JPH10223594A - Substrate-treating device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate-treating device which can perform a substrate- treating work with high workability by eliminating the queuing time, when the treating procedure is to be changed. SOLUTION: When a substrate treatment is started, a recipe (treating procedure) stored on a magnetic disk 34 is copied to buffers 42 and 52. A master controller 40 and a tank controller 50 execute a prescribed substrate treatment by controlling a substrate-transporting robot TR and a tank controller BC in accordance with the content of the copied recipe. On the other hand, the content alteration of the recipe is permitted, after the recipe has been copied to the buffers 42 and 52 from the magnetic disk 34. The alteration is performed by using an editing means 60, and the content of the recipe stored on the magnetic disk 34 is changed. When the content of the recipe is changed, the content of the recipe copied to the buffers 42 and 52 is not changed, and the treatment following the unchanged content of the recipe is continued.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thin substrate (hereinafter simply referred to as "substrate") such as a semiconductor substrate, a liquid crystal glass substrate, a glass substrate for a photomask, and a substrate for an optical disk. The present invention relates to a substrate processing apparatus for performing a plurality of substrate processes according to the method.

[0002]

2. Description of the Related Art As is well known, as a substrate processing apparatus as described above, an immersion processing apparatus for performing processing by immersing a substrate in a processing liquid or a rotary processing apparatus for performing processing while rotating the substrate (for example, And various types such as a rotary developing apparatus and a rotary resist coating apparatus. In each of these apparatuses, a plurality of substrate processes are performed in accordance with a processing procedure created in advance (hereinafter, referred to as a “recipe”), and a desired process is achieved. For example, in an immersion treatment apparatus, a chemical treatment with a chemical solution and a cleaning treatment with pure water are performed according to a recipe prepared in advance, and a desired treatment is achieved. Hereinafter, an outline of processing control of an immersion processing apparatus which is an example of a conventional substrate processing apparatus will be described.

FIG. 7 is a functional block diagram schematically illustrating a control mechanism in a conventional substrate processing apparatus. 1, the control mechanism of the conventional substrate processing apparatus includes a main control unit 110, a master controller 120, a tank controller 130, and an editing unit 115. Here, the master controller 120 and the tank controller 130 are control units that control the transport and immersion processing of a set of a plurality of substrates (hereinafter, referred to as “lots”), and are storage units for storing recipes. Some RAM 12
1 and 131 are provided. The editing means 115 is a means for the operator to change the contents of the recipe in the RAMs 121 and 131.

FIG. 8 is a diagram for explaining the contents stored in the RAMs 121 and 131. As shown in FIG.
AM121, 131 have a plurality of recipes (here n)
Is stored, and in each recipe, a processing tank to be conveyed, processing conditions therein, and the like are sequentially described. Here, the reason why a plurality of recipes are stored is that the processing order and processing conditions may differ depending on the lot to be processed, and a plurality of patterns are prepared in advance.

In this conventional substrate processing apparatus, when processing is started, a recipe No. corresponding to a processing content to be performed on a lot to be processed is selected. Is transmitted from the main control unit 110 to the master controller 120 and the tank controller 130, and the received recipe No. among the plurality of recipes stored in the RAMs 121 and 131 is received. The processing is sequentially executed with reference to the recipe content corresponding to. For example, when processing is started for lot A, the recipe No. corresponding to the processing content to be performed on lot A is determined. 2 is transmitted, and the master controller 120 and the tank controller 130 that have received it transmit the recipe No. out of the plurality of recipes stored in the RAMs 121 and 131. The substrate processing is executed in accordance with the contents of 2. As shown, this recipe N
o. The processing content corresponding to 2 is first transported to the processing tank X and processed under predetermined conditions, then transported to the processing tank Y and processed under other conditions, and further, in the final step, This is a series of substrate processing contents for performing processing.

