JPH10261612A - Wet treatment as well as rotary cleaning method and device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To enable high cleaning process by a method, wherein the treatment objects are rotated while the cleaning water having ultrasonic want exceeding a specific frequency is injected into the treatment objects or continuously dripped thereon. SOLUTION: A first tank 503 is used for the cleaning mainly by ozone water, as well as for the brush cleaning by electrolytic ionic water. A second tank 504 is used for mainly high-pressure injection of the electrolytic ionic water, thereby enabling the removal of the particles exceeding 1μm but not exceeding 10μm. A third tank 505 is used for the ultrasonic wave cleaning mainly using electrolytic water, thereby enabling the submicron particles to be removed using the ultrasonic wave frequency exceeding 30KHz, in this step. A fourth tank 506 is used for the finish cleaning and the drying step mainly using electrolytic ionic water. Furthermore, it is preferable that the objects treated be of such constitution as the be rotatable in respective tanks 501-506.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION The present invention relates to a method for obtaining a surface having a higher degree of cleanliness than a conventional one in a field where an extremely clean surface such as a glass substrate for a liquid crystal display or a semiconductor substrate is required. The present invention relates to a possible wet processing method and processing apparatus, a rotary cleaning method and a rotary cleaning apparatus.

[0002]

2. Description of the Related Art Conventionally, wet processing of a glass substrate for a liquid crystal display device is performed by using, for example, the following technique.

That is, using an organic solvent, a water-soluble surfactant solution, ultrapure water and ultraviolet light in combination with ozone, etc.
It is mainly performed by a process of removing organic substances and fine particles attached to the substrate surface.

For example, in an immersion treatment method, cleaning is performed in the following procedure. (1) Surfactant / ultrasonic cleaning 1/5 min (2) Surfactant / ultrasonic cleaning 2/5 min (3) Ultrapure water / ultrasonic cleaning 1/5 min (4) Ultrapure water / ultra Ultrasonic cleaning 2/5 minutes (5) Ultrapure water / immersion cleaning / 5 minutes (6) Drying / IPA (isopropyl alcohol) vapor drying

In the single-wafer method, cleaning is performed in the following procedure. (1) Surfactant / brush scrub / 0.5 min (2) Ultrapure water rinse / 0.5 min (3) Ultrapure water high pressure jet / 0.5 min (4) Ultrapure water / ultrasonic shower cleaning /0.5 min (5) Ultraviolet ozone cleaning / 0.5 min (6) Drying / spin drying / 0.5 min

[0006] However, in the field of semiconductors where the degree of integration is increasing as at present, a cleaning technique with higher cleanliness is required.

[0007]

SUMMARY OF THE INVENTION It is an object of the present invention to provide a wet processing method and a processing apparatus, and a rotary cleaning method and a rotary cleaning apparatus, which can perform higher-purity cleaning than before.

[0008]

The wet treatment method of the present invention comprises a cleaning step using ozone water, a brush cleaning step using electrolytic ionic water, a high-pressure jet cleaning step using electrolytic ionic water, and applying ultrasonic waves of 30 kHz or more to electrolytic ionic water. The method includes a cleaning step including at least one of an ultrasonic cleaning step performed by irradiation and a cleaning step using electrolytic ionized water, and a drying step.

A wet treatment apparatus according to the present invention comprises an ozone water nozzle for supplying ozone water, an ultrapure water nozzle for supplying ultrapure water, and an electrolytic ionic water for supplying electrolytic ionic water. A first tank having at least a supply nozzle, a brush for brushing the object to be treated, an electrolytic ion water high-pressure jet nozzle for injecting electrolytic ion water at high pressure to the object to be treated, and ultrapure water. A second tank having at least a nozzle for ultrapure water for supplying to the object to be treated, a means for introducing electrolytic ionic water, and a means for irradiating the electrolytic ionic water with ultrasonic waves of 30 kHz or more. A third tank having at least a means, a fourth tank having at least a nozzle capable of irradiating ultrasonic waves of 30 kHz or more by introducing electrolytic ion water, and a fifth tank for drying the object to be processed. Tank and Characterized in that it has at least.

