JPH10506225A - 粒子ビーム色収差補正コラム - Google Patents
粒子ビーム色収差補正コラムInfo
- Publication number
- JPH10506225A JPH10506225A JP8516789A JP51678996A JPH10506225A JP H10506225 A JPH10506225 A JP H10506225A JP 8516789 A JP8516789 A JP 8516789A JP 51678996 A JP51678996 A JP 51678996A JP H10506225 A JPH10506225 A JP H10506225A
- Authority
- JP
- Japan
- Prior art keywords
- lens
- particle
- column
- interleaved
- chromatic aberration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002245 particle Substances 0.000 title claims abstract description 33
- 230000004075 alteration Effects 0.000 title claims description 58
- 230000005291 magnetic effect Effects 0.000 claims description 19
- 230000003287 optical effect Effects 0.000 claims description 10
- 238000000605 extraction Methods 0.000 claims description 9
- 238000000926 separation method Methods 0.000 claims description 5
- 230000005684 electric field Effects 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims 1
- 210000003462 vein Anatomy 0.000 claims 1
- 238000010884 ion-beam technique Methods 0.000 abstract description 11
- 229910045601 alloy Inorganic materials 0.000 abstract description 5
- 239000000956 alloy Substances 0.000 abstract description 5
- 229910001338 liquidmetal Inorganic materials 0.000 abstract description 5
- 239000007788 liquid Substances 0.000 abstract description 4
- 150000002500 ions Chemical class 0.000 description 53
- 238000005468 ion implantation Methods 0.000 description 5
- 230000001133 acceleration Effects 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000005459 micromachining Methods 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- 238000011144 upstream manufacturing Methods 0.000 description 3
- 230000009977 dual effect Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 230000005389 magnetism Effects 0.000 description 2
- 238000004949 mass spectrometry Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000005405 multipole Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 108010083687 Ion Pumps Proteins 0.000 description 1
- 229910002065 alloy metal Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005292 diamagnetic effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 210000003746 feather Anatomy 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000001886 ion microscopy Methods 0.000 description 1
- 238000002164 ion-beam lithography Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000004452 microanalysis Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/26—Arrangements for deflecting ray or beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/10—Lenses
- H01J37/145—Combinations of electrostatic and magnetic lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/049—Focusing means
- H01J2237/0492—Lens systems
- H01J2237/04926—Lens systems combined
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/05—Arrangements for energy or mass analysis
- H01J2237/057—Energy or mass filtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/08—Ion sources
- H01J2237/0802—Field ionization sources
- H01J2237/0805—Liquid metal sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/153—Correcting image defects, e.g. stigmators
- H01J2237/1534—Aberrations
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Particle Accelerators (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.針状粒子源、抽出電極、集束レンズ、および精細に集束された粒子ビームを つくるためのインターリーブ四極レンズ装置を含む粒子光学コラム。この中、イ ンターリーブレンズはインターリーブレンズのマイナスの色収差は、他の全部の 粒子光学部品のプラスの色収差を補正する様な、電場対磁場比に於いて使用され 、像点直径は粒子エネルギーの小さな変化からは実質的に独立している。 2.請求項1の粒子光学コラムに加えて、イオン源と、単一質量の粒子の精細に 集束されたビームをつくるためのインターリーブ四極レンズの間に在る、ヴィー ン速度フィルターを含む粒子光学コラム。 3.請求項2の質量分離粒子光学コラムに加えて、ヴィーンフィルター内を幅広 のビームを通過させる光学コラムに比して収差を減少する様にヴィーンフィルタ ー中で交差するビームを含むコラム。 4.針状粒子源、抽出電極、及び精細に集束された粒子ビームを生成するための 複数のインターリーブ四極レンズを含む粒子光学コラム。この中のインターリー ブレンズは、針状粒子源と抽出電極によって出来たプラスの色収差を増やさない 様に、又、細いビームを生成するために静電レンズのみを使ったコラムに比べて 像点直径のエネルギー依存が減らされる様に、電場対磁場の臨界比にて、操作さ れる。 5.請求項4の粒子光学コラムに加えて、イオン源とインターリーブ四極レンズ の間に在るヴィーン速度フィルターを含むコラム。このコラムは、精細に集束さ れた単一質量の粒子からなるビームを生成するのに役立つ。 6.請求項5の質量分離粒子光学コラムに加えて、幅広いビームがヴィーンフィ ルターを通過するコラムに比して収差を減少する様にヴィーンフィルター中で交 差するビームを含む光学コラム。 7.針状イオン源と複数のレンズを含む精細に集束された粒子ビームを生成する 粒子光学コラムに加えて、インターリーブレンズのマイナスの色収差が、他の全 部の粒子光学部品のプラスの色収差を正確に補正し、且つ像点直径は粒子エネル ギーの小さな変化からは実質的に独立している様な電場対磁場の臨界比に於いて 使用されるインターリーブ四極レンズ装置を含むコラム。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/US1994/013358 WO1996016426A1 (en) | 1993-08-20 | 1994-11-18 | Chromatically compensated particle-beam column |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH10506225A true JPH10506225A (ja) | 1998-06-16 |
JP3844253B2 JP3844253B2 (ja) | 2006-11-08 |
Family
ID=22243299
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP51678996A Expired - Fee Related JP3844253B2 (ja) | 1994-11-18 | 1994-11-18 | 粒子ビーム色収差補償コラム |
Country Status (8)
Country | Link |