[0006] Further, not only one lot is processed, but usually a plurality of lots are processed simultaneously. Each of the lots has the recipe No. corresponding to the processing content in the same manner as described above. Is the main control unit 11
0 to the master controller 120 and the tank controller 130, and the recipe No. Is performed according to the recipe content corresponding to. Therefore, RAM1
21 and 131, along with a plurality of recipes, the recipe No. corresponding to the lot being processed. Is also stored. For example, as shown in FIG. 8A, three lots A, B, C
Are simultaneously processed, the recipe No. corresponding to each is processed. 2, 4, and x are stored in the RAMs 121 and 131, and these recipe Nos. Each lot is processed according to the recipe content corresponding to.

[0007]

However, there are cases where it is desired to change the contents of the above-mentioned recipe (for example, when it is desired to change the processing parameters). In some cases, such as when processing a substrate or using a new type of processing solution, it may be necessary to make frequent changes. In such a case, the operator of the apparatus uses the editing means 115 (see FIG. 7) to edit the RAM 12
The contents of the recipe stored in 1, 131 can be changed.

However, for example, when three lots A, B, and C are simultaneously processed as described above, the recipe No. Even if an attempt is made to change the content of the recipe No. 2, Since it is performed while referring to the contents of No. 2, it cannot be changed. If this is forcibly changed, the lot A will be processed according to the changed content during the processing, or the processing of the lot A will be interrupted on the way, and in any case, the lot A will be a defective lot.

Therefore, the recipe No. If it is desired to change the contents of No. 2, the change must be waited until the processing of the lot A being processed is finally completed, and the workability is reduced. In particular, when it is desired to make frequent changes as described above, the waiting time is increased and the workability is significantly reduced.

SUMMARY OF THE INVENTION In view of the above problems, an object of the present invention is to provide a substrate processing apparatus which eliminates a waiting time when it is desired to change a processing procedure and has high workability.

[0011]

According to a first aspect of the present invention, there is provided a substrate processing apparatus for processing a plurality of substrates in accordance with a predetermined processing procedure, wherein (a) storing the processing procedure in advance. A first storage unit to be stored; (b) a second storage unit in which the processing procedure is copied from the first storage unit; (c)
A processing unit that performs substrate processing according to the processing procedure copied to the second storage unit; and (d) a processing procedure editing unit that edits the processing procedure stored in the first storage unit. When performing the substrate processing, after the processing procedure is copied to the second storage unit, editing of the processing procedure stored in the first storage unit is permitted.

According to a second aspect of the present invention, in the substrate processing apparatus according to the first aspect of the present invention, the second storage unit includes a plurality of storage areas each of which can copy the processing procedure. When copying the processing procedure from one storage unit to the second storage unit, the processing procedure is copied to the storage area determined in a predetermined order.

According to a third aspect of the present invention, in the substrate processing apparatus according to the first aspect of the present invention, the second storage unit includes a plurality of storage areas each of which can copy the processing procedure. When copying the processing procedure from one storage unit to the second storage unit, the processing procedure is copied to a free area of the plurality of storage areas, and the processing unit follows the processing procedure copied to the free area. When the processing is completed, the area is released again.

[0014]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings, but before that, the principle of processing control used in this embodiment will be described using a model example. Here is an outline.

[0015]

[A: Principle of Processing Control Applied to Substrate Processing Apparatus According to the Present Invention] In an apparatus of an embodiment to be described later, a desktop computer as an upper controller and a tank controller and a master controller as lower controllers are provided as control units. Although the model-like example illustrated here is not applied as it is,
By understanding the principle with a simple example, an embodiment of the present invention described later will be easily understood.

FIG. 1 is a diagram showing the principle of processing control applied to the substrate processing apparatus according to the present invention. As shown,
The control unit CT includes an editing unit ED, a first storage unit M1,
The second storage unit M2 and the processing unit PS are electrically connected. The processing unit PS performs substrate processing according to a recipe created in advance, but normally, when processing is not being performed, the recipe is stored in the first storage unit M1. Then, when starting the substrate processing, the necessary recipe is copied from the first storage unit M1 to the second storage unit M2, and the processing unit PS refers to the recipe copied to the second storage unit M2 during processing. Perform substrate processing.

