JPH1110134A - Waste liquid treating apparatus and waste liquid treating method - Google Patents

Waste liquid treating apparatus and waste liquid treating method

Info

Publication number
JPH1110134A
JPH1110134A JP9164452A JP16445297A JPH1110134A JP H1110134 A JPH1110134 A JP H1110134A JP 9164452 A JP9164452 A JP 9164452A JP 16445297 A JP16445297 A JP 16445297A JP H1110134 A JPH1110134 A JP H1110134A
Authority
JP
Japan
Prior art keywords
waste liquid
concentration
developing
developing waste
pipe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9164452A
Other languages
Japanese (ja)
Inventor
Yutaka Watarai
豊 渡会
Isamu Tatsuno
勇 辰野
Yasushi Nishimura
靖史 西村
Keiji Yamada
敬二 山田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Sasakura Engineering Co Ltd
Original Assignee
Fujitsu Ltd
Sasakura Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd, Sasakura Engineering Co Ltd filed Critical Fujitsu Ltd
Priority to JP9164452A priority Critical patent/JPH1110134A/en
Publication of JPH1110134A publication Critical patent/JPH1110134A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To reuse concentrated developer waste liquid as a neutralization agent of acid exhaust gas while an extreme reduction of a volume of the developer waste liquid and its easy operation control are achieved by a method wherein a multiplying factor in concentration of alkaline waste liquid is raised as it is without regulating pH concerning a waste liquid treatment. SOLUTION: (1) While developer waste liquid is supplied under a reduced pressure state (S3), the developer waste liquid is concentrated by heating (S4). (2) The concentrated waste liquid after heating is reserved (S5). (3) The concentration of a specific material contained in the concentrated development waste liquid is measured (S6). (4) When the concentration is lower than a specific value, (1), (2) and (3) are repeated for the stored development waste liquid, and when the concentration of the specific material becomes the specific value or higher, the developer waste liquid is recovered.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、廃液処理装置及び
廃液処理方法に関し、より詳しくは、現像廃液を濃縮
し、濃縮廃液を再利用することができる廃液処理装置及
び廃液処理方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a waste liquid processing apparatus and a waste liquid processing method, and more particularly, to a waste liquid processing apparatus and a waste liquid processing method capable of concentrating development waste liquid and reusing the concentrated waste liquid.

【0002】[0002]

【従来の技術】近年、工場から排出される環境負荷物質
の軽減が要求されている。この現像廃液はアルカリ性で
あり、COD(Chemical Oxygen Demand)値を示し、ま
た主成分であるTMAH(テトラアンモニウムハイドロ
オキサイド)は生物毒性を示すことから、産業廃棄物と
して焼却処分している。しかし、近年のウエハの大口径
化に伴い、その使用量は増加の一途をたどり、その現像
廃液の発生量も増加している。今後の対応として、発生
量自体を減らすとともに、発生した現像廃液を効率良く
処理する必要がある。
2. Description of the Related Art In recent years, there has been a demand for reduction of environmentally harmful substances discharged from factories. This waste developing solution is alkaline, exhibits a COD (Chemical Oxygen Demand) value, and TMAH (tetraammonium hydroxide), which is a main component, exhibits biotoxicity, and is incinerated as industrial waste. However, with the recent increase in the diameter of wafers, the amount of use has been steadily increasing, and the amount of development waste liquid has also increased. As measures to be taken in the future, it is necessary to reduce the generated amount itself and efficiently process the generated developing waste liquid.

【0003】従来の現像廃液の処理方法には、生物活性
汚泥法による現像廃液の分解とRO膜を用いた濃縮処理
法による現像廃液の減容化がある。生物活性汚泥法は微
生物を用いて現像廃液を分解させる方法であり、TMA
Hの生物毒を緩和させるため、排水中のTMAH濃度を
2000ppm (0.2%)程度に管理する必要がある。図4
はこのことを示す実験例であり、生物活性汚泥処理法に
より処理された後の排水の水質を示す一例である。な
お、図4中、TOCとはTotal Organic Carbonの略であ
る。また、図4中のTOC-SS負荷とは、排水中の微生物量
に対するTOC量(TMAHの量)のことである。
Conventional processing methods for developing waste liquid include decomposition of the developing waste liquid by a bioactive sludge method and reduction of the volume of the developing waste liquid by a concentration treatment method using an RO membrane. The bioactive sludge method is a method of decomposing a developing waste liquid using microorganisms,
To mitigate the biotoxicity of H, the TMAH concentration in the wastewater
It is necessary to control to about 2000ppm (0.2%). FIG.
Is an experimental example showing this, and is an example showing the water quality of wastewater after being treated by the biologically activated sludge treatment method. In FIG. 4, TOC is an abbreviation for Total Organic Carbon. The TOC-SS load in FIG. 4 refers to the TOC amount (TMAH amount) relative to the amount of microorganisms in the wastewater.

【0004】また、生物活性汚泥法では、TMAHが高
濃度の場合、微生物の活動が著しく低下し、処理能力回
復までに時間を要する。更に、TMAHの分解に伴い、
発生する窒素に対して脱窒素処理が必要となる。一方、
RO膜濃縮法は、RO膜に対して現像廃液中の水分を透
過させて濃縮する一種の濾過方法であり、処理すべき原
廃液のpHを8〜9程度の弱アルカリにする必要があ
る。ところで、処理すべき現像廃液のpHは通常12〜
13の強アルカリであるため、前処理として現像廃液の
pH調整が必要である。
[0004] In the bioactive sludge method, when the TMAH concentration is high, the activity of microorganisms is remarkably reduced, and it takes time to recover the treatment capacity. Furthermore, with the decomposition of TMAH,
A denitrification treatment is required for the generated nitrogen. on the other hand,
The RO membrane concentration method is a kind of filtration method in which the water in the developing waste liquid is passed through the RO membrane and concentrated, and the pH of the raw waste liquid to be treated needs to be weakly alkaline, about 8 to 9. Incidentally, the pH of the developing waste liquid to be treated is usually 12 to
Since it is a strong alkali of 13, it is necessary to adjust the pH of the waste developer as a pretreatment.

【0005】更に、RO膜濃縮法において、濃縮倍率の
上昇は透過水量の低下(図6参照)と水質悪化(図5参
照)をもたらす。図5及び図6に示すように、実用上、
10倍前後(TMAH濃度で3%前後)の濃縮が限界で
ある。従って、濃縮後でも現像廃液の大部分を占める水
は、その後の焼却廃棄処理に悪影響をもたらすととも
に、処理コストが極めて高価なものとなる。
Further, in the RO membrane concentration method, an increase in the concentration ratio causes a decrease in the amount of permeated water (see FIG. 6) and a deterioration in water quality (see FIG. 5). As shown in FIGS. 5 and 6, in practice,
The concentration of about 10 times (about 3% in TMAH concentration) is the limit. Therefore, water which occupies most of the development waste liquid even after concentration has a bad influence on the subsequent incineration disposal treatment, and the treatment cost becomes extremely expensive.

【0006】[0006]

【発明が解決しようとする課題】上記したように、生物
活性汚泥法では、微生物を用いているため生存の管理及
び運転に手間がかかるとともに、現像廃液を容れるタン
ク等が大型となるため設置スペースに問題が生じる。一
方、RO膜濃縮法では、現像廃液のpH調整を必要とす
るため中和剤として酸性薬液を大量に使用するととも
に、そのpH管理が容易ではない。また、濃縮度の限界
が低く、現像廃液を大幅に減容化することが難しい。
As described above, in the bioactive sludge method, since microorganisms are used, the management and operation of survival are troublesome, and the tank and the like for containing the developing waste liquid are large, so that the installation space is large. Problem. On the other hand, in the RO membrane concentration method, a large amount of an acidic chemical solution is used as a neutralizing agent because the pH of the developing waste solution needs to be adjusted, and the pH control is not easy. Further, the limit of the degree of concentration is low, and it is difficult to greatly reduce the volume of the developing waste liquid.

【0007】さらに、濃縮した現像廃液を廃棄するので
は、資源を有効に活用しているとはいえず、可能な限り
濃縮した現像廃液を再利用することが望ましい。本発明
は、上記の従来例の問題点に鑑みて創作されたものであ
り、pH調整なしで、アルカリ性のまま廃液の濃縮倍率
を上げることにより、現像廃液の大幅な減容化と容易な
運転管理を達成することができ、かつ濃縮した現像廃液
を酸性排蒸気の中和剤として再利用することが可能な廃
液処理装置及び廃液処理方法を提供するものである。
Further, when the concentrated waste solution is discarded, it cannot be said that the resources are effectively utilized, and it is desirable to reuse the concentrated waste solution as much as possible. The present invention has been made in view of the above-described problems of the conventional example. By increasing the concentration ratio of the waste liquid while maintaining the alkalinity without adjusting the pH, the volume of the development waste liquid can be significantly reduced and the operation can be easily performed. An object of the present invention is to provide a waste liquid treatment apparatus and a waste liquid treatment method capable of achieving control and reusing a concentrated development waste liquid as a neutralizing agent for acidic exhaust vapor.

