JPH1036894A - Cleaning method - Google Patents

Cleaning method

Info

Publication number
JPH1036894A
JPH1036894A JP385297A JP385297A JPH1036894A JP H1036894 A JPH1036894 A JP H1036894A JP 385297 A JP385297 A JP 385297A JP 385297 A JP385297 A JP 385297A JP H1036894 A JPH1036894 A JP H1036894A
Authority
JP
Japan
Prior art keywords
hfc
cleaning
liquid
hfe
mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP385297A
Other languages
Japanese (ja)
Other versions
JP4063906B2 (en
Inventor
Michinori Yokozawa
道則 横澤
Hideaki Kikuchi
秀明 菊地
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chemours Mitsui Fluoroproducts Co Ltd
Original Assignee
Du Pont Mitsui Fluorochemicals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont Mitsui Fluorochemicals Co Ltd filed Critical Du Pont Mitsui Fluorochemicals Co Ltd
Priority to JP00385297A priority Critical patent/JP4063906B2/en
Publication of JPH1036894A publication Critical patent/JPH1036894A/en
Application granted granted Critical
Publication of JP4063906B2 publication Critical patent/JP4063906B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Detergent Compositions (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a cleaning method with a new hydrofluorocarbon solvent which method provides a similar effect on cleaning dirt such as oil or flux adhering to a metal part, etc., to that of a chlorofluorocarbon such as CFC-113, is excellent in noncombustibility and low-toxicity, and does not deplete the ozone layer. SOLUTION: Dirt on an article to be cleaned is removed by using a warm bath of a mixture comprising a hydrofluorocarbon(HFC) or a hydrofluoroether(HFE) having a b. p. of 30-150 deg.C or a liq. mixture of these compds. and an org. compd. such as a glycol ether or an ester having a b.p. at least 50 deg.C higher than that of the HFC or HFE and compatible with the HFC or HFE. Then org. compds. adhering to the article are removed by rinsing it with the HFC or HFE alone.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、精密機械工業、光
学機械工業や電子工業等において金属部品・プラスチッ
ク部品・ガラス部品等に付着した油汚れ等、特にフラッ
クスを効率的に除去する洗浄方法であり、さらには高度
に弗素化されたハイドロフルオロカーボンまたはハイド
ロフルオロエーテル液体を用いる洗浄方法に関するもの
である。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning method for efficiently removing oil stains and the like, particularly flux, adhered to metal parts, plastic parts, glass parts, and the like in the precision machine industry, optical machine industry, electronic industry, and the like. And more particularly to a cleaning method using a highly fluorinated hydrofluorocarbon or hydrofluoroether liquid.

【0002】[0002]

【従来の技術】従来、上記金属部品等の洗浄方法におい
ては、洗浄液として1,1,2−トリクロロ−1,2,
2−トリフルオロエタン(以下、CFC−113とい
う。)にアルコール類または水及び界面活性剤を添加し
たものが多く使用されてきた。しかし、近年オゾン問題
によりCFC−113のようなクロロフルオロカーボン
(以下、CFCという)の使用は規制されている。
2. Description of the Related Art Conventionally, in a method for cleaning metal parts and the like, 1,1,2-trichloro-1,2,2,
A mixture of 2-trifluoroethane (hereinafter referred to as CFC-113) to which alcohols or water and a surfactant are added has been used in many cases. However, in recent years, the use of chlorofluorocarbons (hereinafter, referred to as CFCs) such as CFC-113 has been regulated due to the ozone problem.

【0003】CFC−113の代替品として、炭化水素
のすべての水素原子が弗素原子で置換されたパーフルオ
ロカーボン(以下、FCという。)液体や、炭化水素の
水素原子の一部が弗素原子のみで置換され、塩素原子を
含まないハイドロフルオロカーボン(以下、HFCとい
う。)液体を洗浄液として用いることができ、これらF
CあるいはHFC洗浄液は、CFC−113等のCFC
液体と同様、低毒性、不燃性、低腐食性であり、しかも
塩素を含まないのでオゾン層を破壊する恐れがないが、
汚れ成分の溶解力(以下、洗浄力という。)が劣るた
め、先ず被洗浄物を洗浄力に優れたハイドロカーボン
(以下、HCという。)系液体、例えば石油系洗浄液、
テルペン系洗浄液、又はアルコール系洗浄液等で洗浄し
た後、被洗浄物に付着した洗浄液をFC液体或いはHF
C液体ですすぎ洗浄を行なう方法、或いはFC液体もし
くはHFC液体とHC系液体との混合物で洗浄した後、
FC液体或いはHFC液体ですすぎ洗浄を行う方法が提
唱されている。
As a substitute for CFC-113, a perfluorocarbon (hereinafter referred to as FC) liquid in which all hydrogen atoms of hydrocarbons are replaced by fluorine atoms, or a part of hydrogen atoms of hydrocarbons is only fluorine atoms A substituted hydrofluorocarbon (hereinafter, referred to as HFC) liquid containing no chlorine atom can be used as a cleaning liquid.
C or HFC cleaning liquid is CFC-113 or other CFC
Like liquid, it has low toxicity, non-flammability, low corrosiveness and does not contain chlorine, so there is no danger of destroying the ozone layer.
Since the dissolving power (hereinafter referred to as cleaning power) of the dirt component is inferior, first, an object to be cleaned is converted into a hydrocarbon (hereinafter referred to as HC) -based liquid having excellent cleaning power, such as a petroleum-based cleaning liquid.
After cleaning with a terpene-based cleaning liquid or an alcohol-based cleaning liquid, the cleaning liquid adhering to the object to be cleaned is FC liquid or HF.
After rinsing with C liquid, or after washing with a mixture of FC liquid or HFC liquid and HC liquid,
A method of rinsing with FC liquid or HFC liquid has been proposed.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、洗浄に
使用される石油系洗浄液、テルペン系洗浄液、又は高級
アルコール系洗浄液等は、洗浄力は優れているものの、
FC液体もしくはHFC液体に難溶性であるため、これ
らの洗浄液は被洗浄物表面に付着したまま除去されない
ため、被洗浄物のすすぎ不良が起こり使用することが出
来なかった。また、HFC液体に相溶性のある低級アル
コール類は沸点が低く、引火性という欠点があった。
However, petroleum-based cleaning liquids, terpene-based cleaning liquids, higher alcohol-based cleaning liquids and the like used for cleaning have excellent cleaning power,
Since they are hardly soluble in FC liquids or HFC liquids, these cleaning liquids are not removed while adhering to the surface of the object to be cleaned. Also, lower alcohols that are compatible with the HFC liquid have a drawback of low boiling point and flammability.

