JPH1110472A - Vacuum suction holding device - Google Patents

Vacuum suction holding device

Info

Publication number
JPH1110472A
JPH1110472A JP17015397A JP17015397A JPH1110472A JP H1110472 A JPH1110472 A JP H1110472A JP 17015397 A JP17015397 A JP 17015397A JP 17015397 A JP17015397 A JP 17015397A JP H1110472 A JPH1110472 A JP H1110472A
Authority
JP
Japan
Prior art keywords
porous ceramic
workpiece
sealing material
holding surface
holding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17015397A
Other languages
Japanese (ja)
Other versions
JP3865872B2 (en
Inventor
Hiroyuki Morioka
裕之 森岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP17015397A priority Critical patent/JP3865872B2/en
Publication of JPH1110472A publication Critical patent/JPH1110472A/en
Application granted granted Critical
Publication of JP3865872B2 publication Critical patent/JP3865872B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Jigs For Machine Tools (AREA)
  • Dicing (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PROBLEM TO BE SOLVED: To flatten a holding surface with high accuracy by taking one main surface of a porous ceramic plate as a holding surface, coating the peripheral edge part of the holding surface and the side of the porous ceramic plate with a sealing material such as resin, glass or the like to be air-tightly sealed, and making the sealing material coated on the peripheral edge part of the holding surface conductive. SOLUTION: As a sealing material 5, conductive resin or glass is applied to the side of a porous ceramic body 2 and stepped parts 2b, 2d of upper and lower one main surfaces and impregnated in such a manner as to fill up pores of the porous ceramic body 2. Further, coating is performed to fill up the stepped parts 2b, 2d of the upper and lower one main surfaces to be air-tightly sealed. Thus, the top of the sealing material 5 coated on the stepped part 2b and an adsorption surface are flattened to form the same flat surface to be taken as a holding surface 6 for a workpiece W. The workpiece W is placed on the holding surface 6 of a vacuum suction holding device 1, and vacuum- sucked from a sucking surface 4 by a vacuum pump to suck and hold the work piece W with good accuracy.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、保持面の吸着部が
多孔質セラミックスからなる真空吸着保持装置に関する
ものであり、特に、半導体ウエハや薄膜磁気ヘッド用基
板などの被加工物をブレードで切断分離するダイシング
加工やスライシング加工に好適なものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum suction holding device in which a holding portion of a holding surface is made of a porous ceramic, and more particularly to cutting a workpiece such as a semiconductor wafer or a substrate for a thin film magnetic head with a blade. It is suitable for dicing or slicing for separation.

【0002】[0002]

【従来の技術】従来、半導体装置や薄膜磁気ヘッドの製
造工程において、半導体ウエハや磁気ヘッド用基板など
の被加工物を切断分離する工程では、被加工物を吸着保
持するために真空吸着保持装置が使用されている。
2. Description of the Related Art Conventionally, in the process of cutting and separating a workpiece such as a semiconductor wafer or a substrate for a magnetic head in a manufacturing process of a semiconductor device or a thin film magnetic head, a vacuum suction holding device for suctioning and holding the workpiece. Is used.

【0003】この種の真空吸着保持装置には、保持面の
吸着部が多孔質セラミック体からなるものと、緻密質セ
ラミック板に多数の吸引孔を穿設したものがあり、その
中でも被加工物の切断分離工程では均一な吸着力が得ら
れる多孔質タイプのものが多用されている。
[0003] This type of vacuum suction holding device includes a device in which a suction portion of a holding surface is made of a porous ceramic body and a device in which a number of suction holes are formed in a dense ceramic plate. In the cutting / separating step, a porous type capable of obtaining a uniform adsorption force is often used.

【0004】図4は一般的な多孔質タイプの真空吸着保
持装置21を示したもので、ステンレス等の金属からな
る基体24の中央に開口する凹部25に、被加工物Wよ
り若干径の小さな多孔質セラミック体22を嵌合し、そ
の上面を吸着面23とするとともに、該吸着面23を基
体24のリム部27の頂面28と同一平面上に位置させ
ることで被加工物Wの保持面29を形成したものであっ
た。そして、上記基体24の凹部25に連通する排気孔
26より真空吸引することで、前記保持面29に載置し
た被加工物Wを吸着させて固定するとともに、ダイヤモ
ンドブレード30をリム部27の頂面28と微小に当接
させ、接触したことを電気的に検知して切断開始状態と
したあと、ダイヤモンドブレード30を保持面29上に
沿って水平に移動させるか、あるいは真空吸着保持装置
21を水平に移動させることで、被加工物Wを所定の形
状に切断分離するようになっていた。
FIG. 4 shows a general porous type vacuum suction holding device 21 in which a recess 25 opened at the center of a base 24 made of metal such as stainless steel has a diameter slightly smaller than the workpiece W. The workpiece W is held by fitting the porous ceramic body 22 and using the upper surface thereof as the suction surface 23 and positioning the suction surface 23 on the same plane as the top surface 28 of the rim 27 of the base 24. The surface 29 was formed. Then, the workpiece W placed on the holding surface 29 is sucked and fixed by vacuum suction through an exhaust hole 26 communicating with the concave portion 25 of the base 24, and the diamond blade 30 is fixed to the top of the rim 27. After making minute contact with the surface 28 and electrically detecting the contact to make the cutting start state, the diamond blade 30 is moved horizontally along the holding surface 29 or the vacuum suction holding device 21 is moved. The workpiece W is cut and separated into a predetermined shape by moving the workpiece W horizontally.

