of a hollow ring.
0, it is supported and incorporated by a guide rod 11 (see the lower half of the figure), and is incorporated by a piston rod 13 of a driving device 12 so as to be able to reciprocate in the axial direction of the rotation axis along the guide rod. ing.
【0007】この往復運動によって永久磁石7がポール
ピース9の位置、すなわち円筒部材1と磁気的に対向する
位置まで挿入された状態(図2の上半分に示す状態)が
制動オンである。一方、永久磁石7がポールピース9から
離れた位置にある状態(図2の下半分に示す状態)が制
動オフである。ポールピース9は、軟強磁性材料からな
り、図2に示すように永久磁石7と円筒部材1との間に設
けられて、円筒部材への磁場通路としての役割を果たし
ている。The state where the permanent magnet 7 is inserted to the position of the pole piece 9 by this reciprocating movement, that is, the position where the permanent magnet 7 is magnetically opposed to the cylindrical member 1 (the state shown in the upper half of FIG. 2) is brake-on. On the other hand, a state in which the permanent magnet 7 is located at a position away from the pole piece 9 (a state shown in the lower half of FIG. 2) is braking off. The pole piece 9 is made of a soft ferromagnetic material, and is provided between the permanent magnet 7 and the cylindrical member 1 as shown in FIG. 2, and serves as a magnetic field path to the cylindrical member.
【0008】制動オンの状態では、円筒部材1が永久磁
石7から発する磁束を横切って回転するので、円筒部材
の内壁部表面近傍に渦電流が流れる。この渦電流と磁束
の相互作用によって回転子には制動トルクが発生する。
この円筒部材は、渦電流にともなうジュール熱で昇温さ
れ、制動オフの状態でフィン4によって冷却降温され
る。In the brake-on state, the cylindrical member 1 rotates across the magnetic flux emitted from the permanent magnet 7, so that an eddy current flows near the inner wall surface of the cylindrical member. The interaction between the eddy current and the magnetic flux generates a braking torque in the rotor.
The temperature of this cylindrical member is increased by Joule heat due to the eddy current, and is cooled and cooled by the fins 4 in a brake-off state.
【0009】永久磁石方式リターダまたは電磁石方式リ
ターダにおいても、制動トルクの発生を向上させる方策
として、回転子の円筒部材またはディスクの磁石と対向
する面に電気抵抗の小さな材料からなる金属層をめっき
することが提案されている。そして、これらの金属層に
は、銅または銅合金が用いられ、単一の金属層で構成す
るものと、ニッケル−銅−ニッケルなどのように多層膜
で構成するものが提案されている(特開昭63-274359号
公報、同64-30450号公報、特開平1-288636号公報参
照)。In a permanent magnet type retarder or an electromagnet type retarder as well, as a measure for improving the generation of braking torque, a metal layer made of a material having a small electric resistance is plated on a surface of the rotor cylindrical member or the disk facing the magnet. It has been proposed. For these metal layers, copper or a copper alloy is used, and one composed of a single metal layer and one composed of a multilayer film such as nickel-copper-nickel have been proposed. See JP-A-63-274359, JP-A-64-30450, and JP-A-1-288636.
【0010】従来、リターダの円筒部材内表面にめっき
を施すには、電鋳用の硫酸銅めっき浴が用いられてい
た。そのめっき工程は、次に示す(A)から(G)までの工程
で行われる。Conventionally, a copper sulfate plating bath for electroforming has been used for plating the inner surface of the cylindrical member of the retarder. The plating step is performed in the following steps (A) to (G).
【0011】(A)洗浄→(B)電着塗装によるマスキング→
(C)被めっき面の研磨→(D)洗浄→(E)シアン化銅めっき
浴による下地ストライク処理→(F)硫酸銅めっき浴によ
る厚めっき処理→(G)めっき面の研磨 図3は、リターダの円筒部材を示す図であり、(a)は縦
断面図、(b)は平面図である。めっきされるリターダの
円筒部材1は、スポークを溶接しない状態であるが、外
周面にはフィン4が取り付けられた状態である。したが
って、円筒部材の内表面(被めっき面14)を除き、側面
とフィンに(工程B)のマスキングが行われる。(工程E)の
下地ストライク処理および(工程F)の厚めっき処理は、
円筒部材の軸中心部に銅電極を設置し、円筒部材を陰電
極としてめっき浴を空気撹拌しながら行われる。(A) Cleaning → (B) Masking by electrodeposition coating →
(C) Polishing of the surface to be plated → (D) Cleaning → (E) Underground strike treatment with copper cyanide plating bath → (F) Thick plating treatment with copper sulfate plating bath → (G) Polishing of plating surface It is a figure which shows the cylindrical member of a retarder, (a) is a longitudinal cross-sectional view, (b) is a top view. The cylindrical member 1 of the retarder to be plated is in a state in which no spokes are welded, but a fin 4 is attached to the outer peripheral surface. Therefore, except for the inner surface (plated surface 14) of the cylindrical member, the masking (step B) is performed on the side surfaces and the fins. The underlayer strike process in (Step E) and the thick plating process in (Step F)
A copper electrode is installed at the center of the axis of the cylindrical member, and the plating is performed while stirring the plating bath using the cylindrical member as a negative electrode.
