JPH1029822A - Forming mold for optical element and its production - Google Patents

Forming mold for optical element and its production

Info

Publication number
JPH1029822A
JPH1029822A JP8187384A JP18738496A JPH1029822A JP H1029822 A JPH1029822 A JP H1029822A JP 8187384 A JP8187384 A JP 8187384A JP 18738496 A JP18738496 A JP 18738496A JP H1029822 A JPH1029822 A JP H1029822A
Authority
JP
Japan
Prior art keywords
layer
substrate
forming
tungsten carbide
optical element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8187384A
Other languages
Japanese (ja)
Inventor
Takeharu Komiya
毅治 小宮
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP8187384A priority Critical patent/JPH1029822A/en
Publication of JPH1029822A publication Critical patent/JPH1029822A/en
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
    • C03B11/06—Construction of plunger or mould
    • C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
    • C03B11/084—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
    • C03B11/086—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00—Press-moulding glass
    • C03B2215/02—Press-mould materials
    • C03B2215/08—Coated press-mould dies
    • C03B2215/10—Die base materials
    • C03B2215/12—Ceramics or cermets, e.g. cemented WC, Al2O3 or TiC
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00—Press-moulding glass
    • C03B2215/02—Press-mould materials
    • C03B2215/08—Coated press-mould dies
    • C03B2215/14—Die top coat materials, e.g. materials for the glass-contacting layers
    • C03B2215/16—Metals or alloys, e.g. Ni-P, Ni-B, amorphous metals
    • C03B2215/17—Metals or alloys, e.g. Ni-P, Ni-B, amorphous metals comprising one or more of the noble meals, i.e. Ag, Au, platinum group metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00—Press-moulding glass
    • C03B2215/02—Press-mould materials
    • C03B2215/08—Coated press-mould dies
    • C03B2215/30—Intermediate layers, e.g. graded zone of base/top material
    • C03B2215/31—Two or more distinct intermediate layers or zones
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00—Press-moulding glass
    • C03B2215/02—Press-mould materials
    • C03B2215/08—Coated press-mould dies
    • C03B2215/30—Intermediate layers, e.g. graded zone of base/top material
    • C03B2215/34—Intermediate layers, e.g. graded zone of base/top material of ceramic or cermet material, e.g. diamond-like carbon

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)

Abstract

PROBLEM TO BE SOLVED: To remove a minute opening present on a surface of a substrate and to obtain a forming die having an extremely smooth forming surface applying a surface forming layer of the substrate by vapor deposition on the forming surface of the substrate which is made of tungsten carbide produced by sintering, and then forming a surface layer comprising a noble metal thin film thereon. SOLUTION: This forming mold is composed of a substrate of tungsten carbide (WC) produced by sintering, a surface forming layer 2 produced by vapor deposition on the forming surface of the substrate 1, and a surface layer 4 of a noble metal thin film formed on the surface forming layer 2. An intermediate layer 3 for preventing diffusion is preferable formed between the surface forming layer 2 of the base body and the surface layer 4. The intermediate layer is preferably made of a compd. of metal and nonmetal. For example, aluminum oxide is preferable. As the surface forming layer 2 of the substrate, a WC film produced by vapor deposition is preferable.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【０００１】[0001]

【発明の属する技術分野】本発明は、プレス成形によっ
て研削・研磨を行わずに光学素子を成形するために使用
する成形型に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a molding die used for molding an optical element without grinding and polishing by press molding.

【０００２】[0002]

【従来の技術】光学機器の分野では、光学装置の構成の
簡略化、軽量化などを達成するために、非球面レンズを
用い光学機器を製造することが増加する傾向にある。従
来、ガラスレンズは研磨法によって製造されていたが、
複雑な形状を有する非球面レンズでは、量産化が困難で
あることから、研磨法に代わる製造方法としてプレス成
形の研究が盛んに行われている。2. Description of the Related Art In the field of optical instruments, there is a tendency to increase the production of optical instruments using aspherical lenses in order to achieve simplification of the configuration of an optical device and reduction in weight. Conventionally, glass lenses were manufactured by a polishing method,
Since it is difficult to mass-produce an aspheric lens having a complicated shape, research on press molding has been actively conducted as a manufacturing method instead of a polishing method.