【0005】[0005]

【発明が解決しようとする課題】ところが、図4の真空
吸着保持装置21のように、基体24の凹部25に多孔
質セラミック体22を嵌合した二体構造のものでは、金
属からなる基体24と多孔質セラミック体22との間の
熱膨張差が大きいために、被加工物Wの切断を行うとダ
イヤモンドブレード30との摩擦により発生する熱でも
って真空吸着保持装置21の保持面29が微妙に変形す
るといった課題があった。その為、半導体ウエハや薄膜
磁気ヘッド用基板などのように一枚の基板から多数の製
品を所定の寸法通りに切り出すことができず、生産性を
高めることができなかった。
However, in the case of a two-body structure in which the porous ceramic body 22 is fitted into the concave portion 25 of the base 24 as in the vacuum suction holding device 21 of FIG. 4, the base 24 made of metal is used. When the workpiece W is cut, the holding surface 29 of the vacuum suction holding device 21 is delicate due to the heat generated by friction with the diamond blade 30 because the difference in thermal expansion between the workpiece and the porous ceramic body 22 is large. There was a problem that it was deformed. For this reason, a large number of products cannot be cut out from a single substrate such as a semiconductor wafer or a substrate for a thin-film magnetic head according to predetermined dimensions, and productivity cannot be increased.

【0006】また、保持面29を構成する吸着面23と
リム部27の頂面28は異材質からなるために同一平面
を構成するように研削することは難しいものであった。
Further, since the suction surface 23 forming the holding surface 29 and the top surface 28 of the rim portion 27 are made of different materials, it is difficult to grind them so as to form the same plane.

【0007】即ち、リム部27を構成するステンレスは
吸着面23を構成するセラミックスに比べて硬度が小さ
いことから、平面研削を行うと吸着面23に比べリム部
27の頂面28が多く削られ、段差が形成されるといっ
た課題があった。その為、被加工物Wとして半導体ウエ
ハや薄膜磁気ヘッド用基板を切断すると、被加工物Wの
周縁部がリム部27の頂面28で保持されていないこと
から、被加工物Wの周縁部より所定寸法の製品を切り出
すことができなかった。
That is, since the stainless steel forming the rim portion 27 has a lower hardness than the ceramics forming the suction surface 23, the top surface 28 of the rim portion 27 is cut more than the suction surface 23 when the surface is ground. There is a problem that a step is formed. Therefore, when a semiconductor wafer or a substrate for a thin-film magnetic head is cut as the workpiece W, the peripheral edge of the workpiece W is not held by the top surface 28 of the rim portion 27, so that the peripheral edge of the workpiece W It was not possible to cut out a product having a predetermined size.

【0008】しかも、図4の真空吸着保持装置21のよ
うに二体構造であると、吸着面23を構成する多孔質セ
ラミック体22と基体24とを別々に形成しなければな
らないことから、部品点数が多くなるとともに、前述し
たように吸着面23とリム部27の頂面28とが同一平
面上に位置するよう平坦化するために、多孔質セラミッ
ク体22及び基体24の寸法精度を厳密に管理しなけれ
ばならないなどの不都合もあった。
In addition, in the case of a two-body structure as in the vacuum suction holding device 21 of FIG. 4, the porous ceramic body 22 and the base 24 constituting the suction surface 23 must be formed separately. In order to increase the number of points and flatten the adsorption surface 23 and the top surface 28 of the rim portion 27 on the same plane as described above, the dimensional accuracy of the porous ceramic body 22 and the base 24 must be strictly adjusted. There were also inconveniences such as having to manage.

【0009】[0009]

【課題を解決するための手段】そこで、上記課題に鑑
み、本発明の真空吸着保持装置は、多孔質セラミック板
の一主面を保持面とし、該保持面の周縁部及び多孔質セ
ラミック板の側面に樹脂やガラスなどの封止材を塗着せ
しめて気密にシールするとともに、少なくとも上記保持
面の周縁部に塗着した封止材に導電性を持たせたことを
特徴とするものである。
SUMMARY OF THE INVENTION In view of the above problems, a vacuum suction holding apparatus according to the present invention uses one main surface of a porous ceramic plate as a holding surface, and a peripheral portion of the holding surface and a porous ceramic plate. A sealing material such as resin or glass is applied to the side surface to seal airtightly, and at least a sealing material applied to a peripheral portion of the holding surface has conductivity. .

【0010】[0010]

【作用】本発明の真空吸着保持装置は、多孔質セラミッ
ク板の側面及び吸着面の周縁部に、樹脂やガラスなどの
封止材を塗着した一体構造としてあることから、従来の
二体構造のように切断時に発生する加工熱による保持面
の変形を抑えることができる。しかも、吸着面を含む被
加工物の保持面を平坦に仕上げることができるととも
に、上記封止材は多孔質セラミック板の気孔を埋めるよ
うに被覆含浸させてあることから周囲を確実にシールす
ることができる。
The vacuum suction holding device according to the present invention has an integral structure in which a sealing material such as resin or glass is applied to the side surface of the porous ceramic plate and the peripheral portion of the suction surface. As described above, deformation of the holding surface due to processing heat generated at the time of cutting can be suppressed. In addition, the holding surface of the workpiece including the suction surface can be finished flat, and the sealing material is impregnated so as to fill the pores of the porous ceramic plate. Can be.

