JPH11116582A - Production of silyl enol ethers - Google Patents
Production of silyl enol ethersInfo
- Publication number
- JPH11116582A JPH11116582A JP9294865A JP29486597A JPH11116582A JP H11116582 A JPH11116582 A JP H11116582A JP 9294865 A JP9294865 A JP 9294865A JP 29486597 A JP29486597 A JP 29486597A JP H11116582 A JPH11116582 A JP H11116582A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- solvent
- silyl enol
- formula
- trimethylsiloxy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- -1 silyl enol ethers Chemical class 0.000 title claims abstract description 37
- 238000004519 manufacturing process Methods 0.000 title claims description 16
- 238000006243 chemical reaction Methods 0.000 claims abstract description 42
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 claims abstract description 31
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 claims abstract description 28
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims abstract description 24
- 150000001875 compounds Chemical class 0.000 claims abstract description 24
- 239000002904 solvent Substances 0.000 claims abstract description 20
- FBADCSUQBLLAHW-VURMDHGXSA-N (z)-4-trimethylsilyloxypent-3-en-2-one Chemical compound CC(=O)\C=C(\C)O[Si](C)(C)C FBADCSUQBLLAHW-VURMDHGXSA-N 0.000 claims abstract description 9
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 8
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 6
- 125000000962 organic group Chemical group 0.000 claims abstract description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- WRQNANDWMGAFTP-UHFFFAOYSA-N Methylacetoacetic acid Chemical compound COC(=O)CC(C)=O WRQNANDWMGAFTP-UHFFFAOYSA-N 0.000 claims description 3
- PAKRJFGJJLLRBP-UHFFFAOYSA-N 2-trimethylsilyloxybut-2-enoic acid Chemical compound C[Si](OC(C(=O)O)=CC)(C)C PAKRJFGJJLLRBP-UHFFFAOYSA-N 0.000 claims 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 claims 1
- LABTWGUMFABVFG-UHFFFAOYSA-N methyl propenyl ketone Chemical compound CC=CC(C)=O LABTWGUMFABVFG-UHFFFAOYSA-N 0.000 claims 1
- 238000003786 synthesis reaction Methods 0.000 abstract description 16
- 238000000034 method Methods 0.000 abstract description 14
- 239000003795 chemical substances by application Substances 0.000 abstract description 5
- 238000004381 surface treatment Methods 0.000 abstract description 4
- 239000006227 byproduct Substances 0.000 description 14
- 238000010992 reflux Methods 0.000 description 13
- 239000000203 mixture Substances 0.000 description 10
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 8
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 8
- 238000009835 boiling Methods 0.000 description 7
- 239000003054 catalyst Substances 0.000 description 7
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 238000004821 distillation Methods 0.000 description 6
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical group N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 238000001308 synthesis method Methods 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- 239000005051 trimethylchlorosilane Substances 0.000 description 4
- 239000005046 Chlorosilane Substances 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000000543 intermediate Substances 0.000 description 3
- OQNKCUVOGBTGDJ-VOTSOKGWSA-N methyl (e)-3-trimethylsilyloxybut-2-enoate Chemical compound COC(=O)\C=C(/C)O[Si](C)(C)C OQNKCUVOGBTGDJ-VOTSOKGWSA-N 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 230000002194 synthesizing effect Effects 0.000 description 3
- 239000013076 target substance Substances 0.000 description 3
- ILWRPSCZWQJDMK-UHFFFAOYSA-N triethylazanium;chloride Chemical compound Cl.CCN(CC)CC ILWRPSCZWQJDMK-UHFFFAOYSA-N 0.000 description 3
- NWPNXBQSRGKSJB-UHFFFAOYSA-N 2-methylbenzonitrile Chemical compound CC1=CC=CC=C1C#N NWPNXBQSRGKSJB-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- GJWAPAVRQYYSTK-UHFFFAOYSA-N [(dimethyl-$l^{3}-silanyl)amino]-dimethylsilicon Chemical compound C[Si](C)N[Si](C)C GJWAPAVRQYYSTK-UHFFFAOYSA-N 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- QUKGYYKBILRGFE-UHFFFAOYSA-N benzyl acetate Chemical compound CC(=O)OCC1=CC=CC=C1 QUKGYYKBILRGFE-UHFFFAOYSA-N 0.000 description 2
- KVNRLNFWIYMESJ-UHFFFAOYSA-N butyronitrile Chemical compound CCCC#N KVNRLNFWIYMESJ-UHFFFAOYSA-N 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- OSLAYKKXCYSJSF-ARJAWSKDSA-N (Z)-4-aminopent-3-en-2-one Chemical compound C\C(N)=C\C(C)=O OSLAYKKXCYSJSF-ARJAWSKDSA-N 0.000 description 1
- ZRVOCNOYAJIAAP-NTMALXAHSA-N (z)-4-[tert-butyl(dimethyl)silyl]oxypent-3-en-2-one Chemical compound CC(=O)\C=C(\C)O[Si](C)(C)C(C)(C)C ZRVOCNOYAJIAAP-NTMALXAHSA-N 0.000 description 1
- SJXRYSFPMDJANJ-UHFFFAOYSA-N 1-[[[hexyl(dimethyl)silyl]amino]-dimethylsilyl]hexane Chemical compound CCCCCC[Si](C)(C)N[Si](C)(C)CCCCCC SJXRYSFPMDJANJ-UHFFFAOYSA-N 0.000 description 1
- CVBUKMMMRLOKQR-UHFFFAOYSA-N 1-phenylbutane-1,3-dione Chemical compound CC(=O)CC(=O)C1=CC=CC=C1 CVBUKMMMRLOKQR-UHFFFAOYSA-N 0.000 description 1
- KFBXUKHERGLHLG-UHFFFAOYSA-N 2,4-Nonanedione Chemical compound CCCCCC(=O)CC(C)=O KFBXUKHERGLHLG-UHFFFAOYSA-N 0.000 description 1
