JPH1045435A - Low-reflection glass - Google Patents

Low-reflection glass

Info

Publication number
JPH1045435A
JPH1045435A JP8201995A JP20199596A JPH1045435A JP H1045435 A JPH1045435 A JP H1045435A JP 8201995 A JP8201995 A JP 8201995A JP 20199596 A JP20199596 A JP 20199596A JP H1045435 A JPH1045435 A JP H1045435A
Authority
JP
Japan
Prior art keywords
thin film
layer
glass
low
refractive index
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8201995A
Other languages
Japanese (ja)
Inventor
Akira Sakata
昭 坂田
Atsushi Takamatsu
敦 高松
Takeshi Kondo
剛 近藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Priority to JP8201995A priority Critical patent/JPH1045435A/en
Publication of JPH1045435A publication Critical patent/JPH1045435A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/40Coatings comprising at least one inhomogeneous layer
    • C03C2217/42Coatings comprising at least one inhomogeneous layer consisting of particles only

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

PROBLEM TO BE SOLVED: To produce a low-reflection glass having an excellent surface low- reflection function and self-cleaning function capable of maintaining both functions for a long time and capable of keeping the low-reflection by making a soil such as finger mark and sweat always inconspicuous. SOLUTION: A thin film layer having a refractive index (n1 ) of 1.78-2.30 and a film thickness (d1 ) of 20-120nm is formed on at least one side surface of a transparent glass substrate as the first layer on the side of the glass, then the thin film layer having the refractive index (n2 ) of 1.46-1.90 and the film thickness (d2 ) of 40-120nm and dispersed with TiO2 fine particles having an optically active function is laminated on the first thin film layer as the second layer, and the refractive indexes satisfy (n1 )>(n2 ).

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、表面反射低減機能
とセルフクリ−ニング機能とを併せ持ち、例えば表面に
付着する指紋、油脂などの汚染物、汗その他の汚れ等を
紫外線存在下でセルフクリ−ニングすることで排除し、
表面反射低減機能を長く持続できて、優れた視認性を保
持して誤認をなくすることができ、セキュリティ上や安
全上の向上に寄与する低反射ガラスに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention has both a function of reducing surface reflection and a function of self-cleaning. For example, self-cleaning of fingerprints, oils and other contaminants, sweat and other dirt, etc. adhering to the surface in the presence of ultraviolet rays. By eliminating
The present invention relates to a low-reflection glass capable of maintaining a surface reflection reducing function for a long time, maintaining excellent visibility and eliminating false recognition, and contributing to improvement in security and safety.

【0002】本発明の低反射ガラスは、建築用、車両
用、船舶あるいは航空機等の窓ガラス、CD機など各種電
子電気機器用のタッチパネル、さらには調理用品のガラ
ス、展示用の各種ショウケ−スやカバ−ガラス、各種表
示用スクリ−ン等、広い分野で採用できる有用なもので
ある。
The low-reflection glass of the present invention is used as a window glass for buildings, vehicles, ships or aircraft, a touch panel for various electronic and electric devices such as a CD machine, a glass for cooking utensils, and various showcases for exhibitions. This is a useful material that can be used in a wide range of fields, such as glass, cover glass, and various display screens.

【0003】[0003]

【従来の技術】従来から、低反射ガラスならびに該範疇
に属するガラスが各種提案がなされ種々の分野で採用さ
れてきているが、その一方で例えば干渉タイプの低反射
ガラス等において、該ガラスの膜表面に指紋、汗、手垢
あるいは油脂などの汚染物等の汚れによって光学設計が
狂い、低反射特性が機能し難くなるばかりか、逆に反射
率が増大するようになって低反射ガラスとしての所期の
目的が達成できなくなるため、これを防止しようとする
提案が特にタッチパネル等において種々なされてきてい
る。
2. Description of the Related Art Conventionally, various low-reflection glasses and glasses belonging to the category have been proposed and adopted in various fields. On the other hand, for example, in the case of interference-type low-reflection glass and the like, the film of the glass is used. Dirt such as fingerprints, sweat, hand stains, and oils and fats on the surface degrades the optical design, making low-reflection characteristics difficult to function. Conversely, the reflectivity increases and the surface becomes a low-reflection glass. Since it is no longer possible to achieve the desired purpose, various proposals have been made to prevent this, especially for touch panels and the like.

【0004】例えば、特開昭60-49079号公報には指紋付
着防止剤が記載されており、炭素数4〜21個のポリフル
オロアルキル基又はポリフルオロエ─テル基を含有する
化合物を含むものが記載されている。
[0004] For example, Japanese Patent Application Laid-Open No. 60-49079 discloses an antifingerprint agent, which contains a compound containing a polyfluoroalkyl group or a polyfluoroether group having 4 to 21 carbon atoms. Have been.

【0005】また例えば、実願昭59-143325 号のマイク
ロフイルム(実開昭61-57423号)にはタッチパネルの構
造が記載されており、タッチパネル本体の表面に、微細
な凹凸を設けることが記載されている。
For example, the structure of a touch panel is described in a microfilm of Japanese Utility Model Application No. 59-143325 (Japanese Utility Model Application Laid-Open No. 61-57423), and it is described that fine irregularities are provided on the surface of the touch panel body. Have been.

【0006】また例えば、実願昭60-152692 号のマイク
ロフイルム(実開昭62-59922号)には透明タッチパネル
が記載されており、表面に電極を形成した基板を対向配
置してなるメンプレン方式の透明タッチパネルのタッチ
面となる透明基板の外面に透明な耐擦傷性のある弗素系
樹脂を塗布したことが記載されている。
For example, a transparent touch panel is described in a microfilm of Japanese Utility Model Application No. 60-152692 (Japanese Utility Model Application Laid-Open No. 62-59922), and a membrane system in which substrates having electrodes formed on the surface thereof are opposed to each other. It discloses that a transparent abrasion-resistant fluorine-based resin is applied to the outer surface of a transparent substrate serving as a touch surface of a transparent touch panel.

【0007】また例えば、実願平2-5072号のマイクロフ
イルム(実開平3-96639 号)には投射型表示装置用スク
リ−ン及びそれを用いた投射型表示装置が記載されてお
り、液晶素子の少なくとも観察者側に低反射層を設けた
ことが記載されている。
For example, a microfilm (Japanese Utility Model Application Laid-Open No. 3-96639) of Japanese Utility Model Application No. Hei 2-5072 describes a screen for a projection type display device and a projection type display device using the same. It is described that a low reflection layer is provided on at least the observer side of the element.

【0008】また例えば、特開平4-171521号公報にはタ
ッチパネルが記載されており、透明基板上の透明導電膜
が無機質膜上に有機質膜を重ねた複合透明保護膜で被覆
され、有機質膜が最表層であることが記載され、有機質
膜がフッ素樹脂膜あるいは有機物超微粒子膜あるいは有
機系ハ−ドコ−ト膜であることが記載されている。
For example, Japanese Patent Application Laid-Open No. 4-171521 discloses a touch panel, in which a transparent conductive film on a transparent substrate is covered with a composite transparent protective film in which an organic film is stacked on an inorganic film, and the organic film is It is described that it is the outermost layer, and that the organic film is a fluororesin film, an organic ultrafine particle film, or an organic hard coat film.

【0009】また例えば、特開平6-110049号公報には撥
油性皮膜を有する液晶表示装置が記載されており、基板
表面にシロキサン結合を介して化学結合させた保護膜を
備えていることが記載されている。
[0009] For example, Japanese Patent Application Laid-Open No. 6-110049 discloses a liquid crystal display device having an oil-repellent film, which describes that a substrate is provided with a protective film chemically bonded through a siloxane bond. Have been.

【0010】また例えば、特開平7-116623号公報には反
射防止層の油脂膜除去方法が記載されており、反射防止
層の表面に指紋等として付着した油脂膜に粘着層を圧着
し、ついでその粘着層を油脂膜の移着下に剥離すること
が記載されている。
[0010] For example, Japanese Patent Application Laid-Open No. Hei 7-116623 describes a method of removing an oil film from an antireflection layer. An adhesive layer is press-bonded to an oil film adhering as a fingerprint or the like to the surface of the antireflection layer. It is described that the adhesive layer is peeled off while transferring an oil film.

【0011】一方例えば特開昭64-70701号公報には導電
性反射防止膜を有する透明板が記載されており、導電性
付与の金属膜上に、屈折率が1.90〜2.50でかつ膜厚が20
0 Å〜400 Åの高屈折率誘電体膜と、該表面上に屈折率
が1.35〜1.50でかつ膜厚が700 Å〜1200Åの低屈折率誘
電体膜とからなるものが開示されている。
On the other hand, for example, JP-A-64-70701 discloses a transparent plate having a conductive anti-reflection film, and has a refractive index of 1.90 to 2.50 and a film thickness on a metal film for imparting conductivity. 20
A film comprising a high-refractive-index dielectric film having a refractive index of 0 ° to 400 ° and a low-refractive-index dielectric film having a refractive index of 1.35 to 1.50 and a film thickness of 700 ° to 1200 ° on its surface is disclosed.

