JPH11135915A - Manufacture of ceramic circuit board - Google Patents

Manufacture of ceramic circuit board

Info

Publication number
JPH11135915A
JPH11135915A JP29449897A JP29449897A JPH11135915A JP H11135915 A JPH11135915 A JP H11135915A JP 29449897 A JP29449897 A JP 29449897A JP 29449897 A JP29449897 A JP 29449897A JP H11135915 A JPH11135915 A JP H11135915A
Authority
JP
Japan
Prior art keywords
iodine
etching
brazing
unnecessary
copper plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP29449897A
Other languages
Japanese (ja)
Inventor
Koichi Nakasu
浩一 中洲
Toshiyuki Yoshikata
敏之 芳片
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal SMI Electronics Device Inc
Okuno Chemical Industries Co Ltd
Original Assignee
Sumitomo Metal SMI Electronics Device Inc
Okuno Chemical Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal SMI Electronics Device Inc, Okuno Chemical Industries Co Ltd filed Critical Sumitomo Metal SMI Electronics Device Inc
Priority to JP29449897A priority Critical patent/JPH11135915A/en
Publication of JPH11135915A publication Critical patent/JPH11135915A/en
Withdrawn legal-status Critical Current

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  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

PROBLEM TO BE SOLVED: To reduce the removal treatment time of an unnecessary brazing material, by etching a metallic plate which is joined to a ceramic board using a brazing material, and then using water solution wherein iodine and iodine compound are added. SOLUTION: Silver brazing paste is applied all over a ceramic substrate 10. A copper plate 14 is put on it and is heated to 790 to 1063 deg.C, and the copper plate 14 and the ceramic substrate 10 are brazed. Silver brazing paste fuses to constitute a silver brazing layer 16. The copper plate 14 is provided with an etching resist layer 18 and is etched by liquid of cupric chloride and hydrochloric acid for forming a specified circuit. An unnecessary silver brazing layer 16' is removed by using etchant containing iodine and iodine compound at least 5 wt.% in the total. A peeling time (15 minutes) can be greatly reduced by using solution of iodine (5%) and iodine compound (potassium iodide 30%) for etching an unnecessary brazing material layer in this way.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、活性金属ろう法に
よるセラミックス回路基板の製造方法、特にセラミック
ス基板上に金属板をろう材を用いて接合する回路基板の
製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a ceramic circuit board by an active metal brazing method, and more particularly to a method for manufacturing a circuit board in which a metal plate is joined on a ceramic substrate using a brazing material.

【0002】[0002]

【従来の技術】セラミックス回路基板の製造方法、例え
ば、金属ろうとして銀ろうを用いる活性銀ろう法による
DBC 基板 (Direct BondingCopper Substrate) の製造方
法にあっては、セラミックス基板に活性銀ろうを塗布
し、その上に銅板を載せてろう付けを行い、次いでレジ
スト層を印刷してから銅板をエッチングすることにより
所定回路を形成し、最後に回路基板から不要の銀ろうを
再びエッチングにより除去するのである。
2. Description of the Related Art A method for manufacturing a ceramic circuit board, for example, by an active silver brazing method using silver brazing as a metal brazing.
In the method of manufacturing the DBC substrate (Direct Bonding Copper Substrate), active silver solder is applied to a ceramic substrate, a copper plate is placed on the substrate, brazing is performed, a resist layer is printed, and then the copper plate is etched. To form a predetermined circuit, and finally, unnecessary silver solder is removed again from the circuit board by etching.