【0005】[0005]

【課題を解決するための手段】本発明者らは、HFC液
体と混合して用いる有機化合物として、HFCと相溶性
が有り、且つ高沸点の有機化合物を用いることにより、
被洗浄物に付着した洗浄液のすすぎ不良や引火の危険が
なく、被洗浄物表面の汚れをきれいに落とすことができ
ることを見いだした。
Means for Solving the Problems The present inventors have found that by using an organic compound which is compatible with HFC and has a high boiling point as an organic compound to be mixed with an HFC liquid,
It has been found that there is no danger of rinsing of the cleaning liquid adhering to the object to be cleaned or danger of ignition, and it is possible to clean the surface of the object to be cleaned.

【0006】即ち本発明は、被洗浄物品を、沸点が30
〜150℃の範囲のハイドロフルオロカーボン(HF
C)またはハイドロフルオロエーテル(HFE)もしく
はそれらの混合物液体と、該HFCまたはHFE液体の
沸点よりも50℃以上高い沸点を有し、且つ該HFCま
たはHFEと相溶性のある有機化合物との混合物の温浴
を用いて汚れを除去し、次いで該HFCまたはHFE単
体にて被洗浄部品に付着した有機化合物をすすいで除去
することを特徴とする物品の洗浄方法である。
That is, according to the present invention, an article to be cleaned has a boiling point of 30.
Hydrofluorocarbon (HF) in the range of
C) or a mixture of a hydrofluoroether (HFE) or a mixture thereof and an organic compound having a boiling point higher than that of the HFC or HFE liquid by 50 ° C. or more and compatible with the HFC or HFE. A method for cleaning articles, comprising removing stains using a warm bath, and then rinsing and removing organic compounds attached to the parts to be cleaned using the HFC or HFE alone.

【0007】[0007]

【発明の実施の形態】ここでハイドロフルオロカーボン
(HFC)とは、炭化水素の水素原子の一部が弗素原子
のみで置換され、塩素原子を含まない弗素化炭化水素で
あり、ハイドロフルオロエーテル(以下、HFEとい
う。)とはエーテル類の水素原子の一部が弗素原子のみ
で置換され、塩素原子を含まない弗素化エーテルであ
る。
BEST MODE FOR CARRYING OUT THE INVENTION Here, hydrofluorocarbon (HFC) is a fluorinated hydrocarbon in which part of the hydrogen atoms of a hydrocarbon is replaced only by fluorine atoms and does not contain chlorine atoms. , HFE) are fluorinated ethers in which some of the hydrogen atoms of the ethers are replaced only by fluorine atoms and do not contain chlorine atoms.

【0008】本発明で用いられるHFCまたはHFE液
体としては沸点が30〜150℃のものである。(以下
HFC、HFEの両者を総称して「HFC/E」とい
う。)HFC/E液体の沸点が30℃未満では、蒸発ロ
スが大きく、水の結露の問題もある。また、HFC液体
の沸点が150℃を越えるとその蒸発速度が遅くなり、
被洗浄物品表面に残存するHFC/Eが汚れを濃縮した
状態で液滴となり、その蒸発した後に汚れが集中した部
分を被洗浄物表面に形成する原因になる。
[0008] The HFC or HFE liquid used in the present invention has a boiling point of 30 to 150 ° C. (Hereinafter, both HFC and HFE are collectively referred to as “HFC / E”.) If the boiling point of the HFC / E liquid is less than 30 ° C., evaporation loss is large, and there is also a problem of water condensation. Further, when the boiling point of the HFC liquid exceeds 150 ° C., the evaporation rate becomes slow,
The HFC / E remaining on the surface of the article to be cleaned becomes droplets in a state where the dirt is concentrated, and after evaporation, forms a portion where the dirt is concentrated on the surface of the article to be cleaned.

