JPH1053858A - Porous metallic sheet and its production - Google Patents
Porous metallic sheet and its productionInfo
- Publication number
- JPH1053858A JPH1053858A JP21175496A JP21175496A JPH1053858A JP H1053858 A JPH1053858 A JP H1053858A JP 21175496 A JP21175496 A JP 21175496A JP 21175496 A JP21175496 A JP 21175496A JP H1053858 A JPH1053858 A JP H1053858A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- photoresist
- metal
- projections
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、各種合成樹脂成型
材料、半田用金属材料等として用いられている真球状の
微粒子の分級等に用いる多孔金属板及びその製造方法に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a porous metal plate used for classifying spherical fine particles used as various synthetic resin molding materials, metal materials for soldering, and the like, and a method for producing the same.
【0002】[0002]
【従来の技術及び発明が解決しようとする課題】真球状
の微粒子(フロービーズ)は、通常ポリエチレン、又は
エチレン・アクリル酸共重合体樹脂等を原料として形成
され、流動性、分散性に優れ、塗料の艶消し剤,接着
剤,インキの改質剤,ゴムの離型剤又は化粧品素材等に
利用されている。特に表面をイオンスパッタ、蒸着、メ
ッキ等の手段によりCu又はNi、またはこれらの合
金、またはこれら以外の合金等の金属でコーティング処
理して表面処理をすると、比重の軽い金属粉としての取
り扱いが可能となり、導電材料、又はエレクトロニクス
材料等の添加剤にも広く利用されている。2. Description of the Related Art True spherical fine particles (flow beads) are usually formed from polyethylene or ethylene-acrylic acid copolymer resin as raw materials, and have excellent fluidity and dispersibility. It is used as a matting agent for paints, adhesives, ink modifiers, rubber release agents or cosmetic materials. In particular, if the surface is coated with a metal such as Cu or Ni, or their alloys, or other alloys by means of ion sputtering, vapor deposition, plating, etc., and then surface-treated, it can be handled as a metal powder having a low specific gravity. It is widely used as an additive for a conductive material or an electronic material.
【0003】ところでこのような微粒子は、その用途に
応じて数十μから数百μまで各種の粒径のものが製造さ
れているが、例えば樹脂成型材料、半田用金属材料に用
いる場合には成型条件、半田付け条件の安定を図るため
に粒径を均一に揃える必要があり、分級板等を用いたふ
るい分けは欠かせないものとなっている。しかし従来の
分級板は、金網によって形成されているため、ふるい目
の面積、即ちオープニングを均一化するのが難しく、正
確な分級が出来なかった。[0003] By the way, such fine particles are produced in various particle sizes from several tens to several hundreds of microns depending on the application. For example, when they are used for a resin molding material or a metal material for soldering. In order to stabilize molding conditions and soldering conditions, it is necessary to make the particle size uniform, and sieving using a classifying plate or the like is indispensable. However, since the conventional classification plate is formed by a wire mesh, it is difficult to make the area of the sieve, that is, the opening, uniform, and accurate classification cannot be performed.
【0004】また、ふるい目は金網を構成する線材同士
の組み合わせにより形成されているため、その形状が四
角形であって、四隅に段差を伴う角部が形成されるた
め、ふるい目の部分に微粒子によるブリッジが形成され
易く、目詰まりが生じ、迅速、かつ正確な分級が難しい
という問題があった。更に、金網を構成する金属線の材
料は鉄系、Cu系等であるため、例えば表面にPt等を
金属コーティング処理された微粒子の場合、磨耗したこ
れら鉄系,Cu系の金属成分が微粒子の表面に付着し、
微粒子が汚染されるという問題もあった。Further, since the sieve is formed by a combination of wires constituting a wire mesh, the shape is quadrangular, and corners with steps are formed at the four corners. Therefore, there is a problem that bridges are easily formed, clogging occurs, and quick and accurate classification is difficult. Further, since the material of the metal wire forming the wire net is iron-based, Cu-based, or the like, for example, in the case of fine particles having a surface coated with Pt or the like, the worn iron-based or Cu-based metal components are fine particles. Adhere to the surface,
There was also a problem that the fine particles were contaminated.