【0003】従来、その不要のろう材のエッチング除去
にはフッ化水素アンモニウム等のフッ化物溶液、あるい
はフッ化物+過酸化水素溶液などを主成分とするエッチ
ング液が使われていた。しかし、そのようなエッチング
液ではエッチングスピードが遅いため、厚み30μm程度
のろう材を除去するのに30分以上の時間を要していた。
加えて過酸化水素を使用する場合は同成分の自然分解に
よりエッチング液の組成が経時的に変化することがある
ため、エッチング液を長期間使用するには液組成の厳重
な分析、管理を必要としており、液管理に手間がかかっ
ていた。
Conventionally, an etching solution containing a fluoride solution such as ammonium hydrogen fluoride or a fluoride + hydrogen peroxide solution as a main component has been used for removing the unnecessary brazing material by etching. However, since such an etching solution has a low etching speed, it takes 30 minutes or more to remove a brazing material having a thickness of about 30 μm.
In addition, when hydrogen peroxide is used, the composition of the etchant may change over time due to spontaneous decomposition of the same component, so strict analysis and management of the solution composition is necessary for long-term use of the etchant. And it took time to manage the liquid.

【0004】[0004]

【発明が解決しようとする課題】したがって、従来の活
性銀ろう法によるDBC 基板の製造は、コスト的にも問題
があり、また性能的にもバラツキの見られる傾向があっ
た。
Therefore, the production of a DBC substrate by the conventional active silver brazing method has a problem in terms of cost and tends to show variations in performance.

【0005】ここに、本発明は、従来法のエッチング液
と比較してより安定したエッチング液を使用して、さら
に短時間にろう材のエッチングが可能な方法を提供する
ことで、上述のような従来技術の問題を解決しようとす
るのである。
Here, the present invention provides a method capable of etching a brazing material in a shorter time using a more stable etching solution as compared with a conventional etching solution. It is intended to solve the problems of the prior art.

【0006】[0006]

【課題を解決するための手段】本発明者らは、上述の課
題解決のために、ろう材のエッチングスピードの高速
化、およびエッチング液の安定化のため、種々成分のエ
ッチング液を評価した結果、ヨウ素およびヨウ素化合物
を主成分とする溶液を使用することで、上記課題が達成
できることを見い出し、本発明を完成した。
Means for Solving the Problems In order to solve the above-mentioned problems, the present inventors evaluated the etching solutions of various components in order to increase the etching speed of the brazing material and stabilize the etching solutions. It has been found that the above-mentioned object can be achieved by using a solution containing iodine and an iodine compound as main components, and the present invention has been completed.

【0007】ここに、本発明は、セラミックス基板にろ
う材を介して金属板を接合した後、該金属板を所定形状
にエッチングし、次いでヨウ素およびヨウ素化合物を含
む水溶液で不要ろう材を除去することを特徴とするセラ
ミックス回路基板の製造方法である。
According to the present invention, after joining a metal plate to a ceramic substrate via a brazing material, the metal plate is etched into a predetermined shape, and then unnecessary brazing material is removed with an aqueous solution containing iodine and an iodine compound. A method for manufacturing a ceramic circuit board, comprising:

【0008】[0008]

【発明の実施の形態】次に、本発明を添付図面を参照し
ながら、さらに具体的に説明する。なお、以下において
は活性銀ろう法によるDBC 基板の製法方法を例にとって
本発明を説明する。
Next, the present invention will be described more specifically with reference to the accompanying drawings. In the following, the present invention will be described by taking a method of manufacturing a DBC substrate by an active silver soldering method as an example.

【0009】図1(a)〜(d) は、本発明にかかるセラミ
ックス回路基板の製造方法の各工程を示すもので、図1
(a) においてはセラミックス基板10の上に銀ろうペース
ト12を適宜手段で全面的に塗布する。次いで、この上
に、銅板14を載せて、例えば 790〜1063℃に加熱し、銅
板とセラミックス基板とをろう付けする。このとき銀ろ
うペースト12は溶融して銀ろう層16を構成する。図1
(b) 参照。
FIGS. 1 (a) to 1 (d) show each step of the method for manufacturing a ceramic circuit board according to the present invention.
In (a), a silver brazing paste 12 is applied on the entire surface of a ceramic substrate 10 by appropriate means. Next, the copper plate 14 is placed thereon and heated to, for example, 790 to 1063 ° C., and the copper plate and the ceramic substrate are brazed. At this time, the silver brazing paste 12 is melted to form the silver brazing layer 16. FIG.
See (b).

