JPH10303116A - Bubble generation preventing mechanism, liquid treating device using it, and liquid supplying mechanism - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a bubble generation preventing mechanism which can prevent the generation of bubbles in a treating solution, even when the flow of the treating solution is stopped, and a liquid treating device using the mechanism. SOLUTION: Even when a treating solution is transported to a nozzle side due to the inertia of the solution when the flow of the treating solution is stopped, the occurrence of a reduced-pressure state on the downstream of an air-operated valve 81 can be prevented, because bellows 85 shrink correspondingly to the inertia of the treating solution and reduce the volume of the treating solution in a pipeline 84. Therefore, the generation of bubbles on the downstream of the valve 81 can be prevented when the internal pressure of the pipeline returns to a normal state from the reduced state.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a bubble generation preventing mechanism suitable for liquid processing such as application and development of a resist liquid performed on an object to be processed, such as a semiconductor wafer or an LCD substrate, and an apparatus using the same. The present invention relates to a liquid processing device and a liquid supply mechanism.

[0002]

2. Description of the Related Art For example, in the manufacture of a semiconductor device or a liquid crystal display (LCD) substrate, a photoresist is applied to a semiconductor wafer or an LCD substrate as an object to be processed, and a circuit pattern is formed using a photolithography technique. The circuit is formed by transferring the image to a substrate and developing it.

In such liquid processing, a processing solution such as a resist solution, a developing solution, and a thinner is sent out from a tank containing the solution, transported through a pipeline, and supplied to the surface of the workpiece through a nozzle. You. In this case, the start / stop of the flow of the processing liquid in the pipeline is controlled by opening / closing a valve which is an opening / closing means provided in the middle of the pipeline.

[0004]

In the case where the flow of the processing liquid is started and stopped by opening and closing the valve as described above, when the flow of the processing liquid is stopped by closing the valve, the flow immediately downstream of the opening and closing part is instantly obtained. The pressure is reduced. That is, when the processing liquid flow state is suddenly stopped by closing the valve, the processing liquid flow stops at the moment upstream of the opening / closing portion, but is downstream of the opening / closing portion, particularly immediately downstream. However, it does not stop at that moment, the volume changes due to the inertia of the processing solution, and the pressure is temporarily reduced.

[0005] As described above, when the pressure immediately downstream of the opening / closing portion is temporarily reduced, the gas dissolved in the liquid tends to foam easily, and the bubbles remain in the processing liquid even when the pressure returns to the normal pressure.
At the tip of the nozzle, as shown in FIG.
When the valve is closed, the liquid 101 once flows out of the nozzle tip 100 due to the inertia of the flow of the processing liquid, and then, as shown in FIG. Since the gas 102 is sometimes sucked, the liquid drainage property at the tip is deteriorated, and dropping or the like easily occurs.

[0006] As described above, when bubbles are generated in the processing liquid, when the processing liquid is a resist liquid, when the resist liquid is supplied to the surface of the object to be processed, coating unevenness occurs. Is a developing solution, a non-developed portion is generated. Therefore, it is desired that bubbles are not generated in the processing liquid even when the flow of the processing liquid is stopped.

Conventionally, in order to prevent the generation of air bubbles, for example, in an air operated valve, the speed of closing the valve is adjusted by a speed controller or the like, but the adjustment range is limited, and the adjustment speed is limited to a desired speed. It cannot be lowered or cannot open and close due to the cracking pressure of the valve. This tendency is more likely to occur as the flow path increases and the flow rate of the fluid increases, and as the flow velocity increases.

The present invention has been made in view of the above points, and has an air bubble generation preventing mechanism capable of effectively preventing air bubbles from being generated in a processing liquid even when the flow of the processing liquid is stopped. An object of the present invention is to provide a used liquid processing apparatus and a liquid supply mechanism.

[0009]

According to a first aspect of the present invention, there is provided a bubble generation preventing mechanism for preventing bubbles from being generated in a processing liquid when the processing liquid is supplied to an object to be processed. A processing liquid flow path for allowing the processing liquid to flow from the processing liquid supply system to the processing target; and a processing liquid flow path provided in the processing liquid flow path, the processing liquid flow path between the processing target supply system side and the processing target side. An opening / closing means for starting / stopping the flow of the processing liquid; and a bubble generation preventing unit for alleviating a pressure change on the side of the object to be processed with respect to the opening / closing portion of the opening / closing means when the flow of the processing liquid is stopped. A bubble generation preventing mechanism is provided.

