JPH1053881A - Sliding member and its production - Google Patents

Sliding member and its production

Info

Publication number
JPH1053881A
JPH1053881A JP22589096A JP22589096A JPH1053881A JP H1053881 A JPH1053881 A JP H1053881A JP 22589096 A JP22589096 A JP 22589096A JP 22589096 A JP22589096 A JP 22589096A JP H1053881 A JPH1053881 A JP H1053881A
Authority
JP
Japan
Prior art keywords
hard
plating
plating layer
base material
sliding member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22589096A
Other languages
Japanese (ja)
Other versions
JP3578873B2 (en
Inventor
Akira Harayama
章 原山
Toshiaki Imai
俊晶 今井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teikoku Piston Ring Co Ltd
Original Assignee
Teikoku Piston Ring Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teikoku Piston Ring Co Ltd filed Critical Teikoku Piston Ring Co Ltd
Priority to JP22589096A priority Critical patent/JP3578873B2/en
Publication of JPH1053881A publication Critical patent/JPH1053881A/en
Application granted granted Critical
Publication of JP3578873B2 publication Critical patent/JP3578873B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Other Surface Treatments For Metallic Materials (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

PROBLEM TO BE SOLVED: To produce a sliding member having a hard Cr plating layer capable of sufficiently maintaining seizing resistance and wear resistance even if the wear of the sliding face progresses. SOLUTION: The surface of the base metal in the inner circumferential face of a cylinder liner 1 is formed into a rugged face 3 having surface roughness of 5 to 30μm amplitude and 20 to 100μm pitch, and a hard Cr plating layer 2 is formed on the rugged face 3. The hard Cr plating layer 2 has a reticulately stretching fine recessed part 4 on the surface and furthermore having fine voids 5 reticulately stretching along the rugged face 3 of the base metal surface and distributed independently in the thickness direction on the inside.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、硬質Crめっき層
を摺動面に有している摺動部材に関し、例えば内燃機関
のシリンダライナやピストンリングに適用して有効であ
る。
The present invention relates to a sliding member having a hard Cr plating layer on a sliding surface, and is effective when applied to, for example, a cylinder liner or a piston ring of an internal combustion engine.

【0002】[0002]

【従来の技術】内燃機関用のピストンリングの外周面、
側面、あるいはシリンダライナの内周面に硬質Crめっ
きを施すことがある。しかし、硬質Crめっきは、高硬
度、耐摩耗性、低摩擦係数を有するが、保油性が乏しい
欠点がある。
2. Description of the Related Art An outer peripheral surface of a piston ring for an internal combustion engine,
Hard Cr plating may be applied to the side surface or the inner peripheral surface of the cylinder liner. However, although hard Cr plating has high hardness, abrasion resistance and a low coefficient of friction, it has a drawback of poor oil retention.

【0003】そこで、潤滑油溜まりとして機能する微細
な凹部を表面に形成したポーラスCrめっきが、耐焼き
付き性を改善するために行われており、特にシリンダラ
イナの内周面に利用されている。
[0003] Therefore, porous Cr plating in which fine concave portions functioning as lubricating oil reservoirs are formed on the surface is performed to improve seizure resistance, and is used particularly on the inner peripheral surface of a cylinder liner.

【0004】この微細な凹部の形成方法には、 ・Crめっき後、逆電処理でエッチングする方法 ・母材に表面粗さを付加し、それをめっき表面に残存さ
せる方法 等がある。
[0004] As a method of forming such fine concave portions, there are: a method of etching by reverse voltage treatment after Cr plating; a method of adding surface roughness to the base material and leaving it on the plating surface.

【0005】硬質Crめっき後、逆電処理によるエッチ
ングによって形成された微細な凹部は網目状に延びてお
り、後工程の研磨加工での加工代の大小により、 チャンネルタイプ:凹部が網目状に延びているもの(加
工代が小の場合) ピットタイプ:凹部が独立して分散しているもの(加工
代が大の場合) インターメディエイトタイプ:上記2つの中間的なもの
(加工代が中の場合) の3つに分けられる。そして摺動部材に要求される耐摩
耗性、耐焼き付き性等の摺動特性に応じて、使い分けら
れている。
[0005] After the hard Cr plating, the fine concave portions formed by the etching by the reverse voltage treatment extend in a mesh shape, and the channel type: the concave portions extend in a mesh shape due to the size of the processing allowance in the polishing process in the subsequent process. Pit type: when the recesses are dispersed independently (when the processing allowance is large) Intermediate type: intermediate between the above two (when the processing allowance is medium) Case) is divided into three. The sliding members are properly used according to sliding characteristics such as abrasion resistance and seizure resistance required.

【0006】[0006]

【発明が解決しようとする課題】しかし、従来のポーラ
スCrめっきは表面にのみ凹部が存在し、摺動特性改善
に効果的な凹部はめっき層内部に存在しない。従って、
摺動面が摩耗すると凹部が無くなり、耐焼き付き性が劣
化する不都合がある。
However, in the conventional porous Cr plating, a concave portion exists only on the surface, and a concave portion effective for improving the sliding characteristics does not exist in the plating layer. Therefore,
When the sliding surface is worn, the concave portion disappears, and there is a disadvantage that the seizure resistance is deteriorated.

