JPH1068969A - Liquid crystal display element - Google Patents

Abstract

PROBLEM TO BE SOLVED: To make it possible to prevent the light leakage from the circumferences of color filters by disposing picture frame-like light shielding layers formed like picture frames along the peripheral edges or near the peripheral edges on one main surface of an array substrate disposed with switching element on one main surface of two transparent substrates constituting a liquid crystal cell. SOLUTION: Drivers 3, TFTs 4 and transfer wirings 5 are formed on a first transparent substrate 1 which is the TFT array substrate and the color filters 6 are formed on the TFTs 4. The picture frame-like light shielding layers 10 consisting of black matrices 7 and colored layers 8 are formed to cover the drivers 3 on the circumferences of the color filters 6 and ITO films 9 are formed on the color filters 6 and the colored layers 8. Such picture frame-like light shielding layers 10 are formed on the drivers, by which the light shielding layers of the color filters 6 having the sufficient light shieldability are formed without impairing the flatness on the substrates formed with the color filters 6.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and more particularly to an active matrix type liquid crystal display device.

[0002]

2. Description of the Related Art In recent years, an active matrix type liquid crystal display device using a liquid crystal is becoming a display device replacing a CRT display device.

FIG. 12 is a schematic sectional structural view of a conventional active matrix type liquid crystal display device. On a first transparent substrate 101, a TFT 103 is provided.
03 so as to be electrically connected to the ITO pixel electrode 104.
Are provided, and an alignment film 105 made of polyimide is formed so as to cover them. On the other hand, the second transparent substrate 1
On the light-shielding layer 106K, a 0.1 μm-thick metal film made of chromium (Cr) is patterned into a predetermined shape.
Are formed. The light-shielding layer 106K has an opening at a position facing the pixel opening on the first transparent substrate 101, and the opening is formed in the opening by a pigment dispersion method, an electrodeposition method, a printing method, or the like. , 106G and 106B are formed. Further, the light shielding layer 106K and the coloring layer 10
A common electrode 107 is formed so as to cover 6R, 106G, and 106B, and an alignment film 108 is formed on the common electrode 107. A liquid crystal material to be a liquid crystal layer 111 is injected into a liquid crystal cell assembled by interposing a spacer 110 between the first transparent substrate 101 and the second transparent substrate 102, and the first transparent substrate 101 and the second An active matrix liquid crystal display element is formed by attaching a polarizing plate to the outer surface of each transparent substrate 102.

In this active matrix type liquid crystal display element, a pixel electrode 104 is switched by switching a TFT 103.
By applying an image signal to the liquid crystal layer 111, the alignment state of the liquid crystal molecules in the liquid crystal layer 111 is controlled, and the colored layers 106R,
Light transmitted through 6G and 106B can be modulated to function as a liquid crystal display element.

As described above, the light-shielding layer 106K is formed on the portion of the pixel electrode 104 facing the region other than the pixel opening in order to prevent light leakage from the periphery of the pixel electrode 104 and entry of light into the TFT 103. ing. However, the first
The design on the second transparent substrates 101 and 102 may be caused by misalignment between the first transparent substrate 101 and the second transparent substrate 102 at the time of assembling the liquid crystal cell, or the TFT 103 on the first transparent substrate 101 and the second Light-shielding layer 10 on transparent substrate 102
This is performed so that a pitch shift from the 6K forming portion is allowed. Therefore, the aperture ratio of the light-shielding layer 106K is reduced, and there is a disadvantage that the luminance as a display device is reduced.

In order to compensate for this drawback, a structure in which a color filter (colored layer and light-shielding layer) is formed on a TFT array substrate, that is, a color filter is formed above or below a pixel electrode on a transparent substrate on which a TFT is provided. An improved liquid crystal display device having a structure in which a layer is formed and a common electrode is formed on a transparent electrode as a counter substrate is proposed.

[0007]

However, in the above-mentioned improved liquid crystal display element, since a light-shielding layer is formed on the TFT, a conductive material cannot be used as a material for the light-shielding layer, and the insulating property is high. It is necessary to use a material, which has the following problems. That is, when a light-shielding layer is formed using a material having a high insulating property, it is difficult to obtain a sufficient light-shielding property with a thickness similar to that of a conductive material. is there. However, when the thickness of the light-shielding layer is increased, the step at the peripheral edge of the light-shielding layer also increases, and the step causes poor alignment of liquid crystal molecules and the like, and as a result, light leakage from around the color filter occurs. As a result, the display quality is degraded.

In the current structure of the improved liquid crystal display device, it is difficult to form a light-shielding layer having a sufficient light-shielding property without impairing the flatness on the TFT array substrate on which the light-shielding layer is formed.

SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and has as its object to provide a liquid crystal display device having a color filter formed on a TFT array substrate and a substrate on which a color filter is formed in other liquid crystal display devices. An object of the present invention is to provide a liquid crystal display element having a structure capable of forming a light shielding layer of a color filter having a sufficient light shielding property without impairing the above flatness.

[0010]

According to the liquid crystal display device of the present invention, of the two transparent substrates constituting the liquid crystal cell, one of the main substrates of the array substrate on which the switching element is provided on one main surface. It is characterized by having a frame-shaped light-shielding layer formed in a frame shape along the peripheral portion or the vicinity of the peripheral portion on the surface, particularly when forming a color filter on an array substrate on which switching elements are formed. It is necessary to form a light-shielding layer having a sufficient thickness in order to ensure a sufficient light-shielding property of the light-shielding layer of the color filter. A light-shielding layer of a color filter having a sufficient light-shielding property can be formed without impairment, and light leakage from around the color filter can be prevented.

[0011]

Embodiments of a liquid crystal display device according to the present invention will be described below with reference to the drawings.

A feature of the liquid crystal display element according to the present invention is that a frame-shaped light-shielding layer is formed around the color filter in order to improve the flatness around the color filter while securing a sufficient light-shielding property of the light-shielding layer of the color filter. On the point. In particular, when a color filter is formed on an array substrate on which a switching element is formed, it is necessary to form a light-shielding layer having a sufficient thickness to secure a sufficient light-shielding property of the light-shielding layer of the color filter. The effect of applying the configuration of the present invention is great.

FIGS. 1 to 3 are sectional structural views of a liquid crystal display device according to a first embodiment of the present invention, and FIG. 4 is a sectional view of the liquid crystal display device shown in FIGS. It is the top view which showed the corresponding location. FIGS. 1, 2 and 3 are cross-sectional structural views taken along lines AB, CD and EF in FIG. 4, respectively. The liquid crystal display device according to the first embodiment of the present invention is one in which the configuration of the present invention is applied to a liquid crystal display device having a driver-mounted p-Si TFT structure. FIG.
FIG. 2 is a cross-sectional structure diagram illustrating an example of a driver-mounted p-Si TFT structure of the liquid crystal display element according to the first embodiment of the present invention.

First, the sectional structure of the liquid crystal display device according to the first embodiment of the present invention in FIG. 1 will be described. On a first transparent substrate 1 which is a TFT array substrate,
A driver 3, a TFT 4, and a transfer wiring 5 are formed, and a color filter 6 is formed on the TFT 4. A frame-shaped light-shielding layer 10 composed of a black matrix 7 and a coloring layer 8 is formed around the color filter 6 so as to cover the driver 3. Color filter 6
An ITO film 9 is formed on the coloring layer 8. By forming the frame-shaped light-shielding layer 10 on the driver 3,
The size of the liquid crystal display element can be reduced.

On the other hand, an ITO film 11 as a common electrode is formed as a counter electrode on the second transparent substrate 2 as a counter substrate, and an alignment film 12 made of polyimide is formed on the ITO film 11. . What is indicated by reference numeral 13 is
This is a blurred portion generated when the alignment film 12 made of polyimide is printed, that is, a halo region.

The first transparent substrate 1 and the second transparent substrate 2 are bonded together with an adhesive 14 to form a liquid crystal cell. On the outside of the adhesive 14, a transfer material (electrode transfer material) for flowing a current from the first transparent substrate 1 as the TFT array substrate to the ITO film 11 on the second transparent substrate 2 as the opposite substrate. 15 are formed. This transfer material 15 is connected to the transfer wiring 5.

The sectional structure of the liquid crystal display device according to the first embodiment of the present invention in FIG. 2 is substantially the same as the sectional structure in FIG. 1, and a frame-shaped light-shielding layer 10 is formed. Does not have a driver 3
Instead, an O / S pad 16 is provided. Thus, by forming the frame-shaped light-shielding layer 10 on the electrode or the wiring, the size of the liquid crystal display element can be reduced.

The sectional structure of the liquid crystal display element according to the first embodiment of the present invention in FIG. 3 is substantially the same as the sectional structure in FIG. However, since this portion is a lead wire disposition portion, the external power input terminal 17 is disposed, and the transfer wiring 5 and the transfer material 15 are not disposed.

FIG. 5 is a sectional view showing a driver-mounted p-SiT of a liquid crystal display element according to the first embodiment of the present invention.
7 specifically shows an example of an FT structure.

