JPH1022425A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH1022425A
JPH1022425A JP19540496A JP19540496A JPH1022425A JP H1022425 A JPH1022425 A JP H1022425A JP 19540496 A JP19540496 A JP 19540496A JP 19540496 A JP19540496 A JP 19540496A JP H1022425 A JPH1022425 A JP H1022425A
Authority
JP
Japan
Prior art keywords
particles
copper
diode chip
invar
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19540496A
Other languages
Japanese (ja)
Inventor
Takaaki Yokoyama
隆昭 横山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanken Electric Co Ltd
Original Assignee
Sanken Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanken Electric Co Ltd filed Critical Sanken Electric Co Ltd
Priority to JP19540496A priority Critical patent/JPH1022425A/en
Publication of JPH1022425A publication Critical patent/JPH1022425A/en
Pending legal-status Critical Current

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  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To reduce deterioration due to heat cycle and improve heat dissipation characteristics by permitting a support body to contain nickel steel which has a small linear expansion coefficient in a shape of particles and providing a copper which has a high heat conductivity between the nickel steel particles. SOLUTION: A support board 1a, which is a mixed mold of copper particles 11 and Invar particles, is provided by rolling a mixed material of copper particles and Invar particles by a weight ratio of 1:1 into disc shape. Therefore, the linear expansion coefficient of the support body 1a becomes 10×10<-6> K<-1> , approximately at the middle of those of copper and Invar, which is a value close to that of silicon which constitutes a diode chip 2. Therefore, a semiconductor device which is less deteriorated clue to brazing material 3 and the heat cycle of a diode chip 2 is obtained. A heat conduction path due to the copper particles 11 is formed at the part under the diode chip 2 of the support body 1a, and heat generated by the diode chip 2 is efficiently discharged to the bottom side of the support board 1a.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、金属支持板に半導体素
子が固着された構造の整流ダイオード等の半導体装置に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device such as a rectifier diode having a structure in which a semiconductor element is fixed to a metal support plate.

【0002】[0002]

【従来の技術】整流ダイオードを図1に示すように構成
することがある。この図1において、銅から成る皿状金
属支持板1の一方の主面にシリコンダイオードチップ2
がろう材(半田)3で固着されており、ダイオードチッ
プ2の上面にはヘッダ部4を有する棒状リード部材5が
ろう材(半田)6で固着されている。支持板1の一方の
主面には、ダイオードチップ2及びヘッダ部4を含むよ
うにシリコンラバーから成る保護樹脂被覆体7が設けら
れている。
2. Description of the Related Art A rectifier diode is sometimes constructed as shown in FIG. In FIG. 1, a silicon diode chip 2 is provided on one main surface of a dish-shaped metal support plate 1 made of copper.
A bar-shaped lead member 5 having a header portion 4 is fixed to the upper surface of the diode chip 2 with a brazing material (solder) 6. On one main surface of the support plate 1, a protective resin coating 7 made of silicon rubber is provided so as to include the diode chip 2 and the header 4.

【0003】[0003]