- ZBLRLJUOIRWSCE-UHFFFAOYSA-N 2-[[[tert-butyl(dimethyl)silyl]amino]-dimethylsilyl]-2-methylpropane Chemical compound CC(C)(C)[Si](C)(C)N[Si](C)(C)C(C)(C)C ZBLRLJUOIRWSCE-UHFFFAOYSA-N 0.000 description 1
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- XHRGPLDMNNGHCX-UHFFFAOYSA-N 3-Methylbutyl 3-oxobutanoate Chemical compound CC(C)CCOC(=O)CC(C)=O XHRGPLDMNNGHCX-UHFFFAOYSA-N 0.000 description 1
- BOHCMQZJWOGWTA-UHFFFAOYSA-N 3-methylbenzonitrile Chemical compound CC1=CC=CC(C#N)=C1 BOHCMQZJWOGWTA-UHFFFAOYSA-N 0.000 description 1
- GONJOQKUKVYDLI-UHFFFAOYSA-N 3-trimethylsilyloxybut-2-enoic acid Chemical compound C[Si](C)(C)OC(C)=CC(O)=O GONJOQKUKVYDLI-UHFFFAOYSA-N 0.000 description 1
- PLGPBTCNKJQJHQ-UHFFFAOYSA-N 4,4-dimethylcyclohexane-1,3-dione Chemical compound CC1(C)CCC(=O)CC1=O PLGPBTCNKJQJHQ-UHFFFAOYSA-N 0.000 description 1
- ZLRQSTFNPGEETG-UHFFFAOYSA-N 4-(trimethylsilylamino)pent-3-en-2-one Chemical compound CC(=O)C=C(C)N[Si](C)(C)C ZLRQSTFNPGEETG-UHFFFAOYSA-N 0.000 description 1
- UMCXOIUYJCEINR-UHFFFAOYSA-N 4-dimethylsilyloxypent-3-en-2-one Chemical compound C[SiH](C)OC(C)=CC(C)=O UMCXOIUYJCEINR-UHFFFAOYSA-N 0.000 description 1
- VCZNNAKNUVJVGX-UHFFFAOYSA-N 4-methylbenzonitrile Chemical compound CC1=CC=C(C#N)C=C1 VCZNNAKNUVJVGX-UHFFFAOYSA-N 0.000 description 1
- KHZGUWAFFHXZLC-UHFFFAOYSA-N 5-methylhexane-2,4-dione Chemical compound CC(C)C(=O)CC(C)=O KHZGUWAFFHXZLC-UHFFFAOYSA-N 0.000 description 1
- PFJFNQUFMTYCHB-UHFFFAOYSA-N C[SiH2]N[SiH3] Chemical compound C[SiH2]N[SiH3] PFJFNQUFMTYCHB-UHFFFAOYSA-N 0.000 description 1
- VZEMLLAVSZOIBW-UHFFFAOYSA-N C[Si](OC(=CC(C)=O)CC)(C)C Chemical compound C[Si](OC(=CC(C)=O)CC)(C)C VZEMLLAVSZOIBW-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- RFFFKMOABOFIDF-UHFFFAOYSA-N Pentanenitrile Chemical compound CCCCC#N RFFFKMOABOFIDF-UHFFFAOYSA-N 0.000 description 1
- HIMXYMYMHUAZLW-UHFFFAOYSA-N [[[dimethyl(phenyl)silyl]amino]-dimethylsilyl]benzene Chemical compound C=1C=CC=CC=1[Si](C)(C)N[Si](C)(C)C1=CC=CC=C1 HIMXYMYMHUAZLW-UHFFFAOYSA-N 0.000 description 1
- ZVQOOHYFBIDMTQ-UHFFFAOYSA-N [methyl(oxido){1-[6-(trifluoromethyl)pyridin-3-yl]ethyl}-lambda(6)-sulfanylidene]cyanamide Chemical compound N#CN=S(C)(=O)C(C)C1=CC=C(C(F)(F)F)N=C1 ZVQOOHYFBIDMTQ-UHFFFAOYSA-N 0.000 description 1
- 239000003905 agrochemical Substances 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 229940007550 benzyl acetate Drugs 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- HJSLFCCWAKVHIW-UHFFFAOYSA-N cyclohexane-1,3-dione Chemical compound O=C1CCCC(=O)C1 HJSLFCCWAKVHIW-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- LOGSONSNCYTHPS-UHFFFAOYSA-N cyclopentane-1,3-dione Chemical compound O=C1CCC(=O)C1 LOGSONSNCYTHPS-UHFFFAOYSA-N 0.000 description 1
- 125000005594 diketone group Chemical group 0.000 description 1
- BADXJIPKFRBFOT-UHFFFAOYSA-N dimedone Chemical compound CC1(C)CC(=O)CC(=O)C1 BADXJIPKFRBFOT-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- TYQSGJQIXZTWHI-UHFFFAOYSA-N ethyl 3-trimethylsilyloxybut-2-enoate Chemical compound CCOC(=O)C=C(C)O[Si](C)(C)C TYQSGJQIXZTWHI-UHFFFAOYSA-N 0.000 description 1
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- ILPNRWUGFSPGAA-UHFFFAOYSA-N heptane-2,4-dione Chemical compound CCCC(=O)CC(C)=O ILPNRWUGFSPGAA-UHFFFAOYSA-N 0.000 description 1
- SDAXRHHPNYTELL-UHFFFAOYSA-N heptanenitrile Chemical compound CCCCCCC#N SDAXRHHPNYTELL-UHFFFAOYSA-N 0.000 description 1
- NDOGLIPWGGRQCO-UHFFFAOYSA-N hexane-2,4-dione Chemical compound CCC(=O)CC(C)=O NDOGLIPWGGRQCO-UHFFFAOYSA-N 0.000 description 1
- AILKHAQXUAOOFU-UHFFFAOYSA-N hexanenitrile Chemical compound CCCCCC#N AILKHAQXUAOOFU-UHFFFAOYSA-N 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 150000003840 hydrochlorides Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- QHDRKFYEGYYIIK-UHFFFAOYSA-N isovaleronitrile Chemical compound CC(C)CC#N QHDRKFYEGYYIIK-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- PLZZPPHAMDJOSR-UHFFFAOYSA-N nonanenitrile Chemical compound CCCCCCCCC#N PLZZPPHAMDJOSR-UHFFFAOYSA-N 0.000 description 1
- YSIMAPNUZAVQER-UHFFFAOYSA-N octanenitrile Chemical compound CCCCCCCC#N YSIMAPNUZAVQER-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- GVIIRWAJDFKJMJ-UHFFFAOYSA-N propan-2-yl 3-oxobutanoate Chemical compound CC(C)OC(=O)CC(C)=O GVIIRWAJDFKJMJ-UHFFFAOYSA-N 0.000 description 1
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- JKUYRAMKJLMYLO-UHFFFAOYSA-N tert-butyl 3-oxobutanoate Chemical compound CC(=O)CC(=O)OC(C)(C)C JKUYRAMKJLMYLO-UHFFFAOYSA-N 0.000 description 1
- HDXQNJQEDFHZAR-UHFFFAOYSA-N tert-butyl 3-trimethylsilyloxybut-2-enoate Chemical compound C[Si](C)(C)OC(C)=CC(=O)OC(C)(C)C HDXQNJQEDFHZAR-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、有機合成用中間
体、シリル化剤等として有機合成、各種表面処理等の分
野で有用な高純度のシリルエノールエーテル類を高収率
で製造することができるシリルエノールエーテル類の製
造方法に関する。TECHNICAL FIELD The present invention relates to a method for producing a high-purity silyl enol ether useful as an intermediate for organic synthesis and a silylating agent in the fields of organic synthesis and various surface treatments. The present invention relates to a method for producing a possible silyl enol ether.
