JP3824030B2 - Bubble generation preventing mechanism and liquid processing apparatus using the same - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a bubble generation prevention mechanism suitable for liquid processing such as resist liquid coating and development processing performed on a target object such as a semiconductor wafer or an LCD substrate, a liquid processing apparatus using the same, and a liquid supply Regarding the mechanism.
[0002]
[Prior art]
For example, in the manufacture of semiconductor devices and liquid crystal display (LCD) substrates, a photoresist is applied to a semiconductor wafer or LCD substrate as an object to be processed, and a circuit pattern is transferred to the photoresist using photolithography technology. A circuit is formed by developing the film.
[0003]
In such a liquid processing, a processing solution such as a resist solution, a developing solution, and a thinner is sent out from a tank that accommodates the processing solution, transported through a pipeline, and supplied to the surface of the object to be processed through a nozzle. In this case, the start / stop of the flow of the processing liquid in the pipe line is controlled by opening / closing a valve which is an opening / closing means provided in the middle of the pipe line.
[0004]
[Problems to be solved by the invention]
As described above, when starting and stopping the flow of the processing liquid is performed by opening and closing the valve, when the valve is closed and the flow of the processing liquid is stopped, the pressure is reduced immediately downstream of the opening and closing portion. That is, when the valve is closed and the processing liquid flow is suddenly stopped, the processing liquid flow stops immediately at the upstream side of the opening / closing part, but the processing liquid flow is downstream of the opening / closing part, particularly immediately downstream. However, it does not stop at that moment, and the volume changes due to the inertia of the processing liquid, and the pressure is temporarily reduced.
[0005]
As described above, when the pressure immediately downstream of the opening / closing portion is temporarily reduced in pressure, the gas dissolved in the liquid is easily foamed, and bubbles remain in the processing liquid even when the pressure returns to normal pressure. In addition, at the nozzle tip, as shown in FIG. 11A, when the valve is closed, the liquid 101 once comes out from the nozzle tip 100 due to the inertia of the treatment liquid flow, and thereafter, as shown in FIG. As shown, since the gas 102 is sucked when the downstream side of the opening / closing portion returns from the reduced pressure state to the normal pressure, the liquid drainage at the tip is deteriorated, and it is easy for dropouts to occur.
[0006]
As described above, when bubbles are generated in the processing solution, when the processing solution is a resist solution, coating unevenness occurs when the resist solution is supplied to the surface of the object to be processed. In this case, a non-development portion is generated. Therefore, it is desired that bubbles do not occur in the processing liquid even when the processing liquid flow is stopped.
[0007]
Conventionally, in order to prevent air bubbles from occurring, for example, air operated valves have been adjusted with a speed controller or the like in order to reduce the speed at which the valve is closed. However, there is a limit to the adjustment range, and the speed can be reduced to a desired speed. Otherwise, it will not open and close due to the cracking pressure of the valve. This tendency is more likely to occur as the flow path is larger and the fluid flow rate is larger, and as the flow velocity is higher.
[0008]
  The present invention has been made in view of such points, and a bubble generation preventing mechanism capable of effectively preventing bubbles from being generated in the processing liquid even when the processing liquid flow is stopped, and a liquid using the same An object is to provide a processing apparatus.
[0009]
[Means for Solving the Problems]
  In order to solve the above-mentioned problem, the first invention is a bubble generation preventing mechanism for preventing bubbles from being generated in the processing liquid when supplying the processing liquid to the object to be processed,
  A processing liquid flow path for passing the processing liquid from the processing liquid supply system to the object to be processed;
  An opening / closing means provided in the processing liquid channel, for starting / stopping a processing liquid flow between the processing object supply system side and the processing object side in the processing liquid channel;
  When the treatment liquid flow is stopped,To-be-processed side of the opening / closing part of the opening / closing meansReduce the volume in the processing liquid flow pathA bubble generation prevention unit;
A bubble generation preventing mechanism is provided.
