JPH10268329A - Manufacture of liquid crystal display element - Google Patents

Manufacture of liquid crystal display element

Info

Publication number
JPH10268329A
JPH10268329A JP8742497A JP8742497A JPH10268329A JP H10268329 A JPH10268329 A JP H10268329A JP 8742497 A JP8742497 A JP 8742497A JP 8742497 A JP8742497 A JP 8742497A JP H10268329 A JPH10268329 A JP H10268329A
Authority
JP
Japan
Prior art keywords
seal
resin
substrate
liquid crystal
sealing resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8742497A
Other languages
Japanese (ja)
Inventor
Hiroshi Hoshino
博史 星野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Display Corp
Original Assignee
Kyocera Display Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Display Corp filed Critical Kyocera Display Corp
Priority to JP8742497A priority Critical patent/JPH10268329A/en
Publication of JPH10268329A publication Critical patent/JPH10268329A/en
Pending legal-status Critical Current

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  • Liquid Crystal (AREA)

Abstract

PROBLEM TO BE SOLVED: To reduce stress applied to a seal part and to prevent peeling by overheating the plastic substrate of the liquid crystal display element up to glass transition point (Tg) at which seal resin show elasticity. SOLUTION: A couple of plastic substrates having transparent electrodes formed are put one over the other face to face across the seal resin, and the plastic substrates are cut along the cell surrounded with the seal resin to form an injection hole. At this time, the temperature of the seal resin is held within a range of Tg of the seal resin -30 to +50 deg.C and the plastic substrates are cut. As a cutting method, a scribe cutting method is applicable for the plastic substrates without causing any problem of seal material peeling. When the temperature of the seal part is lower than the Tg of the seal resin -30 deg.C at the time of the cutting of the substrates, the seal part is easy to peel, but when higher than Tg +50 deg.C, there is the possibility of thermal deformation of the substrate, inconvenience regarding facilities, and trouble in operation.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は液晶表示素子の製造
方法に関し、さらに詳しく言えば、透明電極基板をプラ
スチック基板とした液晶表示素子の切断技術に関するも
のである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a liquid crystal display device, and more particularly to a technique for cutting a liquid crystal display device using a transparent electrode substrate as a plastic substrate.

【0002】[0002]

【従来の技術】液晶表示素子の製造工程は概略次のとお
りである。まず、マザーボードとしての大きな透明基板
を一対用意し、その各々の一方の表面に複数の表示画面
を例えばマトリクス状に割り振り、その表示画面ごとに
透明電極を形成する。そして、その一方の透明基板に1
表示画面単位でそれを囲むようにシール樹脂を印刷し、
他方の透明基板を透明電極同士が対向するように位置合
わせし、加熱または光照射によりシール樹脂を硬化させ
て2枚の透明基板を張り合わせる。
2. Description of the Related Art A manufacturing process of a liquid crystal display device is roughly as follows. First, a pair of large transparent substrates as a motherboard is prepared, a plurality of display screens are allocated on one surface of each of them, for example, in a matrix, and a transparent electrode is formed for each display screen. Then, one transparent substrate
Print the seal resin around the display screen unit,
The other transparent substrate is positioned so that the transparent electrodes face each other, and the sealing resin is cured by heating or light irradiation to bond the two transparent substrates together.

【0003】次に、このマザーボードをマトリクス配置
の行もしくは列に沿って複数のスティック基板に切断
し、各セル内に液晶を注入するための注入口出しを行な
う。そして、その注入口から液晶を注入した後、注入口
を接着剤で封じ、必要に応じてセルごとの切断を行な
い、洗浄し、偏光膜の貼り付けを行なう。このようにし
て、最終的に製品としての液晶表示素子が得られる。
Next, this motherboard is cut into a plurality of stick substrates along rows or columns in a matrix arrangement, and an injection port for injecting liquid crystal into each cell is formed. Then, after injecting the liquid crystal from the injection port, the injection port is sealed with an adhesive, and if necessary, the cell is cut, washed, and a polarizing film is attached. Thus, a liquid crystal display element as a product is finally obtained.

【0004】[0004]

【発明が解決しようとする課題】ところで、透明基板と
してプラスチックを用いる液晶表示素子は軽量で破損し
にくいという特徴を有しているため、近年特に携帯用情
報端末などにも用途が拡大しているが、その反面、信頼
性が低いという問題を抱えている。
However, liquid crystal display elements using plastic as a transparent substrate have the characteristics of being lightweight and hard to break, and in recent years, their use has been expanded particularly to portable information terminals and the like. However, on the other hand, there is a problem that reliability is low.