【0007】本発明の課題は、摺動面の摩耗が進行して
も耐焼き付き性、耐摩耗性を良好に維持できる硬質Cr
めっき層を有している摺動部材を提供することである。
An object of the present invention is to provide a hard Cr which can maintain good seizure resistance and abrasion resistance even when the wear of the sliding surface progresses.
An object of the present invention is to provide a sliding member having a plating layer.

【0008】[0008]

【課題を解決するための手段】本発明は、摺動面に硬質
Crめっき層を有し、この硬質Crめっき層の表面に微
細な凹部が形成されている摺動部材において、厚さ方向
に独立している微細な空洞が前記硬質Crめっき層の内
部に分布して形成されていることを特徴とする。
SUMMARY OF THE INVENTION The present invention relates to a sliding member having a hard Cr plating layer on a sliding surface and a fine recess formed on the surface of the hard Cr plating layer. Independent fine cavities are formed so as to be distributed inside the hard Cr plating layer.

【0009】前記硬質Crめっき層の断面における空洞
面積比率(空洞面積比率は断面の面積に対するその断面
における空洞の総面積の比率をいう。)は、耐焼き付き
性および耐摩耗性の点から5〜30%であるのが望まし
く、上記範囲において、必要とされる摺動特性に応じて
選択するとよい。空洞面積比率が大きいと耐摩耗性、耐
焼き付き性が低下し、小さいと耐焼き付き性が低下す
る。シリンダライナの場合、より好ましい空洞面積比率
の範囲は10〜20%である。
The ratio of the cavity area in the cross section of the hard Cr plating layer (the ratio of the cavity area refers to the ratio of the total area of the cavity in the cross section to the area of the cross section) is 5 to 5 from the viewpoint of seizure resistance and wear resistance. It is desirable to be 30%, and in the above range, it is good to select according to the required sliding characteristics. If the ratio of the cavity area is large, the wear resistance and the seizure resistance decrease, and if it is small, the seizure resistance decreases. In the case of a cylinder liner, a more preferable range of the cavity area ratio is 10 to 20%.

【0010】前記硬質Crめっき層との母材の境界面
は、振幅5〜30μm、ピッチ20〜100μmの表面
粗さを有しているのが望ましい。この表面粗さは旋削加
工等で実現できる。表面粗さのピッチが小さすぎると、
1つのうねりの中に空洞が複数存在しなくなり、空洞が
厚さ方向に平均化して分布しなくなる。同様に、表面粗
さの振幅が小さすぎても、平均化の効果が生じない。ま
た、めっき面はめっきの平滑化作用により母材面よりも
滑らかになる傾向がある。この作用により、母材面の振
幅の大きさが5μm未満あるいはピッチの大きさが20
μm未満であると、最終めっき面が平滑化し、図3
(a)に近似したものとなるので好ましくない。同様
に、母材面の振幅の大きさが30μmを越えると、最終
めっき面の研磨加工代が増大する不利があり、ピッチの
大きさが100μmを越えると、摺動面に局部的に図3
(a)に近似する部分が生じるので好ましくない。以上
から上記範囲が望ましい。
The interface between the hard Cr plating layer and the base material preferably has an amplitude of 5 to 30 μm and a pitch of 20 to 100 μm. This surface roughness can be realized by turning or the like. If the pitch of the surface roughness is too small,
A plurality of cavities does not exist in one undulation, and the cavities are not distributed evenly in the thickness direction. Similarly, if the amplitude of the surface roughness is too small, the averaging effect does not occur. Also, the plated surface tends to be smoother than the base material surface due to the smoothing action of the plating. By this action, the amplitude of the base material surface is less than 5 μm or the pitch is less than 20 μm.
If it is less than μm, the final plating surface is smoothed, and FIG.
This is not preferable because it becomes similar to (a). Similarly, if the amplitude of the base material surface exceeds 30 μm, there is a disadvantage in that the polishing allowance for the final plating surface increases, and if the pitch size exceeds 100 μm, the sliding surface is locally formed on the sliding surface.
This is not preferable because a portion similar to FIG. From the above, the above range is desirable.

【0011】上記の摺動部材は、フッ素イオンを含むC
rめっき浴を用いて、硬質Crめっき工程とエッチング
工程とを繰り返し行い、めっきを積層することによって
製造できる。フッ素イオンを含むCrめっき浴によっ
て、硬質Crめっきの上に更に硬質Crめっきを施す
と、めっき層間に優れた密着性を得ることができる。
The above-mentioned sliding member is made of C containing fluorine ions.
It can be manufactured by repeatedly performing a hard Cr plating step and an etching step using an r plating bath, and laminating the plating. When a hard Cr plating is further applied on the hard Cr plating by a Cr plating bath containing fluorine ions, excellent adhesion between the plating layers can be obtained.

