JPH10299920A - Multiple system opening/closing device and solution treatment device using it - Google Patents

Abstract

PROBLEM TO BE SOLVED: To reduce the number of opening/closing member driving means so as to attain miniaturization by providing a processing solution lead-in pipe for leading in a processing solution and at least two processing solution lead-out pipes for leading the processing solution to a processed body, and opening/closing at least two processing solution lead-out pipes simultaneously by an opening/closing member. SOLUTION: An air-operated valve 51, a multiple system opening/closing device, applied to application of an LCD board, to a processing system, and the like is provided with a cylinder 60 above a body 51a having a processing solution lead-in pipe 61 formed to lead in a processing solution from a processing solution conduit, and processing solution lead-out pipes 62a-62c formed to lead the led-in processing solution out to processing solution conduits of multiple systems (three systems, for instance). One piston 63 serving as an opening/closing member to simultaneously open/close the end parts of the processing solution lead-in pipe 61 and all the processing solution lead-out pipes 62a-62c is fittingly mounted in the cylinder 60 and put in opening action being pushed upward through a film member 64 by air pressure led in from an air supply port 65b.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a multi-system opening / closing apparatus suitable for liquid processing such as application and development of a resist liquid performed on an object to be processed such as a semiconductor wafer or an LCD substrate, and an apparatus using the same. The present invention relates to a liquid processing apparatus.

[0002]

2. Description of the Related Art For example, in the manufacture of a semiconductor device or a liquid crystal display (LCD) substrate, a photoresist is applied to a semiconductor wafer or an LCD substrate as an object to be processed, and a circuit pattern is formed by photolithography. Is transferred to a photoresist and developed to form a circuit.

In such liquid processing, a processing solution such as a resist solution, a developing solution, and a thinner is sent out from a tank containing the solution, transported through a pipeline, and supplied to the surface of the workpiece through a nozzle. You. In this case, the start / stop of the flow of the processing liquid in the pipeline is controlled by opening and closing a valve which is an opening / closing device provided in the middle of the pipeline.

[0004]

In order to supply the processing liquid from a plurality of nozzles to the surface of the object to be processed, if the pipe through which the processing liquid flows is branched into a plurality of pipes, the pipes are usually branched. A valve is provided for each. As described above, if a valve is provided for each pipeline, it is necessary to take a certain amount of space between the pipelines, and the size of the apparatus is inevitably increased. In addition, since an actuator for controlling the opening and closing of each valve is required, the cost is high.

SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and is a compact multi-system opening / closing apparatus capable of controlling the opening and closing of multi-system processing liquid flow conduits and a liquid processing system using the same. It is intended to provide a device.

[0006]

According to a first aspect of the present invention, there is provided a multi-system opening / closing device for supplying a processing liquid to an object to be processed, comprising a processing liquid introduction pipe for introducing the processing liquid. At least 2 for introducing the processing liquid to the object to be processed.
Two treatment liquid outlet pipes, and an opening / closing member for opening and closing the processing liquid outlet pipe.
Provided is a multi-system opening / closing device characterized by simultaneously opening and closing two processing liquid outlet pipes.

According to a second aspect of the present invention, there is provided the multi-system opening / closing apparatus according to the first aspect, wherein the opening / closing member opens and closes the processing liquid introduction pipe. A third invention provides the multi-system switching device according to the first invention or the second invention, wherein the number of the opening and closing members is one. A fourth invention provides the multi-system opening / closing device according to the first to third inventions, wherein the opening / closing member is driven by supply of air.

According to a fifth aspect of the present invention, there is provided a liquid processing apparatus for supplying a processing liquid to a processing target to perform processing, wherein a processing liquid supply unit for supplying a processing liquid to the surface of the processing target, and a processing liquid supply unit. A processing liquid supply system for supplying a liquid, and an opening / closing means provided between the processing liquid supply means and the processing liquid supply system for starting / stopping the flow of the processing liquid; A processing liquid inlet pipe for introducing a processing liquid from a processing liquid supply system, at least two processing liquid outlet pipes for leading the processing liquid to a processing liquid supply unit, and an open / close switch for simultaneously opening and closing at least two processing liquid outlet pipes And a member for providing a liquid processing apparatus.