【0005】本発明は斯かる事情に鑑みなされたもので
あって、その目的とするところは、ふるい目のオープニ
ングを均一化し、分級精度を格段に向上させ得、また目
詰まりが生じ難く、円滑な分級を可能とした多孔金属板
及びその製造方法を提供するにある。The present invention has been made in view of the above circumstances, and has as its object to uniformize the opening of the sieve, to improve the classification accuracy remarkably, hardly cause clogging, and to achieve smoothness. It is an object of the present invention to provide a perforated metal plate and a method for producing the same, which can perform an appropriate classification.
【0006】[0006]
【課題を解決するための手段】第1の発明に係る多孔金
属板は、多数の突起を形成した基板の表面に、前記突起
の高さ以下の厚さの金属層を形成し、前記基板及び突起
を除去してなることを特徴とする。According to a first aspect of the present invention, there is provided a porous metal plate having a metal layer having a thickness equal to or less than the height of the projections on a surface of the substrate on which a large number of projections are formed. The projection is removed.
【0007】第2の発明に係る多孔金属板の製造方法
は、基板表面にフォトレジストの所要厚み層を形成し、
その表面に予め作成した所望形状のパターンのフォトマ
スクを重ねて露光,現像し、前記基板表面に予め定めた
孔径に対応した直径を有するフォトレジストの多数の突
起を形成し、前記基板表面に蒸着、メッキ又はスパッタ
リングを施して、前記突起の高さ以下の厚さの金属層を
形成した後、前記基板及び突起を溶解除去することを特
徴とする。According to a second aspect of the present invention, there is provided a method for manufacturing a perforated metal plate, comprising forming a required thickness layer of a photoresist on a substrate surface,
A photomask having a pattern of a desired shape prepared in advance is superposed on the surface, exposed and developed, and a number of protrusions of photoresist having a diameter corresponding to a predetermined hole diameter are formed on the surface of the substrate, and vapor-deposited on the surface of the substrate. Forming a metal layer having a thickness equal to or less than the height of the projection by plating or sputtering, and then dissolving and removing the substrate and the projection.
【0008】第1,第2の発明にあっては、フォトリソ
グラフィ技術を利用することで、孔の面積(広さ)の均
一化,微小化が容易となり、また孔を平坦面に成形出来
るため、ブリッジの発生も少なく正確な分級が可能とな
る。In the first and second aspects of the present invention, the use of the photolithography technique makes it easy to make the area (width) of the holes uniform and small, and to form the holes into a flat surface. Accurate classification is possible with less occurrence of bridges.
【0009】[0009]
【発明の実施の形態】以下本発明をその実施の形態を示
す図面に基づき、具体的に説明する。図1は、本発明に
係る分級板の部分拡大図であり、図中1は分級板、2は
分級板1を構成する金属板、3は金属板2に形成された
ふるい目である。金属板2は、微粒子の表面にコーティ
ングした金属と同じ種類の金属、例えばNi,Cu,A
l又はこれらの合金、又はこれらと他の金属との合金製
であって、主としてメッキ層、又はスパッタ層として一
様な厚さに形成され、これに多数のふるい目3が形成さ
れている。ふるい目3は、その直径を分級すべき微粒子
の直径と略同じ、又はそれよりも若干大きい均一な直径
としてある。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be specifically described below with reference to the drawings showing the embodiments. FIG. 1 is a partially enlarged view of a classifier according to the present invention, in which 1 is a classifier, 2 is a metal plate constituting the classifier 1, and 3 is a sieve formed on the metal plate 2. The metal plate 2 is made of the same kind of metal as the metal coated on the surface of the fine particles, for example, Ni, Cu, A
1 or an alloy thereof or an alloy of these and other metals, and is formed to have a uniform thickness mainly as a plating layer or a sputtered layer, on which a large number of sieves 3 are formed. The sieve 3 has a uniform diameter substantially the same as or slightly larger than the diameter of the fine particles to be classified.