---|---|
EP (1) | EP0745266B1 (ja) |
JP (1) | JP3844253B2 (ja) |
KR (1) | KR100308720B1 (ja) |
AU (1) | AU689528B2 (ja) |
CA (1) | CA2188997C (ja) |
DE (1) | DE69432670T2 (ja) |
RU (1) | RU2144237C1 (ja) |
WO (1) | WO1996016426A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008192596A (ja) * | 2007-02-06 | 2008-08-21 | Ict Integrated Circuit Testing Ges Fuer Halbleiterprueftechnik Mbh | 収差補正型質量分離装置 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998025293A2 (en) * | 1996-12-03 | 1998-06-11 | Koninklijke Philips Electronics N.V. | Method of operating a particle-optical apparatus |
US6593578B1 (en) * | 2001-11-08 | 2003-07-15 | Schlumberger Technologies, Inc. | Wien filter for use in a scanning electron microscope or the like |
WO2013120097A1 (en) * | 2012-02-09 | 2013-08-15 | Fluxion Inc. | Compact, filtered ion source |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4555666A (en) * | 1979-03-29 | 1985-11-26 | Martin Frederick W | Energy-stable accelerator with needle-like source and focused particle beam |
US4590379A (en) * | 1980-09-16 | 1986-05-20 | Martin Frederick W | Achromatic deflector and quadrupole lens |
EP0175933A1 (de) * | 1984-09-21 | 1986-04-02 | Siemens Aktiengesellschaft | Rasterlinsen-System ohne Ablenkfarbfehler zur Materialbearbeitung mit Korpuskularstrahlen |
-
1994
- 1994-11-18 RU RU96116893A patent/RU2144237C1/ru not_active IP Right Cessation
- 1994-11-18 EP EP95904093A patent/EP0745266B1/en not_active Expired - Lifetime
- 1994-11-18 DE DE69432670T patent/DE69432670T2/de not_active Expired - Lifetime
- 1994-11-18 WO PCT/US1994/013358 patent/WO1996016426A1/en active IP Right Grant
- 1994-11-18 JP JP51678996A patent/JP3844253B2/ja not_active Expired - Fee Related
- 1994-11-18 KR KR1019960703883A patent/KR100308720B1/ko not_active IP Right Cessation
- 1994-11-18 AU AU13706/95A patent/AU689528B2/en not_active Ceased
- 1994-11-18 CA CA002188997A patent/CA2188997C/en not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008192596A (ja) * | 2007-02-06 | 2008-08-21 | Ict Integrated Circuit Testing Ges Fuer Halbleiterprueftechnik Mbh | 収差補正型質量分離装置 |
US8049180B2 (en) | 2007-02-06 | 2011-11-01 | Ict, Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh | Achromatic mass separator |
Also Published As
Publication number | Publication date |
---|---|
CA2188997C (en) | 2002-08-06 |
WO1996016426A1 (en) | 1996-05-30 |
DE69432670T2 (de) | 2004-03-11 |
AU689528B2 (en) | 1998-04-02 |
EP0745266B1 (en) | 2003-05-14 |
CA2188997A1 (en) | 1996-05-30 |
EP0745266A1 (en) | 1996-12-04 |
RU2144237C1 (ru) | 2000-01-10 |
AU1370695A (en) | 1996-06-17 |
KR100308720B1 (ko) | 2001-12-15 |
EP0745266A4 (en) | 1998-01-28 |
DE69432670D1 (de) | 2003-06-18 |
JP3844253B2 (ja) | 2006-11-08 |
KR970700926A (ko) | 1997-02-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP2365514B1 (en) | Twin beam charged particle column and method of operating thereof | |
CN102468104B (zh) | 带有集成静电能量过滤器的带电粒子源 | |
CN102064074B (zh) | 用于粒子光学透镜的轴向像差的校正器 | |
US6924488B2 (en) | Charged-particle beam apparatus equipped with aberration corrector | |
EP2478546B1 (en) | Distributed ion source acceleration column | |
US5369279A (en) | Chromatically compensated particle-beam column | |
JP4133602B2 (ja) | 荷電粒子ビーム装置における収差補正方法および荷電粒子ビーム装置 | |
JP2012227141A (ja) | ビームから中性物質を除去する収差補正のウィーンe×b質量フィルタ | |
EP0155283B1 (en) | Focused ion beam column | |
JPH02229418A (ja) | 集束されたイオンビームコラム | |
US8049180B2 (en) | Achromatic mass separator | |
JP4343951B2 (ja) | 荷電粒子ビーム系用の単段式荷電粒子ビームエネルギー幅低減系 | |
JPH10506225A (ja) | 粒子ビーム色収差補正コラム | |
EP0079931B1 (en) | Focused ion beam microfabrication column | |
TWM634731U (zh) | 帶電粒子束操縱設備和帶電粒子束設備 | |
JP6432905B2 (ja) | リターディングを用いたエネルギーアナライザ・モノクロメータ | |
Tsuno | Simulation of a Wien filter as beam separator in a low energy electron microscope | |
US20240170248A1 (en) | Particle beam system | |
WO2009141655A2 (en) | Improved particle beam generator | |
EP2312610B1 (en) | Charged particle device with an achromatic beam deflector, or an achromatic beam separator, and method of operating |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20040914 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20041214 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20050207 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20050314 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20060725 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20060811 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100825 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100825 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110825 Year of fee payment: 5 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120825 Year of fee payment: 6 |
|
LAPS | Cancellation because of no payment of annual fees |