【0012】それぞれのめっき厚さは、(工程E)の下地
ストライク処理で1〜2μm、(工程F)の厚めっき処理
で100〜200μmである。シアン化銅めっき浴で下地処理
を施すのは、硫酸銅めっき浴では鋼を腐食させ、鋼に直
接めっきができないためである。シアン化銅めっき浴
は、厚めっき処理には適していないが、鋼を腐食させな
いので下地処理として使用されている。The thickness of each plating is 1-2 μm in the underlayer strike treatment in (Step E) and 100-200 μm in the thick plating treatment in (Step F). The undercoat treatment is performed in the copper cyanide plating bath because the copper sulfate plating bath corrodes the steel and cannot directly plate the steel. Copper cyanide plating baths are not suitable for thick plating, but are used as groundwork because they do not corrode steel.
【0013】[0013]
【発明が解決しようとする課題】上記の方法でめっきさ
れた円筒部材をリターダに組み込み、制動試験を行った
後、円筒部材の調査を行い次のことを明らかにした。The cylindrical member plated by the above method was assembled in a retarder, and after a braking test was conducted, the cylindrical member was examined to find out the following.
【0014】(1)硫酸銅めっき浴には、通常、めっき面
を平滑にするために硫黄を含む光沢剤が添加されてい
る。この硫黄がめっき層中に共析するので、円筒部材が
リターダに組み込まれ高温に曝されると、硫黄が拡散し
て界面に濃縮され、めっき層が剥離する。(1) Usually, a brightener containing sulfur is added to a copper sulfate plating bath in order to smooth a plated surface. Since this sulfur is eutectoid in the plating layer, when the cylindrical member is incorporated in the retarder and exposed to a high temperature, the sulfur is diffused and concentrated at the interface, and the plating layer is separated.
【0015】(2)光沢剤を添加しためっき浴でめっきを
行っためっき層は、無添加のものに比較して引張り伸び
が約1/3に低下するので、制動オン、またはオフの切り
換えによる膨張、収縮によって割れが発生する。(2) Since the tensile elongation of the plating layer plated in the plating bath to which the brightener is added is reduced to about 1/3 as compared with that of the plating layer without the addition of the brightening agent, the braking on or off is switched. Cracks occur due to expansion and contraction.
【0016】(3)銅めっき層は、軟質で損傷されやすい
ので、この層の上にニッケル−りん合金などの保護膜が
被覆されている。しかし、前記工程の(G)に示すように
めっき面の機械研磨加工を行うと、砥粒がめっき表面に
残存することがあり、この砥粒が保護膜を被覆するとき
ピット欠陥となる。(3) Since the copper plating layer is soft and easily damaged, a protective film such as a nickel-phosphorus alloy is coated on this layer. However, when the mechanical polishing of the plated surface is performed as shown in (G) of the above process, abrasive grains may remain on the plated surface, and when these abrasive grains cover the protective film, they become pit defects.
【0017】リターダの回転子の円筒部材は、図2に示
すように、その内周部がポールピースに接近して回転す
るほど、また銅めっき層(100〜500μm)が存在するこ
とによって制動トルクの発生が大きくなる。また、前述
したように制動オン、またはオフの切り換えによって円
筒部材には約600℃までの昇温と、冷却が繰り返される
ため、めっき層には欠陥が無く、柔軟で緻密な組織が要
求される。As shown in FIG. 2, as the inner peripheral portion of the cylindrical member of the rotor of the retarder rotates closer to the pole piece, the braking torque is increased by the presence of the copper plating layer (100 to 500 μm). Is more likely to occur. In addition, as described above, since the temperature of the cylindrical member is raised to about 600 ° C. and the cooling is repeated by switching the braking on or off, the plating layer has no defects, and a flexible and dense structure is required. .
【0018】このため、たとえば硫酸銅めっき浴を用
い、銅層の厚さを厚くするには、必要とする厚さ以上の
めっき厚さとした後、機械研磨などによって所要の厚さ
に仕上げていた。また、めっき層に欠陥が無く、柔軟で
緻密な組織とするためには、めっき浴の撹拌、光沢剤や
界面活性剤の添加のほかに、電流密度や電極の配置など
の調整を行う必要があった。しかも、従来の方法は、次
に示すような欠点があった。For this reason, for example, in order to increase the thickness of the copper layer by using a copper sulfate plating bath, the plating thickness is set to be greater than the required thickness, and then the required thickness is finished by mechanical polishing or the like. . In addition, in order to obtain a flexible and dense structure with no defects in the plating layer, it is necessary to adjust the current density and the arrangement of the electrodes in addition to stirring the plating bath, adding brighteners and surfactants. there were. In addition, the conventional method has the following disadvantages.
【0019】硫酸銅めっき浴は、鋼を腐食するため、
非めっき面を耐食性塗料などで被覆しなければならな
い、 めっき層を必要とする厚さ以上の厚さにすることは、
めっき処理時間を長くさせるだけでなく、機械研磨工程
を必要とし、いずれもコストアップにつながる、 めっき面の表面性状を均一にするには、より精度の高
い管理が要求されるため、めっき浴の撹拌、電流密度お
よび電極の配置などの調整が必要であり、設備の改造な
どを必要とする、 光沢剤はめっき層を緻密で平滑にするためめっき液に
添加されるが、これは有機物質からなるものが多く、こ
れらの分解不純物がめっき層に電析して、めっき層の物
性を劣化させる。The copper sulfate plating bath corrodes steel,
It is necessary to cover the non-plated surface with a corrosion-resistant paint, etc.