【0010】銅板14は回路を構成する素材であり、図1
(c) に示すように、エッチングレジスト層18を設け、次
いで塩化第2銅+塩酸のエッチング液を使用してエッチ
ングを行うことで所定の回路を形成する。
The copper plate 14 is a material constituting a circuit.
As shown in (c), a predetermined circuit is formed by providing an etching resist layer 18 and then performing etching using an etching solution of cupric chloride + hydrochloric acid.

【0011】ここに、前述の銀ろう層16を銅板のエッチ
ング除去と同時には除くことはできない。そのため、従
来にあっては、銅板の回路を一旦形成してから、その回
路部分をマスクした状態で、例えばフッ化物+過酸化水
素溶液によるエッチングを行っていた。
Here, the above-mentioned silver brazing layer 16 cannot be removed simultaneously with the etching removal of the copper plate. Therefore, in the related art, after a circuit of a copper plate is once formed, etching with, for example, a fluoride + hydrogen peroxide solution is performed while the circuit portion is masked.

【0012】しかしながら、本発明の場合には、図1
(d) に示すように、例えば、ヨウ素およびヨウ素化合物
を合計で、5重量%以上含む、好ましくは合計で30重量
%以上含むエッチング溶液を用いて不要の銀ろう層16'
、つまりマスクされなかった領域に存在する銀ろう層1
6' を除去するのである。
However, in the case of the present invention, FIG.
As shown in (d), for example, an unnecessary silver brazing layer 16 ′ is formed by using an etching solution containing iodine and an iodine compound in a total of 5% by weight or more, preferably in a total of 30% by weight or more.
I.e. the silver braze layer 1 in the unmasked areas
Remove 6 '.

【0013】本発明において使用できるヨウ素化合物と
しては、特に制限はないが、アルカリ金属のヨウ化物が
例示される。
The iodine compound that can be used in the present invention is not particularly limited, and examples thereof include an iodide of an alkali metal.

【0014】本発明において用いるエッチング溶液の組
成は、特に制限ないが好ましくは、ヨウ素およびヨウ素
化合物を合計で5重量%以上、好ましくは30重量%以上
含むが、合計量が30重量%以上のときヨウ素は、例えば
2〜10%程度含有される。なお、ヨウ素の上限は20%で
あれば十分である。
The composition of the etching solution used in the present invention is not particularly limited, but preferably contains iodine and an iodine compound in a total amount of 5% by weight or more, preferably 30% by weight or more. Iodine is contained, for example, at about 2 to 10%. It is sufficient that the upper limit of iodine is 20%.

【0015】下掲の表1は、各種エッチング液によるろ
う材のエッチング速度を比較するものである。ただし、
ろう材組成Ag:Cu:Zr=72:26:2、ろう付け層厚さ:
30μm、浸漬温度:30℃であった。
[0015] Table 1 below compares the etching rates of brazing materials with various etchants. However,
Brazing material composition Ag: Cu: Zr = 72: 26: 2, brazing layer thickness:
30 μm, immersion temperature: 30 ° C.

【0016】[0016]

【表1】 表1に示す結果からも、本発明にしたがって不要なろう
材層のエッチングにヨウ素+ヨウ化カリ溶液を使用する
ことにより、剥離時間を大幅に短縮可能であることが分
かる。
[Table 1] From the results shown in Table 1, it can be seen that the use of the iodine + potassium iodide solution for etching the unnecessary brazing material layer according to the present invention can greatly reduce the stripping time.

【0017】また、以上の説明からすでに当業者には理
解されるように、ヨウ素、ヨウ素化合物((例: ヨウ化カ
リウム) は、いずれも過酸化水素のように自然分解はし
ないため、エッチング液の組成は長期間にわたり安定し
ており、その管理は容易である。
As will be understood by those skilled in the art from the above description, iodine and iodine compounds (eg, potassium iodide) do not spontaneously decompose unlike hydrogen peroxide, so that an etching solution Is stable over a long period of time and its management is easy.