When it is necessary for the processing unit PS to change the recipe used for the substrate processing, the recipe is copied to the second storage unit M2, and then the operator uses the editing means ED. The change of the recipe content stored in the first storage unit M1 is allowed. At this time, the first storage unit M1 and the second storage unit M2 are controlled independently of each other, and even if the contents of the recipe stored in the first storage unit M1 are changed, The contents of the recipe copied to the storage unit M2 are maintained without being changed.

That is, since the recipe stored in the first storage unit M1 can be changed after the recipe is copied to the second storage unit M2, the recipe stored in the first storage unit M1 can be changed. Even if the content is changed, the content of the recipe copied to the second storage unit M2 is maintained without being changed. As a result, the operation of the processing unit PS that executes the substrate processing while referring to the contents of the recipe copied to the second storage unit M2 is not affected. Therefore, for example, as a recipe for another process to be performed after this process, changing the recipe used for this process to create a new recipe, or the like, changes the recipe. There is no need to wait, the waiting time when changing the recipe is eliminated, and the workability can be prevented from lowering.

The above is the principle of the processing control which is a feature of the present invention, and the substrate processing apparatus of the embodiment described below applies this principle.

[0020]

[B: Overall schematic configuration of the substrate processing apparatus according to the present invention] First, the overall configuration of the substrate processing apparatus according to the present invention will be described. FIG. 2 is a schematic front view showing an example of the substrate processing apparatus according to the present invention. The substrate processing apparatus 100 includes a substrate W
Is an immersion treatment device that performs treatment by immersing
Chemical tanks CB1, CB2 and washing tanks WB1, WB2, FR
, A drying unit SD, and a substrate transport robot T for transporting the substrate
R. Further, the substrate processing apparatus 100 includes, at both ends thereof, a loader section LD for mounting a cassette 20 storing unprocessed substrates W and an unloader section ULD for mounting a cassette 20 storing processed substrates W. Have. Further, the substrate processing apparatus 100 includes a control mechanism including the desktop computer 30 and means connected thereto. This control mechanism will be described later in detail.

The chemical tanks CB1 and CB2 are tanks capable of storing a chemical such as sulfuric acid, ammonia, hydrochloric acid, hydrofluoric acid, hydrogen peroxide or a mixture thereof, and are used for performing a surface chemical treatment on the substrate. It is a tank. In addition, washing tank WB
1, WB2 is a processing tank that contains pure water and cleans a chemical solution attached to the substrate W. The washing tank FR is also a washing tank containing pure water, and is mainly used for finish washing. Further, the drying unit SD is a processing unit that removes water droplets attached to the substrate W while rotating the substrate W, and dries.

The substrate transfer robot TR is movable in the horizontal and vertical directions, pays out unprocessed lots from the loader section LD, circulates and transfers the lots among the processing tanks according to a pre-made recipe, and processes the lots. This is a robot that transfers completed lots to the unloader unit ULD. The substrate transport robot TR includes a pair of openable and closable hands 11, and a plurality of grooves for holding the substrate W are provided in the hand 11 in parallel at a constant pitch (shown in the figure). (Omitted), lots are held by the plurality of grooves. This substrate transfer robot T
When the R receives the lot from the loader section LD, the pair of hands 11 of the substrate transport robot TR grips the lot raised from the cassette 20 by a holder (not shown) provided below the cassette 20. Will be When transferring the lot to the unloader unit ULD, the lot is transferred from the hand 11 to a holder (not shown), and the lot is stored in the cassette 20 by descending the holder. You. The example shown here is an apparatus of a type in which a lot is taken out from the cassette 20 and the lot is directly gripped and transported by the substrate transport robot TR. May be a so-called cassette transport type device for transporting the paper.

[0023]

[C: Control Mechanism of Substrate Processing Apparatus] Next, the substrate processing apparatus 1
The 00 control mechanism will be described. FIG. 3 is a functional block diagram for explaining a control mechanism of the substrate processing apparatus 100. A desktop computer 30 is incorporated in the substrate processing apparatus 100, and an operator gives instructions to the apparatus via the desktop computer 30 and sets recipe contents, that is, sets processing patterns and processing conditions. it can.

