JPH11119839A5 - - Google Patents

Info

Publication number
JPH11119839A5
JPH11119839A5 JP1997286326A JP28632697A JPH11119839A5 JP H11119839 A5 JPH11119839 A5 JP H11119839A5 JP 1997286326 A JP1997286326 A JP 1997286326A JP 28632697 A JP28632697 A JP 28632697A JP H11119839 A5 JPH11119839 A5 JP H11119839A5
Authority
JP
Japan
Prior art keywords
valve opening
pressure
pressure control
detection means
control abnormality
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997286326A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11119839A (ja
JP4293318B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP28632697A priority Critical patent/JP4293318B2/ja
Priority claimed from JP28632697A external-priority patent/JP4293318B2/ja
Publication of JPH11119839A publication Critical patent/JPH11119839A/ja
Publication of JPH11119839A5 publication Critical patent/JPH11119839A5/ja
Application granted granted Critical
Publication of JP4293318B2 publication Critical patent/JP4293318B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP28632697A 1997-10-20 1997-10-20 圧力制御異常検出方法、異常表示方法および半導体製造装置 Expired - Fee Related JP4293318B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28632697A JP4293318B2 (ja) 1997-10-20 1997-10-20 圧力制御異常検出方法、異常表示方法および半導体製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28632697A JP4293318B2 (ja) 1997-10-20 1997-10-20 圧力制御異常検出方法、異常表示方法および半導体製造装置

Publications (3)

Publication Number Publication Date
JPH11119839A JPH11119839A (ja) 1999-04-30
JPH11119839A5 true JPH11119839A5 (cg-RX-API-DMAC10.html) 2005-06-16
JP4293318B2 JP4293318B2 (ja) 2009-07-08

Family

ID=17702946

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28632697A Expired - Fee Related JP4293318B2 (ja) 1997-10-20 1997-10-20 圧力制御異常検出方法、異常表示方法および半導体製造装置

Country Status (1)

Country Link
JP (1) JP4293318B2 (cg-RX-API-DMAC10.html)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW583522B (en) * 2001-04-27 2004-04-11 Tokyo Electron Ltd Remote maintenance system for semiconductor manufacturing apparatus and plant-side client and vendor-side server and storage medium and remote maintenance method for semiconductor manufacturing apparatus
JP4335085B2 (ja) * 2004-07-05 2009-09-30 シーケーディ株式会社 真空圧力制御システム
JP6424500B2 (ja) * 2014-07-11 2018-11-21 株式会社島津製作所 圧力制御装置および真空システム
JP6790356B2 (ja) * 2015-12-22 2020-11-25 横河電機株式会社 フィールド機器、設定装置、及び設定プログラム
JP6681452B1 (ja) * 2018-10-19 2020-04-15 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理装置及び半導体装置の製造方法
JP2023132914A (ja) * 2022-03-11 2023-09-22 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置管理システム、管理装置、基板処理装置、基板処理装置管理方法および基板処理装置管理プログラム

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0668698B2 (ja) * 1984-12-07 1994-08-31 株式会社東芝 プロセス状態監視装置
JP2906624B2 (ja) * 1990-09-27 1999-06-21 株式会社島津製作所 薄膜形成装置
JPH0736539A (ja) * 1993-07-20 1995-02-07 Fuji Electric Co Ltd プロセス異常原因推定方法

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