【0008】[0008]

【課題を解決するための手段】上記課題は、第1の発明
である、現像廃液を溜める現像廃液貯溜槽と、前記現像
廃液の導入口と、前記導入した現像廃液を加熱する手段
と、前記加熱により前記現像廃液中から蒸発する蒸気の
排気口と、前記加熱した後の濃縮した現像廃液を溜める
貯溜部と、前記貯溜部の現像廃液の温度を測定する手段
とを有する減圧可能な濃縮貯溜槽と、前記濃縮した現像
廃液を回収する濃縮廃液回収槽と、前記現像廃液貯溜槽
から前記濃縮貯溜槽の導入口に該現像廃液貯留槽内の現
像廃液を送る第1の配管と、前記貯溜部内の現像廃液を
前記導入口に還流させる第2の配管と、前記濃縮貯溜槽
の貯留部内の現像廃液を前記濃縮廃液回収槽に送る第3
の配管と、前記貯溜部の現像廃液の温度が所定の圧力下
で設定温度よりも低いとき、前記貯溜部の現像廃液を前
記第2の配管に流出させて前記導入口に導き、前記貯溜
部の現像廃液の温度が前記所定の圧力下で前記設定温度
以上のとき、前記貯溜部の現像廃液を前記第3の配管に
流出させて前記濃縮廃液回収槽に導く第1の制御手段と
を有することを特徴とする廃液処理装置によって解決さ
れ、第2の発明である、前記濃縮貯溜槽の排気口から流
れ出た蒸気を圧縮する手段と、該圧縮手段により圧縮さ
れて昇温した蒸気を前記加熱手段に導いて該加熱手段を
昇温させる第4の配管とを備えたことを特徴とする第1
の発明に記載の廃液処理装置によって解決され、第3の
発明である、前記加熱手段を通ってきた蒸気を冷却し、
液化する手段と、前記液化により生成した液体の電気伝
導率を測定する手段と、前記液体の廃棄槽と、前記電気
伝導率が所定の値に対する大小により前記液体を前記廃
棄槽の方に導き、或いは、前記液体を前記現像廃液貯溜
槽の方に導く第2の制御手段とを有することを特徴とす
る第1又は第2の発明に記載の廃液処理装置によって解
決され、第4の発明である、前記濃縮貯溜槽内に設置さ
れた前記現像廃液の放出手段と、前記濃縮貯溜槽内の現
像廃液に気泡が生じたときに前記第1の配管を流れる現
像廃液の一部を該第1の配管から分岐させて前記放出手
段に流す第3の制御手段とを有することを特徴とする第
1乃至第3の発明のいずれかに記載の廃液処理装置によ
って解決され、第5の発明である、(1)減圧状態で、
現像廃液を供給しつつ加熱して該現像廃液を濃縮させ、
(2)前記加熱した後の濃縮した現像廃液を貯留し、
(3)前記貯留した現像廃液に含まれている特定物質の
濃度を測定し、(4)前記濃度が所定値よりも低いとき
は、前記貯留した現像廃液について前記(1)、(2)
及び(3)を繰り返し、前記特定物質の濃度が前記所定
値以上になったとき前記現像廃液を回収することを特徴
とする廃液処理方法によって解決され、第6の発明であ
る、前記現像廃液に含まれる特定物質の濃度の測定は、
前記現像廃液の温度を測定し、該温度とモル沸点上昇と
を対応させることにより行うことを特徴とする第5の発
明に記載の廃液処理方法によって解決され、第7の発明
である、前記現像廃液の加熱は、前記蒸発により生成さ
れた蒸気を圧縮して該蒸気の温度を上昇させ、該昇温し
た蒸気のエネルギを前記現像廃液に与えることにより行
うことを特徴とする第5又は第6の発明に記載の廃液処
理方法によって解決される。
The first object of the present invention is to provide a developing waste liquid storage tank for storing a developing waste liquid, an inlet for the developing waste liquid, a means for heating the introduced developing waste liquid, A pressure-reducing condensable storage having an exhaust port for vapor evaporating from the developer waste by heating, a reservoir for storing the concentrated developer waste after heating, and a means for measuring the temperature of the developer waste in the reservoir; A tank, a concentrated waste liquid collecting tank for collecting the concentrated developing waste liquid, a first pipe for sending the developing waste liquid in the developing waste liquid storing tank from the developing waste liquid storing tank to an inlet of the concentrated storing liquid tank, A second pipe for recirculating the developing waste liquid in the section to the inlet, and a third pipe for sending the developing waste liquid in the storage section of the concentration storage tank to the concentrated waste liquid recovery tank.
And when the temperature of the developing waste liquid in the storage section is lower than a set temperature under a predetermined pressure, the developing waste liquid in the storage section flows out to the second pipe and is guided to the inlet, and the storage section is When the temperature of the developing waste liquid is equal to or higher than the set temperature under the predetermined pressure, the developing waste liquid in the reservoir is discharged to the third pipe and guided to the concentrated waste liquid collecting tank. A second aspect of the present invention is a waste liquid treatment apparatus characterized in that the means for compressing steam flowing out of an exhaust port of the concentration storage tank and heating the steam heated by compression by the compression means. And a fourth pipe for guiding the heating means to heat the heating means.
Solved by the waste liquid treatment apparatus according to the invention of the third aspect, the third aspect of the invention is to cool the steam that has passed through the heating means,
Means for liquefaction, means for measuring the electric conductivity of the liquid generated by the liquefaction, a waste tank for the liquid, and the electric conductivity guides the liquid toward the waste tank depending on the magnitude relative to a predetermined value, Alternatively, there is provided a waste liquid processing apparatus according to the first or second invention, further comprising second control means for guiding the liquid toward the development waste liquid storage tank, and is a fourth invention. Means for discharging the developing waste liquid provided in the concentration storage tank, and a part of the development waste liquid flowing through the first pipe when bubbles are generated in the development waste liquid in the concentration storage tank. A fifth control invention is solved by the waste liquid treatment apparatus according to any one of the first to third inventions, further comprising: a third control unit that branches off from the pipe and flows to the discharge unit. (1) Under reduced pressure,
Heating while supplying the developing waste liquid to concentrate the developing waste liquid,
(2) storing the concentrated developing waste liquid after the heating,
(3) measuring the concentration of the specific substance contained in the stored developing waste liquid, and (4) when the concentration is lower than a predetermined value, the above-mentioned (1) and (2) for the stored developing waste liquid.
And (3) are repeated, and when the concentration of the specific substance is equal to or higher than the predetermined value, the developing waste liquid is recovered. Measurement of the concentration of specific substances contained
The method according to the seventh aspect, wherein the temperature of the development waste liquid is measured, and the temperature is raised to correspond to the increase in the molar boiling point. The heating of the waste liquid is performed by compressing the vapor generated by the evaporation to increase the temperature of the vapor, and applying the energy of the heated vapor to the developing waste liquid. The invention is solved by a waste liquid treatment method according to the invention.

【0009】本発明においては、濃縮した現像廃液中の
特定物質の濃度が所定値に達するまで、現像廃液の濃縮
と濃縮後の現像廃液中の特定物質の濃度の測定とを繰り
返している。現像廃液に含まれる特定物質の濃度の測定
は、例えば、現像廃液の温度を測定し、該温度とモル沸
点上昇とを対応させることにより行うようにすると、簡
単に濃度測定を行うことが出来る。
In the present invention, the concentration of the developing waste liquid and the measurement of the concentration of the specific substance in the concentrated developing waste liquid are repeated until the concentration of the specific substance in the concentrated developing waste liquid reaches a predetermined value. The concentration of the specific substance contained in the development waste liquid can be easily measured by, for example, measuring the temperature of the development waste liquid and making the temperature correspond to the rise in the molar boiling point.

【0010】この場合、特定物質の濃度が所定値になる
まで現像廃液を濃縮させるための、貯留した現像廃液の
循環系は本願発明の濃縮処理装置の構成となる。即ち、
濃縮貯溜槽の貯溜部に貯溜した現像廃液の温度が設定温
度よりも低いとき、貯溜部の現像廃液を第2の配管に流
出させて再び濃縮貯溜槽の現像廃液の導入口に導き、貯
溜部の現像廃液の温度が設定温度以上のとき、貯溜部の
現像廃液を第3の配管に流出させて濃縮廃液回収槽に導
く第1の制御手段を設ける。
In this case, the circulating system of the stored developing waste liquid for concentrating the developing waste liquid until the concentration of the specific substance reaches a predetermined value has the configuration of the concentration processing apparatus of the present invention. That is,
When the temperature of the developing waste liquid stored in the storage section of the concentration storage tank is lower than the set temperature, the development waste liquid in the storage section flows out to the second pipe and is again led to the introduction port of the development waste liquid in the concentration storage tank. When the temperature of the developing waste liquid is equal to or higher than the set temperature, first control means is provided for causing the developing waste liquid in the storage section to flow out to the third pipe and to guide the developing waste liquid to the concentrated waste liquid collecting tank.