【0012】さらにまた他方で、紫外線が照射されるこ
とで有機化合物の汚れを分解(酸化)促進する機能を発
揮する物質としてTiO2、V2O5、ZnO 、WO3 、Fe2O3 等が
知られ、ことにアナタ−ゼ型の結晶型のTiO2微粒子は光
触媒としての効果が優れていることが知られている。最
近例えば特開平7-232080号公報には光触媒機能を有する
多機能材及びその製造方法が記載されている等が知られ
ている。
[0012] On the other hand, TiO 2 , V 2 O 5 , ZnO, WO 3 , Fe 2 O 3, and the like are substances that exhibit a function of promoting the decomposition (oxidation) of stains on organic compounds when irradiated with ultraviolet rays. In particular, it is known that anatase-type crystal TiO 2 fine particles have an excellent effect as a photocatalyst. Recently, for example, Japanese Patent Application Laid-Open No. 7-232080 discloses a multifunctional material having a photocatalytic function and a method for producing the same.

【0013】[0013]

【発明が解決しようとする課題】前述した例えば、特開
昭60-49079号公報に記載の指紋付着防止剤、実願昭60-1
52692 号のマイクロフイルム(実開昭62-59922号)に記
載の透明タッチパネル、実願平2-5072号のマイクロフイ
ルム(実開平3-96639 号)に記載の投射型表示装置用ス
クリ−ン及びそれを用いた投射型表示装置、特開平4-17
1521号公報に記載のタッチパネルならびに特開平6-1100
49号公報に記載の撥油性皮膜を有する液晶表示装置等で
は、フッ素樹脂膜やシロキサン結合を介して化学結合さ
せた保護膜や低反射層あるいはシリコ−ン系膜層等の各
種汚れを付着し難くする防汚性膜を施すものである。
For example, the aforementioned anti-fingerprint agent disclosed in JP-A-60-49079 is disclosed in
The transparent touch panel described in the microfilm of No. 52692 (Japanese Utility Model Application Laid-Open No. 62-59922), the screen for the projection display device described in the microfilm of Japanese Utility Model Application No. 2-5072 (Japanese Utility Model Application No. 3-96639), and Projection type display device using the same, JP-A-4-17
No. 1521 JP-A-6100
In the liquid crystal display device having an oil-repellent film described in Japanese Patent Publication No. 49, various kinds of dirt such as a fluororesin film, a protective film chemically bonded through a siloxane bond, a low-reflection layer or a silicon-based film layer are adhered. This is to provide an antifouling film to make it difficult.

【0014】また実願昭59-143325 号のマイクロフイル
ム(実開昭61-57423号)に記載のタッチパネルの構造で
は微細な凹凸表面とすることで同様に各種汚れを付着し
難くするものであり、特開平7-116623号公報に記載の反
射防止層の油脂膜除去方法では反射防止層の表面に指紋
等の付着油脂膜に対し、強制的に粘着層を圧着し、該粘
着層に前記付着油脂膜を移着させ、強制的に剥離しよう
とするものである。
In the structure of the touch panel described in the microfilm of Japanese Utility Model Application No. 59-143325 (Japanese Utility Model Application No. 61-57423), various dirts are similarly hardly adhered by forming a fine uneven surface. According to the method for removing an oil film from the antireflection layer described in JP-A-7-116623, an adhesive layer is forcibly pressed against an oil film such as a fingerprint on the surface of the antireflection layer, and the adhesive layer is adhered to the adhesive layer. It is intended to transfer the oil film and forcibly peel it off.

【0015】また一方で例えば、特開昭64-70701号公報
に記載の導電性反射防止膜では、干渉タイプの反射防止
膜のため、膜面に汗や汚れなどの被膜ができると光学設
計が狂い反射防止特性がなくなるばかりか逆に反射率が
増して高反射膜化したり、また反射色調が膜面にできた
汗や汚れなどの被膜部だけその色調が変わり目立つよう
になり、そのために、洗浄などのクリ−ニングを頻繁に
する必要があるものとなる。また、これらの汚れを防止
するためには、これら各種汚れを付着し難くする防汚性
膜を施す程度のみでは不充分であり、反射低減をなしつ
つ汚れが常に目立たないようセルフクリ−ニング機能を
併せもつようにしなければならないものであった。
On the other hand, for example, the conductive anti-reflection film described in Japanese Patent Application Laid-Open No. 64-70701 is an interference type anti-reflection film. Therefore, if a film such as sweat or dirt is formed on the film surface, an optical design is required. Not only does the anti-reflective property disappear, but also the reflectance increases and the film becomes highly reflective, and the color tone changes and becomes noticeable only in the film part such as sweat and dirt on the film surface, and therefore, Frequent cleaning such as cleaning is required. In order to prevent these stains, it is not sufficient to apply only an antifouling film which makes these various stains difficult to adhere, and a self-cleaning function is provided so that the stains are not always noticeable while reducing reflection. They had to be combined.

【0016】[0016]

【課題を解決するための手段】本発明は、従来のかかる
欠点に鑑みてなしたものであって、透明ガラス基板の少
なくとも片側表面、好ましくは表裏両面に形成した2層
系の反射防止薄膜において、該積層薄膜の最外層薄膜に
光活性作用を持つTiO2微粒子を分散させた薄膜を用い、
セルフクリ−ニング機能を付与し、また各層の膜厚およ
び屈折率を適宜組み合わせて調整して特定し、適宜適切
な反射率に低減するようにすることで、優れた反射低減
をなして高い視認性や居住性や安全性等を得ることがで
きることに加え、紫外線存在下で汚れが常に目立たない
ようにするセルフクリ−ニング機能を併せもつようにし
た有用な低反射ガラスを提供するものである。
SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned drawbacks, and is directed to a two-layer antireflection thin film formed on at least one surface of a transparent glass substrate, preferably on both front and back surfaces. Using a thin film in which TiO 2 fine particles having a photoactive effect are dispersed in the outermost thin film of the laminated thin film,
By providing a self-cleaning function, adjusting the thickness and the refractive index of each layer by appropriately combining and specifying them, and appropriately reducing the reflectance, the reflection is excellently reduced, and the visibility is high. Another object of the present invention is to provide a useful low-reflection glass having a self-cleaning function for making dirt always inconspicuous in the presence of ultraviolet rays, in addition to obtaining a low-reflection glass in addition to providing high comfort and comfort.

【0017】すなわち、本発明は、透明ガラス基板の少
なくとも片側表面に、ガラス面側から第1層目として屈
折率n1が1.78〜2.30であってかつ膜厚d1が20〜120nm の
薄膜層を形成し、次いで該第1層目の薄膜層上に、第2
層目として屈折率n2が1.46〜1.90であってかつ膜厚d2
40〜120nm でありかつ光活性作用を有するTiO2微粒子を
分散させた薄膜層を被覆積層して成り、しかも前記屈折
率がn1>n2であることを特徴とする低反射ガラス。
That is, the present invention provides a thin film layer having a refractive index n 1 of 1.78 to 2.30 and a thickness d 1 of 20 to 120 nm as a first layer from the glass surface side on at least one surface of a transparent glass substrate. Is formed, and then a second layer is formed on the first thin film layer.
The refractive index n 2 as a layer th a 1.46 to 1.90 and the thickness d 2
A low-reflection glass, which is formed by coating and laminating a thin film layer in which TiO 2 fine particles having a photoactive action and having a wavelength of 40 to 120 nm are dispersed, and wherein the refractive index is n 1 > n 2 .

【0018】ならびに、前記第1層目の薄膜が、SiO2
TiO2、Al2O3 、ZrO2、SnO2、B2O3およびこれらから2種
以上選択し組み合わせた複合膜であることを特徴とする
上述した低反射ガラス。
Further, the first thin film is made of SiO 2 ,
The low-reflection glass described above, which is a composite film of TiO 2 , Al 2 O 3 , ZrO 2 , SnO 2 , B 2 O 3 and a combination of two or more thereof.

【0019】また、前記第2層目の光活性作用を有する
TiO2微粒子を分散させた薄膜が、SiO2、Al2O3 、ZrO2
SnO2およびこれらを組み合わせた複合膜であることを特
徴とする上述した低反射ガラス。
The second layer has a photoactive effect.
Thin film with TiO 2 fine particles dispersed, SiO 2 , Al 2 O 3 , ZrO 2 ,
The low reflection glass described above, which is a composite film comprising SnO 2 and a combination thereof.

【0020】さらに、前記光活性作用を有するTiO2微粒
子が、アナタ−ゼ型であって、平均粒径が3nm以上50nm
以下であることを特徴とする上述した低反射ガラスを提
供するものである。
Further, the TiO 2 fine particles having a photoactive effect are anatase type and have an average particle diameter of 3 nm or more and 50 nm or less.
The object of the present invention is to provide the above-described low reflection glass characterized by the following.