The p-SiTFT structure is configured as follows. The semiconductor layer 5 is provided on the first transparent substrate 51.
2 and a gate insulating film 53 covering the semiconductor layer 52.
Are formed. A gate 54 is provided at a position on the gate insulating film 53 corresponding to the semiconductor layer 52, and covers the gate insulating film 53 and the gate 54 to form a silicon oxide film 5.
5. A silicon nitride film 57 is formed. Through holes are provided in the silicon nitride film 57, the silicon oxide film 55, and the gate oxide film 53, and the drain 58 and the source 59
Are electrically connected to the semiconductor layer 52 and disposed.
An insulating layer 61 made of an acrylic resin or a pigment-containing resin constituting a color filter is formed so as to cover the above structures, and a through hole 62 is formed on a source 59 of the insulating layer 61. . The pixel electrode 63 is formed on the insulating layer 61, and the pixel electrode 63 is electrically connected to the source 59 through the through hole 62.

On the other hand, the driver disposing portion on which the frame-shaped light-shielding layer is formed is configured as follows. A driver 56 is provided on the first transparent substrate 51, and the driver 56 is covered with a silicon nitride film 57. A frame-shaped light-shielding layer 60 is formed on a portion of the silicon nitride film 57 substantially corresponding to the driver 56.

The thickness of the frame-shaped light-shielding layer in the liquid crystal display device according to the present invention can be appropriately adjusted at the time of its formation. The thickness of the frame-shaped light-shielding layer is set so that light leakage from the periphery of the color filter is prevented while ensuring flatness. Also,
As described later, the frame-shaped light-shielding layer is preferably formed except for the liquid crystal injection port of the liquid crystal cell.

As the material of the frame-shaped light-shielding layer, a metal such as chromium (Cr), a pigment-containing resin constituting the color filter, carbon black, and various other inorganic and organic substances can be used.

As described above, in the liquid crystal display element according to the first embodiment of the present invention, since the frame-shaped light-shielding layer is formed around the color filter, a sufficient light-shielding property of the light-shielding layer of the color filter is ensured. The flatness around the color filter can be improved while preventing light leakage from around the color filter.

FIG. 6 is a sectional structural view of a liquid crystal display device according to a second embodiment of the present invention. The sectional structure of the liquid crystal display device according to the second embodiment of the present invention in FIG.
It is as follows. On a first transparent substrate 21, a TFT 2
3 are provided, and a pixel electrode 24 is provided so as to be electrically connected to the TFT 23. Then, an alignment film 5 is formed to cover them. A color filter including a light-shielding layer 26K and coloring layers 26R, 26G, and 26B is formed on the second transparent substrate 22, and a common electrode 27 as a counter electrode is formed on the common electrode 27 on the color filter. Are each provided with an alignment film 28.

On the other hand, on the periphery of the second transparent substrate 22, a frame-shaped light-shielding layer is formed as follows. That is, the first layer 26 of the frame-shaped light-shielding layer is formed on the second transparent substrate 22 using the same material as the light-shielding layer 26K of the color filter.
K ′ is formed thereon, and the second layer 26 of the frame-shaped light-shielding layer is formed thereon using the same material as the blue coloring layer 26B ′ of the color filter.
B ′ is formed thereon, and a common electrode 27 is further formed thereon, and an alignment film 28 is overlapped on the inner side on the frame-shaped light-shielding layer.

Then, the first transparent substrate 21 and the second
The transparent substrate 22 is bonded with an adhesive with the spacer 30 interposed therebetween to form a liquid crystal cell. A liquid crystal layer 31 is sandwiched between the first and second transparent substrates 21 and 22.

In the liquid crystal display device according to the second embodiment of the present invention, the frame-shaped light-shielding layer is made of the same material as that of the color filter, and is laminated in ascending order of transmittance among the materials. It has been formed.

Since the frame-shaped light-shielding layer is formed of the same material as the material constituting the color filter, a process only for forming the frame-shaped light-shielding layer is unnecessary. By the way, the reason why the materials are laminated in order of the transmittance is as follows. In the same process as the formation of the color filter, when the frame-shaped light-shielding layer is formed by laminating a plurality of materials,
The lamination of each material is performed so that the color filter is formed flat. Then, in the frame-shaped light shielding layer,
A phenomenon occurs in which the layers are not laminated at the same thickness but are formed thinner as the upper layer is formed. Therefore, the frame-shaped light-shielding layer can obtain a higher light-shielding property by laminating a material having a low transmittance on a lower layer that is formed thicker. It is.

