JPH11103169A - Glass ceramic wiring board - Google Patents

Glass ceramic wiring board

Info

Publication number
JPH11103169A
JPH11103169A JP26239797A JP26239797A JPH11103169A JP H11103169 A JPH11103169 A JP H11103169A JP 26239797 A JP26239797 A JP 26239797A JP 26239797 A JP26239797 A JP 26239797A JP H11103169 A JPH11103169 A JP H11103169A
Authority
JP
Japan
Prior art keywords
conductor layer
thickness
wiring board
glass
copper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26239797A
Other languages
Japanese (ja)
Inventor
Satoshi Hamano
智 濱野
Toshiaki Shigeoka
俊昭 重岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP26239797A priority Critical patent/JPH11103169A/en
Publication of JPH11103169A publication Critical patent/JPH11103169A/en
Pending legal-status Critical Current

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  • Conductive Materials (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a glass ceramic wiring board, which is provided with a copper conductor conductor layer formed on the surface of the wiring board with a stable bonding strength and a high adhesion, even if the glass ceramic wiring board is dipped into an acid or an alkaline etching liquid, a cleaning liquid, a plating solution or the like and has airtightness and high reliability. SOLUTION: In a conductor layer, which is formed by firing simultaneously with a glass ceramic porcelain and contains copper as its main component, the thickness of an internal conductor layer in a wiring board is 7 to 15 μm, the thickness of a surface conductor layer on the wiring board is 12 μm or thicker and the ratio of the thickness of a coated layer formed by coating on the surface conductor layer to the thickness of the surface conductor layer and the ratio of the thickness of the coated layer to the thickness of the surface conductor layer are 0.3 or lower.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、低抵抗の銅導体か
ら成る導体層を具備した各種回路基板や高周波用多層配
線基板等に適用されるガラスセラミック配線基板に関す
るものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a glass-ceramic wiring board applied to various circuit boards or high-frequency multilayer wiring boards having a conductor layer made of a low-resistance copper conductor.

【0002】[0002]

【従来の技術】従来より、半導体素子を収容する半導体
素子収納用パッケージや、半導体素子の他に各種電子部
品を搭載した混成集積回路装置等の各種配線基板用絶縁
基体として、電気絶縁性や化学的安定性等の特性に優れ
たアルミナ質セラミックスが多用されてきた。
2. Description of the Related Art Conventionally, as an insulating base for various kinds of wiring boards such as a semiconductor element housing package for housing a semiconductor element and a hybrid integrated circuit device mounted with various electronic components in addition to the semiconductor element, an electric insulating property and a chemical insulating property are known. Alumina ceramics having excellent properties such as mechanical stability have been widely used.

【0003】しかし、近年、携帯電話に代表される通信
分野における1〜10GHz帯の高周波領域で多用され
る配線基板には、前記アルミナ質セラミックスから成る
絶縁基体よりも更に導体損失の低減と小型化が要求され
ており、このため低抵抗導体として銅(Cu)や金(A
u)、銀(Ag)で導体層を形成した誘電率がアルミナ
質セラミックス並みのガラスセラミック配線基板が前記
通信分野用の配線基板として注目されており、例えば、
携帯電話のパワーアンプモジュール等への適用が検討さ
れている。
However, in recent years, wiring boards frequently used in the high frequency range of 1 to 10 GHz in the communication field typified by mobile phones have been further reduced in conductor loss and reduced in size compared to the insulating base made of alumina ceramics. Therefore, copper (Cu) or gold (A) is used as a low-resistance conductor.
u), a glass-ceramic wiring board having a conductor layer formed of silver (Ag) and having a dielectric constant similar to that of alumina ceramics has been attracting attention as a wiring board for the communication field.
Application to power amplifier modules and the like of mobile phones is being studied.

【0004】かかるガラスセラミック配線基板を構成す
る低抵抗導体として、金はコストが高くなるという難点
があり、一方、銀は大気中で焼成でき、絶縁基体表面に
形成した配線導体には金属被覆を施さなくてもワイヤー
ボンディングが可能であり、コスト面では有利であるも
のの、該銀の配線導体はマイグレーションや半田食われ
の問題から信頼性に劣るという欠点があり、それを改善
するために銀にパラジウム等を添加することが行われて
いるが、その場合には導体抵抗が高くなり、特に前記高
周波領域で使用する配線基板用には適用できないという
問題がある。
As a low-resistance conductor constituting such a glass-ceramic wiring board, gold has the disadvantage that the cost is high, while silver can be fired in the air, and the wiring conductor formed on the surface of the insulating substrate is coated with a metal coating. Although wire bonding is possible even without performing this method, it is advantageous in terms of cost, but the silver wiring conductor has a disadvantage that it is inferior in reliability due to migration and solder erosion. Addition of palladium or the like is performed, but in that case, the conductor resistance becomes high, and there is a problem that it cannot be applied particularly to a wiring board used in the high frequency region.