According to a second aspect of the present invention, in the first aspect, a partial pressure generated in the processing liquid flow path due to inertia of the processing liquid when the bubble generation preventing section stops the flow of the processing liquid. A bubble generation preventing mechanism is provided, which has an expansion / contraction member that expands and contracts in response to a change to cause a change in the volume of a flow path.

According to a third aspect of the present invention, there is provided the bubble generation preventing mechanism according to the first or second invention, wherein a bubble generation preventing portion is provided in the processing liquid flow path. 4th
The invention provides a bubble generation preventing mechanism according to the first or second invention, wherein a bubble generation preventing portion is provided in the opening / closing means.

According to a fifth aspect of the present invention, there is provided a liquid processing apparatus for performing processing by supplying a processing liquid to a processing object, wherein the processing liquid supply unit supplies the processing liquid to the surface of the processing object, and the processing liquid supply unit supplies the processing liquid to the processing liquid supply unit. A processing liquid supply system for supplying a liquid, an opening / closing means provided between the processing liquid supply means and the processing liquid supply system for starting and stopping the flow of the processing liquid, and stopping the flow of the processing liquid. A liquid processing apparatus comprising: a bubble generation preventing unit configured to relieve a pressure change on a processing target side of a liquid opening / closing part of the opening / closing unit.

[0013] In a sixth aspect based on the fifth aspect, the bubble generation preventing section is configured such that when the flow of the processing liquid is stopped, the partial pressure generated in the processing liquid flow path generated by the inertia of the processing liquid. Provided is a liquid processing apparatus having a swelling member that expands and contracts according to a change to cause a volume change of a flow path.

According to a seventh aspect of the present invention, there is provided the liquid processing apparatus according to the fifth or sixth aspect, wherein a bubble generation preventing portion is provided between the processing liquid supply means and the processing liquid supply system. I do. An eighth invention provides the liquid processing apparatus according to the fifth invention or the sixth invention, wherein a bubble generation preventing portion is provided in the opening / closing means.

According to a ninth aspect of the present invention, there is provided a liquid flow path having an expanding / contracting portion whose volume can be changed, and when the flow of the liquid in the flow path is stopped, the liquid flows from the front end of the flow path by inertia of the liquid. The liquid supply mechanism is characterized in that the liquid supply mechanism is prevented from spilling out.

According to the first aspect of the present invention, the flow of the processing liquid is stopped by the bubble generation preventing portion because the pressure change on the side of the object to be processed is reduced more than the opening / closing portion of the opening / closing means when the flow of the processing liquid is stopped. In this case, it is possible to prevent the pressure immediately downstream of the opening / closing portion from being reduced, and to prevent the liquid from flowing out too much from the front end when the flow is stopped. As a result, the generation of bubbles can be prevented.

According to the second aspect of the present invention, since the bubble generation preventing portion has the expanding / contracting member capable of expanding / contracting, when the flow of the processing liquid is stopped, the opening / closing portion of the opening / closing means is closer to the object to be processed. It expands and contracts in response to changes in pressure, and can prevent a decompression state immediately downstream of the open / close section even when the flow of the processing liquid is stopped, and also prevents the liquid from flowing too far from the tip when the flow is stopped. As a result, generation of bubbles can be prevented. In addition, as such an expansion / contraction member, for example, a bellows, a flexible tube,
Accumulators and the like are preferred.

According to the sixth and seventh aspects of the present invention, the bubble generation preventing mechanisms of the first and second aspects of the present invention are applied to a liquid processing apparatus for supplying a processing liquid to an object to perform processing. Therefore, liquid processing can be performed on an object to be processed with a processing liquid in which bubbles are prevented from being generated, so that defective liquid processing can be reduced.

Further, as in the third and seventh aspects of the present invention, by providing the bubble generation preventing portion between the processing liquid supply means and the processing liquid supply system, the existing opening / closing means can be applied as it is. .