[0010]
According to a second aspect of the present invention, in the first aspect, the bubble generation prevention unit responds to a partial pressure change generated in the processing liquid flow path generated by the inertia of the processing liquid when the processing liquid flow is stopped. A bubble generation preventing mechanism having an expansion / contraction member that undergoes expansion / contraction deformation and causes a volume change of a flow path is provided.
[0011]
A third invention provides the bubble generation preventing mechanism according to the first or second invention, wherein a bubble generation preventing portion is provided in the processing liquid flow path.
A fourth invention provides the bubble generation preventing mechanism according to the first or second invention, wherein a bubble generation preventing portion is provided in the opening / closing means.
[0012]
  A fifth aspect of the invention is a liquid processing apparatus that supplies a processing liquid to an object to be processed and performs processing.
  A treatment liquid supply means for supplying a treatment liquid to the surface of the object to be treated;
  A treatment liquid supply system for supplying the treatment liquid to the treatment liquid supply means;
  An opening / closing means provided between the processing liquid supply means and the processing liquid supply system, for starting and stopping the processing liquid flow;
  When the flow of the treatment liquid is stopped, the object side is closer to the opening / closing portion of the opening / closing means.Reduce the volume in the processing liquid flow pathA bubble generation prevention unit;
A liquid processing apparatus is provided.
[0013]
According to a sixth aspect of the present invention based on the fifth aspect, the bubble generation preventing unit responds to a partial pressure change generated in the processing liquid flow path generated by the inertia of the processing liquid when the processing liquid flow is stopped. There is provided a liquid processing apparatus having an expansion / contraction member that undergoes expansion / contraction deformation to cause a volume change of a flow path.
[0014]
A seventh invention provides a liquid processing apparatus according to the fifth or sixth invention, wherein a bubble generation preventing portion is provided between the processing liquid supply means and the processing liquid supply system.
An eighth invention provides a liquid processing apparatus according to the fifth or sixth invention, wherein a bubble generation preventing part is provided in the opening / closing means.
[0016]
  According to the first aspect of the present invention, when the flow of the processing liquid is stopped by the bubble generation preventing unit, the opening / closing portion of the opening / closing means is closer to the object to be processed.Since the volume in the processing liquid flow path is reduced,When the processing liquid flow is stopped, it is possible to prevent the downstream of the opening / closing part from being in a reduced pressure state,As a result, generation of bubbles can be prevented. Further, it is possible to prevent the liquid from being excessively discharged from the tip when the flow is stopped.
[0017]
According to the second invention, since the bubble generation preventing portion has the expansion / contraction member capable of expansion / contraction deformation, when the processing liquid flow is stopped, the pressure change on the object to be processed side is more than the opening / closing portion of the opening / closing means. Accordingly, even if the processing liquid flow is stopped, it is possible to prevent the pressure from being reduced immediately downstream of the opening / closing portion, and it is possible to prevent the liquid from being excessively discharged from the tip when the flow is stopped. As a result, the generation of bubbles can be prevented. As such an expansion / contraction member, for example, a bellows, a flexible tube, an accumulator, or the like is suitable.
[0018]
  The second5Invention and No.6According to the invention, since the bubble generation preventing mechanism of the first invention and the second invention are applied to the liquid processing apparatuses that perform the processing by supplying the processing liquid to the object to be processed, the processing that prevents the generation of bubbles. Liquid processing can be performed on the target object with the liquid, and liquid processing defects can be reduced.
[0019]
Furthermore, as in the third and seventh aspects of the invention, by providing the bubble generation preventing portion between the processing liquid supply means and the processing liquid supply system, the existing opening / closing means can be applied as it is.
[0020]
Furthermore, as in the fourth and eighth inventions, by providing the bubble generation preventing part in the opening / closing means, it is possible to avoid the occurrence of a reduced pressure state immediately downstream near the liquid opening / closing part. Since the depressurized state is more likely to occur as the opening / closing portion is closer, this configuration can more effectively prevent the generation of bubbles.
[0022]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below in detail with reference to the accompanying drawings.
