JPH1051082A - Wiring board, and its manufacture, and liquid crystal element equipped with the wiring board, and its manufacture - Google Patents

Wiring board, and its manufacture, and liquid crystal element equipped with the wiring board, and its manufacture

Info

Publication number
JPH1051082A
JPH1051082A JP12124697A JP12124697A JPH1051082A JP H1051082 A JPH1051082 A JP H1051082A JP 12124697 A JP12124697 A JP 12124697A JP 12124697 A JP12124697 A JP 12124697A JP H1051082 A JPH1051082 A JP H1051082A
Authority
JP
Japan
Prior art keywords
substrate
wiring
resin
metal wiring
liquid crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12124697A
Other languages
Japanese (ja)
Other versions
JP3689529B2 (en
Inventor
Hiroyuki Tokunaga
博之 徳永
Masaru Kamio
優 神尾
Haruo Tomono
晴夫 友野
Yuji Matsuo
雄二 松尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP12124697A priority Critical patent/JP3689529B2/en
Publication of JPH1051082A publication Critical patent/JPH1051082A/en
Application granted granted Critical
Publication of JP3689529B2 publication Critical patent/JP3689529B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings

Landscapes

  • Liquid Crystal (AREA)
  • Structure Of Printed Boards (AREA)

Abstract

PROBLEM TO BE SOLVED: To fill resin equally and with good flatness between metallic wires by removing the squeeze-out of resin. SOLUTION: A wiring board 15 is manufactured by forming a band-shaped projection 10 around the position 5mm or more apart from the outermost metallic wiring, and pressing the UV hardening resin injected between a glass substrate 6 and a mold board thereby spreading the UV hardening resin 7, and then, hardening it. Hereby, the squeeze-out of the UV hardening resin 7 from the edge of the glass board 6 is suppressed by the band-shaped projection 10 at the time of pressing, whereby the shortage region of the UV hardening resin 7 on the glass board 6 vanishes, and the UV hardening resin 7 is filled equally and besides with good flatness between the metallic wires.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、金属配線間に樹脂
が充填、硬化された配線基板、その製造方法及び該配線
基板を備えた液晶素子及びその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wiring board in which a resin is filled and cured between metal wirings, a method for manufacturing the same, a liquid crystal device provided with the wiring board, and a method for manufacturing the same.

【0002】[0002]

【従来の技術】TN(Twisted Nematic )やSTN(Su
per Twisted Nematic )型等の液晶素子では、従来よ
り、ガラス基板上に形成される透明電極にはITO(In
dium TinOxide )膜などが一般に用いられている。
2. Description of the Related Art TN (Twisted Nematic) and STN (Sutured Nematic)
In a liquid crystal device such as a per Twisted Nematic (Twisted Nematic) type, a transparent electrode formed on a glass substrate has conventionally been provided with ITO (In).
dium TinOxide) film is generally used.

【0003】上述した従来の透明電極(ITO膜)は抵
抗率が大きいため、最近のように表示面積の大型化、高
精細化に伴って印加される電圧波形の遅延が問題になっ
てきた。特に、強誘電性液晶を用いた液晶素子では基板
ギャップがより狭いため、電圧波形の遅延が顕著であっ
た。また、透明電極を厚く形成することも考えられる
が、膜厚を厚くすると成膜に時間、コストがかかる、透
明性が悪くなる等の問題点があった。
[0003] The above-mentioned conventional transparent electrode (ITO film) has a large resistivity, so that the delay of the applied voltage waveform has recently become a problem as the display area becomes larger and the definition becomes higher. In particular, in the liquid crystal element using the ferroelectric liquid crystal, the delay of the voltage waveform was remarkable because the substrate gap was narrower. It is also conceivable to form the transparent electrode thicker, but when the film thickness is increased, there are problems such as time and cost required for film formation and poor transparency.

【0004】このような問題点を解決するために、膜厚
の薄い透明電極に併設して低抵抗率の金属配線を形成す
る構成の配線基板が提案されている(例えば、特開平2
−63019号公報)。この公報に開示されている配線
基板は、金属配線を透明な絶縁物で埋め込み、ITO膜
等の透明電極を形成したものである。尚、この公報にお
いては、該絶縁物にスルーホールを設けることによっ
て、金属配線と透明電極とを電気的に接続している。
In order to solve such a problem, there has been proposed a wiring board having a structure in which a low-resistance metal wiring is formed in parallel with a thin transparent electrode (for example, Japanese Patent Application Laid-Open No. HEI 2 (1998) -213).
-63019). The wiring board disclosed in this publication is one in which metal wiring is embedded with a transparent insulator to form a transparent electrode such as an ITO film. In this publication, a metal wiring and a transparent electrode are electrically connected by providing a through hole in the insulator.

【0005】上述したような構成の配線基板を作製する
場合、金属配線間を埋めて平坦化する絶縁物として透明
な樹脂を用いる構成の配線基板が提案されている(例え
ば、特開平6−347810号公報)。
In the case of manufacturing a wiring board having the above-described structure, a wiring board having a structure using a transparent resin as an insulator for filling and flattening between metal wirings has been proposed (for example, Japanese Patent Application Laid-Open No. Hei 6-347810). No.).

【0006】このような低抵抗率の金属配線を、透明電
極を形成する下地のガラス基板に形成して配線基板を作
製する場合、従来、例えば図23乃至図25に示すよう
な製造方法によって行われていた。
When a wiring substrate is manufactured by forming such a low-resistivity metal wiring on a base glass substrate on which a transparent electrode is to be formed, conventionally, for example, a line is formed by a manufacturing method as shown in FIGS. Had been

【0007】先ず、平滑な型基板100の表面上に、U
V(紫外線)硬化樹脂101を定量液化治具(図示省
略)で所定量滴下する(図23(a)参照)。次に、U
V硬化樹脂101が滴下された型基板100上に、予め
1μm程度の膜厚の金属配線103が施されたガラス基
板104を、金属配線103を型基板100に向けてU
V硬化樹脂101を挟むように接触させる(図23
(b),(c)参照)。
First, U is placed on the surface of a smooth mold substrate 100.
A predetermined amount of the V (ultraviolet) curable resin 101 is dropped with a quantitative liquefaction jig (not shown) (see FIG. 23A). Next, U
On the mold substrate 100 on which the V-cured resin 101 has been dropped, a glass substrate 104 on which a metal wiring 103 having a thickness of about 1 μm has been formed in advance is placed.
The V-cured resin 101 is contacted so as to sandwich the V-cured resin 101 (FIG. 23).
(See (b) and (c)).

【0008】次に、型基板100とガラス基板104と
でUV硬化樹脂101を挟んだ一体物をプレス機105
内に入れ、加圧して型基板100とガラス基板104を
密着させる(図24(a),(b)参照)。この時、後
の工程でITO膜等の透明電極と金属配線103が接触
して導通性を保つようにするため、UV硬化樹脂101
を金属配線103の表面上から除去するか、又は該表面
の一部に極薄く樹脂が残る程度になるように、型基板1
00とガラス基板104とを強く、しかも基板全面に均
一に密着させる。
[0008] Next, an integrated product sandwiching the UV curable resin 101 between the mold substrate 100 and the glass substrate 104 is pressed by a pressing machine 105.
The mold substrate 100 and the glass substrate 104 are brought into close contact with each other by applying pressure (see FIGS. 24A and 24B). At this time, in order to keep the metal wiring 103 in contact with a transparent electrode such as an ITO film in a later process, the UV curable resin 101 is used.
Is removed from the surface of the metal wiring 103, or the mold substrate 1 is removed so that the resin is left very thinly on a part of the surface.
00 and the glass substrate 104 are strongly and uniformly adhered to the entire surface of the substrate.

【0009】次に、このUV硬化樹脂101を硬化させ
るために、型基板100とガラス基板104の一体物を
プレス機105内から取り出し、ガラス基板104側か
らUV光106を照射してUV硬化樹脂101を硬化さ
せる(図25(a)参照)。その際、基板周囲をマスク
して、周囲のUV硬化樹脂101が硬化しないようにし
てもよい(未硬化の樹脂は、型基板100の剥離後に洗
浄除去する)。
Next, in order to cure the UV-curable resin 101, an integrated body of the mold substrate 100 and the glass substrate 104 is taken out of the press 105, and irradiated with UV light 106 from the glass substrate 104 side. The substrate 101 is cured (see FIG. 25A). At this time, the periphery of the substrate may be masked so that the surrounding UV-curable resin 101 is not cured (the uncured resin is washed away after the mold substrate 100 is peeled off).

【0010】次に、離型治具(図示省略)により型基板
100からガラス基板104とUV硬化樹脂101の一
体物を剥離して、金属配線103間にUV硬化樹脂10
1が埋め込まれた配線基板107を得ていた(図25
(b),(c)参照)。
Next, the integrated body of the glass substrate 104 and the UV curable resin 101 is peeled off from the mold substrate 100 by a mold release jig (not shown), and the UV curable resin
1 has been obtained (FIG. 25).
(See (b) and (c)).

【0011】[0011]

【発明が解決しようとする課題】ところで、上述した従
来の配線基板の製造方法では、UV硬化樹脂101が滴
下されている型基板100とガラス基板104を加圧す
る工程(図24(a),(b)参照)において、加圧に
より型基板100とガラス基板104間の端からUV硬
化樹脂101の一部101aがはみ出してしまう。
In the above-described conventional method of manufacturing a wiring board, the steps of pressing the mold substrate 100 onto which the UV curable resin 101 is dropped and the glass substrate 104 (FIGS. 24A and 24A). b)), a portion 101a of the UV curable resin 101 protrudes from the end between the mold substrate 100 and the glass substrate 104 due to the pressure.

【0012】このように、UV硬化樹脂101が滴下さ
れている型基板100とガラス基板104を加圧して密
着させる時に、UV硬化樹脂101の一部101aがは
み出してしまうと、プレス機105で型基板100とガ
ラス基板104をさらに加圧しても、UV硬化樹脂10
1の延伸が生じなくなる。このため、型基板100とガ
ラス基板104間の一部にUV硬化樹脂101が均一に
到達しない領域が発生して平坦性が悪くなり、後の工程
でITO膜等の透明電極との密着不良が生じる問題点が
あった。
As described above, when a part 101a of the UV curable resin 101 protrudes when the mold substrate 100 on which the UV curable resin 101 is dropped and the glass substrate 104 are brought into close contact with each other by pressing, the mold 105 is used by the press machine 105. Even if the substrate 100 and the glass substrate 104 are further pressed, the UV curable resin 10
No stretching of 1 occurs. For this reason, an area where the UV curable resin 101 does not reach uniformly is generated in a part between the mold substrate 100 and the glass substrate 104, resulting in poor flatness, and poor adhesion to a transparent electrode such as an ITO film in a later process. There were problems that occurred.

【0013】また、型基板100とガラス基板104間
の端からはみ出したUV硬化樹脂101の一部101a
が、プレス機105に付着して汚染して再使用の際に汚
れとなって、製造歩留まりの低下につながるという問題
点もあった。
Further, a portion 101a of the UV curable resin 101 protruding from the end between the mold substrate 100 and the glass substrate 104
However, there is also a problem that the toner adheres to the press machine 105 and becomes contaminated, and becomes dirty when reused, which leads to a reduction in production yield.