Further, as in the fourth and eighth inventions, by providing a bubble generation preventing portion in the opening / closing means,
It is possible to avoid the occurrence of a reduced pressure state immediately downstream of the liquid opening / closing portion. Since the depressurized state is more likely to occur as the position is closer to the opening / closing portion, this configuration can more effectively prevent the generation of bubbles.

Further, according to the ninth aspect, the apparatus has a liquid flow path having an expanding / contracting portion whose volume can be changed, and when the flow of the liquid in the flow path is stopped, the inertia of the liquid causes the liquid to flow. Since the liquid is prevented from spilling out from the front end of the flow path, there is no suction of air from the front end of the liquid flow path and the like, and the liquid drainage property is improved.
That is, dropping or the like is prevented.

[0022]

Embodiments of the present invention will be described below in detail with reference to the accompanying drawings. FIG. 1 is a perspective view showing an LCD substrate coating / developing processing system to which the present invention is applied.

This coating / developing processing system includes a cassette station 1 on which a cassette C accommodating a plurality of substrates S is mounted, and a plurality of processing units for performing a series of processing including resist coating and developing on the substrates S. Processing unit 2 provided
And the cassette C on the cassette station 1 and the processing unit 2
And a transport mechanism 3 for transporting the LCD substrate between them. Then, at the cassette station 1, the cassette C is carried into and out of the system. The transport mechanism 3 includes a transport arm 11 that can move on a transport path 12 provided along the direction in which the cassettes are arranged. The transport arm 11 transports the substrate S between the cassette C and the processing unit 2. Done.

The processing unit 2 comprises a first stage 2a and a second stage 2b.
, Each having passages 15 and 16 at the center, and processing units disposed on both sides of these passages. A relay section 17 is provided between them.

The front stage 2a has a main arm 18 movable along a passage 15. On one side of the passage 15, a brush washing unit 21, a water washing unit 22, an adhesion processing unit 23, and a cooling unit 24 are provided.
However, two resist coating units 25 are disposed on the other side. On the other hand, the rear section 2b includes a main arm 19 that can move along the passage 16. On one side of the passage 19, a heat system unit group 28 including a plurality of heat treatment units 26 and cooling units 27 is provided. On the side, two development processing units 29 are arranged. In the thermal system unit group 28, a set formed by stacking two units
Are arranged in a row, and the upper stage is a heat treatment unit 26.
And the lower stage is the cooling unit 27. The heat treatment unit 26 performs pre-bake for stabilizing the resist, post-exposure bake after exposure, and post-bake treatment after development. Note that an interface unit 30 for transferring the substrate S to and from an exposure apparatus (not shown) is provided at the rear end of the rear stage unit 2b.

The main arm 18 transfers the substrate S to and from the arm 11 of the transport mechanism 3, and loads and unloads the substrate S to and from the respective processing units in the former stage 2 a. Has a function of transferring the substrate S. Further, the main arm 19 transfers the substrate S to and from the relay unit 17, and also loads and unloads the substrate S to and from each processing unit of the subsequent-stage unit 2 b, and transfers the substrate S to and from the interface unit 30. It has a function to perform. By consolidating and integrating the processing units in this manner, space saving and processing efficiency can be achieved.

In the coating / developing processing system configured as described above, the substrate S in the cassette C is transported to the processing section 2 and firstly, the cleaning unit 21 and the water cleaning unit 2
The cleaning unit 2 cleans the resist, the adhesion treatment unit 23 increases the hydrophobicity of the resist in order to enhance the fixability of the resist, and the cooling unit 24 cools the resist. Thereafter, the substrate S is subjected to a pre-baking process in one of the heat processing units 26 and cooled by a cooling unit 27, and then is conveyed to an exposure device via an interface unit 30, where a predetermined pattern is exposed. Then, it is carried again through the interface unit 30 and subjected to post-exposure bake processing in one of the heat processing units 26. After that, the substrate S cooled by the cooling unit 27 is
And a predetermined circuit pattern is formed. The developed substrate S is accommodated in a predetermined cassette on the cassette station 1 by the main arms 19 and 18 and the transport mechanism 3.