A sixth invention provides a liquid processing apparatus according to the fifth invention, wherein the opening and closing member opens and closes the processing liquid introduction pipe. A seventh invention provides the liquid processing apparatus according to the fifth invention or the sixth invention, wherein the number of the opening and closing members is one. An eighth invention provides the liquid processing apparatus according to the fifth invention to the seventh invention, wherein the opening and closing member is driven by supply of air.

According to the first aspect of the present invention, the number of the opening / closing members is reduced to simultaneously open and close the plurality of processing liquid outlet pipes, so that the size of the opening / closing device can be reduced. As in the second invention,
Since the opening / closing member also opens and closes the processing liquid introduction pipe, the opening / closing member for the processing liquid introduction pipe can be omitted, and the size of the opening / closing device can be further reduced. Furthermore, as in the third aspect of the present invention, the supply of the processing liquid can be quickly stopped by using a single opening / closing member, and the drop of the processing liquid from the nozzle can be prevented. Further, the present invention is particularly suitable when the opening / closing member is driven by air supply as in the fourth invention.

According to the fifth aspect of the present invention, the number of the opening / closing members is reduced to simultaneously open and close the plurality of processing liquid outlet pipes, so that the size of the opening / closing device can be reduced, thereby reducing the size of the liquid processing apparatus. be able to. Therefore, the degree of freedom of the installation location of the opening and closing device in the liquid processing apparatus is increased. Since the opening / closing member also opens and closes the processing liquid introduction pipe as in the sixth invention, the opening / closing member for the processing liquid introduction pipe can be eliminated, and the size of the opening / closing device can be further reduced. As a result, the size of the liquid processing apparatus can be further reduced.

Further, as in the seventh aspect of the present invention, by providing only one opening / closing member, the supply of the processing liquid can be stopped promptly, and the drop of the processing liquid from the nozzle can be prevented. . Further, by using a single opening / closing member, the processing liquid can be simultaneously supplied to the object to be processed in multiple systems, and the liquid can be uniformly applied to the object to be processed. Further, the present invention is particularly suitable when the opening / closing member is driven by supply of air as in the eighth invention.

[0013]

Embodiments of the present invention will be described below in detail with reference to the accompanying drawings. FIG. 1 is a perspective view showing an LCD substrate coating / developing processing system to which the present invention is applied.

This coating / developing processing system includes a cassette station 1 on which a cassette C accommodating a plurality of substrates S is placed, and a plurality of processing units for performing a series of processing including resist coating and development on the substrates S. Processing unit 2 provided
And the cassette C on the cassette station 1 and the processing unit 2
And a transport mechanism 3 for transporting the LCD substrate between them. Then, at the cassette station 1, loading of the cassette C into the system and unloading of the cassette C from the system are performed. The transport mechanism 3 includes a transport arm 11 that can move on a transport path 12 provided along the direction in which the cassettes are arranged. The transport arm 11 transports the substrate S between the cassette C and the processing unit 2. Done.

The processing section 2 comprises a first stage portion 2a and a second stage portion 2b.
, Each having passages 15 and 16 at the center, and processing units disposed on both sides of these passages. A relay section 17 is provided between them.

The front section 2a has a main arm 18 movable along a passage 15. On one side of the passage 15, a brush washing unit 21, a water washing unit 22, an adhesion processing unit 23, and a cooling unit 24 are provided.
However, two resist coating units 25 are disposed on the other side. On the other hand, the rear section 2b includes a main arm 19 that can move along the passage 16. On one side of the passage 19, a heat system unit group 28 including a plurality of heat treatment units 26 and cooling units 27 is provided. On the side, two development processing units 29 are arranged. In the thermal system unit group 28, a set formed by stacking two units
Are arranged in a row, and the upper stage is a heat treatment unit 26.
And the lower stage is the cooling unit 27. The heat treatment unit 26 performs pre-bake for stabilizing the resist, post-exposure bake after exposure, and post-bake treatment after development. Note that an interface unit 30 for transferring the substrate S to and from an exposure apparatus (not shown) is provided at the rear end of the rear stage unit 2b.