【0012】本発明の摺動部材は上記のように形成され
ているので、摺動面に形成されている微細な凹部が潤滑
油溜まりとして機能するため、使用初期において耐焼き
付き性が高い。摺動表面が摩耗すると、硬質Crめっき
層の内部に分布する空洞が新たに摺動表面に露出して凹
部となるため、常に適量の潤滑油を摺動面に保持でき
る。従って、摩耗が進行しても耐焼き付き性、耐摩耗性
を良好に維持できる。また、硬質Crめっき層の内部に
分布する空洞は厚さ方向に独立しているので、硬質Cr
めっき層の破壊脱落が抑制される。
Since the sliding member of the present invention is formed as described above, the fine concave portion formed on the sliding surface functions as a lubricating oil reservoir, and therefore has high seizure resistance in the early stage of use. When the sliding surface is worn, a cavity distributed inside the hard Cr plating layer is newly exposed on the sliding surface and becomes a concave portion, so that an appropriate amount of lubricating oil can always be held on the sliding surface. Therefore, even if abrasion progresses, seizure resistance and abrasion resistance can be favorably maintained. Further, since the cavities distributed inside the hard Cr plating layer are independent in the thickness direction, the hard Cr
Destruction and falling off of the plating layer are suppressed.

【0013】なお、摺動面に対して垂直な方向から見た
空洞の開口幅は、平均値で2〜8μmとするのが、強度
上の面から望ましい。これは、従来のポーラスCrめっ
きの凹部の開口幅の平均値と比較すると、約1/2であ
る。
The opening width of the cavity viewed from the direction perpendicular to the sliding surface is preferably 2 to 8 μm on average from the viewpoint of strength. This is about 2 as compared with the average value of the opening width of the concave portion of the conventional porous Cr plating.

【0014】図3は、母材の表面を所定の表面粗さを有
している凹凸面とするのが良い理由を説明するための模
式図である。
FIG. 3 is a schematic diagram for explaining the reason why the surface of the base material is preferably made to have an uneven surface having a predetermined surface roughness.

【0015】図3(a)は母材の表面が平坦面に形成さ
れている場合で、硬質Crめっき工程とエッチング工程
を3回繰り返して行った場合を示している。
FIG. 3A shows a case where the surface of the base material is formed to be a flat surface and a case where the hard Cr plating step and the etching step are repeated three times.

【0016】最初の硬質Crめっき工程とエッチング工
程で形成された硬質Crめっき層はその表面に網目状に
延びている微細な凹部を有する。この凹部は断面が略V
字状をなしており、2回目の硬質Crめっき工程とエッ
チング工程によって積層される硬質Crめっき層で覆わ
れ、空洞5となる。同様にして、3回目の硬質Crめっ
き工程とエッチング工程によって、二層目の硬質Crめ
っき層の表面の凹部も覆われて、空洞5となる。このよ
うにして、硬質Crめっき層2は、その表面に網目状に
延びている微細な凹部4を有し、内部には網目状に延び
ている微細な空洞5が厚さ方向に独立分布して形成され
る。すなわち、二層目の硬質Crめっき層に形成された
空洞5と三層目の硬質Crめっき層に形成された空洞5
は厚さ方向に独立しており、それぞれ母材表面と平行な
平面内を網目状に延びて形成されている。
The hard Cr plating layer formed in the first hard Cr plating step and the etching step has fine concave portions extending in a mesh on the surface. This recess has a cross section of approximately V
It is shaped like a letter, and is covered with a hard Cr plating layer that is laminated by a second hard Cr plating step and an etching step to form a cavity 5. Similarly, the recesses on the surface of the second hard Cr plating layer are also covered by the third hard Cr plating step and the etching step, and the cavity 5 is formed. In this way, the hard Cr plating layer 2 has fine concave portions 4 extending in a mesh on its surface, and fine cavities 5 extending in a mesh form are distributed independently in the thickness direction inside. Formed. That is, the cavity 5 formed in the second hard Cr plating layer and the cavity 5 formed in the third hard Cr plating layer
Are independent in the thickness direction, and are formed so as to extend in a mesh shape on a plane parallel to the surface of the base material.

【0017】従って、表面が摩耗していくと、図に示す
a−a線、b−b線、c−c線の位置にいくに従って、
表面に露出する凹部の開口幅が次第に小さくなり、耐焼
き付き性を一定に維持できない。
Therefore, as the surface wears, as it goes to the positions of the lines aa, bb, and cc shown in FIG.
The width of the opening of the concave portion exposed on the surface gradually decreases, and the seizure resistance cannot be maintained at a constant level.

【0018】これに対して、図3(b)は、母材の表面
を微細な凹凸形状を有している凹凸面とし、硬質Crめ
っき工程とエッチング工程を3回繰り返して行った場合
を示している。硬質Crめっき層2は、その表面に網目
状に延びている微細な凹部4を有し、内部には母材表面
の凹凸面に沿って網目状に延びており厚さ方向に独立し
て分布している微細な空洞5を有している。
On the other hand, FIG. 3 (b) shows a case where the surface of the base material is made to be an irregular surface having fine irregularities, and the hard Cr plating step and the etching step are repeated three times. ing. The hard Cr plating layer 2 has fine recesses 4 extending in a mesh on its surface, and extends in a mesh along the uneven surface of the base material surface, and is distributed independently in the thickness direction. It has a fine cavity 5 which is formed.