【0011】さらに、少なくとも保持面の周縁部に塗着
した封止材には導電性を持たせてあることから、ダイヤ
モンドブレードが微小に接触したことを電気的に検知す
ることができ、保持面を傷付けることなく、被加工物を
切断することができる。
Furthermore, since the sealing material applied to at least the peripheral portion of the holding surface is made conductive, it is possible to electrically detect the minute contact of the diamond blade with the holding surface, and The workpiece can be cut without damaging the workpiece.

【0012】[0012]

【発明の実施の形態】以下、本発明の実施形態について
説明する。
Embodiments of the present invention will be described below.

【0013】図1は本発明の真空吸着保持装置1の一例
を示す図で、(a)は斜視図、(b)は(a)のX−X
線断面図であり、図2は図1(b)のA部を拡大した断
面図である。
FIG. 1 is a view showing an example of a vacuum suction holding apparatus 1 according to the present invention, in which (a) is a perspective view and (b) is XX of (a).
2 is an enlarged sectional view of a portion A in FIG. 1B.

【0014】図1の真空吸着保持装置は、被加工物Wよ
りも大きな外径を有する円盤状の多孔質セラミック板2
からなり、該多孔質セラミック板2の一主面の周縁部に
は深さh50〜500μm程度の段差部2bを設け、中
央凸部2aの表面を吸着面3とするとともに、他方の一
主面の周縁部にも深さh50〜500μm程度の段差部
2dを設け、中央凸部2cの表面を吸引面4としてあ
る。なお、吸着面3の外形は被加工物Wと同等あるいは
若干小さくなるように形成してある。
The vacuum suction holding apparatus shown in FIG. 1 is a disk-shaped porous ceramic plate 2 having an outer diameter larger than the workpiece W.
The stepped portion 2b having a depth h of about 50 to 500 μm is provided at a peripheral portion of one main surface of the porous ceramic plate 2, and the surface of the central convex portion 2a is used as the suction surface 3 while the other main surface is formed. Is also provided with a step 2d having a depth h of about 50 to 500 μm at the peripheral edge thereof, and the surface of the central convex portion 2c is used as the suction surface 4. The outer shape of the suction surface 3 is formed to be equal to or slightly smaller than the workpiece W.

【0015】また、上記多孔質セラミック体2の側面
と、上下一主面の段差部2b,2dには、封止材5とし
て導電性を有する樹脂やガラスを多孔質セラミック体2
の気孔を埋めるように塗布含浸させるとともに、上下一
主面の段差部2b,2dを埋めるように被覆して気密に
シールしてあり、段差部2bに塗着した封止材5の頂面
と吸着面3とが同一平面を構成するように平坦化し、被
加工物Wの保持面6としてある。
On the side surface of the porous ceramic body 2 and the step portions 2b and 2d of the upper and lower main surfaces, a conductive resin or glass as the sealing material 5 is provided.
Of the sealing material 5 applied to the stepped portion 2b and airtightly sealed so as to fill the stepped portions 2b and 2d of the upper and lower main surfaces. The suction surface 3 is flattened so as to form the same plane, and is used as a holding surface 6 for the workpiece W.

【0016】その為、真空吸着保持装置1の保持面6に
被加工物Wを載置し、吸引面4より真空ポンプ(不図
示)で真空吸引すれば、被加工物Wを均一な吸着力でも
って吸引することができるとともに、段差のない平坦な
保持面6を有することから、被加工物Wを精度良く吸着
保持することができる。
For this reason, if the workpiece W is placed on the holding surface 6 of the vacuum suction holding device 1 and vacuum-suctioned from the suction surface 4 by a vacuum pump (not shown), the workpiece W can be uniformly sucked. Thus, the workpiece W can be sucked and held, and the work piece W can be suction-held accurately with the flat holding surface 6 having no step.

【0017】また、保持面6に固定した被加工物Wを切
断分離するには、まず、保持面6の周縁部に塗着する封
止材5にダイヤモンドブレード30を当接させて切断開
始状態とする。
In order to cut and separate the workpiece W fixed to the holding surface 6, first, the diamond blade 30 is brought into contact with the sealing material 5 applied to the peripheral portion of the holding surface 6 to start cutting. And

【0018】即ち、図1(b)に示すように、電源の一
方をダイヤモンドブレード30に、他方を真空吸着保持
装置1に塗着した封止材5にそれぞれ接続しておけば、
該封止材5が導電性を有することから、ダイヤモンドブ
レード30を封止材5と接触させることにより導通をは
かることができ、流れる電流を電流計で測定することに
よりダイヤモンドブレード30が真空吸着保持装置1の
保持面6と微小に当接し、切断開始状態となったことを
確認することができる。
That is, as shown in FIG. 1B, if one of the power supplies is connected to the diamond blade 30 and the other is connected to the sealing material 5 applied to the vacuum suction holding device 1,
Since the sealing material 5 has conductivity, conduction can be achieved by bringing the diamond blade 30 into contact with the sealing material 5, and the diamond blade 30 is held by vacuum suction by measuring the flowing current with an ammeter. It is possible to confirm that the cutting surface has started to be in a state of minute contact with the holding surface 6 of the device 1.