【0005】従って、前記低抵抗導体として非酸化性雰
囲気中で焼成しなければならないこと、及び絶縁基体表
面の配線導体に金属被覆を施すことが必要であるという
ものの、高い信頼性が確保できる銅導体の配線化が鋭意
研究開発されている。
Accordingly, although the low-resistance conductor must be fired in a non-oxidizing atmosphere and the wiring conductor on the surface of the insulating substrate needs to be coated with a metal, copper which can ensure high reliability can be obtained. The wiring of conductors has been intensively researched and developed.

【0006】かかる銅を配線導体とするガラスセラミッ
ク配線基板は、例えば、ガラスセラミック原料粉末と有
機バインダー等を用いて調製した泥漿をシート状に成形
した後、得られたガラスセラミックグリーンシートにビ
アホール等を打ち抜き加工し、該ビアホールに銅を主成
分とし、ガラス粉末を混合した導体ペーストを充填する
と共に、前記グリーンシート上に同様の銅メタライズ組
成物から成る導体ペーストを用いて所定の配線パターン
を形成し、これらを複数枚位置合わせして加圧積層した
後、一般的には前記積層体を水蒸気を含有する窒素雰囲
気から成る非酸化性雰囲気中で加熱して脱バインダー及
び焼成を行って作製することが提案されている(特開平
5−243700号公報参照)。
A glass ceramic wiring board using copper as a wiring conductor is formed, for example, by forming a slurry prepared using glass ceramic raw material powder and an organic binder into a sheet, and then forming a via hole or the like in the obtained glass ceramic green sheet. And the via hole is filled with a conductive paste containing copper as a main component and a glass powder, and a predetermined wiring pattern is formed on the green sheet using a conductive paste made of the same copper metallized composition. After a plurality of these are aligned and pressure-laminated, they are generally produced by heating the laminated body in a non-oxidizing atmosphere composed of a nitrogen atmosphere containing water vapor to remove the binder and fire. (See Japanese Patent Application Laid-Open No. 5-243700).

【0007】[0007]

【発明が解決しようとする課題】しかしながら、前記提
案で得られる焼成後の銅導体にはガラス成分が含まれて
いることから、表面の銅導体から成る導体層にNi−A
uメッキやCu−Auメッキ等の金属被覆を施す場合、
予め銅導体表面のガラスを除去するために酸性あるいは
アルカリ性のエッチング液や洗浄液等にガラスセラミッ
ク配線基板を浸漬しなければならないこと、及びメッキ
処理の工程において酸性あるいはアルカリ性のメッキ液
にガラスセラミック配線基板が浸漬されること等から、
銅導体中の微細ボイドに前記エッチング液や洗浄液、メ
ッキ液等が浸透したり、銅導体中のガラス成分が溶出す
ることにより、銅導体とガラスセラミック磁器との界面
組織が浸食され、その結果、銅導体から成る導体層との
接合強度が劣化するという課題があった。
However, since the fired copper conductor obtained in the above proposal contains a glass component, the surface of the conductor layer made of the copper conductor is made of Ni-A.
When applying metal coating such as u plating or Cu-Au plating,
The glass-ceramic wiring substrate must be immersed in an acidic or alkaline etching solution or cleaning solution in order to remove the glass on the copper conductor surface in advance, and the glass-ceramic wiring substrate must be immersed in an acidic or alkaline plating solution in the plating process. Is soaked,
The etching solution, the cleaning solution, the plating solution or the like penetrates into the fine voids in the copper conductor, or the glass component in the copper conductor is eluted, whereby the interface structure between the copper conductor and the glass ceramic porcelain is eroded. There has been a problem that the bonding strength with a conductor layer made of a copper conductor is deteriorated.

【0008】また、前記内部導体層の厚さが厚くなると
内部導体層の端部のグリーンシート積層面に空隙が発生
し易くなることから、内部導体層がガラスセラミック配
線基板の外周部に近い部分に形成された場合には、空隙
が該配線基板外周部とつながってエッチング液や洗浄
液、メッキ液等が浸透し、内部導体層とガラスセラミッ
ク磁器の界面が浸食され、気密性が低下するという課題
もあった。
Further, when the thickness of the internal conductor layer is increased, voids are easily generated on the green sheet laminating surface at the end of the internal conductor layer, so that the internal conductor layer is close to the outer peripheral portion of the glass ceramic wiring board. In this case, the gap is connected to the outer peripheral portion of the wiring board, and an etching solution, a cleaning solution, a plating solution, and the like penetrate, and the interface between the internal conductor layer and the glass ceramic porcelain is eroded, thereby reducing airtightness. There was also.