【0005】その理由の一つとして、信頼性の面から有
利なTgが高く緻密なシール樹脂を使用すると、例えば
マザーボードを複数のスティック基板に切断する際、そ
の応力によりシール部に剥離が生じやすいということが
挙げられる。その原因は、プラスチック基板が可撓性で
あり、切断時に基板が変形してもシール樹脂がこれに追
随できないためである。
One of the reasons is that when a dense sealing resin having a high Tg, which is advantageous from the viewpoint of reliability, is used, for example, when a motherboard is cut into a plurality of stick substrates, the sealing portion is likely to peel off due to the stress. It is mentioned. This is because the plastic substrate is flexible and the sealing resin cannot follow the substrate even when the substrate is deformed during cutting.

【0006】本発明は、上記従来の問題点を解決するた
めになされたもので、その目的は、プラスチック基板を
透明基板とした場合、シール樹脂としてTgの高い樹脂
を使用しても、その基板張り合わせ後における基板切断
時にシール樹脂に剥離が生じないようにした液晶表示素
子の製造方法を提供することにある。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned conventional problems. It is an object of the present invention to provide a transparent substrate made of a plastic substrate, even if a high Tg resin is used as a sealing resin. It is an object of the present invention to provide a method of manufacturing a liquid crystal display element in which a sealing resin does not peel off when a substrate is cut after bonding.

【0007】[0007]

【課題を解決するための手段】上記目的を達成するた
め、本発明は、透明電極が形成された一対のプラスチッ
ク基板をシール樹脂を介して対向的に重ね合わせ、その
シール樹脂にて囲まれたセルに沿って上記プラスチック
基板を切断して注入口出しを行なうにあたって、上記シ
ール樹脂の温度を同シール樹脂のTg(ガラス転移点)
−30〜+50℃の範囲内として上記プラスチック基板
を切断することを特徴としている。
According to the present invention, a pair of plastic substrates having transparent electrodes formed thereon are opposed to each other via a sealing resin, and are surrounded by the sealing resin. When cutting the plastic substrate along the cell and performing injection porting, the temperature of the sealing resin is set to Tg (glass transition point) of the sealing resin.
The method is characterized in that the plastic substrate is cut within the range of -30 to + 50 ° C.

【0008】基板の切断方法には、大別してダイシング
ブレードを高速回転させて基板を切断するダイシング切
断法と、基板に超硬ホイールを押しつけてハーフカット
を入れ、その後押圧力を加えて残余部分を破断するスク
ライブ切断法とがあるが、プラスチック基板の場合、ダ
イシング切断法では樹脂が溶融してダイシングブレード
に付着するため、頻繁にそのブレードをクリーニングす
る必要がある。
[0008] The substrate cutting method is roughly divided into a dicing cutting method in which a dicing blade is rotated at a high speed to cut the substrate, and a half cut by pressing a carbide wheel on the substrate, and then applying a pressing force to remove the remaining portion. Although there is a scribe cutting method that breaks, in the case of a plastic substrate, since the resin is melted and adheres to the dicing blade in the dicing cutting method, it is necessary to frequently clean the blade.

【0009】この点、スクライブ切断法によれば、超硬
ホイールに溶融樹脂が付着することはなくメンテナンス
上好ましい。しかしながら、切断時に基板に対して大き
な外力が加えられるため、シール材が剥離するなどのお
それがあるとされていたが、本発明によれば、シール材
剥離などの問題を生ずることなく、プラスチック基板に
対してスクライブ切断法を適用することができる。
In this regard, according to the scribe cutting method, the molten resin does not adhere to the carbide wheel, which is preferable for maintenance. However, it has been considered that a large external force is applied to the substrate at the time of cutting, so that the sealing material may be peeled off. Can be applied to the scribe cutting method.

【0010】本発明において、プラスチック基板には光
透過率が高く、光学的に均一で、しかも耐熱性の良好な
材料が用いられる。このような樹脂としては、ポリアク
リレート、ポリカーボネート、ポリエチレンテレフタレ
ートなどの熱可塑性プラスチック、または、それらのア
ロイ、ブレンド、コンポジットが挙げられる。また、エ
ポキシ樹脂、光架橋樹脂などの硬化性樹脂を使用するこ
とも可能である。
In the present invention, a material having high light transmittance, optical uniformity and good heat resistance is used for the plastic substrate. Examples of such a resin include thermoplastics such as polyacrylate, polycarbonate, and polyethylene terephthalate, or alloys, blends, and composites thereof. It is also possible to use a curable resin such as an epoxy resin or a photocrosslinking resin.