The bubble generation preventing mechanism, which is the object of the present invention,
Among the above-mentioned systems, the present invention is applied to the resist coating unit 25 and the developing unit 29.

FIG. 2 is a view showing a resist liquid and solvent supply system in the resist coating unit 25. The resist coating unit 25 has a spin chuck 31 for holding the substrate S by suction, and a nozzle holder 32 is provided above the spin chuck 31. A resist solution nozzle 33 and a solvent nozzle 34 are attached to the nozzle holder 32, and are connected to a resist solution supply system 40 and a solvent supply system 50, respectively. The substrate S held by the spin chuck 31 is surrounded by a rotatable cup (not shown), and the cup is closed by a lid (not shown) during the coating operation.

The resist solution supply system 40 has a resist solution supply pipe 41. The resist solution nozzle 33 is provided at one end, and a resist solution container 42 is provided at the other end. The resist solution in the resist solution container 42 is
It is supplied to the nozzle 33 by the bellows pump 43. The bellows pump 43 is capable of sucking the resist solution and sending the resist solution by rotating the ball screw 45 by the stepping motor 44.

The resist solution sent from the bellows pump 43 is discharged from the resist solution nozzle 33 through a filter 46, a degassing mechanism 47, an air operation valve 48, and a suck back valve 49. The air operation valve 48 has a function of opening and closing a resist solution supply pipe, and the suck-back valve 49 has a function of pulling back the resist solution remaining at the tip of the nozzle 33 to prevent solidification thereof. Have. As described below,
Downstream of the air operation valve 48 or inside the air operation valve 48, a bubble generation preventing portion is provided, and these form a bubble generation preventing mechanism.

The solvent supply system 50 has a solvent supply pipe 51, one end of which is provided with the solvent nozzle 34, and the other end of which is provided with a solvent container 52. For example, a thinner is stored as a solvent in the solvent container 52,
This solvent is supplied to the nozzle 34 by gas pressure feeding. This gas pressure feeding is performed by supplying a pressure feeding gas in the gas cylinder 53, for example, a nitrogen gas into the container 52. The solvent in the solvent container 52 is discharged from the nozzle 34 through the filter 54 and a degassing mechanism 55 to be described later by being gas-fed.

FIG. 3 is a view showing a developing solution supply system in the developing unit 29. The developing unit 29 has a chuck 73 for sucking and holding the substrate S, a nozzle 72 having a width substantially equal to that of the substrate S above the nozzle 73 and a plurality of liquid ejection holes at the bottom thereof along the longitudinal direction thereof. Is provided. The nozzle 72 is connected to the developer supply system 60. The substrate S held by the chuck 73 is surrounded by a cup (not shown).

The developing solution supply system 60 has a developing solution container 61 in which the developing solution is stored. A gas cylinder 63 storing, for example, nitrogen gas as a pumping gas is connected to the container 61 via a pipe 64. Also,
The end of the pipe 62 is immersed in the developer in the container 61, and the intermediate container 66 and the degassing mechanism 67
Are provided in order. Then, the developer in the container 61 is supplied to the container 61 through a pipe 64 by a pressure-supplying gas, for example, a nitrogen gas, in a gas cylinder 63, and is thus fed to a nozzle 72 through a pipe 62. A limit sensor 66a and an empty sensor 66b, for example, each composed of a capacitance sensor, are provided outside the intermediate container 66. Signals from these sensors are output to a controller (not shown), and the position of the liquid level of the developer is determined. Controlled.

On the downstream side of the degassing mechanism 67, the pipe 62 branches into a plurality of pipes, for example, a pipe 62a and a pipe 62b, and each pipe has a flow meter 68a, 68b, a filter 69a, 69b, water jackets 70a and 70b through which temperature regulating water is circulated, and air operation valves 71a and 71b are provided in this order. The developing solution is introduced into the nozzle 72 from two locations through these two pipes. And when developing,
The developer discharged from the liquid discharge holes provided at the bottom of the nozzle 72 is supplied to the substrate S. As described later, a bubble generation preventing portion is provided downstream of the air operation valve or inside the air operation valve, and these components constitute a bubble generation prevention mechanism.