【0009】このようなHFC/Eのうち、HFCとし
ては具体的には1,1,1,2,3,4,4,5,5,
5−デカフルオロペンタン(以下、HFC43−10m
eeという。沸点55℃)、1,1,2,2,3,3,
4,4−オクタフルオロブタン(以下、338pccと
いう。沸点44℃)などがあり、HFEとしては1,
2,2,2−テトラフルオロエチル−ヘプタフルオロプ
ロピルエーテル(沸点40℃)、1,1,1,2,3,
3−ヘキサフルオロ−2−ヘプタフルオロプロピロキシ
−3−(1,2,2,2−テトラフルオロエトキシ)−
プロパン(沸点104℃)などを挙げることができる。
Among such HFC / Es, HFC is specifically 1,1,1,2,3,4,4,5,5,5.
5-decafluoropentane (hereinafter referred to as HFC43-10m
ee. Boiling point 55 ° C), 1,1,2,2,3,3
4,4-octafluorobutane (hereinafter referred to as 338 pcc; boiling point: 44 ° C.);
2,2,2-tetrafluoroethyl-heptafluoropropyl ether (boiling point 40 ° C.), 1,1,1,2,3
3-hexafluoro-2-heptafluoropropoxy-3- (1,2,2,2-tetrafluoroethoxy)-
And propane (boiling point: 104 ° C.).

【0010】該HFC/E液体と混合して用いる有機化
合物(以下、単に有機化合物という。)は、その沸点が
HFC液体の沸点よりも50℃以上、好ましくは100
℃以上高く、且つHFC/E液体と相溶性のあるもので
ある。
[0010] The organic compound used by mixing with the HFC / E liquid (hereinafter simply referred to as "organic compound") has a boiling point at least 50 ° C, preferably 100 ° C, higher than the boiling point of the HFC liquid.
Higher than ℃ and compatible with HFC / E liquid.

【0011】HFC/E液体と相溶性がない有機化合物
で洗浄すると、被洗浄物品の表面に付着した有機化合物
をHFC/Eですすぎ落とすことが困難であり、また、
有機化合物の沸点がHFC/E液体の沸点よりも50℃
以上、好ましくは100℃以上高くないと、HFC/E
液体の沸点以上の温度にならないので加熱による洗浄効
果が期待できず、また引火性の低減という効果が期待で
きない。
When washing with an organic compound incompatible with the HFC / E liquid, it is difficult to rinse off the organic compound attached to the surface of the article to be washed with HFC / E.
The boiling point of the organic compound is 50 ° C. higher than the boiling point of the HFC / E liquid
Above, preferably not higher than 100 ° C, HFC / E
Since the temperature is not higher than the boiling point of the liquid, the cleaning effect by heating cannot be expected, and the effect of reducing the flammability cannot be expected.

【0012】このような有機化合物として、沸点がHF
C/Eの沸点よりも50℃以上高いグリコールエーテル
或いはエステル系化合物が好適であり、また両者の混合
物を用いることもできる。具体的には、グリコールエー
テルとしてトリエチレングリコールジメチルエーテル
等、エステル系化合物としてジメチルコハク酸、ジメチ
ルグルタル酸、ジメチルアジピン酸、或いはそれらの混
合物等を例示することが出来る。
As such an organic compound, the boiling point is HF.
A glycol ether or ester compound having a boiling point of C / E higher than that of C / E by 50 ° C. or more is suitable, and a mixture of both can also be used. Specifically, examples of the glycol ether include triethylene glycol dimethyl ether and the like, and examples of the ester compound include dimethyl succinic acid, dimethyl glutaric acid, dimethyl adipic acid, and mixtures thereof.

【0013】HFC/E液体およびそれと相溶性の有る
有機化合物との混合比率は両成分の種類、両者の沸点差
や、被洗浄物品の汚れの程度等にもよるが、HFC/E
液体/有機化合物(重量比)=10/90〜70/30
の範囲で混合するのが好ましい。HFC/E液体に対し
有機化合物の量が少ないと洗浄力が低下し、また多すぎ
ると引火性が高くなったり、次工程のHFC/Eによる
有機化合物のすすぎ不良となるので好ましくない。
The mixing ratio of the HFC / E liquid and the organic compound having compatibility with the HFC / E liquid depends on the type of both components, the boiling point difference between them, and the degree of contamination of the article to be cleaned.
Liquid / organic compound (weight ratio) = 10 / 90-70 / 30
It is preferred to mix in the range of. If the amount of the organic compound is small relative to the HFC / E liquid, the detergency decreases, and if the amount is too large, the flammability increases and the HFC / E in the next step undesirably results in poor rinsing of the organic compound.

【0014】本発明の洗浄方法は、フラックス等の汚れ
の洗浄に好適に使用される。本発明においては、先ず被
洗浄物品を、HFC/Eと有機化合物との混合物を用い
て汚れを除去し、次いで被洗浄物品に付着した有機化合
物を該HFC/E単体にてすすぐ。
The cleaning method of the present invention is suitably used for cleaning dirt such as flux. In the present invention, first, the articles to be cleaned are cleaned with a mixture of HFC / E and an organic compound, and then the organic compounds attached to the articles to be cleaned are rinsed with the HFC / E alone.