【0019】かくして、ダイヤモンドブレード30を水
平方向に移動させるか、あるいは真空吸着保持装置1を
水平方向に移動させることで被加工物Wを所定の形状に
切断分離することができる。
Thus, the workpiece W can be cut and separated into a predetermined shape by moving the diamond blade 30 in the horizontal direction or by moving the vacuum suction holding device 1 in the horizontal direction.

【0020】また、図1に示す真空吸着保持装置1は、
多孔質セラミック体2からなる一体構造であることか
ら、被加工物Wの保持面6を段差のない平坦面とするこ
とができるとともに、切断時に発生する加工熱による保
持面6の変形を抑えることができ、被加工物Wを所定の
寸法精度に切断することができるため、例えば、半導体
ウエハや薄膜磁気ヘッド用基板のように一枚の基板から
多数の製品を切り出し、かつ一つ一つの製品に高い寸法
精度が要求される被加工物Wを切断する時でも、全ての
製品を所定の寸法通りに切り出すことができ、生産性を
大幅に高めることができる。
The vacuum suction holding device 1 shown in FIG.
Since it is an integral structure made of the porous ceramic body 2, the holding surface 6 of the workpiece W can be a flat surface with no steps, and the deformation of the holding surface 6 due to processing heat generated during cutting can be suppressed. Since the workpiece W can be cut to a predetermined dimensional accuracy, for example, a large number of products are cut out from a single substrate such as a semiconductor wafer or a substrate for a thin film magnetic head, and each product is cut out. Even when the workpiece W that requires high dimensional accuracy is cut, all products can be cut out according to predetermined dimensions, and productivity can be greatly increased.

【0021】また、多孔質セラミック体2の側面及び保
持面6の周縁部には、封止材5として導電性を有する樹
脂やガラスを塗着し、気密にシールしてあることから、
吸引面4より真空吸引すれば、所望の吸着力でもって吸
着面3に被加工物Wを吸着保持することができるととも
に、保持面6の周縁部に塗着した封止材5にダイヤモン
ドブレード30を接触させれば、確実に導通をはかるこ
とができるため、微小に当接したことを電気的に検知す
ることができ、保持面6を傷付けることなく被加工物W
を切断分離することができる。
Further, since a resin or glass having conductivity is applied as a sealing material 5 to the side surface of the porous ceramic body 2 and the peripheral portion of the holding surface 6 and the airtight sealing is performed.
By vacuum suction from the suction surface 4, the workpiece W can be suction-held on the suction surface 3 with a desired suction force, and the diamond blade 30 is applied to the sealing material 5 applied to the peripheral edge of the holding surface 6. , Contact can be reliably established, so that the minute contact can be electrically detected, and the workpiece W can be detected without damaging the holding surface 6.
Can be cut and separated.

【0022】ところで、このような一体構造の真空吸着
保持装置1を構成する多孔質セラミック体2としては、
保持面6の変形を抑えるために8000kg/mm2
上の剛性(ヤング率)を有するものが良く、例えば、ア
ルミナ、ジルコニア、窒化珪素、炭化珪素、窒化アルミ
ニウムなどのセラミックスを使用することができる。
By the way, as the porous ceramic body 2 constituting the vacuum suction holding apparatus 1 having such an integrated structure,
In order to suppress deformation of the holding surface 6, a material having a rigidity (Young's modulus) of 8000 kg / mm 2 or more is preferable. For example, ceramics such as alumina, zirconia, silicon nitride, silicon carbide, and aluminum nitride can be used.

【0023】また、被加工物Wを均一な吸着力で保持す
るには多孔質セラミック体2の平均気孔径が5〜50μ
mでかつ気孔率が5〜40%のものが良く、より好まし
くは平均気孔径が5〜10μmでかつ気孔率が25〜3
5%のものが良い。これは、多孔質セラミック体2の平
均気孔径が5μm未満であると、多孔質セラミック体2
内を通過する気体の通気抵抗が大きすぎるために吸引力
を高めたとしても大きな吸着力が得られないからであ
り、逆に、平均気孔径が50μmより大きくなると、厚
みの薄い被加工物Wを吸着させた時に気孔部が凹に窪
み、被加工物Wの平坦精度が阻害され、所定の寸法精度
に切断することができなくなるからである。
In order to hold the workpiece W with a uniform suction force, the average pore diameter of the porous ceramic body 2 is 5 to 50 μm.
m and a porosity of 5 to 40% are preferred, and more preferably an average pore diameter of 5 to 10 μm and a porosity of 25 to 3
5% is good. This is because if the average pore diameter of the porous ceramic body 2 is less than 5 μm,
This is because even if the suction force is increased, a large suction force cannot be obtained because the gas flow resistance of the gas passing through the inside is too large. Conversely, if the average pore diameter is larger than 50 μm, the thin workpiece W This causes the pores to be recessed when suction is performed, thereby impairing the flatness accuracy of the workpiece W and making it impossible to cut the workpiece W to a predetermined dimensional accuracy.