【0014】そこで、本発明は、金属配線間に充填する
樹脂の均一性と平坦性の向上、及び樹脂のはみ出しによ
る汚れを防止して製造歩留まりの向上を図ることができ
る配線基板、その製造方法及び該配線基板を備えた液晶
素子及びその製造方法を提供することを目的とする。
Accordingly, the present invention provides a wiring board and a method for manufacturing the same, which can improve the uniformity and flatness of the resin filled between the metal wirings, and can prevent contamination due to the protrusion of the resin and improve the production yield. And a liquid crystal device having the wiring substrate and a method for manufacturing the same.

【0015】[0015]

【課題を解決するための手段】上記のような問題を解決
するために、基板表面に金属配線の配線パターンと、前
記金属配線間に設けられた樹脂とを有する配線基板にお
いて、前記基板上の、前記配線パターンの最外部の前記
金属配線から5mm以上離れた位置に帯状の凸部を有す
ることを特徴としている。
In order to solve the above problems, a wiring board having a wiring pattern of metal wiring on a substrate surface and a resin provided between the metal wirings is provided. And a strip-shaped projection at a position separated from the outermost metal wiring by 5 mm or more of the wiring pattern.

【0016】また、基板表面に金属配線を配線パターン
し、樹脂を前記基板と型基板の間に注入して前記基板と
前記型基板とを密着、加圧して、前記樹脂を前記金属配
線間に充填して硬化する配線基板の製造方法において、
前記基板上の、前記配線パターンの最外部の前記金属配
線から5mm以上離れた位置に帯状の凸部を形成して、
前記基板と前記型基板間に前記樹脂を注入して加圧し、
前記帯状の凸部内で前記樹脂を前記金属配線間に充填す
ることを特徴としている。
Further, a metal wiring is patterned on the surface of the substrate, a resin is injected between the substrate and the mold substrate, and the substrate and the mold substrate are brought into close contact with each other and pressurized. In a method of manufacturing a wiring board that fills and cures,
Forming a belt-shaped convex portion at a position separated from the outermost metal wiring of the wiring pattern by 5 mm or more on the substrate,
Inject the resin between the substrate and the mold substrate and pressurize,
The method is characterized in that the resin is filled between the metal wirings in the strip-shaped convex portion.

【0017】また、基板表面に金属配線を配線パターン
し、樹脂を前記基板と型基板の間に注入して前記基板と
前記型基板とを密着、加圧して、前記樹脂を前記金属配
線間に充填して硬化する配線基板の製造方法において、
前記型基板上の、前記基板の最外部の前記金属配線から
5mm以上離れた位置に対応して帯状の凸部を形成し
て、前記基板と前記型基板間に前記樹脂を注入して加圧
し、前記帯状の凸部内で前記樹脂を前記金属配線間に平
坦に充填することを特徴としている。
Further, a metal wiring is formed on the surface of the substrate by wiring pattern, a resin is injected between the substrate and the mold substrate, and the substrate and the mold substrate are brought into close contact with each other and pressurized. In a method of manufacturing a wiring board that fills and cures,
On the mold substrate, a band-shaped convex portion is formed corresponding to a position at least 5 mm away from the outermost metal wiring of the substrate, and the resin is injected and pressurized between the substrate and the mold substrate. The method is characterized in that the resin is flatly filled between the metal wirings in the strip-shaped convex portion.

【0018】また、基板表面に金属配線を配線パターン
し、樹脂を前記基板と型基板の間に注入して前記基板と
前記型基板とを密着、加圧して、前記樹脂を前記金属配
線間に充填して硬化する配線基板の製造方法において、
前記一方の基板の表面に、前記金属配線の配線パターン
を形成する工程と、前記樹脂を型基板と前記基板との間
に注入して前記基板と前記型基板の両面の端部側から、
前記金属配線の長手方向に沿って前記基板と前記型基板
とを加圧して、前記樹脂を前記金属配線間に充填して硬
化する工程と、を有することを特徴としている。
A wiring pattern of metal wiring is formed on the surface of the substrate, a resin is injected between the substrate and the mold substrate, and the substrate and the mold substrate are brought into close contact with each other and pressurized. In a method of manufacturing a wiring board that fills and cures,
Forming a wiring pattern of the metal wiring on the surface of the one substrate, and injecting the resin between the mold substrate and the substrate, from both ends of the both surfaces of the substrate and the mold substrate,
Pressurizing the substrate and the mold substrate along the longitudinal direction of the metal wiring, filling the resin between the metal wirings, and curing the resin.

【0019】また、互いに対向するように配置された一
対の基板と、前記基板間に挟持した液晶と、少なくとも
一方の前記基板に設けた透明電極と該透明電極の背面と
電気的に接する配線パターンされた金属配線と、該金属
配線間に設けられた樹脂とを有する液晶素子において、
前記基板上の、前記配線パターンの最外部の前記金属配
線から5mm以上離れた位置に帯状の凸部を有すること
を特徴としている。
Also, a pair of substrates disposed so as to face each other, a liquid crystal sandwiched between the substrates, a transparent electrode provided on at least one of the substrates, and a wiring pattern electrically contacting the rear surface of the transparent electrode. In a liquid crystal element having a metal wiring and a resin provided between the metal wirings,
A strip-shaped convex portion is provided on the substrate at a position separated from the outermost metal wiring of the wiring pattern by 5 mm or more.

【0020】また、互いに対向するように配置された一
対の基板と、前記基板間に挟持した液晶と、少なくとも
一方の前記基板に設けた透明電極と該透明電極の背面と
電気的に接する配線パターンされた金属配線と、該金属
配線間に設けられた樹脂とを有する液晶素子の製造方法
において、前記一方の基板の表面に、前記金属配線の配
線パターンを形成する工程と、前記基板上の、前記配線
パターンの最外部の前記金属配線から5mm以上離れた
位置に帯状の凸部を形成する工程と、前記帯状の凸部内
で前記樹脂を前記金属配線間に充填する工程と、を少な
くとも有することを特徴としている。
Also, a pair of substrates arranged to face each other, a liquid crystal sandwiched between the substrates, a transparent electrode provided on at least one of the substrates, and a wiring pattern electrically contacting the back surface of the transparent electrode. Forming a wiring pattern of the metal wiring on a surface of the one of the substrates, wherein the metal wiring and a resin provided between the metal wirings are provided. Forming at least a step of forming a band-shaped protrusion at a position separated from the outermost metal wiring of the wiring pattern by 5 mm or more; and filling the resin between the metal wirings in the band-shaped protrusion. It is characterized by.

【0021】また、互いに対向するように配置された一
対の基板と、前記基板間に挟持した液晶と、少なくとも
一方の前記基板に設けた透明電極と該透明電極の背面と
電気的に接する配線パターンされた金属配線と、該金属
配線間に設けられた樹脂とを有する液晶素子の製造方法
において、前記一方の基板の表面に、前記金属配線の配
線パターンを形成する工程と、前記樹脂を型基板と前記
基板との間に注入して前記型基板と前記基板とを密着、
加圧して、前記樹脂を前記金属配線間に充填して硬化す
る工程と、を有し、予め前記型基板上の、前記基板の最
外部の前記金属配線から5mm以上離れた位置に対応し
て帯状の凸部を形成して、前記基板と前記型基板間に前
記樹脂を注入して加圧し、前記帯状の凸部内で前記樹脂
を前記金属配線間に平坦に充填することを特徴としてい
る。
Also, a pair of substrates arranged to face each other, a liquid crystal sandwiched between the substrates, a transparent electrode provided on at least one of the substrates, and a wiring pattern electrically contacting the rear surface of the transparent electrode. Forming a wiring pattern of the metal wiring on a surface of the one substrate in a method for manufacturing a liquid crystal element having a metal wiring formed and a resin provided between the metal wirings; The mold substrate and the substrate are brought into close contact by being injected between the substrate and the substrate,
Pressurizing, filling the resin between the metal wirings and curing, and corresponding to a position on the mold substrate which is at least 5 mm away from the outermost metal wiring of the substrate. A band-shaped convex portion is formed, and the resin is injected between the substrate and the mold substrate and pressurized, and the resin is filled flat between the metal wirings in the band-shaped convex portion.

【0022】また、互いに対向するように配置された一
対の基板と、該基板間に挟持した液晶と、少なくとも一
方の前記基板に設けた透明電極と該透明電極の背面と電
気的に接する配線パターンされた金属配線と、該金属配
線間に設けられた樹脂とを有する液晶素子の製造方法に
おいて、前記一方の基板の表面に、前記金属配線の配線
パターンを形成する工程と、前記樹脂を型基板と前記基
板との間に注入して前記基板と前記型基板の両面の端部
側から、前記金属配線の長手方向に沿って前記基板と前
記型基板とを加圧して、前記樹脂を前記金属配線間に充
填して硬化する工程と、を有することを特徴としてい
る。
Also, a pair of substrates disposed so as to face each other, a liquid crystal sandwiched between the substrates, a transparent electrode provided on at least one of the substrates, and a wiring pattern electrically contacting the rear surface of the transparent electrode Forming a wiring pattern of the metal wiring on a surface of the one substrate in a method for manufacturing a liquid crystal element having a metal wiring formed and a resin provided between the metal wirings; And between the substrate and the substrate, pressurize the substrate and the mold substrate along the longitudinal direction of the metal wiring from both ends of the substrate and the mold substrate, and pressurize the resin with the metal. And curing between the wirings.

【0023】(作用)プレス成型で金属配線間に充填し
た樹脂を平坦化しようとする時、平坦化に必要な樹脂の
量を正確に供給することは極めて困難で、ほとんどの場
合、型基板と基板との間に挟まれた余分な樹脂が基板の
縁からはみ出して、樹脂が均一に到達しない領域が発生
する。このため、本発明では、基板または型基板上の、
配線パターンの最外部の金属配線から5mm以上離れた
位置に帯状の凸部を設けて基板の縁から樹脂のはみ出し
を防止することにより、樹脂を金属配線間に均一に、且
つ平坦性よく充填することができる。
(Operation) When flattening the resin filled between the metal wirings by press molding, it is extremely difficult to accurately supply the amount of resin required for the flattening. Excess resin sandwiched between the substrate and the substrate protrudes from the edge of the substrate, and a region where the resin does not reach uniformly occurs. Therefore, in the present invention, on the substrate or the mold substrate,
A resin is uniformly filled between metal wirings with good flatness by providing a belt-shaped convex portion at a position at least 5 mm away from the outermost metal wiring of the wiring pattern to prevent the resin from protruding from the edge of the substrate. be able to.

【0024】[0024]

【発明の実施の形態】以下、図面に基づいて本発明の実
施の形態を説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0025】図1は、本発明の実施の形態に係る配線基
板を備えた液晶素子の一例を示す概略断面図である。こ
の液晶素子1は、偏光板2a,2bの間に対向して配置
された一対の配線基板である電極基板3a,3bを備え
ており、電極基板3a,3b間には強誘電性液晶等の液
晶4が充填されている。液晶4が充填されている電極基
板3a,3b間には、この基板ギャップを保持するため
に球状のスペーサ5が配置されている。
FIG. 1 is a schematic cross-sectional view showing an example of a liquid crystal device provided with a wiring board according to an embodiment of the present invention. The liquid crystal element 1 includes a pair of wiring substrates, ie, electrode substrates 3a and 3b, which are disposed opposite to each other between the polarizing plates 2a and 2b, and a ferroelectric liquid crystal or the like is provided between the electrode substrates 3a and 3b. The liquid crystal 4 is filled. A spherical spacer 5 is disposed between the electrode substrates 3a and 3b filled with the liquid crystal 4 to maintain the substrate gap.