【０００３】光学ガラスのフレス成形では、ガラス及び
成形型は数百度まで加熱されるため、成形型には加工性
の他に高温強度、耐熱衝撃性、化学的安定性などが要求
される。これらを満足するため、現在ではタングステン
カーバイドや各種サーメットを基体とし、その基体の成
形面にガラスとの化学的反応の少ない貴金属薄膜を形成
した成形型がー般的に使用されている。例えば持開昭６
０−２４６２３０号には超硬合金を基体として、その基
体上に貴金属層を被覆したことを特徴とし、この貴金属
層が、イリジウム（Ｉｒ）、オスニウム（Ｏｓ）、パラ
ジウム（Ｐｄ）、ロージウム（Ｒｈ）、ルテニウム（Ｒ
ｕ）からなる群より選ばれた少なくとも一つの元素とＰ
ｔ（６０〜９９重量％）との貴金属合金であるもの等が
開示されている。In the fressing of optical glass, since the glass and the mold are heated to several hundred degrees, the mold is required to have high temperature strength, thermal shock resistance, chemical stability, etc. in addition to workability. In order to satisfy these requirements, at present, a molding die using tungsten carbide or various cermets as a substrate, and a precious metal thin film having little chemical reaction with glass formed on the molding surface of the substrate is generally used. For example, Shokai 6
No. 0-246230 is characterized in that a hard metal is used as a base and a noble metal layer is coated on the base, and this noble metal layer is made of iridium (Ir), osmium (Os), palladium (Pd), rhodium (Rh). ), Ruthenium (R
u) at least one element selected from the group consisting of
Noble metal alloys with t (60 to 99% by weight) are disclosed.

【０００４】[0004]

【発明が解決しようとする課題】上記特開昭６０−２４
６２３０号における基体には、その表面上に、基体の焼
結時に形成される微細な開口が点在する。これらの微細
な開口は光学素子の成形時に転写されることからピック
アップレンズなどの平滑さを要求される光学素子の成形
には不適当である。また、ＣＶＤ法による繊密なＳｉＣ
（炭化珪素）層を形成したＳｉＣ焼結材は平滑性に優れ
るが、靭性に乏しいことから欠け等が生じやすい。DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention
The substrate in No. 6230 has fine openings formed on the surface of the substrate when the substrate is sintered. Since these fine openings are transferred during the molding of the optical element, they are unsuitable for molding an optical element requiring smoothness such as a pickup lens. In addition, fine SiC by CVD method
The SiC sintered material on which the (silicon carbide) layer is formed is excellent in smoothness, but is apt to be chipped due to poor toughness.

【０００５】よって、本発明では基体表面に点在する微
細な開口を除去し、かつ平滑性に優れた基体を有した光
学素子の成形型を得て、非常に平滑な成形面を有した成
形型を得ることを目的とする。Therefore, in the present invention, a molding die for an optical element having a substrate with excellent smoothness is obtained by removing minute openings scattered on the surface of the substrate, and forming a molding die having an extremely smooth molding surface. The purpose is to get the mold.

【０００６】[0006]