Next, the bubble generation preventing mechanism according to the present invention will be described. FIG. 4 is a plan view illustrating an embodiment in which a bubble generation preventing unit is provided in a processing liquid supply pipe.
The air operation valve 81 is provided with a processing liquid inlet 82 and a processing liquid outlet 83, and introduces the processing liquid transported from the processing liquid pipeline 84 through the processing liquid inlet 82 to start the flow of the processing liquid. In accordance with the stop signal, the processing liquid is appropriately led out from the processing liquid outlet 83.

Downstream of the air-operated valve 81, that is, on the substrate S side (nozzle side) from the processing liquid outlet, the expansion and contraction deformation is performed according to the pressure change so as to reduce the pressure change when the flow of the processing liquid is stopped. A bellows 85 as an expansion / contraction member is provided. The bellows 85 is provided with a processing liquid conduit 84 generated due to the inertia of the processing liquid when the flow of the processing liquid is stopped, that is, the property that the processing liquid tends to flow to the nozzle side even if the flow of the processing liquid is stopped. Prevents partial pressure changes inside.

In the above configuration, when the flow of the processing liquid is stopped by the air-operated valve 81, the flow of the processing liquid is stopped upstream of the air-operated valve 81 while closing the valve. On the other hand, downstream of the air operation valve 81, even if the flow of the processing liquid is stopped, the processing liquid is slightly transported to the nozzle side by inertia. At this time, if the downstream side of the air operated valve 81 is in a rigid state as in the conventional configuration, the pressure is reduced downstream of the air operated valve 81.
Even if the flow of the processing liquid is stopped and the processing liquid is transported to the nozzle side due to the inertia of the processing liquid, the bellows 85 shrinks according to the pressure change, and the volume in the processing liquid pipe 84 is reduced. Thus, it is possible to avoid a pressure reduction state downstream of the air operation valve 81. Therefore, it is possible to prevent generation of bubbles when returning from the reduced pressure state to the normal pressure state downstream of the air operation valve 81. Further, since the bellows 85 is provided downstream of the air-operated valve 81 in such a manner that the pressure expands and contracts in response to a change in pressure during the passage of the processing liquid, the processing liquid does not flow out at the nozzle tip and the processing liquid does not flow out too much. In addition, it is possible to prevent the gas from being sucked into the nozzle.

In the present invention, instead of the bellows 85, instead of the bellows 85, as an expanding / contracting member which expands / contracts in response to the pressure change, the pressure change is reduced when the flow of the processing liquid is stopped.
As shown in FIG. 5, a flexible tube 86 made of an elastic material such as rubber such as silicone rubber or a soft resin such as silicone resin may be provided in the processing liquid pipeline 84 downstream of the air-operated valve 81. As shown in
An accumulator 87 may be provided in the processing liquid pipeline 84 downstream of the air operation valve 81. The expansion / contraction member is not limited to these, and any member made of an elastic material and capable of freely expanding and contracting according to the amount of gas can be used.

With such a configuration, the volume in the processing liquid conduit 84 can be reduced in response to the pressure change in the same manner as described above, and the pressure can be prevented from being reduced downstream of the air operation valve 81. , Whereby the air operated valve 8
The generation of air bubbles when returning from the reduced pressure state to the normal pressure state downstream of 1 is prevented. In addition, the flow of the processing liquid is prevented from being excessively discharged at the nozzle tip when the flow is stopped, so that the suction of gas from the nozzle can be prevented.

Next, another embodiment of the bubble generation preventing mechanism according to the present invention will be described. FIG. 7 is a plan view showing an embodiment in which the bubble generation preventing mechanism of the present invention is provided in an air-operated valve which is an opening / closing means. The air-operated valve 91 has a processing liquid inlet 92 and a processing liquid outlet 93, and introduces the processing liquid transported from the processing liquid conduit through the processing liquid inlet 92, and starts and stops the flow of the processing liquid. The processing liquid is appropriately led out of the processing liquid outlet 93 in accordance with the following.

