JPH11126966A - Manufacture of supporting spring with wiring pattern - Google Patents

Manufacture of supporting spring with wiring pattern

Info

Publication number
JPH11126966A
JPH11126966A JP9290865A JP29086597A JPH11126966A JP H11126966 A JPH11126966 A JP H11126966A JP 9290865 A JP9290865 A JP 9290865A JP 29086597 A JP29086597 A JP 29086597A JP H11126966 A JPH11126966 A JP H11126966A
Authority
JP
Japan
Prior art keywords
wiring pattern
pattern
foil
support spring
spring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9290865A
Other languages
Japanese (ja)
Inventor
Katsumi Suzuki
勝美 鈴木
Takuya Yonekawa
琢哉 米川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Cable Ltd
Original Assignee
Hitachi Cable Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Cable Ltd filed Critical Hitachi Cable Ltd
Priority to JP9290865A priority Critical patent/JPH11126966A/en
Publication of JPH11126966A publication Critical patent/JPH11126966A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a method by which a highly reliable, inexpensive, and simple supporting spring with wiring pattern which has a uniform thickness and spring property and can float an MR (magneto-resistive head) mounting section in a uniform attitude and from which the position of the wiring pattern is not deviated. SOLUTION: After an SUS (stainless steel) pattern 2 is formed by punching a double-sided substrate composed of copper foil 7, polyimide 8, and SUS foil 9 (201), dry films 3 are respectively laminated upon both surfaces of the pattern 7 (203). Then, after a copper wiring pattern 4 is formed by exposing, developing, and etching the dry films 3, the dry films 3 are stripped off and the polyimide 8 is removed from prescribed parts (204). After removing the polyimide 8, dry films 3 are again laminated upon the pattern 2 (205) and Ni/Au plating 10 is performed on the copper wiring pattern 4 (206). Then a polyimide-based resin 11 is applied to the pattern 4. Finally, a supporting spring with wiring pattern is manufactured by removing the dry films 3 (208) and the supporting spring thus manufactured becomes a product after appearance inspections and characteristic evaluation (209).

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、配線パターン付き
支持バネの製造方法に関し、特に、銅箔にフォトファブ
リケーション技術を用いたエッチングを施して配線パタ
ーンを形成し、ステンレス箔をスタンピングして支持バ
ネを形成する配線パターン付き支持バネの製造方法に関
する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a support spring with a wiring pattern, and more particularly, to forming a wiring pattern by etching a copper foil using a photofabrication technique and stamping and supporting a stainless steel foil. The present invention relates to a method for manufacturing a support spring with a wiring pattern that forms a spring.

【0002】[0002]

【従来の技術】従来から、MRヘッド(Magnetoresistiv
e Head)用配線基板付き支持バネはHDD(ハード・デ
ィスクドライブ装置)に組み込まれ、先端にMRヘッド
を搭載してハード・ディスクに記憶データ等を書き込
み、読み出しする重要な部品である。この為、MRヘッ
ド用配線パターン付き支持バネには、高い信頼性が必要
とされ、さらに安価な製造方法が要求されていた。
2. Description of the Related Art Conventionally, an MR head (Magnetoresistiv) has been used.
The support spring with a wiring board for the e-head is an important component that is incorporated in a hard disk drive (HDD) and has an MR head mounted at the tip to write and read stored data and the like to and from the hard disk. For this reason, the support spring with the wiring pattern for the MR head is required to have high reliability, and a more inexpensive manufacturing method has been required.