【課題を解決するための手段】よって、本発明では上記
課題を解決するため、本発明の第１の形態では、焼結に
より成形されたタングステンカーバイドで形成された基
体と、基体の成形面に蒸着により成膜された基体表面形
成層と、基体表面形成層上に金属薄膜で形成された表面
層とを備えた。この様にすることで基体表面に存在する
微小な開口を塞ぐことができる。また、本発明の第２の
形態では、基体表面形成層と表面層との間に拡散防止を
目的とする中間層を備えた。この様にすることで、基体
と表面層との間にそれぞれの物質の拡散を抑える。ま
た、本発明の第３の形態では中間層は、金属と非金属と
の化合物で形成されていることし、更に本発明の第４の
形態では中間層は、アルミニウムの酸化物で形成されて
いることとした。Therefore, in the present invention, in order to solve the above-mentioned problems, according to a first embodiment of the present invention, a substrate formed of tungsten carbide formed by sintering and a molding surface of the substrate are provided. A substrate surface forming layer formed by vapor deposition and a surface layer formed of a metal thin film on the substrate surface forming layer were provided. In this manner, a minute opening existing on the surface of the base can be closed. In the second embodiment of the present invention, an intermediate layer for preventing diffusion is provided between the substrate surface forming layer and the surface layer. By doing so, the diffusion of each substance between the substrate and the surface layer is suppressed. In the third embodiment of the present invention, the intermediate layer is formed of a compound of a metal and a non-metal, and in the fourth embodiment of the present invention, the intermediate layer is formed of an oxide of aluminum. I decided to.

【０００７】また、本発明の第５の形態では、焼結によ
り得られたタングステンカーバイドで形成された基体の
成形面に、蒸着によりタングステンカーバイドを成膜
し、成膜されたタングステンカーバイド上に更に貴金属
合金を成膜した。そして、本発明の第６の形態では、蒸
着により成膜されたタングステンカーバイドの上にアル
ミニウムの酸化物を成膜し、更に貴金属合金を成膜し
た。In a fifth aspect of the present invention, a tungsten carbide film is formed by vapor deposition on a molding surface of a substrate formed of tungsten carbide obtained by sintering, and the tungsten carbide is further formed on the formed tungsten carbide. A noble metal alloy was formed. In the sixth embodiment of the present invention, an oxide of aluminum is formed on tungsten carbide formed by vapor deposition, and a noble metal alloy is further formed.

【０００８】このようにして、本発明は上記課題の解決
を行った。次に、本発明の実施の形態を挙げて、更に本
発明を詳しく説明する。しかし、本発明は以下に述べる
本発明の実施の形態にだけに限られるものではない。Thus, the present invention has solved the above-mentioned problems. Next, the present invention will be described in more detail with reference to embodiments of the present invention. However, the present invention is not limited only to the embodiments of the present invention described below.

【０００９】[0009]

【発明の実施の形態】本発明の実施の形態では、耐衝撃
性に優れ、取扱いの容易なタングステンカ−バイド（Ｗ
Ｃ）を基体とし、その基体の成形面上にタングステンカ
ーバイド（ＷＣ）層を蒸着により形成して、基体の成形
面上に点在する微細な閉口を封孔処理した。そして、タ
ングステンカーバイドで被覆された成形面を精密に加工
し、最表面に第三層として金属薄膜を形成することで靭
性に富み、取扱いが容易でピックアップレンズなどの平
滑さを要求される光学素子の成形に適した高精度な光学
素子のプレス成形を可能とした光学素子の成形型を得て
いる。DESCRIPTION OF THE PREFERRED EMBODIMENTS In an embodiment of the present invention, tungsten carbide (W) having excellent impact resistance and easy handling is used.
C) was used as a substrate, a tungsten carbide (WC) layer was formed on the molding surface of the substrate by vapor deposition, and fine openings scattered on the molding surface of the substrate were sealed. Optical elements that require a high degree of toughness, are easy to handle, and require smoothness, such as pickup lenses, by precisely processing the molded surface coated with tungsten carbide and forming a third metal layer on the outermost surface. An optical element mold that enables high-precision press-forming of optical elements suitable for molding is obtained.