【0019】母材表面が微細な凹凸面に形成されている
場合は、網目状に延びている空洞5が母材表面の凹凸面
に沿って形成されるため、平面内に形成されず、厚さ方
向に波状に形成される。すなわち、二層目の硬質Crめ
っき層に形成された空洞5と三層目の硬質Crめっき層
に形成された空洞5は厚さ方向に独立しており、それぞ
れ母材表面の凹凸面に沿って網目状に延びて、厚さ方向
に波状に形成されている。
When the surface of the base material is formed on a fine uneven surface, the cavities 5 extending in a mesh form are formed along the uneven surface of the surface of the base material. It is formed in a wavy shape in the vertical direction. That is, the cavities 5 formed in the second hard Cr plating layer and the cavities 5 formed in the third hard Cr plating layer are independent in the thickness direction. It extends in a mesh shape and is formed in a wavy shape in the thickness direction.

【0020】そのため、表面が図に示すa−a線、b−
b線、c−c線の位置へ順次摩耗した場合においても、
表面に露出する凹部の開口幅と密度は厚さ方向の各位置
において平均化し、表面に露出する凹部はチャンネルタ
イプ、ピットタイプ、インターメディエイトタイプが混
在したものになる。以上より、使用中の耐焼き付き性を
一定に維持することができる。
Therefore, the surface is shown by the line aa, b-
Even in the case of abrasion to the positions of the b-line and the cc-line sequentially,
The opening width and density of the concave portion exposed on the surface are averaged at each position in the thickness direction, and the concave portion exposed on the surface is a mixture of a channel type, a pit type, and an intermediate type. As described above, the seizure resistance during use can be kept constant.

【0021】[0021]

【発明の実施の形態】図1は本発明の一実施形態を示し
ており、シリンダライナ1の内周面に硬質Crめっき層
2が形成されている。シリンダライナ1の内周面の母材
表面は微細な凹凸形状を有している凹凸面3に形成され
ており、この凹凸面3上に、前記硬質Crめっき層2が
形成されている。硬質Crめっき層2は、その表面に網
目状に延びている微細な凹部4を有しているとともに、
内部には母材表面の凹凸面3に沿って網目状に延びてお
り厚さ方向に独立して分布している微細な空洞5を有し
ている。
FIG. 1 shows an embodiment of the present invention. A hard Cr plating layer 2 is formed on an inner peripheral surface of a cylinder liner 1. The base material surface on the inner peripheral surface of the cylinder liner 1 is formed on an uneven surface 3 having fine unevenness, and the hard Cr plating layer 2 is formed on the uneven surface 3. The hard Cr plating layer 2 has fine recesses 4 extending in a mesh on the surface thereof,
The inside has fine cavities 5 extending in a mesh shape along the uneven surface 3 of the base material surface and distributed independently in the thickness direction.

【0022】前記凹凸面3は振幅5〜30μm、ピッチ
20〜100μmの表面粗さを有している面であり、前
記硬質Crめっき層2の断面における空洞面積比率は1
0〜20%である。
The uneven surface 3 is a surface having an amplitude of 5 to 30 μm and a pitch of 20 to 100 μm, and has a cavity area ratio of 1 in the cross section of the hard Cr plating layer 2.
0 to 20%.

【0023】次に、上記シリンダライナ1の内周面にお
ける硬質Crめっき層2の形成方法について説明する。
Next, a method of forming the hard Cr plating layer 2 on the inner peripheral surface of the cylinder liner 1 will be described.

【0024】(1)凹凸面の形成 シリンダライナ1の内周面の母材表面は、旋削加工によ
って、所定の表面粗さを有する凹凸面に形成される。
(1) Formation of Uneven Surface The base material surface of the inner peripheral surface of the cylinder liner 1 is formed into an uneven surface having a predetermined surface roughness by turning.

【0025】(2)めっき処理 所定の表面粗さを有する凹凸面とされた内周面の母材表
面上に、硬質Crめっき→(硬質Crめっき工程−エッ
チング工程)の繰り返し→研磨加工を行った。
(2) Plating treatment Hard Cr plating → (hard Cr plating step—etching step) is repeated → polishing on the inner peripheral surface of the base material surface having an irregular surface having a predetermined surface roughness. Was.

【0026】硬質Crめっきのめっき浴組成、および硬
質Crめっき工程とエッチング工程の各条件を下記に示
す。なお、最初の硬質Crめっきは、ストライクめっき
条件で、通常3〜10分であり、他の条件は下記に示す
条件と同じである。
The plating bath composition of the hard Cr plating and the conditions of the hard Cr plating step and the etching step are shown below. The first hard Cr plating is performed under strike plating conditions, usually for 3 to 10 minutes, and the other conditions are the same as those described below.

【0027】めっき浴組成 CrO3 250g/l H2 SO4 1g/l H2 SiF6 5g/l 硬質Crめっき工程 電流密度 60A/dm2 めっき浴温 50℃ めっき時間 10分 エッチング工程 電流密度 50A/dm2 めっき浴温 50℃ 時間 60秒Plating bath composition CrO 3 250 g / l H 2 SO 4 1 g / l H 2 SiF 6 5 g / l Hard Cr plating step Current density 60 A / dm 2 Plating bath temperature 50 ° C. Plating time 10 minutes Etching step Current density 50 A / dm 2 Plating bath temperature 50 ° C Time 60 seconds

【0028】上記の条件で、硬質Crめっき工程→エッ
チング工程の1サイクルを行うと、図2(a)に示され
ているように、硬質Crめっき層2Aが内周面の母材表
面上に形成され、硬質Crめっき層2Aの表面には網目
状に延びている微細な凹部4が形成される。この場合、
凹部4は内周面の母材表面の凹凸面3に沿って形成され
るため、平面内に形成されず、厚さ方向に波状に形成さ
れる。
When one cycle of the hard Cr plating process → the etching process is performed under the above conditions, as shown in FIG. 2A, the hard Cr plating layer 2A is formed on the inner peripheral surface of the base material. A fine concave portion 4 is formed on the surface of the hard Cr plating layer 2A and extends in a mesh shape. in this case,
Since the concave portion 4 is formed along the uneven surface 3 of the inner peripheral surface of the base material, the concave portion 4 is not formed in a plane, but is formed in a wave shape in the thickness direction.