【0021】[0021]

【発明の実施の形態】ここで、ガラス面側から第1層目
として屈折率n1が1.78〜2.30であってかつ膜厚d1が20〜
120nm の薄膜層を形成し、次いで該第1層目の薄膜層上
に、第2層目として屈折率n2が1.46〜1.90であってかつ
膜厚d2が40〜120nm でありかつ光活性作用を有するTiO2
微粒子を分散させた薄膜層を被覆積層して成り、しかも
前記屈折率がn1>n2であることで成ることとしたのは、
例えば屈折率が2.3 を超える高屈折率薄膜等を用い、前
記薄膜層を2層を超えて多層薄膜層にするにしたがっ
て、多重干渉によって反射が強くなってきて、可視光透
過率が70%以上あるいは反射低減が所期の値となり難い
ものとなるからであり、第1ならびに第2層薄膜の前記
屈折率ならびに前記膜厚の値内でなければ、例えば可視
光反射率が3%以上となる等、到底反射低減せしめたガ
ラスとは言えないものとなるからである。
DETAILED DESCRIPTION OF THE INVENTION Here, a refractive index n 1 is 1.78 to 2.30 and 20 to the thickness d 1 as the first layer from the glass surface side
Forming a thin film layer of 120 nm, then the first layer of the thin film layer, the refractive index n 2 as the second layer is a 1.46 to 1.90 and the thickness d 2 is 40~120nm and photoactive TiO 2 with action
It comprises a thin film layer in which fine particles are dispersed by coating stack, yet the said refractive index was that made by a n 1> n 2 is
For example, when a high refractive index thin film having a refractive index of more than 2.3 is used, and as the thin film layer becomes more than two layers and becomes a multilayer thin film layer, the reflection becomes stronger due to multiple interference, and the visible light transmittance becomes 70% or more. Alternatively, this is because the reflection reduction is unlikely to be the expected value. If the refractive index and the film thickness of the first and second thin films are not within the values, for example, the visible light reflectance becomes 3% or more. This is because the glass cannot be said to be a glass whose reflection has been reduced at all.

【0022】また、前記第1層目の屈折率n1を1.78〜2.
30としたのは、ゾルケル法では2.30を超える酸化物薄膜
ができ難いし、1.78未満では可視光線反射率が3%以上
となり低反射とは言えなくなるためである。
The first layer has a refractive index n 1 of 1.78 to 2.
The reason for setting the value to 30 is that it is difficult to form an oxide thin film exceeding 2.30 by the Solkel method, and if it is less than 1.78, the visible light reflectance becomes 3% or more and it cannot be said that the reflection is low.

【0023】また、前記第2層目の屈折率n2を1.46〜1.
90としたのは、1.90を超えると可視光線反射率が3%以
上となり低反射とは言えなくなり、光活性TiO2微粒子の
含有率が高いほど膜強度が低下することとなり、1.46未
満では光活性TiO2微粒子をほとんど分散させることがで
きないため、セルフクリ−ニング機能が発揮できないか
らである。
The refractive index n 2 of the second layer is set to 1.46 to 1.
The reason for setting the value to 90 is that if it exceeds 1.90, the visible light reflectance becomes 3% or more and it cannot be said that the reflection is low, and the higher the content of the photoactive TiO 2 fine particles, the lower the film strength becomes. This is because the TiO 2 fine particles can hardly be dispersed and the self-cleaning function cannot be exhibited.

【0024】また、前記屈折率がn1>n2であることとし
たのは、n1<n2では低反射とはならないからである。さ
らにまた、例えば、第1層目の屈折率n1が1.78〜2.30
で、第2層目の屈折率n2が1.46〜1.90である場合、第1
層目薄膜層としては、モル比でTiO2:SiO2=40:60〜10
0 :0である薄膜と、第2層目薄膜層としては、モル比
で光活性TiO2微粒子:SiO2=1:99〜50:50である薄膜
とを組み合わせることが好ましい。さらにより好ましく
は、第1層目の屈折率n1が1.90〜2.10で、第2層目の屈
折率n2が1.54〜1.70である場合、第1層目薄膜層として
は、モル比でTiO2:SiO2=50:50〜85:15である薄膜
と、第2層目薄膜層としては、モル比で光活性TiO2微粒
子:SiO2=10:90〜30:70である薄膜とを組み合わせる
ことであり、良好な低反射性能でかつ良好なセルフクリ
−ニング機能を示すものとなる。
The reason that the refractive index satisfies n 1 > n 2 is that low reflection does not occur when n 1 <n 2 . Furthermore, for example, the refractive index n 1 of the first layer is 1.78 to 2.30
In, the refractive index n 2 of the second layer is from 1.46 to 1.90, the first
As the thin film layer, TiO 2 : SiO 2 = 40: 60 to 10 in molar ratio
It is preferable to combine a thin film having 0: 0 and a thin film having a molar ratio of photoactive TiO 2 fine particles: SiO 2 = 1: 99 to 50:50 as the second thin film layer. Even more preferably, a refractive index n 1 of the first layer is 1.90 to 2.10, if the second layer having a refractive index n 2 is from 1.54 to 1.70, as the first layer thin film layer, TiO molar ratio 2 : A thin film in which SiO 2 = 50: 50 to 85:15 and a thin film in which the molar ratio of photoactive TiO 2 fine particles: SiO 2 = 10: 90 to 30:70 are used as the second thin film layer. By combining them, a good low reflection performance and a good self-cleaning function can be obtained.

【0025】さらに、前記第1層目薄膜層の薄膜が、Si
O2、TiO2、Al2O3 、ZrO2、SnO2、B2O3およびこれらから
2種以上選択し組み合わせた複合膜から成ることが好ま
しく、これら単独の成分はもちろん、屈折率が比較的高
いTiO2(2.25程度)、ZrO2(1.95程度)、SnO2(1.9 程
度)と屈折率が比較的低いSiO2(1.45程度)、Al2O
3(1.65程度)、あるいはB2O3(1.60程度)とを種々組
み合わせて混合することで、自由にコントロールして屈
折率n1が1.78〜2.30になるような複合膜を得易く、かつ
耐久性に優れるものとなるからである。
Further, the thin film of the first thin film layer is made of Si
It is preferable to use a composite film of O 2 , TiO 2 , Al 2 O 3 , ZrO 2 , SnO 2 , B 2 O 3 and a combination of two or more selected from them. TiO 2 (about 2.25), ZrO 2 (about 1.95), SnO 2 (about 1.9), SiO 2 (about 1.45) with a relatively low refractive index, Al 2 O
3 (about 1.65), or B 2 O 3 (about 1.60) and by mixing various combinations of freely refractive index n 1 and the control tends to give a composite film such that from 1.78 to 2.30, and durable It is because it becomes what is excellent in nature.

【0026】さらに、前記第2層目薄膜層の薄膜が、Si
O2(1.45程度)、Al2O3 (1.65程度)の単独の成分はも
ちろん、これらSiO2、Al2O3 を組み合わせた複合膜、あ
るいはZrO2やSnO2の単独、もしくはSiO2やAl2O3 にZrO2
やSnO2を例えばモル比で10%以下程度組み合わせた複合
膜等が挙げられる。なお、該モル比で10%以下程度とし
たのは、この程度で耐久性が向上するが、逆に10%を超
えると屈折率が上がり低反射性能が悪くなり、光活性Ti
O2微粒子を入れる量を減少させることとなってセルフク
リ−ニング機能が低下することとなり、またその割りに
耐久性の向上が見られ難いからである。
Further, the thin film of the second thin film layer is made of Si
O 2 (approximately 1.45) and Al 2 O 3 (approximately 1.65) alone, of course, a composite film combining these SiO 2 and Al 2 O 3 , ZrO 2 and SnO 2 alone, or SiO 2 and Al 2 O 3 to ZrO 2
And a composite film in which SnO 2 is combined in a molar ratio of, for example, about 10% or less. In addition, the reason why the molar ratio is set to about 10% or less is that the durability is improved at this level, but if it exceeds 10%, the refractive index increases and the low reflection performance is deteriorated, and the photoactive Ti
This is because reducing the amount of the O 2 fine particles reduces the self-cleaning function, and it is difficult to improve the durability.

【0027】また、前記光活性作用を有するTiO2微粒子
としては、結晶構造がアナタ−ゼ型であり、その平均粒
径が3nm以上50nm以下であることが好ましく、より好ま
しくは4nm以上30nm以下のものである。粒径が50nmを超
えると、例えば塗布溶液中での分散性が悪くなり、均質
膜が得られ難くなるとともに、膜のヘイズ値が高くなり
視認性が悪化するようになる。
The TiO 2 fine particles having a photoactive effect have an anatase type crystal structure and an average particle diameter of preferably 3 nm to 50 nm, more preferably 4 nm to 30 nm. Things. If the particle size exceeds 50 nm, for example, the dispersibility in a coating solution will be poor, and it will be difficult to obtain a uniform film, and the haze value of the film will be high, and the visibility will be deteriorated.

【0028】さらに、光活性作用を有するTiO2微粒子分
散溶液としては、例えば、タイノックM-6 〔多木化学
(株)製、平均粒径が5nm、TiO2濃度が6%水溶液〕、
タイノックA-6 〔多木化学(株)製、平均粒径が10nm、
TiO2濃度が6%水溶液〕、ST-Kシリ−ズ〔石原産業
(株)製、平均粒径が20nm、SiO2バインダ−に分散させ
たもの〕等が挙げられ、特にタイノックM-6 程度が好ま
しいものである。
Further, as a TiO 2 fine particle dispersion having a photoactive action, for example, Taynock M-6 [manufactured by Takagi Chemical Co., Ltd., having an average particle size of 5 nm and a TiO 2 concentration of 6% aqueous solution],
Tynoc A-6 [manufactured by Taki Kagaku Co., Ltd., average particle size is 10 nm,
TiO 2 concentration 6% aqueous solution), ST-K series (manufactured by Ishihara Sangyo Co., Ltd., having an average particle size of 20 nm, dispersed in a SiO 2 binder) and the like. Is preferred.