【0011】上記本発明によれば、現像廃液を循環させ
て徐々に濃縮させることで、水分中の特定物質、例えば
TMAH濃度を低減させることができる。このため、特
定物質による環境汚染等の問題を生じさせることなく、
容易に排水を行うことができる。また、各循環毎に特定
物質(TMAH)の濃度の測定を行っている。ところ
で、現像廃液に含まれるTMAH(特定物質)を過剰濃
縮した場合、常温で固化してしまうため、室温に保たれ
ている回収タンクには容れられなくなり、実用上問題と
なるが、本発明によれば、上記TMAHの臨界濃度を所
定値として設定することでその問題を解決することが出
来る。
According to the present invention, the concentration of a specific substance, for example, TMAH in water can be reduced by circulating and gradually concentrating the developing waste liquid. Therefore, without causing problems such as environmental pollution by specific substances,
Drainage can be performed easily. The concentration of the specific substance (TMAH) is measured for each circulation. By the way, if TMAH (specific substance) contained in the developing waste liquid is excessively concentrated, it will solidify at room temperature and cannot be contained in the recovery tank kept at room temperature, which is a practical problem. According to this, the problem can be solved by setting the critical concentration of TMAH as a predetermined value.

【0012】更に、減圧状態で現像廃液中の水分を蒸発
させることで、その蒸発温度を低下させることが出来
る。このため、エネルギコストを低減することができ
る。また、130℃程度でTMAHがトリメチルアミン
に熱分解するとされているが、水分の蒸発温度を100
℃よりも低くすることで熱分解を抑制することができ、
このため、酸性排ガスの中和剤としての再生利用も可能
となる。
Further, the evaporation temperature can be lowered by evaporating the water in the developing waste liquid under reduced pressure. For this reason, energy cost can be reduced. Further, it is said that TMAH is thermally decomposed into trimethylamine at about 130 ° C.
By lowering the temperature below ℃, thermal decomposition can be suppressed,
For this reason, it is also possible to reuse acidic exhaust gas as a neutralizing agent.

【0013】また、蒸発により生成された蒸気を圧縮し
てその蒸気の温度を上昇させ、昇温した蒸気のエネルギ
を現像廃液に与えることにより現像廃液の加熱を行う。
この場合、装置構成を次のようにする。即ち、加熱手段
として昇温した蒸気の熱エネルギにより加熱するものを
用い、さらに濃縮貯溜槽の排気口に、蒸気の圧縮手段
と、該圧縮手段により圧縮されて昇温した蒸気を加熱手
段に導く第4の配管とをつなぐ。
Further, the developing waste liquid is heated by compressing the vapor generated by the evaporation to increase the temperature of the vapor and applying the energy of the heated vapor to the developing waste liquid.
In this case, the device configuration is as follows. That is, a heating means which is heated by the heat energy of the heated steam is used as the heating means, and the steam compression means and the steam which has been heated by being compressed by the compression means are introduced into the exhaust port of the concentration storage tank to the heating means. Connect to the fourth pipe.

【0014】省エネルギ等においては、一部では省エネ
ルギ等を達成したが、その省エネルギ等を達成するため
に他のところでエネルギを消費するということがないよ
うにすることが重要であるところ、本発明によれば、現
像廃液から蒸発させた蒸気の熱エネルギを利用して現像
廃液自体の加熱に用いているので、エネルギを有効に活
用することができ、全体として省エネルギを達成するこ
とができる。
In energy saving and the like, although energy saving and the like have been partially achieved, it is important to prevent energy from being consumed elsewhere in order to achieve the energy saving and the like. According to the present invention, since the thermal energy of the vapor evaporated from the development waste liquid is used to heat the development waste liquid itself, the energy can be effectively used, and energy saving can be achieved as a whole. it can.

【0015】また、本発明においては、濃縮貯溜槽の排
気口から出てくる蒸気、または加熱手段を通ってきた蒸
気の液化により生成した液体の電気伝導率を測定する手
段と、電気伝導率が所定の値に対する大小により液体を
廃棄槽の方に導き、或いは現像廃液貯溜槽の方に導く第
2の制御手段とを有する。電気伝導率の大小により、排
水中の特定物質(TMAH)のおおよその濃度の高低が
分かる。即ち、例えば、電気伝導率が高いとき特定物質
の濃度が高く、電気伝導率が低いときその濃度が低いこ
とが分かるため、環境汚染の恐れのない濃度に所定値を
設定することで特定物質の濃度の低い清浄な排水のみを
廃棄することができる。特定物質の濃度の高い排水は再
び現像廃液貯溜槽に戻せばよい。
Further, in the present invention, there is provided a means for measuring the electric conductivity of a liquid generated by liquefaction of steam coming out of an exhaust port of a concentration storage tank or steam passing through a heating means; Second control means for guiding the liquid toward the waste tank or the developing waste liquid storage tank according to the magnitude of the predetermined value. From the magnitude of the electric conductivity, it is possible to know the approximate level of the concentration of the specific substance (TMAH) in the wastewater. That is, for example, when the electric conductivity is high, the concentration of the specific substance is high, and when the electric conductivity is low, it is known that the concentration is low. Only clean wastewater with low concentration can be discarded. The wastewater having a high concentration of the specific substance may be returned to the developing waste liquid storage tank again.

【0016】更に、濃縮貯溜槽内に設置された現像廃液
の放出手段と、第1の配管から分岐させて第1の配管を
流れる現像廃液の一部を放出手段に流す第3の制御手段
とを有する。これにより、現像廃液が界面活性剤を含ん
でいるために貯溜部の現像廃液の表面に気泡が生じたと
きに適宜処理すべき現像廃液の一部を用いて濃縮貯溜槽
内に放出することで、消泡することができる。
Further, there is provided a discharge means for developing waste liquid provided in the concentration storage tank, and a third control means for branching from the first pipe and flowing a part of the developing waste liquid flowing through the first pipe to the discharging means. Having. With this, when bubbles are generated on the surface of the developing waste liquid in the storage part because the developing waste liquid contains a surfactant, the developing waste liquid is discharged into the concentration storage tank by using a part of the developing waste liquid to be appropriately treated. Can be defoamed.

【0017】[0017]

【発明の実施の形態】以下に、本発明の実施の形態につ
いて図面を参照しながら説明する。図1は、本発明の実
施の形態に係る、現像廃液の濃縮処理装置(廃液処理装
置)の構成について示す模式図である。現像廃液とし
て、フォトリソグラフィ工程でレジスト膜をマスクとし
てパターニングを行い、その後そのレジスト膜を溶解し
たときに生成される現像廃液(主成分:テトラアンモニ
ウムハイドロオキサイド、以下TMAHと称する。)を
用いる。濃縮後の現像廃液は酸性排ガス等の中和剤とし
て再利用する。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a schematic diagram illustrating a configuration of a developing waste liquid concentration processing apparatus (waste liquid processing apparatus) according to an embodiment of the present invention. As a developing waste liquid, a developing waste liquid (main component: tetraammonium hydroxide; hereinafter, referred to as TMAH) generated by patterning using a resist film as a mask in a photolithography step and then dissolving the resist film is used. The concentrated developer waste is reused as a neutralizing agent for acidic exhaust gas and the like.

【0018】現像廃液の濃縮処理装置は、図1に示すよ
うに、フォトリソグラフィ工程で生成した現像廃液を溜
める現像廃液貯溜槽T1 と、現像廃液を濃縮し、貯溜す
る減圧可能な濃縮貯溜槽T2 と、濃縮された現像廃液を
回収する濃縮廃液回収槽T3とを有する。減圧可能な濃
縮貯溜槽T2 を用いるのは、現像廃液を加熱して現像廃
液中の水分を蒸発させるときに、凡そ130℃で熱分解
するとされているTMAHが熱分解を起こさないよう
に、蒸発温度を80℃以下に下げるためである。このた
め、濃縮貯溜槽T2 内を減圧する排気装置A5 が配管P
16を通して濃縮貯溜槽T2 と接続されている。
[0018] concentration treatment apparatus development waste, as shown in FIG. 1, a waste developer reservoir T 1 for storing a waste developer generated in the photolithography process, a development waste was concentrated under reduced pressure concentrates reservoir to reservoir has a T 2, a concentrated waste liquid collecting tank T 3 for collecting the concentrated development waste. To use a reduced pressure concentrates reservoir T 2 are, when heating the waste developer evaporate water in the development waste, as TMAH which is to be thermally decomposed at approximately 130 ° C. does not cause thermal decomposition, This is for reducing the evaporation temperature to 80 ° C. or less. Therefore, the exhaust system A 5 to reduce the pressure in the concentrate reservoir T 2 the pipe P
And it is connected to the concentrate reservoir T 2 through 16.