【0024】また、多孔質セラミック体2の気孔率が5
未満では、吸着面3と吸引面4とを連通する開気孔が少
ないために均一な吸着力が得られず、逆に、気孔率が4
0%より大きくなると多孔質セラミック板2の剛性が大
きく低下し、保持面6が変形する恐れがあるからであ
る。
The porosity of the porous ceramic body 2 is 5
If it is less than 1, the number of open pores communicating the suction surface 3 and the suction surface 4 is small, so that a uniform suction force cannot be obtained.
If it exceeds 0%, the rigidity of the porous ceramic plate 2 is greatly reduced, and the holding surface 6 may be deformed.

【0025】なお、本発明の多孔質セラミック板2とし
ては、各種原料を造粒した顆粒を一軸加圧成形法や等加
圧成形法など一般的に公知のセラミック成形手段により
所定の形状に成形したあと、各種原料を完全に焼結させ
ることができる温度より若干低い温度で焼成することに
より得られる多孔質セラミックスを使用すれば良く、顆
粒の粒子径や焼成温度を適宜調整することで、所定の平
均気孔径及び気孔率に設定することができる。また、こ
の他に、予め各種原料からなるセラミック球状体を形成
しておき、これらをガラス等の接着成分で接合した多孔
質セラミックスや、球状のセラミック仮焼体をバインダ
ー等で接着したものを本焼成することで各セラミック仮
焼体の接触部を焼結させて形成した多孔質セラミックス
を用いることもでき、このような多孔質セラミックスを
用いれば、セラミック球状体やセラミック仮焼体の粒子
径を調整することで簡単に所定の平均気孔径及び気孔率
に設定することができるとともに、より均一な吸着力を
得ることができる。
As the porous ceramic plate 2 of the present invention, granules obtained by granulating various raw materials are formed into a predetermined shape by a generally known ceramic forming means such as a uniaxial pressing method or an isopressing method. After that, it is only necessary to use porous ceramics obtained by firing at a temperature slightly lower than the temperature at which various raw materials can be completely sintered, and by appropriately adjusting the particle diameter of the granules and the firing temperature, a predetermined amount can be obtained. Average pore diameter and porosity. In addition, ceramic spheres made of various raw materials are formed in advance, and porous ceramics in which these are bonded with an adhesive component such as glass, or those obtained by bonding spherical ceramic calcined bodies with a binder or the like are used. It is also possible to use porous ceramics formed by sintering the contact portions of each ceramic calcined body by firing, and by using such porous ceramics, it is possible to reduce the particle diameter of ceramic spherical bodies and ceramic calcined bodies. By adjusting, it is possible to easily set a predetermined average pore diameter and a predetermined porosity, and it is possible to obtain a more uniform adsorption force.

【0026】一方、多孔質セラミック体2の周囲を気密
にシールする封止材5としては、各種樹脂やガラスに導
電性付与剤を混ぜたものを用いれば良い。
On the other hand, as the sealing material 5 for hermetically sealing the periphery of the porous ceramic body 2, a material obtained by mixing a conductivity imparting agent with various resins or glass may be used.

【0027】例えば、導電性を有する樹脂としては、樹
脂材に、アクリル系、エポキシ系、シリコン系、ウレタ
ン系、フェノール系等の樹脂を用いることができ、導電
性付与剤としては、金(Au)、銀(Ag)、銅(C
u)、ニッケル(Ni)等の金属を用いれば良い。これ
らの導電性付与剤は上記樹脂材に対して60〜90重量
%、好ましくは80〜85重量%の割合で均質に混合分
散させることで樹脂の体積固有抵抗値を10Ω・cm以
下とすることができる。その為、微少な電流も流すこと
ができるため、ダイヤモンドブレード30が微小に当接
したことを確実に検出することができる。
For example, as the resin having conductivity, acrylic resin, epoxy resin, silicon resin, urethane resin, phenol resin, or the like can be used as the resin material. As the conductivity imparting agent, gold (Au) can be used. ), Silver (Ag), copper (C
u), a metal such as nickel (Ni) may be used. These conductivity-imparting agents are uniformly mixed and dispersed at a ratio of 60 to 90% by weight, preferably 80 to 85% by weight with respect to the resin material, so that the volume resistivity of the resin is 10 Ω · cm or less. Can be. For this reason, since a very small current can be passed, it is possible to reliably detect that the diamond blade 30 has minutely contacted.

【0028】また、導電性を有するガラスとしては、L
2 O−Al2 3 −SiO2 系ガラスに導電性付与剤
としてFe2 3 、Ni2 3 、Cu2 Oのうち一種以
上を含有させた表面抵抗が103 Ω未満の結晶化ガラ
ス、あるいは、Na2 O−WO3 −P2 5 系ガラスや
Na2 O−WO3 −B2 5 系ガラスからなり、その表
層部にNa0.7 WO3 結晶を析出させた表面抵抗が1Ω
程度の結晶化ガラス等を用いることができる。
The conductive glass may be L
Crystallization in which one or more of Fe 2 O 3 , Ni 2 O 3 , and Cu 2 O are added to an i 2 O—Al 2 O 3 —SiO 2 system glass as a conductivity imparting agent and the surface resistance is less than 10 3 Ω. It consists of glass or Na 2 O-WO 3 -P 2 O 5 system glass or Na 2 O-WO 3 -B 2 O 5 system glass, and has a surface resistance of Na 0.7 WO 3 crystal deposited on the surface layer. 1Ω
Some degree of crystallized glass or the like can be used.