FIG. 1 is a perspective view showing an application / development processing system for an LCD substrate to which the present invention is applied.
[0023]
This coating / development processing system includes a cassette station 1 on which a cassette C for storing a plurality of substrates S is placed, and a processing including a plurality of processing units for performing a series of processes including resist coating and development on the substrates S. And a transport mechanism 3 for transporting the LCD substrate between the cassette C on the cassette station 1 and the processing unit 2. Then, the cassette station 1 carries in the cassette C and carries out the cassette C from the system. The transport mechanism 3 includes a transport arm 11 that can move on a transport path 12 provided in the cassette arrangement direction. The transport arm 11 can transport the substrate S between the cassette C and the processing unit 2. Done.
[0024]
The processing section 2 is divided into a front stage portion 2a and a rear stage portion 2b, each having passages 15 and 16 at the center, and each processing unit is disposed on both sides of these passages. And the relay part 17 is provided between these.
[0025]
The front stage portion 2a includes a main arm 18 movable along the passage 15. On one side of the passage 15, a brush cleaning unit 21, a water washing unit 22, an adhesion processing unit 23, and a cooling unit 24 are provided on the other side. Two resist coating units 25 are arranged on the side. On the other hand, the rear stage portion 2 b includes a main arm 19 that can move along the passage 16. A heat system unit group 28 including a plurality of heat treatment units 26 and cooling units 27 is provided on one side of the passage 19, and the other side. Two development processing units 29 are arranged on the side. In the thermal system unit group 28, three sets of units stacked in two stages are arranged along the passage 19, the upper stage is the heat treatment unit 26, and the lower stage is the cooling unit 27. The heat processing unit 26 performs pre-baking for resist stabilization, post-exposure baking after exposure, and post-baking processing after development. Note that an interface unit 30 for transferring the substrate S to and from an exposure apparatus (not shown) is provided at the rear end of the rear stage unit 2b.
[0026]
The main arm 18 transfers the substrate S to and from the arm 11 of the transport mechanism 3, loads / unloads the substrate S to / from each processing unit of the front stage unit 2 a, and further transfers the substrate S to / from the relay unit 17. It has a function to deliver. The main arm 19 transfers the substrate S to and from the relay unit 17, and loads and unloads the substrate S with respect to each processing unit of the rear stage unit 2 b and further transfers the substrate S to and from the interface unit 30. Has the function to perform.
By consolidating and integrating the processing units in this way, it is possible to save space and improve processing efficiency.
[0027]
In the coating / development processing system configured as described above, the substrate S in the cassette C is transported to the processing unit 2 and is first cleaned by the cleaning unit 21 and the water washing unit 22 so as to improve the resist fixing property. Then, after being hydrophobized by the adhesion processing unit 23 and cooled by the cooling unit 24, a resist is applied by the resist coating unit 25. Thereafter, the substrate S is pre-baked by one of the heat treatment units 26, cooled by the cooling unit 27, and then transferred to the exposure apparatus via the interface unit 30, where a predetermined pattern is exposed. And it carries in again through the interface part 30, and a post-exposure baking process is performed in one of the heat processing units 26. FIG. Thereafter, the substrate S cooled by the cooling unit 27 is developed by the development processing unit 29, and a predetermined circuit pattern is formed. The developed substrate S is accommodated in a predetermined cassette on the cassette station 1 by the main arms 19 and 18 and the transport mechanism 3.
[0028]
The bubble generation prevention mechanism that is the subject of the present invention is applied to the resist coating unit 25 and the developing unit 29 in the above-described system.
[0029]
FIG. 2 is a diagram showing a resist solution and solvent supply system in the resist coating unit 25. The resist coating unit 25 includes a spin chuck 31 that holds the substrate S by suction, and a nozzle holder 32 is provided above the spin chuck 31. A resist solution nozzle 33 and a solvent nozzle 34 are attached to the nozzle holder 32, and a resist solution supply system 40 and a solvent supply system 50 are connected to them. The substrate S held by the spin chuck 31 is surrounded by a rotatable cup (not shown), and this cup is sealed by a lid (not shown) during the coating operation.