The main arm 18 transfers the substrate S to and from the arm 11 of the transport mechanism 3, and loads and unloads the substrate S to and from each processing unit in the former stage 2 a, and further, to the relay unit 17. Has a function of transferring the substrate S. Further, the main arm 19 transfers the substrate S to and from the relay unit 17, and also loads and unloads the substrate S to and from each processing unit of the subsequent-stage unit 2 b, and transfers the substrate S to and from the interface unit 30. It has a function to perform. By consolidating and integrating the processing units in this manner, space saving and processing efficiency can be achieved.

In the coating / developing processing system configured as described above, the substrate S in the cassette C is transported to the processing section 2 and firstly, the cleaning unit 21 and the water cleaning unit 2
The cleaning unit 2 cleans the resist, the adhesion treatment unit 23 increases the hydrophobicity of the resist in order to enhance the fixability of the resist, and the cooling unit 24 cools the resist. Thereafter, the substrate S is subjected to a pre-baking process in one of the heat processing units 26 and cooled by a cooling unit 27, and then is conveyed to an exposure device via an interface unit 30, where a predetermined pattern is exposed. Then, it is carried again through the interface unit 30 and subjected to post-exposure bake processing in one of the heat processing units 26. After that, the substrate S cooled by the cooling unit 27 is
And a predetermined circuit pattern is formed. The developed substrate S is accommodated in a predetermined cassette on the cassette station 1 by the main arms 19 and 18 and the transport mechanism 3.

The multi-system opening / closing device to which the present invention is applied is applied to the resist coating unit 25 and the developing unit 29 in the above-mentioned system. Here, a case where the multi-system opening / closing device of the present invention is applied to the developing unit 29 will be described.

FIG. 2 is a view showing a developing solution supply system in the developing unit 29. The developing unit 29 has a chuck 53 for sucking and holding the substrate S, a nozzle 52 having a width substantially the same as that of the substrate S, and a plurality of liquid discharge holes at its bottom along the longitudinal direction. Is provided. The developing solution supply system 40 is connected to the nozzle 52. The substrate S held by the chuck 53 is surrounded by a cup (not shown).

The developing solution supply system (processing solution supply system) 40 has a developing solution container 41, in which the developing solution is stored. A gas cylinder 43 storing, for example, nitrogen gas as a pumping gas is connected to the container 41 via a pipe 44. The end of the pipe 42 is immersed in the developer in the container 41, and an intermediate container 46 and a degassing mechanism 47 are provided in the middle of the pipe 42 in order. And container 4
The developer in 1 is supplied to the container 41 through a pipe 44 by a pressurized gas, for example, a nitrogen gas, in a gas cylinder 43, and is supplied to the nozzle 52 through a pipe 42. Outside the intermediate container 46, a limit sensor 46a and an empty sensor 46b composed of, for example, a capacitance sensor are provided. Signals from these are output to a controller (not shown), and the position of the liquid level of the developing solution is determined. Controlled.

Downstream of the deaeration mechanism 47, a flow meter 48, a filter 49, and a water jacket 5 through which temperature-regulated water is circulated before reaching the nozzle 52.
An air operation valve 51, which is an opening / closing device to be described later, is provided in order. A developing solution is introduced into the nozzle 52 from the air operation valve 51 from three places via piping. At the time of development, the developing solution discharged from the liquid discharging hole provided at the bottom of the nozzle 52 is applied to the substrate S.
Supplied to

As shown in FIG. 3, an air operation valve 51, which is a multi-system opening / closing device of the present invention, has a main body 51a.
And a cylinder 60 provided thereabove, and a main body 51a.
And a processing liquid introduction pipe 61 for introducing a processing liquid from a processing liquid flow pipe, and a processing liquid also provided for the main body 51a and introduced from the processing liquid introduction pipe through multiple systems (here, three systems). Processing liquid outlet pipes 62a, 62 which are led to a flow conduit
b, 62c, and a piston 63, which is one opening / closing member for simultaneously opening and closing the end of the processing liquid introduction pipe 61 and the ends of all the processing liquid outlet pipes 62a, 62b, 62c.