【0026】電極基板3a,3bは、ガラス基板6a,
6bと、ガラス基板6a,6b上にUV硬化樹脂からな
る絶縁膜7a,7b、及び低抵抗の金属、例えばCr、A
l、Ag、Cu等からなる金属配線8a,8bと、金属配線
8a,8bと電気的に接しているITO膜からなる透明
電極9a,9bとでそれぞれ構成されている。
The electrode substrates 3a and 3b are made of a glass substrate 6a,
6b, insulating films 7a and 7b made of UV-curable resin on glass substrates 6a and 6b, and low-resistance metal such as Cr, A
Metal wirings 8a and 8b made of l, Ag, Cu, etc., and transparent electrodes 9a and 9b made of an ITO film that are in electrical contact with metal wirings 8a and 8b, respectively.

【0027】透明電極9a,9bはストライプ状にそれ
ぞれ形成され、互いに90゜の角度で交差したマトリク
ス電極となっている。また、透明電極9a,9b上に
は、配向膜11a,11b等がそれぞれ形成されてい
る。
The transparent electrodes 9a and 9b are formed in stripes, respectively, and are matrix electrodes which cross each other at an angle of 90 °. On the transparent electrodes 9a and 9b, alignment films 11a and 11b are formed, respectively.

【0028】上述した液晶素子1の電極基板3a,3b
に適用される配線基板は、その製造工程において図2
(a),(b)に示すように、ガラス基板6上にストラ
イプ状に配線パターンされた金属配線8が形成され、ガ
ラス基板6の周縁の全周には金属配線8とほぼ同じ厚さ
の帯状の凸部10が形成されている。尚、本実施の形態
ではこの帯状の凸部10は、液晶素子1を製造する際の
スクライブ工程において切り落とされるので、帯状の凸
部10はこの液晶素子1には残らない。
The electrode substrates 3a, 3b of the liquid crystal element 1 described above
Is applied to the wiring board shown in FIG.
As shown in (a) and (b), a metal wiring 8 having a wiring pattern formed in a stripe pattern is formed on a glass substrate 6, and has the same thickness as the metal wiring 8 around the entire periphery of the glass substrate 6. A belt-shaped convex portion 10 is formed. Note that, in the present embodiment, the band-shaped convex portion 10 is cut off in a scribing step when the liquid crystal element 1 is manufactured, so that the band-shaped convex portion 10 does not remain in the liquid crystal element 1.

【0029】帯状の凸部10は、金属配線8と同一の材
料を用いて同一プロセスで形成するのが好ましいが、レ
ジスト等の物質で金属配線8と別個に形成してもよい。
また、凸部10の厚みは金属配線8と同程度か、ガラス
基板6に歪みが生じない程度とし、凸部10の幅は一般
的には1〜20mm程度、好ましくは3〜15mm、最
適には5〜10mmにする。尚、凸部10の幅は20m
m以上とすることも可能ではあるが、ガラス基板6上で
のスペースが大きくなり、1mm以下では充填されるU
V硬化樹脂(図示省略)の乗り越えによってはみ出しが
生じる可能性が高くなる。また、凸部10の一部に空気
抜き用の隙間を形成してもよい。その際、かかる隙間
は、凸部10のうち、金属配線8と平行でない部分に設
けるのが好ましい。
It is preferable that the belt-like convex portion 10 is formed by the same process using the same material as the metal wiring 8, but it may be formed separately from the metal wiring 8 by using a material such as a resist.
The thickness of the convex portion 10 is approximately the same as that of the metal wiring 8 or the extent that the glass substrate 6 is not distorted, and the width of the convex portion 10 is generally about 1 to 20 mm, preferably 3 to 15 mm. Is 5 to 10 mm. In addition, the width of the protrusion 10 is 20 m.
m or more, but the space on the glass substrate 6 is large, and
There is a high possibility that the V-cured resin (not shown) may run off when it gets over. In addition, a gap for venting air may be formed in a part of the protrusion 10. In this case, it is preferable that such a gap be provided in a portion of the protrusion 10 that is not parallel to the metal wiring 8.

【0030】また、UV硬化樹脂の加圧方法が一定の方
向性があるローラーを用いる場合には、UV硬化樹脂の
はみ出しが加圧方向に平行な辺で生じ易く樹脂不足が発
生するので、図3(a),(b)に示すように、UV硬
化樹脂(図示省略)の加圧方向(矢印A方向)に平行な
ガラス基板6の両辺の周縁上のみに帯状の凸部10c,
10dをそれぞれ形成するのが好ましい。
When a roller having a certain direction is used for pressing the UV curable resin, the UV curable resin is likely to protrude on a side parallel to the pressing direction, resulting in insufficient resin. As shown in FIGS. 3 (a) and 3 (b), band-shaped convex portions 10c are formed only on the peripheral edges of both sides of the glass substrate 6 parallel to the pressing direction (the direction of arrow A) of the UV curing resin (not shown).
10d is preferably formed.

【0031】また、図4(a),(b)に示すように、
上述したガラス基板6の周縁上に帯状の凸部10を形成
する代わりに、UV硬化樹脂(図示省略)を延伸するた
めの型基板12の周縁上の全周に帯状の凸部10eを形
成してもよい。また、図5に示すように、UV硬化樹脂
(図示省略)の加圧方向(矢印A方向)に平行な型基板
12の両辺の周縁上に帯状の凸部10f,10gをそれ
ぞれ形成してもよい。尚、ガラス基板6と型基板12の
どちらに帯状の凸部を設ける場合においても、金属配線
8の外側と凸部の間には、外にはみ出さずに余ったUV
硬化樹脂が溜めておけるようにある程度のスペースが必
要で、一般には5mm以上、好ましくは8mm以上、最
適には10mm以上の間隔をパターン設計時に考慮して
おくことが好ましい。
As shown in FIGS. 4A and 4B,
Instead of forming the band-shaped protrusions 10 on the periphery of the glass substrate 6 described above, a band-shaped protrusion 10e is formed on the entire periphery of the mold substrate 12 for extending the UV curing resin (not shown). You may. Further, as shown in FIG. 5, strip-shaped convex portions 10f and 10g may be respectively formed on the periphery of both sides of the mold substrate 12 parallel to the pressing direction (the direction of arrow A) of the UV curing resin (not shown). Good. In addition, regardless of which of the glass substrate 6 and the mold substrate 12 is provided with the band-shaped convex portion, the extra UV is formed between the convex portion and the outside of the metal wiring 8 without protruding outside.
A certain amount of space is required to store the cured resin, and it is generally preferable to consider an interval of 5 mm or more, preferably 8 mm or more, and optimally 10 mm or more when designing the pattern.

【0032】このように、ガラス基板6上に形成した帯
状の凸部10によってUV硬化樹脂がガラス基板6の縁
から外にはみ出すことが防止されることにより、ガラス
基板6上でUV硬化樹脂の不足領域が生じることはな
く、金属配線8をUV硬化樹脂で均一に、且つ平坦性よ
く埋め込むことができる。
As described above, the UV-curable resin is prevented from protruding from the edge of the glass substrate 6 by the belt-shaped convex portions 10 formed on the glass substrate 6, so that the UV-curable resin Insufficient regions do not occur, and the metal wiring 8 can be buried uniformly and with good flatness with the UV curing resin.

【0033】次に、図1に示した本発明に係る液晶素子
1の電極基板3a,3bに適用される配線基板の製造方
法を図6乃至図9を参照して説明する。
Next, a method of manufacturing a wiring substrate applied to the electrode substrates 3a and 3b of the liquid crystal element 1 according to the present invention shown in FIG. 1 will be described with reference to FIGS.

【0034】先ず、ガラス基板6上に金属配線8と、金
属配線8を囲むようにしてガラス基板6の周縁の全周に
帯状の凸部10を同一のプロセスで形成し、このガラス
基板6の金属配線8側を型基板12に向けて金属配線8
間に滴下したUV硬化樹脂7を挟むように接触させる
(図6(a),(b)参照)。
First, a metal wiring 8 is formed on a glass substrate 6, and a belt-shaped convex portion 10 is formed on the entire periphery of the glass substrate 6 so as to surround the metal wiring 8 by the same process. 8 with the metal wiring 8 facing the mold substrate 12.
The UV curable resin 7 dropped between them is brought into contact so as to sandwich it (see FIGS. 6A and 6B).

【0035】金属配線8と帯状の凸部10は、例えばス
パッタリング法でガラス基板6上に金属膜層を形成した
後、フォトリソ法によりパターンニングして形成するこ
とができる。また、型基板12としては金属、ガラス、
セラミック、合成樹脂等を用いることができ、UV硬化
樹脂7としてはエポキシ系、アクリル系等のUV硬化樹
脂を用いることができる。尚、UV硬化樹脂7は、ガラ
ス基板6、あるいは型基板12のどちらに滴下させても
よい。
The metal wiring 8 and the strip-shaped convex portions 10 can be formed by forming a metal film layer on the glass substrate 6 by, for example, a sputtering method and then patterning by a photolithographic method. Further, as the mold substrate 12, metal, glass,
Ceramic, synthetic resin, or the like can be used. As the UV-curable resin 7, an epoxy-based or acrylic-based UV-curable resin can be used. The UV curable resin 7 may be dropped on either the glass substrate 6 or the mold substrate 12.

【0036】次に、UV硬化樹脂7を挟んだガラス基板
6と型基板12をプレス機13で上下から圧力を加え全
面にわたって密着させる(図7参照)。尚、金属配線8
の表面は、平坦化されたUV硬化樹脂7から露出してい
るか、表面の一部に極薄く樹脂が残る程度である。その
後、プレス機13から取り外したガラス基板6と型基板
12に対し、型基板12側からUV光14を照射してU
V硬化樹脂7を硬化させ、型基板12を剥離することに
よって配線基板15を作製する(図8、図9(a),
(b)参照)。
Next, the glass substrate 6 and the mold substrate 12 sandwiching the UV-curable resin 7 are pressed together from above and below by a press machine 13 to bring them into close contact with each other (see FIG. 7). In addition, the metal wiring 8
Is exposed from the flattened UV curable resin 7 or the resin is very thin on a part of the surface. Thereafter, the glass substrate 6 and the mold substrate 12 removed from the press 13 are irradiated with UV light 14 from the mold substrate 12 side to
By curing the V-cured resin 7 and peeling the mold substrate 12, the wiring substrate 15 is manufactured (FIGS. 8, 9A,
(B)).

【0037】尚、UV光14は型基板12側から照射し
てもガラス基板6側から照射してもよく、また、両方か
ら同時に照射してもよい。
The UV light 14 may be irradiated from the mold substrate 12 side, from the glass substrate 6 side, or from both sides simultaneously.