In addition to prolonging the plating process time, it requires a mechanical polishing process, all of which lead to cost increases.To make the surface properties of the plating surface more uniform, more precise control is required. Stirring, adjustment of current density and arrangement of electrodes are required, and equipment remodeling is required.Brightener is added to the plating solution to make the plating layer dense and smooth. In many cases, these decomposed impurities deposit on the plating layer and deteriorate the physical properties of the plating layer.
【0020】本発明の目的は、機械研磨などによる均一
仕上げを必要とせず、めっきしたままの状態でも、めっ
き皮膜の内質が良好で厚めっきできる方法とその装置を
提供するにある。It is an object of the present invention to provide a method and an apparatus for performing thick plating with good quality of a plating film even when plating is performed without requiring uniform finishing by mechanical polishing or the like.
【0021】[0021]
【課題を解決するための手段】本発明者らは、硫酸銅め
っき浴を用いて厚めっきを施しためっき層の調査を行
い、従来下地ストライクに使用しているシアン化銅めっ
き浴によるめっき方法を適用できないか、と考え研究を
行った。その結果、めっき面を研掻することにより、内
質の良好な厚めっき層が得られることを確認し、本発明
を完成した。この発明の要旨は、下記のに示すリター
ダ円筒部材のめっき方法と図1に示すめっき装置にあ
る。Means for Solving the Problems The present inventors investigated a plating layer which was thickly plated using a copper sulfate plating bath, and found that a plating method using a copper cyanide plating bath conventionally used for an underlying strike. We studied whether or not it could be applied. As a result, it was confirmed that a good-quality thick plating layer could be obtained by polishing the plating surface, and the present invention was completed. The gist of the present invention resides in a plating method for a retarder cylindrical member described below and a plating apparatus shown in FIG.
【0022】円筒部材1の軸中央部に陽電極15が設け
られ、かつ円筒部材の内表面に接触する摩擦ローラー16
が設けられためっき装置を用い、円筒部材と摩擦ローラ
ーとを回転させながら円筒部材の内表面を研掻しつつめ
っきする渦電流式減速装置用円筒部材のめっき方法。そ
のめっき浴にはシアン化銅系溶液を用いるのが望まし
い。A positive electrode 15 is provided at the center of the shaft of the cylindrical member 1, and a friction roller 16 which contacts the inner surface of the cylindrical member.
A plating method for a cylindrical member for an eddy current type reduction gear, wherein the plating is performed while the inner surface of the cylindrical member is being polished while rotating the cylindrical member and the friction roller by using a plating apparatus provided with. It is desirable to use a copper cyanide solution for the plating bath.
【0023】渦電流式減速装置に装着される回転子の
円筒部材内表面をめっきする装置であって、めっき槽22
の中央部に円筒状に配設された円柱状の陽電極15を懸架
する支柱19が設けられ、その支柱からのびる支持アーム
25とめっき槽22に水封的に固定された軸受け26とによっ
て支持された摩擦ローラー16が設けられ、かつ支柱19の
内部にはめっきされる回転子の円筒部材1を保持する保
持具17の回転アーム18を支持する回転軸20が設けられて
いる渦電流式減速装置用円筒部材のめっき装置。An apparatus for plating an inner surface of a cylindrical member of a rotor mounted on an eddy current type reduction gear, wherein a plating tank 22
A support 19 for suspending a cylindrical positive electrode 15 disposed in a cylindrical shape is provided at the center of the support arm, and a support arm extending from the support is provided.
A friction roller 16 supported by a bearing 25 fixed to the plating tank 22 in a water-sealing manner is provided, and a support 17 for holding a cylindrical member 1 of a rotor to be plated is provided inside a column 19. A plating apparatus for a cylindrical member for an eddy current type reduction gear provided with a rotating shaft 20 that supports a rotating arm 18.
【0024】本発明が対象とするめっき厚さは、100〜5
00μmである。The plating thickness targeted by the present invention is 100 to 5
00 μm.
【0025】[0025]
【発明の実施の形態】硫酸銅めっき浴を用いてめっきさ
れたリターダの円筒部材は、制動試験を行うと、めっき
層が剥離したり、割れ、またはピット欠陥が発生するこ
とがある。発明者らは、これらについて調査を行い、次
のことを明らかにした。BEST MODE FOR CARRYING OUT THE INVENTION When a braking test is performed on a cylindrical member of a retarder plated using a copper sulfate plating bath, a plating layer may peel off, crack, or generate pit defects. The inventors investigated these and found the following.
【0026】めっき層の剥離:硫酸銅めっき浴には、め
っき層の表面を平滑にするために硫黄を含む光沢剤が添
加されている。この硫黄は、めっき層中に共析している
ので、円筒部材が高温に曝されると、拡散して界面に濃
縮され、めっき層が剥離する。Stripping of plating layer: A brightener containing sulfur is added to the copper sulfate plating bath in order to smooth the surface of the plating layer. Since this sulfur is eutectoid in the plating layer, when the cylindrical member is exposed to a high temperature, it diffuses and concentrates on the interface, and the plating layer peels off.