【0003】従来のMRヘッド用配線パターン付き支持
バネは、厚さ20〜50μmのステンレス製の支持バネ
材に、ビニールで被覆された金の撚り線を配線パターン
として接着剤で貼り付けて製造していた。また、他の方
法では、配線パターンとしてフレキシブル基板(FP
C)を別の工程で作成し、上記と同様に、これをステン
レス製の支持バネ材に接着剤で貼り付けて製造してい
た。
[0003] A conventional support spring with a wiring pattern for an MR head is manufactured by attaching a gold stranded wire covered with vinyl as a wiring pattern with an adhesive to a stainless steel support spring material having a thickness of 20 to 50 µm. I was In another method, a flexible substrate (FP) is used as a wiring pattern.
C) was prepared in a separate step and, similarly to the above, was produced by sticking it to a stainless steel supporting spring material with an adhesive.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、上述し
たような従来の配線パターン付き支持バネの製造方法に
よれば、ステンレス(SUS)箔の支持バネを製造した
後、これに配線パターンとしてのビニール被覆の撚り線
又はフレキシブル基板を接着剤で貼り付けているため、
人手を要し、製造工程が長く歩留りが低下し、製造され
る配線パターン付き支持バネが高価格になるという問題
があった。
However, according to the above-described conventional method of manufacturing a support spring with a wiring pattern, a support spring made of stainless steel (SUS) foil is manufactured and then coated with vinyl as a wiring pattern. Because the stranded wire or flexible substrate is attached with an adhesive,
There is a problem in that the manufacturing process is long, the yield is reduced, and the manufactured supporting spring with a wiring pattern is expensive.

【0005】また、撚り線又はフレキシブル基板を、別
工程で製造されたSUS箔の支持バネに接着剤で貼り付
けるのため、その厚さが不均一になるり、均一なバネ性
が得られず、MRヘッドを搭載するスライダ部分の浮上
姿勢が均一にならないという問題があった。
[0005] Further, since the stranded wire or the flexible substrate is attached to the support spring of the SUS foil manufactured in a separate process with an adhesive, the thickness becomes uneven or uniform spring property cannot be obtained. In addition, there has been a problem that the flying attitude of the slider portion on which the MR head is mounted is not uniform.

【0006】更に、SUS箔の支持バネに、配線パター
ンを接着剤で貼り付けているため、SUS箔の支持バネ
に対する配線パターンの位置ズレが発生し、高い信頼性
が得られないという問題があった。
Further, since the wiring pattern is attached to the support spring of the SUS foil with an adhesive, there is a problem in that the position of the wiring pattern is displaced with respect to the support spring of the SUS foil, and high reliability cannot be obtained. Was.

【0007】従って、本発明の目的は、簡単な製造工程
で、均一な厚さとバネ性を有し、支持バネと配線パター
ンの位置ズレが起きず、MR搭載部の浮上姿勢が均一と
なり、信頼性の高い、安価な配線パターン付き支持バネ
の製造方法を提供することである。
Therefore, an object of the present invention is to provide a uniform manufacturing process, uniform thickness and resilience, no misalignment between a support spring and a wiring pattern, a uniform floating attitude of an MR mounting portion, and a high reliability. It is an object of the present invention to provide a method for manufacturing a highly reliable and inexpensive supporting spring with a wiring pattern.

【0008】[0008]

【課題を解決するための手段】本発明は、以上に述べた
目的を実現するため、ステンレス箔等のバネ材料箔によ
って形成された支持バネ上に、銅箔等の導電材料箔によ
って形成された所定の配線パターンを有する配線パター
ン付き支持バネの製造方法において、ベースフィルムの
反対面にバネ材料箔と導電材料箔を貼り合わせ、バネ材
料箔をスタンピングして、支持バネを形成し、導電材料
箔をエッチングして、所定の配線パターンを形成する、
ことを特徴とする配線パターン付き支持バネの製造方法
を提供する。
According to the present invention, in order to achieve the above-mentioned object, a conductive material foil such as a copper foil is formed on a support spring formed by a spring material foil such as a stainless steel foil. In a method of manufacturing a support spring with a wiring pattern having a predetermined wiring pattern, a spring material foil and a conductive material foil are attached to the opposite surface of the base film, and the spring material foil is stamped to form a support spring. Is etched to form a predetermined wiring pattern,
A method for manufacturing a support spring with a wiring pattern is provided.