The first to fifth tanks may be used alone or as tanks having different functions.

[0011] In the rotary cleaning method of the present invention, the object to be processed is rotated by spraying or continuously dropping cleaning water to which an ultrasonic wave of 30 kHz or more is applied onto the object to be processed. Washing is performed.

[0012] The rotary cleaning apparatus of the present invention comprises a tank for cleaning an object to be processed, holding means for rotatably holding the object to be processed in the tank, and a cleaning liquid for the object to be processed. It is characterized by having a nozzle for spraying or dropping continuously and an ultrasonic oscillator for applying ultrasonic waves to the cleaning liquid.

[0013] By adopting each of the above-described configurations, it is possible to perform cleaning with higher purity than before.

It is noted that ultrapure water or electrolytic ionized water is 30 khz.
If a means for irradiating ultrasonic waves of z or more to clean the brush is provided, contamination from the brush is eliminated, and higher-purity cleaning is achieved.

Further, if at least one of the tanks is configured to be able to be rinsed with pure water or electrolytic ionic water after the cleaning treatment in each of the tanks, the rinsing can be sufficiently performed and there is no contamination by the cleaning liquid. Washing can be performed.

In at least one of the tanks, the means for holding the object to be processed is rotatable, so that very clean washing can be performed.

When the object to be processed is rotated at a rotation speed of 100 rpm or more, and the cleaning water to which ultrasonic waves of 30 kHz or more are applied is jetted or continuously dropped onto the object to be processed, the particle residual ratio is significantly reduced as compared with the prior art. can do.

When electrolytic ionic water is used as the washing water, the particle residual ratio can be further reduced as compared with the prior art, and the dispersion of the residual ratio can be extremely reduced.

[0019]

Embodiments of the present invention will be described below with reference to the drawings. FIG. 2 shows an embodiment of the wet processing apparatus.

In this embodiment, ozone water nozzles 116 and 121 for supplying ozone water, ultrapure water nozzles 117 and 120 for supplying ultrapure water, and an electrolytic solution for supplying electrolytic ionic water are provided. Ionized water supply nozzles 122 to 125
A first tank 506 (101) having brushes 102 and 103 for brushing the object to be processed; electrolytic ion water high-pressure jet nozzles 210 and 211 for high-pressure injection of electrolytic ions to the object; Pure water is treated 115
Tank 504 (204) having at least nozzles 206 and 209 for ultrapure water for supplying the ionized water, means for introducing electrolytic ionized water,
A third tank 50 having at least ultrasonic oscillators 303 and 304 that are means for irradiating ultrasonic waves of not less than Hz.
5 (309) and the fourth for drying the object 115 having the nozzle 415 for introducing electrolytic ion water.
And at least the tank 402.

The wet processing apparatus shown in the embodiment includes a first tank 503, a second tank 504, a third tank 504, and a fourth tank 50.
The ozone water nozzles 116 and 121 for supplying ozone water are connected to an ozone water production device 509 via an ozone water outlet pipe 108.

The ultrapure water nozzles 117 and 120 for supplying the ultrapure water are connected to the ultrapure water outlet pipe 109 via
It is connected to an ultrapure water supply (not shown).

The nozzles 122 to 125 for supplying electrolytic ionic water for supplying electrolytic ionic water are connected to an electrolytic ionic water producing apparatus 508 via electrolytic ionic water outlet pipes.

Further, in this embodiment, a pair of brushes 10
2,103 are provided. The brushes 102 and 103 brush the front and back surfaces of the workpiece 115.

Then, one end of the nozzle is connected to the workpiece 1
The surface 15 is disposed at a position where ultrapure water or ozone water can be supplied.