【0009】[0009]

【発明の目的】本発明は前記課題を解消せんとして成さ
れたもので、その目的は、酸性あるいはアルカリ性のエ
ッチング液や洗浄液、メッキ液等にガラスセラミック配
線基板を浸漬しても、安定した接合強度で高い密着性を
もって形成された銅導体の導体層を具備し、かつ気密性
と高い信頼性を有するガラスセラミック配線基板を提供
することにある。
SUMMARY OF THE INVENTION The object of the present invention is to solve the above-mentioned problems, and an object of the present invention is to stably bond a glass-ceramic wiring board to an acidic or alkaline etching solution, a cleaning solution, a plating solution, or the like. An object of the present invention is to provide a glass-ceramic wiring board having a conductor layer of a copper conductor formed with high strength and high adhesion, and having airtightness and high reliability.

【0010】[0010]

【課題を解決するための手段】本発明者等は鋭意研究の
結果、ガラスセラミック配線基板に形成する銅を主成分
とする該配線基板の内部及び表面の各導体層の厚さと、
該表面導体層上に被着形成する金属被覆層の厚さをそれ
ぞれ一定範囲に制御することにより、銅導体の導体層の
密着性を向上することができると共に、内部導体層の端
部に発生し易い空隙を抑制して気密性が確保できること
を知見し、本発明に至った。
Means for Solving the Problems As a result of intensive studies, the present inventors have found that the thickness of each conductor layer inside and on the surface of a glass ceramic wiring board, which is mainly composed of copper, and formed on the wiring board,
By controlling the thickness of the metal coating layer formed on the surface conductor layer to be within a certain range, the adhesion of the copper conductor to the conductor layer can be improved, and at the end of the internal conductor layer, The inventors have found that airtightness can be ensured by suppressing voids that are easily formed, and have led to the present invention.

【0011】即ち、本発明のガラスセラミック配線基板
は、ガラスセラミック磁器と同時焼成して形成した銅を
主成分とする導体層の内、該配線基板の内部導体層の厚
さが7〜15μmで、該配線基板の表面導体層の厚さが
12μm以上であり、該表面導体層の厚さに対する表面
導体層上に被着形成された被覆層の厚さの比、被覆層の
厚さ/表面導体層の厚さが0.3以下であることを特徴
とするものである。
That is, in the glass-ceramic wiring board of the present invention, the thickness of the internal conductor layer of the wiring board is 7 to 15 μm among the copper-based conductor layers formed by co-firing with the glass ceramic porcelain. The thickness of the surface conductor layer of the wiring board is 12 μm or more, and the ratio of the thickness of the coating layer formed on the surface conductor layer to the thickness of the surface conductor layer; The conductive layer has a thickness of 0.3 or less.

【0012】[0012]

【作用】本発明によれば、ガラスセラミック配線基板に
おける銅を主成分とする内部導体層の厚さが7〜15μ
mで、表面導体層の厚さを12μm以上と厚くし、該表
面導体層上に被着形成する金属被覆層の厚さを表面導体
層の厚さの30%以下としたことから、メッキ処理及び
その前処理工程においてそれらの処理液により表面導体
層とガラスセラミック磁器との界面組織が浸食されるの
を抑制し、界面の組織を焼成後の状態に維持することが
できることから、表面導体層の接合強度を安定化するこ
とができる。
According to the present invention, the thickness of the internal conductor layer mainly composed of copper in the glass ceramic wiring board is 7 to 15 μm.
m, the thickness of the surface conductor layer was increased to 12 μm or more, and the thickness of the metal coating layer formed on the surface conductor layer was set to 30% or less of the thickness of the surface conductor layer. In addition, in the pretreatment step, the treatment liquid suppresses the erosion of the interface structure between the surface conductor layer and the glass ceramic porcelain, and the interface structure can be maintained in a state after firing. Can stabilize the bonding strength.

【0013】また、ガラスセラミック配線基板の内部の
銅を主成分とする導体層の厚さを7〜15μmに限定す
ることで、十分に低い導体抵抗を確保でき、かつ導体層
の端部に空隙が発生しない組織を形成することができ、
配線基板の気密性も確保することができる。
Further, by limiting the thickness of the conductor layer mainly composed of copper inside the glass ceramic wiring board to 7 to 15 μm, a sufficiently low conductor resistance can be ensured, and a gap is formed at the end of the conductor layer. Can form a tissue that does not occur,
The airtightness of the wiring board can also be ensured.

【0014】[0014]

【発明の実施の形態】以下、本発明のガラスセラミック
配線基板について詳細に述べる。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The glass ceramic wiring board of the present invention will be described in detail below.