【0009】[0009]

【発明の実施の形態】以下本発明の配線パターン付き支
持バネの製造方法を詳細に説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a method for manufacturing a support spring with a wiring pattern according to the present invention will be described in detail.

【0010】図1は、本発明の配線パターン付き支持バ
ネの製造方法によって製造される配線パターン付き支持
バネの一形態を示す。この配線パターン付き支持バネ
は、ステンレス(SUS304)箔から成る所定の形状
のSUS304バネ板2と、SUS304バネ板2上に
設けられ、所定のパターンを有する銅箔から成る銅配線
パターン4とを備えている。また、銅配線パターン4
は、Ni/Auめっきが施され、MRヘッドが搭載され
るMRヘッド搭載部5と、電気信号を取出す電極パッド
6を有し、このMRヘッド搭載部5および電極パッド6
以外の配線部には、ポリイミド系樹脂が塗布されてい
る。
FIG. 1 shows an embodiment of a support spring with a wiring pattern manufactured by the method for manufacturing a support spring with a wiring pattern of the present invention. The support spring with a wiring pattern includes a SUS304 spring plate 2 having a predetermined shape made of stainless steel (SUS304) foil, and a copper wiring pattern 4 provided on the SUS304 spring plate 2 and made of copper foil having a predetermined pattern. ing. In addition, copper wiring pattern 4
Has an MR head mounting section 5 on which Ni / Au plating is applied and on which an MR head is mounted, and an electrode pad 6 for extracting an electric signal. The MR head mounting section 5 and the electrode pad 6
The other wiring parts are coated with a polyimide resin.

【0011】図2は、本発明による配線パターン付き支
持バネを製造する方法の一形態を示す。図2(a)は、
製造工程を示し、図2(b)は、製造工程での部材の断
面を示す。この配線パターン付き支持バネの基板材料
は、厚さ0.018mmの銅(Cu)箔7と、厚さ0.
010mmのポリイミド(PI)8と、厚さ0.020
mmのステンレス(SUS304)箔9とからなる両面
基板1が用いられている(201) 。この基板1をスタンピ
ング技術により打ち抜き、支持バネになるSUSパター
ン2を形成した後、10%の硝酸(HNO3)水溶液に
浸漬して、抜き端面の微細バリを溶解する(202) 。次
に、アルカリ脱脂、酸洗浄して表面の油脂分と錆を除去
した後、両面に厚さ13μmの感光性ドライフィルム3
をラミネートする(203) 。そして、銅箔7側の感光性ド
ライフィルム3を露光機で露光し、アルカリ現像して銅
箔7に所定のパターンを描画する。この銅箔7にパター
ンを描画した基板1をエッチング機でエッチングして、
銅箔電気信号用配線パターン4を形成した後、両面の感
光性ドライフィルム3を剥離する。その後、銅配線パタ
ーン4の下以外のSUSパターン2の表面のポリイミド
8をレーザ光及びプラズマ光で劣化し、ヒドラジン水溶
液に浸透して剥離する(204) 。
FIG. 2 shows an embodiment of a method of manufacturing a support spring with a wiring pattern according to the present invention. FIG. 2 (a)
FIG. 2B shows a manufacturing process, and FIG. 2B shows a cross section of the member in the manufacturing process. The substrate material of the support spring with the wiring pattern is a copper (Cu) foil 7 having a thickness of 0.018 mm and a thickness of 0.1 mm.
010 mm polyimide (PI) 8 and a thickness of 0.020
A double-sided substrate 1 made of a stainless steel (SUS304) foil 9 mm is used (201). The substrate 1 is stamped by a stamping technique to form a SUS pattern 2 serving as a support spring, and then immersed in a 10% nitric acid (HNO3) aqueous solution to dissolve fine burrs on the punched end surface (202). Then, after removing fats and oils and rust on the surface by alkali degreasing and acid washing, a photosensitive dry film 3 having a thickness of 13 μm was formed on both surfaces.
Is laminated (203). Then, the photosensitive dry film 3 on the side of the copper foil 7 is exposed by an exposing machine and developed with an alkali to draw a predetermined pattern on the copper foil 7. The substrate 1 having the pattern drawn on the copper foil 7 is etched by an etching machine,
After forming the copper foil electrical signal wiring pattern 4, the photosensitive dry films 3 on both sides are peeled off. Thereafter, the polyimide 8 on the surface of the SUS pattern 2 other than under the copper wiring pattern 4 is degraded by the laser light and the plasma light, penetrates into the hydrazine aqueous solution, and is stripped (204).