【0029】さらに、希釈溶媒としては、特に限定され
ないが、エタノ−ル、メタノ−ル、イソプロパノ−ル、
アセトン、あるいはこれらの混合溶媒が好ましい。さら
にまた、前記2層薄膜の成膜方法としては、特に限定さ
れないが、ディッピング法、スピンコ−ト法、フレキソ
印刷法、ロ−ルコ−ト法、フロ−コ−ト法、スプレイ
法、印刷法、あるいは本出願人が既に出願提案した塗膜
方法等、既存の各種塗膜方法ならびにこれらの組み合わ
せた成膜法などが挙げられる。
The diluting solvent is not particularly limited, but may be ethanol, methanol, isopropanol, or the like.
Acetone or a mixed solvent thereof is preferred. Furthermore, the method for forming the two-layer thin film is not particularly limited, but includes dipping, spin coating, flexographic printing, roll coating, flow coating, spraying, and printing. Or various existing coating methods, such as a coating method already proposed by the present applicant, and a film forming method combining these methods.

【0030】さらにまた、ガラス基板としては、透明ガ
ラスであれば無色あるいは有色のどちらでもよい、すな
わち例えば、クリア、ブルー、ブロンズ、グレーあるい
はグリーンガラス等でもよく、特に自動車用窓材ではブ
ルー色系あるいはゴールド色系、グリーン色系、なかで
もグリーン色系色調で熱線・紫外線吸収性能を得やすい
ものであればより好ましいものである。また単板で使用
できることはもとより、また複層あるいは合せガラスあ
るいは強化ガラスまたは強度アップガラス、曲げガラス
等としても使用できることは言うまでもない。さらに、
ガラス基板が無機質でも有機質でもよいことは言うに及
ばない。
Further, the glass substrate may be colorless or colored as long as it is a transparent glass, that is, for example, clear, blue, bronze, gray or green glass. Alternatively, it is more preferable to use a gold color, a green color, and especially a green color tone that can easily obtain heat ray / ultraviolet absorption performance. Needless to say, it can be used not only as a single plate, but also as a multilayer, laminated glass, tempered glass, glass with increased strength, bent glass, and the like. further,
It goes without saying that the glass substrate may be inorganic or organic.

【0031】さらにまた、前記光活性チタニア微粒子が
光活性効果を示すのは紫外線に起因するものであり、紫
外線を多く含む太陽光が直接ふりそそぐ場所のみなら
ず、太陽光がガラス越しに当たる場所や太陽光が散乱な
どにより間接的に当たる場所、さらには太陽光が直接的
および間接的に当たらないところでも微量の紫外線を発
生する蛍光灯下にさらされた場所(屋内)など、広範囲
な場所や状況下で効果を示すものである。
Furthermore, the photoactive titania fine particles exhibit a photoactive effect due to ultraviolet rays, not only in a place where sunlight containing a large amount of ultraviolet rays directly flows, but also in a place where sunlight shines through glass or in a sunshine. In a wide range of places and conditions, such as places where light is indirectly hit by scattering, etc., or places exposed to fluorescent lights that generate a small amount of ultraviolet light even where sunlight is not directly or indirectly (indoors) This shows the effect.

【0032】前述したとおり、本発明の低反射ガラス
は、中屈折率n1の薄膜と光活性作用を有するTiO2微粒子
を分散させた低屈折率n2の薄膜とを、特定範囲の屈折率
ならびに所定の膜厚d1, d2と特定範囲の膜厚で適宜屈折
率がn1>n2であるように組み合わせ、シンプルな2層の
薄膜被覆積層にしたことにより、優れた表面反射低減機
能とセルフクリ−ニング機能とを併せ持ち、例えば表面
に付着する指紋、油脂などの汚染物、汗その他の汚れ等
を紫外線存在下でセルフクリ−ニングすることで排除し
つつ常に目立たないようにでき、ギラツキ感を抑えるこ
とができて優れた視認性を保持し誤認や違和感をなくす
ることができ、さらに高耐久性であって人や環境に優し
く、表面反射低減機能とセルフクリ−ニング機能を長く
持続できて、セキュリティ上や安全上の向上に寄与する
有用な低反射ガラスであり、建築用、車両用、船舶ある
いは航空機等の窓ガラス、CD機など各種電子電気機器用
のタッチパネル、さらには調理用品のガラス、展示用の
各種ショウケ−スやカバ−ガラス、各種表示用スクリ−
ン等、広い分野で採用できる。
As described above, the low-reflection glass of the present invention comprises a thin film having a medium refractive index n 1 and a thin film having a low refractive index n 2 in which fine particles of TiO 2 having photoactivity are dispersed. Excellent reduction in surface reflection by combining two layers of thin film coatings with a predetermined thickness d 1 and d 2 and a thickness in a specific range so that the refractive index is appropriately n 1 > n 2. It has both a function and a self-cleaning function.For example, fingerprints, contaminants such as oils and fats, sweat and other dirt, etc. adhering to the surface can be eliminated by self-cleaning in the presence of ultraviolet rays while always being inconspicuous. It can suppress the feeling of feeling, maintain excellent visibility, eliminate misunderstandings and discomfort, and is highly durable, friendly to people and the environment, and can maintain the surface reflection reduction function and self-cleaning function for a long time And secure It is a useful low-reflection glass that contributes to the improvement of safety and security, window glass for construction, vehicles, ships or aircraft, touch panels for various electronic and electrical devices such as CD machines, and glass for cooking utensils, Various showcases and cover glass for display, various display screens
Can be adopted in a wide range of fields such as

【0033】[0033]

【実施例】以下、実施例により本発明を具体的に説明す
る。ただし本発明は係る実施例に限定されるものではな
い。
The present invention will be described below in detail with reference to examples. However, the present invention is not limited to such an embodiment.

【0034】実施例1 加水分解させたテトラエトキシシラン〔Si(OC2H5)4〕と
同じく加水分解させたイソプロピルチタナ−ト〔Ti(OC3
H7)4〕をモル比で48:52となるように混合し、これにエ
タノ−ルを加え溶質濃度が約 0.42mol/l となるよう希
釈し第1層薄膜用アルコキシド溶液を調製した。この調
製溶液に、大きさ約100mm ×100mm で板厚約3mmのソ−
ダライムガラス(フロ−トガラス)板を浸漬し、約4mm
/秒の速度で引き上げてガラス表裏両面に被膜後、約30
0 ℃で約30分間加熱し、SiO2・TiO2薄膜からなる第1層
薄膜を得た。なお該調製溶液の粘度を測定したところ約
2.0mPa・s(2.0cP)であった。
Example 1 Hydrolyzed tetraethoxysilane [Si (OC 2 H 5 ) 4 ] and hydrolyzed isopropyl titanate [Ti (OC 3
H 7 ) 4 ] was mixed at a molar ratio of 48:52, and ethanol was added thereto to dilute the solute concentration to about 0.42 mol / l to prepare an alkoxide solution for the first layer thin film. A solution of about 100 mm x 100 mm and a plate thickness of about 3 mm was added to this prepared solution.
Dipped lime glass (float glass) plate, about 4mm
/ 30 sec / sec.
By heating at 0 ° C. for about 30 minutes, a first layer thin film composed of a SiO 2 .TiO 2 thin film was obtained. When the viscosity of the prepared solution was measured, it was approximately
It was 2.0 mPa · s (2.0 cP).

【0035】次に、チタニア(TiO2)微粒子分散水溶液
〔タイノックM-6 、多木化学(株)製、平均粒子径5n
m、TiO2濃度6%〕を約6倍のエタノ−ルで希釈し、約
1時間室温で攪拌した。次いでこの溶液に加水分解させ
たテトラエトキシシラン〔Si(OC2H5)4〕をシリカとチタ
ニアのモル比が88:12になるように加え、エタノ−ルで
溶質濃度が約 0.25mol/l となるよう希釈し、約10分間
室温でホモジナイザ−を用い攪拌し第2層薄膜用アルコ
キシド溶液を調製した。なお該調製溶液の粘度を測定し
たところ約2.3mPa・s(2.3cP)であった。
Next, an aqueous solution of titania (TiO 2 ) fine particles dispersed therein [Tynoc M-6, manufactured by Taki Kagaku KK, average particle size 5n
m, TiO 2 concentration 6%] was diluted with ethanol about 6 times and stirred at room temperature for about 1 hour. Next, hydrolyzed tetraethoxysilane [Si (OC 2 H 5 ) 4 ] was added to this solution so that the molar ratio of silica to titania was 88:12, and the solute concentration in ethanol was about 0.25 mol / l. And stirred at room temperature for about 10 minutes using a homogenizer to prepare an alkoxide solution for the second layer thin film. When the viscosity of the prepared solution was measured, it was about 2.3 mPa · s (2.3 cP).

