JP3726405B2 - Glass substrate smoothing apparatus and substrate manufacturing method - Google Patents

Glass substrate smoothing apparatus and substrate manufacturing method Download PDF

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Publication number
JP3726405B2
JP3726405B2 JP6553297A JP6553297A JP3726405B2 JP 3726405 B2 JP3726405 B2 JP 3726405B2 JP 6553297 A JP6553297 A JP 6553297A JP 6553297 A JP6553297 A JP 6553297A JP 3726405 B2 JP3726405 B2 JP 3726405B2
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Japan
Prior art keywords
glass substrate
polishing
polished
pushing
flexible stage
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Expired - Fee Related
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JP6553297A
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Japanese (ja)
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JPH10244455A (en
Inventor
康夫 城戸内
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Panasonic Corp
Panasonic Holdings Corp
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Panasonic Corp
Matsushita Electric Industrial Co Ltd
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Priority to JP6553297A priority Critical patent/JP3726405B2/en
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  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Description

【0001】
【発明の属する技術分野】
本発明は、カラーフィルター基板等の塗布膜を有するガラス基板のうねりや異物による突起を研磨し、平坦にするガラス基板平滑化装置及び基板の製造方法に関する。
【0002】
【従来の技術】
一般に、カラーフィルター基板等の塗布膜を有するガラス基板のうねりや異物による突起を研磨する装置としては、ガラス基板を吸着固定するステージと、可撓性で押圧しながら研磨するポリッシャーとで構成され、アルミナ等の研磨剤を用いて、ポリッシャーとガラス基板との一方もしくは双方を回転して、ガラス基板全体を研磨する装置と、突起の部分にのみ直接研磨テープを用いて研磨する装置が従来より知られている。
【0003】
【発明が解決しようとする課題】
しかし、ガラス基板全体を研磨する装置は、ガラス基板全体を一様に研磨する方式であるため、ガラス基板の一部に大きな突起がある場合、その突起がある部分を充分研磨することができない。また、ガラス基板の突起を充分研磨するようにすると、突起以外の部分が必要以上に研磨され二次的な不良となることがあった。一方、突起の部分にのみ直接研磨テープを用いて研磨する装置では、あらかじめ突起を検査して、その検査によって検出した検出部分を局部的に研磨するもので、突起の検出数に比例して処理能力が変化する欠点があった。
【0004】
【課題を解決するための手段】
本発明のガラス基板平滑化装置及び基板の製造方法は、ガラス基板面を研磨する研磨手段と、ガラス基板を支持する可撓ステージと、ガラス基板を可撓ステージを介して下方から局部的に突き上げる突き上げ手段を有し、可撓ステージ上のガラス基板に対して、突起や塗布むら等のガラス基板内の必要部分を局部的に下方から持ち上げて研磨するようにしたものであるから、選択的に研磨レベルを変えることが可能となり、一定の処理時間で充分平滑化できるものである。
【0005】
【発明の実施の形態】
本発明の請求項1に記載の発明は、研磨するガラス基板を支持する可撓ステージと、前記ガラス基板の研磨すべき突起又は塗布むら部分の位置を特定する検査機と、前記可撓ステージの下方から可撓ステージを局部的に突き上げてガラス基板の研磨すべき突起又は塗布むら部分を局部的に突き上げる突き上げ手段と、前記突き上げ手段によって前記可撓ステージを介して押し上げられるガラス基板の研磨すべき突起又は塗布むら部分を研磨する研磨手段とを有する装置であるから、可撓ステージ上のワークであるガラス基板に対して、ガラス基板の突起又は塗布むら部分を局部的に下方から押し上げることで、部分的に加工レベルを上げることが可能となり、一定の処理時間で充分平滑化できるものである。
また、本発明の請求項2に記載の発明は、可撓ステージの上にガラス基板を支持し、前記可撓ステージの下方から前記可撓ステージを局部的に突き上げることにより前記ガラス基板の研磨すべき突起又は塗布むら部分を突き上げ、突き上げた前記突起又は塗布むら部分を研磨手段により研磨する研磨工程を備えたことを特徴とする基板の製造方法であるから、可撓ステージ上のワークであるガラス基板に対して、ガラス基板の突起又は塗布むら部分を局部的に下方から押し上げることで、部分的に加工レベルを上げることが可能となり、一定の処理時間で充分平滑化できるものである。
【0006】
請求項3に記載の発明は、請求項2に記載の発明において、前記研磨手段を移動し、前記研磨手段を前記可撓ステージを突き上げる突き上げ手段と相対向させて前記突起又は塗布むら部分を研磨するようにしたため、可撓ステージ上のワークであるガラス基板に対して、研磨剤を介して、ポリッシングヘッド(研磨手段)を押圧して回転させ、ガラス基板全体を研磨し平滑化させるもので、研磨すべき突起又は塗布むら部分の位置を検査機等によりXY座標で特定し、その座標位置のみガラス基板を下方から部分的に突き上げることで、全面を研磨するポリッシングヘッドが、その座標位置のみ押圧力を強くして、その座標位置のガラス基板表面のみ研磨レベルを高くし、全体の平滑度を高めるものである。