【0015】本発明ガラスセラミック配線基板に形成さ
れる銅を主成分とする導体層は、銅を主成分としガラス
フリット及び必要に応じてセラミックフィラーを添加
し、有機バインダーと溶剤によりペースト状にした銅導
体ペーストを用いて形成されるもので、該銅導体ペース
トはガラスセラミック磁器と同時焼成可能なものであ
る。
The copper-based conductor layer formed on the glass-ceramic wiring board of the present invention was formed into a paste with an organic binder and a solvent by adding a glass frit and, if necessary, a ceramic filler containing copper as a main component. It is formed using a copper conductor paste, and the copper conductor paste can be co-fired with glass ceramic porcelain.

【0016】そして、前記銅導体ペースト中の主成分の
銅は、平均粒径が2〜6μmの球状粉末を用い、その比
表面積が0.2〜1.5m2 /g程度であることが、銅
導体ペースト中における銅粉末の充填密度を高くしてボ
イドを生成し難いということからはより好ましいもので
ある。
The main component copper in the copper conductor paste is a spherical powder having an average particle diameter of 2 to 6 μm and a specific surface area of about 0.2 to 1.5 m 2 / g. This is more preferable because it is difficult to generate voids by increasing the filling density of the copper powder in the copper conductor paste.

【0017】また、前記銅導体ペーストに添加されるガ
ラスフリットとしては、700〜1000℃の温度でガ
ラスセラミック磁器と同時焼成することが可能なガラス
転移点が700〜750℃で、該転移点以上の温度で急
激に軟化流動するSiO2 −Al2 3 −RO(R:ア
ルカリ土類金属)−B2 3 系ガラスが好ましく、その
添加量は、銅100重量部に対して0.5〜5重量部が
好ましい。
The glass frit to be added to the copper conductor paste has a glass transition point of 700 to 750 ° C. which can be co-fired with glass ceramic porcelain at a temperature of 700 to 1000 ° C. SiO 2 -Al rapidly softened flowable at a temperature 2 O 3 -RO: 0.5 (R alkaline earth metal) -B 2 O 3 based glass is preferred, the amount added, the copper 100 parts by weight -5 parts by weight is preferred.

【0018】更に、前記銅導体ペーストには、該ペース
ト中のガラスの軟化流動による収縮挙動を微調整するた
めにセラミック粉末を添加することができ、融点が高
く、前記ペースト中に添加するガラスと容易に反応して
化合物を生成しないものであればいずれでも良く、例え
ばAl2 3 やSiO2 、ZrO2 等が挙げられ、その
添加量は銅粉末100重量部に対して0.5〜3重量部
程度が緻密に焼結させることから望ましい。
Further, ceramic powder can be added to the copper conductor paste in order to finely adjust the shrinkage behavior of the glass in the paste due to softening flow. Any material may be used as long as it does not easily react to form a compound, and examples thereof include Al 2 O 3 , SiO 2 , and ZrO 2. The amount of the additive is 0.5 to 3 based on 100 parts by weight of the copper powder. It is desirable that the parts by weight be densely sintered.

【0019】一方、前記銅導体ペーストに使用する有機
バインダーには、非酸化性雰囲気中での熱分解性に優れ
たアクリル系樹脂、好ましくはメタクリル酸系樹脂があ
り、溶剤としてはフタル酸ジブチルやα−テルピネオー
ル等の一般的な導体ペースト用の溶剤を適用することが
でき、前記有機バインダーの特性に応じて可塑剤を添加
することも可能である。
On the other hand, the organic binder used for the copper conductor paste includes an acrylic resin, preferably methacrylic acid resin, which is excellent in thermal decomposability in a non-oxidizing atmosphere, and the solvent is dibutyl phthalate or the like. A general solvent for a conductive paste such as α-terpineol can be used, and a plasticizer can be added according to the characteristics of the organic binder.

【0020】次に、このような銅導体ペーストをガラス
セラミック原料粉末を含むグリーンシートにスクリーン
印刷して所定のパターンで導体層を形成するが、焼成後
にガラスセラミック配線基板の内部導体層となるパター
ンに印刷する厚さは、焼成後の厚さが7μm未満では配
線導体のシート抵抗を3mΩ/□以下とすることが困難
であり高周波用途には不適となり、15μmを超えると
配線導体端部のグリーンシート積層面に空隙が発生し易
く、パターンが配線基板外周に近い部分に存在する場合
は前記空隙が配線基板外周にまでつながり、得られたガ
ラスセラミック配線基板の気密性が悪くなるため、その
厚さは7〜15μmの範囲に限定される。
Next, such a copper conductor paste is screen-printed on a green sheet containing glass ceramic raw material powder to form a conductor pattern in a predetermined pattern. After firing, a pattern to become an internal conductor layer of the glass ceramic wiring board is formed. If the thickness after printing is less than 7 μm, it is difficult to reduce the sheet resistance of the wiring conductor to 3 mΩ / □ or less, which is unsuitable for high frequency applications. Voids are likely to be generated on the sheet lamination surface, and when the pattern exists in a portion near the outer periphery of the wiring board, the voids are connected to the outer periphery of the wiring substrate, and the airtightness of the obtained glass ceramic wiring substrate is deteriorated. The length is limited to the range of 7 to 15 μm.