【0036】続いて、上記第1層薄膜付きガラス板を、
この調製溶液に浸漬し、約4mm/秒の速度で引き上げた
後、約300 ℃で約30分間加熱し、前記TiO2微粒子を分散
したSiO2薄膜からなる第2層薄膜を得た。
Subsequently, the glass plate with the first layer thin film is
After being immersed in the prepared solution and pulled up at a speed of about 4 mm / sec, it was heated at about 300 ° C. for about 30 minutes to obtain a second layer thin film composed of the SiO 2 thin film in which the TiO 2 fine particles were dispersed.

【0037】これを約650 ℃で約10分間焼成することで
低反射ガラスを得た。該得られた低反射ガラスにおける
第1層薄膜と第2層薄膜の屈折率および膜厚をエリプソ
メ−タ−〔溝尻光学(株)製〕で測定したところ、第1
層薄膜の屈折率n1が1.95、膜厚d1が約77nm、第2層薄膜
の屈折率n2が1.58、膜厚d2が約80nmであった。また該低
反射ガラスの可視光透過率は約97%であって、波長550n
m での反射率は0.11%であった。
This was fired at about 650 ° C. for about 10 minutes to obtain a low reflection glass. The refractive index and the film thickness of the first layer thin film and the second layer thin film in the obtained low reflection glass were measured with an ellipsometer [manufactured by Mizojiri Optical Co., Ltd.].
Refractive index n 1 of the layer thin film is 1.95, the thickness d 1 of about 77 nm, the refractive index n 2 of the second thin film layer is 1.58, the thickness d 2 was about 80 nm. The visible light transmittance of the low reflection glass is about 97%, and the wavelength is 550 n.
The reflectivity at m was 0.11%.

【0038】さらに、該低反射ガラスの第2層薄膜面
に、ステアリン酸をスピンコ−タ−で塗布し、ブラック
ライトを用い、3mW/cm2 の紫外線を照射したところ、
初期に約10.2%であったヘイズ値が4時間後には4.2 %
まで減少し、7時間後には約0.2 %程度まで減少した。
Further, stearic acid was applied to the surface of the second layer thin film of the low reflection glass by a spin coater, and irradiated with 3 mW / cm 2 ultraviolet light using a black light.
The haze value was about 10.2% at the beginning, but 4.2% after 4 hours.
After 7 hours, it decreased to about 0.2%.

【0039】該低反射ガラスは、セルフクリ−ニング機
能と低反射機能を充分発揮するものであり、めざす所期
の低反射ガラスであった。実施例2 実施例1と同様に、〔Si(OC2H5)4〕と〔Ti(OC3H7)4〕を
モル比で22:78となるように混合し、これを溶質濃度が
約 0.40mol/l となるようエタノ−ルで希釈し第1層薄
膜用アルコキシド溶液を調製した。この調製溶液に、実
施例1と同様のソ−ダライムガラス(フロ−トガラス)
板を浸漬し、約4.2mm /秒の速度で引き上げてガラス表
裏両面に被膜後、約250 ℃で約30分間加熱し、SiO2・Ti
O2薄膜からなる第1層薄膜を得た。なお該調製溶液の粘
度を測定したところ約1.9mPa・s(1.9cP)であった。
The low-reflection glass sufficiently exhibited a self-cleaning function and a low-reflection function, and was the intended low-reflection glass. Example 2 In the same manner as in Example 1, [Si (OC 2 H 5 ) 4 ] and [Ti (OC 3 H 7 ) 4 ] were mixed at a molar ratio of 22:78, and this was mixed with a solute concentration. The mixture was diluted with ethanol to a concentration of about 0.40 mol / l to prepare an alkoxide solution for the first layer thin film. To this prepared solution, soda lime glass (float glass) similar to that of Example 1 was used.
Immersing the plate, coating after the glass both sides pulled up at a rate of about 4.2 mm / sec, heated at about 250 ° C. for about 30 minutes, SiO 2 · Ti
A first layer thin film composed of an O 2 thin film was obtained. When the viscosity of the prepared solution was measured, it was about 1.9 mPa · s (1.9 cP).

【0040】次に、実施例1と同様にし、シリカとチタ
ニアのモル比を82:18にし、エタノ−ルで溶質濃度が約
0.20mol/l となるよう希釈し、約10分間室温でホモジ
ナイザ−を用い攪拌し、第2層薄膜用アルコキシド溶液
を調製した。なお該調製溶液の粘度を測定したところ約
2.0mPa・s(2.0cP)であった。
Next, in the same manner as in Example 1, the molar ratio of silica to titania was 82:18, and the solute concentration was about
The mixture was diluted to 0.20 mol / l and stirred at room temperature for about 10 minutes using a homogenizer to prepare an alkoxide solution for the second layer thin film. When the viscosity of the prepared solution was measured, it was approximately
It was 2.0 mPa · s (2.0 cP).

【0041】続いて、上記第1層薄膜付きガラス板を、
この調製溶液に浸漬し、約4.5 mm/秒の速度で引き上げ
た後、約300 ℃で約30分間加熱し、前記TiO2微粒子を分
散したSiO2薄膜からなる第2層薄膜を得た。
Subsequently, the glass sheet with the first layer thin film was
After being immersed in the prepared solution and pulled up at a speed of about 4.5 mm / sec, it was heated at about 300 ° C. for about 30 minutes to obtain a second layer thin film composed of a SiO 2 thin film in which the TiO 2 fine particles were dispersed.

【0042】これを約650 ℃で約10分間焼成することで
低反射ガラスを得た。該得られた低反射ガラスにおける
第1層薄膜と第2層薄膜の屈折率および膜厚をエリプソ
メ−タ−〔溝尻光学(株)製〕で測定したところ、第1
層薄膜の屈折率n1が2.02、膜厚d1が約80nm、第2層薄膜
の屈折率n2が1.64、膜厚d2が約77nmであった。また該低
反射ガラスの可視光透過率は約95.9%であって、波長55
0nm での反射率は0.06%であった。
This was fired at about 650 ° C. for about 10 minutes to obtain a low reflection glass. The refractive index and the film thickness of the first layer thin film and the second layer thin film in the obtained low reflection glass were measured with an ellipsometer [manufactured by Mizojiri Optical Co., Ltd.].
Refractive index n 1 of the layer thin film is 2.02, the thickness d 1 of about 80 nm, the refractive index n 2 of the second thin film layer is 1.64, the thickness d 2 was about 77 nm. The visible light transmittance of the low reflection glass is about 95.9%, and the wavelength is 55%.
The reflectance at 0 nm was 0.06%.

【0043】さらに、該低反射ガラスの第2層薄膜面
に、ステアリン酸をスピンコ−タ−で塗布し、ブラック
ライトを用い、3mW/cm2 の紫外線を照射したところ、
初期に約10.5%であったヘイズ値が4時間後には4.0 %
まで減少し、7時間後には約0.2 %程度まで減少した。
Further, stearic acid was applied to the surface of the second layer thin film of the low-reflection glass by a spin coater, and irradiated with 3 mW / cm 2 ultraviolet light using a black light.
The haze value was about 10.5% initially, but 4.0% after 4 hours.
After 7 hours, it decreased to about 0.2%.

【0044】該低反射ガラスは、実施例1と同様に、セ
ルフクリ−ニング機能と低反射機能を充分発揮するもの
であり、めざす所期の低反射ガラスであった。実施例3 実施例1と同様に、〔Si(OC2H5)4〕と〔Ti(OC3H7)4〕を
モル比で17:83となるように混合し、これを溶質濃度が
約 0.48mol/l となるようエタノ−ルで希釈し第1層薄
膜用アルコキシド溶液を調製した。この調製溶液に、実
施例1と同様のソ−ダライムガラス(フロ−トガラス)
板を浸漬し、約3.0mm /秒の速度で引き上げてガラス表
裏両面に被膜後、約300 ℃で約30分間加熱し、SiO2・Ti
O2薄膜からなる第1層薄膜を得た。なお該調製溶液の粘
度を測定したところ約2.5mPa・s(2.5cP)であった。
As in the case of Example 1, the low-reflection glass sufficiently exhibited a self-cleaning function and a low-reflection function, and was the intended low-reflection glass. Example 3 As in Example 1, [Si (OC 2 H 5 ) 4 ] and [Ti (OC 3 H 7 ) 4 ] were mixed at a molar ratio of 17:83, and this was mixed with a solute concentration. The mixture was diluted with ethanol to about 0.48 mol / l to prepare an alkoxide solution for the first layer thin film. To this prepared solution, soda lime glass (float glass) similar to that of Example 1 was used.
The plate is immersed, pulled up at a speed of about 3.0 mm / sec, coated on both sides of the glass, and heated at about 300 ° C for about 30 minutes to form SiO 2
A first layer thin film composed of an O 2 thin film was obtained. When the viscosity of the prepared solution was measured, it was about 2.5 mPa · s (2.5 cP).