【0019】濃縮貯溜槽T2 には、現像廃液の導入口I
1 が形成され、その導入口I1 から濃縮貯溜槽T2 内に
現像廃液が導入される。現像廃液の導入口I1 直下には
加熱手段A1 が設けられ、濃縮貯溜槽T2 内に導入され
た現像廃液は順次加熱手段A1 によって加熱される。加
熱手段A1 は金属製の伝熱管を有する熱交換器であり、
伝熱管の内部に蒸気を流入させて伝熱管の表面温度を上
昇させるものである。なお、熱交換器内を通す高温蒸気
として現像廃液から蒸発させた蒸気を用いるため、濃縮
処理装置の作動初期には高温の蒸気を使えない。その場
合は濃縮処理装置外部から蒸気を供給する。
The concentrated storage tank T 2 has an inlet I for developing waste liquid.
1 is formed, a developing waste liquid is introduced from the inlet I 1 in concentrated reservoir T 2. Immediately below inlet I 1 of the waste developer is provided heating means A 1, waste developer introduced into the concentrate reservoir T 2 are heated by sequentially heating means A 1. The heating means A 1 is a heat exchanger having a metal heat transfer tube,
This is to increase the surface temperature of the heat transfer tube by flowing steam into the heat transfer tube. Since steam evaporated from the developing waste liquid is used as high-temperature steam passing through the heat exchanger, high-temperature steam cannot be used in the initial stage of operation of the concentration treatment device. In that case, steam is supplied from the outside of the concentration treatment device.

【0020】加熱手段A1 を用いた加熱により現像廃液
中からTMAH等を含む水分が蒸発し、排気口O1 から
外に排出される。排気口O1 には蒸気の圧縮器A3 が接
続され、蒸発により生成した高温の蒸気を圧縮し、その
温度を2〜3℃上昇させる。この高温の蒸気を上記加熱
手段A1 に送り、加熱用の蒸気として用いる。さらに、
熱交換器A1 を通ってきた蒸気を冷却し、液化させるコ
ンデンサA4と、液化により生成した液体の電気伝導率
を測定する電気伝導率測定器M2 とを備えている。液体
の電気伝導率の測定により、液体中のTMAH(特定物
質)のおおよその濃度が分かる。即ち、電気伝導率が高
いときTMAHの濃度が高く、電気伝導率が低いときそ
の濃度が低いことが分かる。このため、環境汚染の恐れ
のない濃度に所定値を設定することで、清浄な液体のみ
を排水することができる。なお、電気伝導率を測定する
液体として熱交換器A1 を通ってきた蒸気を液化したも
のを用いているが、場合により濃縮貯溜槽T2 の排気口
を通って出てきた蒸気を直接液化したものを用いてもよ
い。
By heating using the heating means A 1 , water containing TMAH and the like evaporates from the developing waste liquid and is discharged to the outside through the exhaust port O 1 . The outlet O 1 is connected to the compressor A 3 vapor, compressing the high-temperature steam generated by evaporation, to increase its temperature 2 to 3 ° C.. It sends the high-temperature steam into the heating means A 1, is used as steam for heating. further,
The steam having passed through the heat exchanger A 1 is cooled, and a condenser A 4 to liquefy, and the electric conductivity meter M 2 to measure the electrical conductivity of the produced by liquefaction liquid. By measuring the electric conductivity of the liquid, the approximate concentration of TMAH (specific substance) in the liquid can be determined. That is, when the electric conductivity is high, the concentration of TMAH is high, and when the electric conductivity is low, the concentration is low. Therefore, by setting a predetermined value to a concentration that does not cause environmental pollution, only a clean liquid can be drained. Although used in which liquefied electrical conductivity has passed through the heat exchanger A 1 as the liquid for measuring the steam, directly liquefying the vapor emerging through the outlet of the concentrate reservoir T 2 optionally You may use what was done.

【0021】一方、加熱により水分が減って濃縮された
現像廃液は濃縮貯溜槽T2 の下部に設けられた貯溜部A
8 に貯溜される。貯溜部A8 には、貯溜された現像廃液
の温度を測定する手段M1 が備えられている。この温度
を測定する手段M1 により濃縮された現像廃液の温度を
測定し、以下の式に基づいて、 ΔTb =RTb 2 Mm/ΔH(=Kb m) ここで、M:溶媒のモル質量 Tb :溶媒の沸点 ΔH:溶媒のモル蒸発熱 m:溶媒の重量モル濃度 Kb :モル沸点上昇定数 その温度とモル沸点上昇とを対応させることにより、現
像廃液中のTMAHの濃度を間接的に測定することがで
きる。このため、簡単に濃度測定を行うことが出来る。
Meanwhile, waste developer containing water in the concentration decreases by heating reservoir A which is provided in the lower portion of the concentrate storage tank T 2
Stored in 8 . The reservoir A 8, the means M 1 for measuring the temperature of the reservoir has been developed waste is provided. The temperature of the developing waste solution concentrated by the means M 1 for measuring the temperature is measured, and ΔT b = RT b 2 Mm / ΔH (= K bm ) where M: mol of solvent mass T b: the boiling point of the solvent [Delta] H: molar heat of vaporization m solvents: molal concentration of solvent K b: by associating the molar ebullioscopic constant temperature and mole ebullioscopic, indirect concentration of TMAH in the development waste Can be measured. Therefore, the concentration measurement can be easily performed.

【0022】モル沸点上昇の原理に基づいて実験により
TMAHの濃度(wt%)と蒸発温度(℃)との関係を
調査した結果を図3に示す。このときの圧力は凡そ60
0mmHg前後である。さらに、濃縮貯溜槽T2 内には
濃縮処理装置を循環する現像廃液自身を放出可能なシャ
ワーA6 と、消泡剤を導入することができるシャワーA
7 とが設置されている。消泡剤はタンクT4 から供給さ
れる。これらのシャワーA6 ,A7 を設置する理由は、
以下のとおりである。即ち、現像廃液中に界面活性剤を
含むことがあるため、現像廃液が加熱されると、気泡が
生じる。この気泡は、濃縮貯溜槽T2 内に貯留された現
像廃液の表面に次々に積み重なっていき、濃縮貯溜槽T
2内に充満するようになる。この状態では濃縮化に支障
をきたすため消泡する必要があるからである。
FIG. 3 shows the results of an investigation on the relationship between the concentration of TMAH (wt%) and the evaporation temperature (° C.) by experiments based on the principle of increasing the molar boiling point. The pressure at this time is about 60
It is around 0 mmHg. Further, a shower A 6 capable of discharging the developing waste liquid itself circulating through the concentration processing device and a shower A capable of introducing an antifoaming agent are provided in the concentration storage tank T 2 .
7 and are installed. Defoamer is supplied from the tank T 4. The reason for installing these showers A 6 and A 7 is that
It is as follows. That is, since the developing waste liquid may contain a surfactant, when the developing waste liquid is heated, bubbles are generated. These air bubbles are successively stacked on the surface of the developing waste liquid stored in the concentration storage tank T 2 , and are concentrated.
Will be filled within 2 . This is because in this state, it is necessary to defoam in order to hinder concentration.

【0023】次に、上記説明した槽等の間の接続関係
と、それらの間を接続する配管を流れる現像廃液の流れ
を制御する制御手段とについて説明する。現像廃液貯溜
槽T1 と濃縮貯溜槽T2 の現像廃液の導入口I1 との間
は、配管P1 −P2 −P3 −P4 −P5 (第1の配管R
1 )により接続されている。濃縮貯溜槽T2 の貯溜部A
8 と導入口I1 との間は、配管P6 −P2 −P3 −P4
−P5 (第2の配管R2 )により接続されている。
Next, the connection relationship between the above-described tanks and the like and the control means for controlling the flow of the waste developer flowing through the pipe connecting them will be described. A pipe P 1 -P 2 -P 3 -P 4 -P 5 (first pipe R) is provided between the development waste liquid storage tank T 1 and the development waste liquid introduction port I 1 of the concentration storage tank T 2.
1 ) connected by Storage part A of concentrated storage tank T 2
8 and between the inlet I 1 is the pipe P 6 -P 2 -P 3 -P 4
It is connected by -P 5 (second pipe R 2).

【0024】濃縮貯溜槽T2 の貯留部A8 と濃縮廃液回
収槽T3 とは、配管P6 −P2 −P 3 −P7 (第3の配
管R3 )により接続されている。そして、貯溜部A8
現像廃液の温度が所定の温度よりも低いとき、貯溜部A
8 の現像廃液を第2の配管R2 に流出させて現像廃液の
導入口I1 に導き、貯溜部A8 の現像廃液の温度が所定
の温度以上のとき、貯溜部A8 の現像廃液を第3の配管
3 に流出させて濃縮廃液回収槽T3 に導く第1の制御
手段C0 を有する。
Concentration storage tank TTwoReservoir A of8And concentrated waste liquid times
Tank TThreeIs the pipe P6−PTwo−P Three−P7(Third distribution
Tube RThree). And storage part A8of
When the temperature of the developing waste liquid is lower than a predetermined temperature, the storage unit A
8Of the developing waste from the second pipe RTwoTo the waste developer
Inlet I1To the reservoir A8The temperature of the developing waste liquid
When the temperature is higher than or equal to8Development waste liquid into the third pipe
RThreeTo the concentrated waste liquid recovery tank TThreeFirst control that leads to
Means C0Having.