【0010】なお、金属板2はその下地の材料(金属ま
たは合成樹脂)の表面に微粒子の表面にコーティングし
た金属と同種の金属、即ちNi,Cu,Al又はこれら
の合金、又はこれら以外の合金、又はPt、Au、P
d、Rh等の白金属元素を単独又はこれらの合金をメッ
キしたものを用いてもよい。ふるい目3は、通常金属板
2の全面に均等な密度で分散形成した場合を示したが、
何らこれに限るものではなく、例えば所定数づつまとめ
て複数の島状に形成してもよい。またふるい目3の形状
は真円形にした場合を示したが、最大直径部分が微粒子
のそれと略同じ又はこれよりも若干大きい条件を満たす
限り、図2(a)に示す如く四角形、又は図2(b)に
示す如き六角形等の多角形、又は楕円形,正方形,長方
形に成形してもよい。The metal plate 2 is made of the same kind of metal as the metal coated on the surface of the fine particles on the surface of the underlying material (metal or synthetic resin), ie, Ni, Cu, Al or an alloy thereof, or an alloy other than these. , Or Pt, Au, P
A white metal element such as d or Rh may be used alone or an alloy thereof may be plated. The sieve 3 is a case where the sieve 3 is usually formed with a uniform density over the entire surface of the metal plate 2,
The present invention is not limited to this. For example, a predetermined number may be collectively formed into a plurality of islands. Also, the shape of the sieve 3 is shown as a perfect circle, but as long as the maximum diameter portion satisfies a condition substantially the same as or slightly larger than that of the fine particles, a square as shown in FIG. It may be formed into a polygon such as a hexagon as shown in (b), or an ellipse, square or rectangle.
【0011】次にこのような分級板1のフォトリソグラ
フィ技術を利用した製造方法について説明する。図3は
分級板1の主要製造工程を断面で示す工程説明図であ
る。先ず、図3(a)に示す如きAl、Cu、又は合金
等の金属製、又はガラス製、又は合成樹脂製の平坦な基
板10を用意し、その表面に図3(b)に示す如く露光
によって硬化するネガ型又は反対のポジ型のフォトレジ
スト11を積層形成する。Next, a method of manufacturing such a classifying plate 1 utilizing the photolithography technique will be described. FIG. 3 is a process explanatory view showing a main manufacturing process of the classifying plate 1 in a cross section. First, a flat substrate 10 made of metal such as Al, Cu, or an alloy as shown in FIG. 3A, glass, or synthetic resin is prepared, and its surface is exposed as shown in FIG. 3B. A negative type or opposite positive type photoresist 11 is formed by lamination.
【0012】基板10として帯状の金属製の箔、又は合
成樹脂製の帯状のシートを用い、これにフォトレジスト
11例えば、ロールコータ等を用いてコーディングす
る。フォトレジスト11の塗布膜の厚さは、図1に示す
金属板2の厚さに相当する厚さに設定する。フォトレジ
スト11の材料としては、例えば感光性ポリイミド等の
ネガ型、ポジ型のいずれを用いてもよい。A band-like metal foil or a synthetic resin band-like sheet is used as the substrate 10, and the photoresist 11 is coded using a roll coater or the like. The thickness of the coating film of the photoresist 11 is set to a thickness corresponding to the thickness of the metal plate 2 shown in FIG. As a material of the photoresist 11, for example, either a negative type such as photosensitive polyimide or a positive type may be used.
【0013】更に、このフォトレジスト(例えばネガ型
のフォトレジスト)11の表面に図3(c)に示す如
く、多数の孔12aを写真製版で形成したフォトマスク
12を重ね合せた後、フォトマスク12の表面側から紫
外線を照射し、露光、現像する。図4は、現像後の基板
10表面の部分拡大斜視図であり、フォトレジスト11
における紫外線照射部分は硬化するから、現像処理を施
すと紫外線の非照射部分が除去され、基板10の表面に
多数の硬化したフォトレジスト11による突起11aが
形成される。Further, as shown in FIG. 3C, a photomask 12 having a large number of holes 12a formed by photolithography is superimposed on the surface of the photoresist (for example, a negative photoresist). 12 is irradiated with ultraviolet rays from the front side, and is exposed and developed. FIG. 4 is a partially enlarged perspective view of the surface of the substrate 10 after development,
Since the UV-irradiated portion is hardened, the non-irradiated portion of the UV-ray is removed by performing the developing process, and a large number of protrusions 11a of the cured photoresist 11 are formed on the surface of the substrate 10.