【0012】SUSパターン2の裏面(下面)側に再び
感光性ドライフィルム3をラミネートする(205) 。銅配
線パターン4には、下地にニッケル及び仕上げに金めっ
き(Ni/Auめっき10)を施した(206) 後、外部か
らの異物付着による配線の短絡を防止するために、MR
ヘッド搭載部5(図1)と信号を取り出す電極パッド部
6(図1)以外の配線部に、感光性ポリイミド系樹脂1
1をスクリーンマスクを用いて塗布する(207) 。最後
に、SUSパターン2の裏側のドライフィルム3を剥離
して、MRヘッド用の配線パターン付き支持バネを製造
する(208) 。この様にして製造した配線パターン付き支
持バネは、外観検査と特性評価を行い、製品となる(20
9) 。
The photosensitive dry film 3 is again laminated on the back (lower) side of the SUS pattern 2 (205). After the copper wiring pattern 4 is nickel-plated on the base and gold-plated (Ni / Au plating 10) on the finish (206), the MR is used to prevent short-circuiting of the wiring due to the attachment of foreign matter from the outside.
Photosensitive polyimide resin 1 is applied to wiring parts other than the head mounting part 5 (FIG. 1) and the electrode pad part 6 (FIG. 1) for extracting signals.
1 is applied using a screen mask (207). Finally, the dry film 3 on the back side of the SUS pattern 2 is peeled off to manufacture a support spring with a wiring pattern for the MR head (208). The support spring with the wiring pattern manufactured in this way is subjected to appearance inspection and characteristic evaluation, and becomes a product (20
9).

【0013】図3は、本発明による配線パターン付き支
持バネを製造する方法の他の一形態を示す。図3(a)
は、製造工程を示し、図3(b)は、製造工程での部材
の断面を示す。基板材料は図2と同じ様に、厚さ0.0
18mmの銅(Cu)箔7と、厚さ0.010mmのポ
リイミド(PI)8と、厚さ0.020mmのステンレ
ス(SUS304)箔9とからなる両面基板1を用いて
いる(301) 。この両面基板1をアルカリ脱脂、酸洗浄し
て表面の油脂分と錆を除去した後、両面に厚さ13μm
の感光性ドライフィルム3をラミネートする(302a)。
次に、銅箔7側の感光性ドライフィルム3を露光機で露
光し、アルカリで現像して銅箔7面に所定のパターンを
描画する。この銅箔7面にパターンを描画した基板をエ
ッチング機でエッチングして銅箔電気信号用配線パター
ン4を形成した後、両面の感光性ドライフィルム3を剥
離する(302b)。
FIG. 3 shows another embodiment of a method of manufacturing a support spring with a wiring pattern according to the present invention. FIG. 3 (a)
Shows a manufacturing process, and FIG. 3B shows a cross section of a member in the manufacturing process. The substrate material has a thickness of 0.0, as in FIG.
A double-sided board 1 comprising a copper (Cu) foil 7 of 18 mm, a polyimide (PI) 8 of 0.010 mm thickness, and a stainless (SUS304) foil 9 of 0.020 mm thickness is used (301). This double-sided substrate 1 is alkali-degreased and acid-washed to remove fats and oils and rust on the surface.
Is laminated (302a).
Next, the photosensitive dry film 3 on the copper foil 7 side is exposed by an exposure machine, developed with an alkali, and a predetermined pattern is drawn on the copper foil 7 surface. After the substrate having the pattern drawn on the surface of the copper foil 7 is etched by an etching machine to form the wiring pattern 4 for a copper foil electric signal, the photosensitive dry film 3 on both sides is peeled off (302b).