The desktop computer 30 has a main body CPU 31 and a read-only memory ROM.
32, a RAM 33 which is a readable and writable memory,
A magnetic disk 34 (first storage unit) for storing control software, data, recipes, and the like, and an input / output port 35 serving as an interface with an associated input / output device
And a network port 36 that is an interface with a device that directly controls the substrate processing apparatus 100, and a communication port 37 that communicates with a host computer or the like provided outside the substrate processing apparatus 100.

The display 38 and the keyboard 3 are connected to the desktop computer 30 via an input / output port 35.
9 are provided along with the editing means 60.
(Processing procedure editing means). While checking the display on the display 38, the operator can input commands and parameters from the keyboard 39 to give commands to the desktop computer 30 and edit / change the contents of the recipe stored in the magnetic disk 34. it can. The editing means 60 is not limited to the combination of the display 38 and the keyboard 39, but may be any means capable of inputting commands and parameters such as a touch panel.

The command input to the desktop computer 30 is processed based on processing software, and transmitted from the desktop computer 30 to the master controller 40 and the tank controller 50 via the network port 36 as necessary. Is done. The master controller 40 controls the operation of the substrate transport robot TR. Further, the tank controller 50 controls the tank control device BC to perform liquid injection and drainage to each processing tank. Note that the substrate transport robot TR and the bath controller BC correspond to a processing unit that performs substrate processing.

The master controller 40 and the tank controller 50 have RAMs 41 and 5 as memories, respectively.
1 and buffers 42 and 52. This RAM4
1 and 51 are the lot being processed and the buffer No. Are stored in the buffers 42 and 52 (second
The storage unit) is a memory in which the recipe is copied from the magnetic disk 34, and includes a plurality of buffer areas (storage areas). The substrate transport robot TR and the bath controller BC operate according to the recipe copied to the buffers 42 and 52, respectively, which will be described later in detail.

In this control mechanism, the desktop computer 30 is a high-order controller, and the master controller 40 and the tank controller 50 are positioned as low-order controllers that operate in response to commands from the high-order controller.

[0029]

[D: Substrate Processing Procedure in Substrate Processing Apparatus] A substrate processing procedure in the substrate processing apparatus 100 having the above-described configuration will be described.

FIG. 4 is a flowchart for explaining a substrate processing procedure in the substrate processing apparatus 100.

First, in a state before the substrate processing is started, a recipe prepared in advance is stored on the magnetic disk 34, and no recipe is stored in the buffers 42 and 52. Before starting the substrate processing, the buffer No. m is set to an initial value "1" (step S1). This setting is performed by the host controller (desktop computer 30).

Next, when the start of the substrate processing is instructed (step S2), the substrate processing is started for the lot.

When substrate processing is started for a certain lot, first, a recipe No. designated in advance for that lot is selected.
Recipe body (substantial part of the recipe and stored in the magnetic disk 34) and the buffer N at that time
o. Is transmitted from the upper controller to the lower controller (master controller 40 and tank controller 50) (step S3). Then, the lower controller that has received them receives the buffer No. that received the received recipe body. (Step S4). The situation at this time will be specifically described with reference to FIG.

FIG. 5 is a diagram for explaining how the recipe body is stored in the buffer area. FIG. 5 (a)
Is a lot name and a recipe No. designated for the lot.
And buffer No. The correlation is shown. For example, if lots A, B, and C are paid out in this order,
When the substrate processing is started for the recipe No. designated for the lot A, 2 and the buffer No. at that time. "M = 1" which is the initial value as the value of
Is transmitted from the upper controller to the lower controller. The lower controller receiving this receives the recipe No. stored in the magnetic disk 34 as shown in FIG.
2 are stored in the buffer Nos. 1 in the buffer area. In the above description, the buffer area is a storage area provided in the buffer 42 and the buffer 52, and has a capacity enough to store a recipe body. Buffer 4
2 and 52 are each composed of a plurality of buffer areas, the number of which is at least as large as the number of lots processed simultaneously by the substrate processing apparatus 100.