[0030]
The resist solution supply system 40 has a resist solution supply pipe 41, the resist solution nozzle 33 is provided at one end thereof, and a resist solution container 42 is provided at the other end. The resist solution in the resist solution container 42 is supplied toward the nozzle 33 by the bellows pump 43. The bellows pump 43 can suck the resist solution and send the resist solution by rotating the ball screw 45 by the stepping motor 44.
[0031]
The resist solution delivered from the bellows pump 43 is discharged from the resist solution nozzle 33 through the filter 46, the deaeration mechanism 47, the air operation valve 48, and the suck back valve 49. The air operation valve 48 has a function of opening and closing the resist solution supply pipe, and the suck back valve 49 has a function of drawing back the resist solution remaining at the tip of the nozzle 33 and preventing its solidification. Have. As will be described later, a bubble generation preventing unit is provided on the downstream side of the air operation valve 48 or inside the air operation valve 48, and a bubble generation preventing mechanism is constituted by these.
[0032]
The solvent supply system 50 has a solvent supply pipe 51, one end of which is provided with the solvent nozzle 34, and the other end is provided with a solvent container 52. For example, thinner is stored as a solvent in the solvent container 52, and this solvent is supplied toward the nozzle 34 by gas pressure feeding. This gas pressure feeding is performed by supplying a pressure feeding gas in the gas cylinder 53, for example, nitrogen gas, into the container 52. The solvent in the solvent container 52 is discharged from the nozzle 34 through the filter 54 and a deaeration mechanism 55 described later by gas pressure feeding.
[0033]
FIG. 3 is a diagram showing a developer supply system in the developing unit 29. The developing unit 29 has a chuck 73 that holds the substrate S by suction, and has a nozzle 72 that has a width substantially the same as that of the substrate S and a plurality of liquid discharge holes at the bottom of the developing unit 29 along the longitudinal direction. Is provided. A developing solution supply system 60 is connected to the nozzle 72. The substrate S held by the chuck 73 is surrounded by a cup (not shown).
[0034]
The developer supply system 60 has a developer container 61 in which the developer is stored. A gas cylinder 63 storing, for example, nitrogen gas as a pressure gas is connected to the container 61 via a pipe 64. Further, the end of the pipe 62 is immersed in the developer in the container 61, and an intermediate container 66 and a deaeration mechanism 67 are sequentially provided in the middle of the pipe 62. Then, the developer in the container 61 is pressure-fed toward the nozzle 72 through the pipe 62 by supplying a pressure-feed gas, for example, nitrogen gas, in the gas cylinder 63 to the container 61 through the pipe 64. Note that a limit sensor 66a and an empty sensor 66b, which are, for example, electrostatic capacitance sensors, are provided outside the intermediate container 66, and signals from these are output to a controller (not shown), and the position of the developer surface is determined. Be controlled.
[0035]
On the downstream side of the deaeration mechanism 67, the pipe 62 branches into a plurality of pipes, for example, a pipe 62 a and a pipe 62 b, and each pipe reaches the nozzle 72 with flow meters 68 a and 68 b, filters 69 a and 69 b, Water jackets 70a and 70b through which water conditioning is circulated and air operation valves 71a and 71b are provided in this order, and the developer is introduced into the nozzle 72 from two locations via these two pipes. During development, the developer discharged from the liquid discharge hole provided at the bottom of the nozzle 72 is supplied to the substrate S. As will be described later, a bubble generation prevention unit is provided on the downstream side of the air operation valve or inside the air operation valve, and these constitute a bubble generation prevention mechanism.
[0036]
Next, the bubble generation preventing mechanism according to the present invention will be described. FIG. 4 is a plan view showing an embodiment in the case where the bubble generation preventing portion is provided in the processing liquid supply conduit. The air operation valve 81 is provided with a processing liquid inlet 82 and a processing liquid outlet 83. The processing liquid transported from the processing liquid conduit 84 is introduced from the processing liquid inlet 82 to start processing liquid flow. The processing liquid is appropriately led out from the processing liquid outlet 83 in accordance with the stop signal.