【0002】[0002]
【従来の技術及び発明が解決しようとする課題】4−ト
リメチルシロキシ−3−ペンテン−2−オンやメチル−
3−トリメチルシロキシ−2−ブテノエートに代表され
るβ−ジケトン化合物のシリルエノールエーテルは、有
機合成用中間体として、また、特に中性のシリル化剤と
して医薬、農薬合成の分野、各種表面処理等の分野で有
用な化合物である。BACKGROUND OF THE INVENTION 4-Trimethylsiloxy-3-penten-2-one and methyl-
Silyl enol ethers of β-diketone compounds typified by 3-trimethylsiloxy-2-butenoate are used as intermediates for organic synthesis, and especially as neutral silylating agents, in the fields of pharmaceuticals, agricultural chemical synthesis, various surface treatments, and the like. Are useful in the field of
【0003】これらのシリルエノールエーテル類の合成
法としては、例えば下記反応式のように下記一般式
(1)で示されるβ−ジケトン化合物と下記一般式
(4)で示されるクロロシラン化合物とから下記一般式
(3)で示されるシリルエノールエーテル類を合成する
方法がある。[0003] As a method for synthesizing these silyl enol ethers, for example, the following reaction formula is used to prepare a β-diketone compound represented by the following general formula (1) and a chlorosilane compound represented by the following general formula (4). There is a method for synthesizing silyl enol ethers represented by the general formula (3).
【0004】[0004]
【化2】 (但し、式中R1はアルキル基又はアルコキシ基、R2、
R3、R4はそれぞれ水素原子又は炭素数1〜10の有機
基である。)Embedded image (Where R 1 is an alkyl group or an alkoxy group, R 2 ,
R 3 and R 4 are each a hydrogen atom or an organic group having 1 to 10 carbon atoms. )
【0005】しかし、上記の合成方法は、大量に溶媒を
必要とする上、例えばトリエチルアミン等の塩基を使用
する必要があるため、生じる塩基の塩酸塩を濾過しなけ
ればならず、工程が煩雑である。しかも、これらの塩酸
塩は、例えばトリエチルアミン塩酸塩のように昇華性を
有するものが多く、溶解させたり濾過しても除去し難
く、このため除去できない塩が蒸留単離の際に蒸留塔に
付着したり、目的物に混入したりするため工業的には不
向きな合成方法であった。とりわけ電子材料等の分野で
は、塩素分の少ない材料が求められており、上記合成方
法は使用できない場合があった。However, the above synthesis method requires a large amount of a solvent and requires the use of a base such as triethylamine. Therefore, the resulting hydrochloride of the base has to be filtered, and the process is complicated. is there. In addition, many of these hydrochlorides have sublimability, such as triethylamine hydrochloride, and are difficult to remove even by dissolution or filtration, so that salts that cannot be removed adhere to the distillation column during distillation isolation. This is a synthesis method that is not industrially suitable because it is mixed with a target substance. In particular, in the field of electronic materials and the like, materials having a low content of chlorine have been demanded, and the above synthesizing method may not be used in some cases.
【0006】そこで、塩基の塩酸塩を生じない方法とし
て、下記反応式のように下記一般式(1)で示されるβ
−ジケトン化合物と下記一般式(2)で示されるジシラ
ザン化合物からの合成法が提案されている。Therefore, as a method of not generating a base hydrochloride, β β represented by the following general formula (1) as shown in the following reaction formula is used.
A synthesis method from a diketone compound and a disilazane compound represented by the following general formula (2) has been proposed.
【0007】[0007]
【化3】 (但し、式中R1、R2、R3、R4はそれぞれ上記と同様
である。)Embedded image (However, in the formula, R 1 , R 2 , R 3 , and R 4 are the same as above.)
【0008】しかしながら、上記の合成法は、下記のよ
うな問題があり、シリルエノールエーテル類の製造方法
として満足できるものではなかった。即ち、上記方法に
おいて、溶媒を使用しない場合には生産性は大きく向上
するものの、低温下では反応速度が遅く、また、高温下
での反応では反応中に発生するアンモニアのため、例え
ばアセチルアセトンとヘキサメチルジシラザンの反応の
場合には、アセチルアセトンの一方のケトンがアミノ化
された4−アミノ−3−ペンテン−2−オン(下記式
(5)で示される化合物)や、それが更にトリメチルシ
リル化された4−トリメチルシリルアミノ−3−ペンテ
ン−2−オン(下記式(6)で示される化合物)が副生
し、これらの副生成物は目的物と沸点が近いために蒸留
では除去しにくいため、目的物質の純度や収率の低下を
招き易いといった問題があった。However, the above-mentioned synthesis method has the following problems and is not satisfactory as a method for producing silyl enol ethers. That is, in the above method, although the productivity is greatly improved when a solvent is not used, the reaction rate is low at a low temperature, and the reaction at a high temperature is ammonia generated during the reaction. In the case of the reaction of methyldisilazane, 4-amino-3-penten-2-one (a compound represented by the following formula (5)) in which one ketone of acetylacetone is aminated, or it is further trimethylsilylated. 4-trimethylsilylamino-3-penten-2-one (a compound represented by the following formula (6)) is by-produced, and since these by-products have a boiling point close to that of the target product, it is difficult to remove them by distillation. There is a problem that the purity and yield of the target substance are likely to be reduced.
【0009】なお、下記の副生成物の生成量は、スケー
ルが大きくなるほど顕著で、工業的スケールでの製造に
おいては、非常に大きな問題となる。[0009] The amount of the following by-products is more remarkable as the scale becomes larger, and becomes a very serious problem in production on an industrial scale.