Of the black, red, green, and blue color layers, the black color layer has the lowest transmittance, and the second lowest transmittance is usually the blue color layer, followed by the transmittance. Lower is the green or red colored layer. Since the order of the low transmittance varies depending on the material, the layers may be stacked in the order of the low transmittance according to the material used.

However, if the frame-shaped light-shielding layer can obtain sufficient light-shielding properties without being stacked in the order of lower transmittance, the frames may be stacked in any order. In this case, the material of each layer of the frame-shaped light shielding layer is not limited to the material constituting the color filter,
Metals such as chromium (Cr), carbon black and the like can also be used.

Hereinafter, an example of a manufacturing process of the liquid crystal display device according to the second embodiment of the present invention will be specifically described with reference to FIG.

Film formation and patterning are repeated by a normal process of forming a TFT, thereby producing an amorphous silicon TFT array substrate 21 having a total of 10,000 pixels in each of the vertical and horizontal 100 pixels in which the TFT and the electrode wiring are formed. Then, from the top of the TFT and the electrode wiring, AL-1051 (product name (manufactured by Nippon Synthetic Rubber Co., Ltd.)) is coated on the entire surface to a thickness of 500 angstroms as an alignment film material, and rubbing treatment is performed. 25 are formed.

Next, a photosensitive black resin is applied on the opposing substrate 22 using a spinner and dried at a temperature of 90 ° C. for 10 minutes. Thereafter, using a photomask having a predetermined pattern shape, a wavelength of 365 nm and an exposure amount of 300 mj / cm.
2, development is performed using an alkaline aqueous solution having a pH of 11.5, and baking is performed at a temperature of 200 ° C. for 60 minutes to form a light-shielding layer 26K having a thickness of 1.0 μm and a first frame-shaped light-shielding layer. 26K '.

Next, a UV-curable acrylic resin resist CR-2000 (trade name (manufactured by Fuji Hunt Technology Co., Ltd.)) in which a red face is dispersed is applied to the entire surface using a spinner to form a red colored layer. Exposure is performed at a wavelength of 365 nm and an exposure amount of 100 mj / cm2 through a photomask in which light is applied to a portion to be formed, and development is performed for 10 seconds using a 1% aqueous solution of potassium hydroxide (KOH).
Baking is performed at a temperature of 230 ° C. for 1 hour to form a red colored layer 26R having a thickness of 2.0 μm. Similarly, a UV-curable acrylic resin resist CG in which green and blue face dentists are dispersed
-2000 and CB-2000 (trade name (manufactured by Fuji Hunt Technology Co., Ltd.)) as materials to form green coloring layers and blue coloring layers 26G and 26B. Here, when forming the blue colored layer 26B, the second layer 26 of the frame-shaped light-shielding layer is used.
Use a mask such that B 'is formed.

After forming the color filter, an ITO film was formed as the transparent electrode 27 to a thickness of 1500 angstroms by sputtering, and an alignment film 28 was formed thereon using the same alignment film material as that of the TFT array substrate 21. . Thereafter, an adhesive 32 is printed along a peripheral portion of the alignment film 28 on the counter substrate 22 except for a portion (not shown) serving as a liquid crystal injection port, and micropearls (5 μm in diameter; (Manufactured by Sekisui Fine Chemical Co., Ltd.) over the entire surface and an active matrix substrate (TFT array substrate)
An electrode transfer material (transfer material (not shown)) for applying a voltage to the counter electrode from the 21 side was formed on the transfer electrode (not shown) outside the adhesive 32. Then, the two substrates 21 and 2 are arranged such that the alignment film 25 and the alignment film 28 face each other and each rubbing direction forms an angle of 90 degrees with each other.
2 and heat the adhesive to cure the two substrates 21
And 22 were pasted together.

Finally, according to a conventional method, ZLI-1565 (trade name (manufactured by E. Merck)) as a liquid crystal composition.
After adding 0.1 wt% of S811 to
The inlet was sealed with a UV curable resin.

As described above, the manufactured color display type active matrix liquid crystal display device has almost no light leakage from the peripheral portion of the pixel region, and has high contrast ratio and high display quality.

FIG. 7 is a sectional structural view of a TFT array substrate of a liquid crystal display device according to a third embodiment of the present invention.
The sectional structure of the TFT array substrate of the liquid crystal display device according to the third embodiment of the present invention in FIG. 7 is as follows. Here, the configuration of the counter substrate in the liquid crystal display element according to the third embodiment of the present invention is substantially the same as the counter substrate in the liquid crystal display element according to the first embodiment of the present invention. Not shown.