【００１０】本発明の実施の形態である成形型では、図
１を参酌して説明すると、基体１として加工性、高温強
度、耐熱衝撃性に優れるタングステンカーバイドを使用
し、荒加工された成形面上に第一層としてタングステン
カーバイド（ＷＣ）層を形成した。このようにすること
で、基体１の成形面上に点在する母材の焼結時に形成さ
れた微細な閉口を封孔処理した。つきに、微細な閉口の
封孔処理をした成形面を精密に加工し、第二層としてに
拡散防止を目的とする中間層３を形成した。しのように
して、高温下で行われる光学ガラス成形時に、活発に行
われやすくなる基体１と表面層４との物質の拡散を抑え
ることができる。また、最表面に表面層４としてとして
金属薄膜を形成した。これにより、平滑性に優れた光学
素子のプレス成形が可能で取扱いの容易な成形型が実現
できた。In a molding die according to an embodiment of the present invention, referring to FIG. 1, using a tungsten carbide excellent in workability, high-temperature strength and thermal shock resistance as a substrate 1, a roughened molding surface A tungsten carbide (WC) layer was formed thereon as a first layer. In this manner, the fine closing formed at the time of sintering of the base material scattered on the molding surface of the base 1 was sealed. At the same time, the molding surface subjected to the fine closing process was precisely processed to form an intermediate layer 3 for the purpose of preventing diffusion as a second layer. In this way, it is possible to suppress the diffusion of the substance between the substrate 1 and the surface layer 4 that is likely to be actively performed during optical glass molding performed at a high temperature. Further, a metal thin film was formed as a surface layer 4 on the outermost surface. As a result, a molding die that can be press-molded for an optical element having excellent smoothness and is easy to handle was realized.

【００１１】本発明の光学素子成形型は、以下の様な手
法を用いて作製した。基体１は、夕ングステンカーバイ
ドを焼結させて成形した。基体１の寸法は図２に示すよ
うに、直径Ａが１０ｍ、厚さＢが１５ｍｍの物を使用
し、基体１の成形面を凹面曲率半径Ｒが３０ｍｍになる
ように加工した。次にスパッタ法により基体１の成形面
上に膜厚５μｍのタングステンカーバイド層２を形成し
た（図１（ｂ）参照）。そして、基体１の成形面上に点
在する母材の焼結時に形成された微細な開口を封孔処理
した後、その成形面の粗さがをＲＭＳ値で６．０〜８．
０Åになるまで研削・研磨した（図１（ｃ）参照）。そ
の後に中間層３として酸化アルミニウム（Ａｌ2Ｏ3）の
薄膜を形成した。この中間層の厚さは７００Åとした。
そして、中間層を形成した後に、白金（Ｐｔ）−ロージ
ウム（Ｒｈ）−金（Ａｕ）の３元合金である物質により
表面層４を形成した。この表面層４は厚さ７００Åにな
るまで成膜した（図１（ｄ）参照）。The optical element molding die of the present invention was manufactured by the following method. The substrate 1 was formed by sintering stainless steel carbide. As shown in FIG. 2, the dimensions of the substrate 1 were 10 m in diameter A and 15 mm in thickness B, and the molding surface of the substrate 1 was machined so that the concave radius of curvature R was 30 mm. Next, a tungsten carbide layer 2 having a thickness of 5 μm was formed on the molding surface of the substrate 1 by a sputtering method (see FIG. 1B). Then, after sealing the fine openings formed at the time of sintering of the base material scattered on the molding surface of the base 1, the roughness of the molding surface is determined to be an RMS value of 6.0 to 8.0.
It was ground and polished until it reached 0 ° (see FIG. 1 (c)). Thereafter, a thin film of aluminum oxide (Al 2 O 3 ) was formed as the intermediate layer 3. The thickness of this intermediate layer was 700 °.
Then, after the formation of the intermediate layer, the surface layer 4 was formed of a substance which is a ternary alloy of platinum (Pt) -rhodium (Rh) -gold (Au). The surface layer 4 was formed to a thickness of 700 ° (see FIG. 1D).