The processing liquid passage 95 of the cylinder 94 of the air-operated valve 91 is substantially horizontal from the processing liquid inlet 92, and turns upward toward the liquid opening / closing section 96 on the way.
It is directed downward at the downstream side of the liquid opening / closing section 96, and is turned again so as to be substantially horizontal, and is connected to the processing liquid outlet 93.

In the liquid opening / closing section 96, a membrane 97 covers the processing liquid passage 95, and the membrane 97 is attached to the entire circumference of the inner wall of the cylinder 94, and a piston which moves up and down by supplying and discharging air therethrough. It is designed to be pressed and released at the tip of 98. The piston 98 is urged by a spring 99 disposed above the liquid opening / closing section 96. Therefore, normally, the tip of the piston 98 presses the membrane member 97 by the spring 99 to close the liquid opening / closing section 96. Further, the piston 98 is provided with a flange 98a, and the inside of the cylinder 94 is divided into two by the flange 98a. In this divided cylinder 94,
Air supplies 100 and 101 for supplying air are provided.

Further, the expansion and contraction which expands and contracts in response to the pressure change so as to reduce the pressure change when the flow of the processing liquid is stopped is provided downstream of the liquid opening / closing portion 96 of the processing liquid passage 95. A bellows 102 as a member is attached. The bellows 102 is covered by a cover 103.
An air port 104 for adjusting a volume change in the inside is provided.

In the above configuration, when the processing liquid is discharged from the nozzle, air is introduced from the air supply unit 101 to increase the volume of a region below the flange 98a to bias the piston 98 by the spring 99. Raise against pressure.
As a result, the processing liquid being pumped by opening the liquid opening / closing section 96 flows through the processing liquid passage 95. As a result, the processing liquid is supplied to the substrate S from the nozzle.

When the flow of the processing liquid is stopped, air is introduced from the air supply unit 100 to increase the volume of the region above the flange 98a, and the piston 98 is lowered together with the urging pressure of the spring 99. . Thereby, the piston 98
Is pressed against the membrane, and the liquid opening / closing section 96 is closed.

When the flow of the processing liquid is stopped in this way, the flow of the processing liquid stops at the upstream of the liquid opening / closing section 96 while closing the valve. On the other hand, downstream of the liquid opening / closing section 96, even if the flow of the processing liquid is stopped, the processing liquid is slightly transported to the nozzle side by inertia. At this time, even if the processing liquid is transported to the nozzle side due to the inertia of the processing liquid, the bellows 102 shrinks in response to the pressure change, and reduces the volume in the processing liquid passage 95. Thus, it is possible to avoid a pressure reduction state downstream of the liquid opening / closing section 96. Therefore, it is possible to prevent the generation of bubbles when returning from the reduced pressure state to the normal pressure state downstream of the liquid opening / closing section 96. Further, as described above, the liquid opening / closing section 9
By providing the bellows 102 downstream of 6, the processing liquid expands and contracts in response to a change in pressure during the flow of the processing liquid. Suction can be prevented.

Also in this embodiment, as shown in FIG. 8, instead of the bellows 102, instead of the bellows 102, a pressure change is caused when the flow of the processing liquid is stopped, or the expansion and contraction member is expanded and contracted in accordance with the pressure change. For example, a flexible tube 105 made of an elastic material such as rubber such as silicone rubber or a soft resin such as silicone resin may be provided in the processing liquid passage 95 downstream of the liquid opening / closing unit 96.

In this embodiment, an expansion / contraction member that expands and contracts in response to a change in pressure is provided downstream of the liquid opening / closing section 96 so as to reduce a change in pressure when the flow of the processing liquid is stopped. As shown in FIGS. 9 and 10, the member is not directly provided in the processing liquid passage 95, and the processing liquid passage 9 is not provided.
5 may be provided on the cover 103. That is, FIG.
As shown in FIG.
3 and a bellows 102 may be provided in the cover 103. As shown in FIG. 10, the processing liquid passage 95 is branched and extended into the cover 103, and an accumulator 106 is provided in the cover 103. May be provided. Further, the expansion and contraction member is not limited to these, and any member made of an elastic material and capable of freely expanding and contracting according to the amount of gas can be used.