【0021】一方、焼成後にガラスセラミック配線基板
の表面に金属被覆層を被着する導体層となるパターンに
印刷する厚さは、焼成後に12μm未満となる場合に
は、メッキ処理時に配線導体とガラスセラミック磁器の
界面組織が浸食されることにより配線導体の接合強度が
安定しないという問題があり、例えば、粒径が6μmの
銅粉末を使用した銅導体ペーストを印刷した場合は、そ
の厚さ方向に銅粉末が2粒以上は必要であることも意味
するものである。
On the other hand, if the thickness of a pattern to be a conductor layer for depositing a metal coating layer on the surface of a glass ceramic wiring board after firing is less than 12 μm after firing, the wiring conductor and the glass during the plating process are required. There is a problem that the bonding strength of the wiring conductor is not stable due to the erosion of the interface structure of the ceramic porcelain. For example, when a copper conductor paste using a copper powder having a particle size of 6 μm is printed, the thickness direction of the copper conductor paste is reduced. This also means that two or more copper powders are required.

【0022】また、前記表面導体層の厚さは、スクリー
ン印刷工程の作業性、及びグリーンシートの加圧積層時
に導体部以外にも圧力が加わるようにするという点から
は30μm程度以下が望ましい。
The thickness of the surface conductor layer is desirably about 30 μm or less from the viewpoint of workability in the screen printing process and that pressure is applied to portions other than the conductor portion when the green sheets are pressed and laminated.

【0023】次に、内部導体層を形成したグリーンシー
トを複数枚積層し、該積層体の両面に前記表面導体層を
形成したグリーンシートをそれぞれ積層して、300〜
500℃の水蒸気を含んだ窒素雰囲気中で含有する有機
バインダーや可塑剤、溶剤等を分解除去した後、同じく
水蒸気を含んだ窒素雰囲気を焼成雰囲気として、使用す
るガラスセラミック材料の組成により焼成温度を800
〜1000℃の範囲で選択して焼成一体化する。
Next, a plurality of green sheets on which the internal conductor layers are formed are laminated, and the green sheets on which the surface conductor layers are formed are laminated on both surfaces of the laminate, respectively.
After decomposing and removing organic binders, plasticizers, solvents, etc. contained in a nitrogen atmosphere containing water vapor at 500 ° C., the nitrogen atmosphere containing water vapor is also used as a firing atmosphere, and the firing temperature is set according to the composition of the glass ceramic material used. 800
The temperature is selected within the range of -1000 ° C. to be integrated by firing.

【0024】かくして得られた銅を主成分とする導体層
を内部及び表面に有する配線基板は、表面の配線導体の
酸化防止、及び半田やロウ材の濡れ性を向上させるため
に、Ni−AuあるいはCu−Au等から成る金属被覆
層を施す。
The thus obtained wiring board having a conductor layer containing copper as a main component inside and on the surface is made of Ni-Au in order to prevent oxidation of the wiring conductor on the surface and to improve the wettability of solder and brazing material. Alternatively, a metal coating layer made of Cu-Au or the like is applied.

【0025】ここで、前記金属被覆層を被着形成するに
先立ち、銅導体表面のガラス成分をエッチング除去して
金属被覆層の密着性を良好ならしめるために、フッ酸等
のエッチング液やアルカリ性、酸性の洗浄液中に浸漬す
るが、その浸漬条件はガラスセラミック磁器及び銅導体
により適宜選択されるものである。
Prior to the formation of the metal coating layer, a glass component on the copper conductor surface is removed by etching to improve the adhesion of the metal coating layer. Immersion in an acidic cleaning solution, the immersion conditions being appropriately selected depending on the glass ceramic porcelain and the copper conductor.

【0026】また、前記金属被覆層を形成するためのメ
ッキ液は種類にもよるが、強酸性あるいは強アルカリ性
の液が一般に使用されていることから、先ず表面導体層
の厚さは前述したように12μm以上であって、金属被
覆層の厚さと表面導体層の厚さとの間には金属被覆層の
厚さ/表面導体層の厚さの比が0.3以下の関係を満足
することが必要である。
The plating solution for forming the metal coating layer depends on the kind, but since a strongly acidic or strongly alkaline solution is generally used, first, the thickness of the surface conductor layer is set as described above. And the ratio of the thickness of the metal coating layer to the thickness of the surface conductor layer satisfies the relationship of 0.3 or less between the thickness of the metal coating layer and the thickness of the surface conductor layer. is necessary.