【0029】更に、硬質Crめっき工程→エッチング工
程が繰り返して行われると、最初の1サイクルの工程で
形成された硬質Crめっき層2Aの上に更に硬質Crめ
っき層2Bが積層されるため、最初の硬質Crめっき層
2Aに形成された凹部4は二層目の硬質Crめっき層2
Bによって覆われて、空洞5となる。この際凹部4には
硬質Crめっきが部分的に析出するので、空洞5は凹部
4よりも小さくなって最初の硬質Crめっき層2Aに残
留する。二層目の硬質Crめっき層2Bには、最初の硬
質Crめっき層2Aと同様の微細な凹部4が表面に形成
されている。
Further, when the hard Cr plating step → etching step is repeated, the hard Cr plating layer 2B is further laminated on the hard Cr plating layer 2A formed in the first one cycle step. The concave portion 4 formed in the hard Cr plating layer 2A of the second
The cavity 5 is covered by B. At this time, since the hard Cr plating is partially deposited in the concave portion 4, the cavity 5 becomes smaller than the concave portion 4 and remains in the first hard Cr plating layer 2A. On the surface of the second hard Cr plating layer 2B, fine recesses 4 similar to the first hard Cr plating layer 2A are formed.

【0030】以下、硬質Crめっき工程→エッチング工
程が所定回数、繰り返して行われると、内周面の母材表
面上に所定厚さで硬質Crめっき層2が形成される。
Thereafter, when the hard Cr plating step → etching step is repeatedly performed a predetermined number of times, the hard Cr plating layer 2 is formed with a predetermined thickness on the inner peripheral surface of the base material.

【0031】上記の条件で、硬質Crめっき工程→エッ
チング工程の1サイクルを行うと、0.01mm程度の
めっき厚さを得ることができるので、例えば0.15m
mのめっき厚さを得るには、15サイクル繰り返し行え
ばよい。
When one cycle of the hard Cr plating step → the etching step is performed under the above conditions, a plating thickness of about 0.01 mm can be obtained.
In order to obtain a plating thickness of m, 15 cycles may be repeated.

【0032】(1)耐焼き付き性試験(本発明と従来例
との比較) 以下、本発明の摺動部材の耐焼き付き性が、従来の摺動
部材に比べて、摺動面の摩耗によって劣化しないことを
示す耐焼き付き性試験について説明する。
(1) Seizure Resistance Test (Comparison between the Present Invention and Conventional Example) The seizure resistance of the sliding member of the present invention is deteriorated by wear of the sliding surface as compared with the conventional sliding member. A description will be given of a seizure resistance test which indicates that the test is not performed.

【0033】(1)試験片 通常のポーラスCrめっきを施した比較例1,2,3の
試験片と、本発明の硬質Crめっき層を有している実施
例1,2,3,4の試験片を用意した。試験片の母材
は、シリンダライナ用鋳鉄(JIS FC300相当)
である。
(1) Test pieces The test pieces of Comparative Examples 1, 2, and 3 which were subjected to ordinary porous Cr plating and the test pieces of Examples 1, 2, 3, and 4 having the hard Cr plating layer of the present invention. A test piece was prepared. The base material of the test piece is cast iron for cylinder liner (JIS FC300 equivalent)
It is.

【0034】(2)めっき処理 (比較例):比較例1,2,3は硬質Crめっき工程→
エッチング工程→研磨加工工程によって作成した。硬質
Crめっきのめっき浴組成、および硬質Crめっき工程
とエッチング工程の各条件を下記に示す。
(2) Plating treatment (Comparative example): Comparative examples 1, 2 and 3 are hard Cr plating steps →
It was created by an etching process → a polishing process. The plating bath composition of the hard Cr plating and the respective conditions of the hard Cr plating step and the etching step are shown below.

【0035】めっき浴組成 前記本発明の一実施形態で示したCrめっき浴組成と同
じ。 硬質Crめっき工程 前記本発明の一実施形態で示した硬質Crめっき工程の
条件と同じ。ただし、めっき時間が3時間。 エッチング工程 前記本発明の一実施形態で示したエッチング工程の条件
と同じ。
Plating bath composition The same as the Cr plating bath composition shown in the embodiment of the present invention. Hard Cr Plating Step Same conditions as in the hard Cr plating step described in the embodiment of the present invention. However, the plating time was 3 hours. Etching Step Same as the etching step conditions described in the embodiment of the present invention.