In this embodiment, the nozzles 118 and 119 for supplying the surfactant are provided independently. The surfactant may be supplied by adding to ozone water or ultrapure water without providing the nozzles 118 and 119 for supplying the surfactant.

In this embodiment, the upper brush ultrasonic cleaning tank 104 for cleaning the upper brush 102 and the lower brush ultrasonic cleaning tank 105 for cleaning the lower brush 103 are used.
Is provided. An ultrasonic oscillator 10 is provided in each of the upper brush ultrasonic cleaning tank 104 and the lower brush ultrasonic cleaning tank 105.
6,107 are provided.

This ultrasonic oscillator can oscillate at 30 kHz or more. The brushes 102 and 103 can be cleaned by applying an ultrasonic wave of 30 kHz or more. In particular, 750 kHz to 5 MHz oscillation is preferable for more efficient brush cleaning. Brush 102,
When cleaning of 103 is required, the upper brush ultrasonic cleaning tank 1
04, a suitable treatment water (for example, ozone water, electrolytic ionic water, ultrapure water) is piped into the lower brush ultrasonic plaster cleaning tank 105.
The brushes 102 and 103 are supplied through the upper brush ultrasonic cleaning tank 104 and the lower brush ultrasonic cleaning tank 1.
The cleaning may be performed while moving the inside of the chamber 05 (means for moving is not specifically shown, but may be any suitable means) and applying ultrasonic waves.

The inner surface of the first tank 101 is preferably formed of stainless steel having a passivation film made of chromium oxide without iron oxide formed on the surface.

It is preferable that the object to be processed is rotatable. Rotate the object to be processed and the front side (back side)
If a cleaning liquid is supplied to the cleaning liquid, cleaning with even higher cleanliness can be performed.

The first tank 101 is a tank for mainly performing cleaning with ozone water and brush cleaning with electrolytic ionic water (cathode water, anode water). By performing these washings, organic substances, particles having a size of 1 μm or less, particles having a size of 10 μm or more, and metals can be removed.

The brush may be any as long as it does not damage the surface of the object to be cleaned and does not become a source of contamination. For example, a brush made of nylon can be used.

In the second tank, an electrolytic ionized water high pressure jet nozzle 2 for injecting electrolytic ionized water at high pressure to the object to be treated is provided.
10, 211 are high pressure jet outlet pipes for electrolytic ionized water 20
1 connected.

The second tank 204 is a tank for mainly injecting electrolytic ion water at a high pressure, and it is possible to remove particles of 10 μm or less and 1 μm or more.

The injection pressure is 5 kgw / cm
^{2 to} 100 kgw / cm ² is preferable from the viewpoint of further improving the cleaning effect without damaging the workpiece.

In this example, nozzles 206 and 209 for introducing ultrapure water and electrolytic ion water introduction nozzles 207 and 208 for introducing other electrolytic ion water are further provided. Ultrapure water or electrolytic ionic water introduced from these nozzles can be used for rinsing.

The nozzles 210 and 211 are made of stainless steel having a passivation film mainly composed of chromium oxide formed on the surface, so that generation of particles from the nozzles can be prevented. Is also preferred.

On the other hand, ultrapure water introduction nozzles 206, 209,
It is preferable to use platinum for the electrolytic ion water introduction nozzles 207 and 208 from the viewpoint of preventing static electricity of pure water.

The third tank 309 is a tank for mainly performing ultrasonic cleaning using electrolytic ionized water. By performing ultrasonic cleaning using electrolytic ion water, submicron particles are removed.

In this embodiment shown in FIG. 4, the third tank 309
Is further provided with an ultrasonic cleaning tank 301 made of quartz, into which electrolytic ionic water 306 is supplied via an electrolytic ionic water outlet pipe 307. The ultrasonic cleaning tank 301 is housed in an ultrasonic tank 302 via an ultrasonic transmission liquid 305. Reference numerals 303 and 304 denote ultrasonic oscillators, and in this example, ultrasonic waves are applied to an object to be processed in a horizontal direction. The ultrasonic wave from the ultrasonic oscillator 303 is
The liquid is transmitted to the object 115 immersed in the electrolytic ionic water 306 in the ultrasonic cleaning tank 301 via the ultrasonic transmission liquid 305.