【0027】めっき層の割れ:光沢剤を添加しためっき
浴でめっきを行っためっき層は、無添加のものに比較し
て引張り伸びが約1/3に低下するので、制動オン、また
はオフの切り換えによる膨張、収縮によって割れが発生
する。Cracking of plating layer: A plating layer plated in a plating bath to which a brightening agent has been added has a tensile elongation reduced to about 1/3 as compared with a plating layer to which no plating agent has been added. Cracks occur due to expansion and contraction due to switching.
【0028】ピット欠陥:銅めっき層は、軟質で損傷さ
れやすいので、この層の上にニッケル−りん合金などの
保護膜が被覆されている。しかし、前記工程の(G)に示
すようにめっき面の機械研磨加工を行うと、砥粒がめっ
き表面に残存することがあり、この砥粒が保護膜を被覆
するときピット欠陥となる。Pit defects: Since the copper plating layer is soft and easily damaged, a protective film such as a nickel-phosphorus alloy is coated on this layer. However, when the mechanical polishing of the plated surface is performed as shown in (G) of the above process, abrasive grains may remain on the plated surface, and when these abrasive grains cover the protective film, they become pit defects.
【0029】これらの知見の基に、従来、下地ストライ
ク処理に使用していたシアン化銅めっき浴を使用するこ
とを考え、シアン化銅めっき浴について調査を行い、下
記に示すような利点と欠点があることをつきとめた。そ
の結果、(6)の欠点を解決すれば、処理時間を長くする
ことによって、厚めっきに適用できると考え、その方法
についての研究を行った。Based on these findings, considering the use of a copper cyanide plating bath which has been used in the underground strike treatment, a study was conducted on the copper cyanide plating bath, and the advantages and disadvantages as described below were obtained. I have found that there is. As a result, if the disadvantage of (6) is solved, it is thought that it can be applied to thick plating by extending the processing time, and the research on the method was conducted.
【0030】利点: (1)電流密度の変動によるめっき厚さのばらつきが少な
い、(2)アルカリ性浴のため鋼材を腐食させない、(3)析
出する結晶粒の大きさが微細で、めっき層の組織が緻密
で欠陥が少ない、(4)鋼材に直接めっきができ、密着性
が良好である。Advantages: (1) Variations in plating thickness due to fluctuations in current density are small, (2) Steel material is not corroded due to the alkaline bath, (3) The size of precipitated crystal grains is fine, (4) It can be plated directly on steel and has good adhesion.
【0031】欠点: (5)めっき速度が10μm/時間と低い、(6)厚めっきする
とめっき表面には銅が瘤状に析出する、(7)電流を
(+)、(−)と交番させるので、時間のロスが大き
い。Disadvantages: (5) The plating rate is as low as 10 μm / hour, (6) When thick plating is performed, copper deposits on the plating surface in the form of bumps, and (7) The current is alternated with (+) and (−). Therefore, time loss is large.
【0032】瘤の発生を防止するには、光沢剤を添加す
ればよいが、光沢剤には前述したような欠陥(めっき層
の剥離、引張り伸びの低下)が発生することもあり、め
っき中に機械的に除去する方法を考えた。In order to prevent the formation of bumps, a brightener may be added. However, the brightener may have the above-described defects (peeling of the plating layer, decrease in tensile elongation), A method of mechanical removal was considered.
【0033】JIS SCM415系合金鋼(0.1%C-0.5%Mo-0.05%
V鋼)からなるリターダの円筒部材を用意し、下記のめ
っき浴およびめっき条件でナイロンブラシによって研掻
しながらめっきを行った。JIS SCM415 alloy steel (0.1% C-0.5% Mo-0.05%
V) was prepared, and plating was performed while polishing with a nylon brush in the following plating bath and plating conditions.
【0034】めっき浴 シアン化第一銅 : 80 g/リットル、 シアン化ナトリウム:100 g/リットル、 炭酸ナトリウム : 30 g/リットル、 水酸化ナトリウム :塩基度調整のための必要量 分析組成 銅: 50 g/リットル、 同上遊離シアン化物: 10 g/リットル、 めっき条件 pH :12、 浴温度 :50℃、 電流密度: 3A/dm2、 処理時間: 8時間。Plating bath Cuprous cyanide: 80 g / liter, sodium cyanide: 100 g / liter, sodium carbonate: 30 g / liter, sodium hydroxide: necessary amount for adjusting basicity, analytical composition copper: 50 g / l, same as above. Free cyanide: 10 g / l, plating conditions pH: 12, bath temperature: 50 ° C, current density: 3 A / dm 2 , treatment time: 8 hours.
【0035】得られためっき層を調査した結果、 (1)めっき表面は、平滑となり、鏡面を呈するものもあ
る。As a result of examining the obtained plating layers, (1) the plating surface is smooth and some of them have a mirror surface.
【0036】(2)内部欠陥のない、緻密な組織である。(2) A dense structure without internal defects.
【0037】(3)電流の交番を行わなくとも、上記(1)お
よび(2)の性能は得られる。(3) The performances of the above (1) and (2) can be obtained without alternating the current.
【0038】(4)電流密度を1A/dm2から4A/dm
2まで高めることができる。(4) The current density is increased from 1 A / dm 2 to 4 A / dm 2
Can be increased up to 2 .