【００１２】このように製作した成形型は、真空中で７
００℃まで加熱し、光学ガラスを加圧成形して成形され
た光学素子の表面粗さを光学式表面粗さ計で観察した。
本発明の実施の形態である封孔処理を施した成形型を使
用して作製した光学素子では表面粗さはＲｍａｘ値５０
〜７０Å程度であった。また、比較例として、同一形状
のタングステンカーバイドを基体とし、タングステンカ
ーバイド層を形成せずに成形面を凹面曲率半径３０ｍ
ｍ、表面粗さがＲＭＳ値で６．０〜８．ＯÅ程度に研削
・研磨し、スバッ夕法により、中間層であるＡｌ2０3膜
を７００Åの厚さに設け、更にＰｔ−Ｒｈ−Ａｕの金属
合金である表面層を７００Åの厚さになるまでを形成し
た成形型を作製した。[0012] The mold thus manufactured is placed in a vacuum at 7
The optical element was heated to 00 ° C., and the optical glass was molded under pressure, and the surface roughness of the molded optical element was observed with an optical surface roughness meter.
The surface roughness of the optical element manufactured by using the mold having been subjected to the sealing treatment according to the embodiment of the present invention has an Rmax value of 50.
It was about 70 °. Further, as a comparative example, a tungsten carbide having the same shape was used as a base, and a forming surface was formed with a concave curvature radius of 30 m without forming a tungsten carbide layer.
m, surface roughness is 6.0 to 8.0 in RMS value. Grinding and polishing to about OÅ, providing an Al 2 O 3 film as an intermediate layer with a thickness of 700Å by the sputtering method, and further increasing the surface layer of a Pt-Rh-Au metal alloy to a thickness of 700Å. A mold having the above steps was manufactured.

【００１３】この比較例である成形型で成形した光学素
子の表面粗さはＲｍａｘ値で７００〜９０ＯÅであっ
た。以上の結果を第１表に示す。The surface roughness of the optical element molded by the mold of this comparative example was 700 to 90 ° in Rmax value. Table 1 shows the above results.

【００１４】[0014]

【表１】 [Table 1]

【００１５】以上の結果のように、比較例での成形型の
様に基体の封孔処理を行わずに得た成形型で作製した光
学素子に対し、本発明の実施の形態の様に基体の封孔処
理を行った成形型で作製した光学素子は、非常に滑らか
な表面を有していることが解る。また、他にＳｉＣ（炭
化珪素）焼結材を基体とした成形型で、成形されるとき
に得られる欠けについても、本発明の実施の形態におけ
る成形型では皆無であった。As described above, the optical element manufactured by the mold obtained without performing the sealing treatment of the substrate as in the mold of the comparative example was compared with the optical element as in the embodiment of the present invention. It can be seen that the optical element produced by the mold having been subjected to the sealing treatment has a very smooth surface. In addition, there was no chip in the molding die according to the embodiment of the present invention, even when the molding die was formed using a SiC (silicon carbide) sintered material as a base.

【００１６】また、本発明の実施の形態では、アルミニ
ウムの酸化物である酸化アルミニウムを用いて基体と表
面層との間に中間層を設けたが、本発明はこれに限られ
ない。ただし、基体と表面層と間でおこる拡散によっ
て、表面層の表面に粗れが発生する場合があるが、この
様な場合に、金属と非金属との化合物で形成された中間
層を備えることで、このような影響を排除することがで
きる。In the embodiment of the present invention, the intermediate layer is provided between the substrate and the surface layer using aluminum oxide which is an oxide of aluminum. However, the present invention is not limited to this. However, the surface layer may be roughened due to diffusion between the substrate and the surface layer.In such a case, it is necessary to provide an intermediate layer formed of a compound of a metal and a non-metal. Thus, such an influence can be eliminated.

【００１７】[0017]

【発明の効果】本発明による光学素子成形型は、基体母
材として加工性、高温強度、耐熱衝撃性などに優れるタ
ングステンカーバイドを使用し、光学素子に型材成形面
の微細な凹凸が転写されることを、成形面上に点在する
母材の焼結時に形成された微細な開口を封孔処理した
後、成形面を精密に加工することで、防止する。The optical element molding die according to the present invention uses tungsten carbide having excellent workability, high-temperature strength, thermal shock resistance and the like as a base material, and fine irregularities on the molding surface are transferred to the optical element. This is prevented by processing the fine surface precisely after sealing the fine openings formed during sintering of the base material scattered on the forming surface.