【0007】
請求項4に記載の発明は、請求項3に記載の発明において、研磨手段の押圧回転動作と突き上げ手段の突き上げヘッドの突き上げ動作とを同期させて前記突起又は塗布むら部分を研磨することから、可撓ステージ上のワークであるガラス基板に対して、研磨剤を供給して、ポリッシングヘッドを押圧して回転させ、ガラス基板全体を研磨し平滑化させることができる。従って研磨すべき突起又は塗布むら部分の位置を検査機等によりXY座標で特定し、全面を研磨するポリッシングヘッドが、その座標位置のみガラス基板を下方から局部的に突き上げることで、その座標位置のみ押圧力を強くして、その座標位置のガラス基板表面のみ研磨レベルを高くし、全体の平滑度を高めるものである。
【0008】
【実施例】
以下、本発明のガラス基板平滑化装置の一実施例を図1を用いて説明する。図1において、カラーフィルター基板やガラス基板等のワークであるガラス基板1に対して、その表面を研磨する研磨手段2として可撓性のポリッシングヘッド3は、X軸,Y軸それぞれにパルスモータ4とLMガイド5により縦横自在に位置制御できる構成になっている。前記ポリッシングヘッド3はモータ6により回転し、空気圧シリンダ7でZ軸方向に可動すると共に、その圧力により、ガラス基板1へポリッシングヘッド3を押しつける圧力を変化させる。その圧力と回転速度と、砥粒を水に溶かした研磨剤8を供給する供給部8aからの吐出量を加減することで、研磨レベルを選択できる構成である。一方、可撓性のゴムからなる可撓ステージ9は、その表面に細い溝が切られ、真空引きにすることでガラス基板1を支持固定する。前記可撓ステージ9の下方には、この可撓ステージ9を局部的に突き上げる突き上げ手段10を設けている。前記突き上げ手段10は、X軸,Y軸それぞれにパルスモータ11とLMガイド12により縦横自在に位置制御できる構成で、Z軸方向は、パルスモータ13の回転がネジ機構14を介して突き上げヘッド15を突出させ、可撓ステージ9を局部的に持ち上げるものである。
【0009】
以上の構成でガラス基板1は、可撓ステージ9に真空吸着され、ガラス基板1の全面をXY座標位置を制御しながら、ポリッシングヘッド3が空気圧シリンダ7で押しつけながら回転し、研磨剤8を供給して研磨する。
【0010】
一方、図2に示すようにガラス基板1は突き上げヘッド15が可撓ステージ9の下方から押し上げるとガラス基板1を局部的に突出し、そこだけ研磨圧力が高くなり、研磨剤8の量が増加する。すなわち、ガラス基板1内に突起や塗布むら等がある場合、その位置を検査機等によりXY座標で特定し、その位置に突き上げヘッド15を合わせ、ガラス基板1を下方から局部的に突き上げることで、全面を研磨するポリッシングヘッド3が、その座標位置のみ押圧力が強くなり、その座標位置のガラス基板1表面のみ研磨レベルを高くし、全体の平滑度を高めるものである。また、突き上げ手段10はXY座標に対して、任意の位置を選択できることより、突起が複数箇所ある場合等、ポリッシングヘッド3のXY座標位置と同位置に突き上げ手段10を合わせ、突き上げヘッド15を突き上げることで、突起のある箇所のみ研磨レベルを上げ、全体の平滑度を高めるものである。また、ガラス基板1は板厚が様々で、研磨して平滑化する材料も異なる場合等、突き上げヘッド15の突き上げ量はパルスモータ13とネジ機構14で任意に制御でき、最適な研磨量を設定できるものである。
【0011】
【発明の効果】
以上のように本発明のガラス基板平滑化装置及び基板の製造方法によれば、あらかじめガラス基板の研磨すべきサイズや突起等、部分的に強く研磨したい場所等の座標位置を特定し、それに合わせて、突き上げ手段とポリッシングヘッドの研磨手段を制御し、かつ突き上げヘッドの突き上げ量はパルスモータとネジ機構で任意に制御でき、最適な研磨量で効率よく研磨でき、ガラス基板の平滑度を高める効果がある。
【図面の簡単な説明】
【図1】 本発明のガラス基板平滑化装置の一実施例を示す構成図
【図2】 同実施例の研磨部分の拡大側面図
【符号の説明】
1 ガラス基板
2 研磨手段
3 ポリッシングヘッド
4,11,13 パルスモータ
5,12 LMガイド
7 空気圧シリンダ
8 研磨剤
9 可撓ステージ
10 突き上げ手段
15 突き上げヘッド
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a glass substrate smoothing apparatus and a substrate manufacturing method for polishing and flattening swells and protrusions caused by foreign matter on a glass substrate having a coating film such as a color filter substrate.
[0002]
[Prior art]
In general, as a device for polishing the undulation of a glass substrate having a coating film such as a color filter substrate and projections due to foreign matter, it is composed of a stage for adsorbing and fixing the glass substrate and a polisher that polishes while pressing with flexibility, An apparatus that polishes the entire glass substrate by rotating one or both of the polisher and the glass substrate using an abrasive such as alumina, and an apparatus that directly polishes only the projections using an abrasive tape are known. It has been.
[0003]
[Problems to be solved by the invention]