On a transparent substrate 41, which is a TFT array substrate, a gate line 42 is formed by patterning a metal film such as molybdenum formed to a thickness of about 0.3 μm by sputtering into a predetermined shape by photolithography. I have. A gate insulating film 43 made of silicon dioxide or silicon nitride is formed on the entire surface of the transparent substrate 41 on which the gate lines 42 are provided.
Is formed, and the gate line 42 on the gate insulating film 43 is formed.
A semiconductor layer 44 is formed at a position corresponding to. At predetermined positions on the gate insulating film 43 and the semiconductor layer 44, a signal line 45 and a source electrode 46 made of aluminum and having a thickness of about 0.3 μm are provided so as to be electrically connected to the semiconductor layer 44, respectively. Have been. The gate line 42, the gate insulating film 43, the semiconductor layer 44, the signal line 45, and the source electrode 46 constitute a TFT.

The TFT is covered with a black colored layer 47 serving as a light shielding layer. Simultaneously with the black colored layer 47, a frame-shaped light shielding layer made of the same material as the black colored layer 47 is provided near the periphery of the transparent substrate. A first layer 47a 'is formed. In this case, to prevent a short circuit of the wiring portion outside the display area,
It is necessary to use an insulating material for the first layer 47a 'of the frame-shaped light shielding layer.

Further, blue, red, and green colored layers 48B, 48R, and 48G obtained by patterning a negative resist containing blue (B), red (R), and green (G) pigments by photolithography are used as gate insulating films. 43 are formed in portions to be pixel openings. At the same time as the blue and red colored layers 48B and 48R, a second layer 48B 'and a third layer 48R' are formed on the first layer 47a 'of the frame-shaped light shielding layer. The method for forming the colored layer is not limited to the photolithography method using a pigment resist, but may be a dyeing method, a printing method, an electrodeposition method, or the like.

On each of the colored layers 48R, 48G, 48B,
Pixel electrodes 49 of about 0.1 μm in thickness are formed of ITO. The pixel electrode 49 is formed of each colored layer 48.
The connection portions (through-hole portions) opened at R, 48G, and 48B are connected to the source electrode 46. still,
The pixel electrode 49 may be formed above or below the colored layer.

When an alignment film made of polyimide is formed thereon, an array substrate having color filters and switching elements is completed. The substrate opposed to this substrate is a transparent substrate on which a 0.15 μm-thick I5
A film in which a TO film is formed and an alignment film made of polyimide is formed thereon is used. A liquid crystal is sandwiched between these substrates, and deflection plates are provided on both sides of the liquid crystal cell to which the peripheral portions of the substrates are adhered to function as a liquid crystal display element.

Also in the liquid crystal display element according to the third embodiment of the present invention, the frame-shaped light-shielding layer is made of the same material as that of the color filter, and is laminated in ascending order of transmittance among these materials. It has been formed. Therefore, a step only for forming the frame-shaped light-shielding layer is unnecessary. The reason for stacking the layers in order of decreasing transmittance is as described above, and the materials and the order of stacking can be changed in the same manner as in the first or second embodiment. Furthermore, the number of frame-shaped light-shielding layers is not limited to three.

As a factor to be considered when changing the stacking order of the respective layers constituting the frame-shaped light-shielding layer, the adhesion strength between the first layer formed on the substrate and the substrate surface can be mentioned. Normal,
The black pigment-dispersed organic film has low adhesion strength to the substrate surface, and the film is easily peeled. Therefore, when a frame-shaped light-shielding layer is formed by laminating a plurality of layers, peeling of the frame-shaped light-shielding layer is prevented by setting the layer having the largest adhesion strength to the substrate among the plurality of layers as the lowermost layer. Can be. For example, in the case of forming a frame-shaped light-shielding layer by laminating colored layers, the layers other than the black colored layer are laminated in the order of the blue colored layer, the red colored layer, and the black colored layer so as to be the lowermost layer. Alternatively, it is also possible to form an inorganic substance layer made of an inorganic substance as the first layer, and to stack the respective colored layers thereon to secure the adhesion strength between the first layer and the substrate surface. As the inorganic material layer, a silicon nitride film or the like having good adhesion to an organic film is preferably formed. Further, for example, 100
By forming the grooves at a pitch of about μm, the contact area with the organic film increases, and the adhesion strength with the organic film also improves.

FIG. 8 is a sectional structural view of a TFT array substrate of a liquid crystal display device according to a fourth embodiment of the present invention.
The cross-sectional structure of the TFT array substrate of the liquid crystal display device according to the fourth embodiment of the present invention in FIG. 8 is the cross-sectional structure of the TFT array substrate of the liquid crystal display device according to the third embodiment of the present invention in FIG. Therefore, only the differences will be described.