【0038】そして、UV硬化樹脂7上に金属配線8と
電気的に接するようにITO膜からなる透明電極(図示
省略)をスパッタ形成・パターニングすることにより、
図1に示した電極基板3a,3bが得られる。
Then, a transparent electrode (not shown) made of an ITO film is formed by sputtering and patterned on the UV curing resin 7 so as to be in electrical contact with the metal wiring 8.
The electrode substrates 3a and 3b shown in FIG. 1 are obtained.

【0039】このように、本発明に係る配線基板15で
は、製造時にプレス機13による加圧により金属配線8
間に押し広げられ平坦化されたUV硬化樹脂7の先端側
は、帯状の凸部10と金属配線8の間の隙間に溜ること
により、ガラス基板6の縁からはみ出すことはない。
As described above, in the wiring board 15 according to the present invention, the metal wiring 8
The tip side of the UV curable resin 7 which is spread and flattened in between is kept in the gap between the strip-shaped convex portion 10 and the metal wiring 8 so that it does not protrude from the edge of the glass substrate 6.

【0040】また、UV硬化樹脂7は帯状の凸部10に
よりブロックされてガラス基板6の縁からはみ出すこと
がないので、ガラス基板6上でUV硬化樹脂7の不足領
域が生じることはなく、金属配線8間にUV硬化樹脂7
が均一に、且つ平坦性よく充填される。
Further, since the UV curable resin 7 is blocked by the band-shaped convex portion 10 and does not protrude from the edge of the glass substrate 6, there is no shortage area of the UV curable resin 7 on the glass substrate 6, and the metal UV curing resin 7 between wiring 8
Are filled uniformly and with good flatness.

【0041】更に、製造時にプレス機13による加圧に
より延伸されたUV硬化樹脂7は、帯状の凸部10によ
ってブロックされることにより、ガラス基板6の外には
み出してプレス機13等の治具を汚すことが防止される
ので、プレス機13等をそのまま再使用してもUV硬化
樹脂7の付着に起因する製造歩留まりの低下を防止する
ことができる。
Further, the UV curable resin 7 stretched by pressurization by the press machine 13 at the time of manufacturing protrudes out of the glass substrate 6 by being blocked by the belt-shaped convex portions 10 and is fixed to the jig of the press machine 13 or the like. Is prevented from being contaminated, so that even if the press machine 13 or the like is reused as it is, it is possible to prevent a decrease in the production yield due to the adhesion of the UV curable resin 7.

【0042】尚、上述した実施の形態では、ガラス基板
6の帯状の凸部10は、液晶素子1を製造する際のスク
ライブ工程で切り落とすが、図10に示すように、ガラ
ス基板6a,6bの周縁の全周あるいは向かい合った2
辺に帯状の凹部10a,10bをそれぞれ残した液晶素
子1aを製造することも可能である。
In the above-described embodiment, the strip-shaped convex portions 10 of the glass substrate 6 are cut off in the scribe step in manufacturing the liquid crystal element 1, but as shown in FIG. 10, the glass substrates 6a and 6b are cut off. All around the periphery or facing 2
It is also possible to manufacture the liquid crystal element 1a with the strip-shaped concave portions 10a and 10b left on the sides.

【0043】[0043]

【実施例】次に、実施例を挙げて上述した配線基板の製
造方法について具体的に説明する。
Next, a method for manufacturing the above-described wiring board will be described in detail with reference to examples.

【0044】(実施例1)図11乃至図15は、本発明
の実施例1に係る配線基板の製造工程を模式的に示した
ものである。
(Embodiment 1) FIGS. 11 to 15 schematically show the steps of manufacturing a wiring board according to Embodiment 1 of the present invention.

【0045】本実施例では、厚さ1mm、100mm×
100mmのガラス基板20上に、幅10μmで膜厚2
μmのCr(クロム)膜からなる金属配線21を100μ
mピッチでストライプ状に形成すると同時に、この金属
配線21から10mm離して、幅5mmで膜厚2μmの
帯状の凸部22をガラス基板20の周縁の全周に形成し
た(図11参照)。金属配線21と帯状の凸部22は、
スパッタリング法でガラス基板20上にCr薄膜層を形成
した後、フォトリソ法によりパターンニングして形成し
た。
In this embodiment, the thickness is 1 mm, 100 mm ×
On a 100 mm glass substrate 20, a film having a width of 10 μm and a film thickness of 2
100 μm of metal wiring 21 made of Cr (chromium) film of μm
Simultaneously with the formation of stripes at m pitches, a strip-shaped protrusion 22 having a width of 5 mm and a thickness of 2 μm was formed on the entire periphery of the glass substrate 20 at a distance of 10 mm from the metal wiring 21 (see FIG. 11). The metal wiring 21 and the belt-shaped convex portion 22
After forming a Cr thin film layer on the glass substrate 20 by a sputtering method, it was formed by patterning by a photolithographic method.

【0046】そして、このガラス基板20にUV照射オ
ゾン処理を5分間行った後、シランカップリング剤(日
本ユニカー(株)社製:A−174)とエチルアルコー
ルを1:4の比に混合したものをスピンコートし、10
0℃で20分熱処理を行い密着処理を施した。
After the glass substrate 20 was subjected to UV irradiation ozone treatment for 5 minutes, a silane coupling agent (A-174 manufactured by Nippon Unicar Co., Ltd.) and ethyl alcohol were mixed at a ratio of 1: 4. Spin-coat
A heat treatment was performed at 0 ° C. for 20 minutes to perform an adhesion treatment.

【0047】次に、ガラス基板20の金属配線21上に
ディスペンサー23を用いてアクリル系のUV硬化樹脂
(ペンタエリストールトリアクリレート:ネオペンチル
グリコールジアクリレート:1−ヒドロキシシクロヘキ
シルフェニルケトン=50:50:2)24を40mg
滴下し、ガラス材からなる型基板25で挟んで密着し
て、プレス機26で加圧(20kg /cm2 の圧力)を3分
間程度加えた(図12(a),(b),(c)、図13
参照)。この時、延伸されるUV硬化樹脂24の先端側
は、帯状の凸部22によってブロックされた。
Next, an acrylic UV curable resin (pentaerythritol triacrylate: neopentyl glycol diacrylate: 1-hydroxycyclohexyl phenyl ketone = 50: 50) is formed on the metal wiring 21 of the glass substrate 20 by using a dispenser 23. 2) 40 mg of 24
The mixture was dropped and held in close contact with a mold substrate 25 made of a glass material, and pressure (a pressure of 20 kg / cm 2 ) was applied for about 3 minutes by a press machine 26 (FIGS. 12A, 12B, and 12C). ), FIG.
reference). At this time, the front end side of the UV curable resin 24 to be stretched was blocked by the belt-like convex portion 22.

【0048】次に、プレス機26からガラス基板20と
型基板25の一体物を取り外し、型基板25側からUV
光(中心波長365nm、紫外線強度200 mJ /cm
2 )27を照射し、UV硬化樹脂24を硬化した(図1
4参照)。
Next, the integrated body of the glass substrate 20 and the mold substrate 25 is removed from the press 26, and the UV
Light (center wavelength 365 nm, ultraviolet intensity 200 mJ / cm
2 ) Irradiate 27 to cure the UV curable resin 24 (FIG. 1)
4).

【0049】次に、離型装置(図示省略)を用いてガラ
ス基板20から型基板25を離型し、イソプロパノール
溶液中で超音波洗浄して未硬化のUV硬化樹脂24を除
去することによって、配線基板28を作製した(図15
(a),(b)参照)。
Next, the mold substrate 25 is released from the glass substrate 20 using a release device (not shown), and the uncured UV-curable resin 24 is removed by ultrasonic cleaning in an isopropanol solution. The wiring substrate 28 was manufactured (FIG. 15).
(See (a) and (b)).

【0050】このように本実施例では、帯状の凸部22
によってUV硬化樹脂24がガラス基板20の縁から外
にはみ出すことが防止されて、金属配線21間をUV硬
化樹脂24で均一に、且つ平坦性よく埋め込むことがで
きた。
As described above, in this embodiment, the belt-like convex portions 22 are formed.
As a result, the UV curable resin 24 was prevented from protruding from the edge of the glass substrate 20, and the space between the metal wirings 21 was uniformly and well-filled with the UV curable resin 24.

【0051】(比較例)図16(a),(b)は、上述
した実施例との比較用の製造工程を示したものである。
(Comparative Example) FIGS. 16A and 16B show a manufacturing process for comparison with the above-described embodiment.

【0052】この比較例では、ガラス基板20上に上述
した実施例と同様のプロセスで金属配線21を形成し
た。ガラス基板20の周縁上には上述した帯状の凸部は
形成していない。そして、上述した実施例と同様のシラ
ンカップリング処理を施した後、実施例1同様のUV硬
化樹脂24を滴下して型基板(図示省略)で挟んで密着
して、プレス機(図示省略)で加圧してUV硬化樹脂2
4を延伸し、UV光で硬化して配線基板29を作製し
た。
In this comparative example, a metal wiring 21 was formed on a glass substrate 20 by the same process as in the above-described embodiment. On the periphery of the glass substrate 20, the above-mentioned band-shaped convex portion is not formed. Then, after performing the same silane coupling treatment as in the above-described embodiment, the same UV curable resin 24 as in the first embodiment is dropped, sandwiched by a mold substrate (not shown), and closely adhered to each other, and a press machine (not shown) UV curing resin 2
4 was stretched and cured with UV light to produce a wiring board 29.

【0053】このように、比較例の配線基板29は、上
述した実施例のようにガラス基板20の周縁に帯状の凸
部が形成されていないので、加圧時にUV硬化樹脂24
の一部24aがガラス基板20の外にはみ出すことによ
り、はみ出した部分に隣接した領域では樹脂不足が生じ
て、金属配線21間に埋め込むUV硬化樹脂24の均一
性と平坦性が低下した。
As described above, since the wiring substrate 29 of the comparative example does not have a belt-like convex portion formed on the periphery of the glass substrate 20 as in the above-described embodiment, the UV curable resin 24
Of the UV curable resin 24 embedded between the metal wirings 21 is reduced in resin uniformity in a region adjacent to the protruding portion due to the part 24 a of the UV curable resin 24 protruding outside the glass substrate 20.

【0054】また、プレス機でUV硬化樹脂24を延伸
する時に、ガラス基板20の外にはみ出したUV硬化樹
脂24でプレス機が汚染され、再使用の前にこの汚れを
洗浄する必要があった。
Further, when the UV curable resin 24 is stretched by the press machine, the press machine is contaminated with the UV curable resin 24 protruding outside the glass substrate 20, and it is necessary to clean the dirt before reuse. .

【0055】(実施例2)図17乃至図19は、本発明
の実施例2に係る配線基板の製造工程を模式的に示した
ものである。
(Embodiment 2) FIGS. 17 to 19 schematically show steps of manufacturing a wiring board according to Embodiment 2 of the present invention.