【0039】これらの結果から、リターダの円筒部材の
内表面をシアン化銅浴でめっきする方法として、回転摩
擦方式によるめっき方法を開発した。From these results, a plating method using a rotary friction method was developed as a method for plating the inner surface of the cylindrical member of the retarder with a copper cyanide bath.
【0040】図1は、本発明のめっき装置の一例を示す
図であり、(a)は平面図、(b)は(a)図のA-A断面図であ
る。FIG. 1 is a view showing an example of the plating apparatus of the present invention, wherein (a) is a plan view and (b) is a sectional view taken along the line AA of (a).
【0041】回転子の円筒部材1は、その外周部を3本
の保持具17に支持され、回転アーム18と支柱19を貫通す
る回転軸20および大歯車21によって回転できるように保
持されている。そして、円筒部材をめっき時の陰電極と
すため、回転軸の一端を電気的に接続する(図示せ
ず)。The cylindrical member 1 of the rotor has its outer peripheral portion supported by three holders 17 and is held so as to be rotatable by a rotating shaft 20 and a large gear 21 penetrating through a rotating arm 18 and a support column 19. . Then, in order to use the cylindrical member as a negative electrode during plating, one end of the rotating shaft is electrically connected (not shown).
【0042】支柱19は、円筒であり、めっき槽22に固定
されている。支柱の内部には、軸受け23に支持された回
転軸20が貫通し、その外周部に陽電極15を懸架するアー
ム24と、摩擦ローラー16を支持する支持アーム25とが取
り付けられている。支柱の材質は、陽電極と円筒部材と
の支持部材を絶縁するため、テフロン(商品名)のよう
な電気絶縁性材料で製作するのが望ましい。The column 19 is a cylinder and is fixed to the plating tank 22. A rotating shaft 20 supported by a bearing 23 penetrates through the inside of the support column, and an arm 24 for suspending the positive electrode 15 and a support arm 25 for supporting the friction roller 16 are attached to the outer periphery thereof. It is desirable that the column be made of an electrically insulating material such as Teflon (trade name) in order to insulate the supporting member between the positive electrode and the cylindrical member.
【0043】摩擦ローラー16は、表面にナイロン(商品
名)繊維を植え付けたローラーであり、支柱に取り付け
た支持アーム25とめっき槽22に取り付けた軸受け26によ
って水封的に支持され、歯車27によって円筒部材1と反
対方向に回転する。大歯車21は、図示しない駆動装置に
よって回転させられる。The friction roller 16 is a roller having nylon (trade name) fiber implanted on its surface. The friction roller 16 is water-sealed by a support arm 25 attached to a column and a bearing 26 attached to a plating tank 22. It rotates in the direction opposite to the cylindrical member 1. The large gear 21 is rotated by a driving device (not shown).
【0044】陽電極15は、銅からなる円筒であり、アー
ム24に懸架され、電気的に接続されている。The positive electrode 15 is a cylinder made of copper, suspended on an arm 24, and electrically connected.
【0045】次に、図1に示す装置を用い、リターダ回
転子の円筒部材内表面をめっきする方法について説明す
る。Next, a method for plating the inner surface of the cylindrical member of the retarder rotor using the apparatus shown in FIG. 1 will be described.
【0046】図1に示すように、円筒部材1は、3本の
保持具17に取り付けられ、回転アーム18の中心をめっき
槽22に設けられた回転軸20に取り付けられる。めっき槽
22には、陽電極15と摩擦ローラー16が配置されており、
円筒部材1と陽電極15がめっき浴28を介して電気的につ
ながれている。めっき槽22の下部に設けられた大歯車21
を回転することによって、円筒部材1と摩擦ローラー16
とが反対方向に回転する。As shown in FIG. 1, the cylindrical member 1 is attached to three holders 17, and the center of the rotating arm 18 is attached to a rotating shaft 20 provided in a plating tank 22. Plating tank
On 22, a positive electrode 15 and a friction roller 16 are arranged,
The cylindrical member 1 and the positive electrode 15 are electrically connected via a plating bath. Large gear 21 provided at the bottom of plating tank 22
By rotating the cylindrical member 1 and the friction roller 16
And rotate in the opposite direction.
【0047】円筒部材を回転させながら内表面に陽電極
の銅を析出させるので、たとえ偏心があったしとても、
均一な厚さでめっきすることができる。また、摩擦ロー
ラー16を円筒部材1の内表面に接触させて回転させるの
で、瘤状に析出した銅が研掻・除去されるので、めっき
面を滑らかにすることができる。Since the positive electrode copper is deposited on the inner surface while rotating the cylindrical member, even if there is eccentricity,
It can be plated with a uniform thickness. Further, since the friction roller 16 is rotated while being in contact with the inner surface of the cylindrical member 1, the copper deposited in the form of a knob is polished and removed, so that the plated surface can be smoothed.
【0048】このように円筒部材を回転させ、その内表
面を摩擦ローラーで研掻しながらめっきすることによっ
て、厚さが均一で、組織の微細なめっき層が得られ、従
来のようにめっき層を機械研磨加工する必要がない。By rotating the cylindrical member and plating the inner surface of the cylindrical member with a friction roller, a plated layer having a uniform thickness and a fine structure can be obtained. Need not be mechanically polished.