【0027】即ち、前記比が0.3を超えると、メッキ
液による表面導体層の銅導体の溶出やメッキ膜に起因す
る残留応力により、表面導体層とガラスセラミック磁器
との接合強度が低下して密着性が不安定となる。
That is, if the ratio exceeds 0.3, the bonding strength between the surface conductor layer and the glass ceramic porcelain decreases due to the elution of the copper conductor of the surface conductor layer by the plating solution and the residual stress caused by the plating film. And the adhesion becomes unstable.

【0028】以上のようにして、銅を主成分とする導体
層を基板の内部及び表面に有し、該表面導体層上に前記
金属被覆層を被着形成したガラスセラミック配線基板を
得ることができる。
As described above, it is possible to obtain a glass-ceramic wiring board having a conductor layer containing copper as a main component inside and on the surface of the substrate and having the metal coating layer formed on the surface conductor layer. it can.

【0029】[0029]

【実施例】本発明のガラスセラミック配線基板につい
て、以下のように評価した。
EXAMPLES The glass ceramic wiring board of the present invention was evaluated as follows.

【0030】先ず、平均粒径が5μmの銅粉末100重
量部に対して、ガラス転移点(Tg)が720℃である
SiO2 −Al2 3 −RO(R:アルカリ土類金属)
−B2 3 系ガラスフリットとAl2 3 粉末をフィラ
ーとして、それぞれ2重量部、0.1重量部を混合し、
該混合物に有機バインダーと溶媒を添加して混練し、銅
導体ペーストを調製した。
First, SiO 2 —Al 2 O 3 —RO (R: alkaline earth metal) having a glass transition point (Tg) of 720 ° C. with respect to 100 parts by weight of copper powder having an average particle size of 5 μm.
-B 2 O 3 based glass frit and Al 2 O 3 powder as filler, respectively 2 parts by weight, 0.1 parts by weight,
An organic binder and a solvent were added to the mixture and kneaded to prepare a copper conductor paste.

【0031】一方、SiO2 が44重量%、Al2 3
が28重量%、MgOが11重量%、ZnOが8重量
%、B2 3 が9重量%の組成を有する結晶性ガラス粉
末61重量%と、ジルコン酸カルシウム粉末21重量
%、チタン酸ストロンチウム粉末16重量%、Al2
3 粉末2重量%から成るガラスセラミック原料粉末に対
して、有機バインダーとしてメタクリル酸イソブチル樹
脂を固形分で12重量%、可塑剤としてフタル酸ジブチ
ルを6重量%添加し、トルエン及び酢酸エチルを溶媒と
してボールミルにより40時間混合し、スラリーを調製
した。
On the other hand, 44% by weight of SiO 2 and Al 2 O 3
There 28 wt%, MgO 11 wt%, ZnO 8% by weight, B 2 O 3 is 9% by weight of a crystalline glass powder 61 wt% with the composition, powdered calcium 21 wt% zirconate, strontium titanate powder 16% by weight, Al 2 O
(3) To a glass ceramic raw material powder composed of 2% by weight of powder, 12% by weight of solid content of isobutyl methacrylate resin as an organic binder and 6% by weight of dibutyl phthalate as a plasticizer, and toluene and ethyl acetate as solvents are added. The mixture was mixed by a ball mill for 40 hours to prepare a slurry.

【0032】得られたスラリーをドクターブレード法に
より厚さ0.4mmのガラスセラミックグリーンシート
を成形した。
A glass ceramic green sheet having a thickness of 0.4 mm was formed from the obtained slurry by a doctor blade method.

【0033】次いで、ガラスセラミックグリーンシート
上に前記銅導体ペーストを用い、表面導体層用として焼
成後に2mm角となる接合強度評価用パターンを印刷し
たもの、及び内部導体層用として焼成後にライン幅が2
00μm、ライン長が40mmとなるシート抵抗評価用
パターンを印刷したもの、更に内部導体層に伴う積層面
の口開きによる気密性良否を評価するためのパターンと
して焼成後に60mm角となる気密性評価用パターンを
印刷したものをそれぞれ準備した。
Next, the copper conductor paste was used on a glass ceramic green sheet, and a pattern for bonding strength evaluation of 2 mm square was printed after firing for the surface conductor layer, and the line width was reduced after firing for the internal conductor layer. 2
A sheet resistance evaluation pattern printed with a thickness of 00 μm and a line length of 40 mm, and a pattern for evaluating the airtightness due to the opening of the laminated surface associated with the internal conductor layer, which is 60 mm square after firing as a pattern for evaluating the airtightness. Printed patterns were prepared.