【0045】次に、チタニア(TiO2)微粒子分散水溶液
〔タイノックM-6 、多木化学(株)製、平均粒子径5n
m、TiO2濃度6%〕を約6倍のエタノ−ルで希釈し、約
1時間室温で攪拌した。次いでこの溶液に加水分解させ
た〔Si(OC2H5)4〕とエタノ−ルで予め溶解したAl(NO3)3
・9H2Oをシリカとアルミナとチタニアのモル比が51:3
1:18になるように加え、エタノ−ルで溶質濃度が約 0.
24mol/l となるよう希釈し、実施例1と同様にして第
2層薄膜用アルコキシド溶液を調製した。なお該調製溶
液の粘度を測定したところ約2.8mPa・s(2.8cP)であっ
た。
Next, a titania (TiO 2 ) fine particle dispersed aqueous solution [Tynoc M-6, manufactured by Taki Kagaku Co., Ltd., average particle size 5 n
m, TiO 2 concentration 6%] was diluted with ethanol about 6 times and stirred at room temperature for about 1 hour. The solution was then hydrolyzed [Si (OC 2 H 5 ) 4 ] and Al (NO 3 ) 3 previously dissolved in ethanol.
9H 2 O with a molar ratio of silica, alumina and titania of 51: 3
In addition to 1:18, the solute concentration was about 0.1 with ethanol.
After dilution to 24 mol / l, an alkoxide solution for a second layer thin film was prepared in the same manner as in Example 1. When the viscosity of the prepared solution was measured, it was about 2.8 mPa · s (2.8 cP).

【0046】続いて、上記第1層薄膜付きガラス板を、
この調製溶液に浸漬し、約3.9 mm/秒の速度で引き上げ
た後、約300 ℃で約20分間加熱し、前記TiO2微粒子を分
散したAl2O3 ・SiO2薄膜からなる第2層薄膜を得た。
Subsequently, the glass plate with the first layer thin film was
After being immersed in this preparation solution and pulled up at a speed of about 3.9 mm / sec, it is heated at about 300 ° C. for about 20 minutes to form a second layer thin film comprising an Al 2 O 3 .SiO 2 thin film in which the TiO 2 fine particles are dispersed. I got

【0047】これを約650 ℃で約3分間焼成することで
低反射ガラスを得た。該得られた低反射ガラスにおける
第1層薄膜と第2層薄膜の屈折率および膜厚をエリプソ
メ−タ−〔溝尻光学(株)製〕で測定したところ、第1
層薄膜の屈折率n1が2.09、膜厚d1が約75nm、第2層薄膜
の屈折率n2が1.69、膜厚d2が約76nmであった。また該低
反射ガラスの可視光透過率は約95.6%であって、波長55
0nm での反射率は0.04%であった。
This was fired at about 650 ° C. for about 3 minutes to obtain a low reflection glass. The refractive index and the film thickness of the first layer thin film and the second layer thin film in the obtained low reflection glass were measured with an ellipsometer [manufactured by Mizojiri Optical Co., Ltd.].
Refractive index n 1 of the layer thin film is 2.09, the thickness d 1 of about 75 nm, the refractive index n 2 of the second thin film layer is 1.69, the thickness d 2 was about 76 nm. The visible light transmittance of the low reflection glass is about 95.6%, and the wavelength is 55%.
The reflectance at 0 nm was 0.04%.

【0048】さらに、該低反射ガラスの第2層薄膜面
に、ステアリン酸をスピンコ−タ−で塗布し、ブラック
ライトを用い、3mW/cm2 の紫外線を照射したところ、
初期に約10.3%であったヘイズ値が4時間後には3.8 %
まで減少し、7時間後には約0.2 %程度まで減少した。
Further, stearic acid was applied to the surface of the second layer thin film of the low-reflection glass by a spin coater, and irradiated with 3 mW / cm 2 ultraviolet light using a black light.
The haze value was about 10.3% at the beginning, but 3.8% after 4 hours
After 7 hours, it decreased to about 0.2%.

【0049】該低反射ガラスは、実施例1と同様に、セ
ルフクリ−ニング機能と低反射機能を充分発揮するもの
であり、めざす所期の低反射ガラスであった。比較例1 加水分解された〔Si(OC2H5)4〕とTiのアルコキシドをモ
ル比で58:42となるように混合し、これにイソプロピル
アルコ−ルを加えて溶質濃度が約 0.40mol/lとなる第
1層薄膜用アルコキシド溶液を調製した。この調製溶液
に、実施例1と同様のソ−ダライムガラス(フロ−トガ
ラス)板を浸漬し、約4.0mm /秒の速度で引き上げてガ
ラス表裏両面に被膜後、約300 ℃で約30分間加熱し、Si
O2・TiO2薄膜からなる第1層薄膜を得た。なお該調製溶
液の粘度を測定したところ約2.0mPa・s(2.0cP)であっ
た。
As in the case of Example 1, the low-reflection glass sufficiently exhibited a self-cleaning function and a low-reflection function, and was the intended low-reflection glass. Comparative Example 1 Hydrolyzed [Si (OC 2 H 5 ) 4 ] and an alkoxide of Ti were mixed at a molar ratio of 58:42, and isopropyl alcohol was added thereto to give a solute concentration of about 0.40 mol. / L of an alkoxide solution for a first layer thin film was prepared. A soda lime glass (float glass) plate similar to that in Example 1 was immersed in this prepared solution, pulled up at a speed of about 4.0 mm / sec, coated on both surfaces of the glass, and then at about 300 ° C. for about 30 minutes. Heat and Si
A first layer thin film composed of an O 2 · TiO 2 thin film was obtained. When the viscosity of the prepared solution was measured, it was about 2.0 mPa · s (2.0 cP).

【0050】次に、加水分解させた〔Si(OC2H5)4〕をイ
ソプロピルアルコ−ルで溶質濃度が約 0.35mol/l とな
るよう希釈し第2層薄膜用アルコキシド溶液を調製し
た。なお該調製溶液の粘度を測定したところ約2.3mPa・
s(2.3cP)であった。
Next, the hydrolyzed [Si (OC 2 H 5 ) 4 ] was diluted with isopropyl alcohol to a solute concentration of about 0.35 mol / l to prepare an alkoxide solution for the second layer thin film. When the viscosity of the prepared solution was measured, it was about 2.3 mPa
s (2.3 cP).

【0051】続いて、上記第1層薄膜付きガラス板を、
この調製溶液に浸漬し、約4.0 mm/秒の速度で引き上げ
た後、約300 ℃で約20分間加熱し、SiO2薄膜からなる第
2層薄膜を得た。
Subsequently, the glass sheet with the first layer thin film was
After being immersed in this prepared solution and pulled up at a speed of about 4.0 mm / sec, it was heated at about 300 ° C. for about 20 minutes to obtain a second layer thin film composed of a SiO 2 thin film.

【0052】これを約650 ℃で約3分間焼成することで
低反射ガラスを得た。該得られた低反射ガラスにおける
第1層薄膜と第2層薄膜の屈折率および膜厚を実施例1
と同様に測定したところ、第1層薄膜の屈折率n1が1.7
9、膜厚d1が約77nm、第2層薄膜の屈折率n2が1.45、膜
厚d2が約95nmであった。また該低反射ガラスの可視光透
過率は約98.0%であって、波長550nm での反射率は0.10
%であった。
This was fired at about 650 ° C. for about 3 minutes to obtain a low reflection glass. The refractive index and the film thickness of the first layer thin film and the second layer thin film in the obtained low reflection glass were determined in Example 1.
And the refractive index n 1 of the first layer thin film was 1.7
9, the film thickness d 1 of about 77 nm, the refractive index n 2 of the second thin film layer is 1.45, the thickness d 2 was about 95 nm. The visible light transmittance of the low reflection glass is about 98.0%, and the reflectance at a wavelength of 550 nm is 0.10%.
%Met.

【0053】さらに、該低反射ガラスの第2層薄膜面
に、ステアリン酸をスピンコ−タ−で塗布し、ブラック
ライトを用い、3mW/cm2 の紫外線を照射したところ、
初期に約10.2%であったヘイズ値が7時間後でも変化せ
ず、ステアリン酸は分解されなかった。
Further, stearic acid was applied to the second layer thin film surface of the low reflection glass by a spin coater, and irradiated with 3 mW / cm 2 ultraviolet light using a black light.
The haze value, which was initially about 10.2%, did not change even after 7 hours, and stearic acid was not decomposed.

【0054】該低反射ガラスは、セルフクリ−ニング機
能がなく、到底めざす所期の低反射ガラスではなかっ
た。比較例2 SiのアルコキシドとTiのアルコキシドをモル比で48:52
となるように混合し、これにエタノ−ルを加え溶質濃度
が約 0.55mol/l となるよう第1層薄膜用アルコキシド
溶液を調製した。この調製溶液に、実施例1と同様のソ
−ダライムガラス(フロ−トガラス)板を浸漬し、約6.
0mm /秒の速度で引き上げてガラス表裏両面に被膜後、
約300 ℃で約30分間加熱し、SiO2・TiO2薄膜からなる第
1層薄膜を得た。なお、該調製溶液の粘度を測定したと
ころ約2.8mPa・s(2.8cP)であった。
The low-reflection glass did not have a self-cleaning function and was not an intended low-reflection glass. Comparative Example 2 Si alkoxide and Ti alkoxide were in a molar ratio of 48:52.
Then, ethanol was added thereto to prepare an alkoxide solution for the first layer thin film so that the solute concentration was about 0.55 mol / l. A soda lime glass (float glass) plate similar to that in Example 1 was immersed in this prepared solution, and the solution was prepared for about 6.
After pulling up at a speed of 0 mm / sec and coating both sides of the glass,
Heating was performed at about 300 ° C. for about 30 minutes to obtain a first layer thin film composed of a SiO 2 .TiO 2 thin film. When the viscosity of the prepared solution was measured, it was about 2.8 mPa · s (2.8 cP).