【0015】このような方法で物品を洗浄するには、図
1に示すような、HFC/Eと有機化合物の混合物を充
填した槽(洗浄槽)、HFC/Eを充填した槽(すすぎ
槽)を1つの容器中に収容したものでそれぞれの上部は
共通の空間となっており、洗浄槽とすすぎ槽の蒸気層が
共有されている洗浄装置が適している。
In order to wash articles by such a method, a tank filled with a mixture of HFC / E and an organic compound (washing tank) and a tank filled with HFC / E (rinse tank) as shown in FIG. Are housed in one container, the upper portions of which are common spaces, and a washing apparatus in which the vapor layer of the washing tank and the rinsing tank are shared is suitable.

【0016】以下、本発明の方法を添付図面に基づいて
具体的に説明する。図1において、洗浄装置1の底部に
複数の槽、2,3及び4が設置され、これらは仕切壁1
0、11等により仕切られている。また洗浄装置1は頂
部が開放されており、その上部の側面上に冷却部6を有
する。冷却部6は、HFC/E蒸気のロスを防ぐ目的で
頂部近くに、又被洗浄物の出し入れに邪魔にならないよ
うに側面に設けられている。
Hereinafter, the method of the present invention will be specifically described with reference to the accompanying drawings. In FIG. 1, a plurality of tanks, 2, 3 and 4 are installed at the bottom of a washing device 1 and
It is partitioned by 0, 11, etc. Further, the cleaning device 1 has an open top, and has a cooling unit 6 on a side surface on the top. The cooling unit 6 is provided near the top for the purpose of preventing loss of HFC / E vapor, and on the side so as not to hinder the taking in and out of the object to be cleaned.

【0017】洗浄槽2は、HFC/Eおよびそれと相溶
性を有する有機化合物との混合溶剤を収容する温浴であ
り、ヒーター7で加熱され、またその洗浄効果を高める
ため撹拌機8を取り付けても良い。被洗浄物品は、洗浄
装置1の上部開口部より装置内に導入され、所望の割合
で混合されたHFC/Eと有機化合物の混合物を収容し
た洗浄槽2に浸漬され、被洗浄物品表面に付着した汚れ
を除去する。
The washing tank 2 is a warm bath containing a mixed solvent of HFC / E and an organic compound having compatibility with the HFC / E. The washing tank 2 is heated by a heater 7 and is equipped with a stirrer 8 to enhance the washing effect. good. The article to be cleaned is introduced into the apparatus through the upper opening of the cleaning apparatus 1, is immersed in a cleaning tank 2 containing a mixture of HFC / E and an organic compound mixed at a desired ratio, and adheres to the surface of the article to be cleaned. Removed stains.

【0018】洗浄槽2の温度は高い温度であることが洗
浄効果を高める意味で好ましいが、一方、混合物が沸騰
する温度を用いた場合には、混合物の蒸発により液組成
が変化してくるという問題がある。そのため、洗浄槽の
温度は通常HFC/Eの沸点と混合物の沸点との間で、
且つ被洗浄物品が熱による損傷を受けない温度が採用さ
れる。
It is preferable that the temperature of the cleaning tank 2 is high in order to enhance the cleaning effect. On the other hand, when the temperature at which the mixture boils is used, the liquid composition changes due to evaporation of the mixture. There's a problem. Therefore, the temperature of the washing tank is usually between the boiling point of HFC / E and the boiling point of the mixture.
In addition, a temperature at which the article to be cleaned is not damaged by heat is employed.

【0019】洗浄が終了した被洗浄物品は、その表面に
HFC/Eと有機化合物の混合物が付着している。有機
化合物が被洗浄物品表面に残存していると、有機化合物
に溶解された汚れが被洗浄物品表面にシミを作る原因と
なる恐れがあること、及び蒸発速度が遅いために乾燥に
時間がかかるという問題があるので、被洗浄物品をすす
ぎ槽中、HFC/E単体ですすぐことにより混合物中の
有機化合物をHFC/Eと置換する。
The article to be washed after washing has a mixture of HFC / E and an organic compound adhered to its surface. If the organic compound remains on the surface of the article to be cleaned, dirt dissolved in the organic compound may cause stains on the surface of the article to be cleaned, and drying takes a long time due to a low evaporation rate. Therefore, the organic compound in the mixture is replaced with HFC / E by rinsing the article to be cleaned with HFC / E alone in a rinsing tank.