【0056】本実施例では、厚さ1mm、100mm×
100mmのガラス基板20上に、実施例1と同様のプ
ロセスで幅10μmで膜厚2μmのCr(クロム)膜から
なる金属配線21を形成すると同時に、ガラス基板20
の両辺の周縁上にこの金属配線21から10mm離し
て、幅5mmで膜厚2μmの帯状の凸部22a,22b
を形成した。帯状の凸部22a,22bは、ストライプ
状に配線された金属配線21の配線方向と平行なガラス
基板10の両側のみに形成した。
In this embodiment, the thickness is 1 mm, 100 mm ×
A metal wiring 21 made of a Cr (chromium) film having a width of 10 μm and a thickness of 2 μm is formed on a 100 mm glass substrate 20 by the same process as in the first embodiment.
10 mm away from the metal wiring 21 on both sides of the belt-shaped convex portions 22a and 22b having a width of 5 mm and a thickness of 2 μm.
Was formed. The band-shaped convex portions 22a and 22b were formed only on both sides of the glass substrate 10 parallel to the wiring direction of the metal wires 21 wired in a stripe shape.

【0057】次に、実施例1と同様のシランカップリン
グ処理を施した後、ガラス基板20の金属配線21上に
ディスペンサー(図示省略)を用いて実施例1同様のU
V硬化樹脂24を滴下した。この時、UV硬化樹脂24
は、ストライプ状に配線された金属配線21の一端側
で、金属配線21の配線方向(矢印A方向)に対して垂
直方向に分布するようにして滴下した(図17(a),
(b)参照)。
Next, after performing the same silane coupling treatment as in the first embodiment, the same U-type as in the first embodiment is formed on the metal wiring 21 of the glass substrate 20 using a dispenser (not shown).
The V-cured resin 24 was dropped. At this time, the UV curable resin 24
Is dropped at one end of the metal wiring 21 wired in a stripe shape so as to be distributed in a direction perpendicular to the wiring direction of the metal wiring 21 (the direction of arrow A) (FIG. 17A,
(B)).

【0058】次に、型基板25をUV硬化樹脂24を滴
下したガラス基板20に張り合わせて、ロールプレス機
26aにガラス基板20のUV硬化樹脂24を滴下した
端面側から挿入し(図18(a),(b)参照)、加圧
(3kgw の圧力)しながらガラス基板20と型基板25
の一体物を一定速度で矢印B方向(金属配線21の長手
方向)に送り、UV硬化樹脂24をガラス基板20全面
に延伸し、UV光で硬化して配線基板30を作製した
(図19(a),(b)参照)。
Next, the mold substrate 25 is adhered to the glass substrate 20 on which the UV curable resin 24 has been dropped, and inserted into the roll press 26a from the end surface of the glass substrate 20 from which the UV curable resin 24 has been dropped (FIG. 18 (a)). ), (B)) and pressurizing (3 kgw pressure) the glass substrate 20 and the mold substrate 25.
Is sent in the direction of arrow B (the longitudinal direction of the metal wiring 21) at a constant speed, and the UV curable resin 24 is stretched over the entire surface of the glass substrate 20 and cured with UV light to produce the wiring substrate 30 (FIG. 19 ( a), (b)).

【0059】このように本実施例においても、帯状の凸
部22a,22bによってUV硬化樹脂24がガラス基
板20の外にはみ出すことが防止されて、金属配線21
間をUV硬化樹脂24で均一に、且つ平坦性よく埋め込
むことができた。
As described above, also in the present embodiment, the UV-curable resin 24 is prevented from protruding out of the glass substrate 20 by the belt-shaped convex portions 22a and 22b, and the metal wiring 21 is formed.
The space was evenly filled with the UV curable resin 24 with good flatness.

【0060】また、本実施例のように、UV硬化樹脂2
4の加圧を一定の方向性があるロールプレス機26aで
行う場合には、UV硬化樹脂24のはみ出しが加圧方向
に平行な辺で生じ易く樹脂不足が発生するので、UV硬
化樹脂24の加圧方向(矢印A方向)に平行なガラス基
板20の周縁上だけに帯状の凸部22a,22bを形成
するだけでよい。
Further, as in this embodiment, the UV curable resin 2
In the case where the pressing of step 4 is performed by a roll press machine 26a having a certain directionality, the UV curable resin 24 is likely to protrude on the side parallel to the pressing direction, resulting in insufficient resin. It is only necessary to form the band-shaped projections 22a and 22b only on the peripheral edge of the glass substrate 20 parallel to the pressing direction (the direction of arrow A).

【0061】(実施例3)本実施例では、厚さ1mm、
100mm×100mmのガラス基板上に、実施例1と
同様のプロセスで幅10μmで膜厚2μmのCr膜からな
る金属配線を100μmピッチで形成すると同時に、こ
の金属配線から8mm離して幅10mmで膜厚3μmの
帯状の凸部をガラス基板の周縁上(全周)に形成した。
他の構成は実施例1と同様とした。
(Embodiment 3) In this embodiment, the thickness is 1 mm,
A metal wiring made of a Cr film having a width of 10 μm and a film thickness of 2 μm is formed at a pitch of 100 μm on a 100 mm × 100 mm glass substrate by the same process as in the first embodiment, and at the same time, a film thickness of 10 mm is formed 8 mm apart from the metal wiring. A 3 μm band-shaped convex portion was formed on the periphery (entire periphery) of the glass substrate.
Other configurations were the same as in the first embodiment.

【0062】このように、実施例1に対して金属配線と
帯状の凸部間の隙間の幅を変え、更に帯状の凸部の幅と
膜厚を変えた場合でも、延伸されるUV硬化樹脂は、帯
状の凸部によってブロックされてガラス基板の外にはみ
出すことはなく、金属配線間をUV硬化樹脂で均一に、
且つ平坦性よく埋め込むことができた。
As described above, even when the width of the gap between the metal wiring and the band-shaped convex portion is changed and the width and the film thickness of the band-shaped convex portion are changed as compared with the first embodiment, Is not blocked by the belt-like convex portion and does not protrude out of the glass substrate.
In addition, it was possible to embed it with good flatness.

【0063】(実施例4)図20乃至図21は本発明の
実施例4に係る配線基板の製造工程を模式的に示したも
のである。
(Embodiment 4) FIGS. 20 to 21 schematically show the steps of manufacturing a wiring board according to Embodiment 4 of the present invention.

【0064】本実施例では、厚さ1mm、100mm×
100mmのガラス基板20上に、実施例1と同様のプ
ロセスで幅10μmで膜厚2μmのAl膜からなる金属配
線21を100μmピッチで形成し、一方、ガラスから
なる型基板25の周縁の全周に幅10mmで膜厚3μm
のAl膜からなる帯状の凸部22cを形成して、このガラ
ス基板20上にUV硬化樹脂24を滴下して型基板25
を張り合わせた(図20(a),(b)参照)。
In this embodiment, the thickness is 1 mm, 100 mm ×
On a 100 mm glass substrate 20, metal wirings 21 made of an Al film having a width of 10 μm and a film thickness of 2 μm are formed at a pitch of 100 μm by the same process as in Example 1, while the entire periphery of a mold substrate 25 made of glass is formed. 10mm wide and 3μm thick
A UV-curable resin 24 is dropped on the glass substrate 20 to form a mold substrate 25.
(See FIGS. 20A and 20B).

【0065】帯状の凸部22cは、型基板25をガラス
基板20に張り合せた時に金属配線21との間には10
mm程度の隙間を有する位置に形成されている。そし
て、実施例1と同様に型基板25とガラス基板20の一
体物ものをプレス機(図示省略)で加圧して、実施例1
同様のUV硬化樹脂24をガラス基板20全面に延伸
し、型基板25側からUV光を照射することにより硬化
して配線基板31を作製した(図21(a),(b)参
照)。
The band-like convex portion 22 c is formed between the metal wiring 21 and the mold substrate 25 when the mold substrate 25 is bonded to the glass substrate 20.
It is formed at a position having a gap of about mm. Then, as in the case of the first embodiment, an integrated product of the mold substrate 25 and the glass substrate 20 is pressed by a press (not shown).
The same UV curable resin 24 was stretched over the entire surface of the glass substrate 20 and cured by irradiating UV light from the mold substrate 25 side to produce a wiring substrate 31 (see FIGS. 21A and 21B).

【0066】このように、型基板25側に帯状の凸部2
2cを形成した場合でも、延伸されるUV硬化樹脂24
は、帯状の凸部22cによってブロックされてガラス基
板20の縁から外にはみ出すことはなく、金属配線21
間をUV硬化樹脂24で均一に、且つ平坦性よく埋め込
むことができた。
As described above, the band-shaped convex portion 2 is provided on the mold substrate 25 side.
Even if 2c is formed, the UV curable resin 24 to be stretched
Does not protrude from the edge of the glass substrate 20 by being blocked by the belt-shaped convex portion 22c,
The space was evenly filled with the UV curable resin 24 with good flatness.

【0067】(実施例5)本実施例では、図22に示す
ように厚さ1mm、100mm×100mmのガラス基
板20上に、実施例1と同様のプロセスで幅10μmで
膜厚2μmのAl膜からなる金属配線21を100μmピ
ッチで形成し、一方、ステンレス製からなる型基板25
の周縁の全周に幅10mmで厚さ3μmの帯状の凸部2
5aを切削法によって一体に形成し、このガラス基板2
0上に実施例1同様のUV硬化樹脂24を滴下して型基
板25を張り合せた。
Embodiment 5 In this embodiment, as shown in FIG. 22, an Al film having a width of 10 μm and a thickness of 2 μm is formed on a glass substrate 20 having a thickness of 1 mm and a size of 100 mm × 100 mm by the same process as in the first embodiment. Are formed at a pitch of 100 μm, while a mold substrate 25 made of stainless steel is formed.
A belt-like convex portion 2 having a width of 10 mm and a thickness of 3 μm on the entire periphery of
5a are integrally formed by a cutting method.
A UV curable resin 24 similar to that of Example 1 was dropped on the mold 0, and a mold substrate 25 was adhered.

【0068】帯状の凸部25aは、型基板25をガラス
基板20に張り合せた時に金属配線21との間には10
mm程度の隙間を有する位置に形成されている。そし
て、実施例1と同様に型基板25とガラス基板20の一
体物ものをプレス機で加圧して、UV硬化樹脂24をガ
ラス基板20全面に延伸し、ガラス基板20側からUV
光を照射することにより硬化して配線基板を作製した。
The band-shaped convex portion 25 a is formed between the metal substrate 21 and the mold substrate 25 when the mold substrate 25 is bonded to the glass substrate 20.
It is formed at a position having a gap of about mm. Then, in the same manner as in the first embodiment, an integrated product of the mold substrate 25 and the glass substrate 20 is pressed by a press machine, and the UV curable resin 24 is stretched over the entire surface of the glass substrate 20.
It was cured by irradiating light to produce a wiring substrate.

【0069】このように、型基板25側に帯状の凸部2
5aを一体に形成した場合でも、延伸されるUV硬化樹
脂24は、帯状の凸部25aによってブロックされてガ
ラス基板20の縁から外にはみ出すことはなく、金属配
線21間をUV硬化樹脂24で均一に、且つ平坦性よく
埋め込むことができた。
As described above, the band-shaped convex portion 2 is provided on the mold substrate 25 side.
Even when the 5a is integrally formed, the UV curable resin 24 to be stretched is not blocked by the band-shaped convex portions 25a and does not protrude from the edge of the glass substrate 20, and the space between the metal wirings 21 is covered with the UV curable resin 24. It could be embedded uniformly and with good flatness.