【0049】[0049]
【実施例】内径が400mm、幅が70mm、フィン外周部の直
径が450mmである円筒部材を用意し、下記のめっき条件
で、本発明の回転式めっき装置(図1において、1個の
円筒部材を装入できる装置)を用い、めっきを行った。
また、比較のため同じめっき条件で、めっき浴のみを撹
拌する方法および円筒部材を上下に揺動する方法によっ
てめっきする実験を行った。EXAMPLE A cylindrical member having an inner diameter of 400 mm, a width of 70 mm, and a diameter of an outer peripheral portion of a fin of 450 mm was prepared, and a rotary plating apparatus of the present invention (one cylindrical member in FIG. The plating was carried out using a device capable of charging the same.
Further, for comparison, an experiment was conducted under the same plating conditions by plating only the plating bath and by swinging the cylindrical member up and down.
【0050】めっき浴 シアン化第一銅 : 80 g/リットル、 シアン化ナトリウム:100 g/リットル、 炭酸ナトリウム : 30 g/リットル、 水酸化ナトリウム :塩基度調整のための必要量 分析組成 銅: 50 g/リットル、 同上遊離シアン化物: 10 g/リットル、 めっき条件 pH :12、 浴温度 :50℃、 電流密度: 3A/dm2、 処理時間: 8時間。Plating bath Cuprous cyanide: 80 g / liter, sodium cyanide: 100 g / liter, sodium carbonate: 30 g / liter, sodium hydroxide: necessary amount for basicity adjustment Analytical composition Copper: 50 g / l, same as above. Free cyanide: 10 g / l, plating conditions pH: 12, bath temperature: 50 ° C, current density: 3 A / dm 2 , treatment time: 8 hours.
【0051】めっき後のめっき厚さの測定と、このめっ
き層の上にさらに保護膜として、厚さ15μmのニッケル
層をワット浴を用いて電気めっき法(浴温度50℃、電流
密度5A/dm2)によって形成した後、熱サイクル試験を
行った。それらの結果を表1に示した。The plating thickness was measured after plating, and a nickel layer having a thickness of 15 μm was further electroplated as a protective film on the plating layer using a Watt bath (bath temperature 50 ° C., current density 5 A / dm. After forming according to 2 ), a heat cycle test was performed. The results are shown in Table 1.
【0052】[0052]
【表1】 [Table 1]
【0053】めっき厚さの測定は、電磁膜厚計によって
行った。その測定位置は、図3に示すように円筒部材の
内周部を8等分し、端面から軸方向の10mm位置(X)、35m
m位置(Y)および60mm位置(Z)の合計24カ所である。表1
において、めっき厚さのバラツキ「円周方向」とあるの
は、上記の(X)、(Y)および(Z)のそれぞれの位置で、8等
分された位置の最大めっき厚さと最小めっき厚さとの差
を表し、「軸方向」とあるのは、8等分されたそれぞれ
の位置において、(X)、(Y)および(Z)の最大厚さと最小厚
さとの差(8点)の最大値を表わす。The plating thickness was measured with an electromagnetic film thickness meter. As shown in FIG. 3, the measurement position is such that the inner peripheral portion of the cylindrical member is divided into eight equal parts, a position 10 mm (X) in the axial direction from the end face, 35 m
There are a total of 24 locations: the m position (Y) and the 60 mm position (Z). Table 1
In the above, the variation in the plating thickness "circumferential direction" means the maximum plating thickness and the minimum plating thickness at the positions of (X), (Y) and (Z) divided into eight equal parts. "Axial direction" means the difference (8 points) between the maximum thickness and the minimum thickness of (X), (Y) and (Z) at each of the eight equally divided positions. Indicates the maximum value.
【0054】熱サイクル試験は、試験体を加熱炉に装入
し、100℃から600℃までを5分間で昇温し、600℃から1
00℃までを10分間で降温する熱サイクルを与えた。そし
て、1000サイクルごとに炉から取り出し、めっき面の亀
裂および剥離の発生を観察した。それらの結果を表1に
あわせて示した。In the heat cycle test, the test specimen was charged into a heating furnace, and the temperature was raised from 100 ° C. to 600 ° C. in 5 minutes, and the temperature was raised from 600 ° C. to 1 ° C.
A heat cycle was given to cool to 00 ° C. in 10 minutes. Then, it was taken out of the furnace every 1000 cycles, and the occurrence of cracks and peeling on the plated surface was observed. The results are shown in Table 1.
【0055】発明例の試験体番号1、2および3の円筒
部材は、回転式めっき方法を用いて得られたので、めっ
き厚さのバラツキは円周方向で5μm以下、軸方向で15
μm以下と良好である。また、5000回の熱サイクル試験
後、めっき層の亀裂または剥離の発生はいずれも認めら
れなかった。Since the cylindrical members of the test pieces Nos. 1, 2 and 3 of the invention were obtained by using the rotary plating method, the variation in the plating thickness was 5 μm or less in the circumferential direction and 15 μm in the axial direction.
μm or less, which is good. After 5000 thermal cycle tests, neither cracking nor peeling of the plating layer was observed.