【0029】また、これらの封止材5はペースト状とす
ることができるため、多孔質セラミック板2に塗布した
あと硬化させることで、気孔内にも適度に含浸させるこ
とができ、アンカー効果による確実な密着強度が得ら
れ、気密にシールすることができる。
Also, since these sealing materials 5 can be made into a paste, they can be applied to the porous ceramic plate 2 and then cured, so that the pores can be appropriately impregnated, and the anchor effect can be obtained. Reliable adhesion strength is obtained, and airtight sealing can be achieved.

【0030】なお、封止材5の厚み幅が薄すぎると、多
孔質セラミック体2の外表面に存在する気孔を確実に塞
ぐことが難しく、気密にシールできない恐れがあるた
め、多孔質セラミック体2中に含浸している部分も含
め、封止材5の最も薄い部分の厚み幅は7μm以上、よ
り好ましくは10μm以上とすることが良い。
If the thickness of the sealing material 5 is too small, it is difficult to reliably close the pores existing on the outer surface of the porous ceramic body 2, and there is a possibility that the sealing cannot be performed airtightly. The thickness of the thinnest portion of the sealing material 5 including the portion impregnated in 2 is preferably 7 μm or more, more preferably 10 μm or more.

【0031】また、本実施形態では、吸着面の外形を円
形としたものを示したが、被加工物Wの形状に合わせて
適宜設計すれば良く、例えば、楕円形や多角形をしたも
の、あるいは星形をしたものなどでも構わない。
In this embodiment, the suction surface has a circular outer shape. However, the suction surface may be appropriately designed according to the shape of the workpiece W. For example, an elliptical or polygonal shape may be used. Or a star-shaped thing may be used.

【0032】ところで、図1に示す真空吸着保持装置1
では、多孔質セタミック板2の側面及び保持面6の周縁
部を共に導電性を有する封止材5で気密にシールした例
を示したが、本発明では少なくとも保持面6の周縁部を
構成する封止材5が導電性を有していれば良く、例え
ば、多孔質セタミック板2の側面に導電性付与剤を含ま
ない前記樹脂やガラス、あるいはそれ以外の周知の樹脂
やガラスを塗着するとともに、保持面6の周縁部を構成
する封止材5に導電性付与剤を含有した前記樹脂やガラ
スを塗着した構造とすることもできる。
Incidentally, the vacuum suction holding device 1 shown in FIG.
In the above, an example is shown in which both the side surface of the porous setum plate 2 and the peripheral edge of the holding surface 6 are hermetically sealed with a sealing material 5 having conductivity. In the present invention, at least the peripheral edge of the holding surface 6 is formed. It is sufficient that the sealing material 5 has conductivity. For example, the above-mentioned resin or glass containing no conductivity-imparting agent, or other well-known resin or glass is applied to the side surface of the porous setumic plate 2. At the same time, a structure in which the resin or glass containing a conductivity-imparting agent is applied to the sealing material 5 constituting the peripheral portion of the holding surface 6 may be employed.

【0033】また、図1に示す真空吸着保持装置1で
は、多孔質セラミック板2の上下一主面に段差部2b,
2dを設けた例を示したが、図3に示す真空吸着保持装
置11ように、多孔質セラミック板12の上下一主面に
は段差部を設けず、吸着面13及び吸引面14を除く多
孔質セラミック板12の周縁部に気孔を埋めるよう封止
材15を十分に含浸させても良く、このような構造とす
れば、被加工物Wの保持面16をより一層平坦化するこ
とができ、さらに被加工物Wの加工精度を高めることが
できる。
In the vacuum suction holding device 1 shown in FIG. 1, a stepped portion 2b,
Although the example in which the 2d is provided is shown, as in the vacuum suction holding device 11 shown in FIG. 3, no step is provided on the upper and lower main surfaces of the porous ceramic plate 12, and the porous ceramic plate 12 except the suction surface 13 and the suction surface 14 is provided. The sealing material 15 may be sufficiently impregnated so as to fill the pores in the periphery of the porous ceramic plate 12. With such a structure, the holding surface 16 of the workpiece W can be further flattened. Further, the processing accuracy of the workpiece W can be improved.

【0034】(実施例)以下、本発明の実施例を図1の
真空吸着保持装置1を例にとって具体的に説明する。
(Embodiment) Hereinafter, an embodiment of the present invention will be described in detail with reference to the vacuum suction holding apparatus 1 shown in FIG.