【0010】[0010]
【化4】 Embedded image
【0011】更には、アセチルアセトンとヘキサメチル
ジシラザンを使用した場合にはこれら化合物が昇華性の
コンプレックスを形成し、これが器壁や配管に付着して
閉塞するおそれがあった。Furthermore, when acetylacetone and hexamethyldisilazane are used, these compounds form a sublimable complex, which may adhere to the vessel walls and pipes and block.
【0012】一方、溶媒を使用する方法としては、ジク
ロロメタンを溶媒とする方法(Can.J.Che
m.,58,138(1980))、テトラヒドロフラ
ンを溶媒とする方法(トリメチルクロロシラン触媒)
(Zh.Anal.Khim.,40,2087(19
85))、テトラヒドロフランを溶媒とする方法(イミ
ダゾール触媒)(Synthesis,722(197
6))等が知られている。On the other hand, as a method using a solvent, a method using dichloromethane as a solvent (Can. J. Che.
m. , 58 , 138 (1980)), a method using tetrahydrofuran as a solvent (trimethylchlorosilane catalyst)
(Zh. Anal. Khim., 40 , 2087 (19
85)), a method using tetrahydrofuran as a solvent (imidazole catalyst) (Synthesis, 722 (197)
6)) and the like are known.
【0013】しかし、非極性溶媒を使用する場合は著し
く反応速度が低下するため実用的ではなく、また、溶媒
としてジクロロメタンやテトラヒドロフランを使用した
場合でも、無溶媒の場合よりも反応速度が遅く、反応率
を高めるために長時間反応を行うと上記の溶媒を使用し
ない場合と同様の副生成物が副生してしまうという問題
点があった。更に、反応速度を高めるために触媒を添加
した場合、反応速度は高まるが、副生成物が多く生成
し、目的物質の純度や収率の大きな低下を招く等の問題
があった。However, the use of a non-polar solvent is not practical because the reaction rate is remarkably reduced, and the use of dichloromethane or tetrahydrofuran as a solvent is not practical because the reaction rate is slower than that without solvent. If the reaction is carried out for a long time to increase the yield, there is a problem that by-products similar to those when the above-mentioned solvent is not used are produced as by-products. Further, when a catalyst is added to increase the reaction rate, the reaction rate is increased, but there are problems such that a large amount of by-products are generated and the purity and yield of the target substance are greatly reduced.
【0014】本発明は、上記事情に鑑みなされたもの
で、シリルエノールエーテル類をより簡便かつ高純度、
高収率で、しかも工業的にも有利に製造することができ
るシリルエノールエーテル類の製造方法を提供すること
を目的とする。The present invention has been made in view of the above circumstances, and provides a simpler and higher-purity silyl enol ether.
It is an object of the present invention to provide a method for producing silyl enol ethers which can be produced industrially advantageously in a high yield.
【0015】[0015]
【課題を解決するための手段及び発明の実施の形態】本
発明者は、上記目的を達成するため鋭意検討を重ねた結
果、下記一般式(1)で示されるβ−ジケトン化合物と
下記一般式(2)で示されるジシラザン化合物との反応
により下記一般式(3)で示されるシリルエノールエー
テル類を製造するに際して、溶媒として有機ニトリル化
合物を用いた場合、反応速度が著しく高まり、触媒を添
加しなくても高反応率で速やかに反応が進行すると共
に、効果的に近沸副生成物の副生を抑制できる上、β−
ジケトン化合物とジシラザン化合物とのコンプレックス
の生成がほとんどなく、かかるコンプレックスが器壁や
配管へ付着することもないこと、それ故、簡便な工程で
高純度かつ高収率でシリルエノールエーテル類を製造可
能であることを知見し、本発明を完成するに至った。Means for Solving the Problems and Embodiments of the Invention The present inventors have made intensive studies to achieve the above object, and as a result, have found that a β-diketone compound represented by the following general formula (1) and a When an organic nitrile compound is used as a solvent in the production of silyl enol ethers represented by the following general formula (3) by the reaction with the disilazane compound represented by (2), the reaction rate is significantly increased, and a catalyst is added. The reaction proceeds rapidly at a high reaction rate without the addition, and the by-product of near-boiling by-products can be effectively suppressed.
There is almost no formation of complexes between diketone compounds and disilazane compounds, and such complexes do not adhere to vessel walls and pipes, and therefore, silyl enol ethers can be produced in a simple process with high purity and high yield. And found that the present invention was completed.
【0016】[0016]
【化5】 (但し、式中R1は炭素数1〜10のアルキル基又はア
ルコキシ基、R2、R3、R4はそれぞれ水素原子又は炭
素数1〜10の有機基である。)Embedded image (However, in the formula, R 1 is an alkyl group or an alkoxy group having 1 to 10 carbon atoms, and R 2 , R 3 , and R 4 are each a hydrogen atom or an organic group having 1 to 10 carbon atoms.)
【0017】従って、本発明は、上記一般式(1)で示
されるβ−ジケトン化合物と上記一般式(2)で示され
るジシラザン化合物とを反応させて上記一般式(3)で
示されるシリルエノールエーテル類を製造する方法にお
いて、溶媒として有機ニトリル化合物を用いることを特
徴とするシリルエノールエーテル類の製造方法を提供す
る。Accordingly, the present invention provides a method for reacting a β-diketone compound represented by the general formula (1) with a disilazane compound represented by the general formula (2) to produce a silyl enol represented by the general formula (3). Provided is a method for producing silyl enol ethers, which comprises using an organic nitrile compound as a solvent in the method for producing ethers.
【0018】以下、本発明につき更に詳細に説明する
と、本発明のシリルエノールエーテル類の製造方法にお
いて、原料として用いるβ−ジケトン化合物及びジシラ
ザン化合物は、それぞれ下記一般式(1)及び下記一般
式(2)で示されるものである。Hereinafter, the present invention will be described in more detail. In the method for producing silyl enol ethers of the present invention, the β-diketone compound and the disilazane compound used as the starting materials are represented by the following general formulas (1) and (1), respectively. This is shown in 2).