【0011】シール樹脂には、硬化した場合緻密で高信
頼性の加熱硬化性エポキシ樹脂、または、光硬化性エポ
キシ樹脂、光硬化性アクリル樹脂など、従来と同様なも
のが使用される。加熱硬化性エポキシ樹脂系のシール材
は基本成分として、エポキシ剤、硬化剤、カップリング
剤、ゴム粒子、充填剤、溶剤などを含有する。硬化した
樹脂のTg(ガラス転移点)は、通常、DSC(示差走
査熱量計)などで測定される。
As the sealing resin, the same one as the conventional one, such as a heat-curable epoxy resin, a photo-curable epoxy resin, or a photo-curable acrylic resin, which is dense and highly reliable when cured, is used. The thermosetting epoxy resin-based sealing material contains, as basic components, an epoxy agent, a curing agent, a coupling agent, rubber particles, a filler, a solvent, and the like. The Tg (glass transition point) of the cured resin is usually measured by DSC (differential scanning calorimeter) or the like.

【0012】本発明において、基板の切断時に、シール
部の温度をシール樹脂のTg−30℃以上、Tg+50
℃以下の範囲とする。それより低温であるとシール部に
剥離が起きやすく、また、それよりも高温であると基板
の熱変形、設備上の不都合および作業上の障害などが生
ずるおそれがある。
In the present invention, at the time of cutting the substrate, the temperature of the sealing portion is set to Tg−30 ° C. or more of the sealing resin and Tg + 50.
It should be in the range of ℃ or less. If the temperature is lower than that, peeling is likely to occur in the seal portion, and if the temperature is higher than that, there is a possibility that thermal deformation of the substrate, inconvenience in equipment, and trouble in work may occur.

【0013】[0013]

【実施例】【Example】

《実施例1》厚さ0.4mmのポリカーボネート基板に
気体透過防止層、ハードコートおよび透明導電膜を積層
し、パターニングしたものを用意した。この基板に定法
にしたがって配向膜を付けて配向処理した。1液エポキ
シ型シール樹脂DSA−7236(四国化成社製)を基
板の所定位置に印刷し、対向基板と重ね合わせて圧着機
で110℃で30分間加熱し、表示セルを形成した。
Example 1 A gas barrier layer, a hard coat, and a transparent conductive film were laminated on a polycarbonate substrate having a thickness of 0.4 mm and patterned to prepare a laminate. An alignment film was attached to the substrate according to a conventional method, and alignment processing was performed. One-part epoxy-type sealing resin DSA-7236 (manufactured by Shikoku Chemicals) was printed at a predetermined position on the substrate, superposed on the counter substrate, and heated at 110 ° C. for 30 minutes with a crimping machine to form a display cell.

【0014】次に、この表示セルをスクライバーで1個
ずつ切断するとき、そのスクライバーテーブルの温度を
上げてシール部の温度を120℃に調整した。切断でシ
ール樹脂が剥離することはなかった。しかる後、セル内
に液晶を注入し、以降定法にしたがって液晶表示素子を
完成した。
Next, when the display cells were cut one by one with a scriber, the temperature of the scriber table was raised to adjust the temperature of the seal portion to 120 ° C. The cutting did not peel off the sealing resin. Thereafter, liquid crystal was injected into the cell, and thereafter, a liquid crystal display device was completed according to a standard method.

【0015】このシール樹脂の圧着後のサンプルを一部
削り取り、DSC(示差走査熱量計)にかけてTg(ガ
ラス転移点)を測定したところ103℃であった。この
液晶表示素子を60℃、相対湿度90%の高温高湿試験
に長時間さらしたが、1000時間経過後においても、
シール樹脂の剥離などはなく、また、表示特性もなんら
変化しなかった。
A sample of the seal resin after pressure bonding was partially scraped off, and Tg (glass transition point) was measured by using a DSC (differential scanning calorimeter). This liquid crystal display device was exposed to a high-temperature and high-humidity test at 60 ° C. and a relative humidity of 90% for a long time.
There was no peeling of the sealing resin and the display characteristics did not change at all.