【0070】[0070]

【発明の効果】以上説明したように、本発明によれば、
基板上の最外部の金属配線から5mm以上離れた位置に
有する帯状の凸部により、金属配線間に充填される樹脂
が基板の縁から外にはみ出すのが防止されて、金属配線
間に樹脂が均一に、且つ平坦性よく充填された配線基板
を提供することができる。
As described above, according to the present invention,
The strip-shaped protrusions located at a distance of 5 mm or more from the outermost metal wiring on the substrate prevent the resin filled between the metal wirings from protruding outside the edge of the substrate, and the resin is formed between the metal wirings. It is possible to provide a wiring board that is uniformly and well-filled.

【0071】また、本発明に係る配線基板の製造方法に
よれば、基板上または型基板上の最外部の金属配線から
5mm以上離れた位置に形成した帯状の凸部により、加
圧されて延伸される樹脂が基板の縁から外にはみ出すこ
となく基板全体に一様に広がり、金属配線間に樹脂を均
一に、且つ平坦性よく充填することができる。更に、延
伸される樹脂が基板の縁から外にはみ出すことが防止さ
れるので、加圧時にプレス機等の治具が樹脂によって汚
れることがなくなり、製造歩留まりの向上を図ることが
できる。
Further, according to the method of manufacturing a wiring board of the present invention, the belt is pressed and stretched by the belt-shaped projection formed at a position at least 5 mm away from the outermost metal wiring on the substrate or the mold substrate. The resin to be spread uniformly over the entire substrate without protruding from the edge of the substrate, and the resin can be uniformly filled between metal wirings with good flatness. Further, since the stretched resin is prevented from protruding from the edge of the substrate, a jig such as a press machine is not contaminated by the resin at the time of pressurization, and the production yield can be improved.

【0072】また、本発明に係る配線基板を備えた液晶
素子及びその製造方法によれば、その製造工程におい
て、基板上または型基板上の最外部の金属配線から5m
m以上離れた位置に形成した帯状の凸部により、金属配
線間に充填される樹脂が基板の縁から外にはみ出すのが
防止されて、基板上の金属配線間に樹脂が均一に、且つ
平坦性よく充填される。更に、UV硬化樹脂が平坦性よ
く充填されることにより、透明電極との密着性もよくな
る。
Further, according to the liquid crystal device provided with the wiring substrate and the method of manufacturing the same according to the present invention, in the manufacturing process, 5 m from the outermost metal wiring on the substrate or the mold substrate.
m, the resin filled between the metal wirings is prevented from protruding from the edge of the substrate, and the resin is uniformly and flat between the metal wirings on the substrate. Filled well. Furthermore, by filling the UV curable resin with good flatness, the adhesion to the transparent electrode is also improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る配線基板を備えた液晶素子を示す
概略断面図。
FIG. 1 is a schematic cross-sectional view showing a liquid crystal element provided with a wiring board according to the present invention.

【図2】(a)は本発明の実施の形態に係る配線基板に
UV硬化樹脂を充填する前の状態を示す平面図、(b)
はそのI−I線断面図。
FIG. 2A is a plan view showing a state before filling a UV curable resin into a wiring board according to an embodiment of the present invention, and FIG.
Is a sectional view taken along the line II.

【図3】(a)は本発明の他の実施の形態に係る配線基
板にUV硬化樹脂を充填する前の状態を示す平面図、
(b)はそのII−II線断面図。
FIG. 3A is a plan view showing a state before a wiring board according to another embodiment of the present invention is filled with a UV curable resin,
(B) is the II-II sectional view taken on the line.

【図4】(a)は本発明の実施の形態に係る配線基板と
型基板間にUV硬化樹脂を充填する前の状態を示す平面
図、(b)は型基板を示す平面図。
FIG. 4A is a plan view showing a state before filling a UV curable resin between a wiring substrate and a mold substrate according to the embodiment of the present invention, and FIG. 4B is a plan view showing the mold substrate.

【図5】本発明の他の実施の形態に係る配線基板の型基
板を示す平面図。
FIG. 5 is a plan view showing a mold substrate of a wiring board according to another embodiment of the present invention.

【図6】(a)は本発明の実施の形態に係る配線基板と
型基板間にUV硬化樹脂を滴下した状態を示す概略断面
図、(b)は配線基板と型基板を密着した状態を示す概
略断面図。
FIG. 6A is a schematic cross-sectional view showing a state in which a UV curable resin is dropped between a wiring substrate and a mold substrate according to an embodiment of the present invention, and FIG. 6B shows a state in which the wiring substrate and the mold substrate are in close contact with each other. FIG.

【図7】UV硬化樹脂をプレス機で加圧している状態を
示す概略断面図。
FIG. 7 is a schematic cross-sectional view showing a state where a UV curable resin is being pressed by a press.

【図8】UV硬化樹脂にUV光を照射している状態を示
す概略断面図。
FIG. 8 is a schematic cross-sectional view showing a state where a UV curable resin is irradiated with UV light.

【図9】(a)は作製された配線基板を示す平面図、
(b)はそのIII −III 線断面図。
FIG. 9A is a plan view showing a manufactured wiring board,
(B) is a sectional view taken along the line III-III.

【図10】本発明の実施の形態の変形例に係る配線基板
を備えた液晶素子を示す概略断面図。
FIG. 10 is a schematic cross-sectional view showing a liquid crystal element including a wiring board according to a modification of the embodiment of the present invention.

【図11】本発明の実施例1に係る配線基板にUV硬化
樹脂を充填する前の状態を示す概略断面図。
FIG. 11 is a schematic cross-sectional view showing a state before the wiring board according to the first embodiment of the present invention is filled with a UV curable resin.

【図12】(a)はUV硬化樹脂を金属配線間に滴下し
た状態を示す概略断面図、(b)は型基板でUV硬化樹
脂を挟む前の状態を示す概略断面図、(c)は配線基板
と型基板を密着した状態を示す概略断面図。
12A is a schematic cross-sectional view illustrating a state in which a UV curable resin is dropped between metal wirings, FIG. 12B is a schematic cross-sectional view illustrating a state before the UV curable resin is sandwiched between mold substrates, and FIG. FIG. 3 is a schematic cross-sectional view showing a state in which a wiring substrate and a mold substrate are in close contact with each other.

【図13】UV硬化樹脂をプレス機で加圧している状態
を示す概略断面図。
FIG. 13 is a schematic cross-sectional view showing a state where a UV curable resin is being pressed by a press machine.

【図14】UV硬化樹脂にUV光を照射している状態を
示す概略断面図。
FIG. 14 is a schematic cross-sectional view showing a state where a UV curable resin is irradiated with UV light.

【図15】(a)は作製された配線基板を示す平面図、
(b)はそのIV−IV線断面図。
FIG. 15A is a plan view showing a manufactured wiring board,
(B) is the IV-IV sectional view taken on the line.

【図16】(a)は比較例に係る配線基板にUV硬化樹
脂を充填する前の状態を示す概略断面図、(b)は比較
例に係る配線基板を示す概略断面図。
16A is a schematic cross-sectional view showing a state before filling a wiring substrate according to a comparative example with a UV curable resin, and FIG. 16B is a schematic cross-sectional view showing a wiring substrate according to a comparative example.

【図17】(a)は本発明の実施例2に係る配線基板に
UV硬化樹脂を滴下した状態を示す平面図、(b)はそ
のV−V線断面図。
17A is a plan view showing a state in which a UV curable resin is dropped on a wiring board according to Embodiment 2 of the present invention, and FIG. 17B is a sectional view taken along line VV.

【図18】(a)は本発明の実施例3に係る配線基板に
滴下したUV硬化樹脂を型基板で挟む前の状態を示す概
略断面図、(b)はUV硬化樹脂をロールプレス機で加
圧している状態を示す概略断面図。
FIG. 18A is a schematic cross-sectional view showing a state before a UV curable resin dropped on a wiring substrate according to a third embodiment of the present invention is sandwiched between mold substrates, and FIG. FIG. 3 is a schematic cross-sectional view showing a state where pressure is applied.

【図19】(a)は作製された配線基板を示す平面図、
(b)はそのVI−VI線断面図。
FIG. 19A is a plan view showing a manufactured wiring board,
(B) is the VI-VI line sectional view.

【図20】(a)は本発明の実施例4に係る型基板と配
線基板間にUV硬化樹脂を滴下した状態を示す概略断面
図、(b)は、配線基板と型基板を密着して加圧した状
態を示す概略断面図。
FIG. 20A is a schematic cross-sectional view showing a state in which a UV curable resin is dropped between a mold substrate and a wiring substrate according to Embodiment 4 of the present invention, and FIG. FIG. 3 is a schematic cross-sectional view showing a pressurized state.

【図21】(a)は作製された配線基板を示す平面図、
(b)はそのVII −VII 線断面図。
FIG. 21A is a plan view showing a manufactured wiring board,
(B) is a sectional view taken along the line VII-VII.

【図22】本発明の実施例5に係る型基板と配線基板間
にUV硬化樹脂を滴下した状態を示す概略断面図。
FIG. 22 is a schematic cross-sectional view showing a state where a UV curable resin is dropped between a mold substrate and a wiring substrate according to Embodiment 5 of the present invention.

【図23】(a)は従来例に係る配線基板の製造方法に
おいて、型基板上にUV硬化樹脂を滴下した状態を示す
概略断面図、(b)は配線基板にUV硬化樹脂を密着さ
せる前の状態を示す概略断面図、(c)は配線基板と型
基板を密着した状態を示す概略断面図。
FIG. 23A is a schematic cross-sectional view showing a state in which a UV curable resin is dropped on a mold substrate in a method for manufacturing a wiring board according to a conventional example, and FIG. (C) is a schematic sectional view showing a state in which the wiring substrate and the mold substrate are in close contact with each other.

【図24】(a)は従来例に係る配線基板の製造方法に
おいて、UV硬化樹脂をプレス機で加圧する前の状態を
示す概略断面図、(b)はUV硬化樹脂をプレス機で加
圧している状態を示す概略断面図。
24A is a schematic cross-sectional view showing a state before pressing a UV-curable resin with a press in a method of manufacturing a wiring board according to a conventional example, and FIG. FIG.

【図25】(a)は従来例に係る配線基板の製造方法に
おいて、UV硬化樹脂にUV光を照射している状態を示
す概略断面図、(b)は型基板を剥離している状態を示
す概略断面図、(c)は作製された配線基板を示す概略
断面図。
FIG. 25A is a schematic cross-sectional view showing a state in which a UV curable resin is irradiated with UV light in a method of manufacturing a wiring substrate according to a conventional example, and FIG. FIG. 1C is a schematic cross-sectional view showing a manufactured wiring board.

【符号の説明】[Explanation of symbols]

1、1a 液晶素子 3a,3b 電極基板 4 液晶 6、6a,6b、20 ガラス基板(基板) 7、7a,7b、24 UV硬化樹脂(樹脂) 8、8a,8b、21 金属配線 9a,9b 透明電極 10、10a〜10g、22、22a〜22c、25a
帯状の凸部 12、25 型基板 13、26 プレス機 26a ロールプレス機 14、27 UV光 15、28、29、30、31 配線基板
1, 1a Liquid crystal element 3a, 3b Electrode substrate 4 Liquid crystal 6, 6a, 6b, 20 Glass substrate (substrate) 7, 7a, 7b, 24 UV curable resin (resin) 8, 8a, 8b, 21 Metal wiring 9a, 9b Transparent Electrodes 10, 10a to 10g, 22, 22a to 22c, 25a
Belt-shaped convex portion 12, 25-type substrate 13, 26 Press machine 26a Roll press machine 14, 27 UV light 15, 28, 29, 30, 31 Wiring board

───────────────────────────────────────────────────── フロントページの続き (72)発明者 松尾 雄二 東京都大田区下丸子3丁目30番2号 キヤ ノン株式会社内 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Yuji Matsuo 3-30-2 Shimomaruko, Ota-ku, Tokyo Inside Canon Inc.