【0025】第1の制御手段C0 は、切替え手段C1
2 とコントローラC3 とポンプA 2 からなる。切替え
手段C1 は配管P1 とP2 とP6 の分岐部に設けられ、
1 とP2 の間を導通させ、又はP2 とP6 の間を導通
させる。切替え手段C2 は配管P3 とP 4 とP7 の分岐
部に設けられおり、配管P3 とP4 の間を導通させて現
像廃液を現像廃液の導入口I1 の方に送り、又は配管P
3 とP7 の間を導通させて現像廃液を濃縮廃液回収槽T
3 の方に送る。コントローラC3 は、現像廃液の温度を
測定する手段M1 から現像廃液の温度情報を受け、所定
温度を基準にして切替え手段C1 ,C2 を適宜切り替え
る。
First control means C0Means switching means C1,
CTwoAnd controller CThreeAnd pump A TwoConsists of Switching
Means C1Is piping P1And PTwoAnd P6Provided at the branch of
P1And PTwo, Or PTwoAnd P6Conduct between
Let it. Switching means CTwoIs piping PThreeAnd P FourAnd P7Branch of
Is installed in the pipe PThreeAnd PFourBetween the current
Image waste liquid is introduced into development waste liquid inlet I1Or pipe P
ThreeAnd P7Between the developing waste liquid and the concentrated waste liquid collecting tank T.
ThreeSend to Controller CThreeSets the temperature of the waste developer
Means M for measuring1Receives the temperature information of the developing waste liquid from
Switching means C based on temperature1, CTwoSwitch appropriately
You.

【0026】ポンプA2 は、配管P2 −P3 の間に設置
され、配管P2 ,P3 内の現像廃液を濃縮廃液回収槽T
3 及び濃縮貯溜槽T2 の現像廃液の導入口I1 の方に流
す。また、シャワーA6 と濃縮貯溜槽T2 の貯溜部A8
とは配管P6 −P2 −P3−P4 −P14を通して接続さ
れている。配管P4 とP5 とP14の分岐部には第3の制
御手段C4 が設けられている。通常は配管P4 とP5
間のみを導通させ、かつ配管P4 とP14の間を遮断して
おく。濃縮貯溜槽T2 内に泡が生じたときに配管P4
14の間をさらに導通させて、配管P4 からP5 を流れ
る現像廃液の一部をシャワーA6 に送る。
[0026] Pump A 2 is installed between the pipe P 2 -P 3, the pipe P 2, P 3 the development waste liquid concentrated liquid waste collection tank in T
3 and flows towards the inlet I 1 of the development waste concentrate reservoir T 2. Also, the shower A 6 and the storage section A 8 of the concentration storage tank T 2 are used.
It is connected through a pipe P 6 -P 2 -P 3 -P 4 -P 14 and. Third control means C 4 is provided in the branch portion of the pipe P 4 and P 5 and P 14. Usually brought into conduction only during the pipe P 4 and P 5, and keep disconnects the pipe P 4 and P 14. To further conduct via the pipe P 4 and P 14 when the bubble is generated in the concentrate reservoir T 2, and sends a portion of the waste developer through the P 5 from the pipe P 4 to the shower A 6.

【0027】圧縮器A3 と熱交換器A1 の間は配管P8
により接続され、熱交換器A1 内の配管P9 を介して、
さらに熱交換器A1 とコンデンサA4 の間は配管P10
より接続され、コンデンサA4 と電気伝導率測定器M2
の間は配管P11により接続されている。また、配管P11
は配管P12とP13とに分岐し、配管P13の他端は現像液
貯留槽T1 につながり、配管P12の他端は現像廃液中か
ら抽出した水分を廃棄する図示しない廃棄槽につなが
る。
A pipe P 8 is provided between the compressor A 3 and the heat exchanger A 1.
Are connected by via a pipe P 9 in the heat exchanger A 1,
Furthermore during the heat exchangers A 1 and capacitor A 4 are connected by a pipe P 10, the capacitor A 4 and the electrical conductivity measuring device M 2
Between it is connected by a pipe P 11. In addition, piping P 11
Branches to a pipe P 12 and P 13, the other end of the pipe P 13 leads the developer storage tank T 1, the other end of the pipe P 12 in disposal tank (not shown) discards the moisture extracted from the development waste Connect.

【0028】配管P11とP12とP13の分岐部には第2の
制御手段C5 が設けられている。第2の制御手段C
5 は、現像廃液から蒸発させた水分の電気伝導率が所定
値よりも高いときは配管P11とP12の間を遮断し、配管
11とP13の間を導通させてその水分を現像液貯留槽T
1 の方に送る。その電気伝導率が所定値よりも低くなっ
たとき、配管P11とP13の間を遮断し、配管P11とP12
の間を導通させて現像廃液中から抽出した水分を廃棄槽
の方に送る。電気伝導率が高いときは水分中にTMAH
が所定の濃度以上に含まれているので、廃棄することは
できず、電気伝導率が所定値よりも小さくなってはじめ
て、廃棄可能となる。
[0028] The branch portion of the pipe P 11 and P 12 and P 13 are the second control means C 5 are provided. Second control means C
5, the developing electric conductivity of the water evaporated from the waste developer is when higher than the predetermined value is cut off between the pipe P 11 and P 12, the water by conduction between the pipe P 11 and P 13 Liquid storage tank T
Send to 1 When the electrical conductivity is lower than a predetermined value, and disconnects the pipe P 11 and P 13, the pipe P 11 and P 12
And water extracted from the waste developer is sent to the waste tank. When electric conductivity is high, TMAH
Is contained at a concentration equal to or higher than a predetermined concentration and cannot be discarded, and can only be discarded when the electric conductivity becomes lower than a predetermined value.

【0029】上記の濃縮処理装置においては、装置の設
置に必要な床面積は凡そ16m2 となり、110m2
度必要であった従来例のRO膜による濃縮方法に比べ
て、1/7以下になる。また、150m2 程度必要であ
った従来例の生物活性汚泥法に比べて凡そ1/10とな
る。従って、従来例と比べて省スペースを図ることがで
きる。
[0029] In the above-described concentration treatment apparatus, floor area approximately 16m 2 becomes required for installing the devices, as compared to the concentration method according to the conventional example of the RO membranes was required about 110m 2, becomes 1/7 or less . In addition, it is about 1/10 as compared with the conventional biologically activated sludge method that required about 150 m 2 . Therefore, space saving can be achieved as compared with the conventional example.

【0030】次に、上記濃縮処理装置を用いて現像廃液
を濃縮する方法について説明する。図2は濃縮処理方法
の流れを示したフローチャートである。まず、現像装置
から現像廃液が廃棄されて来て(S1)、現像廃液貯溜
槽T1に溜められる(S2)。現像廃液中のTMAHの
濃度は凡そ0.289 wt%である。濃縮貯溜槽T2 内を排気
して槽内を減圧する。このとき、0.289 wt%のTMAH
濃度である現像廃液の蒸発温度が70℃となるように、
槽内の真空度を600mmHg前後に設定するととも
に、外部から温度70℃のガスを加熱手段A1 に送っ
て、加熱手段A1 の表面を温度70℃に維持しておく。
なお、場合により、ヒータにより、加熱手段A1 を予め
70℃に加熱しておいてもよい。
Next, a method for concentrating a developing waste liquid using the above-mentioned concentrating apparatus will be described. FIG. 2 is a flowchart showing the flow of the concentration processing method. First, waste developer from the developing device to come discarded (S1), is accumulated in the waste developer storage tank T 1 (S2). The concentration of TMAH in the waste developer is about 0.289 wt%. And evacuating the concentrate reservoir T 2 to reduce the pressure in the tank. At this time, 0.289 wt% of TMAH
So that the evaporation temperature of the development waste liquid, which is the concentration, is 70 ° C.
And sets the degree of vacuum in the vessel back and forth 600 mm Hg, and send the temperature 70 ° C. of the gas from the outside to the heating means A 1, previously maintained at a temperature 70 ° C. The surface of the heating means A 1.
Note optionally by a heater, the heating means A 1 may be preheated to 70 ° C..

【0031】現像廃液貯溜槽T1 に適当な量の現像廃液
が溜まったら、現像廃液貯溜槽T1から配管P1 −P2
−P3 −P4 −P5 (第1の配管R1 )を通して濃縮貯
溜槽T2 の現像廃液の導入口I1 に現像廃液を流す。続
いて、導入口I1 から現像廃液を濃縮貯溜槽T2 内に放
出する(S3)。現像廃液は加熱手段A1 と接触して加
熱され、現像廃液中の水分が蒸発する(S4)。蒸発に
より生成した蒸気は排気口O1 から圧縮器A3 に入り、
圧縮される。これにより、蒸気の温度は2〜3℃上昇す
る。昇温した蒸気は加熱手段A1 に送られる。このと
き、加熱手段A1 には外部から高温のガスが導入されて
いるが、現像廃液中から蒸発した昇温した蒸気が導入さ
れるように切り換える。昇温した蒸気は加熱手段A1
通って加熱手段A1 を加熱し、加熱手段A1 の温度を上
昇させる。
[0031] When the accumulated proper amount of development waste to waste developer reservoir T 1, piping from the development waste reservoir T 1 P 1 -P 2
-P 3 -P 4 -P 5 (first pipe R 1) flowing a developing waste liquid inlet I 1 of the development waste concentrate reservoir T 2 through. Then, to release from the inlet I 1 the development waste in concentrated reservoir T 2 (S3). Development waste is heated in contact with the heating means A 1, moisture in the development waste evaporates (S4). The vapor generated by the evaporation enters the compressor A 3 from the outlet O 1 ,
Compressed. Thereby, the temperature of the steam increases by 2 to 3 ° C. Heated steam is sent to the heating means A 1. In this case, the heating means A 1 is high-temperature gas from the outside is introduced, it switched as steam heated and evaporated from the developing waste liquid is introduced. Heated steam heats the heating means A 1 through heating means A 1, raising the temperature of the heating means A 1.

