JPH1050600A5 - - Google Patents
Info
- Publication number
- JPH1050600A5 JPH1050600A5 JP1996221752A JP22175296A JPH1050600A5 JP H1050600 A5 JPH1050600 A5 JP H1050600A5 JP 1996221752 A JP1996221752 A JP 1996221752A JP 22175296 A JP22175296 A JP 22175296A JP H1050600 A5 JPH1050600 A5 JP H1050600A5
- Authority
- JP
- Japan
- Prior art keywords
- baseline amount
- pattern formed
- image
- exposed
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22175296A JP3651630B2 (ja) | 1996-08-05 | 1996-08-05 | 投影露光方法及び投影露光装置 |
| US08/905,330 US6243158B1 (en) | 1996-08-05 | 1997-08-04 | Projection exposure apparatus and method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22175296A JP3651630B2 (ja) | 1996-08-05 | 1996-08-05 | 投影露光方法及び投影露光装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH1050600A JPH1050600A (ja) | 1998-02-20 |
| JPH1050600A5 true JPH1050600A5 (cg-RX-API-DMAC7.html) | 2004-08-26 |
| JP3651630B2 JP3651630B2 (ja) | 2005-05-25 |
Family
ID=16771662
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22175296A Expired - Fee Related JP3651630B2 (ja) | 1996-08-05 | 1996-08-05 | 投影露光方法及び投影露光装置 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US6243158B1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP3651630B2 (cg-RX-API-DMAC7.html) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7050957B2 (en) * | 2001-02-26 | 2006-05-23 | Agere Systems Inc. | Projection electron beam lithography apparatus and method employing an estimator |
| EP1398601A3 (en) * | 2002-09-13 | 2014-05-07 | Canon Kabushiki Kaisha | Head up display for navigation purposes in a vehicle |
| TWI654661B (zh) | 2004-11-18 | 2019-03-21 | 日商尼康股份有限公司 | 位置測量方法、位置控制方法、測量方法、裝載方法、曝光方法及曝光裝置、及元件製造方法 |
| JP4756984B2 (ja) * | 2005-10-07 | 2011-08-24 | キヤノン株式会社 | 露光装置、露光装置の制御方法およびデバイスの製造方法 |
| NL2007215A (en) | 2010-09-08 | 2012-03-12 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate. |
| JP6338778B2 (ja) * | 2014-12-02 | 2018-06-06 | エーエスエムエル ネザーランズ ビー．ブイ． | リソグラフィ方法及び装置 |
| EP4251964A4 (en) * | 2020-11-24 | 2024-10-16 | Applied Materials, Inc. | METHOD FOR OPTICAL RESOLUTION MEASUREMENT IN OPTICAL DEVICES |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5243195A (en) | 1991-04-25 | 1993-09-07 | Nikon Corporation | Projection exposure apparatus having an off-axis alignment system and method of alignment therefor |
| US5654553A (en) * | 1993-06-10 | 1997-08-05 | Nikon Corporation | Projection exposure apparatus having an alignment sensor for aligning a mask image with a substrate |
| JPH07249558A (ja) * | 1994-03-09 | 1995-09-26 | Nikon Corp | 位置合わせ方法 |
| JP3315540B2 (ja) * | 1994-10-28 | 2002-08-19 | キヤノン株式会社 | 位置計測装置、位置合わせ装置、露光装置およびデバイスの製造方法 |
| US5751404A (en) * | 1995-07-24 | 1998-05-12 | Canon Kabushiki Kaisha | Exposure apparatus and method wherein alignment is carried out by comparing marks which are incident on both reticle stage and wafer stage reference plates |
| JPH0963924A (ja) * | 1995-08-18 | 1997-03-07 | Nikon Corp | アライメント方法 |
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1996
- 1996-08-05 JP JP22175296A patent/JP3651630B2/ja not_active Expired - Fee Related
-
1997
- 1997-08-04 US US08/905,330 patent/US6243158B1/en not_active Expired - Fee Related