The fourth tank 402 is mainly used for finish cleaning with electrolytic ionic water (mainly removing metals and removing particles).
And a tank for drying. 403 is an ultrasonic oscillator. Reference numerals 401 and 412 denote supply pipes of cleaning water (electrolytic ion water) for performing the above-described finishing cleaning. Reference numeral 404 denotes an ultrasonically treated water deriving unit for deriving treated water to which ultrasonic waves have been applied. Length a of this sonicated water deriving unit 404
Is preferably larger than the length of the diagonal line of the object to be processed (substrate). Thus, even when the object to be processed is rotated, the spray water can always be sprayed on the entire substrate, so that reattachment of particles and the like can be prevented.

The metal, organic matter, and oxide film are removed by washing with electrolytic ionic water.

The drying is preferably performed while blowing an inert gas onto the surface of the object to be processed in order to prevent an oxide film from being formed on the surface. Also in this example, a gas inlet 405 for introducing an inert gas is provided. As this gas, it is preferable to use a gas having an impurity concentration of several ppb or less such as moisture. From an economic viewpoint, nitrogen gas is preferable.

It is preferable that the gas is heated by the heater 406 in order to increase the drying speed.

It is preferable to perform rinsing with ultrapure water while applying ultrasonic waves between the washing step with electrolytic ionic water and the drying step, from the viewpoint of increasing cleanliness.

In each of the tanks, when the cleaning is performed while the object to be processed is being rotated by spinning, the cleaning liquid uniformly covers the surface, and a new cleaning liquid is constantly supplied to the surface to be cleaned.
In addition, since the contaminants are removed from the surface by centrifugal force, very clean cleaning can be performed. Therefore, it is preferable that each of the tanks is configured so that the object to be processed can be rotated.

In the present invention, the frequency of the ultrasonic wave in the ultrasonic cleaning step using electrolytic ion water is 30 kHz or more.

It is particularly preferable that 1 MHz to 5 MHz is used for removing particles having a small particle diameter of 1 μm or less. Also 30k
Hz to 1 MHz is particularly preferable for removing particles having a relatively large particle diameter of 1 μm or more.

Further, since the metal adhering to the solid surface often adheres as fine particles, it is 1 MHz to 5 MHz.
Is preferred for removing fine metal particles.

In order to remove organic substances such as resist or adsorbed organic substances adhering to the solid surface, 30 kHz
~ 1 MHz is preferred.

Note that while changing the frequency in the cleaning process, for example, gradually increasing the frequency from 30 kHz to 5 MHz (or from 5 MHz to 30 kHz)
It is preferable to perform the cleaning while gradually lowering the frequency.

FIG. 6 shows an embodiment of the rotary cleaning apparatus.
The rotary cleaning device 600 includes a second tank 204 shown in FIG.
Is substantially the same as that of the rotary cleaning device 600 shown in FIG.
A tank 604 for cleaning the object 115;
4, holding means 260 for rotatably holding the object 115, a nozzle 280 for injecting or continuously dropping the cleaning liquid onto the object 115, and an ultrasonic wave for applying ultrasonic waves to the cleaning liquid. And a sound wave oscillator 270.

The nozzle 280 is connected to a washing water source 290 via a washing water introduction pipe 601 as washing water.
Ultrapure water and electrolytic ionic water may be used.

Conventionally, there has been known a cleaning technique in which ultrapure water is jetted or continuously dropped onto the object 115 while rotating the object.

However, the present inventor has found that the object to be processed can be cleaned more simply when the object to be processed is simply rotated, or when the object is simply washed with ultrapure water to which ultrasonic waves are applied without being rotated. It has been found that if the cleaning is performed with the cleaning water to which the ultrasonic wave is applied while rotating, an extremely excellent cleaning effect that is equal to or more than the sum of the effects of each of them is achieved.