[0037]
An expansion / contraction member that expands / contracts in response to a pressure change so as to reduce the pressure change when the processing liquid flow is stopped downstream of the air operation valve 81, that is, on the substrate S side (nozzle side) from the processing liquid outlet. A bellows 85 is provided. This bellows 85 is a treatment liquid conduit 84 generated due to the inertia of the treatment liquid when the treatment liquid flow is stopped, that is, the property that the treatment liquid tends to flow to the nozzle side even if the treatment liquid flow is stopped. Prevent partial pressure changes inside.
[0038]
In the above configuration, when the processing liquid flow is stopped by the air operation valve 81, the processing liquid flow is stopped upstream of the air operation valve 81 while closing the valve. On the other hand, on the downstream side of the air operation valve 81, the processing liquid is slightly transported to the nozzle side due to inertia even if the processing liquid flow is stopped. At this time, if the downstream of the air operated valve 81 is in a rigid state as in the conventional configuration, the pressure is reduced downstream of the air operated valve 81. However, according to this configuration, the flow of the processing liquid is stopped and Even if the processing liquid is transported to the nozzle side due to inertia, the bellows 85 contracts according to the pressure change, and the volume in the processing liquid pipe 84 is reduced. As a result, it is possible to avoid a reduced pressure state downstream of the air operated valve 81. Therefore, bubbles are prevented from being generated when returning from the reduced pressure state to the normal pressure state downstream of the air operated valve 81. Furthermore, by providing the bellows 85 downstream of the air operation valve 81 in this way, the expansion and contraction is made in response to the pressure change during the flow of the processing liquid, so that the processing liquid does not come out excessively when the flow of the nozzle stops. Further, it is possible to prevent the gas from being sucked into the nozzle.
[0039]
In the present invention, as an expansion / contraction member that expands / contracts according to the pressure change so as to relieve the pressure change when the treatment liquid flow is stopped, instead of the bellows 85, as shown in FIG. For example, a flexible tube 86 made of an elastic material such as a rubber such as silicone rubber or a soft resin such as a silicone resin may be provided in the processing liquid conduit 84 downstream of the air operated valve 81. As shown in FIG. May be provided in the processing liquid conduit 84 downstream of the air operated valve 81. Such an expansion / contraction member is not limited to these, and a member that is made of an elastic material and that can freely expand and contract according to the amount of gas can also be used.
[0040]
By adopting such a configuration, it is possible to reduce the volume in the processing liquid pipe 84 in response to the pressure change as described above, and to avoid the pressure reduction state downstream of the air operation valve 81. Air bubbles are prevented from being generated when returning from the reduced pressure state to the normal pressure state downstream of the air operated valve 81. In addition, the treatment liquid is not excessively discharged at the tip of the nozzle when the flow is stopped, and gas suction at the nozzle can be prevented.
[0041]
Next, another embodiment of the bubble generation preventing mechanism according to the present invention will be described. FIG. 7 is a plan view showing an embodiment in which the bubble generation preventing mechanism of the present invention is provided in an air operated valve as an opening / closing means. The air operated valve 91 includes a processing liquid introduction port 92 and a processing liquid outlet port 93. The processing liquid transported from the processing liquid conduit is introduced from the processing liquid introduction port 92, and a signal for starting / stopping the processing liquid flow is provided. Accordingly, the processing liquid is appropriately derived from the processing liquid outlet 93.
[0042]
The processing liquid flow path 95 of the cylinder 94 of the air operated valve 91 is substantially horizontal from the processing liquid introduction port 92, changes its direction upward toward the liquid opening / closing part 96, and downwards downstream of the liquid opening / closing part 96. The direction is changed so as to face again and become almost horizontal again, and is connected to the treatment liquid outlet 93.