Claims (47)

【特許請求の範囲】[Claims] 【請求項1】 基板表面に金属配線の配線パターンと、
前記金属配線間に設けられた樹脂とを有する配線基板に
おいて、 前記基板上の、前記配線パターンの最外部の前記金属配
線から5mm以上離れた位置に帯状の凸部を有する、 ことを特徴とする配線基板。
1. A wiring pattern of metal wiring on a surface of a substrate,
A wiring board having a resin provided between the metal wirings, wherein the wiring board has a band-shaped convex portion at a position separated from the outermost metal wiring of the wiring pattern by 5 mm or more on the substrate. Wiring board.
【請求項2】 前記帯状の凸部を、前記基板上の前記最
外部の金属配線から5mm以上離れた位置の全周に有す
る、 請求項1記載の配線基板。
2. The wiring board according to claim 1, wherein the strip-shaped convex portion is provided on the entire circumference of a position at least 5 mm away from the outermost metal wiring on the substrate.
【請求項3】 前記帯状の凸部を、前記基板上の前記最
外部の金属配線から5mm以上離れた位置の該金属配線
の長手方向の両側に有する、 請求項1記載の配線基板。
3. The wiring board according to claim 1, wherein the strip-shaped convex portions are provided on both sides in a longitudinal direction of the metal wiring at a position separated from the outermost metal wiring by 5 mm or more on the substrate.
【請求項4】 前記帯状の凸部の幅は1〜20mmであ
る、 請求項1乃至3のいずれか1記載の配線基板。
4. The wiring board according to claim 1, wherein the width of the band-shaped projection is 1 to 20 mm.
【請求項5】 前記帯状の凸部は前記金属配線とほぼ同
じ厚さである、 請求項1乃至4のいずれか1項記載の配線基板。
5. The wiring board according to claim 1, wherein the band-shaped projection has substantially the same thickness as the metal wiring.
【請求項6】 前記帯状の凸部は前記金属配線と同じ金
属からなる、 請求項1乃至5のいずれか1項記載の配線基板。
6. The wiring board according to claim 1, wherein the belt-shaped convex portion is made of the same metal as the metal wiring.
【請求項7】 前記金属配線はCr、Al、Ag、Cuのいずれ
かからなる、 請求項1記載の配線基板。
7. The wiring board according to claim 1, wherein the metal wiring is made of one of Cr, Al, Ag, and Cu.
【請求項8】 前記樹脂はUV硬化樹脂である、 請求項1記載の配線基板。8. The wiring board according to claim 1, wherein the resin is a UV curing resin. 【請求項9】 前記基板はガラス基板である、 請求項1記載の配線基板。9. The wiring substrate according to claim 1, wherein the substrate is a glass substrate. 【請求項10】 基板表面に金属配線を配線パターン
し、樹脂を前記基板と型基板の間に注入して前記基板と
前記型基板とを密着、加圧して、前記樹脂を前記金属配
線間に充填して硬化する配線基板の製造方法において、 前記基板上の、前記配線パターンの最外部の前記金属配
線から5mm以上離れた位置に帯状の凸部を形成して、
前記基板と前記型基板間に前記樹脂を注入して加圧し、
前記帯状の凸部内で前記樹脂を前記金属配線間に充填す
る、 ことを特徴とする配線基板の製造方法。
10. A wiring pattern of a metal wiring is formed on the surface of the substrate, and a resin is injected between the substrate and the mold substrate to bring the substrate and the mold substrate into close contact with each other and pressurized, so that the resin is interposed between the metal wirings. In the method for manufacturing a wiring board that fills and cures, forming a strip-shaped convex portion at a position on the substrate that is at least 5 mm away from the outermost metal wiring of the wiring pattern,
Inject the resin between the substrate and the mold substrate and pressurize,
A method for manufacturing a wiring board, comprising: filling the resin between the metal wirings in the strip-shaped projections.
【請求項11】 前記帯状の凸部を、前記基板上の前記
最外部の金属配線から5mm以上離れた位置の全周に形
成する、 請求項10記載の配線基板の製造方法。
11. The method for manufacturing a wiring board according to claim 10, wherein the belt-shaped convex portion is formed on the entire periphery of the substrate at a position separated from the outermost metal wiring by 5 mm or more.
【請求項12】 前記帯状の凸部を、前記基板上の前記
最外部の金属配線から5mm以上離れた位置の該金属配
線の長手方向の両側に形成する、 請求項10記載の配線基板の製造方法。
12. The method of manufacturing a wiring board according to claim 10, wherein the band-shaped projections are formed on both sides of the metal wiring in the longitudinal direction at positions separated from the outermost metal wiring by 5 mm or more on the substrate. Method.
【請求項13】 前記帯状の凸部の幅は1〜20mmで
ある、 請求項10乃至12のいずれか1記載の配線基板の製造
方法。
13. The method of manufacturing a wiring board according to claim 10, wherein the width of the band-shaped convex portion is 1 to 20 mm.
【請求項14】 前記帯状の凸部を、前記金属配線と同
じ金属で、且つ同一工程でほぼ同じ厚さに形成する、 請求項10記載の配線基板の製造方法。
14. The method of manufacturing a wiring board according to claim 10, wherein the band-shaped projections are formed of the same metal as the metal wiring and have substantially the same thickness in the same step.
【請求項15】 前記金属配線はCr、Al、Ag、Cuのいず
れかからなる、 請求項10記載の配線基板の製造方法。
15. The method according to claim 10, wherein the metal wiring is made of any one of Cr, Al, Ag, and Cu.
【請求項16】 前記樹脂はUV硬化樹脂である、 請求項10記載の配線基板の製造方法。16. The method according to claim 10, wherein the resin is a UV curable resin. 【請求項17】 前記基板はガラス基板である、 請求項10記載の配線基板の製造方法。17. The method according to claim 10, wherein the substrate is a glass substrate. 【請求項18】 基板表面に金属配線を配線パターン
し、樹脂を前記基板と型基板の間に注入して前記基板と
前記型基板とを密着、加圧して、前記樹脂を前記金属配
線間に充填して硬化する配線基板の製造方法において、 前記型基板上の、前記基板の最外部の前記金属配線から
5mm以上離れた位置に対応して帯状の凸部を形成し
て、前記基板と前記型基板間に前記樹脂を注入して加圧
し、前記帯状の凸部内で前記樹脂を前記金属配線間に平
坦に充填する、 ことを特徴とする配線基板の製造方法。
18. A wiring pattern of a metal wiring on a surface of a substrate, a resin is injected between the substrate and the mold substrate, and the substrate and the mold substrate are brought into close contact with each other and pressurized so that the resin is interposed between the metal wirings. In the method for manufacturing a wiring substrate that is filled and cured, a band-shaped convex portion is formed corresponding to a position on the mold substrate that is at least 5 mm away from the outermost metal wiring of the substrate. A method for manufacturing a wiring board, comprising: injecting the resin between mold substrates and pressurizing the resin, and filling the resin flatly between the metal wirings in the strip-shaped convex portion.
【請求項19】 前記帯状の凸部を、前記基板の前記最
外部の金属配線から5mm以上離れた位置に対応して前
記型基板上の全周に形成する、 請求項18記載の配線基板の製造方法。
19. The wiring board according to claim 18, wherein the band-shaped convex portion is formed on the entire periphery of the mold substrate corresponding to a position separated from the outermost metal wiring of the substrate by 5 mm or more. Production method.
【請求項20】 前記帯状の凸部を、前記基板の前記最
外部の金属配線から5mm以上離れた位置に対応して前
記型基板で前記樹脂を一軸方向に加圧する方向と平行な
該型基板上の両側に形成する、 請求項18記載の配線基板の製造方法。
20. The mold substrate parallel to a direction in which the resin is uniaxially pressed by the mold substrate corresponding to a position where the band-shaped convex portion is at least 5 mm away from the outermost metal wiring of the substrate. The method for manufacturing a wiring board according to claim 18, wherein the wiring board is formed on both upper sides.
【請求項21】 前記帯状の凸部の幅は1〜20mmで
ある、 請求項18乃至20のいずれか1項記載の配線基板の製
造方法。
21. The method for manufacturing a wiring board according to claim 18, wherein the width of the band-shaped convex portion is 1 to 20 mm.
【請求項22】 前記金属配線はCr、Al、Ag、Cuのいず
れかからなる、 請求項18記載の配線基板の製造方法。
22. The method according to claim 18, wherein the metal wiring is made of one of Cr, Al, Ag, and Cu.
【請求項23】 前記樹脂はUV硬化樹脂である、 請求項18記載の配線基板の製造方法。23. The method according to claim 18, wherein the resin is a UV curable resin. 【請求項24】 前記基板はガラス基板である、 請求項18記載の配線基板の製造方法。24. The method according to claim 18, wherein the substrate is a glass substrate. 【請求項25】 基板表面に金属配線を配線パターン
し、樹脂を前記基板と型基板の間に注入して前記基板と
前記型基板とを密着、加圧して、前記樹脂を前記金属配
線間に充填して硬化する配線基板の製造方法において、 前記一方の基板の表面に、前記金属配線の配線パターン
を形成する工程と、 前記樹脂を型基板と前記基板との間に注入して前記基板
と前記型基板の両面の端部側から、前記金属配線の長手
方向に沿って前記基板と前記型基板とを加圧して、前記
樹脂を前記金属配線間に充填して硬化する工程と、を有
する、 ことを特徴とする配線基板の製造方法。
25. A wiring pattern of metal wiring is formed on the surface of the substrate, a resin is injected between the substrate and the mold substrate, and the substrate and the mold substrate are brought into close contact with each other and pressurized. In the method for manufacturing a wiring board that is filled and cured, a step of forming a wiring pattern of the metal wiring on the surface of the one substrate; and injecting the resin between a mold substrate and the substrate, and Pressurizing the substrate and the mold substrate along the longitudinal direction of the metal wiring from both end sides of the mold substrate, filling the resin between the metal wirings and curing the resin. A method for manufacturing a wiring board, comprising:
【請求項26】 前記加圧をロールプレス機を用いて行
う、 請求項25記載の配線基板の製造方法。
26. The method according to claim 25, wherein the pressing is performed using a roll press.
【請求項27】 互いに対向するように配置された一対
の基板と、該基板間に挟持した液晶と、少なくとも一方
の前記基板に設けた透明電極と該透明電極の背面と電気
的に接する配線パターンされた金属配線と、該金属配線
間に設けられた樹脂とを有する液晶素子において、 前記基板上の、前記配線パターンの最外部の前記金属配
線から5mm以上離れた位置に帯状の凸部を有する、 ことを特徴とする液晶素子。
27. A pair of substrates arranged to face each other, a liquid crystal interposed between the substrates, a transparent electrode provided on at least one of the substrates, and a wiring pattern electrically contacting the rear surface of the transparent electrode. A liquid crystal element having a metal wiring provided and a resin provided between the metal wirings, wherein a strip-shaped convex portion is provided on the substrate at a position separated from the outermost metal wiring of the wiring pattern by 5 mm or more. A liquid crystal element characterized by the above-mentioned.
【請求項28】 前記帯状の凸部を、前記基板上の前記
最外部の金属配線から5mm以上離れた位置の全周に有
する、 請求項27記載の液晶素子。
28. The liquid crystal device according to claim 27, wherein the band-shaped convex portion is provided on the entire circumference of a position at least 5 mm away from the outermost metal wiring on the substrate.
【請求項29】 前記帯状の凸部を、前記基板上の前記
最外部の金属配線から5mm以上離れた位置の該金属配
線の長手方向の両側に有する、 請求項27記載の液晶素子。
29. The liquid crystal element according to claim 27, wherein the band-shaped convex portion is provided on both sides in a longitudinal direction of the metal wiring at a position separated from the outermost metal wiring by 5 mm or more on the substrate.
【請求項30】 前記帯状の凸部の幅は1〜20mmで
ある、 請求項27乃至29のいずれか1項記載の液晶素子。
30. The liquid crystal device according to claim 27, wherein the width of the band-shaped projection is 1 to 20 mm.
【請求項31】 前記帯状の凸部は前記金属配線とほぼ
同じ厚さである、 請求項27乃至30のいずれか1項記載の液晶素子。
31. The liquid crystal device according to claim 27, wherein the band-shaped projection has substantially the same thickness as the metal wiring.
【請求項32】 前記帯状の凸部は前記金属配線と同じ
金属からなる、 請求項27乃至31のいずれか1項記載の液晶素子。
32. The liquid crystal device according to claim 27, wherein the band-shaped projection is made of the same metal as the metal wiring.
【請求項33】 前記金属配線はCr、Al、Ag、Cuのいず
れかからなる、 請求項27記載の液晶素子。
33. The liquid crystal device according to claim 27, wherein the metal wiring is made of one of Cr, Al, Ag, and Cu.
【請求項34】 前記樹脂はUV硬化樹脂である、 請求項27記載の液晶素子。34. The liquid crystal device according to claim 27, wherein the resin is a UV curable resin. 【請求項35】 前記基板はガラス基板である、 請求項27記載の液晶素子。35. The liquid crystal device according to claim 27, wherein the substrate is a glass substrate. 【請求項36】 前記透明電極はITO膜からなる、 請求項27記載の液晶素子。36. The liquid crystal device according to claim 27, wherein the transparent electrode is made of an ITO film. 【請求項37】 前記液晶は強誘電性液晶である、 請求項27記載の液晶素子。37. The liquid crystal device according to claim 27, wherein the liquid crystal is a ferroelectric liquid crystal. 【請求項38】 互いに対向するように配置された一対
の基板と、該基板間に挟持した液晶と、少なくとも一方
の前記基板に設けた透明電極と該透明電極の背面と電気
的に接する配線パターンされた金属配線と、該金属配線
間に設けられた樹脂とを有する液晶素子の製造方法にお
いて、 前記一方の基板の表面に、前記金属配線の配線パターン
を形成する工程と、 前記基板上の、前記配線パターンの最外部の前記金属配
線から5mm以上離れた位置に帯状の凸部を形成する工
程と、 前記帯状の凸部内で前記樹脂を前記金属配線間に充填す
る工程と、を少なくとも有する、 ことを特徴とする液晶素子の製造方法。
38. A pair of substrates disposed so as to face each other, a liquid crystal interposed between the substrates, a transparent electrode provided on at least one of the substrates, and a wiring pattern electrically contacting the rear surface of the transparent electrode. A method of manufacturing a liquid crystal element having a metal wiring formed and a resin provided between the metal wirings, wherein a wiring pattern of the metal wiring is formed on a surface of the one substrate; A step of forming a band-shaped protrusion at a position separated from the outermost metal wiring by 5 mm or more of the wiring pattern; and a step of filling the resin between the metal wirings in the band-shaped protrusion. A method for manufacturing a liquid crystal element, comprising:
【請求項39】 前記金属配線の配線パターンを形成す
る工程と、前記帯状の凸部を形成する工程とを同時に行
う、 請求項38記載の液晶素子の製造方法。
39. The method for manufacturing a liquid crystal element according to claim 38, wherein a step of forming a wiring pattern of the metal wiring and a step of forming the strip-shaped convex portion are performed simultaneously.
【請求項40】 前記帯状の凸部を、前記基板上の前記
最外部の金属配線から5mm以上離れた位置の全周に形
成する、 請求項38記載の液晶素子の製造方法。
40. The method for manufacturing a liquid crystal element according to claim 38, wherein the band-shaped convex portion is formed on the entire periphery of the substrate at a position separated from the outermost metal wiring by 5 mm or more.
【請求項41】 前記帯状の凸部を、前記基板上の前記
最外部の金属配線から5mm以上離れた位置の該金属配
線の長手方向の両側に形成する、 請求項38記載の液晶素子の製造方法。
41. The liquid crystal device according to claim 38, wherein the band-shaped convex portions are formed on both sides of the metal wiring on the substrate at a position separated from the outermost metal wiring by 5 mm or more in the longitudinal direction. Method.
【請求項42】 前記樹脂を充填する工程の後に、前記
凸部を切り落とす工程を有する、 請求項38記載の液晶素子の製造方法。
42. The method according to claim 38, further comprising a step of cutting off the convex portion after the step of filling the resin.
【請求項43】 互いに対向するように配置された一対
の基板と、該基板間に挟持した液晶と、少なくとも一方
の前記基板に設けた透明電極と該透明電極の背面と電気
的に接する配線パターンされた金属配線と、該金属配線
間に設けられた樹脂とを有する液晶素子の製造方法にお
いて、 前記一方の基板の表面に、前記金属配線の配線パターン
を形成する工程と、 前記樹脂を型基板と前記基板との間に注入して前記型基
板と前記基板とを密着、加圧して、前記樹脂を前記金属
配線間に充填して硬化する工程と、を有し、 予め前記型基板上の、前記基板の最外部の前記金属配線
から5mm以上離れた位置に対応して帯状の凸部を形成
して、前記基板と前記型基板間に前記樹脂を注入して加
圧し、前記帯状の凸部内で前記樹脂を前記金属配線間に
平坦に充填する、 ことを特徴とする液晶素子の製造方法。
43. A pair of substrates disposed so as to face each other, a liquid crystal sandwiched between the substrates, a wiring electrode provided on at least one of the substrates, and a wiring pattern electrically contacting the rear surface of the transparent electrode. A method for manufacturing a liquid crystal element having a metal wiring provided and a resin provided between the metal wirings, wherein a wiring pattern of the metal wiring is formed on a surface of the one substrate; And injecting between the substrate and the mold substrate and the substrate in close contact with each other, pressurizing, filling and curing the resin between the metal wirings, and curing the resin. Forming a band-shaped protrusion corresponding to a position at least 5 mm away from the outermost metal wiring of the substrate, injecting the resin between the substrate and the mold substrate and applying pressure, thereby forming the band-shaped protrusion. Place the resin between the metal wires in the A method for producing a liquid crystal element, wherein the method comprises:
【請求項44】 前記帯状の凸部を、前記基板の前記最
外部の金属配線から5mm以上離れた位置に対応して前
記型基板上の全周に有する、 請求項43記載の液晶素子の製造方法。
44. The manufacturing method of a liquid crystal device according to claim 43, wherein the band-shaped convex portion is provided on the entire periphery of the mold substrate corresponding to a position separated from the outermost metal wiring of the substrate by 5 mm or more. Method.
【請求項45】 前記帯状の凸部を、前記基板の前記最
外部の金属配線から5mm以上離れた位置に対応して前
記型基板で前記樹脂を一軸方向に加圧する方向と平行な
該型基板上の両側に形成する、 請求項43記載の液晶素子の製造方法。
45. The mold substrate parallel to a direction in which the resin is uniaxially pressed by the mold substrate corresponding to a position where the band-shaped convex portion is separated from the outermost metal wiring of the substrate by 5 mm or more. The method for manufacturing a liquid crystal element according to claim 43, wherein the liquid crystal element is formed on both upper sides.
【請求項46】 互いに対向するように配置された一対
の基板と、該基板間に挟持した液晶と、少なくとも一方
の前記基板に設けた透明電極と該透明電極の背面と電気
的に接する配線パターンされた金属配線と、該金属配線
間に設けられた樹脂とを有する液晶素子の製造方法にお
いて、 前記一方の基板の表面に、前記金属配線の配線パターン
を形成する工程と、 前記樹脂を型基板と前記基板との間に注入して前記基板
と前記型基板の両面の端部側から、前記金属配線の長手
方向に沿って前記基板と前記型基板とを加圧して、前記
樹脂を前記金属配線間に充填して硬化する工程と、を有
する、 ことを特徴とする液晶素子の製造方法。
46. A pair of substrates arranged so as to face each other, a liquid crystal sandwiched between the substrates, a transparent electrode provided on at least one of the substrates, and a wiring pattern electrically contacting the rear surface of the transparent electrode. A method for manufacturing a liquid crystal element having a metal wiring provided and a resin provided between the metal wirings, wherein a wiring pattern of the metal wiring is formed on a surface of the one substrate; And between the substrate and the substrate, pressurize the substrate and the mold substrate along the longitudinal direction of the metal wiring from both ends of the substrate and the mold substrate, and pressurize the resin with the metal. Filling between the wirings and curing. A method of manufacturing a liquid crystal element.
【請求項47】 前記加圧をロールプレス機を用いて行
う、 請求項46記載の液晶素子の製造方法。
47. The method according to claim 46, wherein the pressing is performed using a roll press.
JP12124697A 1996-05-14 1997-05-12 Manufacturing method of liquid crystal element Expired - Fee Related JP3689529B2 (en)