【発明が解決しようとする課題】ところで、図1の半導
体装置に対してヒートサイクル(高温と低温の繰返し)
が多数回加えられると、ダイオードチップ2の電気的特
性が低下することがあった。これはヒートサイクルが反
復して加えられることによって、ダイオードチップ2と
支持板1の膨張係数差に起因して生ずる機械的応力がダ
イオードチップ2又はろう材3に加えられるためと考え
られる。この問題を解決する手段として、支持板1の膨
張係数をダイオードチップ2の膨張係数に近づけること
が考えられる。具体的には、支持板1を銅・インバー・
銅の3層構造とすることが考えられる。インバーはニッ
ケル鋼の1種であって、Fe 63.4%、Ni 36
%、Mn 0.4%、C 0.2%から成る。インバー
の線膨張係数は1.2×10-6-1であって銅の線膨張
係数16.2×10-6-1よりも小さく、シリコンの線
膨張係数4.1×10-6-1に近い値を有する。従っ
て、インバーを使用すると、機械的応力の低減を図るこ
とができる。しかし、インバーの熱伝導率は銅よりも低
いので、支持板1の放熱効果が損なわれる。
By the way, a heat cycle (repetition of high temperature and low temperature) is applied to the semiconductor device of FIG.
Is added many times, the electrical characteristics of the diode chip 2 may be degraded. It is considered that this is because the mechanical stress generated due to the difference in expansion coefficient between the diode chip 2 and the support plate 1 is applied to the diode chip 2 or the brazing material 3 by repeatedly applying the heat cycle. To solve this problem, it is conceivable to make the expansion coefficient of the support plate 1 close to that of the diode chip 2. Specifically, the support plate 1 is made of copper, invar,
A three-layer structure of copper is considered. Invar is a type of nickel steel and has 63.4% Fe and 36 Ni
%, Mn 0.4% and C 0.2%. The linear expansion coefficient of Invar is 1.2 × 10 −6 K −1 , which is smaller than the linear expansion coefficient of copper, 16.2 × 10 −6 K −1 , and the linear expansion coefficient of silicon is 4.1 × 10 −6. It has a value close to K -1 . Therefore, when Invar is used, mechanical stress can be reduced. However, since the thermal conductivity of Invar is lower than that of copper, the heat radiation effect of the support plate 1 is impaired.

【0004】そこで、本発明はヒートサイクルによる劣
化が少なく且つ放熱特性が優れている半導体装置を提供
することを目的とする。
Accordingly, an object of the present invention is to provide a semiconductor device which is less deteriorated by a heat cycle and has excellent heat radiation characteristics.

【0005】[0005]

【課題を解決するための手段】上記目的を達成するため
の本発明は、金属製の支持体と、前記支持体にろう材で
固着されたシリコン半導体素子とを備えた半導体装置に
おいて、前記支持体が、銅の粒子とニッケル鋼の粒子と
を圧延加工したものから成り、前記ニッケル鋼は銅より
もシリコンに近い線膨張係数を有し、且つ銅よりも低い
熱伝導率を有していることを特徴とする半導体装置に係
わるものである。
According to the present invention, there is provided a semiconductor device having a metal support and a silicon semiconductor element fixed to the support with a brazing material. The body is made by rolling copper particles and nickel steel particles, and the nickel steel has a linear expansion coefficient closer to silicon than copper, and has a lower thermal conductivity than copper. The present invention relates to a semiconductor device characterized by the above.

【0006】[0006]

【発明の作用及び効果】本発明においては、支持体に線
膨張係数の小さいニッケル鋼が粒子の形状で含まれ、ニ
ッケル鋼の粒子間に熱伝導率の高い銅が介在する。従っ
て、半導体素子で発生した熱は銅を通って支持体の一方
の主面から他方の主面に良好に放出される。また、シリ
コンに近い線膨張係数を有するニッケル鋼が支持体に含
まれているので、ヒートサイクルに基づく応力によるろ
う材及び半導体素子の劣化を防ぐことができる。
In the present invention, nickel steel having a small coefficient of linear expansion is contained in the form of particles in the support, and copper having high thermal conductivity is interposed between the particles of the nickel steel. Therefore, heat generated in the semiconductor element is satisfactorily released from one main surface of the support to the other main surface through the copper. Further, since the support contains nickel steel having a linear expansion coefficient close to that of silicon, it is possible to prevent the brazing material and the semiconductor element from deteriorating due to stress due to a heat cycle.

【0007】[0007]

【実施例】次に、図2を参照して本発明の実施例に係わ
る半導体装置(整流ダイオード)を説明する。図2の半
導体装置は、図1と同様に、支持体としての皿状金属支
持板1aと、この支持板1aの一方の主面の中央に半田
から成るろう材3で固着された半導体素子としてのシリ
コンダイオードチップ2と、このダイオードチップ2の
上面の電極(図示せず)にろう材6で固着されたヘッダ
部4を有する棒状リード5と、保護樹脂被覆体7とを備
えている。なお、ダイオードチップ2はpn接合を有す
るシリコン半導体基板とこの基板の上下の主面に形成さ
れた一対の電極とから成る。
Next, a semiconductor device (rectifier diode) according to an embodiment of the present invention will be described with reference to FIG. The semiconductor device of FIG. 2 has a dish-shaped metal support plate 1a as a support and a semiconductor element fixed to the center of one main surface of the support plate 1a with a brazing material 3 made of solder, similarly to FIG. , A bar-shaped lead 5 having a header portion 4 fixed to an electrode (not shown) on the upper surface of the diode chip 2 with a brazing material 6, and a protective resin coating 7. The diode chip 2 includes a silicon semiconductor substrate having a pn junction and a pair of electrodes formed on upper and lower main surfaces of the substrate.