[0043]
In the liquid opening / closing part 96, a membrane 97 covers the treatment liquid flow path 95, and the membrane 97 is attached to the entire inner wall of the cylinder 94, and the tip of a piston 98 that moves up and down by air supply / discharge It is designed to be pressed and released with The piston 98 is urged by a spring 99 disposed above the liquid opening / closing part 96. Therefore, normally, the tip of the piston 98 presses the membrane member 97 by the spring 99 and the liquid opening / closing part 96 is closed. The piston 98 is provided with a flange 98a, and the inside of the cylinder 94 is divided into two by the flange 98a. Air supplies 100 and 101 for supplying air are provided in the divided cylinders 94, respectively.
[0044]
Further, downstream of the liquid opening / closing portion 96 of the processing liquid flow passage 95, as an expansion / contraction member that expands / contracts according to the pressure change so as to relieve the pressure change when the processing liquid flow is stopped. A bellows 102 is attached. The bellows 102 is covered with a cover 103, and the cover 103 is provided with an air port 104 for adjusting a volume change in the cover 103 due to the movement of the bellows 102.
[0045]
In the configuration described above, when the processing liquid is discharged from the nozzle, air is introduced from the air supply unit 101 to increase the volume of the region below the flange 98a, and the piston 98 resists the biasing pressure of the spring 99. Then raise. As a result, the processing liquid being pumped by opening the liquid opening / closing part 96 flows through the processing liquid flow path 95. As a result, the processing liquid is supplied from the nozzle to the substrate S.
[0046]
When stopping the flow of the processing liquid, air is introduced from the air supply unit 100 to increase the volume of the region above the flange 98 a and lower the piston 98 together with the biasing pressure of the spring 99. Thereby, the tip of the piston 98 presses the membrane, and the liquid opening / closing part 96 is closed.
[0047]
When the processing liquid flow is stopped in this way, the processing liquid flow stops and closes the valve upstream of the liquid opening / closing section 96. On the other hand, downstream of the liquid opening / closing unit 96, the processing liquid is slightly transported to the nozzle side due to inertia even if the processing liquid flow is stopped. At this time, even if the processing liquid is transported to the nozzle side due to the inertia of the processing liquid, the bellows 102 contracts in response to the pressure change, and the volume in the processing liquid flow path 95 is reduced. As a result, it is possible to avoid a pressure reduction state downstream of the liquid opening / closing part 96. Therefore, bubbles are prevented from being generated when returning from the reduced pressure state to the normal pressure state downstream of the liquid opening / closing unit 96. Furthermore, since the bellows 102 is provided downstream of the liquid opening / closing portion 96 in this manner, the expansion and contraction is performed in response to the pressure change during the flow of the processing liquid, so that the processing liquid is excessively discharged at the nozzle tip when the flow is stopped. And the suction of gas in the nozzle can be prevented.
[0048]
Also in this embodiment, as shown in FIG. 8, instead of the bellows 102, for example, silicone is used as an expansion / contraction member that changes the pressure when the treatment liquid flow is stopped or that expands / contracts according to the pressure change. A flexible tube 105 made of an elastic material such as rubber such as rubber or soft resin such as silicone resin may be provided in the processing liquid flow path 95 downstream of the liquid opening / closing part 96.
[0049]
Further, in this embodiment, an expansion / contraction member that expands / contracts according to the pressure change may be provided downstream of the liquid opening / closing portion 96 so as to relieve the pressure change when the processing liquid flow is stopped. As shown in FIGS. 9 and 10, the member may be provided in the cover 103 that covers the processing liquid flow path 95 instead of directly in the processing liquid flow path 95. That is, as shown in FIG. 9, the processing liquid flow path 95 may be branched and extended into the cover 103, and the bellows 102 may be provided in the cover 103. As shown in FIG. The accumulator 106 may be provided in the cover 103 by branching the path 95 and extending into the cover 103. Furthermore, the expansion / contraction member is not limited to these, and a member that is made of an elastic material and that can freely expand and contract according to the amount of gas can also be used.