【0020】図1において、3は第1すすぎ槽、4は第
2すすぎ槽であり、いずれも実質的にHFC/E溶剤単
独よりなる液を収容する槽である。第1すすぎ槽3には
加熱器9を備え、HFC/E溶剤を沸騰状態に保持する
ことができ、一方、第2すすぎ槽はHFC/E溶剤の沸
点以下の温度に保持され、すすぎ効果を高めるために撹
拌機または超音波発振子12を設置することもできる。
各槽間はそれぞれ仕切り板で仕切られているが、上部は
共通の空間で、冷却部6と下部の槽群(2〜4)との間
がHFC/E飽和蒸気域5となっている。
In FIG. 1, reference numeral 3 denotes a first rinsing tank, and reference numeral 4 denotes a second rinsing tank, all of which are tanks for containing a liquid substantially consisting of the HFC / E solvent alone. The first rinsing bath 3 is provided with a heater 9 so that the HFC / E solvent can be kept in a boiling state, while the second rinsing bath is kept at a temperature equal to or lower than the boiling point of the HFC / E solvent, and the rinsing effect is reduced. A stirrer or an ultrasonic oscillator 12 may be provided to increase the height.
Each tank is partitioned by a partition plate, but the upper part is a common space, and the HFC / E saturated steam area 5 is provided between the cooling unit 6 and the lower tank group (2-4).

【0021】第1すすぎ槽3を加熱することにより、H
FC/Eは沸騰状態になり気化するが、HFC/E蒸気
の密度は空気に比べて大きいため(例えば常温での空気
の密度は約1.3kg/lであるのに対し、HFC43
−10meeの沸点での飽和蒸気密度は約10.0g/
lである。)、HFC/Eの蒸気は容器内に停滞し、さ
らに上昇しようとすると蒸気は容器の上部に配置された
冷却部6により凝縮され液化することによって槽群2,
3,4と冷却部6との間にHFC/E溶剤の飽和蒸気域
5が形成される。
By heating the first rinsing tank 3, H
Although FC / E is brought into a boiling state and vaporized, the density of HFC / E vapor is higher than that of air (for example, the density of air at room temperature is about 1.3 kg / l, whereas the density of HFC / E vapor is about 1.3 kg / l.
The saturated vapor density at the boiling point of -10 mee is about 10.0 g /
l. ), The HFC / E vapor stagnates in the vessel, and if it is going to rise further, the vapor is condensed and liquefied by the cooling unit 6 arranged in the upper part of the vessel, so that the tank group 2,
A saturated vapor region 5 of the HFC / E solvent is formed between the cooling units 6 and 3 and 4.

【0022】HFC/Eによるすすぎ方法は如何なる方
法でも良く、例えば図1においてヒーターで加熱されH
FC/E単体が沸騰している状態にある第1すすぎ槽3
(沸騰HFC/E浴)、または撹拌機あるいは超音波発
振子が設置されている第2すすぎ槽4(冷HFC/E
浴)のいづれか一方、もしくは双方のすすぎ槽を用い、
被洗浄物品表面の混合液をすすぎ落とせば良い。
The rinsing method by HFC / E may be any method. For example, in FIG.
First rinsing tank 3 in which the FC / E alone is boiling
(Boiling HFC / E bath) or the second rinsing tank 4 (cold HFC / E bath) provided with a stirrer or ultrasonic oscillator.
Bath) or one or both rinsing tanks,
The mixed liquid on the surface of the article to be cleaned may be rinsed off.

【0023】精密なすすぎを行うためには、洗浄が終了
した被洗浄物品を第1すすぎ槽3の沸騰HFC/Eに浸
漬し、被洗浄物品表面に付着した混合液中の有機化合物
をHFC/Eで置換し、更に第2すすぎ槽4(冷HFC
/E浴)に浸漬し、残りの有機化合物をHFC/Eで置
換した後、HFC/Eの沸点よりも低い温度に冷却され
た被洗浄物品を引き上げて、HFC/Eの飽和蒸気域5
に導入し、被洗浄物品表面で凝縮液化するHFC/Eに
より更に有機化合物とHFC/Eとの置換を行い、すす
ぎを完了する方法が行われる。
In order to carry out precise rinsing, the article to be washed after washing is immersed in boiling HFC / E of the first rinsing tank 3, and the organic compound in the mixed solution adhering to the surface of the article to be washed is washed with HFC / E. E, and further rinsed in the second rinse tank 4 (cold HFC
/ E bath), and the remaining organic compounds are replaced with HFC / E. Then, the article to be cleaned cooled to a temperature lower than the boiling point of HFC / E is pulled up, and the saturated vapor region 5 of HFC / E is removed.
HFC / E is condensed and liquefied on the surface of the article to be cleaned to further replace the organic compound with HFC / E to complete the rinsing.

【0024】すすぎを終了した被洗浄物品は洗浄装置1
の上部開口部より取り出される。被洗浄物品の表面は、
既に汚れも高沸点有機化合物も取り除かれ、HFC/E
単体のみにより濡れている状態であるため、これを気化
蒸散させることにより、きれいに洗浄された染みの無い
物品が得られる。
The article to be cleaned after the rinsing is applied to the cleaning apparatus 1.
Taken out from the upper opening. The surface of the article to be cleaned
Dirt and high boiling organic compounds have already been removed, and HFC / E
Since it is in a state of being wet only by a single substance, by vaporizing and evaporating it, a clean and stain-free article can be obtained.