【0055】次に、実施例1と同様にし、シリカとチタ
ニアのモル比を82:18にし、エタノ−ルで溶質濃度が約
0.25mol/l となるよう希釈し、約10分間室温でホモジ
ナイザ−を用い攪拌し第2層薄膜用アルコキシド溶液を
調製した。なお該調製溶液の粘度を測定したところ約2.
3mPa・s(2.3cP)であった。
Next, in the same manner as in Example 1, the molar ratio of silica to titania was set to 82:18, and the solute concentration was reduced to about ethanol with ethanol.
The mixture was diluted to 0.25 mol / l and stirred at room temperature for about 10 minutes using a homogenizer to prepare an alkoxide solution for the second layer thin film. When the viscosity of the prepared solution was measured, it was about 2.
It was 3 mPa · s (2.3 cP).

【0056】続いて、上記第1層薄膜付きガラス板を、
この調製溶液に浸漬し、約4.0 mm/秒の速度で引き上げ
た後、約300 ℃で約20分間加熱し、前記TiO2微粒子を分
散したSiO2薄膜からなる第2層薄膜を得た。
Subsequently, the glass plate with the first layer thin film was
After being immersed in this prepared solution and pulled up at a speed of about 4.0 mm / sec, it was heated at about 300 ° C. for about 20 minutes to obtain a second layer thin film composed of the SiO 2 thin film in which the TiO 2 fine particles were dispersed.

【0057】これを約650 ℃で約10分間焼成することで
セルフクリ−ニングガラスを得た。該得られたセルフク
リ−ニングガラスにおける第1層薄膜と第2層薄膜の屈
折率および膜厚を実施例1と同様に測定したところ、第
1層薄膜の屈折率n1が1.95、膜厚d1が約140nm 、第2層
薄膜の屈折率n2が1.58、膜厚d2が約80nmであった。また
該セルフクリ−ニングガラスの可視光反射率は波長550n
m で約8%であり、通常のガラスと同じ程度の反射率で
あり、到底めざす所期の低反射ガラスとは言い難いもの
であった。
This was fired at about 650 ° C. for about 10 minutes to obtain a self-cleaning glass.該得was Serufukuri - where the first thin film layer and the refractive index and film thickness of the second thin film layer in the training glass was measured in the same manner as in Example 1, the refractive index n 1 of the first thin film layer is 1.95, the thickness d 1 is about 140 nm, the refractive index n 2 of the second thin film layer is 1.58, the thickness d 2 was about 80 nm. The self-cleaning glass has a visible light reflectance of 550 nm.
m was about 8%, and the reflectance was almost the same as ordinary glass, and it was hard to say that the intended low-reflection glass was aimed at.

【0058】比較例3 比較例2と同様に、SiのアルコキシドとTiのアルコキシ
ドをモル比で48:52となるように混合し、これにエタノ
−ルを加え溶質濃度が約 0.40mol/l となるよう第1層
薄膜用アルコキシド溶液を調製した。この調製溶液に、
実施例1と同様のソ−ダライムガラス(フロ−トガラ
ス)板を浸漬し、約2.8mm /秒の速度で引き上げてガラ
ス表裏両面に被膜後、約300 ℃で約30分間加熱し、SiO2
・TiO2薄膜からなる第1層薄膜を得た。なお該調製溶液
の粘度を測定したところ約2.0mPa・s(2.0cP)であった。
Comparative Example 3 In the same manner as in Comparative Example 2, an alkoxide of Si and an alkoxide of Ti were mixed at a molar ratio of 48:52, and ethanol was added thereto, so that the solute concentration was about 0.40 mol / l. Thus, an alkoxide solution for the first layer thin film was prepared. In this preparation solution,
Similar Seo Example 1 - da-lime glass (flow - sharpened) plate was dipped, after coating on glass both sides pulled up at a rate of about 2.8 mm / sec, heated at about 300 ° C. for about 30 minutes, SiO 2
A first layer thin film made of a TiO 2 thin film was obtained. When the viscosity of the prepared solution was measured, it was about 2.0 mPa · s (2.0 cP).

【0059】次に、実施例1と同様に、シリカとチタニ
アのモル比を82:18とし、エタノ−ルで溶質濃度が約
0.45mol/l となるよう希釈し、約10分間室温でホモジ
ナイザ−を用い攪拌し第2層薄膜用アルコキシド溶液を
調製した。なお該調製溶液の粘度を測定したところ約2.
8mPa・s(2.8cP)であった。
Next, as in Example 1, the molar ratio of silica to titania was 82:18, and the solute concentration was about
The mixture was diluted to 0.45 mol / l and stirred at room temperature for about 10 minutes using a homogenizer to prepare an alkoxide solution for the second layer thin film. When the viscosity of the prepared solution was measured, it was about 2.
It was 8 mPa · s (2.8 cP).

【0060】続いて、上記第1層薄膜付きガラス板を、
この調製溶液に浸漬し、約6.0 mm/秒の速度で引き上げ
た後、約300 ℃で約20分間加熱し、前記TiO2微粒子を分
散したSiO2薄膜からなる第2層薄膜を得た。
Subsequently, the glass sheet with the first layer thin film was
After being immersed in the prepared solution and pulled up at a speed of about 6.0 mm / sec, it was heated at about 300 ° C. for about 20 minutes to obtain a second layer thin film composed of the SiO 2 thin film in which the TiO 2 fine particles were dispersed.

【0061】これを約650 ℃で約10分間焼成することで
セルフクリ−ニングガラスを得た。該得られたセルフク
リ−ニングガラスにおける第1層薄膜と第2層薄膜の屈
折率および膜厚を実施例1と同様に測定したところ、第
1層薄膜の屈折率n1が1.95、膜厚d1が約60nm、第2層薄
膜の屈折率n2が1.56、膜厚d2が約140nm であった。また
該セルフクリ−ニングガラスの可視光反射率は波長550n
m で約16%であり、めざす所期の低反射ガラスではな
く、高反射ガラスであった。
This was fired at about 650 ° C. for about 10 minutes to obtain a self-cleaning glass.該得was Serufukuri - where the first thin film layer and the refractive index and film thickness of the second thin film layer in the training glass was measured in the same manner as in Example 1, the refractive index n 1 of the first thin film layer is 1.95, the thickness d 1 is about 60 nm, the refractive index n 2 of the second thin film layer is 1.56, the thickness d 2 was about 140 nm. The self-cleaning glass has a visible light reflectance of 550 nm.
It was about 16% in m 2, which was not the intended low-reflection glass but high-reflection glass.

【0062】比較例4 Tiのアルコキシドにエタノ−ルを加え溶質濃度が約 0.3
0mol/l となるよう第1層薄膜用アルコキシド溶液を調
製した。この調製溶液に、実施例1と同様のソ−ダライ
ムガラス(フロ−トガラス)板を浸漬し、約3.5mm /秒
の速度で引き上げてガラス表裏両面に被膜後、約300 ℃
で約30分間加熱し、TiO2薄膜からなる第1層薄膜を得
た。なお該調製溶液の粘度を測定したところ約1.8mPa・
s(1.8cP)であった。
Comparative Example 4 Ethanol was added to the alkoxide of Ti to reduce the solute concentration to about 0.3.
An alkoxide solution for the first layer thin film was prepared to have a concentration of 0 mol / l. A soda lime glass (float glass) plate similar to that in Example 1 was immersed in this prepared solution, pulled up at a speed of about 3.5 mm / sec, and coated on both sides of the glass.
For about 30 minutes to obtain a first layer thin film made of a TiO 2 thin film. When the viscosity of the prepared solution was measured, it was approximately 1.8 mPa
s (1.8 cP).

【0063】次に、実施例1と同様に、シリカとチタニ
アのモル比を48:52とし、エタノ−ルで溶質濃度が約
0.30mol/l となるよう希釈し、約10分間室温でホモジ
ナイザ−を用い攪拌し第2層薄膜用アルコキシド溶液を
調製した。なお該調製溶液の粘度を測定したところ約3.
0mPa・s(3.0cP)であった。
Next, as in Example 1, the molar ratio of silica to titania was set to 48:52, and the solute concentration was reduced to about 50% with ethanol.
The mixture was diluted to 0.30 mol / l and stirred at room temperature for about 10 minutes using a homogenizer to prepare an alkoxide solution for the second layer thin film. When the viscosity of the prepared solution was measured, it was about 3.
It was 0 mPa · s (3.0 cP).