[0050]
In these configurations as well, it is possible to reduce the volume in the processing liquid flow path 95 in response to the pressure change, and to avoid a pressure reduction state downstream of the liquid opening / closing part 96. Air bubbles are prevented from being generated when returning from the reduced pressure state to the normal pressure state downstream of the liquid opening / closing unit 96. In addition, the treatment liquid is not excessively discharged at the tip of the nozzle when the flow is stopped, and gas suction at the nozzle can be prevented.
[0051]
In addition, this invention is not limited to the said embodiment, A various deformation | transformation is possible. For example, although the case where an air operated valve is used as the opening / closing means has been described in the above embodiment, the present invention can be applied to other opening / closing means such as a solenoid valve. In the above-described embodiment, the example in which the bubble generation preventing mechanism of the present invention is applied to the resist coating / developing unit has been described. However, the present invention is not limited to this and may be applied to other processes.
[0052]
In the above embodiment, the processing liquid discharge means is connected to the processing liquid supply system (tank). However, the present invention is not limited to this, for example, between the opening / closing member (valve) and the processing liquid supply means (nozzle). Pump or N₂The effect of the present invention can be achieved even if a discharge means by pressure is provided.
[0053]
Furthermore, although the case where the LCD substrate was used as the object to be processed was shown in the above embodiment, the present invention is not limited to this, and the present invention can also be applied to the case of processing other objects to be processed such as a semiconductor wafer.
[0054]
【The invention's effect】
  As described above, according to the first aspect of the present invention, when the flow of the processing liquid is stopped by the bubble generation preventing portion, the opening / closing portion of the opening / closing means is closer to the object to be processed.Since the volume in the processing liquid flow path is reduced,When the processing liquid flow is stopped, it is possible to prevent the downstream of the opening / closing part from being in a reduced pressure state,As a result, generation of bubbles can be prevented. Further, it is possible to prevent the liquid from being excessively discharged from the tip when the flow is stopped.
[0055]
According to the second invention, since the bubble generation preventing portion has the expansion / contraction member capable of expansion / contraction deformation, when the processing liquid flow is stopped, the pressure change on the object to be processed side relative to the opening / closing portion of the opening / closing means is reduced. Accordingly, even if the flow of the processing liquid is stopped, it is possible to prevent the pressure from being reduced immediately downstream of the opening / closing portion, and it is possible to prevent the liquid from being excessively discharged from the tip when the flow is stopped. As a result, the generation of bubbles can be prevented.
[0056]
According to the fifth and sixth aspects of the invention, the bubble generation preventing mechanism of the first and second aspects of the invention is applied to a liquid processing apparatus that supplies a processing liquid to the object to be processed. In addition, liquid processing can be performed on the object to be processed with the processing liquid in which the generation of bubbles is prevented, and liquid processing defects can be reduced.
[0057]
Further, according to the third and seventh inventions, the existing opening / closing means can be applied as it is by providing the bubble generation preventing portion between the processing liquid supply means and the processing liquid supply system.
[0058]
Furthermore, according to the fourth and eighth inventions, by providing the bubble generation preventing part in the opening / closing means, it is possible to avoid the occurrence of a reduced pressure state immediately downstream near the liquid opening / closing part. Since the depressurized state is more likely to occur as the opening / closing portion is closer, this configuration can more effectively prevent the generation of bubbles.
[Brief description of the drawings]
FIG. 1 is a perspective view showing a resist coating / developing system to which a bubble generation preventing mechanism to which the present invention is applied is applied.
FIG. 2 is a view showing a resist solution and solvent supply system in a resist coating unit in which the bubble generation preventing mechanism of the present invention is incorporated.
FIG. 3 is a diagram showing a developer supply system in a developing unit in which the bubble generation preventing mechanism of the present invention is incorporated.
FIG. 4 is a plan view showing an embodiment in the case where the bubble generation preventing mechanism of the present invention is provided in a processing liquid supply conduit.