【0019】[0019]
【化6】 (但し、式中R1は炭素数1〜10のアルキル基又はア
ルコキシ基、R2、R3、R4はそれぞれ水素原子又は炭
素数1〜10の有機基である。)Embedded image (However, in the formula, R 1 is an alkyl group or an alkoxy group having 1 to 10 carbon atoms, and R 2 , R 3 , and R 4 are each a hydrogen atom or an organic group having 1 to 10 carbon atoms.)
【0020】上記式中、R1は炭素数1〜10のアルキ
ル基又はアルコキシ基であり、例えばメチル基、エチル
基、プロピル基、n−ブチル基、iso−ブチル基等の
アルキル基、メトキシ基、エトキシ基、プロポキシ基等
のアルコキシ基が挙げられる。In the above formula, R 1 is an alkyl or alkoxy group having 1 to 10 carbon atoms, for example, an alkyl group such as a methyl group, an ethyl group, a propyl group, an n-butyl group, an iso-butyl group, or a methoxy group. , An ethoxy group and a propoxy group.
【0021】また、上記式中、R2、R3、R4はそれぞ
れ水素原子又は炭素数1〜10の1価の有機基、好まし
くはアルキル基、アリール基、アラルキル基、アルケニ
ル基等の1価炭化水素基であり、例えばメチル、エチ
ル、プロピル、ブチル、ヘキシル、シクロヘキシル、オ
クチル、フェニル、トリル、ベンジル、ビニル、アリ
ル、プロペニル、へキセニル等が例示され、これらはそ
の水素原子の一部又は全部がフッ素等のハロゲン原子な
どで置換されていてもよい。In the above formula, R 2 , R 3 and R 4 are each a hydrogen atom or a monovalent organic group having 1 to 10 carbon atoms, preferably an alkyl, aryl, aralkyl or alkenyl group. Valent hydrocarbon group, for example, methyl, ethyl, propyl, butyl, hexyl, cyclohexyl, octyl, phenyl, tolyl, benzyl, vinyl, allyl, propenyl, hexenyl and the like. All may be substituted by halogen atoms such as fluorine.
【0022】上記式(1)のβ−ジケトン化合物として
は、例えばアセチルアセトン、プロピオニルアセトン、
ブチリルアセトン、イソブチリルアセトン、カプロイル
アセトン、ベンゾイルアセトン等のアセチルアセトン誘
導体、アセト酢酸メチル、アセト酢酸エチル、アセト酢
酸−iso−プロピル、アセト酢酸−tert−ブチ
ル、アセト酢酸−iso−ペンチル、アセト酢酸ベンジ
ル等のアセト酢酸エステル類、1,3−シクロペンタン
ジオン、1,3−シクロヘキサンジオン、4,4−ジメ
チル−1,3−シクロヘキサンジオン、5,5−ジメチ
ル−1,3−シクロヘキサンジオン等の環状β−ジケト
ン化合物などが挙げられる。Examples of the β-diketone compound of the above formula (1) include acetylacetone, propionylacetone,
Acetylacetone derivatives such as butyrylacetone, isobutyrylacetone, caproylacetone, benzoylacetone, methyl acetoacetate, ethyl acetoacetate, isopropylacetoacetate, tert-butylacetoacetate, iso-pentylacetoacetate, Acetoacetic esters such as benzyl acetate, 1,3-cyclopentanedione, 1,3-cyclohexanedione, 4,4-dimethyl-1,3-cyclohexanedione, 5,5-dimethyl-1,3-cyclohexanedione and the like And the like.
【0023】上記式(2)のジシラザン化合物として
は、具体的に1,1,3,3−テトラメチルジシラザ
ン、ヘキサメチルジシラザン、1,3−ジ−tert−
ブチル−1,1,3,3−テトラメチルジシラザン、
1,3−ジ−n−ヘキシル−1,1,3,3−テトラメ
チルジシラザン、1,3−ジフェニル−1,1,3,3
−テトラメチルジシラザン、1,3−ジビニル−1,
1,3,3−テトラメチルジシラザンなどが例示され
る。Specific examples of the disilazane compound of the above formula (2) include 1,1,3,3-tetramethyldisilazane, hexamethyldisilazane, 1,3-di-tert-
Butyl-1,1,3,3-tetramethyldisilazane,
1,3-di-n-hexyl-1,1,3,3-tetramethyldisilazane, 1,3-diphenyl-1,1,3,3
-Tetramethyldisilazane, 1,3-divinyl-1,
Examples thereof include 1,3,3-tetramethyldisilazane.
【0024】上記式(1)のβ−ジケトン化合物と上記
式(2)のジシラザン化合物との使用割合は、式(1)
のジシラザン化合物を式(2)のβ−ジケトン化合物に
対して理論量で0.5〜10当量、特に経済性と反応性
を考慮すると0.6〜2当量とすることが好ましい。The ratio of the β-diketone compound of the above formula (1) to the disilazane compound of the above formula (2) is determined by the formula (1)
The theoretical amount of the disilazane compound of formula (2) is 0.5 to 10 equivalents to the β-diketone compound of formula (2), and particularly preferably 0.6 to 2 equivalents in consideration of economy and reactivity.
【0025】本発明では、上記式(1)のβ−ジケトン
化合物と上記式(2)のジシラザン化合物とを反応させ
るに際して、溶媒として有機ニトリル化合物を用いる。
この有機ニトリル化合物としては、例えばアセトニトリ
ル、プロピオニトリル、n−ブチロニトリル、iso−
ブチロニトリル、n−バレロニトリル、iso−バレロ
ニトリル、ヘキサンニトリル、ヘプタンニトリル、オク
タンニトリル、ノナンニトリル等の脂肪族系ニトリル化
合物、ベンゾニトリル、o−トルニトリル、m−トルニ
トリル、p−トルニトリル等の芳香族系ニトリル化合物
などが例示されるが、経済性、取扱い易さ、沸点などを
考慮するとアセトニトリルを用いるのが最も好ましい。In the present invention, when the β-diketone compound of the above formula (1) is reacted with the disilazane compound of the above formula (2), an organic nitrile compound is used as a solvent.
Examples of the organic nitrile compound include acetonitrile, propionitrile, n-butyronitrile, iso-
Aliphatic nitrile compounds such as butyronitrile, n-valeronitrile, iso-valeronitrile, hexanenitrile, heptanenitrile, octanenitrile, nonanonitrile, and aromatic compounds such as benzonitrile, o-tolunitrile, m-tolunitrile, and p-tolunitrile Although a nitrile compound is exemplified, it is most preferable to use acetonitrile in consideration of economy, ease of handling, boiling point, and the like.