【0008】図2の半導体装置は図1の従来の支持板1
と異なる構成の支持板1aを有し、その他は図1と実質
的に同一に構成されている。図2の支持板1aは、銅の
粒子とインバーの粒子とを重量比で1:1に混合したも
のを皿状に圧延加工したものから成り、図2に説明的に
示すように銅粒子11とインバー粒子12との混合成形
体である。銅粒子11及びインバー粒子12の平均粒径
(さしわたし寸法)は、ダイオードチップ2の熱を支持
板1aの一方の主面から他方の主面に良好に放出するた
めに平面形状が4角形のダイオードチップ2の1辺(最
も長い辺)の長さの1/4 以下(好ましくは1/6 以下)と
されている。
The semiconductor device shown in FIG. 2 is a conventional support plate 1 shown in FIG.
The configuration is substantially the same as that of FIG. The support plate 1a in FIG. 2 is made of a mixture of copper particles and invar particles mixed at a weight ratio of 1: 1 and rolled into a dish shape. As shown in FIG. And invar particles 12. The average particle size (measurement size) of the copper particles 11 and the invar particles 12 is such that the planar shape is quadrangular in order to satisfactorily release the heat of the diode chip 2 from one main surface of the support plate 1a to the other main surface. The length of one side (longest side) of the diode chip 2 is 1/4 or less (preferably 1/6 or less).

【0009】支持板1aは銅粒子11とインバー(ニッ
ケル鋼)粒子12との1:1の混合物であるので、その
線膨張係数は銅とインバーとのほぼ中間の10×10-6
-1であり、ダイオードチップ2を構成するシリコンに
近い値を有する。従って、ろう材3及びダイオードチッ
プ2のヒートサイクルによる劣化の少ない半導体装置を
提供することができる。また、支持板1aの一方の主面
と他方の主面との間に銅粒子11が互いに接触又は近接
するように配置されるので、支持板1aのダイオードチ
ップ2の下の部分に銅粒子11による熱伝導路が形成さ
れ、ダイオードチップ2で発生した熱が支持板1aの下
面側に良好に放出される。また、支持板1aを圧延加工
によって形成することによって銅の中にインバー粒子1
2を均一に分散させた成形体を容易に得ることができ、
銅の特長(高熱伝導率)とインバーの特長(低膨張率)
をバランス良く生かすことができる。従って、ヒートサ
イクルによる劣化が少ないにも拘らず、放熱性が良い半
導体装置を提供することができる。
Since the support plate 1a is a 1: 1 mixture of the copper particles 11 and the invar (nickel steel) particles 12, its linear expansion coefficient is approximately 10 × 10 −6, which is approximately intermediate between copper and invar.
K −1, which is close to the value of silicon constituting the diode chip 2. Therefore, it is possible to provide a semiconductor device in which the brazing material 3 and the diode chip 2 are less deteriorated by the heat cycle. Further, since the copper particles 11 are arranged between one main surface and the other main surface of the support plate 1a so as to be in contact with or close to each other, the copper particles 11 are provided on a portion of the support plate 1a below the diode chip 2. Is formed, and the heat generated in the diode chip 2 is satisfactorily released to the lower surface side of the support plate 1a. Further, by forming the support plate 1a by rolling, the invar particles 1 are contained in the copper.
2 can be easily obtained in a uniformly dispersed form,
Features of copper (high thermal conductivity) and features of invar (low expansion coefficient)
Can be utilized in a well-balanced manner. Therefore, it is possible to provide a semiconductor device with good heat dissipation despite little deterioration due to a heat cycle.