【0014】次に図3(e)に示す如く、基板10の表
面にNi、Cu、Al又はこれらの合金、又はこれらと
他の合金をメッキ、スパッタ又は蒸着等の手段にて略突
起11aの高さに相当する厚さに積層して金属層(金属
板2となる部分)を形成した後、基板10及び突起11
aを溶解除去するか、又は金属層と基板10、突起11
aとを剥離する。これによって、図3(f)に示す如く
金属層における突起11aが存在した部分にふるい目3
が形成され、図1に示す如き分級板1を得る。なお、実
施の形態は分級板1及びその製造方法について説明した
が、これに限らず、金属板2の材料としてAu、Pt、
Pd、Rh等の白金属の金属を用いることで、例えばガ
ス反応用の触媒材料として、又は腐食性の気体又は液体
用の耐食性フィルタとして用いることも出来る。Next, as shown in FIG. 3 (e), the surface of the substrate 10 is coated with Ni, Cu, Al or an alloy thereof, or another alloy thereof by plating, sputtering or vapor deposition. After laminating to a thickness corresponding to the height to form a metal layer (a portion to be the metal plate 2), the substrate 10 and the protrusions 11
a by dissolving or removing the metal layer and the substrate 10 and the protrusions 11
a is peeled off. As a result, as shown in FIG. 3F, the sieve 3
Is formed, and a classifying plate 1 as shown in FIG. 1 is obtained. Although the embodiment has described the classifying plate 1 and the method of manufacturing the classifying plate, the present invention is not limited to this, and Au, Pt,
By using a white metal such as Pd or Rh, it can be used, for example, as a catalyst material for a gas reaction or as a corrosion-resistant filter for a corrosive gas or liquid.
【0015】また、基板10表面への突起の形成手段に
ついては、特に上記した手法にのみ限定するものではな
く、例えば基板10としてその合成樹脂製の帯状フィル
ム等の下地材料の表面にAlをスパッタリングしたもの
を用い、その表面にフォトレジストをふるい目3に相当
する部分を除く基板10の全面にパターン形成し、開口
しているふるい目3と対応する部分に所定の前処理を施
して無電解ニッケルメッキを施した後、フォトレジスト
を除去することでAl膜表面にNi突起を形成すること
としてもよい。The means for forming protrusions on the surface of the substrate 10 is not particularly limited to the above-described method. For example, as the substrate 10, Al is sputtered on the surface of a base material such as a synthetic resin strip film. A photoresist is formed on the entire surface of the substrate 10 except for a portion corresponding to the sieve 3 on the surface thereof, and a predetermined pretreatment is applied to a portion corresponding to the opening 3 to perform electroless processing. After nickel plating, the photoresist may be removed to form Ni projections on the surface of the Al film.
【0016】更に、発明の実施の形態では突起をフォト
レジストのみの一層構造の場合を示したが、分級板1に
おける金属板2の厚さを大きくする場合には突起自体の
高さも大きくする必要がある。この場合は、フォトレジ
ストとして感光性のポリイミドを用いて前述した過程で
フォトマスクを施し、露光,現像した後、先ず、ポリイ
ミドの突起を形成し、次にスパッタリングによって全面
に金属膜を形成し、次いで突起の表面及びその近傍部分
を除く他の部分の金属膜をリフトオフすることで、突起
は本来のポリイミドの高さに加えて金属膜の厚さ分だけ
高くなって、アスペクト比の高い突起を形成することが
可能となり、それだけ金属層の厚さを大きく出来ること
となる。なおこのような分級板は適宜の補強用の枠に装
着して使用される。Further, in the embodiment of the present invention, a case is shown in which the protrusion has a single-layer structure of only a photoresist, but when the thickness of the metal plate 2 in the classifying plate 1 is increased, the height of the protrusion itself must be increased. There is. In this case, using a photosensitive polyimide as a photoresist, applying a photomask in the above-described process, exposing and developing, first, a polyimide protrusion is formed, and then a metal film is formed on the entire surface by sputtering, Next, by lifting off the metal film in the other part except the surface of the protrusion and the vicinity thereof, the protrusion becomes higher by the thickness of the metal film in addition to the height of the original polyimide, and a protrusion having a high aspect ratio is formed. The metal layer can be formed, and the thickness of the metal layer can be increased accordingly. In addition, such a classifying plate is used by being mounted on an appropriate reinforcing frame.
【0017】[0017]
【発明の効果】以上の如く、第1,第2の発明にあって
は、フォトリソグラフィ技術によってふるい目の形成を
行うこととしたから、平坦な金属板にふるい目を形成す
ることが出来、ふるい目の孔径の精度が高く、また目づ
まりを生じ難く、均一、且つ円滑な分級が可能となる。As described above, in the first and second inventions, since the sieve is formed by the photolithography technique, the sieve can be formed on a flat metal plate. The hole diameter of the sieve is high in accuracy, the clogging hardly occurs, and uniform and smooth classification can be performed.
【図1】本発明の実施の形態である分級板の部分拡大図
である。FIG. 1 is a partially enlarged view of a classification plate according to an embodiment of the present invention.