【0026】有機ニトリル化合物の使用量は、適宜調整
することができるが、生産性と反応性の両面から考慮し
て、β−ジケトン化合物1モル当たり50〜600m
l、特に100〜300mlが好適である。The amount of the organic nitrile compound to be used can be appropriately adjusted, but in consideration of both productivity and reactivity, 50 to 600 m / mol of β-diketone compound is used.
1, especially 100 to 300 ml are preferred.
【0027】また、上記反応は、本発明の目的を損なわ
ない範囲で有機ニトリル化合物に1種類以上の他の溶媒
を任意の割合で混合した混合溶媒系で行うことも場合に
よっては可能である。The above reaction may be carried out in a mixed solvent system in which an organic nitrile compound is mixed with one or more other solvents at an arbitrary ratio within a range not to impair the object of the present invention.
【0028】上記反応は、有機ニトリル化合物とβ−ジ
ケトン化合物の混合液にジシラザン化合物を加える方
法、有機ニトリル化合物とジシラザン化合物の混合液に
β−ジケトン化合物を加える方法、あるいは両化合物と
もに溶媒を用いる方法のいずれでも行うことができる。The above reaction can be carried out by adding a disilazane compound to a mixture of an organic nitrile compound and a β-diketone compound, by adding a β-diketone compound to a mixture of an organic nitrile compound and a disilazane compound, or by using a solvent for both compounds. It can be done in any of the ways.
【0029】本発明においては、反応速度をより高める
ためにトリメチルクロロシラン等のクロロシラン類、ド
デシルベンゼンスルホン酸等のスルホン酸類及びその
塩、硫酸アンモニウム等の硫酸塩などの触媒の添加も可
能であるが、不純物混入及び副生成物副生の問題が発生
し易いため、無触媒で反応を行うのがより好ましい。In the present invention, catalysts such as chlorosilanes such as trimethylchlorosilane, sulfonic acids such as dodecylbenzenesulfonic acid and salts thereof, and sulfates such as ammonium sulfate can be added to further increase the reaction rate. It is more preferable to carry out the reaction without a catalyst because problems of impurity contamination and by-product by-product are likely to occur.
【0030】反応温度は10℃から還流する温度とする
ことが望ましい。反応温度を高くすれば反応速度は速く
なり、またアンモニアの系外への除去も容易となるた
め、還流下で反応させるのがより好ましい。The reaction temperature is desirably a temperature at which the temperature is refluxed from 10 ° C. If the reaction temperature is increased, the reaction rate is increased and the removal of ammonia out of the system is facilitated. Therefore, the reaction is more preferably performed under reflux.
【0031】本発明では、このような反応により下記式
(3)で示されるシリルエノールエーテル類を得ること
ができる。In the present invention, silyl enol ethers represented by the following formula (3) can be obtained by such a reaction.
【0032】[0032]
【化7】 (但し、式中R1、R2、R3、R4はそれぞれ上記と同様
である。)Embedded image (However, in the formula, R 1 , R 2 , R 3 , and R 4 are the same as above.)
【0033】上記式(3)で示されるシリルエノールエ
ーテル類の具体例としては、4−ジメチルシロキシ−3
−ペンテン−2−オン、4−トリメチルシロキシ−3−
ペンテン−2−オン、4−tert−ブチルジメチルシ
ロキシ−3−ペンテン−2−オン、4−トリメチルシロ
キシ−3−ヘキセン−2−オン、メチル−3−トリメチ
ルシロキシ−2−ブテノエート、エチル−3−トリメチ
ルシロキシ−2−ブテノエート、tert−ブチル−3
−トリメチルシロキシ−2−ブテノエートなどが挙げら
れる。A specific example of the silyl enol ether represented by the above formula (3) is 4-dimethylsiloxy-3
-Penten-2-one, 4-trimethylsiloxy-3-
Penten-2-one, 4-tert-butyldimethylsiloxy-3-penten-2-one, 4-trimethylsiloxy-3-hexen-2-one, methyl-3-trimethylsiloxy-2-butenoate, ethyl-3- Trimethylsiloxy-2-butenoate, tert-butyl-3
-Trimethylsiloxy-2-butenoate and the like.
【0034】[0034]
【発明の効果】本発明のシリルエノールエーテル類の製
造方法によれば、無触媒でも高反応速度及び高反応率
で、しかも副生成物の副生を効果的に抑制し得、また、
β−ジケトン化合物とジシラザン化合物のコンプレック
スが器壁や配管へ付着することもないもので、工業的に
非常に有利である。According to the method for producing silyl enol ethers of the present invention, a high reaction rate and a high reaction rate can be achieved without using a catalyst, and by-products can be effectively suppressed.
Since the complex of the β-diketone compound and the disilazane compound does not adhere to the vessel wall or piping, it is industrially very advantageous.
【0035】本発明方法で得られるシリルエノールエー
テル類は、塩素分を含まず、高純度であるので、有機合
成用中間体、シリル化剤等として幅広く利用することが
でき、特に電子材料等の分野において有用である。The silyl enol ethers obtained by the method of the present invention do not contain chlorine and have high purity, so that they can be widely used as intermediates for organic synthesis, silylating agents and the like. Useful in the field.
【0036】[0036]
【実施例】以下、実施例及び比較例を挙げて本発明を更
に詳細に説明するが、本発明は下記実施例に制限される
ものではない。EXAMPLES Hereinafter, the present invention will be described in more detail with reference to Examples and Comparative Examples, but the present invention is not limited to the following Examples.
【0037】〔実施例1〕4−トリメチルシロキシ−3
−ペンテン−2−オンの合成 撹拌機、還流器、滴下ロート、温度計及び窒素導入管を
備えたフラスコにヘキサメチルジシラザン364.0g
(2.3mol)とアセトニトリル600mlを入れ、
還流下で滴下ロートよりアセチルアセトン300.3g
(3.0mol)を4時間で滴下した。アセチルアセト
ンの滴下終了後、還流下で2時間熟成し、反応を完結さ
せた。反応液中に副生成物は、ほとんど見られなかっ
た。また、アセチルアセトンとヘキサメチルジシラザン
のコンプレックスの生成も見られなかった。得られた反
応液を減圧蒸留し、4−トリメチルシロキシ−3−ペン
テン−2−オンを圧力10mmHg、沸点72〜73℃
の留分として470.7g得た。目的物はシス体とトラ
ンス体の混合物として得られ、純度99.7%、収率は
91.1%であった。Example 1 4-Trimethylsiloxy-3
Synthesis of -penten-2-one 364.0 g of hexamethyldisilazane in a flask equipped with a stirrer, a reflux condenser, a dropping funnel, a thermometer and a nitrogen inlet tube.