【0025】以下、実施例により本発明を詳細に説明す
る。 [実施例1]一辺が100mmの正方形ステンレス製の
板にカルナバワックスを加熱溶解し均一に塗布したもの
を被洗浄物サンプルとした。HFC液体としてHFC4
3−10mee(沸点55℃)を使用し、有機化合物と
してコハク酸ジメチル、グルタル酸ジメチル、アジピン
酸ジメチルからなる混合物(DBE;Du Pont社
製;沸点205℃)を用い、HFC43−10meeを
35重量%、コハク酸ジメチル、グルタル酸ジメチル、
アジピン酸ジメチルからなる混合物を65重量%の割合
で混合し、洗浄液混合物とした。
Hereinafter, the present invention will be described in detail with reference to examples. [Example 1] Carnauba wax was heated and melted on a square stainless steel plate having a side of 100 mm and uniformly applied to obtain a sample to be cleaned. HFC4 as HFC liquid
Using a mixture of dimethyl succinate, dimethyl glutarate, and dimethyl adipate (DBE; manufactured by Du Pont; boiling point: 205 ° C.) as an organic compound, using HFC43-10mee (boiling point: 55 ° C.) and 35 wt. %, Dimethyl succinate, dimethyl glutarate,
A mixture of dimethyl adipate was mixed at a ratio of 65% by weight to obtain a washing liquid mixture.

【0026】この混合物を図1に示した装置(但し超音
波発振子12は設置せず)の洗浄槽2に収容し、第1す
すぎ槽3及び第2すすぎ槽4にはHFC43−10me
eを充填した。洗浄槽の温度を80℃に設定し、第1す
すぎ槽は沸騰させ、一方、第2すすぎ槽はHFC43−
10meeが沸騰以下に維持した。この状態で、前記被
洗浄物サンプルを先ず洗浄槽に浸漬し、下記の洗浄サイ
クルによりサンプルを各洗浄液に逐次浸漬及び蒸気接触
させて洗浄を行った。 (1)洗浄槽:洗浄液混合物温浴(80℃) :浸漬2分 (2)第1すすぎ槽:沸騰HFC浴 :浸漬30秒 (3)第2すすぎ槽:冷HFC浴 :浸漬30秒 (4)HFC飽和蒸気域 :蒸気洗浄30秒 洗浄終了後、サンプルを取り出し、目視により下記2段
階により洗浄性を判定した。 良好:ワックスが完全に除去 不可:一面にワックスが付着 結果を表1に示す。
This mixture is accommodated in the cleaning tank 2 of the apparatus shown in FIG. 1 (but without the ultrasonic oscillator 12), and the first rinsing tank 3 and the second rinsing tank 4 are filled with HFC43-10me.
e. The temperature of the washing tank was set to 80 ° C., the first rinsing tank was boiled, while the second rinsing tank was HFC43-
10 mee was kept below boiling. In this state, the sample to be cleaned was first immersed in a cleaning tank, and the sample was successively immersed in each cleaning liquid and brought into contact with steam in accordance with the following cleaning cycle for cleaning. (1) Washing tank: washing solution mixture warm bath (80 ° C.): 2 minutes immersion (2) First rinsing tank: boiling HFC bath: 30 seconds immersion (3) Second rinsing tank: cold HFC bath: 30 seconds immersion (4) HFC saturated steam area: steam washing 30 seconds After washing was completed, a sample was taken out, and the washing property was visually judged by the following two steps. Good: wax was completely removed. Impossible: wax adhered to one surface. The results are shown in Table 1.

【0027】[実施例2]一辺が65mm正方形プリン
ト基板にフラックス(住友金属社製;PO−F−350
0M)60μlをはんだ付けした。このプリント基板を
室温で1時間放置し被洗浄物品サンプルとした。HFC
液体としてHFC43−13mee(沸点55℃)を使
用し、有機化合物としてトリエチレングリコールジメチ
ルエーテル(沸点218℃)を用い、HFC43−10
meeを35重量%、トリエチレングリコールジメチル
エーテルを65重量%の割合で混合し、洗浄液混合物と
した。
Example 2 Flux (PO-F-350, manufactured by Sumitomo Metal Co., Ltd.) was applied to a 65 mm square printed circuit board.
0M) 60 μl were soldered. The printed circuit board was allowed to stand at room temperature for 1 hour to obtain a sample to be cleaned. HFC
HFC43-13mee (boiling point 55 ° C.) was used as the liquid, and triethylene glycol dimethyl ether (boiling point 218 ° C.) was used as the organic compound.
35% by weight of mee and 65% by weight of triethylene glycol dimethyl ether were mixed to prepare a cleaning liquid mixture.

【0028】この混合物を用いて、実施例1と同様にし
て洗浄試験を行った。ただし第2すすぎ槽に超音波発振
子12を設置した装置を用いて、第2すすぎ槽において
は超音波洗浄を行い、洗浄サイクルは下記の通りとし
た。 (1)洗浄槽:洗浄液混合物温浴(80℃) :浸漬30秒 (2)第1すすぎ槽:沸騰HFC浴 :浸漬30秒 (3)第2すすぎ槽:冷HFC浴 :超音波洗浄30秒 (4)HFC飽和蒸気域 :蒸気洗浄30秒 結果を表1に示す。
Using this mixture, a washing test was conducted in the same manner as in Example 1. However, ultrasonic cleaning was performed in the second rinse tank using an apparatus in which the ultrasonic oscillator 12 was installed in the second rinse tank, and the cleaning cycle was as follows. (1) Cleaning tank: cleaning solution mixture hot bath (80 ° C.): immersion 30 seconds (2) First rinsing tank: boiling HFC bath: immersion 30 seconds (3) Second rinsing tank: cold HFC bath: ultrasonic cleaning 30 seconds ( 4) HFC saturated steam area: steam cleaning for 30 seconds The results are shown in Table 1.