【００１８】これにより、平滑性に優れた光学素子のプ
レス成形が可能で取扱いの容易な成形型が実現できる。As a result, it is possible to press the optical element having excellent smoothness and to realize a mold that is easy to handle.

【図面の簡単な説明】[Brief description of the drawings]

【図１】は、本発明の実施の形態で作製した成形型の断
面概念図である。FIG. 1 is a conceptual cross-sectional view of a molding die manufactured according to an embodiment of the present invention.

【図２】は、基体１の概略図である。FIG. 2 is a schematic view of a base 1.

【符号の説明】[Explanation of symbols]

１・・・基体（タングステンカーバイド） ２・・・蒸着により得られたタングステンカーバイド層 ３・・・中間層 ４・・・表面層 Ａ・・・外径 Ｂ・・・厚さ Ｒ・・・凹面曲率半径 DESCRIPTION OF SYMBOLS 1 ... Base (tungsten carbide) 2 ... Tungsten carbide layer obtained by vapor deposition 3 ... Intermediate layer 4 ... Surface layer A ... Outer diameter B ... Thickness R ... Concave surface curvature radius

Claims (6)

【特許請求の範囲】[Claims] 【請求項１】焼結により成形されたタングステンカーバ
イドで形成された基体と、 前記基体の成形面に蒸着により成膜された基体表面形成
層と、 前記基体表面形成層上に貴金属薄膜で形成された表面層
とを備えたことを特徴とする光学素子の成形型1. A base formed of tungsten carbide formed by sintering, a base surface forming layer formed by vapor deposition on a forming surface of the base, and a noble metal thin film formed on the base surface forming layer. Mold for optical element, comprising: 【請求項２】前記基体表面形成層と前記表面層との間に
拡散防止を目的とする中間層を備えたことを特徴とする
請求項１記載の光学素子の成形型2. An optical element molding die according to claim 1, further comprising an intermediate layer for preventing diffusion between said substrate surface forming layer and said surface layer. 【請求項３】前記中間層は、金属と非金属との化合物で
形成されていることを特徴とする請求項２記載の光学素
子の成形型3. The mold according to claim 2, wherein the intermediate layer is formed of a compound of a metal and a nonmetal. 【請求項４】前記中間層は、アルミニウムの酸化物で形
成されていることを特徴とする請求項３記載の光学素子
の成形型4. The mold according to claim 3, wherein the intermediate layer is formed of an aluminum oxide. 【請求項５】焼結により得られたタングステンカーバイ
ドで形成された基体の成形面に、蒸着によりタングステ
ンカーバイドを成膜し、 前記成膜されたタングステンカーバイド上に更に貴金属
合金を成膜した事を特徴とする光学素子の成形型の製造
方法5. A method in which a tungsten carbide film is formed by vapor deposition on a molding surface of a substrate made of tungsten carbide obtained by sintering, and a noble metal alloy is further formed on the formed tungsten carbide. Characteristic method of manufacturing mold for optical element 【請求項６】前記蒸着により成膜されたタングステンカ
ーバイドの上にアルミニウムの酸化物を成膜し、更に前
記貴金属合金を成膜したことを特徴とする請求項５記載
の光学素子の成形型の製造方法6. An optical element molding die according to claim 5, wherein an aluminum oxide film is formed on the tungsten carbide film formed by the vapor deposition, and the noble metal alloy is further formed. Production method
JP8187384A 1996-07-17 1996-07-17 Forming mold for optical element and its production Pending JPH1029822A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8187384A JPH1029822A (en) 1996-07-17 1996-07-17 Forming mold for optical element and its production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8187384A JPH1029822A (en) 1996-07-17 1996-07-17 Forming mold for optical element and its production

Publications (1)

Publication Number Publication Date
JPH1029822A true JPH1029822A (en) 1998-02-03

Family

ID=16205078

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8187384A Pending JPH1029822A (en) 1996-07-17 1996-07-17 Forming mold for optical element and its production

Country Status (1)

Country Link
JP (1) JPH1029822A (en)

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