However, since the apparatus for polishing the entire glass substrate is a system that uniformly polishes the entire glass substrate, if there is a large protrusion on a part of the glass substrate, the part having the protrusion cannot be sufficiently polished. In addition, if the protrusions of the glass substrate are sufficiently polished, portions other than the protrusions may be polished more than necessary, resulting in secondary defects. On the other hand, in an apparatus that polishes directly on the protrusions using the polishing tape, the protrusions are inspected in advance, and the detected parts detected by the inspection are locally polished, and the process is proportional to the number of protrusions detected. There was a drawback that ability changed.
[0004]
[Means for Solving the Problems]
A glass substrate smoothing apparatus and a substrate manufacturing method according to the present invention include a polishing means for polishing a glass substrate surface, a flexible stage for supporting the glass substrate, and a glass substrate pushed up locally from below through the flexible stage. Since it has a push-up means, and the glass substrate on the flexible stage is made by locally lifting and polishing necessary portions in the glass substrate such as protrusions and coating unevenness from the lower side, The polishing level can be changed, and the polishing can be sufficiently smoothed in a fixed processing time.
[0005]
DETAILED DESCRIPTION OF THE INVENTION
According to a first aspect of the present invention, there is provided a flexible stage for supporting a glass substrate to be polished, an inspection machine for specifying a position of a projection or uneven coating portion to be polished on the glass substrate, and the flexible stage. A push-up means that pushes up the flexible stage locally from below and pushes up the projection or uneven coating portion of the glass substrate locally, and the glass substrate pushed up by the push-up means through the flexible stage should be polished Since it is a device having a polishing means for polishing the protrusion or uneven coating portion, by pushing up the protrusion or uneven coating portion of the glass substrate locally from below on the glass substrate which is a work on the flexible stage, The processing level can be partially increased, and smoothing can be sufficiently performed in a certain processing time.
According to a second aspect of the present invention, the glass substrate is polished by supporting the glass substrate on the flexible stage and locally pushing up the flexible stage from below the flexible stage. Glass that is a workpiece on a flexible stage, comprising a polishing step of pushing up the power protrusion or uneven coating portion and polishing the raised protrusion or uneven coating portion with a polishing means. By pushing up the protrusions or uneven coating portions of the glass substrate locally from below the substrate, it is possible to partially increase the processing level, and the substrate can be sufficiently smoothed in a certain processing time.