The difference lies in the order of lamination of the layers constituting the frame-shaped light-shielding layer. In the liquid crystal display element according to the fourth embodiment of the present invention, the blue colored layer 48B 'is the first layer,
The green coloring layer 48G 'is a second layer, and the black coloring layer 47b' is a third layer. In this case, unlike the third embodiment, since the black colored layer 47b 'does not cause a short circuit of the wiring portion outside the display area, the black colored layer 47b' has a high light-shielding conductive property. Can be used.

FIG. 9 is a sectional structural view of a liquid crystal display device according to a fifth embodiment of the present invention. The sectional structure of the liquid crystal display device according to the fifth embodiment of the present invention in FIG.
It is as follows.

First transparent substrate 7 which is a TFT array substrate
1, a driver 76, a TFT 73, and a pixel electrode 74
Is formed, and an insulating layer 82 is formed on the driver 76.
An alignment film 75 is formed on the TFT 73 and the pixel electrode 74.

On the other hand, a color filter composed of a light shielding layer 77 and coloring layers 78R, 78G and the like is formed on the second transparent substrate 2 which is an opposite substrate, and the same as the light shielding layer 77 near the periphery of the substrate. First layer 77 ′ made of material, red coloring layer 7
A frame-shaped light-shielding layer in which a second layer 78R ′ made of the same material as 8R is laminated is formed. A common electrode 79 as a counter electrode is formed on the entire surface from above, and an alignment film 80 is formed in a pixel region on the common electrode 79.

First transparent substrate 71 and second transparent substrate 72
Are bonded to each other with an adhesive (not shown) to constitute a liquid crystal cell, and between the frame-shaped light-shielding layers (77 ′ and 78R ′) and the insulating layer 82 on the outside of the adhesive.
A transfer material 81 for flowing a current from the side of the first transparent substrate 71 which is a TFT array substrate to the common electrode 79 on the second transparent substrate 72 which is a counter substrate is formed. The transfer material 81 is formed on part or all of the frame-shaped light-shielding layer. Therefore, when the transfer material 81 is formed on a part of the frame-shaped light-shielding layer, the thickness of the part of the frame-shaped light-shielding layer is formed to be thinner than other parts.

When a frame-shaped light-shielding layer is provided on the substrate on which the color filter is formed, the frame-shaped light-shielding layers (77 'and 7
8R '), the upper electrode of the frame-shaped light-shielding layer is made of a layer 78 made of the same material as the red coloring layer.
R ′, that is, depending on whether it is an insulating layer or not, the resistance of the counter electrode 79 is lower in the case of the insulating layer. Therefore, when the transfer material 81 is provided on the frame-shaped light-shielding layer, the uppermost layer of the frame-shaped light-shielding layer should be an insulating layer as in the liquid crystal display element according to the fifth embodiment of the present invention. Is desirable.

FIG. 10 is a perspective plan view of a liquid crystal display device according to a sixth embodiment of the present invention, and FIG.
It is sectional drawing along H. The configuration of the liquid crystal display device according to the sixth embodiment of the present invention is applicable to each of the above embodiments, and the contents are as follows. That is, when the frame-shaped light-shielding layer is formed in a complete frame shape, the height of the liquid crystal injection port for injecting the liquid crystal material becomes smaller than the cell gap between the two substrates, so that the liquid crystal injection port becomes smaller. In addition, there is a problem that injection of a liquid crystal material becomes difficult.

Therefore, the liquid crystal display element according to the sixth embodiment of the present invention has the following configuration in order to secure the same size of the liquid crystal injection port as when no frame-shaped light shielding layer is provided. ing.

First transparent substrate 9 constituting liquid crystal cell 90
A driver 93, an external power supply input terminal 94, and the like are provided on 1, and a frame-shaped light-shielding layer 97 is formed. Code 95
Denotes an adhesive, and reference numeral 96 denotes a pixel region.

The frame-shaped light-shielding layer 97 has a step at the portion of the liquid crystal injection port cut by the line GH and is not completely frame-shaped. As shown in FIG. 11, the frame-shaped light-shielding layer 97 other than the liquid crystal injection port is formed by laminating a first layer 97K which is a black coloring layer and a second layer 97B which is a blue coloring layer. In contrast, the frame-shaped light-shielding layer 9 at the liquid crystal layer injection port
7 is configured such that a black colored layer 97K is laminated on a metal film 98 which is sufficiently thinner than the colored layer.