(2.3 mol) and 600 ml of acetonitrile,
300.3 g of acetylacetone from the dropping funnel under reflux
(3.0 mol) was added dropwise over 4 hours. After the completion of the dropwise addition of acetylacetone, the mixture was aged for 2 hours under reflux to complete the reaction. Almost no by-product was found in the reaction solution. No complex of acetylacetone and hexamethyldisilazane was formed. The resulting reaction solution was distilled under reduced pressure to give 4-trimethylsiloxy-3-penten-2-one at a pressure of 10 mmHg and a boiling point of 72 to 73 ° C.
470.7 g were obtained as a fraction. The target compound was obtained as a mixture of a cis-form and a trans-form, and had a purity of 99.7% and a yield of 91.1%.
【0038】〔実施例2〕4−トリメチルシロキシ−3
−ペンテン−2−オンの合成 撹拌機、還流器、滴下ロート、温度計及び窒素導入管を
備えたフラスコにアセチルアセトン300.3g(3.
0mol)とアセトニトリル600m1を入れ、還流下
で滴下ロートよりヘキサメチルジシラザン484.2g
(3.0mol)を4時間で滴下した。この時点で反応
は完結していた。反応液中に副生成物はほとんど見られ
なかった。また、アセチルアセトンとヘキサメチルジシ
ラザンのコンプレックスの生成も見られなかった。Example 2 4-Trimethylsiloxy-3
Synthesis of -penten-2-one 300.3 g of acetylacetone (3.10 g) was added to a flask equipped with a stirrer, a reflux condenser, a dropping funnel, a thermometer and a nitrogen inlet tube.
0 mol) and 600 ml of acetonitrile, and 484.2 g of hexamethyldisilazane from a dropping funnel under reflux.
(3.0 mol) was added dropwise over 4 hours. At this point the reaction was complete. Almost no by-product was found in the reaction solution. No complex of acetylacetone and hexamethyldisilazane was formed.
【0039】〔実施例3〕メチル−3−トリメチルシロ
キシ−2−ブテノエートの合成 撹拌機、還流器、滴下ロート、温度計及び窒素導入管を
備えたフラスコにヘキサメチルジシラザン61.3g
(0.38mol)とアセトニトリル100m1を入
れ、還流下で滴下ロートよりアセト酢酸メチル58.1
g(0.5mol)を3時間で滴下した。アセト酢酸メ
チルの滴下終了後、還流下で2時間熟成し、反応を完結
させた。反応液中に副生成物はほとんど見られなかっ
た。得られた反応液を減圧蒸留し、メチル−3−トリメ
チルシロキシ−2−ブテノエートを圧力10mmHg、
沸点74〜76℃の留分として85.5g得た。目的物
はシス体とトランス体の混合物として得られ、純度9
9.6%、収率は90.8%であった。Example 3 Synthesis of methyl-3-trimethylsiloxy-2-butenoate 61.3 g of hexamethyldisilazane was placed in a flask equipped with a stirrer, a reflux condenser, a dropping funnel, a thermometer and a nitrogen inlet tube.
(0.38 mol) and 100 ml of acetonitrile, and methyl refluxed 58.1 from a dropping funnel under reflux.
g (0.5 mol) was added dropwise over 3 hours. After the completion of the dropwise addition of methyl acetoacetate, the mixture was aged under reflux for 2 hours to complete the reaction. Almost no by-product was found in the reaction solution. The resulting reaction solution was distilled under reduced pressure, and methyl-3-trimethylsiloxy-2-butenoate was subjected to a pressure of 10 mmHg,
85.5 g were obtained as a fraction having a boiling point of 74 to 76 ° C. The target compound was obtained as a mixture of the cis- and trans-isomers and had a purity of
9.6% and the yield was 90.8%.
【0040】〔比較例1〕クロロシランを用いた4−ト
リメチルシロキシ−3−ペンテン−2−オンの合成 撹拌機、還流器、滴下ロート及び温度計を備えたフラス
コにアセチルアセトンを110.1g(1.1mo
l)、トリエチルアミンを111.3g(1.1mo
l)、トルエンを300m1入れ、滴下ロートよりトリ
メチルクロロシラン108.6g(1.0mol)を室
温、2時間で滴下した。トリメチルクロロシランの滴下
終了後、1時間還流を行った。ヘキサンを300ml加
えた後、トリエチルアミン塩酸塩を濾過により除去し、
濾液をロータリーエバポレーターで減圧濃縮した。減圧
蒸留し、4−トリメチルシロキシ−3−ペンテン−2−
オンを圧力10mmHg、沸点72〜74℃の留分とし
て90.6g、純度95.0%で得た。収率は52.6
%であった。蒸留の際、蒸留塔にトリエチルアミン塩酸
塩が付着し、目的物にも混入していた。[Comparative Example 1] Synthesis of 4-trimethylsiloxy-3-penten-2-one using chlorosilane 110.1 g of acetylacetone (1.10 g) was placed in a flask equipped with a stirrer, a reflux condenser, a dropping funnel and a thermometer. 1 mo
l), 111.3 g (1.1 mol) of triethylamine.
l), 300 ml of toluene was added, and 108.6 g (1.0 mol) of trimethylchlorosilane was added dropwise from a dropping funnel at room temperature for 2 hours. After the completion of the dropwise addition of trimethylchlorosilane, the mixture was refluxed for 1 hour. After adding 300 ml of hexane, triethylamine hydrochloride was removed by filtration,
The filtrate was concentrated under reduced pressure using a rotary evaporator. Distillation under reduced pressure, 4-trimethylsiloxy-3-pentene-2-
90.6 g of a fraction having a pressure of 10 mmHg and a boiling point of 72 to 74 ° C. was obtained at a purity of 95.0%. Yield 52.6
%Met. At the time of distillation, triethylamine hydrochloride adhered to the distillation column and was mixed with the target product.
【0041】〔比較例2〕テトラヒドロフラン溶媒での
4−トリメチルシロキシ−3−ペンテン−2−オンの合
成 撹拌機、還流器、滴下ロート、温度計及び窒素導入管を
備えたフラスコにヘキサメチルジシラザン484.2g
(3.0mol)とテトラヒドロフラン600m1を入
れ、還流下で滴下ロートよりアセチルアセトン300.