【0035】まず、真空吸着保持装置1の多孔質セラミ
ック板2を形成するために、出発原料としてAl2 3
粉末を99重量%に対し、焼結助剤としてSiO2 、M
gOを合計1重量%の範囲でバインダー及び溶媒ととも
に添加混合し、スプレードライヤーにより造粒して顆粒
を製作した。そして、この顆粒を金型内に充填して円盤
状に成形したあと、金型から取り出し、1700℃程度
の温度で焼成することにより気孔率30%、平均気孔径
10μmのアルミナセラミックスからなる多孔質セラミ
ック板2を形成した。
First, in order to form the porous ceramic plate 2 of the vacuum suction holding device 1, Al 2 O 3
99% by weight of powder, SiO 2 , M
gO was added and mixed together with a binder and a solvent in a total range of 1% by weight, and granulated by a spray drier to produce granules. Then, the granules are filled in a mold and formed into a disk shape, taken out of the mold, and fired at a temperature of about 1700 ° C. to form a porous material made of alumina ceramic having a porosity of 30% and an average pore diameter of 10 μm. A ceramic plate 2 was formed.

【0036】次に、多孔質セラミック板2の上下一主面
の周縁部に研削加工を施して200μm程度の段差部2
b,2dを形成するとともに、上側の中央凸部2aの頂
面に研磨加工を施して吸着面3を形成し、さらに、下側
の中央凸部2cの頂面に研磨加工を施して吸引面4を形
成した。そして、導電性付与剤として銀(Ag)を80
重量%混合分散したアクリル樹脂のスラリーを、上記多
孔質セラミック板2の側面及び上下一主面の段差部2
b,2dに塗布したあと硬化させ、導電性を有する封止
材5でもって気密にシールし、しかるのち、上側の一主
面に研磨加工を施して被加工物Wの保持面6を形成する
ことにより図1に示す真空吸着保持装置1を形成した。
Next, the periphery of the upper and lower main surfaces of the porous ceramic plate 2 is subjected to grinding to form a stepped portion 2 of about 200 μm.
b, 2d are formed, and the top surface of the upper central convex portion 2a is polished to form the suction surface 3, and the top surface of the lower central convex portion 2c is polished to form the suction surface. 4 was formed. Then, silver (Ag) is added as a conductivity imparting agent to 80
The acrylic resin slurry mixed and dispersed by weight% is mixed with the side surface of the porous ceramic plate 2 and the step portion 2 of the upper and lower main surfaces.
After being applied to b and 2d, it is cured and hermetically sealed with a sealing material 5 having conductivity. Thereafter, the upper main surface is polished to form the holding surface 6 of the workpiece W. Thus, the vacuum suction holding device 1 shown in FIG. 1 was formed.

【0037】そして、この真空吸着保持装置1を用いて
8インチのシリコンウエハから50×50mmの寸法を
有する製品の切り出し作業を行ったところ、全ての製品
を切り出すことができ、また、これらの製品の寸法を測
定したところ、寸法誤差を±0.005mmに抑えるこ
とができた。
Then, when a product having a size of 50 × 50 mm is cut out from an 8-inch silicon wafer using the vacuum suction holding device 1, all products can be cut out. When the dimensions were measured, the dimensional error could be suppressed to ± 0.005 mm.

【0038】[0038]

【発明の効果】以上のように、本発明の真空吸着保持装
置によれば、多孔質セラミック板の一主面を保持面と
し、該保持面の周縁部及び多孔質セラミック板の側面に
樹脂やガラスなどの封止材を塗着せしめて気密にシール
するとともに、少なくとも上記保持面の周縁部に塗着し
た封止材に導電性を持たせたことにより、保持面を高精
度に平坦化することができ、均一な吸着力でもって被加
工物を精度良く保持することができる。しかも、ダイヤ
モンドブレードによる被加工物の切断工程において、保
持面の周縁部を構成する封止材にダイヤモンドブレード
を接触させれば、確実に導通をはかることができるた
め、微小に当接したことを電気的に検知することがで
き、保持面を傷付けることなく被加工物を切断分離する
ことができる。
As described above, according to the vacuum suction holding device of the present invention, one main surface of the porous ceramic plate is used as the holding surface, and the peripheral portion of the holding surface and the side surface of the porous ceramic plate are coated with resin or the like. A sealing material such as glass is applied and airtightly sealed, and at least the sealing material applied to the periphery of the holding surface is made conductive to flatten the holding surface with high precision. The workpiece can be accurately held with a uniform suction force. In addition, in the process of cutting the workpiece with the diamond blade, if the diamond blade is brought into contact with the sealing material forming the peripheral portion of the holding surface, conduction can be reliably achieved, so that the minute contact has been achieved. Electrical detection can be performed, and the workpiece can be cut and separated without damaging the holding surface.

【0039】その上、多孔質セラミック体からなる一体
構造品であることから、切断時に発生する加工熱による
保持面の変形を大幅に抑えることができるとともに、構
造上部品点数が少なくてすみ、かつ製造が容易であるた
めに製造コストを大幅に抑えることができる。
In addition, since it is an integral structure made of a porous ceramic body, deformation of the holding surface due to processing heat generated at the time of cutting can be greatly suppressed, and the number of components in the structure can be reduced, and Since the production is easy, the production cost can be greatly reduced.

【0040】かくして、本発明の真空吸着保持装置を半
導体ウエハや薄膜磁気ヘッド用基板のダイシング加工や
スライシング加工に用いれば、全ての製品を所定の寸法
通りに切断分離することができ、生産性を高めることが
できる。
Thus, if the vacuum suction holding apparatus of the present invention is used for dicing or slicing of a semiconductor wafer or a substrate for a thin-film magnetic head, all products can be cut and separated to predetermined dimensions, and productivity can be reduced. Can be enhanced.