【0018】[0018]

【実施例】本例では、予め慣用法によりAlN 基板を作成
し、次いで図1(a) 〜(d) に示す工程にしたがって、セ
ラミックス回路基板を製造した。まず、図1(a) 、(b)
の工程によって、銅板をろう付けし、図1(c) に示す工
程においてエッチングされた銅板をマスク処理してか
ら、露出する不要な銀ろう層16' をエッチング除去し、
そのときの速度を種々のエッチング液について評価し
た。その結果を表2に示す。
EXAMPLE In this example, an AlN substrate was prepared in advance by a conventional method, and then a ceramic circuit substrate was manufactured according to the steps shown in FIGS. 1 (a) to 1 (d). First, FIGS. 1 (a) and (b)
In the step (b), the copper plate is brazed, the copper plate etched in the step shown in FIG. 1 (c) is masked, and the unnecessary unnecessary silver brazing layer 16 'is removed by etching.
The speed at that time was evaluated for various etching solutions. Table 2 shows the results.

【0019】[0019]

【表2】 [Table 2]

【0020】[0020]

【発明の効果】以上説明したように、本発明によれば、
ヨウ素およびヨウ素化合物を主成分とする液でろう材を
エッチングすることで、従来のフッ化物+過酸化水素溶
液によるエッチングと比較して処理時間の短縮が可能と
なった。
As described above, according to the present invention,
By etching the brazing material with a liquid containing iodine and an iodine compound as a main component, the processing time can be reduced as compared with the conventional etching using a fluoride + hydrogen peroxide solution.

【図面の簡単な説明】[Brief description of the drawings]

【図1】図1(a) 〜(d) は、活性銀ろう法によるDBC 基
板の製造方法の工程図である。
1 (a) to 1 (d) are process diagrams of a method for manufacturing a DBC substrate by an active silver brazing method.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 セラミックス基板にろう材を介して金属
板を接合した後、該金属板を所定形状にエッチングし、
次いでヨウ素およびヨウ素化合物を含む水溶液で不要ろ
う材を除去することを特徴とするセラミックス回路基板
の製造方法。
After joining a metal plate to a ceramic substrate via a brazing material, the metal plate is etched into a predetermined shape,
Next, an unnecessary brazing material is removed with an aqueous solution containing iodine and an iodine compound.
JP29449897A 1997-10-27 1997-10-27 Manufacture of ceramic circuit board Withdrawn JPH11135915A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29449897A JPH11135915A (en) 1997-10-27 1997-10-27 Manufacture of ceramic circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29449897A JPH11135915A (en) 1997-10-27 1997-10-27 Manufacture of ceramic circuit board

Publications (1)

Publication Number Publication Date
JPH11135915A true JPH11135915A (en) 1999-05-21

Family

ID=17808554

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29449897A Withdrawn JPH11135915A (en) 1997-10-27 1997-10-27 Manufacture of ceramic circuit board

Country Status (1)

Country Link
JP (1) JPH11135915A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1298970A2 (en) * 2001-09-28 2003-04-02 Dowa Mining Co., Ltd. Method for producing metal/ceramic bonding circuit board
JP2014053619A (en) * 2013-09-30 2014-03-20 Dowa Holdings Co Ltd Method for manufacturing metal-ceramic bonded circuit board
US10314621B2 (en) 2002-05-30 2019-06-11 Warsaw Orthopedic, Inc. Laminoplasty devices and methods

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1298970A2 (en) * 2001-09-28 2003-04-02 Dowa Mining Co., Ltd. Method for producing metal/ceramic bonding circuit board
EP1298970A3 (en) * 2001-09-28 2004-10-20 Dowa Mining Co., Ltd. Method for producing metal/ceramic bonding circuit board
US6918529B2 (en) 2001-09-28 2005-07-19 Dowa Mining Co., Ltd. Method for producing metal/ceramic bonding circuit board
US10314621B2 (en) 2002-05-30 2019-06-11 Warsaw Orthopedic, Inc. Laminoplasty devices and methods
JP2014053619A (en) * 2013-09-30 2014-03-20 Dowa Holdings Co Ltd Method for manufacturing metal-ceramic bonded circuit board

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Effective date: 20050104