JPH10244455A - Glass substrate smoothing device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a glass substrate smoothing device capable of flattening a substrate efficiently by uniformly grinding the entire surfaces of a glass substrate having coat film such as color filter substrate and locally raising the grinding level for those protruded parts caused by waviness or foreign matter. SOLUTION: A glass substrate smoothing device comprises a grinding means 2 which grinds the surfaces of a glass substrate 1, a flexible stage 9 which fixedly supports the glass substrate 1, and a push up means 10 which partially push up the glass substrate 10 from the underside. Also the necessary protruded and nonuniformly coated parts in the glass substrate 1 located on the flexible stage 9 are raised from the underside so as to enable to selectively vary grinding level and sufficiently smoothen the parts in a specified processing time.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a glass substrate smoothing apparatus for polishing a glass substrate having a coating film such as a color filter substrate or the like due to undulations or foreign matters and flattening the same.

[0002]

2. Description of the Related Art In general, as a device for polishing projections due to undulations or foreign substances on a glass substrate having a coating film such as a color filter substrate, a stage for adsorbing and fixing the glass substrate and a polisher for polishing while pressing with flexibility. The polishing apparatus is configured to rotate one or both of the polisher and the glass substrate using an abrasive such as alumina, and a device for polishing the entire glass substrate, and directly polishing only the projections using a polishing tape. Devices are conventionally known.

[0003]

However, since the apparatus for polishing the entire glass substrate is a system for uniformly polishing the entire glass substrate, if there is a large projection on a part of the glass substrate, the projection is present. The part cannot be sufficiently polished. In addition, if the projections on the glass substrate are sufficiently polished, portions other than the projections may be polished more than necessary, resulting in secondary defects. On the other hand, an apparatus that uses a polishing tape directly to polish only the projections, inspects the projections in advance, and locally polishes the detected portions detected by the inspection, and treats them in proportion to the number of detected projections. There was a disadvantage that the ability changed.

[0004]

A glass substrate smoothing apparatus according to the present invention comprises a polishing means for polishing a glass substrate surface, a flexible stage for supporting the glass substrate, and a glass substrate from below via a flexible stage. It has a push-up means for locally pushing up, and a necessary portion in the glass substrate such as a projection or uneven coating is lifted from below and polished with respect to the glass substrate on the flexible stage. Thus, the polishing level can be changed, and the surface can be sufficiently smoothed in a certain processing time.

[0005]

DETAILED DESCRIPTION OF THE INVENTION According to the first aspect of the present invention, a polishing means for polishing a surface of a glass substrate, a flexible stage for supporting the glass substrate, and a glass substrate from below via the flexible stage. Since the device has push-up means for partially pushing up, a required portion of the glass substrate, such as a projection or uneven coating, is pushed up from below onto the glass substrate, which is a work on the flexible stage, to partially process the glass substrate. The level can be increased, and sufficient smoothing can be performed in a fixed processing time.

According to a third aspect of the present invention, there is provided a polishing means having a polishing head which is flexible and rotates while pressing, and a supply section for supplying an abrasive, as specified in the second aspect,
Since the XY coordinates are selected and the pushing means for pushing the glass substrate locally from below is provided, the polishing head is pressed and rotated with respect to the glass substrate which is a work on the flexible stage via an abrasive. In order to polish and smooth the entire glass substrate, especially when there are projections or uneven coating in the glass substrate, the position is specified by an XY coordinate by an inspection machine or the like, and only the coordinate position is part of the glass substrate from below. When the polishing head is polished up, the polishing head for polishing the entire surface increases the pressing force only at the coordinate position, increases the polishing level only at the glass substrate surface at the coordinate position, and increases the overall smoothness.

According to a fourth aspect of the present invention, there is provided a polishing head which is flexible and rotates while being pressed, and a push-up means for selecting an XY coordinate in synchronization with the polishing head and for locally pushing up the glass substrate from below. Accordingly, the polishing agent is supplied to the glass substrate, which is a work on the flexible stage, and the polishing head is pressed and rotated to polish and smooth the entire glass substrate. Therefore, especially when projections or uneven coating are present in the glass substrate, the position is specified by XY coordinates using an inspection machine or the like, and the polishing head that polishes the entire surface locally pushes the glass substrate only from the coordinate position from below. Thus, the pressing force is increased only at the coordinate position, the polishing level is increased only at the surface of the glass substrate at the coordinate position, and the overall smoothness is increased.