【0036】(実施例):前記本発明の一実施形態で説
明した硬質Crめっき層2の形成方法と同じ。空洞面積
比率は15%、母材の表面粗さは振幅8μm、ピッチ3
0μmである。
Example: The same as the method of forming the hard Cr plating layer 2 described in the embodiment of the present invention. The cavity area ratio is 15%, the surface roughness of the base material is 8 μm in amplitude, and the pitch is 3
0 μm.

【0037】(3)試験方法 上記試験片の硬質Crめっき層を表面から種々の研磨代
で研削して、耐焼き付き性試験に供した。
(3) Test Method The hard Cr plating layer of the test piece was ground from the surface with various polishing allowances, and was subjected to a seizure resistance test.

【0038】図4に耐焼き付き性試験に使用した公知の
高面圧焼き付き試験機の概要を示す。上記で説明した試
験片10は、ステータ11により保持され、油圧装置に
より所定荷重Pでロータ12側に押し付けられる。一
方、相手部材たる相手試験片13は、ロータ12により
保持され、ロータ12の回転により回転させられる。
FIG. 4 shows an outline of a known high surface pressure seizure tester used for the seizure resistance test. The test piece 10 described above is held by the stator 11 and pressed against the rotor 12 with a predetermined load P by a hydraulic device. On the other hand, a mating test piece 13 as a mating member is held by the rotor 12 and rotated by the rotation of the rotor 12.

【0039】このような装置において、ステータ11に
形成されている注油孔14から摺動面に所定量の給油を
しながら、相手試験片13を回転させる。一定時間毎に
試験片10に作用させる荷重を段階的に増加させ、試験
片10と相手試験片13との摺動により発生するトルク
をトルクメータで測定し、記録計に記録させる。焼き付
き現象が発生するとトルクが急激に上昇する。したがっ
て、トルクが急激に上昇するときの試験片10に作用す
る荷重を焼き付き荷重とし、この焼き付き荷重の大小で
焼き付き特性の良否を判定する。
In such an apparatus, the opposing test piece 13 is rotated while a predetermined amount of oil is supplied to the sliding surface from the lubrication hole 14 formed in the stator 11. The load applied to the test piece 10 is increased stepwise at regular intervals, and the torque generated by sliding between the test piece 10 and the mating test piece 13 is measured by a torque meter and recorded on a recorder. When the burn-in phenomenon occurs, the torque rises sharply. Therefore, the load acting on the test piece 10 when the torque sharply increases is defined as the seizure load, and the quality of the seizure characteristics is determined based on the magnitude of the seizure load.

【0040】試験条件は次の通りである。 回転速度 8m/s一定 荷重 20kgfより開始 10kgf/minの割合で段階的に増加 潤滑油 軽油 油温 80℃ 相手試験片 ピストンリング用鋳鉄材The test conditions are as follows. Rotational speed 8m / s Constant load Starting from 20kgf Increasing stepwise at a rate of 10kgf / min Lubricating oil Light oil Oil temperature 80 ℃ Test specimen

【0041】(4)試験結果 耐焼き付き性試験で得られた各試験片の焼き付き荷重を
図5に示す。図5に示されているように、比較例は20
μm以上の表面研磨により凹部が消滅して、耐焼き付き
荷重が大幅に低下する。これに対して、実施例は60μ
mの表面研磨を行っても、耐焼き付き性が低下しない。
(4) Test Results FIG. 5 shows the seizure load of each test piece obtained in the seizure resistance test. As shown in FIG.
The concave portion disappears due to the surface polishing of μm or more, and the seizure resistance is greatly reduced. On the other hand, in the example, 60 μm
Even if the surface of m is polished, the seizure resistance does not decrease.

【0042】(2)耐焼き付き性試験(空洞の面積比
率) 次に、硬質Crめっき層の内部に分布する空洞の面積比
率が耐焼き付き性に及ぼす影響について試験を行った。
この試験に供した試験片は、上記(1)耐焼き付き性試
験(本発明と従来例との比較)で説明した実施例の試験
片と同じである。ただし、めっき処理の条件におけるエ
ッチング条件を種々変えることによって、空洞の面積比
率が異なる種々の試験片を作成した。結果を図6に示
す。
(2) Seizure Resistance Test (Area Ratio of Cavity) Next, a test was performed on the effect of the area ratio of cavities distributed inside the hard Cr plating layer on seizure resistance.
The test piece subjected to this test is the same as the test piece of the example described in the above (1) Seizure resistance test (comparison between the present invention and the conventional example). However, various test pieces having different void area ratios were prepared by changing the etching conditions in the plating process. FIG. 6 shows the results.

【0043】図6に示されているように、硬質Crめっ
き層の断面における空洞面積比率は5〜30%の範囲で
耐焼き付き性が良好であることがわかる。より好ましい
範囲は10〜27%である。
As shown in FIG. 6, it can be seen that the seizure resistance is good when the cavity area ratio in the cross section of the hard Cr plating layer is in the range of 5 to 30%. A more preferred range is 10 to 27%.