【0032】一方、蒸発せずに濃縮貯溜槽T2 内に残っ
た現像廃液は加熱手段A1 から落下して濃縮貯溜槽T2
下部の貯留部A8 に溜まる。貯留部A8 の現像廃液は水
分が相当程度除去されているので、TMAHの濃度が高
くなっている。このようにして、貯留部A8 に濃縮され
た現像廃液を溜めていく。常時、現像廃液の温度を測定
する(S6)。
On the other hand, the developing waste liquid remaining in the concentration storage tank T 2 without evaporating falls from the heating means A 1 and drops in the concentration storage tank T 2.
Collects in the bottom of the reservoir A 8. Since development waste reservoir portion A 8 moisture is considerably removed, the concentration of TMAH is high. In this way, going pooled and concentrated to reservoir A 8 development waste. The temperature of the developing waste liquid is constantly measured (S6).

【0033】このとき、図3に示すように、濃縮が進む
につれて蒸発温度が高くなるが、80℃以下に設定した
終点温度に達しなければ、第1の制御手段C0 により濃
縮貯溜槽T2 の貯留部A8 から配管P6 −P2 −P3
4 −P5 (第2の配管R2)を通して再び濃縮貯溜槽
2 の導入口I1 に現像廃液を送る(S3)。そして、
さらに上記で説明した方法により現像廃液を蒸発させ
(S4)、貯留する(S5)。このようにして、現像廃
液の蒸発温度が設定温度に達するまで、繰り返し現像廃
液を蒸発させ、貯留して濃縮を行う。
At this time, as shown in FIG. 3, the evaporation temperature increases as the concentration progresses. However, if the end point temperature does not reach 80 ° C. or less, the concentration control tank T 2 is controlled by the first control means C 0. pipe from the reservoir a 8 P 6 -P 2 -P 3 -
P 4 -P 5 sends a development waste again inlet I 1 of concentrate reservoir T 2 through (second pipe R 2) (S3). And
Further, the developing waste liquid is evaporated (S4) and stored (S5) by the method described above. In this manner, the developing waste liquid is repeatedly evaporated, stored, and concentrated until the evaporating temperature of the developing waste liquid reaches the set temperature.

【0034】現像廃液の蒸発温度が設定温度に達した
ら、第1の制御手段C0 により濃縮貯溜槽T2 の貯留部
8 から配管P6 −P2 −P3 −P7 (第3の配管
2 )を通して濃縮廃液回収槽T3 に現像廃液を流す。
ところで、上記の濃縮処理工程S8で、濃縮貯溜槽T2
内で蒸発し、圧縮器A 3 で圧縮されて加熱手段A1 を通
り抜けた蒸気はコンデンサA4 により冷却されて液化す
る(S9)。その後、液化により生成した液体の電気伝
導率を測定し(S10)、電気伝導率が所定値よりも大
きい場合には、液体に含まれるTMAHの量が多いの
で、その液体を現像廃液貯留槽T1 に戻す(S2)。ま
た、電気伝導率が所定値よりも小さくなったとき、中和
処理を行って(S11)、廃棄する(S12)。
The evaporating temperature of the developing waste liquid has reached the set temperature.
The first control means C0By concentration tank TTwoStorage department
A8From piping P6−PTwo−PThree−P7(Third piping
RTwo) Through the concentrated waste liquid recovery tank TThreeThe developing waste liquid.
By the way, in the concentration processing step S8, the concentration storage tank TTwo
Evaporates in the compressor A ThreeHeating means A1Through
The escaped steam is condenser AFourLiquefied by cooling
(S9). After that, the electric conduction of the liquid generated by liquefaction
The conductivity is measured (S10), and the electric conductivity is larger than a predetermined value.
When the amount of TMAH contained in the liquid is high,
Then, the liquid is transferred to a developing waste liquid storage tank T.1(S2). Ma
Also, when the electric conductivity becomes lower than the specified value, neutralization
Processing is performed (S11), and discarded (S12).

【0035】また、濃縮中に、貯留部A8 の現像廃液の
表面に気泡が生じて積み重なっていった場合、制御手段
4 により配管P4 −P14をさらに導通させて、現像廃
液の一部をシャワーA6 に流す。これにより、貯留部A
8 の現像廃液の表面に現像廃液が放出されて消泡が行わ
れる。なお、あまりに過剰な気泡が生じた場合には、タ
ンクT4 から消泡剤を濃縮貯溜槽T2 内に導き、シャワ
ーA7 から貯留部A8の現像廃液の表面に噴霧する。こ
れにより、貯留部A8 の現像廃液の表面の消泡を行うこ
とができる。
Further, during concentration, when bubbles on the surface of the developing waste liquid reservoir A 8 went stacked occur, to further conduct a pipe P 4 -P 14 by the control unit C 4, the development waste one flow of parts to the shower a 6. Thereby, the storage unit A
The development waste liquid is released to the surface of the development waste liquid of No. 8 and defoaming is performed. In the case where too excessive foaming occurs, leads from the tank T 4 antifoam in concentrate reservoir T 2, is sprayed on the surface of the developing waste liquid reservoir A 8 from the shower A 7. Thus, it is possible to perform defoaming of the surface of the waste developer in the reservoir A 8.

【0036】上記のようにして、濃縮された現像廃液の
凝縮水の水質を表1に示す。
Table 1 shows the quality of the condensed water of the concentrated development waste liquid as described above.

【0037】[0037]

【表1】 [Table 1]

【0038】表1に示すように、凝縮水の水質は弱アル
カリ性を示すが、pH値が水質汚濁防止法で定められて
いる範囲(pH5.8 〜pH8.6 )に入っており、良好な水質
であるといえる。なお、その他の水質の良否を表すパラ
メータCOD値、全窒素含有量も問題ない範囲にあると
いえる。以上のように、本発明の実施の形態において
は、濃縮した現像廃液中のTMAHの濃度が所定値に達
するまで、現像廃液中の水分の蒸発と蒸発後の現像廃液
中のTMAHの濃度の測定とを繰り返している。
As shown in Table 1, the water quality of the condensed water is weakly alkaline, but the pH value falls within the range (pH 5.8 to pH 8.6) specified by the Water Pollution Control Law. It can be said that it is water quality. In addition, it can be said that other parameters such as the COD value indicating the quality of water quality and the total nitrogen content are within a range without any problem. As described above, in the embodiment of the present invention, until the concentration of TMAH in the concentrated developing waste liquid reaches a predetermined value, evaporation of water in the developing waste liquid and measurement of the concentration of TMAH in the developing waste liquid after evaporation are performed. And has been repeated.

【0039】現像廃液を循環させて徐々に濃縮させるこ
とで、水分中のTMAH濃度を低減させることができ
る。このため、TMAHによる環境汚染等の問題を生じ
させることなく、容易に排水を行うことができる。ま
た、各循環毎にTMAHの濃度の測定を行っているの
で、現像廃液に含まれるTMAHの臨界濃度を所定値と
して設定することで、濃縮された現像廃液が回収槽内で
固化するのを防止することができる。
By circulating and gradually concentrating the developing waste liquid, the TMAH concentration in the water can be reduced. Therefore, drainage can be easily performed without causing problems such as environmental pollution due to TMAH. Also, since the concentration of TMAH is measured for each circulation, the critical concentration of TMAH contained in the developing waste liquid is set as a predetermined value to prevent the concentrated developing waste liquid from solidifying in the recovery tank. can do.