[0006]
According to a third aspect of the present invention, in the second aspect of the invention, the polishing means is moved, and the polishing means is opposed to a push-up means that pushes up the flexible stage to polish the protrusions or uneven coating portions. Because the glass substrate that is the work on the flexible stage is pressed against the glass substrate, the polishing head (polishing means) is pressed and rotated to polish and smooth the entire glass substrate. The position of the projection or uneven coating portion to be polished is specified with an XY coordinate by an inspection machine or the like, and the polishing head for polishing the entire surface pushes only the coordinate position by partially pushing up the glass substrate from below only at the coordinate position. The pressure is increased to increase the polishing level only on the surface of the glass substrate at the coordinate position, thereby improving the overall smoothness.
[0007]
The invention according to claim 4 is that, in the invention according to claim 3, the pressing rotation operation of the polishing means and the push-up operation of the push-up head of the push-up means are synchronized to polish the projection or the uneven application portion . An abrasive is supplied to the glass substrate which is a workpiece on the flexible stage, and the polishing head is pressed and rotated to polish and smooth the entire glass substrate. Accordingly, the position of the projection or uneven coating portion to be polished is specified by an XY coordinate by an inspection machine or the like, and the polishing head for polishing the entire surface pushes up the glass substrate locally only from the coordinate position, thereby only the coordinate position. The pressing force is increased to increase the polishing level only on the glass substrate surface at the coordinate position, thereby increasing the overall smoothness.
[0008]
【Example】
Hereinafter, an embodiment of the glass substrate smoothing apparatus of the present invention will be described with reference to FIG. In FIG. 1, a flexible polishing head 3 as a polishing means 2 for polishing the surface of a glass substrate 1 which is a work such as a color filter substrate or a glass substrate has a pulse motor 4 for each of the X axis and Y axis. The LM guide 5 can control the position vertically and horizontally. The polishing head 3 is rotated by a motor 6 and is moved in the Z-axis direction by a pneumatic cylinder 7, and the pressure for pressing the polishing head 3 against the glass substrate 1 is changed by the pressure. The polishing level can be selected by adjusting the pressure, the rotation speed, and the discharge amount from the supply unit 8a that supplies the abrasive 8 in which abrasive grains are dissolved in water. On the other hand, the flexible stage 9 made of flexible rubber has a thin groove cut on its surface, and supports and fixes the glass substrate 1 by evacuation. A push-up means 10 is provided below the flexible stage 9 to push up the flexible stage 9 locally. The push-up means 10 can be vertically and horizontally controlled by a pulse motor 11 and an LM guide 12 in each of the X axis and the Y axis. In the Z-axis direction, the push motor 15 rotates through the screw mechanism 14 through the screw mechanism 14. And the flexible stage 9 is locally lifted.
[0009]
With the above configuration, the glass substrate 1 is vacuum-sucked by the flexible stage 9, and the polishing head 3 rotates while pressing the pneumatic cylinder 7 while controlling the XY coordinate position over the entire surface of the glass substrate 1 to supply the polishing agent 8. And polish.
[0010]
On the other hand, as shown in FIG. 2, when the glass substrate 1 is pushed up from below the flexible stage 9 by the push-up head 15, the glass substrate 1 protrudes locally, and the polishing pressure increases accordingly, and the amount of the abrasive 8 increases. . That is, when there are protrusions or coating unevenness in the glass substrate 1, the position is specified by an XY coordinate by an inspection machine or the like, the head 15 is aligned with the position, and the glass substrate 1 is locally pushed up from below. The polishing head 3 for polishing the entire surface has a strong pressing force only at the coordinate position, and increases the polishing level only on the surface of the glass substrate 1 at the coordinate position, thereby improving the overall smoothness. Further, since the push-up means 10 can select an arbitrary position with respect to the XY coordinates, the push-up means 10 is matched to the same position as the XY coordinate position of the polishing head 3 and the push-up head 15 is pushed up when there are a plurality of protrusions. As a result, the polishing level is raised only at the locations where the protrusions are provided, and the overall smoothness is increased. Further, when the glass substrate 1 has various plate thicknesses and the materials to be polished and smoothed are different, the push-up amount of the push-up head 15 can be arbitrarily controlled by the pulse motor 13 and the screw mechanism 14, and an optimum polishing amount is set. It can be done.