【0014】その後、銅配線パターン4の下以外のSU
S箔9の表面のポリイミド8をレーザ光及びプラズマ光
で劣化し、ヒドラジン水溶液に浸漬して剥離し、SUS
箔9をスタンピング技術により打ち抜き、支持バネにな
るSUSパターン2を形成した後、SUSパターン2の
裏面(下面)側に再び感光性ドライフィルム3をラミネ
ートする(303) 。銅配線パターン4には、下地にニッケ
ル及び仕上げに金めっき(Ni/Auめっき10)を施
した(304) 後、外部からの異物付着による配線の短絡を
防止するために、MRヘッド搭載部5(図1)と信号を
取り出す電極パッド部6(図1)以外の配線部に、感光
性ポリイミド系樹脂11をスクリーンマスクを用いて塗
布する(305) 。最後に、SUSパターン2の裏側のドラ
イフィルム3を剥離して、MRヘッド用の配線パターン
付き支持バネを製造する(306) 。この様にして製造した
配線パターン付き支持バネは、外観検査と特性評価を行
い製品となる(307) 。
Then, the SUs other than those under the copper wiring pattern 4
The polyimide 8 on the surface of the S foil 9 is degraded by laser light and plasma light, immersed in an aqueous hydrazine solution, and peeled off.
After stamping the foil 9 to form the SUS pattern 2 serving as a support spring, the photosensitive dry film 3 is laminated again on the back surface (lower surface) of the SUS pattern 2 (303). After the copper wiring pattern 4 has been subjected to nickel plating on the base and gold plating (Ni / Au plating 10) for the finish (304), the MR head mounting portion 5 is provided to prevent short-circuiting of the wiring due to the attachment of foreign matter from the outside. A photosensitive polyimide resin 11 is applied using a screen mask to wiring portions other than the electrode pad portion 6 (FIG. 1) for extracting signals (FIG. 1) and a signal (305). Finally, the dry film 3 on the back side of the SUS pattern 2 is peeled off to manufacture a support spring with a wiring pattern for the MR head (306). The support spring with the wiring pattern manufactured in this manner is subjected to appearance inspection and characteristic evaluation, and becomes a product (307).

【0015】以上、本発明による配線パターン付き支持
バネの製造方法のいくつかの形態を示したが、上記形態
例では、銅配線パターン4を形成した後、銅配線パター
ン4の下以外のポリイミド8を溶解剥離しているが、こ
の部分のポリイミド8は、必ずしも剥離する必要はな
い。
Although several embodiments of the method of manufacturing a support spring with a wiring pattern according to the present invention have been described above, in the above-described embodiment, after the copper wiring pattern 4 is formed, the polyimide 8 other than under the copper wiring pattern 4 is formed. Is dissolved and peeled off, but the polyimide 8 in this portion does not necessarily need to be peeled off.

【0016】[0016]

【発明の効果】以上述べた通り、本発明の配線パターン
付き支持バネの製造方法によれば、支持バネと配線パタ
ーンを同一の製造工程内で作成するようにしたので、簡
単な製造工程で、均一な厚さとバネ性を有し、支持バネ
と配線パターンの位置ズレが起きず、MR搭載部の浮上
姿勢が均一となり、信頼性の高い、安価な配線パターン
付き支持バネを提供することができるようになった。
As described above, according to the method of manufacturing a support spring with a wiring pattern of the present invention, the support spring and the wiring pattern are formed in the same manufacturing process. It has a uniform thickness and spring properties, does not cause displacement between the support spring and the wiring pattern, makes the floating posture of the MR mounting unit uniform, and can provide a reliable and inexpensive support spring with a wiring pattern. It became so.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明による配線パターン付き支持バネを示す
概略図である。
FIG. 1 is a schematic view showing a support spring with a wiring pattern according to the present invention.