【0029】[実施例3]実施例1と同様の被洗浄物品
サンプルを用いた。HFE液体として1,2,2,2−
テトラフルオロエチル−ヘプタフルオロプロピルエーテ
ル(沸点40℃;”フレオンE−l”(Du Pont
社製)・・・以下HFEと呼ぶ)を使用し、有機化合
物としてコハク酸ジメチル、グルタル酸ジメチル、アジ
ピン酸ジメチルからなる混合物(DBE;Du Pon
t社製;沸点205℃)を用いHFEを20重量%、
コハク酸ジメチル、グルタル酸ジメチル、アジピン酸ジ
メチルからなる混合物を80重量%の割合で混合し、洗
浄液混合物とした。この混合物を用いて、実施例1と同
様にして、図1の装置を用いて、洗浄試験を行い、目視
により洗浄性を判定した。結果を表1に示す。
Example 3 The same article sample to be washed as in Example 1 was used. 1,2,2,2- as HFE liquid
Tetrafluoroethyl-heptafluoropropyl ether (boiling point 40 ° C .; “Freon E-1” (Du Pont
A mixture comprising dimethyl succinate, dimethyl glutarate and dimethyl adipate (DBE; Du Pon) as organic compounds.
t company; boiling point: 205 ° C.) and 20% by weight of HFE,
A mixture composed of dimethyl succinate, dimethyl glutarate, and dimethyl adipate was mixed at a ratio of 80% by weight to obtain a washing liquid mixture. Using this mixture, a washing test was carried out in the same manner as in Example 1 using the apparatus shown in FIG. 1, and the washing property was visually judged. Table 1 shows the results.

【0030】[実施例4]実施例3と同様の被洗浄物品
を用いた。HFE液体として1,1,1,2,3,3−
ヘキサフルオロ−2−ヘプタフルオロプロポキシ−3−
(1,2,2,2−テトラフルオロエトキシ)−プロパ
ン(沸点104℃;”フレオンE−2”(Du Pon
t社製)・・・以下HFEと呼ぶ)を使用し、有機化
合物としてプロピレングリコールモノプロピルエーテル
を用い、HFEを40重量%、プロピレングリコール
モノプロピルエーテルを60重量%の割合で混合し、洗
浄液混合物とした。この混合物を用いて、実施例3と同
様にして、図1の装置を用いて、洗浄試験を行い、目視
により洗浄性を判定した。結果を表1に示す。
Example 4 The same article to be cleaned as in Example 3 was used. 1,1,1,2,3,3- as HFE liquid
Hexafluoro-2-heptafluoropropoxy-3-
(1,2,2,2-tetrafluoroethoxy) -propane (boiling point 104 ° C .; “Freon E-2” (Du Pon
using HFE), propylene glycol monopropyl ether as an organic compound, HFE at a ratio of 40% by weight, and propylene glycol monopropyl ether at a ratio of 60% by weight. And Using this mixture, a washing test was carried out in the same manner as in Example 3 using the apparatus shown in FIG. 1, and the washing property was visually determined. Table 1 shows the results.

【0031】[比較例1]実施例1において、高沸点有
機化合物として、コハク酸ジメチル、グルタル酸ジメチ
ル、アジピン酸ジメチル混合物の代わりに、ノルマルド
デカンとノルマルウンデカンからなる混合物(NSクリ
ーン200;日鉱石化社製;初留点189℃)を用いた
以外は、実施例1と同様にして、図1の装置を用いて、
HFC43−13meeとの混合溶剤による洗浄試験を
行ったが、使用した有機溶剤がHFC43−10mee
と相溶性が無いため、混合溶剤の温度はNSクリーン2
00沸騰状態でも50℃迄しか上がらず、一面にワック
スが付着しており、ワックスの除去ができなかった。結
果を表1に示す。
Comparative Example 1 In Example 1, instead of a mixture of dimethyl succinate, dimethyl glutarate and dimethyl adipate as a high boiling organic compound, a mixture consisting of normal dodecane and normal undecane (NS Clean 200; Nippon Mining ore) Except for using the first boiling point of 189 ° C.) and using the apparatus of FIG.
A cleaning test with a mixed solvent with HFC43-13mee was performed, and the organic solvent used was HFC43-10mee.
Temperature is not compatible with NS Clean 2
Even in the boiling state, the temperature rose only up to 50 ° C., and wax was adhered to one side, so that the wax could not be removed. Table 1 shows the results.