Returning to FIG. No. 1 in the buffer area. 2 are stored, that is, the buffers 42, 52
After the recipe body is copied to the buffer No. Is incremented by “1” (step S5), and the value is incremented by the buffer No. The maximum value of
In other words, when the number of buffer areas is exceeded,
1 "(step S6). At this time, the lower-level controller controls the operations of the substrate transport robot TR and the bath controller BC while referring to the recipe body stored in the buffer area of the buffer No. 1. (Step S7) Therefore, for the lot A, the substrate transport robot TR and the bath controller BC execute the processing according to the contents of the recipe No. 2 copied to the buffers 42 and 52.

FIG. FIG. 3 is a diagram showing a recipe body stored in one buffer area. Here, the recipe No. As shown in the drawing, in the first step, the immersion treatment for a treatment time t ₁ is performed in the chemical solution tank CB in accordance with a predetermined processing condition (for example, the temperature of the chemical solution), and then the water washing tank WB1 is stored. Immersion treatment for a treatment time t ₂ is performed, and finally the drying section SD
Drying the processing time t _k is in the contents to be performed in.

Returning to FIG. 4, finally, step S8
Then, it is determined whether or not the processing has been completed for all the lots. Here, for example, when paying out lot B, the process returns to step S2 again and returns to steps S3 to S3.
The processing up to step S7 is performed.

That is, when the substrate processing is started for the lot B, the recipe N
o. 4 and the buffer No. 4 previously incremented in step S5. Is transmitted from the upper controller to the lower controller.
The lower controller that has received this receives the recipe No. No. 4 for the recipe body. 2 in the buffer area. Then, the host controller sends the buffer No.
Of the buffer No. is incremented by “1”, and the lower controller The operations of the substrate transport robot TR and the bath controller BC are controlled with reference to the recipe body stored in the second buffer area.

Further, after that, when the substrate processing is started also for the lot C, the steps S3 to S3 are performed in the same manner as described above.
The processing up to step S7 is performed.

In the manner described above, the buffers 42, 52
Since each is composed of a plurality of buffer areas, it is possible to simultaneously process a plurality of lots (up to the maximum number of buffer areas).

[0041]

[E: Editing of Recipe] In the above, when it is necessary to change the contents of the recipe when the lower-level controller performs the substrate processing, the buffer 42, 5
After the recipe body has been copied to step 2, that is, after the processing of step S4 in FIG. 4 has been completed, editing of the contents of the recipe stored in the magnetic disk 34 is permitted. For example,
Recipe No. If you want to change some of the recipe body 2
The recipe No. 2 recipe bodies are magnetic disks 34
From buffer No. 1 is copied to the buffer area of the recipe No. 1 in the magnetic disk 34. Editing work of the second recipe body is allowed.

The editing operation of the recipe body is performed by the operator using the editing means 60 composed of the display 38 and the keyboard 39 as described above. At this time, the magnetic disk 34 and the buffers 42 and 52 are independent from each other, and even if the recipe body in the magnetic disk 34 is changed, the recipe bodies stored in the buffers 42 and 52 are not changed.

Therefore, the buffer No. The magnetic disk without affecting the operations of the substrate transport robot TR and the tank control device BC that execute the substrate processing according to the recipe body copied in the buffer area of No. 1, in other words, without affecting the processing for the lot A. 34
Recipe No. in Since the change of the recipe body of No. 2 is possible, the waiting time at the time of changing the recipe is eliminated, and the workability can be prevented from lowering.

Next, the recipe No. Similarly, when it is desired to partially change the recipe body of recipe No. 4. 4 from the magnetic disk 34 to the buffer no. After being copied to the buffer area No. 2, the recipe No. The editing work of the recipe body No. 4 is allowed.