That is, (1) When the object to be cleaned is rotated while dropping or spraying the cleaning water irradiated with the ultrasonic wave, (1) and (2) are synergistic effects of (1) and (2). It has been found that an effect greater than the sum of the effects obtained in each of 2) can be obtained. This is considered to be because particles separated from the object by the ultrasonic wave are quickly pushed out of the system by high-speed rotation (100 rpm or more).

In the case of the rotary cleaning, the bending due to its own weight is eliminated by rotation even for a large-sized substrate, and the cleaning water irradiated with the ultrasonic waves uniformly hits the substrate, so that high-purity cleaning can be realized.

The above synergistic effect does not occur at a rotational speed of 100 rpm or less. The reason is not clear. The rotation speed is more preferably from 300 rpm to 2000 rpm, and still more preferably from 300 rpm to 1500 rpm. The upper limit is preferably 3000 rm. 3000
If it exceeds rpm, the drying speed may be too high to perform sufficient cleaning in some cases.

In the rotary cleaning, the frequency of the ultrasonic wave applied to the cleaning water is 30 kHz or more.

Incidentally, 1 MHz to 3 MHz is particularly preferable for removing small-diameter particles having a size of 1 μm or less. Also 30k
Hz to 1 MHz is particularly preferable for removing particles having a relatively large particle diameter of 1 μm or more.

Further, since the metal adhering to the solid surface often adheres as fine particles, it is 1 MHz to 3 MHz.
Is preferred for removing fine metal particles.

In order to remove organic substances such as resist or adsorbed organic substances adhering to the solid surface, 30 kHz
~ 1 MHz is preferred.

While changing the frequency in the cleaning process, for example, gradually increasing the frequency from 30 kHz to 3 MHz (or from 3 MHz to 30 kHz).
It is preferable to perform the cleaning while gradually lowering the frequency.

[0064]

【Example】

(Example 1) The liquid crystal display substrate was cleaned using the wet processing apparatus shown in FIG. 1, and more specifically, FIGS. The procedure is as follows.

First tank Cleaning with ozone water Ozone concentration: 5 ppm Cleaning time: 30 sec Pure water rinsing 5 sec By this treatment, organic substances and metals were removed.

Brush cleaning with electrolytic ionized water Electrolytic ionized water Cathode water pH: 8 Redox potential: -500 mV Cleaning time: 20 sec

The brush was used after being cleaned by a dedicated ultrasonic cleaning tank. In the ultrasonic cleaning, a megahertz band of 750 kHz or more was used, particles of μm to sub-μm were sufficiently removed from the brush, and relatively large particles were removed from particles of 1 μm or less.

The large particles did not reattach to the brush due to the effect of the treated water (ie, the polarity of the particles could be made the same as the polarity of the brush material by controlling the pH and the oxidation-reduction potential).

By this treatment, particles of 0.5 μm or more and particles of 10 μm or more were removed very well.

Second tank High pressure jet cleaning with electrolytic ionized water Electrolytic ionized water Cathode water pH: 8 Redox potential: -500 mV Cleaning time: 50 sec Pure water rinse: 10 sec

By this treatment, particles having a size of 10 μm or less and 0.5 μm or more were removed very well.

The static electricity was removed by electrolytic ionic water. Particle reattachment was performed by the effect of treated water.

Third tank Ultrasonic cleaning with electrolytic ion water Electrolytic ion water Cathode water pH: 8 Redox potential: -500 mV Cleaning time: 50 sec Ultrasonic frequency 50 kHz Submicron particles were removed by this treatment.

Fourth tank Cleaning with electrolytic ionized water Electrolytic ionized water Anode water HF added pH: 3 Oxidation far potential: 1000 mV Ultrasonic rinse Rinse time: 20 sec Ultrasonic: 950 kHz Spin drying: nitrogen blow (center) Metals, organics, and oxide films have been removed.