Therefore, the height of the liquid crystal injection port is as high as the case where the frame-shaped light-shielding layer is not provided, and the liquid crystal material can be easily injected. In addition, the metal film 9
By forming 8, the frame-shaped light-shielding layer 97 at the portion of the liquid crystal layer injection port can also secure light-shielding properties equal to or higher than other portions. Further, since the black colored layer 97K which is an insulating layer is formed on the metal film 98,
Therefore, no DC voltage is applied directly to the liquid crystal layer. The metal film 98 is preferably formed using a gate line material or a signal line material in the same step as the formation of the gate line material or the signal line material.

The frame-shaped light-shielding layer in each of the embodiments described above is formed of the same material as the insulating layer formed in the display region, in addition to the colored layer or the light-shielding layer constituting the color filter. Is also good.

[0060]

As described above, according to the liquid crystal display device of the present invention, of the two transparent substrates forming the liquid crystal cell, the array substrate having the switching elements disposed on one principal surface is formed. Since a frame-shaped light-shielding layer formed in a frame shape is provided along a peripheral portion or a vicinity of the peripheral portion on one main surface, particularly when a color filter is formed on an array substrate on which a switching element is formed. It is necessary to form a light-shielding layer having a sufficient thickness in order to ensure a sufficient light-shielding property of the light-shielding layer of the color filter. However, the configuration of the present invention impairs flatness on a substrate on which the color filter is formed. Thus, a light-shielding layer of a color filter having a sufficient light-shielding property can be formed, and light leakage from around the color filter can be prevented.

[Brief description of the drawings]

FIG. 1 is a sectional structural view of a liquid crystal display device according to a first embodiment of the present invention.

FIG. 2 is a sectional structural view of the liquid crystal display device according to the first embodiment of the present invention.

FIG. 3 is a sectional structural view of the liquid crystal display element according to the first embodiment of the present invention.

FIG. 4 is a plan view showing a corresponding portion of a cross section of the liquid crystal display element shown in FIGS. 1 to 3;

FIG. 5 is a sectional structural view showing an example of a driver-mounted p-Si TFT structure of the liquid crystal display element according to the first embodiment of the present invention.

FIG. 6 is a sectional structural view of a liquid crystal display device according to a second embodiment of the present invention.

FIG. 7 is a sectional structural view of a TFT array substrate of a liquid crystal display device according to a third embodiment of the present invention.

FIG. 8 is a sectional structural view of a TFT array substrate of a liquid crystal display device according to a fourth embodiment of the present invention.

FIG. 9 is a sectional structural view of a liquid crystal display device according to a fifth embodiment of the present invention.

FIG. 10 is a plan perspective view of a liquid crystal display device according to a sixth embodiment of the present invention.

FIG. 11 is a sectional structural view taken along line GH in FIG. 10;

FIG. 12 is a schematic sectional structural view of a conventional active matrix type liquid crystal display element.

[Explanation of symbols]

1, 2, 21, 22, 41, 51, 71, 72, 91,
92, 101, 102 Transparent substrate 3, 56, 76, 93 Driver 4, 23, 73, 103 TFT 5 Transfer wiring 6 Color filter 7 Black matrix 8, 26K, 26R, 26G, 26B, 26K ', 26
B ', 48R, 48G, 48B, 48R', 48B ',
48 ', 61, 78R, 78G, 78R', 97K, 9
7B, 106K, 106R, 106G, 106B Colored layer 9 ITO film 10, 60, 97 Frame-shaped light-shielding layer 11, 27, 79, 107 Common electrode 12, 25, 28, 75, 80, 105, 108 Alignment film 13 Halo region 14, 32, 95 Adhesive 15, 81 Transfer material (electrode transfer material) 16 O / S pad 17, 94 External power input terminal 24, 49, 63, 74, 104 Pixel electrode 30, 110 Spacer 31, 111 Liquid crystal layer 42 , 54 gate line 43, 53 gate insulating film 44, 52 semiconductor layer 45 signal line 46, 59 source electrode 47, 47a ', 47b', 77, 77 'light shielding film 55 silicon oxide film 57 silicon nitride film 58 drain electrode 62 through Hole part 82 insulating layer 90 liquid crystal cell 96 pixel area 98 metal film