【0056】これに対し比較例の試験体番号4、5およ
び6の円筒部材は、揺動式めっき方法を用いて得られた
ので、めっき厚さのバラツキは円周方向で34〜197μ
m、軸方向で173〜258μmと、バラツキが大きい。ま
た、熱サイクル試験では、1000回または2000回で亀裂
が、3000回または4000回で剥離の発生が認められた。試
験体番号7および8の円筒部材は、撹拌式めっき方法を
用いて得られたので、めっき厚さのバラツキは円周方向
で121〜226μm、軸方向で214〜278μmと、バラツキが
大きい。また、熱サイクル試験では、1000回で亀裂が、
3000回で剥離の発生が認められた。On the other hand, since the cylindrical members of the test pieces Nos. 4, 5 and 6 of the comparative examples were obtained by using the oscillating plating method, the variation in the plating thickness was 34 to 197 μm in the circumferential direction.
m, 173 to 258 μm in the axial direction, with large variations. In the thermal cycle test, cracks were observed after 1000 or 2000 times, and peeling was observed after 3000 or 4000 times. Since the cylindrical members of specimens Nos. 7 and 8 were obtained by using the stirring plating method, the plating thickness varied greatly in the circumferential direction from 121 to 226 µm and in the axial direction from 214 to 278 µm. Also, in the heat cycle test, cracks occur 1000 times,
Peeling was observed at 3000 times.
【0057】[0057]
【発明の効果】回転摩擦ローラーによってめっき面を研
掻する本発明のめっき方法は、シアン化銅系めっき浴に
よる厚めっきを可能とし、非めっき面のマスキングを不
要とする。また、光沢剤などの添加を必要としないで、
均一で、組織の緻密な、物性のよいめっき層を得ること
ができる。このため、従来行っていた機械研磨加工が不
要となる。The plating method of the present invention, in which the plated surface is polished by a rotating friction roller, enables thick plating using a copper cyanide plating bath and eliminates the need for masking of the non-plated surface. Also, without the need to add brighteners,
It is possible to obtain a uniform, dense, and well-structured plating layer. For this reason, the mechanical polishing conventionally performed becomes unnecessary.
【0058】本発明のめっき装置およびめっき方法を用
いて円筒部材の内表面をめっきしたリターダは、制動性
能を向上させるとともに、制動の繰り返しによってもめ
っき層の劣化(亀裂や剥離の発生)がなく、耐久性に優
れたものである。The retarder in which the inner surface of the cylindrical member is plated by using the plating apparatus and the plating method of the present invention can improve the braking performance and prevent the plating layer from being deteriorated (crack or peeling) even by repeated braking. , With excellent durability.
【図1】本発明のめっき装置の一例を示す図であり、
(a)は平面図、(b)は(a)図のA-A断面図である。FIG. 1 is a view showing one example of a plating apparatus of the present invention;
(a) is a plan view, and (b) is an AA cross-sectional view of (a).
【図2】永久磁石を使用したリターダの一例を示す縦断
面図である。FIG. 2 is a longitudinal sectional view showing an example of a retarder using a permanent magnet.
【図3】リターダの円筒部材を示す図であり、(a)は縦
断面図、(b)は平面図である。3A and 3B are diagrams showing a cylindrical member of the retarder, wherein FIG. 3A is a longitudinal sectional view, and FIG. 3B is a plan view.
1.円筒部材 2.スポーク 3.ディスク 4.フィン 5.ブラケット 6.回転軸 7.永久磁石 8.支持リング 9.ポールピース 10.ケーシング 11.案内棒 12.駆動装置 13.ピストンロッド 14.被めっき面 15.陽電極 16.摩擦ローラー 17.保持具 18.回転アーム 19.支柱 20.回転軸 21.大歯車 22.めっき槽 23.軸受け 24.アーム 25.支持アーム 26.軸受け 27.歯車 28.めっき浴 R.回転子 S.ステータ X、Y、Z.めっき厚さ測定位置 1. 1. cylindrical member Spokes 3. Disk 4. Fins 5. Bracket 6. Rotation axis 7. 7. permanent magnet Support ring 9. Pole piece 10. Casing 11. Guide rod 12. Drive unit 13. Piston rod 14. Plated surface 15. Positive electrode 16. Friction roller 17. Holder 18. Rotating arm 19. Prop 20. Rotary axis 21. Large gear 22. Plating tank 23. Bearing 24. Arm 25. Support arm 26. Bearing 27. Gear 28. Plating bath Rotor S. Stator X, Y, Z. Plating thickness measurement position
───────────────────────────────────────────────────── フロントページの続き (72)発明者 石田 昭佳 大阪府大阪市此花区島屋5丁目1番109号 住友金属工業株式会社関西製造所製鋼品事 業所内 (72)発明者 中村 克弘 大阪府東大阪市柏田西1丁目12番26号帝国 イオン株式会社内 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Shoka Ishida 5-1-1109 Shimaya, Konohana-ku, Osaka-shi 1-12-26 Kashiwada Nishi, Higashiosaka-shi Teikoku Aeon Co., Ltd.
Claims (3)
筒部材内表面をめっきする方法であって、円筒部材の軸
中央部に陽電極が設けられ、かつ円筒部材の内表面に接
触して回転する摩擦ローラーが設けられた装置を用い、
摩擦ローラーでめっき面を研掻し、かつ円筒部材を回転
させながらめっきすることを特徴とする渦電流式減速装
置用円筒部材のめっき方法。1. A method of plating an inner surface of a cylindrical member of a rotor mounted on an eddy current type speed reducer, wherein a positive electrode is provided at a central portion of a shaft of the cylindrical member, and the inner surface of the cylindrical member is in contact with the positive electrode. Using a device provided with a friction roller that rotates
A plating method for a cylindrical member for an eddy current type reduction gear, wherein a plating surface is polished with a friction roller and plating is performed while rotating the cylindrical member.