【0010】[0010]

【変形例】本発明は上述の実施例に限定されるものでな
く、例えば次の変形が可能なものである。 (1) 銅とインバーの重量比を例えば銅30〜80重
量%、インバー20〜70重量%の範囲で変えることが
できる。 (2) 支持板1aの圧延加工時に溶融しない範囲で加
熱することができる。 (3) 実施例のインバーは重量比でFe 63.4
%、Ni 36%、Mn0.4%、C 0.2%の組成
であるが、これに限ることなく、銅よりもシリコンに近
い線膨張係数が得られる範囲で組成を変えることができ
る。 (5) 高耐圧化のためにダイオードチップ2の側面を
傾斜面とすることができる。 (6) 整流ダイオードに限ることなく、サイリスタ等
の別の半導体装置にも本発明を適用することができる。 (7) 比較的大面積のセラミック基板又は銅基板(金
属基板)の上に本発明に従う平板状の銅とニッケル鋼の
圧延加工物(支持体)を配置し、この上に半導体チップ
を固着した構成にすることができる。
[Modifications] The present invention is not limited to the above-described embodiment, and for example, the following modifications are possible. (1) The weight ratio of copper to Invar can be changed, for example, in the range of 30 to 80% by weight of copper and 20 to 70% by weight of Invar. (2) The support plate 1a can be heated in a range that does not melt during rolling. (3) Invar of the example is Fe 63.4 in weight ratio.
%, Ni 36%, Mn 0.4%, and C 0.2%, but the composition is not limited to this, and the composition can be changed within a range where a linear expansion coefficient closer to that of silicon can be obtained than that of copper. (5) The side surface of the diode chip 2 can be an inclined surface to increase the breakdown voltage. (6) The present invention can be applied not only to the rectifier diode but also to another semiconductor device such as a thyristor. (7) A flat copper-nickel steel rolled product (support) according to the present invention is disposed on a relatively large-area ceramic substrate or copper substrate (metal substrate), and a semiconductor chip is fixed thereon. It can be configured.

【図面の簡単な説明】[Brief description of the drawings]

【図1】従来の半導体装置を示す断面図である。FIG. 1 is a cross-sectional view illustrating a conventional semiconductor device.

【図2】本発明の実施例の半導体装置を示す断面図であ
る。
FIG. 2 is a sectional view showing a semiconductor device according to an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1a 支持板 2 ダイオードチップ 12 インバー粒子 1a support plate 2 diode chip 12 invar particles

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 金属製の支持体と、前記支持体にろう材
で固着されたシリコン半導体素子とを備えた半導体装置
において、 前記支持体が、銅の粒子とニッケル鋼の粒子とを圧延加
工したものから成り、前記ニッケル鋼は銅よりもシリコ
ンに近い線膨張係数を有し、且つ銅よりも低い熱伝導率
を有していることを特徴とする半導体装置。
1. A semiconductor device comprising: a metal support; and a silicon semiconductor element fixed to the support with a brazing material, wherein the support is formed by rolling copper particles and nickel steel particles. Wherein the nickel steel has a linear expansion coefficient closer to that of silicon than copper and has a lower thermal conductivity than copper.
JP19540496A 1996-07-05 1996-07-05 Semiconductor device Pending JPH1022425A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19540496A JPH1022425A (en) 1996-07-05 1996-07-05 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19540496A JPH1022425A (en) 1996-07-05 1996-07-05 Semiconductor device

Publications (1)

Publication Number Publication Date
JPH1022425A true JPH1022425A (en) 1998-01-23

Family

ID=16340555

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19540496A Pending JPH1022425A (en) 1996-07-05 1996-07-05 Semiconductor device

Country Status (1)

Country Link
JP (1) JPH1022425A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9653411B1 (en) * 2015-12-18 2017-05-16 Intel Corporation Electronic package that includes fine powder coating

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9653411B1 (en) * 2015-12-18 2017-05-16 Intel Corporation Electronic package that includes fine powder coating

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