[0008]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the glass substrate smoothing apparatus of the present invention will be described below with reference to FIG. In FIG. 1, a flexible polishing head 3 as a polishing means 2 for polishing a surface of a glass substrate 1, which is a work such as a color filter substrate or a glass substrate, has a pulse motor 4 for each of the X axis and the Y axis. And the LM guide 5 so that the position can be controlled vertically and horizontally. The polishing head 3 is rotated by a motor 6 and is movable in the Z-axis direction by a pneumatic cylinder 7. The pressure changes the pressure for pressing the polishing head 3 against the glass substrate 1. The polishing level can be selected by adjusting the pressure, the rotation speed, and the discharge amount from the supply unit 8a that supplies the abrasive 8 in which the abrasive grains are dissolved in water. On the other hand, the flexible stage 9 made of flexible rubber has a thin groove formed on the surface thereof, and the glass substrate 1 is supported and fixed by vacuuming. Below the flexible stage 9, a push-up means 10 for locally pushing up the flexible stage 9 is provided. The push-up means 10 has a structure in which the position of the pulse motor 13 can be controlled vertically and horizontally in the X-axis and Y-axis by a pulse motor 11 and an LM guide 12. Are projected, and the flexible stage 9 is locally lifted.

With the above structure, the glass substrate 1 is vacuum-adsorbed to the flexible stage 9 and the polishing head 3 rotates while pressing the entire surface of the glass substrate 1 with the pneumatic cylinder 7 while controlling the XY coordinate position, and the abrasive 8 is supplied and polished.

On the other hand, as shown in FIG. 2, when the push-up head 15 pushes up the glass substrate 1 from below the flexible stage 9, the glass substrate 1 is locally projected, and the polishing pressure is increased accordingly, and the amount of the abrasive 8 is increased. Increase. That is, when there are projections or uneven coating in the glass substrate 1, the position is specified by an XY coordinate using an inspection machine or the like, the thrust head 15 is aligned with the position, and the glass substrate 1 is thrust locally from below. In the polishing head 3 for polishing the entire surface, the pressing force is increased only at the coordinate position, the polishing level is increased only at the surface of the glass substrate 1 at the coordinate position, and the overall smoothness is improved. Further, since the push-up means 10 can select an arbitrary position with respect to the XY coordinates,
For example, when there are a plurality of protrusions,
By aligning the push-up means 10 at the same position as the Y coordinate position and pushing up the push-up head 15, the polishing level is increased only at the portion where the protrusion is present, and the overall smoothness is increased. Further, when the glass substrate 1 has various thicknesses and different materials to be polished and smoothed, for example, the pushing-up amount of the pushing-up head 15 can be arbitrarily controlled by the pulse motor 13 and the screw mechanism 14, and an optimal polishing amount is set. You can do it.

[0011]

As described above, according to the glass substrate smoothing apparatus of the present invention, the coordinate position of the place where the glass substrate is to be polished, such as the size or protrusion to be polished, is specified in advance, and the coordinate position is adjusted. The pushing means and the polishing means of the polishing head are controlled, and the pushing amount of the pushing head can be arbitrarily controlled by a pulse motor and a screw mechanism.
Polishing can be performed efficiently with an optimum polishing amount, and the effect of increasing the smoothness of the glass substrate is obtained.

[Brief description of the drawings]

FIG. 1 is a configuration diagram showing one embodiment of a glass substrate smoothing device of the present invention.

FIG. 2 is an enlarged side view of a polished portion of the embodiment.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Glass substrate 2 Polishing means 3 Polishing head 4,11,13 Pulse motor 5,12 LM guide 7 Pneumatic cylinder 8 Abrasive 9 Flexible stage 10 Thrusting means 15 Thrusting head

Claims (4)

[Claims] 1. A flexible stage for supporting a glass substrate to be polished, push-up means for locally pushing up the flexible stage from below the flexible stage to push up a portion of the glass substrate to be polished, and A polishing means for polishing a portion of the glass substrate to be polished which is pushed up through the flexible stage. 2. A polishing head, comprising: a polishing head having flexibility and rotating while pressing a glass substrate surface;
2. The glass substrate smoothing device according to claim 1, further comprising a supply unit for supplying an abrasive to the polishing portion. 3. The glass substrate smoothing apparatus according to claim 1, wherein the polishing means and the push-up means can select XY coordinates and can be located opposite to each other. 4. The glass substrate smoothing device according to claim 1, wherein the pressing and rotating operation of the polishing head of the polishing means and the pushing-up operation of the pushing-up head of the pushing-up means are synchronized. apparatus.