Also in these configurations, the volume in the processing liquid passage 95 is reduced in response to the pressure change in the same manner as described above, and it is possible to avoid a pressure reduction downstream of the liquid opening / closing section 96. This prevents the generation of air bubbles when returning from the reduced pressure state to the normal pressure state downstream of the liquid opening / closing section 96. In addition, the flow of the processing liquid is prevented from being excessively discharged at the nozzle tip when the flow is stopped, so that the suction of gas from the nozzle can be prevented.

Note that the present invention is not limited to the above-described embodiment, and various modifications are possible. For example, in the above embodiment, the case where an air operated valve is used as the opening / closing means is described, but the present invention can be applied to other opening / closing means, for example, a solenoid valve. Also,
In the above embodiment, the example in which the bubble generation preventing mechanism of the present invention is applied to the resist coating / developing unit has been described. However, the present invention is not limited to this, and may be applied to other processing.

In the above embodiment, the processing liquid discharge means is connected to the processing liquid supply system (tank). However, the present invention is not limited to this. For example, an opening / closing member (valve) and processing liquid supply means (nozzle) The effect of the present invention can be achieved even if a pump or a discharge means using N ₂ pressurization is provided between them.

Further, in the above embodiment, the case where the LCD substrate is used as the object to be processed has been described. However, the present invention is not limited to this, and can be applied to the case of processing another object to be processed such as a semiconductor wafer.

[0054]

As described above, according to the first aspect of the present invention, when the flow of the processing liquid is stopped, the change in pressure on the processing target side relative to the opening / closing portion of the opening / closing means is alleviated by the bubble generation preventing section. When the flow of the processing liquid is stopped, it is possible to prevent the pressure immediately downstream of the opening / closing portion from being reduced, and also to prevent the liquid from excessively flowing out from the front end when the flow is stopped. Generation can be prevented.

According to the second aspect, since the bubble generation preventing portion has the expanding / contracting member capable of expanding / contracting deformation, when the flow of the processing liquid is stopped, the opening / closing portion of the opening / closing means is closer to the object to be processed. It expands and contracts in response to a change in pressure, and can prevent a decompression state immediately downstream of the open / close portion even if the flow of the processing liquid is stopped. As a result, generation of bubbles can be prevented.

According to the fifth and sixth aspects of the present invention, the bubble generation preventing mechanisms of the first and second aspects of the present invention are applied to a liquid processing apparatus for supplying a processing liquid to a processing target and performing processing. Therefore, liquid processing can be performed on an object to be processed with a processing liquid in which bubbles are prevented from being generated, so that defective liquid processing can be reduced.

Further, according to the third and seventh aspects of the present invention, the existing opening / closing means can be applied as it is by providing the bubble generation preventing portion between the processing liquid supply means and the processing liquid supply system. .

Further, according to the fourth and eighth aspects of the present invention, the air bubble generation preventing portion is provided in the opening / closing means.
It is possible to avoid the occurrence of a reduced pressure state immediately downstream of the liquid opening / closing portion. Since the depressurized state is more likely to occur as the position is closer to the opening / closing portion, this configuration can more effectively prevent the generation of bubbles.

Further, according to the ninth aspect, there is provided a liquid flow path having an expanding / contracting portion capable of changing the volume, and when the flow of the liquid through the flow path is stopped, the inertia of the liquid causes the liquid to flow. Since the liquid is prevented from spilling out from the front end of the flow path, there is no suction of air from the front end of the liquid flow path and the like, and the liquid drainage property is improved.
That is, dropping or the like is prevented.

[Brief description of the drawings]

FIG. 1 is a perspective view showing a resist coating / developing system to which a bubble generation preventing mechanism to which the present invention is applied is applied.

FIG. 2 is a diagram showing a resist liquid and solvent supply system in a resist coating unit in which the bubble generation preventing mechanism of the present invention is incorporated.

FIG. 3 is a diagram showing a developer supply system in a developing unit in which the bubble generation preventing mechanism of the present invention is incorporated.

FIG. 4 is a plan view showing an embodiment in which the bubble generation preventing mechanism of the present invention is provided in a processing liquid supply pipe.

FIG. 5 is a plan view showing another embodiment in which the bubble generation preventing mechanism of the present invention is provided in a processing liquid supply pipe.