FIG. 5 is a plan view showing another embodiment in the case where the bubble generation preventing mechanism of the present invention is provided in the processing liquid supply conduit.
FIG. 6 is a plan view showing another embodiment in the case where the bubble generation preventing mechanism of the present invention is provided in the processing liquid supply conduit.
FIG. 7 is a plan view showing one embodiment when the bubble generation preventing mechanism of the present invention is provided in the opening / closing means.
FIG. 8 is a plan view showing another embodiment when the bubble generation preventing mechanism of the present invention is provided in the opening / closing means.
FIG. 9 is a plan view showing another embodiment when the bubble generation preventing mechanism of the present invention is provided in the opening / closing means.
FIG. 10 is a plan view showing another embodiment when the bubble generation preventing mechanism of the present invention is provided in the opening / closing means.
FIG. 11 is a schematic diagram illustrating dripping of the tip portion of a conventional liquid supply nozzle.
[Explanation of symbols]
25 …… Resist application unit
29 …… Development unit
33 …… Resist nozzle
34 …… Solvent nozzle
40 …… Resist solution supply system
41 …… Resist solution supply piping
42 …… Resist solution container
50 …… Solvent supply system
51 …… Solvent supply piping
52 …… Solvent container
81, 91 …… Air operated valve
82, 92 ... Treatment liquid inlet
83, 93 …… Processing liquid outlet
84 …… Processing liquid pipeline
85, 102 ... Bellows
86, 105 …… Flexible tube
87,106 …… Accumulator
94 …… Cylinder
95 …… Processing liquid passage
96 …… Liquid opening and closing part
97 …… Membrane member
98 …… Piston
98a …… Flange
99 …… Spring
100, 101 …… Air supply port
103 …… Cover
104 …… Air vent
S …… Board

Claims (8)

A bubble generation preventing mechanism for preventing bubbles from being generated in the processing liquid when supplying the processing liquid to the object to be processed,
A treatment liquid flow path for allowing the treatment liquid to flow from the treatment liquid supply system to the object to be treated;
An opening / closing means provided in the processing liquid channel, for starting / stopping a processing liquid flow between the processing object supply system side and the processing object side in the processing liquid channel;
When stopping the treatment liquid through-flow, and the bubble generation preventing portion to reduce the volume of processing solution flow path of the treated side than the opening and closing parts of the closing means,
A bubble generation preventing mechanism comprising:   When the flow of the processing liquid is stopped, the bubble generation preventing unit expands and contracts in response to a partial pressure change generated in the processing liquid flow path due to the inertia of the processing liquid. The bubble generation preventing mechanism according to claim 1, further comprising an expansion / contraction member that causes a volume change.   The bubble generation preventing mechanism according to claim 1, wherein a bubble generation preventing unit is provided in the processing liquid flow path.   The bubble generation preventing mechanism according to claim 1, wherein a bubble generation preventing unit is provided in the opening / closing means. A liquid processing apparatus that performs processing by supplying a processing liquid to an object to be processed,
A treatment liquid supply means for supplying a treatment liquid to the surface of the object to be treated;
A treatment liquid supply system for supplying the treatment liquid to the treatment liquid supply means;
An opening / closing means provided between the processing liquid supply means and the processing liquid supply system, for starting and stopping the processing liquid flow;
When the treatment liquid flow is stopped, a bubble generation prevention unit that reduces the volume in the treatment liquid flow path on the object to be treated side relative to the opening / closing part of the opening / closing means,
A liquid processing apparatus comprising:   When the flow of the processing liquid is stopped, the bubble generation preventing unit expands and contracts in response to a partial pressure change generated in the processing liquid flow path due to the inertia of the processing liquid. The liquid processing apparatus according to claim 5, further comprising an expansion / contraction member that causes volume change.   The liquid processing apparatus according to claim 5, wherein a bubble generation preventing unit is provided between the processing liquid supply unit and the processing liquid supply system.   The liquid processing apparatus according to claim 5, wherein a bubble generation preventing unit is provided in the opening / closing means.

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