【0032】[0032]

【表1】 HFC:HFC43-10mee HFE:1,2,2,2-テトラフルオロエチル−ヘプタフル
オロプロピルエーテル HFE:1,1,1,2,3,3-ヘキサフルオロ−2−ヘプタフ
ルオロプロポキシ−3-(1,2,2,2-テトラフルオロエトキ
シ)−プロパン
[Table 1] HFC: HFC43-10mee HFE: 1,2,2,2-tetrafluoroethyl-heptafluoropropyl ether HFE: 1,1,1,2,3,3-hexafluoro-2-heptafluoropropoxy-3- (1 , 2,2,2-Tetrafluoroethoxy) -propane

【0033】[0033]

【発明の効果】本発明の洗浄方法により、非引火性であ
るが洗浄力の乏しいハイドロフルオロカーボン(HF
C)またはハイドロフルオロエーテル(HFE)と特定
の有機化合物とを用い、洗浄とすすぎを行うことによ
り、油フラックス等の汚れに対し、引火性の危険もな
く、CFC−113と同等の洗浄効果を得ることが可能
となった。
According to the cleaning method of the present invention, hydrofluorocarbon (HF) which is nonflammable but has poor cleaning power
By performing cleaning and rinsing using C) or hydrofluoroether (HFE) and a specific organic compound, a cleaning effect equivalent to that of CFC-113 can be obtained with respect to dirt such as oil flux without danger of flammability. It became possible to obtain.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の洗浄方法を実施するための装置の1例
である。
FIG. 1 is an example of an apparatus for performing a cleaning method of the present invention.

【符号の説明】[Explanation of symbols]

1 容器 2 洗浄槽 3 第1すすぎ槽(沸騰HFC/E浴) 4 第2すすぎ槽(冷HFC/E浴) 5 HFC/E飽和蒸気域 6 冷却部 7 ヒーター 8 攪拌機 9 ヒーター 10 仕切壁 11 仕切壁 12 超音波発振子 DESCRIPTION OF SYMBOLS 1 Container 2 Cleaning tank 3 1st rinsing tank (boiling HFC / E bath) 4 2nd rinsing tank (cold HFC / E bath) 5 HFC / E saturated vapor area 6 Cooling unit 7 Heater 8 Stirrer 9 Heater 10 Partition wall 11 Partition Wall 12 ultrasonic oscillator

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 被洗浄物品を、沸点が30〜150℃の
範囲のハイドロフルオロカーボン(HFC)またはハイ
ドロフルオロエーテル(HFE)もしくはそれらの混合
物液体と、該HFCまたはHFE液体の沸点よりも50
℃以上高い沸点を有し、且つ該HFCまたはHFEと相
溶性のある有機化合物との混合物の温浴を用いて汚れを
除去し、次いで該HFCまたはHFE単体にて被洗浄部
品に付着した有機化合物をすすいで除去することを特徴
とする物品の洗浄方法。
1. An article to be cleaned is prepared by mixing a hydrofluorocarbon (HFC) or a hydrofluoroether (HFE) having a boiling point in the range of 30 to 150 ° C. or a mixture thereof with a liquid having a boiling point of 50 to 50 ° C. higher than the boiling point of the HFC or HFE liquid.
The dirt is removed using a warm bath of a mixture of an organic compound having a boiling point higher than or equal to 0 ° C. and compatible with the HFC or HFE, and then the organic compound adhering to the part to be cleaned with the HFC or HFE alone is removed. A method for cleaning articles characterized by rinsing and removing.
【請求項2】 ハイドロフルオロカーボンが、1,1,
1,2,3,4,4,5,5,5−デカフルオロペンタ
ン及び/または1,1,2,2,3,3,4,4−オク
タフルオロブタンである請求項2記載の洗浄方法。
2. The method according to claim 1, wherein the hydrofluorocarbon is 1,1,
3. The cleaning method according to claim 2, which is 1,2,3,4,4,5,5,5-decafluoropentane and / or 1,1,2,2,3,3,4,4-octafluorobutane. .
【請求項3】 ハイドロフルオロエーテルが、1,2,
2,2−テトラフルオロエチル−ヘプタフルオロプロピ
ルエーテル及び/または1,1,1,2,3,3−ヘキ
サフルオロ−2−ヘプタフルオロプロピロキシ−3−
(1,2,2,2−テトラフルオロエトキシ)−プロパ
ンである請求項1記載の洗浄方法。
3. The method of claim 1, wherein the hydrofluoroether is 1,2,2.
2,2-tetrafluoroethyl-heptafluoropropyl ether and / or 1,1,1,2,3,3-hexafluoro-2-heptafluoropropoxy-3-
The cleaning method according to claim 1, wherein (1,2,2,2-tetrafluoroethoxy) -propane is used.
【請求項4】 有機化合物がグリコールエーテル、エス
テルのいづれかもしくはそれらの混合物である請求項1
〜3のいづれかに記載の洗浄方法。
4. The method according to claim 1, wherein the organic compound is a glycol ether, an ester, or a mixture thereof.
The cleaning method according to any one of Items 1 to 3.
JP00385297A 1996-05-20 1997-01-13 Cleaning method Expired - Fee Related JP4063906B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP00385297A JP4063906B2 (en) 1996-05-20 1997-01-13 Cleaning method

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Application Number Priority Date Filing Date Title
JP8-124452 1996-05-20
JP12445296 1996-05-20
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ID=26337497

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