3g(3.0mol)を5時間で滴下した。アセチルア
セトンの滴下終了後、還流下で3時間熟成したが、反応
率は35.3%であり、反応は非常に遅かった。Comparative Example 2 Synthesis of 4-trimethylsiloxy-3-penten-2-one in tetrahydrofuran solvent Hexamethyldisilazane was placed in a flask equipped with a stirrer, refluxer, dropping funnel, thermometer and nitrogen inlet tube. 484.2g
(3.0 mol) and 600 ml of tetrahydrofuran.
3 g (3.0 mol) was added dropwise over 5 hours. After completion of the dropwise addition of acetylacetone, the mixture was aged for 3 hours under reflux. The reaction rate was 35.3%, and the reaction was very slow.
【0042】〔比較例3〕無溶媒での4−トリメチルシ
ロキシ−3−ペンテン−2−オンの合成 撹拌機、還流器、滴下ロート及び温度計を備えたフラス
コにアセチルアセトンを300.3g(3.0mol)
入れ、温度を100℃に保持しながら滴下ロートよりヘ
キサメチルジシラザン484.2g(3.0mol)を
3時間で滴下した。ヘキサメチルジシラザンの滴下終了
後、1時間還流を行った。反応液中の副生成物量は、目
的物に対して上記化合物(1)が2.1%、上記化合物
(2)が7.3%であった。また、アセチルアセトンと
ヘキサメチルジシラザンのコンプレックスが器壁、特に
コンデンサーに多く付着し、閉塞のおそれがあった。得
られた反応液を減圧蒸留し、4−トリメチルシロキシ−
3−ペンテン−2−オンを圧力10mmHg、沸点72
〜74℃の留分として373.6g、純度91.5%で
得た。収率は72.3%であった。[Comparative Example 3] Synthesis of 4-trimethylsiloxy-3-penten-2-one without using a solvent A flask equipped with a stirrer, a reflux condenser, a dropping funnel and a thermometer was charged with 300.3 g of acetylacetone (3. 0 mol)
While maintaining the temperature at 100 ° C., 484.2 g (3.0 mol) of hexamethyldisilazane was dropped from the dropping funnel over 3 hours. After the completion of the dropping of hexamethyldisilazane, the mixture was refluxed for 1 hour. The amount of by-products in the reaction solution was 2.1% for the compound (1) and 7.3% for the compound (2) based on the target product. Further, a complex of acetylacetone and hexamethyldisilazane adhered much to the vessel wall, particularly to the condenser, and there was a risk of clogging. The resulting reaction solution was distilled under reduced pressure to give 4-trimethylsiloxy-
3-penten-2-one at a pressure of 10 mmHg and a boiling point of 72
373.6 g as a fraction at 7474 ° C., purity 91.5%. The yield was 72.3%.
【0043】アセチルアセトンの滴下終了後、還流下で
3時間熟成したが、反応率は35.3%であり、反応は
非常に遅かった。After completion of the dropwise addition of acetylacetone, the mixture was aged for 3 hours under reflux. The conversion was 35.3%, and the reaction was very slow.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 殿村 洋一 新潟県中頸城郡頸城村大字西福島28−1 信越化学工業株式会社合成技術研究所内 ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Yoichi Tonomura 28-1 Nishifukushima, larger section of Kushiro-mura, Nakakushiro-gun, Niigata Prefecture Synthetic Technology Laboratory, Shin-Etsu Chemical Co., Ltd.
Claims (3)
ン化合物と下記一般式(2)で示されるジシラザン化合
物とを反応させて下記一般式(3)で示されるシリルエ
ノールエーテル類を製造する方法において、溶媒として
有機ニトリル化合物を用いることを特徴とするシリルエ
ノールエーテル類の製造方法。 【化1】 (但し、式中R1は炭素数1〜10のアルキル基又はア
ルコキシ基、R2、R3、R4はそれぞれ水素原子又は炭
素数1〜10の有機基である。)1. A β-diketone compound represented by the following general formula (1) is reacted with a disilazane compound represented by the following general formula (2) to produce a silyl enol ether represented by the following general formula (3). A method for producing silyl enol ethers, wherein an organic nitrile compound is used as a solvent. Embedded image (However, in the formula, R 1 is an alkyl group or an alkoxy group having 1 to 10 carbon atoms, and R 2 , R 3 , and R 4 are each a hydrogen atom or an organic group having 1 to 10 carbon atoms.)
ザンとを反応させて4−トリメチルシロキシ−3−ペン
テン−2−オンを製造する方法において、溶媒としてア
セトニトリルを用いることを特徴とする4−トリメチル
シロキシ−3−ペンテン−2−オンの製造方法。2. A method for producing 4-trimethylsiloxy-3-penten-2-one by reacting acetylacetone and hexamethyldisilazane, wherein acetonitrile is used as a solvent. -A method for producing penten-2-one.
ザンとを反応させてメチル−3−トリメチルシロキシ−
2−ブテノエートを製造する方法において、溶媒として
アセトニトリルを用いることを特徴とするメチル−3−
トリメチルシロキシ−2−ブテノエートの製造方法。3. The reaction of methyl acetoacetate with hexamethyldisilazane to give methyl-3-trimethylsiloxy-
A method for producing 2-butenoate, wherein acetonitrile is used as a solvent.
A method for producing trimethylsiloxy-2-butenoate.
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JP3520738B2 JP3520738B2 (en) | 2004-04-19 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6174650B1 (en) * | 1997-01-23 | 2001-01-16 | Matsushita Electric Industrial Co., Ltd. | Manufacturing method and apparatus for semiconductor device |
WO2011108661A1 (en) | 2010-03-04 | 2011-09-09 | 国立大学法人京都大学 | Method for producing silylenol ethers |
-
1997
- 1997-10-13 JP JP29486597A patent/JP3520738B2/en not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6174650B1 (en) * | 1997-01-23 | 2001-01-16 | Matsushita Electric Industrial Co., Ltd. | Manufacturing method and apparatus for semiconductor device |
WO2011108661A1 (en) | 2010-03-04 | 2011-09-09 | 国立大学法人京都大学 | Method for producing silylenol ethers |
US8809567B2 (en) | 2010-03-04 | 2014-08-19 | Kyoto University | Method for producing silylenol ethers |
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