【0016】〈比較例1〉実施例1と同様にして表示セ
ルを作製したが、切断時のシール部の温度は作業雰囲気
温度のままとし、特に加熱はしなかった。この場合、切
断後のセルは約16%の率でシール樹脂の剥離が見られ
た。
Comparative Example 1 A display cell was prepared in the same manner as in Example 1, except that the temperature of the seal portion at the time of cutting was kept at the working atmosphere temperature, and no particular heating was performed. In this case, peeling of the sealing resin was observed at a rate of about 16% in the cell after cutting.

【0017】[0017]

【発明の効果】以上説明したように、本発明によれば、
液晶表示素子のプラスチック基板を切断する際、シール
樹脂がその弾性を示すTg温度付近に加熱するようにし
たことにより、次のような効果が奏される。
As described above, according to the present invention,
When the plastic substrate of the liquid crystal display element is cut, the sealing resin is heated to around the Tg temperature at which the elasticity of the sealing resin is exhibited.

【0018】切断時にシール部に応力がかけられて
も、シール樹脂が弾性を持つため、その応力が緩和され
て剥離を起こさない。 その結果、従来では使用できないようなTgが高く緻
密な樹脂をシール材として使用することが可能となり、
きわめて信頼性の高いプラスチック液晶表示素子が製造
できる。 プラスチック基板をトラブルなく切断することができ
るため、生産性の向上が図れる。
Even if a stress is applied to the seal portion at the time of cutting, since the sealing resin has elasticity, the stress is relieved and the separation does not occur. As a result, it becomes possible to use a dense resin having a high Tg that cannot be used conventionally as a sealing material,
An extremely reliable plastic liquid crystal display element can be manufactured. Since the plastic substrate can be cut without any trouble, productivity can be improved.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 透明電極が形成された一対のプラスチッ
ク基板をシール樹脂を介して対向的に重ね合わせ、その
シール樹脂にて囲まれたセルに沿って上記プラスチック
基板を切断して注入口出しを行なうにあたって、上記シ
ール樹脂の温度を同シール樹脂のTg(ガラス転移点)
−30〜+50℃の範囲内として上記プラスチック基板
を切断することを特徴とする液晶表示素子の製造方法。
1. A pair of plastic substrates having a transparent electrode formed thereon are opposed to each other with a sealing resin interposed therebetween, and the plastic substrate is cut along cells surrounded by the sealing resin to form an injection port. In this case, the temperature of the above sealing resin is set to Tg (glass transition point) of the sealing resin.
A method for manufacturing a liquid crystal display element, comprising cutting the plastic substrate at a temperature within the range of -30 to + 50 ° C.
【請求項2】 上記プラスチック基板の切断法がスクラ
イブ切断法である請求項1に記載の液晶表示素子の製造
方法。
2. The method according to claim 1, wherein the cutting method of the plastic substrate is a scribe cutting method.
JP8742497A 1997-03-21 1997-03-21 Manufacture of liquid crystal display element Pending JPH10268329A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8742497A JPH10268329A (en) 1997-03-21 1997-03-21 Manufacture of liquid crystal display element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8742497A JPH10268329A (en) 1997-03-21 1997-03-21 Manufacture of liquid crystal display element

Publications (1)

Publication Number Publication Date
JPH10268329A true JPH10268329A (en) 1998-10-09

Family

ID=13914501

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8742497A Pending JPH10268329A (en) 1997-03-21 1997-03-21 Manufacture of liquid crystal display element

Country Status (1)

Country Link
JP (1) JPH10268329A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010109682A1 (en) * 2009-03-26 2010-09-30 次世代モバイル用表示材料技術研究組合 Display device manufacturing method
CN102749746A (en) * 2012-06-21 2012-10-24 深圳市华星光电技术有限公司 Liquid crystal substrate cutting device and liquid crystal substrate cutting method
JP5070341B2 (en) * 2008-09-12 2012-11-14 シャープ株式会社 Manufacturing method of display panel

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5070341B2 (en) * 2008-09-12 2012-11-14 シャープ株式会社 Manufacturing method of display panel
WO2010109682A1 (en) * 2009-03-26 2010-09-30 次世代モバイル用表示材料技術研究組合 Display device manufacturing method
JP2010230901A (en) * 2009-03-26 2010-10-14 Technology Research Association For Advanced Display Materials Method for manufacturing display
JP4623685B2 (en) * 2009-03-26 2011-02-02 次世代モバイル用表示材料技術研究組合 Manufacturing method of display device
CN102749746A (en) * 2012-06-21 2012-10-24 深圳市华星光电技术有限公司 Liquid crystal substrate cutting device and liquid crystal substrate cutting method

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