【0064】続いて、上記第1層薄膜付きガラス板を、
この調製溶液に浸漬し、約3.0 mm/秒の速度で引き上げ
た後、約300 ℃で約20分間加熱し、前記TiO2微粒子を分
散したSiO2薄膜からなる第2層薄膜を得た。
Subsequently, the glass plate with the first layer thin film was
After being immersed in this prepared solution and pulled up at a speed of about 3.0 mm / sec, it was heated at about 300 ° C. for about 20 minutes to obtain a second layer thin film composed of a SiO 2 thin film in which the TiO 2 fine particles were dispersed.

【0065】これを約650 ℃で約10分間焼成することで
セルフクリ−ニングガラスを得た。該得られたセルフク
リ−ニングガラスにおける第1層薄膜と第2層薄膜の屈
折率および膜厚を実施例1と同様に測定したところ、第
1層薄膜の屈折率n1が2.20、膜厚d1が約63nm、第2層薄
膜の屈折率n2が1.95、膜厚d2が約70nmであった。また該
セルフクリ−ニングガラスの可視光反射率は波長550nm
で約4.2 %であり、到底めざす所期の低反射ガラスとは
言い難いものであった。
This was fired at about 650 ° C. for about 10 minutes to obtain a self-cleaning glass.該得was Serufukuri - where the first thin film layer and the refractive index and film thickness of the second thin film layer in the training glass was measured in the same manner as in Example 1, the refractive index n 1 of the first thin film layer is 2.20, the thickness d 1 is about 63 nm, the refractive index n 2 of the second thin film layer is 1.95, the thickness d 2 was about 70 nm. The self-cleaning glass has a visible light reflectance of 550 nm.
It was about 4.2%, which was hardly the expected low-reflection glass.

【0066】[0066]

【発明の効果】以上詳述したように、本発明は、透明ガ
ラス基板の少なくとも片側面に、中屈折率薄膜と光活性
TiO2微粒子含有低屈折率薄膜とを、特定した屈折率なら
びに膜厚で組み合わせ、第2層目の屈折率が第1層目の
屈折率により小さくするようにしたシンプルな2層の薄
膜被覆積層でなる低反射ガラスとしたことにより、簡便
に得ることができて、優れた表面反射低減機能とセルフ
クリ−ニング機能とを併せ持ち、表面に付着する指紋、
油脂、汗などの汚れ等を紫外線存在下でセルフクリ−ニ
ングして常に目立たないように分解し、頻繁なクリ−ニ
ングをする必要もなくなり、優れた視認性を保持し、誤
認や違和感をなくすることができ、高耐久性で人的物的
の両面や環境に対しても優しく、しかも表面反射低減機
能とセルフクリ−ニング機能とを長く持続できて、セキ
ュリティ上や安全上の向上に寄与することができ、建築
用、車両用、船舶用あるいは航空機用等の窓ガラス、CD
機などの各種電子電気機器用のタッチパネル、さらには
調理用品のガラス、展示用の各種ショウケ−スやカバ−
ガラス、各種表示スクリ−ン等、幅広い分野において有
用な低反射ガラスを提供できるものである。
As described in detail above, the present invention provides a transparent glass substrate having a medium refractive index thin film and a photoactive
A simple two-layer thin film coating and lamination in which the low refractive index thin film containing TiO 2 fine particles is combined with the specified refractive index and film thickness so that the refractive index of the second layer becomes smaller than the refractive index of the first layer. By using a low-reflection glass consisting of, it can be easily obtained, has both excellent surface reflection reduction function and self-cleaning function, and has a fingerprint attached to the surface,
Dirt such as oils and fats and sweat are self-cleaned in the presence of ultraviolet rays to disassemble them inconspicuously, eliminating the need for frequent cleaning, maintaining excellent visibility and eliminating misperception and discomfort. It is highly durable, is friendly to both human and physical aspects and the environment, and has a long-lasting surface reflection reduction function and self-cleaning function, contributing to improved security and safety. Window glass for architectural, vehicle, ship or aircraft use, CD
Touch panels for various electronic and electrical equipment such as machines, glass for cooking utensils, various showcases and covers for exhibitions
The present invention can provide a low-reflection glass useful in a wide range of fields such as glass and various display screens.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 G02B 1/10 G02B 1/10 Z ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 6 Identification code Agency reference number FI Technical display location G02B 1/10 G02B 1/10 Z

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 透明ガラス基板の少なくとも片側表面
に、ガラス面側から第1層目として屈折率n1が1.78〜2.
30であってかつ膜厚d1が20〜120nm の薄膜層を形成し、
次いで該第1層目の薄膜層上に、第2層目として屈折率
n2が1.46〜1.90であってかつ膜厚d2が40〜120nm であり
かつ光活性作用を有するTiO2微粒子を分散させた薄膜層
を被覆積層して成り、しかも前記屈折率がn1>n2である
ことを特徴とする低反射ガラス。
1. A refractive index n1 of at least 1.78 to 2.2 on a surface of at least one side of a transparent glass substrate as a first layer from the glass surface side.
A 30 and the film thickness d 1 to form a thin layer of 20 to 120,
Next, on the first thin film layer, as a second layer, a refractive index
n 2 is made by coating stack a thin film layer containing dispersed TiO 2 fine particles and the thickness d 2 be 1.46 to 1.90 has is and photoactive action is 40 to 120 nm, yet the refractive index n 1> n 2 is a low reflection glass.
【請求項2】 前記第1層目の薄膜が、SiO2、TiO2、Al
2O3 、ZrO2、SnO2、B2O3およびこれらから2種以上選択
し組み合わせた複合膜であることを特徴とする請求項1
記載の低反射ガラス。
2. The method according to claim 1, wherein the first thin film is made of SiO 2 , TiO 2 , Al.
2. A composite membrane comprising 2 O 3 , ZrO 2 , SnO 2 , B 2 O 3, and a combination of two or more of these.
The low reflection glass as described.
【請求項3】 前記第2層目の光活性作用を有するTiO2
微粒子を分散させた薄膜が、SiO2、Al2O3 、ZrO2、SnO2
およびこれらを組み合わせた複合膜であることを特徴と
する請求項1乃至2記載の低反射ガラス。
3. TiO 2 having a photoactive action of the second layer
SiO 2 , Al 2 O 3 , ZrO 2 , SnO 2
3. The low reflection glass according to claim 1, wherein the low reflection glass is a composite film obtained by combining these.
【請求項4】 前記光活性作用を有するTiO2微粒子が、
アナタ−ゼ型であって、平均粒径が3nm以上50nm以下で
あることを特徴とする請求項1乃至3記載の低反射ガラ
ス。
4. The TiO 2 fine particles having a photoactive effect,
The low-reflection glass according to any one of claims 1 to 3, wherein the glass is an anatase type and has an average particle diameter of 3 nm or more and 50 nm or less.
JP8201995A 1996-07-31 1996-07-31 Low-reflection glass Pending JPH1045435A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8201995A JPH1045435A (en) 1996-07-31 1996-07-31 Low-reflection glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8201995A JPH1045435A (en) 1996-07-31 1996-07-31 Low-reflection glass

Publications (1)

Publication Number Publication Date
JPH1045435A true JPH1045435A (en) 1998-02-17

Family

ID=16450203

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8201995A Pending JPH1045435A (en) 1996-07-31 1996-07-31 Low-reflection glass

Country Status (1)

Country Link
JP (1) JPH1045435A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001042155A1 (en) * 1999-12-13 2001-06-14 Nippon Sheet Glass Co., Ltd. Low-reflection glass article
EP1131656A1 (en) * 1998-11-20 2001-09-12 Sola International Holdings, Ltd. Coated lens to reduce visual perception of stains
EP1283432A2 (en) * 2001-08-06 2003-02-12 Nippon Sheet Glass Co., Ltd. Windowpane for head up display
JP2007536137A (en) * 2004-05-10 2007-12-13 サン−ゴバン グラス フランス Substrate with photocatalytic coating
US8263228B2 (en) 2006-02-14 2012-09-11 Pilkington Automotive Limited Vehicle glazing
WO2021199466A1 (en) * 2020-03-31 2021-10-07 日本電産株式会社 Optical member

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1131656A1 (en) * 1998-11-20 2001-09-12 Sola International Holdings, Ltd. Coated lens to reduce visual perception of stains
EP1131656A4 (en) * 1998-11-20 2002-03-20 Sola Int Holdings Coated lens to reduce visual perception of stains
WO2001042155A1 (en) * 1999-12-13 2001-06-14 Nippon Sheet Glass Co., Ltd. Low-reflection glass article
US6921578B2 (en) 1999-12-13 2005-07-26 Nippon Sheet Glass Co., Ltd. Low-reflection glass article
EP1283432A2 (en) * 2001-08-06 2003-02-12 Nippon Sheet Glass Co., Ltd. Windowpane for head up display
EP1283432A3 (en) * 2001-08-06 2003-02-26 Nippon Sheet Glass Co., Ltd. Windowpane for head up display
JP2007536137A (en) * 2004-05-10 2007-12-13 サン−ゴバン グラス フランス Substrate with photocatalytic coating
US8263228B2 (en) 2006-02-14 2012-09-11 Pilkington Automotive Limited Vehicle glazing
WO2021199466A1 (en) * 2020-03-31 2021-10-07 日本電産株式会社 Optical member

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