【0040】更に、減圧状態で現像廃液中の水分を蒸発
させることで、その蒸発温度を低下させることが出来
る。このため、エネルギコストを低減することができ
る。また、蒸発温度を低下させることでTMAHの熱分
解を抑制することができ、このため、酸性排ガスの中和
剤としての再利用も可能となる。また、蒸発により生成
された蒸気を圧縮してその蒸気の温度を上昇させ、昇温
した蒸気のエネルギを現像廃液に与えることにより現像
廃液の加熱を行っている。省エネルギ等においては、一
部では省エネルギ等を達成したが、その省エネルギ等を
達成するために他のところでエネルギを消費するという
ことがないようにすることが重要であるところ、現像廃
液から蒸発させた蒸気の熱エネルギを利用して現像廃液
自体の加熱に用いているので、エネルギを有効に活用す
ることができ、全体として省エネルギを達成することが
できる。
Further, the evaporation temperature can be reduced by evaporating the water in the developing waste liquid under reduced pressure. For this reason, energy cost can be reduced. In addition, by lowering the evaporation temperature, thermal decomposition of TMAH can be suppressed, and therefore, it is possible to reuse acidic exhaust gas as a neutralizing agent. In addition, the vapor generated by the evaporation is compressed to increase the temperature of the vapor, and the energy of the heated vapor is applied to the waste developer to heat the waste developer. In energy saving, etc., energy saving was achieved in part, but it is important not to consume energy in other places to achieve the energy saving, etc. Since the thermal energy of the evaporated vapor is used to heat the development waste liquid itself, the energy can be effectively used, and energy saving can be achieved as a whole.

【0041】[0041]

【発明の効果】以上のように、本発明においては、濃縮
した現像廃液中の特定物質の濃度が所定値に達するま
で、現像廃液中の水分の蒸発と水分を蒸発させた後の現
像廃液中の特定物質の濃度の測定とを繰り返している。
現像廃液を循環させて徐々に濃縮させることで、水分中
の特定物質の濃度を低減させることができる。このた
め、特定物質による環境汚染等の問題を生じさせること
なく、容易に排水を行うことができる。
As described above, in the present invention, the evaporation of the water in the development waste liquid and the evaporation of the water in the development waste liquid until the concentration of the specific substance in the concentrated development waste liquid reaches a predetermined value. The measurement of the concentration of the specific substance is repeated.
By circulating and gradually concentrating the developing waste liquid, the concentration of the specific substance in the water can be reduced. Therefore, drainage can be easily performed without causing a problem such as environmental pollution due to the specific substance.

【0042】また、各循環毎に現像廃液中の特定物質の
濃度の測定を行っている。この場合、特定物質の臨界濃
度を所定値として設定することで現像廃液の固化等の濃
縮による弊害を防止することが出来る。更に、減圧状態
で現像廃液中の水分を蒸発させることにより、その蒸発
温度を低下させることが出来る。このため、エネルギコ
ストを低減することができる。また、現像廃液中の特定
物質(例えば、TMAH)の熱分解を抑制することがで
き、このため、酸性排ガスの中和剤としての再生利用も
可能となる。
The concentration of a specific substance in the developing waste liquid is measured for each circulation. In this case, by setting the critical concentration of the specific substance as a predetermined value, it is possible to prevent adverse effects due to concentration such as solidification of the development waste liquid. Further, the evaporation temperature can be reduced by evaporating the water in the developing waste liquid under reduced pressure. For this reason, energy cost can be reduced. In addition, thermal decomposition of a specific substance (for example, TMAH) in the development waste liquid can be suppressed, and therefore, it is possible to reuse acidic exhaust gas as a neutralizing agent.

【図面の簡単な説明】[Brief description of the drawings]

【図1】図1は、本発明の実施の形態に係る現像廃液の
濃縮処理装置の全体構成を示す図である。
FIG. 1 is a diagram illustrating an overall configuration of a developing waste liquid concentration processing apparatus according to an embodiment of the present invention.

【図2】図2は、本発明の実施の形態に係る現像廃液の
濃縮処理方法について示すフローチャートである。
FIG. 2 is a flowchart illustrating a method for concentrating a developing waste liquid according to an embodiment of the present invention.

【図3】図3は、本発明の実施の形態に係る現像廃液の
TMAH濃度に対する沸点上昇について示す特性図であ
る。
FIG. 3 is a characteristic diagram showing a rise in a boiling point with respect to a TMAH concentration of a developing waste liquid according to the embodiment of the present invention.

【図4】図4は、従来例に係る生物活性汚泥法による処
理後の排水中のTMAH濃度と全有機炭素量の関係につ
いて示す特性図である。
FIG. 4 is a characteristic diagram showing a relationship between a TMAH concentration in wastewater after treatment by a biologically activated sludge method and a total organic carbon amount according to a conventional example.

【図5】図5は、従来例に係るRO膜濃縮法による濃縮
倍率に対する排水の水質について示す特性図である。
FIG. 5 is a characteristic diagram showing water quality of wastewater with respect to a concentration ratio by an RO membrane concentration method according to a conventional example.

【図6】図6は、従来例に係るRO膜濃縮法による濃縮
倍率に対する現像廃液の透過水量について示す特性図で
ある。
FIG. 6 is a characteristic diagram showing the amount of permeated water of a developing waste solution with respect to the concentration ratio by the RO membrane concentration method according to the conventional example.

【符号の説明】[Explanation of symbols]

1 熱交換器(加熱手段)、 A2 ポンプ、 A3 圧縮器、 A4 コンデンサ、 A5 排気装置、 A6 ,A7 シャワー、 A8 貯留部、 C0 第1の制御手段、 C1 ,C2 切替え手段、 C3 コントローラ、 C4 第3の制御手段、 C5 第2の制御手段、 I1 現像廃液の導入口、 M1 現像廃液の温度を測定する手段、 M2 電気伝導率測定器(電気伝導率を測定する手
段)、 P0 〜P16 配管、 O1 排気口、 T1 現像廃液貯留槽、 T2 濃縮貯留槽、 T3 濃縮廃液回収槽、 T4 消泡剤のタンク。
A 1 heat exchanger (heating means), A 2 pump, A 3 compressor, A 4 condenser, A 5 exhaust device, A 6 , A 7 shower, A 8 storage unit, C 0 first control means, C 1 , C 2 switching means, C 3 controller, C 4 a third control unit, C 5 second control means, I 1 inlet of the developing waste, M1 means for measuring the temperature of the developing waste, M2 electric conductivity meter ( means for measuring the electrical conductivity), P 0 to P 16 pipe, O 1 outlet, T 1 development waste reservoir, T 2 concentration storage tank, T 3 concentration waste liquid collecting tank, tank T 4 defoamer.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 辰野 勇 大阪府大阪市西淀川区御幣島6丁目7番5 号 株式会社ササクラ内 (72)発明者 西村 靖史 大阪府大阪市西淀川区御幣島6丁目7番5 号 株式会社ササクラ内 (72)発明者 山田 敬二 大阪府大阪市西淀川区御幣島6丁目7番5 号 株式会社ササクラ内 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Isamu Tatsuno 6-7-5 Moundoshima, Nishiyodogawa-ku, Osaka-shi, Osaka Inside Sasakura Inc. No. Sasakura Co., Ltd. (72) Inventor Keiji Yamada 6-7-5 Motejima, Nishiyodogawa-ku, Osaka-shi, Osaka