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JP12124697A JP3689529B2 (en) 1996-05-14 1997-05-12 Manufacturing method of liquid crystal element

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Application Number Priority Date Filing Date Title
JP8-119392 1996-05-14
JP11939296 1996-05-14
JP12124697A JP3689529B2 (en) 1996-05-14 1997-05-12 Manufacturing method of liquid crystal element

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JP3689529B2 JP3689529B2 (en) 2005-08-31

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001032555A1 (en) * 1999-11-04 2001-05-10 Japan Science And Technology Corporation Substrate with feedthrough and method for manufacturing the same
KR100690604B1 (en) * 2000-12-28 2007-03-09 엘지전자 주식회사 Multilayer hologram diffuser and fabrication method thereof
US20180348627A1 (en) * 2016-01-27 2018-12-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
US10969686B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
US10969677B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001032555A1 (en) * 1999-11-04 2001-05-10 Japan Science And Technology Corporation Substrate with feedthrough and method for manufacturing the same
KR100690604B1 (en) * 2000-12-28 2007-03-09 엘지전자 주식회사 Multilayer hologram diffuser and fabrication method thereof
US20180348627A1 (en) * 2016-01-27 2018-12-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
US10969686B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
US10969677B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask
US11029596B2 (en) * 2016-01-27 2021-06-08 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby

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