【0044】(3)耐焼き付き性試験(母材の表面粗
さ) 次に、母材の表面粗さが耐焼き付き性に及ぼす影響につ
いて試験を行った。この試験に供した試験片は、上記
(1)耐焼き付き性試験(本発明と従来例との比較)で
説明した実施例の試験片と同じである。ただし、母材表
面の表面粗さを種々変えることによって、母材の表面粗
さが異なる種々の試験片を作成した。結果を図7に示
す。
(3) Seizure Resistance Test (Surface Roughness of Base Material) Next, the effect of the surface roughness of the base material on the seizure resistance was tested. The test piece subjected to this test is the same as the test piece of the example described in the above (1) Seizure resistance test (comparison between the present invention and the conventional example). However, various test pieces having different surface roughnesses of the base material were prepared by variously changing the surface roughness of the base material surface. FIG. 7 shows the results.

【0045】図7に示されているように、硬質Crめっ
き前の母材表面の表面粗さを振幅H(谷底から山頂まで
の高さ)が5μm以上、ピッチP(山頂と山頂との距
離)が20μm以上に調整したものは、耐焼き付き性が
良好であることがわかる。
As shown in FIG. 7, the surface roughness of the base material surface before hard Cr plating was adjusted so that the amplitude H (the height from the valley bottom to the peak) was 5 μm or more, and the pitch P (the distance between the peaks and the peak). ) Is adjusted to 20 μm or more, the seizure resistance is good.

【0046】なお、本発明において、硬質Crめっき層
に空洞を安定して生成させるために、粒径0.5〜10
μmの非導電性粉末を10〜50g/l、めっき液に混
合すると、エッチングによって生じた凹部に粉末が沈着
し、めっき工程で凹部にCrめっきが析出してしまうこ
とを防止することができる。非導電性粉末としては、例
えばAl2 3 ,SiC,Si3 4 等を使用すること
ができる。
In the present invention, in order to stably form cavities in the hard Cr plating layer, the particle diameter is 0.5 to 10%.
When 10 to 50 g / l of a non-conductive powder having a thickness of 10 μm is mixed with a plating solution, it is possible to prevent the powder from depositing in the concave portions generated by etching and depositing Cr plating in the concave portions in the plating step. As the non-conductive powder, for example, Al 2 O 3 , SiC, Si 3 N 4 or the like can be used.

【0047】[0047]

【発明の効果】以上説明したように、本発明の摺動部材
は、使用中に摩耗しても耐焼き付き性、耐摩耗性を良好
に維持できるので、摺動部材の長寿命化を図ることがで
き、また、この摺動部材と組み合わせる相手材を選択す
る自由度が拡大する。
As described above, the sliding member of the present invention can maintain good seizure resistance and abrasion resistance even when worn during use, so that the life of the sliding member can be extended. In addition, the degree of freedom in selecting a partner material to be combined with the sliding member is increased.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施形態を示しており、(a)はシ
リンダライナを示す縦断面図、(b)は硬質Crめっき
層の一部を内周面と垂直な方向から見た拡大図、(c)
は内周面の一部の拡大断面図である。
1A and 1B show an embodiment of the present invention, in which FIG. 1A is a longitudinal sectional view showing a cylinder liner, and FIG. 1B is an enlarged view of a part of a hard Cr plating layer viewed from a direction perpendicular to an inner peripheral surface. Figure, (c)
Is an enlarged sectional view of a part of the inner peripheral surface.

【図2】上記シリンダライナに形成する硬質Crめっき
層の製造工程を説明する模式図であり、(a)は硬質C
rめっき工程→エッチング工程の1サイクル後を示し、
(b)は同工程の2サイクル後を示す。
FIGS. 2A and 2B are schematic diagrams illustrating a manufacturing process of a hard Cr plating layer formed on the cylinder liner, wherein FIG.
r shows one cycle after the plating process → the etching process,
(B) shows two cycles after the same step.

【図3】母材の表面を所定の表面粗さを有している凹凸
面とするのが良い理由を説明するための模式図であり、
(a)は母材の表面が平坦面に形成されている場合、
(b)は母材の表面が微細な凹凸形状を有している凹凸
面に形成されている場合を示す。
FIG. 3 is a schematic diagram for explaining the reason why the surface of the base material is preferably an uneven surface having a predetermined surface roughness;
(A) is when the surface of the base material is formed as a flat surface,
(B) shows a case where the surface of the base material is formed on an uneven surface having fine unevenness.

【図4】高面圧焼き付き試験機の説明図である。FIG. 4 is an explanatory view of a high surface pressure seizure tester.

【図5】本発明と従来例の耐焼き付き性の試験結果を示
すグラフである。
FIG. 5 is a graph showing test results of seizure resistance of the present invention and a conventional example.

【図6】空洞の面積比率を変えた場合の耐焼き付き性の
試験結果を示すグラフである。
FIG. 6 is a graph showing test results of image sticking resistance when the area ratio of the cavity is changed.

【図7】(a)は母材の表面粗さを変えた場合の耐焼き
付き性の試験結果を示すグラフであり、(b)は表面粗
さの振幅を示す説明図、(c)は表面粗さのピッチを示
す説明図である。
7A is a graph showing a test result of seizure resistance when the surface roughness of the base material is changed, FIG. 7B is an explanatory diagram showing the amplitude of the surface roughness, and FIG. It is explanatory drawing which shows the pitch of roughness.