【0034】また、前記表面導体層用のガラスセラミッ
クグリーンシートには、積層時に内部導体層の前記ライ
ンの両端に相当する位置にビアホールを形成し、銅導体
ペーストを充填して、基板表面から内部導体層のシート
抵抗が測定できるようにした。
In the glass ceramic green sheet for the surface conductor layer, via holes are formed at positions corresponding to both ends of the line of the internal conductor layer at the time of lamination, and a copper conductor paste is filled thereinto so that the inner surface of the substrate is filled with the copper conductor paste. The sheet resistance of the conductor layer was measured.

【0035】かくして得られた各グリーンシートを順次
積層した後、気密性評価用パターンよりも縦横の各辺1
mm大きい寸法で切断し、積層体中の有機バインダー等
の有機成分や、該有機成分が分解した後に残留するカー
ボンを除去するため、55mmHgの水蒸気を含んだ窒
素雰囲気中、750℃の温度で1時間保持する熱処理を
行った後、900℃の温度で1時間保持して焼結させ
た。
After sequentially stacking the green sheets thus obtained, each of the green sheets is placed one on each side of the vertical and horizontal sides of the airtightness evaluation pattern.
In order to remove organic components such as an organic binder in the laminate and carbon remaining after the organic components are decomposed, the laminate is cut at a temperature of 750 ° C. in a nitrogen atmosphere containing 55 mmHg of steam. After performing the heat treatment for holding for one hour, it was held at a temperature of 900 ° C. for one hour and sintered.

【0036】その後、表面導体層上にNiメッキとAu
メッキを順次施し、Auメッキ厚みは全て1μmとして
金属被覆層を被着形成し、評価用のガラスセラミック配
線基板を作製した。
Thereafter, Ni plating and Au are applied on the surface conductor layer.
Plating was sequentially performed, and the thickness of the Au plating was all 1 μm, and a metal coating layer was formed thereon to form a glass ceramic wiring board for evaluation.

【0037】かくして得られた評価用のガラスセラミッ
ク配線基板の断面を鏡面研磨し、走査型電子顕微鏡を用
いてその断面を写真撮影し、該写真より表面導体層、内
部導体層、及び金属被覆層の厚さを測定した。
The cross section of the glass-ceramic wiring board for evaluation thus obtained is mirror-polished, and the cross section is photographed using a scanning electron microscope. From the photograph, the surface conductor layer, the inner conductor layer, and the metal coating layer are taken. Was measured for thickness.

【0038】また、表面導体層の接合強度については、
銅リード線を基板面と平行にして2mm角の表面導体層
に半田付けし、リード線を基板面に対して垂直方向に曲
げて10mm/minの速度で引っ張り試験を行い、リ
ード線が剥離した時の荷重を接合強度として評価した。
Further, regarding the bonding strength of the surface conductor layer,
A copper lead wire was soldered to a 2 mm square surface conductor layer parallel to the substrate surface, the lead wire was bent in a direction perpendicular to the substrate surface, and a tensile test was performed at a speed of 10 mm / min, and the lead wire was peeled off. The load at that time was evaluated as the bonding strength.

【0039】次に、内部導体層のシート抵抗について
は、内部導体層に接続したビアホールを介して基板表面
で接続したパッド部を4端子法にて抵抗を測定し、ライ
ン長、ライン幅よりシート抵抗に換算した。
Next, regarding the sheet resistance of the internal conductor layer, the resistance of the pad portion connected on the surface of the substrate through the via hole connected to the internal conductor layer was measured by a four-terminal method, and the sheet length was determined from the line length and line width. It was converted to resistance.

【0040】他方、前記配線基板の気密性については、
前記メッキ後のガラスセラミック配線基板をHeガス中
で4気圧、2時間加圧した後、30分放置してリークデ
ィテクターにてリーク量を測定し、5×10-8atm・
cc/secHe以下を良と判定した。
On the other hand, regarding the airtightness of the wiring board,
After pressurizing the plated glass-ceramic wiring board in He gas at 4 atm for 2 hours, leave it for 30 minutes, measure the leak amount with a leak detector, and measure 5 × 10 −8 atm.
cc / secHe or less was determined to be good.