After completion of the above cleaning treatment, Al ₂ O ₃ particles (1 μm
m) was examined for cleanliness.

[0076]

[Table 1]

In the examples of the present invention, it can be seen that the number of residual particles is much smaller than in the prior art.

(Embodiment 2) In this embodiment, a cleaning effect using the rotary cleaning apparatus shown in FIG. 5 will be described.

An alumina particle having a diameter of 1 μm was
It was suspended in ultrapure water so as to have a concentration of ケ / ml to prepare an alumina suspension. The glass substrate was immersed in this alumina suspension for 10 minutes.

After the glass substrate was taken out of the alumina suspension, the glass substrate was immersed in a tank containing ultrapure water and the ultrapure water overflowed from the tank to wash the glass substrate. After washing with ultrapure water, spin drying was performed. A plurality of samples contaminated with alumina were thus prepared.

Each of these samples was subjected to various types of washing under the conditions shown in Table 2, and the particle residual ratio and its variation were examined. The cleaning shown in Table 2 was performed by dropping cleaning water (ultra pure water, electrolytic ionic water) on the surface of the glass substrate.
The results are shown in Table 2 and FIG.

[0082]

[Table 2] *: Electrolyzed water is cathode water

[0083]

According to the present invention, it is possible to perform cleaning with higher purity than before.

[Brief description of the drawings]

FIG. 1 is a conceptual diagram showing an apparatus configuration of a wet processing apparatus according to an embodiment.

FIG. 2 is a front conceptual view showing a first tank of the wet processing apparatus according to the embodiment.

FIG. 3 is a conceptual front view showing a second tank of the wet processing apparatus according to the embodiment.

FIG. 4 is a conceptual front view showing a third tank of the wet processing apparatus according to the embodiment.

FIG. 5 is a conceptual front view showing a fourth tank of the wet processing apparatus according to the embodiment.

FIG. 6 is a conceptual front view showing a rotary cleaning device according to an embodiment.

FIG. 7 is a graph showing a cleaning result.

[Explanation of symbols]

101 first tank, 102 upper brush, 103 lower brush, 104 upper brush ultrasonic cleaning tank, 105 lower brush ultrasonic cleaning tank, 106, 107 ultrasonic oscillator, 108 ozone water outlet pipe, 109 ultrapure water outlet pipe, 110 Surfactant outlet pipe, 111 Electrolytic ion water / anode water outlet pipe, 112 Electrolytic ion water / cathode water outlet pipe, 113,114 Brush cleaning tank ultrapure water inlet pipe, 115 Workpiece (glass substrate) / Spin rotation With mechanism, 116 ozone water nozzle, 117 ultrapure water nozzle, 120 ultrapure water nozzle, 121 ozone water nozzle, 122-125 electrolytic ionic water nozzle 201 electrolytic ionic water high pressure jet outlet pipe, 202 ultrapure water Outlet piping, 203 Electrolytic ion water outflow piping, 204 Second tank, 206, 207, 208, 209 Water, static electricity removing pipe, 210, 211 high-pressure jet nozzle, 260 workpiece holding means, 270 ultrasonic oscillator, 280 nozzle, 290 cleaning liquid source, 301 ultrasonic cleaning tank, 302 ultrasonic tank, 303, 304 ultrasonic wave Oscillator, 305 Ultrasonic transmission liquid, 306 Treated water (electrolytic ion water, cathode water, anode water, ultrapure water), 307 Electrolytic ion water outlet pipe, 308 Ultrapure water outlet pipe, 309 Third tank, 310 Drainage Piping, 311 Workpiece vertical mechanism, 313 Ultrasonic transmission liquid outlet pipe, 401 Cleaning water supply pipe, 402 fourth tank, 403 Ultrasonic oscillator, 404 Ultrasonic application treated water outlet, 405 Ultra Clean N ₂ , 406 N ₂ temperature control for the heater, 407 treatment object spin drying mechanism holder portion 408 object to be treated rotary drying device axis Part, 410 ultrapure water outlet pipe, 411 electrolytic ion water, anode water, 412 to 416 treated water, antistatic pipe, 417 ozone water outlet alarm, 501 wet treatment equipment main body, 502 loader, 503 first tank, 504 second tank, 505 third tank, 506 fourth tank, 507 unloader, 508 electrolytic ionized water production equipment, 509 ozone water production equipment, 510 electrolytic ion supply piping, 511, 513 return piping from wet treatment equipment, 512 ozone water supply pipe, 600 rotary cleaning device, 601 cleaning water introduction pipe, 604 tank.