 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Daisuke Miyazaki 8 Shinsugita-cho, Isogo-ku, Yokohama-shi, Kanagawa Prefecture Inside Toshiba Yokohama Office (72) Inventor Makoto Hasegawa 8 Shin-Sugita-cho, Isogo-ku, Yokohama-shi, Kanagawa Inside the Toshiba Yokohama Office (72) Inventor Muneharu Akiyoshi 8 Shinsugita-cho, Isogo-ku, Yokohama-shi, Kanagawa Prefecture Inside the Toshiba Yokohama Office (72) Akiko Ueno 8 Shin-Sugita-cho, Isogo-ku, Yokohama-shi, Kanagawa Address: In the Toshiba Yokohama Office, Ltd. (72) Minako Kurosaki, Inventor Minako Kurosaki 8 in Shinsugita-cho, Isogo-ku, Yokohama, Kanagawa Prefecture (72) Inventor: Shoichi Kurauchi Shin-Sugitacho, Isogo-ku, Yokohama, Kanagawa No. 8 In the Toshiba Yokohama Office (72) Inventor Jin Hafuji 8 Shinshin Sugita-cho, Isogo-ku, Yokohama-shi, Kanagawa Company Toshiba Yokohama workplace (72) inventor Green River bright row, Kawasaki City, Kanagawa Prefecture Kawasaki-ku Nisshin-cho, address 7 1 Toshiba Electronics Engineering Co., Ltd. in

Claims (22)

[Claims] 1. A frame along a peripheral portion or a vicinity of a peripheral portion on one main surface of an array substrate on which a switching element is disposed on one main surface of two transparent substrates constituting a liquid crystal cell. A liquid crystal display device comprising a frame-shaped light-shielding layer formed in a shape. 2. The liquid crystal display device according to claim 1, wherein
A liquid crystal display device, wherein the array substrate has a color filter formed on the one main surface. 3. The liquid crystal display device according to claim 1, wherein the frame-shaped light-shielding layer is formed by laminating a plurality of opaque layers. . 4. The liquid crystal display device according to claim 3, wherein
The first layer of the plurality of opaque layers is a layer having a maximum adhesion strength with the array substrate when stacked on the array substrate, among layers constituting the plurality of opaque layers. A liquid crystal display device characterized by the above-mentioned. 5. The liquid crystal display device according to claim 4, wherein
The first layer of the plurality of opaque layers is a layer other than a black colored layer. 6. The liquid crystal display device according to claim 3, wherein
A liquid crystal display device, wherein an inorganic material layer is formed between the plurality of opaque layers and the array substrate. 7. The liquid crystal display device according to claim 6, wherein
The liquid crystal display device according to claim 1, wherein the inorganic material layer is a silicon nitride film. 8. The liquid crystal display device according to claim 6, wherein grooves of a predetermined pitch are formed in said inorganic material layer. 9. The liquid crystal display device according to claim 3, wherein
The liquid crystal display device according to claim 1, wherein the plurality of opaque layers are stacked in ascending order of transmittance. 10. The liquid crystal display device according to claim 9, wherein a first layer of said plurality of opaque layers is a black colored layer. 11. A liquid crystal display device according to claim 1, wherein said frame-shaped light shielding layer is formed on an electrode or a wiring. 12. The liquid crystal display element according to claim 11, wherein, of the layers constituting the frame-shaped light-shielding layer, a layer in contact with the electrode or the wiring is an insulating layer. 13. A liquid crystal display device according to claim 12, wherein each layer formed on said insulating layer includes a black matrix layer. 14. A liquid crystal display device according to claim 12, wherein said insulating layer is made of an inorganic substance. 15. The liquid crystal display device according to claim 12, wherein said insulating layer is also formed in a display area. 16. The liquid crystal display element according to claim 1, wherein a thickness of the frame-shaped light-shielding layer at a liquid crystal injection port is smaller than a thickness at a portion other than the liquid crystal injection port. A liquid crystal display device characterized by the above-mentioned. 17. The liquid crystal display device according to claim 16, wherein a light-shielding film is formed in the frame-shaped light-shielding layer at the liquid crystal injection port. 18. The liquid crystal display device according to claim 17, wherein said light-shielding film is formed in the same step as the wiring in the display area. 19. A liquid crystal display device according to claim 1, wherein said frame-shaped light-shielding layer is formed on a drive circuit for driving said switching element. A liquid crystal display element characterized in that part or all of the liquid crystal display element overlaps with an adhesive forming area for bonding the two transparent substrates. 20. The liquid crystal display device according to claim 1, wherein an electrode transfer material is formed on part or all of the frame light-shielding layer. 21. The liquid crystal display device according to claim 20, wherein, when the electrode transfer material is formed on a part of the frame light-shielding layer, a portion of the frame light-shielding layer where the electrode transfer material is formed. Is formed so as to be thinner than the portion where the electrode transfer material is formed by the height of the electrode transfer material. 22. The liquid crystal display device according to claim 20, wherein the electrode transfer material is formed outside the adhesive forming region where the two transparent substrates are bonded to each other. Liquid crystal display element.