EP1073091A3
(en )
2004-10-06
Electrode for plasma generation, plasma treatment apparatus using the electrode, and plasma treatment with the apparatus
EP2233606A3
(en )
2011-04-20
Plasma discharge apparatus
EP0658918A3
(en )
1995-07-05
Plasma processing apparatus
EP0997926A3
(en )
2000-05-17
Plasma treatment apparatus and method
WO2002012587A3
(en )
2003-03-20
Processing apparatus and cleaning method
JPH10280155A5
(enrdf_load_stackoverflow )
2005-02-24
JP2001152335A5
(enrdf_load_stackoverflow )
2006-11-02
JPH10195635A5
(enrdf_load_stackoverflow )
2004-11-25
JPH0469465U
(enrdf_load_stackoverflow )
1992-06-19
JPS57131373A
(en )
1982-08-14
Plasma etching device
JP2003077903A5
(enrdf_load_stackoverflow )
2004-12-16
CN2577437Y
(zh )
2003-10-01
管筒状工件内壁等离子体注入装置
MY128221A
(en )
2007-01-31
Master medium cleaning method
EP0834593A3
(en )
1999-01-27
Plasma thin-film forming apparatus and method
JP3409881B2
(ja )
2003-05-26
Rf放電型イオン源
JPS5812339B2
(ja )
1983-03-08
イオンエツチングホウホウ
JP2002184759A5
(enrdf_load_stackoverflow )
2005-07-14
JPH07300395A
(ja )
1995-11-14
ダイヤモンド表面吸着水素量の低減方法
JPH11124671A5
(enrdf_load_stackoverflow )
2005-06-23
JPS629324Y2
(enrdf_load_stackoverflow )
1987-03-04
JPS5924358Y2
(ja )
1984-07-19
イオン化装置
JPS62171748A
(ja )
1987-07-28
プラズマ処理装置
JPS5776188A
(en )
1982-05-13
Gas plasma etching device
JPS62191100U
(enrdf_load_stackoverflow )
1987-12-04
JPS551016A
(en )
1980-01-07
Cleaning method for electron gun and its device