 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Kenichi Mimori 3-31 Meido, Izumi-ku, Sendai City, Miyagi Prefecture Inside Frontech Co., Ltd. (72) Inventor Yasuhiko Kasama 3-31, Meido, Izumi-ku, Sendai City, Miyagi Prefecture Address: Front Tech Co., Ltd. (72) Within the inventor Yoshire Kure 3-31, Meizudo, Izumi-ku, Sendai City, Miyagi Prefecture Address: 72 Co., Ltd. Front Tech Co., Ltd. (72) Tadahiro Omi 2-17, Yonegabukuro, Aoba-ku, Sendai City, Miyagi Prefecture -301 (72) Inventor Takayuki Imaoka 1-4-9 Kawagishi, Toda City, Saitama Prefecture Organo Corporation

Claims (8)

[Claims] A cleaning step using ozone water; a brush cleaning step using electrolytic ionic water; a high-pressure jet cleaning step using electrolytic ionic water; an ultrasonic cleaning step of irradiating the electrolytic ionic water with ultrasonic waves of 30 kHz or more; A wet processing method comprising: a cleaning step having at least one of the following cleaning steps: and a drying step. 2. An ozone water nozzle for supplying ozone water, an ultrapure water nozzle for supplying ultrapure water, an electrolytic ion water supply nozzle for supplying electrolytic ionic water, A first tank having at least a brush for brushing the processing object; an electrolytic ion water high-pressure jet nozzle for injecting high pressure electrolytic ion water to the processing object; and supplying ultrapure water to the processing object. A second tank having at least a nozzle for ultrapure water, a means for introducing electrolytic ionic water, and a means for irradiating the electrolytic ionic water with ultrasonic waves of 30 kHz or more. At least a third tank, a fourth tank having at least a nozzle into which electrolytic ionized water is introduced and capable of irradiating ultrasonic waves of 30 kHz or more, and a fifth tank for drying an object to be processed thing Wet treatment apparatus according to claim. 3. The wet processing apparatus according to claim 2, further comprising means for irradiating the brush with ultrasonic waves of 30 kHz or more to pure water or electrolytic ion water to clean the brush. 4. A structure in which at least one of the first to fourth tanks can be rinsed with pure water or electrolytic ionic water after a cleaning treatment in each tank. The wet processing apparatus according to claim 2 or 3, wherein 5. The apparatus according to claim 2, wherein a means for holding an object to be processed is rotatable in at least one of the first to fourth tanks. Item 6. The wet treatment device according to item 1. 6. The processing object is rotated at a rotation speed of 100 rpm or more, and the cleaning water to which an ultrasonic wave of 30 kHz or more is applied is sprayed or continuously dropped on the processing object to thereby reduce the processing object. A rotary cleaning method characterized by performing cleaning. 7. The rotary cleaning method according to claim 6, wherein said cleaning water is electrolytic ionized water. 8. A tank for cleaning an object to be processed, holding means for rotatably holding the object in the tank, and spraying or continuously dropping a cleaning liquid onto the object to be processed. A rotary cleaning device, comprising: a nozzle for performing cleaning; and an ultrasonic oscillator for applying ultrasonic waves to the cleaning liquid.