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 現像廃液を溜める現像廃液貯溜槽と、 前記現像廃液の導入口と、前記導入した現像廃液を加熱
する手段と、前記加熱により前記現像廃液中から蒸発す
る蒸気の排気口と、前記加熱した後の濃縮した現像廃液
を溜める貯溜部と、前記貯溜部の現像廃液の温度を測定
する手段とを有する減圧可能な濃縮貯溜槽と、 前記濃縮した現像廃液を回収する濃縮廃液回収槽と、 前記現像廃液貯溜槽から前記濃縮貯溜槽の導入口に該現
像廃液貯留槽内の現像廃液を送る第1の配管と、 前記貯溜部内の現像廃液を前記導入口に還流させる第2
の配管と、 前記濃縮貯溜槽の貯留部内の現像廃液を前記濃縮廃液回
収槽に送る第3の配管と、 前記貯溜部の現像廃液の温度が所定の圧力下で設定温度
よりも低いとき、前記貯溜部の現像廃液を前記第2の配
管に流出させて前記導入口に導き、前記貯溜部の現像廃
液の温度が前記所定の圧力下で前記設定温度以上のと
き、前記貯溜部の現像廃液を前記第3の配管に流出させ
て前記濃縮廃液回収槽に導く第1の制御手段とを有する
ことを特徴とする廃液処理装置。
A developing waste liquid storage tank for storing the developing waste liquid; an inlet for the developing waste liquid; a unit for heating the introduced developing waste liquid; an exhaust port for vapor evaporated from the developing waste liquid by the heating; A reservoir for storing the concentrated developer waste after heating, a decompressible concentration reservoir having means for measuring the temperature of the developer waste in the reservoir, and a concentrated waste recovery tank for collecting the concentrated developer waste A first pipe for sending a developing waste liquid in the developing waste liquid storage tank from the developing waste liquid storage tank to an introduction port of the concentration storage tank; and a second pipe for returning the developing waste liquid in the storage section to the introduction port.
And a third pipe for sending the developing waste liquid in the storage part of the concentration storage tank to the concentrated waste liquid recovery tank, and when the temperature of the development waste liquid in the storage part is lower than a set temperature under a predetermined pressure, The developing waste liquid in the storage section is caused to flow out to the second pipe and guided to the inlet, and when the temperature of the developing waste liquid in the storing section is equal to or higher than the set temperature under the predetermined pressure, the developing waste liquid in the storing section is discharged. A wastewater treatment apparatus comprising: first control means for flowing out to the third pipe and leading to the concentrated waste liquid recovery tank.
【請求項2】 前記濃縮貯溜槽の排気口から流れ出た蒸
気を圧縮する手段と、該圧縮手段により圧縮されて昇温
した蒸気を前記加熱手段に導いて該加熱手段を昇温させ
る第4の配管とを備えたことを特徴とする請求項1に記
載の廃液処理装置。
2. A means for compressing steam flowing out from an exhaust port of the concentration storage tank, and a fourth means for guiding the steam compressed and heated by the compression means to the heating means to heat the heating means. The waste liquid treatment apparatus according to claim 1, further comprising a pipe.
【請求項3】 前記加熱手段を通ってきた蒸気を冷却
し、液化する手段と、 前記液化により生成した液体の電気伝導率を測定する手
段と、 前記液体の廃棄槽と、 前記電気伝導率が所定の値に対する大小により前記液体
を前記廃棄槽の方に導き、或いは、前記液体を前記現像
廃液貯溜槽の方に導く第2の制御手段とを有することを
特徴とする請求項1または請求項2に記載の廃液処理装
置。
3. A means for cooling and liquefying the vapor that has passed through the heating means, a means for measuring the electric conductivity of the liquid generated by the liquefaction, a waste tank for the liquid, 2. A control device according to claim 1, further comprising second control means for guiding the liquid toward the waste tank depending on the magnitude of the predetermined value, or guiding the liquid toward the developing waste liquid storage tank. 3. The waste liquid treatment apparatus according to 2.
【請求項4】 前記濃縮貯溜槽内に設置された前記現像
廃液の放出手段と、前記濃縮貯溜槽内の現像廃液に気泡
が生じたときに前記第1の配管を流れる現像廃液の一部
を該第1の配管から分岐させて前記放出手段に流す第3
の制御手段とを有することを特徴とする請求項1乃至請
求項3のいずれかに記載の廃液処理装置。
4. A discharging means for discharging the developing waste liquid provided in the concentration storage tank, and a part of the developing waste liquid flowing through the first pipe when bubbles are generated in the developing waste liquid in the concentration storage tank. A third branch branched from the first pipe and flowing to the discharging means;
The waste liquid treatment apparatus according to any one of claims 1 to 3, further comprising: a control unit.
【請求項5】 (1)減圧状態で現像廃液を供給しつつ
加熱して該現像廃液を濃縮させ、 (2)前記加熱した後の濃縮した現像廃液を貯留し、 (3)前記貯留した現像廃液に含まれている特定物質の
濃度を測定し、 (4)前記濃度が所定値よりも低いときは、前記貯留し
た現像廃液について前記(1)、(2)及び(3)を繰
り返し、前記特定物質の濃度が前記所定値以上になった
とき前記現像廃液を回収することを特徴とする廃液処理
方法。
5. The method according to claim 1, further comprising: (1) heating the developing waste liquid while supplying the developing waste liquid under reduced pressure to concentrate the developing waste liquid; (2) storing the concentrated developing waste liquid after the heating; and (3) storing the stored developing waste liquid. The concentration of the specific substance contained in the waste liquid is measured. (4) When the concentration is lower than a predetermined value, the above (1), (2) and (3) are repeated for the stored developing waste liquid, and A waste liquid processing method, wherein the developing waste liquid is collected when the concentration of the specific substance is equal to or higher than the predetermined value.
【請求項6】 前記現像廃液に含まれる特定物質の濃度
の測定は、前記現像廃液の温度を測定し、該温度とモル
沸点上昇とを対応させることにより行うことを特徴とす
る請求項5に記載の廃液処理方法。
6. The method according to claim 5, wherein the measurement of the concentration of the specific substance contained in the developing waste liquid is performed by measuring a temperature of the developing waste liquid and making the temperature correspond to an increase in the molar boiling point. The waste liquid treatment method described in the above.
【請求項7】 前記現像廃液の加熱は、前記蒸発により
生成された蒸気を圧縮して該蒸気の温度を上昇させ、該
昇温した蒸気のエネルギを前記現像廃液に与えることに
より行うことを特徴とする請求項5又は請求項6に記載
の廃液処理方法。
7. The heating of the developing waste liquid is performed by compressing the vapor generated by the evaporation to increase the temperature of the vapor, and applying energy of the heated vapor to the developing waste liquid. The waste liquid treatment method according to claim 5 or 6, wherein
JP9164452A 1997-06-20 1997-06-20 Waste liquid treating apparatus and waste liquid treating method Pending JPH1110134A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9164452A JPH1110134A (en) 1997-06-20 1997-06-20 Waste liquid treating apparatus and waste liquid treating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9164452A JPH1110134A (en) 1997-06-20 1997-06-20 Waste liquid treating apparatus and waste liquid treating method

Publications (1)

Publication Number Publication Date
JPH1110134A true JPH1110134A (en) 1999-01-19

Family

ID=15793452

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9164452A Pending JPH1110134A (en) 1997-06-20 1997-06-20 Waste liquid treating apparatus and waste liquid treating method

Country Status (1)

Country Link
JP (1) JPH1110134A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012040468A (en) * 2010-08-16 2012-03-01 Japan Organo Co Ltd Wastewater treatment method and wastewater treatment apparatus
KR101125864B1 (en) * 2009-05-28 2012-03-29 주식회사 에이치엔 A Processing Apparatus for Wastewater Treatment
JP2014077936A (en) * 2012-10-11 2014-05-01 Panasonic Corp Regeneration method and regeneration apparatus for resist stripping solution
JP2019051479A (en) * 2017-09-15 2019-04-04 株式会社ササクラ Development waste liquid treating device and treating method

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02100602U (en) * 1989-01-30 1990-08-10
JPH0699166A (en) * 1992-09-21 1994-04-12 Ebara Infilco Co Ltd Method and device for treating drained water
JPH06190201A (en) * 1992-09-21 1994-07-12 Sasakura Eng Co Ltd Evaporating concentrating device
JPH06296801A (en) * 1993-04-16 1994-10-25 Hitachi Ltd Method of controlling concentration of concentrated liquid and apparatus for controlling concentration of concentrated liquid

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02100602U (en) * 1989-01-30 1990-08-10
JPH0699166A (en) * 1992-09-21 1994-04-12 Ebara Infilco Co Ltd Method and device for treating drained water
JPH06190201A (en) * 1992-09-21 1994-07-12 Sasakura Eng Co Ltd Evaporating concentrating device
JPH06296801A (en) * 1993-04-16 1994-10-25 Hitachi Ltd Method of controlling concentration of concentrated liquid and apparatus for controlling concentration of concentrated liquid

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101125864B1 (en) * 2009-05-28 2012-03-29 주식회사 에이치엔 A Processing Apparatus for Wastewater Treatment
JP2012040468A (en) * 2010-08-16 2012-03-01 Japan Organo Co Ltd Wastewater treatment method and wastewater treatment apparatus
JP2014077936A (en) * 2012-10-11 2014-05-01 Panasonic Corp Regeneration method and regeneration apparatus for resist stripping solution
JP2019051479A (en) * 2017-09-15 2019-04-04 株式会社ササクラ Development waste liquid treating device and treating method

Similar Documents

Publication Publication Date Title
JP6440156B2 (en) Organic solvent purification system and method
JP4774124B1 (en) Lithographic printing plate development waste reduction device
JP6636111B2 (en) Organic solvent purification system and method
WO1988006914A1 (en) Apparatus for concentrating waste liquid, apparatus for processing waste liquid and method of concentrating waste liquid
WO2016063578A1 (en) Ammonia-containing wastewater treatment apparatus and treatment method
JP2520317B2 (en) Ultrapure water production apparatus and method
KR100553026B1 (en) Method and apparatus for treatment of hydrofluoric acid drainage
JP2020146639A (en) Dehydration apparatus and dehydration method of organic solvent
JPH1110134A (en) Waste liquid treating apparatus and waste liquid treating method
JP6797632B2 (en) Fluorine-containing water treatment method and treatment equipment
JP3112508B2 (en) Waste liquid treatment method
CN211561936U (en) Organic solvent dehydration device and refining system
JP2020146635A (en) Dehydrator and dehydration method for liquid mixture including organic solvent and water
JP2018065098A (en) Processing method and processing device for amine-containing drainage water
JPH10263301A (en) Liquid thickening
JP4052652B2 (en) Water treatment method and equipment
JP2006283988A (en) Deaerating system
JP2004188411A (en) Method and apparatus for treating hydrofluoric acid waste water
JPH11244843A (en) Steam compression type pure water producing device
JPH10118404A (en) Method for concentrating liquid
JP4238458B2 (en) Organic drainage treatment method and apparatus
JP7213109B2 (en) Method and apparatus for removing condensate from inflow gas of vacuum pump
JP3941017B2 (en) Liquid concentration method
JP7220597B2 (en) Organic solvent distillation purification device and distillation purification method
JP2005125252A (en) Evaporative concentration method and evaporative concentration apparatus

Legal Events

Date Code Title Description
A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20030422