As shown in FIG. 4, on the lower side surface of the piston 63, a membrane member 64 is provided over the entire circumference between the piston 63 and the main body 51a of the valve 51. Further, the piston 63 has a flange portion 6 which partitions the inside of the cylinder into two upper and lower regions.
7 are provided on the side wall of the cylinder 60, and air supply ports 65a, 65 for supplying air to the two regions, respectively.
5b are formed. Further, the piston 63 is normally pressed downward by the urging force of the spring 68, and in a steady state, the processing liquid introduction pipe 61 and all the processing liquid discharge pipes 62a, 62b, 62c are closed integrally. (Normally closed).

When operating the air operation valve 51 having the above structure, when air is introduced from the air supply port 65b, the volume of the lower region divided by the flange 67 increases, and the piston 63 is pushed upward. As a result, the processing liquid introduction pipe 61 and all the processing liquid outlet pipes 62a, 62b, 62c are simultaneously opened, and the processing liquid flows, and the processing liquid flows onto the surface of the substrate S via the nozzle 52. Supplied. Accordingly, the processing liquid can be supplied to the substrate S from the three nozzles at the same timing, and uniform liquid processing on the substrate S can be performed.

On the other hand, when the supply of the processing liquid is stopped,
The supply of air from the air supply port 65b is stopped, and air is introduced from the air supply port 65a. At this time, the flange 67
As the volume of the upper region divided by the above increases, the urging force of the spring 68 also acts to push down the piston 63 downward. Thereby, the processing liquid introduction pipe 61 and all the processing liquid discharge pipes 62a, 62b, 62c are closed at the same time. Since a seal structure is adopted between the piston 63 and the processing liquid introduction pipe 61 and all the processing liquid outlet pipes 62a, 62b, 62c so as to prevent leakage of the processing liquid when they come into contact with each other, Thus, the flow is stopped without leakage of the processing liquid.

The air operation valve 51 according to the present invention having the above structure opens and closes the processing liquid introduction pipe 61 and all the processing liquid discharge pipes 62a, 62b, 62c with one piston (opening / closing member). That is, there is one opening / closing member and one means for driving it, for example, an actuator. Therefore, the air operation valve 51 serving as the opening / closing device can be reduced in size. Thus, the entire liquid processing apparatus can be reduced in size. Further, since the air operation valve 51 is small, the degree of freedom of the layout of the unit in the liquid processing apparatus is increased.

The present invention is not limited to the above embodiment, but can be variously modified. For example, in the above embodiment, the air operation valve is described. However, the present invention can be similarly applied to a multi-system open / close valve having an open / close member.

In the above-described embodiment, the case where there are three treatment liquid outlet pipes and one opening / closing member has been described.
The present invention can be applied to all cases where the number of opening / closing members is smaller than the number of processing liquid outlet pipes. Further, in the above-described embodiment, the case where the opening / closing member simultaneously opens and closes the processing liquid introduction pipe is described. May be used.

In the above embodiment, the case where the opening / closing device is applied to the developer supply system is described. However, the same effects as described above can be obtained by applying the present invention to a resist solution supply system or the like. . Further, in the above embodiment, the example in which the opening / closing device is applied to the resist coating / developing unit has been described. That is, the present invention can be applied to all of the multi-system processing liquid flow pipes in which the processing liquid flow pipes are branched.

In the above embodiment, the processing liquid discharge means is connected to the processing liquid supply system (tank). However, the present invention is not limited to this. For example, an opening / closing member (valve) and processing liquid supply means (nozzle) may be used. The effect of the present invention can be achieved even if a pump or a discharge means using N ₂ pressurization is provided between them.

Further, in the above-described embodiment, the case where the LCD substrate is used as the object to be processed has been described. However, the present invention is not limited to this and can be applied to the case of processing other objects to be processed such as a semiconductor wafer.

[0033]

As described above, according to the first aspect of the present invention, the number of opening / closing members can be reduced, and accordingly, the number of driving means for the opening / closing members can be reduced. The size of the device can be reduced. Further, since the processing liquid can be supplied to the plurality of processing liquid outlet pipes by opening and closing the opening / closing member, the processing liquid can be supplied to the object to be processed almost simultaneously, for example, by a shower-shaped or slit-shaped nozzle. For this reason, even when the size of the substrate is increased, uniform processing (for example, development) can be performed on the substrate surface. Further, when the processing liquid is a resist liquid, the same amount of resist can be supplied almost simultaneously from a plurality of processing liquid outlet pipes, so that the film thickness of the resist can be made more uniform.