【0041】[0041]

【表1】 [Table 1]

【0042】表から明らかなように、本発明の請求範囲
外である試料番号1はシート抵抗が4.5mΩ/□と大
であり、同じく試料番号6は気密性が悪く、また試料番
号7、13、16はいずれも表面導体層とガラスセラミ
ック磁器との接合強度が1.6kg/2mm角以下と小
さく、ガラスセラミック配線基板として要求される諸特
性を満足していない。
As is clear from the table, Sample No. 1, which is outside the scope of the present invention, has a large sheet resistance of 4.5 mΩ / □, Sample No. 6 has poor airtightness, and Sample No. 7, Nos. 13 and 16 each have a small bonding strength of 1.6 kg / 2 mm square or less between the surface conductor layer and the glass ceramic porcelain, and do not satisfy various characteristics required as a glass ceramic wiring board.

【0043】それに対して、本発明に係るガラスセラミ
ック配線基板ではいずれも前記諸特性を満足するもので
あることが分かる。
On the other hand, it can be seen that the glass ceramic wiring board according to the present invention satisfies the above-mentioned characteristics.

【0044】尚、本発明は前記詳述した実施例に何ら限
定されるものではない。
The present invention is not limited to the above-described embodiment.

【0045】[0045]

【発明の効果】以上、詳述したように、本発明のガラス
セラミック配線基板は、銅を主成分とする内部導体層の
厚さを7〜15μm、表面導体層の厚さを12μm以上
と厚くし、該表面導体層上に被着形成する金属被覆層の
厚さを表面導体層の厚さに対して0.3倍以下としたこ
とから、前記金属被覆層を形成する時に表面導体層とガ
ラスセラミック磁器との界面組織が浸食されることを抑
制でき、また内部導体層端部の積層界面における空隙の
発生を抑制できることから、表面導体層の接合強度が安
定してガラスセラミック磁器との高い密着性が得られる
と共に、気密性に優れたガラスセラミック配線基板を得
ることができる。
As described in detail above, in the glass ceramic wiring board of the present invention, the thickness of the internal conductor layer mainly composed of copper is 7 to 15 μm, and the thickness of the surface conductor layer is 12 μm or more. Since the thickness of the metal coating layer to be formed on the surface conductor layer is not more than 0.3 times the thickness of the surface conductor layer, when the metal coating layer is formed, Since the interfacial structure with the glass ceramic porcelain can be suppressed from being eroded, and the occurrence of voids at the lamination interface at the end of the inner conductor layer can be suppressed, the bonding strength of the surface conductor layer is stable and high with the glass ceramic porcelain. Adhesiveness can be obtained, and a glass-ceramic wiring board excellent in airtightness can be obtained.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】ガラスセラミック磁器と同時焼成して形成
した銅を主成分とする配線導体を有するガラスセラミッ
ク配線基板であって、前記ガラスセラミック配線基板の
内部導体層の厚さが7〜15μmで、かつガラスセラミ
ック配線基板の表面導体層の厚さが12μm以上で、該
表面導体層上に被着形成された金属被覆層の厚さと前記
表面導体層の厚さの比(金属被覆層の厚さ/表面導体層
の厚さ)が0.3以下であることを特徴とするガラスセ
ラミック配線基板。
1. A glass-ceramic wiring board having a wiring conductor containing copper as a main component and formed by co-firing with a glass-ceramic ceramic, wherein the thickness of the internal conductor layer of the glass-ceramic wiring board is 7 to 15 μm. A thickness of the surface conductor layer of the glass ceramic wiring board is 12 μm or more, and a ratio of the thickness of the metal coating layer formed on the surface conductor layer to the thickness of the surface conductor layer (the thickness of the metal coating layer) (Thickness / thickness of surface conductor layer) is 0.3 or less.
JP26239797A 1997-09-26 1997-09-26 Glass ceramic wiring board Pending JPH11103169A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26239797A JPH11103169A (en) 1997-09-26 1997-09-26 Glass ceramic wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26239797A JPH11103169A (en) 1997-09-26 1997-09-26 Glass ceramic wiring board

Publications (1)

Publication Number Publication Date
JPH11103169A true JPH11103169A (en) 1999-04-13

Family

ID=17375210

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26239797A Pending JPH11103169A (en) 1997-09-26 1997-09-26 Glass ceramic wiring board

Country Status (1)

Country Link
JP (1) JPH11103169A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6865090B2 (en) 1999-12-20 2005-03-08 Murata Manufacturing Co., Ltd. Outer coating substrate for electronic component and piezoelectric resonant component
JP2013038415A (en) * 2011-08-05 2013-02-21 Samsung Electro-Mechanics Co Ltd Thin film electrode ceramic substrate and method for producing the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6865090B2 (en) 1999-12-20 2005-03-08 Murata Manufacturing Co., Ltd. Outer coating substrate for electronic component and piezoelectric resonant component
JP2013038415A (en) * 2011-08-05 2013-02-21 Samsung Electro-Mechanics Co Ltd Thin film electrode ceramic substrate and method for producing the same

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