[0011]
【The invention's effect】
As described above, according to the glass substrate smoothing apparatus and the substrate manufacturing method of the present invention, the coordinate position of the place where the glass substrate is to be polished strongly, such as the size or protrusion to be polished, is specified in advance and adjusted accordingly. The thrusting means and the polishing means of the polishing head can be controlled, and the thrusting amount of the thrusting head can be controlled arbitrarily with a pulse motor and screw mechanism, and it is possible to polish efficiently with the optimum polishing amount and to increase the smoothness of the glass substrate There is.
[Brief description of the drawings]
FIG. 1 is a block diagram showing an embodiment of a glass substrate smoothing apparatus of the present invention. FIG. 2 is an enlarged side view of a polished portion of the embodiment.
DESCRIPTION OF SYMBOLS 1 Glass substrate 2 Polishing means 3 Polishing head 4,11,13 Pulse motor 5,12 LM guide 7 Pneumatic cylinder 8 Abrasive agent 9 Flexible stage 10 Pushing means 15 Pushing head

Claims (4)

研磨するガラス基板を支持する可撓ステージと、前記ガラス基板の研磨すべき突起又は塗布むら部分の位置を特定する検査機と、前記可撓ステージの下方から可撓ステージを局部的に突き上げてガラス基板の研磨すべき突起又は塗布むら部分を局部的に突き上げる突き上げ手段と、前記突き上げ手段によって前記可撓ステージを介して押し上げられるガラス基板の研磨すべき突起又は塗布むら部分を研磨する研磨手段とを具備したことを特徴とするガラス基板平滑化装置。A flexible stage that supports the glass substrate to be polished, an inspection machine that identifies the position of the protrusion or uneven coating portion of the glass substrate to be polished, and the flexible stage is pushed up locally from below the flexible stage to make glass A pushing-up means for locally pushing up the protrusion or uneven coating portion of the substrate to be polished; and a polishing means for polishing the protrusion or uneven coating portion of the glass substrate that is pushed up by the pushing-up means through the flexible stage. A glass substrate smoothing apparatus comprising: 可撓ステージの上にガラス基板を支持し、前記可撓ステージの下方から前記可撓ステージを局部的に突き上げることにより前記ガラス基板の研磨すべき突起又は塗布むら部分を局部的に突き上げ、突き上げた前記突起又は塗布むら部分を研磨手段により研磨する研磨工程を備えたことを特徴とする基板の製造方法。  A glass substrate is supported on the flexible stage, and the projection to be polished or the uneven coating portion of the glass substrate is locally pushed up and pushed up by locally pushing up the flexible stage from below the flexible stage. A method for manufacturing a substrate, comprising: a polishing step of polishing the protrusion or the uneven coating portion by a polishing means. 前記研磨手段を移動し、前記研磨手段を前記可撓ステージを突き上げる突き上げ手段と相対向させて前記突起又は塗布むら部分を研磨することを特徴とする請求項2記載の基板の製造方法。  3. The method of manufacturing a substrate according to claim 2, wherein the polishing means is moved, and the protrusion or the uneven coating portion is polished by making the polishing means face the pushing-up means that pushes up the flexible stage. 前記研磨手段の押圧回転動作と突き上げ手段の突き上げヘッドの突き上げ動作とを同期させて前記突起又は塗布むら部分を研磨することを特徴とする請求項3記載の基板の製造方法。  4. The method for manufacturing a substrate according to claim 3, wherein the projection or the uneven coating portion is polished by synchronizing the pressing rotation operation of the polishing means and the pushing-up operation of the pushing-up head of the pushing-up means.
JP6553297A 1997-03-03 1997-03-03 Glass substrate smoothing apparatus and substrate manufacturing method Expired - Fee Related JP3726405B2 (en)

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JP6553297A JP3726405B2 (en) 1997-03-03 1997-03-03 Glass substrate smoothing apparatus and substrate manufacturing method

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JPH10244455A JPH10244455A (en) 1998-09-14
JP3726405B2 true JP3726405B2 (en) 2005-12-14

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