Further, as in the second invention, the opening / closing member also opens and closes the processing liquid introduction pipe, so that the number of opening / closing members and the number of driving means for the opening / closing members can be further reduced.
The size of the switchgear can be further reduced. Further, as in the third aspect, the supply of the processing liquid can be quickly stopped by using only one opening / closing member. Further, the present invention is particularly suitable when the opening / closing member is driven by air supply as in the fourth invention.

According to the fifth aspect of the present invention, the number of the opening / closing members in the opening / closing device is small, and the number of driving means for the opening / closing members is small accordingly, so that the size of the opening / closing device can be reduced. The processing device can be reduced in size. Therefore, the degree of freedom of the installation location of the opening and closing device in the liquid processing apparatus is increased. Further, as in the sixth aspect, the opening / closing member also opens and closes the processing liquid introduction pipe, so that the number of opening / closing members and the number of driving means for the opening / closing member can be further reduced, and the size of the opening / closing device is further reduced. Can be achieved. As a result, the size of the liquid processing apparatus can be further reduced.

Further, by using only one opening / closing member as in the seventh aspect, the supply of the processing liquid can be stopped quickly. Furthermore, by making the opening and closing member one,
The processing liquid can be simultaneously supplied to the object to be processed in multiple systems, and the liquid processing can be uniformly performed on the object. Further, the present invention is particularly suitable when the opening / closing member is driven by supply of air as in the eighth invention.

[Brief description of the drawings]

FIG. 1 is a perspective view showing a resist coating / developing system to which a bubble generation preventing mechanism to which the present invention is applied is applied.

FIG. 2 is a diagram showing a developer supply system in a developing unit in which the multi-system opening / closing device of the present invention is incorporated.

FIG. 3 is a schematic view showing an embodiment of the multi-system switching device of the present invention.

FIG. 4 is a sectional view showing an embodiment of the multi-system switching device of the present invention.

[Explanation of symbols]

 40 developer supply system 41 developer container 42 pipe 51 air operation valve 51a body 52 nozzle 60 cylinder 61 processing liquid introduction pipe 62a, 62b, 62c processing Liquid outlet pipe 63 Piston 65a, 65b Air supply port 67 Flange S Substrate

Claims (8)

[Claims] 1. A multi-system opening / closing device for supplying a processing liquid to an object to be processed, comprising: a processing liquid introduction pipe for introducing the processing liquid; and at least two processing liquids for leading the processing liquid to the object to be processed. A multi-system opening / closing device, comprising: an outlet pipe; and an opening / closing member that opens and closes the processing liquid outlet pipe, wherein the opening / closing member simultaneously opens and closes at least two processing liquid outlet pipes. 2. The multi-system opening / closing device according to claim 1, wherein the opening / closing member opens and closes the processing liquid introduction pipe. 3. The multi-system switching device according to claim 1, wherein the number of the switching members is one. 4. The apparatus according to claim 1, wherein the opening and closing member is driven by supply of air.
The multi-system switchgear according to the paragraph. 5. A liquid processing apparatus for performing processing by supplying a processing liquid to an object to be processed, comprising: a processing liquid supply unit configured to supply the processing liquid to the surface of the object; and a processing liquid supplied to the processing liquid supply unit. A processing liquid supply system, provided between the processing liquid supply means and the processing liquid supply system,
Opening / closing means for starting / stopping the flow of the processing liquid, wherein the opening / closing means guides the processing liquid from the processing liquid supply system and guides the processing liquid to the processing liquid supply means A liquid processing apparatus, comprising: at least two processing liquid outlet pipes for opening and closing; and an opening and closing member for simultaneously opening and closing the at least two processing liquid outlet pipes. 6. The liquid processing apparatus according to claim 5, wherein the opening and closing member opens and closes the processing liquid introduction pipe. 7. The liquid processing apparatus according to claim 5, wherein the number of the opening and closing members is one. 8. The apparatus according to claim 5, wherein the opening / closing member is driven by supplying air.
The liquid processing apparatus according to the item.