【図2】分級板の他の例を示す部分拡大図である。FIG. 2 is a partially enlarged view showing another example of a classifying plate.
【図3】本発明の実施の形態である分級板の主要製造工
程を示す工程説明図である。FIG. 3 is a process explanatory view showing main manufacturing steps of a classifying plate according to an embodiment of the present invention.
【図4】図3に示す工程中の現像後の基板表面を示す部
分拡大斜視図である。FIG. 4 is a partially enlarged perspective view showing a substrate surface after development in a step shown in FIG. 3;
1 分級板 2 金属板 3 ふるい目 10 基板 11 フォトレジスト 12 フォトマスク Reference Signs List 1 Classification plate 2 Metal plate 3 Sieve 10 Substrate 11 Photoresist 12 Photomask
Claims (2)
記突起の高さ以下の厚さの金属層を形成し、前記基板及
び突起を除去してなることを特徴とする多孔金属板。1. A porous metal plate comprising: a metal layer having a thickness equal to or less than the height of the projections formed on a surface of a substrate on which a number of projections are formed; and removing the substrate and the projections.
を形成し、その表面に予め作成した所望形状のパターン
のフォトマスクを重ねて露光,現像し、前記基板表面に
予め定めた孔径に対応した直径を有するフォトレジスト
の多数の突起を形成し、前記基板表面に蒸着、メッキ又
はスパッタリングを施して、前記突起の高さ以下の厚さ
の金属層を形成した後、前記基板及び突起を溶解除去す
ることを特徴とする多孔金属板の製造方法。2. A required thickness layer of a photoresist is formed on the surface of a substrate, and a photomask having a pattern of a desired shape prepared in advance is exposed and developed on the surface, and the surface of the substrate is exposed to a predetermined hole diameter. After forming a large number of protrusions of photoresist having a diameter, depositing, plating or sputtering on the surface of the substrate to form a metal layer having a thickness equal to or less than the height of the protrusions, then dissolving and removing the substrate and the protrusions A method for producing a perforated metal plate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21175496A JPH1053858A (en) | 1996-08-09 | 1996-08-09 | Porous metallic sheet and its production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21175496A JPH1053858A (en) | 1996-08-09 | 1996-08-09 | Porous metallic sheet and its production |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH1053858A true JPH1053858A (en) | 1998-02-24 |
Family
ID=16611033
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21175496A Pending JPH1053858A (en) | 1996-08-09 | 1996-08-09 | Porous metallic sheet and its production |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH1053858A (en) |
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-
1996
- 1996-08-09 JP JP21175496A patent/JPH1053858A/en active Pending
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JP2006150349A (en) * | 2004-10-29 | 2006-06-15 | Brother Ind Ltd | Method for manufacturing filter |
JP5455099B1 (en) * | 2013-09-13 | 2014-03-26 | 大日本印刷株式会社 | Metal plate, metal plate manufacturing method, and mask manufacturing method using metal plate |
US10233546B2 (en) | 2013-09-13 | 2019-03-19 | Dai Nippon Printing Co., Ltd. | Metal plate, method of manufacturing metal plate, and method of manufacturing mask by use of metal plate |
US10731261B2 (en) | 2013-09-13 | 2020-08-04 | Dai Nippon Printing Co., Ltd. | Metal plate, method of manufacturing metal plate, and method of manufacturing mask by use of metal plate |
US11486031B2 (en) | 2013-10-15 | 2022-11-01 | Dai Nippon Printing Co., Ltd. | Metal plate |
US10600963B2 (en) | 2014-05-13 | 2020-03-24 | Dai Nippon Printing Co., Ltd. | Metal plate, method of manufacturing metal plate, and method of manufacturing mask by using metal plate |
US11217750B2 (en) | 2014-05-13 | 2022-01-04 | Dai Nippon Printing Co., Ltd. | Metal plate, method of manufacturing metal plate, and method of manufacturing mask by using metal plate |
US10570498B2 (en) | 2015-02-10 | 2020-02-25 | Dai Nippon Printing Co., Ltd. | Manufacturing method for deposition mask, metal plate used for producing deposition mask, and manufacturing method for said metal sheet |
US10612124B2 (en) | 2015-02-10 | 2020-04-07 | Dai Nippon Printing Co., Ltd. | Manufacturing method for deposition mask, metal plate used for producing deposition mask, and manufacturing method for said metal sheet |
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