【図2】本発明による配線パターン付き支持バネの製造
方法の一形態を示す概略図である。
FIG. 2 is a schematic view showing one embodiment of a method for manufacturing a support spring with a wiring pattern according to the present invention.

【図3】本発明による配線パターン付き支持バネの製造
方法の一形態を示す概略図である。
FIG. 3 is a schematic view showing one embodiment of a method of manufacturing a support spring with a wiring pattern according to the present invention.

【符号の説明】[Explanation of symbols]

1 両面基板 2 SUSパターン 3 ドライフィルム 4 銅配線パターン 5 MRヘッド搭載部 6 電極パッド 7 銅箔 8 ポリイミド 9 SUS箔 10 Ni/Auめっき 11 ポリイミド系樹脂 12 SUS304バネ板 DESCRIPTION OF SYMBOLS 1 Double-sided board 2 SUS pattern 3 Dry film 4 Copper wiring pattern 5 MR head mounting part 6 Electrode pad 7 Copper foil 8 Polyimide 9 SUS foil 10 Ni / Au plating 11 Polyimide resin 12 SUS304 spring plate

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】ステンレス箔等のバネ材料箔によって形成
された支持バネ上に、銅箔等の導電材料箔によって形成
された所定の配線パターンを有する配線パターン付き支
持バネの製造方法において、 ベースフィルムの反対面に前記バネ材料箔と前記導電材
料箔を貼り合わせ、 前記バネ材料箔をスタンピングして、前記支持バネを形
成し、 前記導電材料箔をエッチングして、前記所定の配線パタ
ーンを形成する、 ことを特徴とする配線パターン付き支持バネの製造方
法。
1. A method of manufacturing a support spring with a wiring pattern having a predetermined wiring pattern formed of a conductive material foil such as a copper foil on a support spring formed of a spring material foil such as a stainless steel foil. Affixing the spring material foil and the conductive material foil on the opposite side of the above, stamping the spring material foil to form the support spring, and etching the conductive material foil to form the predetermined wiring pattern A method for manufacturing a support spring with a wiring pattern, comprising:
【請求項2】前記支持バネの形成は、前記導電材料箔か
ら前記所定の配線パターンを形成する前、又は前記所定
の配線パターンを形成した後に行われることを特徴とす
る、請求項1記載の配線パターン付き支持バネの製造方
法。
2. The method according to claim 1, wherein the supporting spring is formed before the predetermined wiring pattern is formed from the conductive material foil or after the predetermined wiring pattern is formed. A method for manufacturing a support spring with a wiring pattern.
【請求項3】前記バネ材料箔は、前記スタンピング後に
化学処理されることを特徴とする、請求項1記載の配線
パターン付き支持バネの製造方法。
3. The method according to claim 1, wherein the spring material foil is chemically treated after the stamping.
JP9290865A 1997-10-23 1997-10-23 Manufacture of supporting spring with wiring pattern Pending JPH11126966A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9290865A JPH11126966A (en) 1997-10-23 1997-10-23 Manufacture of supporting spring with wiring pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9290865A JPH11126966A (en) 1997-10-23 1997-10-23 Manufacture of supporting spring with wiring pattern

Publications (1)

Publication Number Publication Date
JPH11126966A true JPH11126966A (en) 1999-05-11

Family

ID=17761505

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9290865A Pending JPH11126966A (en) 1997-10-23 1997-10-23 Manufacture of supporting spring with wiring pattern

Country Status (1)

Country Link
JP (1) JPH11126966A (en)

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