FIG. 6 is a plan view showing another embodiment in which the bubble generation preventing mechanism of the present invention is provided in a processing liquid supply pipe.

FIG. 7 is a plan view showing an embodiment in which the bubble generation preventing mechanism of the present invention is provided in the opening / closing means.

FIG. 8 is a plan view showing another embodiment in which the bubble generation preventing mechanism of the present invention is provided in the opening / closing means.

FIG. 9 is a plan view showing another embodiment in which the bubble generation preventing mechanism of the present invention is provided in the opening / closing means.

FIG. 10 is a plan view showing another embodiment in which the bubble generation preventing mechanism of the present invention is provided in the opening / closing means.

FIG. 11 is a schematic diagram for explaining a liquid dripping at a tip portion of a conventional liquid supply nozzle.

[Explanation of symbols]

 25 resist coating unit 29 developing unit 33 resist liquid nozzle 34 solvent nozzle 40 resist liquid supply system 41 resist liquid supply pipe 42 resist liquid container 50 solvent supply system 51 ... Solvent supply pipe 52 ... Solvent container 81,91 ... Air operated valve 82,92 ... Treatment liquid inlet 83,93 ... Treatment liquid outlet 84 ... Treatment liquid pipeline 85,102 ... Bellows 86,105 ... flexible tubes 87, 106 ... accumulators 94 ... cylinders 95 ... processing liquid passages 96 ... liquid opening / closing parts 97 ... membrane members 98 ... pistons 98a ... flanges 99 ... springs 100, 101 ... Air supply port 103: Cover 104: Air port S: Substrate

Claims (9)

[Claims] An air bubble generation preventing mechanism for preventing bubbles from being generated in a processing liquid when supplying a processing liquid to a processing object, wherein the processing liquid flows from the processing liquid supply system to the processing object. A processing liquid flow path; an opening / closing unit provided in the processing liquid flow path, for starting and stopping the flow of processing liquid between the processing object supply system side and the processing target side in the processing liquid flow path; An air bubble generation prevention mechanism, comprising: an air bubble generation prevention unit configured to alleviate a pressure change on the processing object side with respect to the opening / closing portion of the opening / closing means when the flow is stopped. 2. The method according to claim 1, wherein the air bubble generation preventing portion expands and contracts in response to a partial pressure change generated in the processing liquid flow path generated by inertia of the processing liquid when the flow of the processing liquid is stopped. The bubble generation preventing mechanism according to claim 1, further comprising an expansion / contraction member that causes a change in volume of the flow path. 3. The bubble generation prevention mechanism according to claim 1, wherein a bubble generation prevention unit is provided in the processing liquid flow path. 4. The air bubble generation preventing mechanism according to claim 1, wherein an air bubble generation preventing section is provided in the opening / closing means. 5. A liquid processing apparatus for performing processing by supplying a processing liquid to an object to be processed, comprising: a processing liquid supply unit configured to supply the processing liquid to the surface of the object; and a processing liquid supplied to the processing liquid supply unit. A processing liquid supply system, an opening / closing means provided between the processing liquid supply means and the processing liquid supply system for starting and stopping the flow of the processing liquid, and when the flow of the processing liquid is stopped, A liquid processing apparatus, comprising: a bubble generation prevention unit configured to reduce a pressure change on a processing object side of the opening / closing unit of the opening / closing unit. 6. The bubble generation preventing section expands and contracts in response to a partial pressure change generated in the processing liquid flow path generated by inertia of the processing liquid when the flow of the processing liquid is stopped. The liquid processing apparatus according to claim 5, further comprising an expansion / contraction member that causes a change in volume of the flow path. 7. The liquid processing apparatus according to claim 5, wherein an air bubble generation preventing unit is provided between the processing liquid supply unit and the processing liquid supply system. 8. The liquid processing apparatus according to claim 5, wherein an air bubble generation preventing section is provided in the opening / closing means. 9. A liquid flow path having an expanding / contracting portion whose volume can be changed, and when the flow of the liquid in the flow path is stopped, the liquid spills from the front end of the flow path due to the inertia of the liquid. A liquid supply mechanism for preventing the liquid supply.