ことを特徴とする請求項1に記載の渦電流式減速装置用
円筒部材のめっき方法。2. The method for plating a cylindrical member for an eddy current type reduction gear according to claim 1, wherein a copper cyanide solution is used as a plating bath.
筒部材内表面をめっきする装置であって、めっき槽の中
央部に円筒状に配設された円柱状の陽電極を懸架する支
柱が設けられ、その支柱からのびる支持アームとめっき
槽に水封的に固定された軸受けとによって支持された摩
擦ローラーが設けられ、かつ支柱の内部にはめっきされ
る回転子の円筒部材を保持する保持具の回転アームを支
持する回転軸が設けられていることを特徴とする渦電流
式減速装置用円筒部材のめっき装置。3. An apparatus for plating an inner surface of a cylindrical member of a rotor mounted on an eddy current type reduction gear, wherein a cylindrical positive electrode disposed in a cylindrical shape at a center of a plating tank is suspended. A strut is provided, a friction roller supported by a support arm extending from the strut and a bearing water-sealed to the plating tank is provided, and a cylindrical member of a rotor to be plated is held inside the strut. A plating device for a cylindrical member for an eddy current type reduction gear, comprising: a rotating shaft that supports a rotating arm of a holding tool to be provided.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30179397A JP3205531B2 (en) | 1997-11-04 | 1997-11-04 | Plating method of cylindrical member for eddy current type reduction gear and its apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30179397A JP3205531B2 (en) | 1997-11-04 | 1997-11-04 | Plating method of cylindrical member for eddy current type reduction gear and its apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH11140687A true JPH11140687A (en) | 1999-05-25 |
JP3205531B2 JP3205531B2 (en) | 2001-09-04 |
Family
ID=17901251
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP30179397A Expired - Lifetime JP3205531B2 (en) | 1997-11-04 | 1997-11-04 | Plating method of cylindrical member for eddy current type reduction gear and its apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3205531B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103673861A (en) * | 2013-11-12 | 2014-03-26 | 富士施乐高科技(深圳)有限公司 | Non-metallic shaft film thickness measuring method and system |
-
1997
- 1997-11-04 JP JP30179397A patent/JP3205531B2/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103673861A (en) * | 2013-11-12 | 2014-03-26 | 富士施乐高科技(深圳)有限公司 | Non-metallic shaft film thickness measuring method and system |
Also Published As
Publication number | Publication date |
---|---|
JP3205531B2 (en) | 2001-09-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
AU2002321112B2 (en) | Process for electroplating metallic and metall matrix composite foils, coatings and microcomponents | |
US20040256236A1 (en) | Compositions and coatings including quasicrystals | |
TW384319B (en) | Process for coating the face of a part made of aluminum or aluminum alloy | |
JP2938151B2 (en) | Method of applying abrasive layer to titanium alloy compressor airfoil | |
KR20010022951A (en) | THE APPARATUS FOR MANUFACTURING Ni-Fe ALLOY THIN FOIL | |
JP2016519002A (en) | Grinding sawing wire and its manufacturing method and use | |
Shawki et al. | Deposition of high wear resistance of Ni‐composite coatings | |
JP3205531B2 (en) | Plating method of cylindrical member for eddy current type reduction gear and its apparatus | |
JP2002069689A (en) | Method for electroplating on powder | |
JPS6328839A (en) | Overlay alloy for bearing | |
CS204967B2 (en) | Xerographic band and method of making the same | |
JP2002146588A (en) | Metal plating method | |
JPS6328896A (en) | Method and apparatus for electrodeposition of bearing alloy | |
US4720329A (en) | Apparatus and method for the electrolytic plating of layers onto computer memory hard discs | |
US5385660A (en) | Dendritic growth assisted electroform separation | |
JP2012176483A (en) | Method for manufacturing abrasive grain-fixed wire | |
EP0972861A2 (en) | Laminated chromium plating layers having superior wear resistance and fatigue strength | |
JP3351710B2 (en) | Plating method | |
GB2271578A (en) | Pretreatment of light metals with phosphoric acid; electroless deposition | |
KR101826428B1 (en) | Method for manufacturing grinding tool with aluminium diamond grinder | |
Isern et al. | Particle distribution, film formation and wear performance of brush plated Ni/WC | |
JP3375549B2 (en) | Composite plating method for cylindrical members | |
JP3492449B2 (en) | Plating method and plating apparatus | |
JPH06272078A (en) | Electroplating method | |
JP4342066B2 (en) | Core wire holder |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090629 Year of fee payment: 8 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100629 Year of fee payment: 9 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100629 Year of fee payment: 9 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110629 Year of fee payment: 10 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110629 Year of fee payment: 10 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120629 Year of fee payment: 11 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130629 Year of fee payment: 12 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313115 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130629 Year of fee payment: 12 |
|
R371 | Transfer withdrawn |
Free format text: JAPANESE INTERMEDIATE CODE: R371 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313115 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130629 Year of fee payment: 12 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
EXPY | Cancellation because of completion of term |