【符号の説明】[Explanation of symbols]

1 シリンダライナ 2 硬質Crめっき層 3 凹凸面 4 凹部 5 空洞 10 試験片 11 ステータ 12 ロータ 13 相手試験片 14 注油孔 DESCRIPTION OF SYMBOLS 1 Cylinder liner 2 Hard Cr plating layer 3 Uneven surface 4 Concave portion 5 Cavity 10 Test piece 11 Stator 12 Rotor 13 Opposite test piece 14 Oil hole

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 摺動面に硬質Crめっき層を有し、この
硬質Crめっき層の表面に微細な凹部が形成されている
摺動部材において、 厚さ方向に独立している微細な空洞が前記硬質Crめっ
き層の内部に分布して形成されていることを特徴とする
摺動部材。
1. A sliding member having a hard Cr plating layer on a sliding surface and a fine recess formed on the surface of the hard Cr plating layer, wherein a fine cavity independent in a thickness direction is formed. A sliding member, which is formed so as to be distributed inside the hard Cr plating layer.
【請求項2】 前記硬質Crめっき層の断面における空
洞面積比率が、5〜30%であることを特徴とする請求
項1記載の摺動部材。
2. The sliding member according to claim 1, wherein a cavity area ratio in a cross section of the hard Cr plating layer is 5 to 30%.
【請求項3】 前記硬質Crめっき層との母材の境界面
が、振幅5〜30μm、ピッチ20〜100μmの表面
粗さを有していることを特徴とする請求項1または2記
載の摺動部材。
3. The slide according to claim 1, wherein a boundary surface of the base material with the hard Cr plating layer has a surface roughness of an amplitude of 5 to 30 μm and a pitch of 20 to 100 μm. Moving member.
【請求項4】 母材の表面粗さを振幅5〜30μm、ピ
ッチ20〜100μmとし、その母材の表面上に、フッ
素イオンを含むCrめっき浴を用いて、硬質Crめっき
工程とエッチング工程とを繰り返し行う工程を有してい
ることを特徴とする摺動部材の製造方法。
4. A hard Cr plating step and an etching step using a Cr plating bath containing fluorine ions on the surface of the base material with an amplitude of 5 to 30 μm and a pitch of 20 to 100 μm. A manufacturing method of a sliding member, characterized by comprising a step of repeatedly performing:
JP22589096A 1996-08-08 1996-08-08 Sliding member Expired - Fee Related JP3578873B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22589096A JP3578873B2 (en) 1996-08-08 1996-08-08 Sliding member

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22589096A JP3578873B2 (en) 1996-08-08 1996-08-08 Sliding member

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2001391238A Division JP3650062B2 (en) 2001-12-25 2001-12-25 Manufacturing method of sliding member
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Publications (2)

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JPH1053881A true JPH1053881A (en) 1998-02-24
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Family

ID=16836484

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6296951B1 (en) 1998-06-26 2001-10-02 Nippon Piston Ring Co., Ltd. Laminated chromium plating layers having superior wear resistance and fatigue strength
EP1253220A1 (en) * 1999-12-27 2002-10-30 Nippon Piston Ring Co., Ltd. Sliding member
US6596410B2 (en) * 2000-09-29 2003-07-22 Nippon Piston Ring Co., Ltd. Chrome-plated sliding member and manufacturing method thereof
WO2005098095A1 (en) * 2004-04-06 2005-10-20 Iox Co., Ltd. Method for preparing multi-component alloy onto substrate by molten salt electrolysis
US7318963B2 (en) 2004-01-30 2008-01-15 Kabushiki Kaisha Riken Composite chromium plating film and sliding member having the same and method for manufacture thereof
JP5673682B2 (en) * 2010-08-31 2015-02-18 株式会社村田製作所 Porous electroless plated film, electrode, current collector, electrochemical sensor, power storage device and sliding member using the same, and method for producing porous electroless plated film
CN110318053A (en) * 2018-03-28 2019-10-11 丰田自动车东日本株式会社 Sliding component and its manufacturing method

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6296951B1 (en) 1998-06-26 2001-10-02 Nippon Piston Ring Co., Ltd. Laminated chromium plating layers having superior wear resistance and fatigue strength
EP1253220A1 (en) * 1999-12-27 2002-10-30 Nippon Piston Ring Co., Ltd. Sliding member
EP1253220A4 (en) * 1999-12-27 2006-03-22 Nippon Piston Ring Co Ltd Sliding member
US6596410B2 (en) * 2000-09-29 2003-07-22 Nippon Piston Ring Co., Ltd. Chrome-plated sliding member and manufacturing method thereof
DE10147659C2 (en) * 2000-09-29 2003-09-25 Nippon Piston Ring Co Ltd Sliding element with electrolytically applied hard chrome plating, its use and process for its manufacture
US7318963B2 (en) 2004-01-30 2008-01-15 Kabushiki Kaisha Riken Composite chromium plating film and sliding member having the same and method for manufacture thereof
WO2005098095A1 (en) * 2004-04-06 2005-10-20 Iox Co., Ltd. Method for preparing multi-component alloy onto substrate by molten salt electrolysis
JP5673682B2 (en) * 2010-08-31 2015-02-18 株式会社村田製作所 Porous electroless plated film, electrode, current collector, electrochemical sensor, power storage device and sliding member using the same, and method for producing porous electroless plated film
CN110318053A (en) * 2018-03-28 2019-10-11 丰田自动车东日本株式会社 Sliding component and its manufacturing method

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