【図面の簡単な説明】[Brief description of the drawings]

【図1】(a)は本発明の真空吸着保持装置の一実施形
態を示す斜視図であり、(b)は(a)のX−X線断面
図である。
FIG. 1A is a perspective view showing an embodiment of the vacuum suction holding device of the present invention, and FIG. 1B is a cross-sectional view taken along line XX of FIG.

【図2】図1(b)のA部を拡大した断面図である。FIG. 2 is an enlarged sectional view of a portion A in FIG. 1 (b).

【図3】本発明の真空吸着保持装置の他の実施形態を示
す断面図である。
FIG. 3 is a cross-sectional view showing another embodiment of the vacuum suction holding device of the present invention.

【図4】従来の真空吸着保持装置を示す断面図である。FIG. 4 is a sectional view showing a conventional vacuum suction holding device.

【符号の説明】[Explanation of symbols]

1・・・真空吸着保持装置 2・・・多孔質セラミック板 2a・・・凸部 2b・・・段差部 2c・・・凸部 2d・・・段差部 3・・・吸着面 4・・・吸引面 5・・・封止材 6・・・保持面 W・・・被加工物 DESCRIPTION OF SYMBOLS 1 ... Vacuum adsorption holding apparatus 2 ... Porous ceramic plate 2a ... Convex part 2b ... Step part 2c ... Convex part 2d ... Step part 3 ... Adsorption surface 4 ... Suction surface 5: Sealing material 6: Holding surface W: Workpiece

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】多孔質セラミック板の一主面を保持面と
し、該保持面の周縁部及び多孔質セラミック板の側面に
樹脂やガラスなどの封止材を塗着せしめて気密にシール
するとともに、少なくとも上記保持面の周縁部に塗着し
た封止材が導電性を有することを特徴とする真空吸着保
持装置。
1. A main surface of a porous ceramic plate is used as a holding surface, and a sealing material such as resin or glass is applied to a peripheral portion of the holding surface and a side surface of the porous ceramic plate to seal airtightly. And a sealing material applied to at least a peripheral portion of the holding surface has conductivity.
JP17015397A 1997-06-26 1997-06-26 Vacuum suction holding device Expired - Fee Related JP3865872B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17015397A JP3865872B2 (en) 1997-06-26 1997-06-26 Vacuum suction holding device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17015397A JP3865872B2 (en) 1997-06-26 1997-06-26 Vacuum suction holding device

Publications (2)

Publication Number Publication Date
JPH1110472A true JPH1110472A (en) 1999-01-19
JP3865872B2 JP3865872B2 (en) 2007-01-10

Family

ID=15899675

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17015397A Expired - Fee Related JP3865872B2 (en) 1997-06-26 1997-06-26 Vacuum suction holding device

Country Status (1)

Country Link
JP (1) JP3865872B2 (en)

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WO2005092564A1 (en) * 2004-03-25 2005-10-06 Ibiden Co., Ltd. Vacuum chuck and suction board
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JP2009253247A (en) * 2008-04-11 2009-10-29 Ariake Materials Co Ltd Suction body for vacuum suction apparatus, and vacuum suction apparatus
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JP2010172967A (en) * 2009-01-27 2010-08-12 Nitto Denko Corp Suction-fixing sheet and method of manufacturing the same
JP2010274378A (en) * 2009-05-29 2010-12-09 Kyocera Corp Vacuum suction member, vacuum suction apparatus, and method for manufacturing vacuum suction member
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JP2011009423A (en) * 2009-06-25 2011-01-13 Disco Abrasive Syst Ltd Holding table assembly and method of manufacturing holding table
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JP2014128849A (en) * 2012-12-28 2014-07-10 Taiheiyo Cement Corp Vacuum suction device and method of manufacturing the same
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* Cited by examiner, † Cited by third party
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JPH11226833A (en) * 1998-02-13 1999-08-24 Ckd Corp Adsorptive plate for vacuum chuck and manufacture thereof
WO2002103780A1 (en) * 2001-05-25 2002-12-27 Tokyo Electron Limited Substrate table, production method therefor and plasma treating device
US7067178B2 (en) 2001-05-25 2006-06-27 Tokyo Electron Limited Substrate table, production method therefor and plasma treating device
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US7544393B2 (en) 2001-05-25 2009-06-09 Tokyo Electron Limited Substrate table, production method therefor and plasma treating device
WO2005092564A1 (en) * 2004-03-25 2005-10-06 Ibiden Co., Ltd. Vacuum chuck and suction board
US7654887B2 (en) 2004-03-25 2010-02-02 Ibiden Co., Ltd. Vacuum chuck and suction board
JP2007149856A (en) * 2005-11-25 2007-06-14 Hamamatsu Photonics Kk Laser processing method
US9102005B2 (en) 2005-11-25 2015-08-11 Hamamatsu Photonics K.K. Laser processing method
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JP2014090105A (en) * 2012-10-31 2014-05-15 Disco Abrasive Syst Ltd Processing device
JP2014128849A (en) * 2012-12-28 2014-07-10 Taiheiyo Cement Corp Vacuum suction device and method of manufacturing the same
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