It should be noted that recipes not processed are
For example, the recipe No. Editing of the recipe body No. 3 does not affect the lot being processed, and can be edited at any time.

[0046]

[Modifications] Although the embodiments of the present invention have been described above, the present invention is not limited to the above examples. For example, in the above embodiment, the buffer No. is used to determine the copy destination of the recipe body. Of the buffer No. is incremented by "1". Although the recipe body is copied according to the order described above, an empty buffer area may be searched at the start of processing, and the recipe body may be copied to the empty buffer area. Specifically, when there is a substrate processing start request, the lower controller searches for an empty area in the buffers 42 and 52,
Buffer No. of the empty area. To the host controller, and the host controller receives the buffer N
o. And the recipe No. specified in advance for the lot to be processed. Is transmitted to the lower-level controller. Subsequent processing is the same as that of the above-described embodiment, but after the processing of the lot is completed, the buffer No. in which the recipe body referred to in the processing of the lot is stored. , The recipe body is erased from the buffer area, and the buffer area is released.

In this way, there is no possibility that a new recipe body is overwritten on the buffer area in use, so that the number of buffer areas can be reduced even when a plurality of lots are processed simultaneously.

The storage unit is not limited to a combination of a magnetic disk and a buffer, but may be any known storage means such as a combination of an optical disk or a magneto-optical disk with a normal RAM.

Furthermore, the substrate processing apparatus 100 in the above embodiment is an immersion processing apparatus provided with a plurality of processing tanks, but is not limited thereto. In the case of a substrate processing apparatus that performs a plurality of processes according to a predetermined processing procedure, such as a type processing apparatus, the same effects as in the above embodiment can be obtained by including the configuration shown in FIG.

[0050]

As described above, according to the first aspect of the present invention, when the processing unit performs the substrate processing, after the processing procedure is copied to the second storage unit, it is stored in the first storage unit. Since the editing of the stored processing procedure is permitted, even if the processing procedure in the first storage unit is changed, the processing procedure copied to the second storage unit is not changed, and the operation of the processing unit is affected. This makes it possible to change the processing procedure in the first storage unit without any change, and as a result, there is no waiting time when the processing procedure is changed, and it is possible to prevent a reduction in workability.

According to the second aspect of the present invention, the second storage unit includes a plurality of storage areas each capable of copying a processing procedure, and the processing procedure is copied from the first storage unit to the second storage unit. In this case, since the processing procedure is copied to a storage area determined in a predetermined order, processing according to a plurality of processing procedures can be executed simultaneously.

According to the third aspect of the present invention, the second storage unit includes a plurality of storage areas each capable of copying a processing procedure, and the processing procedure is copied from the first storage unit to the second storage unit. When copying, copy to a free area of multiple storage areas,
When the processing unit ends the processing according to the processing procedure copied to the free area, the area is released again,
There is no possibility that another processing procedure is overwritten and copied to the used storage area, and the number of storage areas can be reduced even when processing according to a plurality of processing procedures is performed simultaneously.

[Brief description of the drawings]

FIG. 1 is a diagram showing the principle of processing control applied to a substrate processing apparatus according to the present invention.

FIG. 2 is a schematic front view showing an example of the substrate processing apparatus according to the present invention.

FIG. 3 is a functional block diagram for explaining a control mechanism of the substrate processing apparatus of FIG. 2;

FIG. 4 is a flowchart for explaining a substrate processing procedure in the substrate processing apparatus of FIG. 2;

FIG. 5 is a diagram for explaining how a recipe body is stored in a buffer area.

FIG. 6 is a diagram showing a recipe body stored in a buffer area.

FIG. 7 is a functional block diagram for explaining an outline of a control mechanism in a conventional substrate processing apparatus.

FIG. 8 is a diagram for explaining storage contents of a RAM in the conventional substrate processing apparatus of FIG. 7;

[Explanation of symbols]

 REFERENCE SIGNS LIST 30 desktop computer 34 magnetic disk 40 master controller 50 tank controller 42, 52 buffer 60 editing means 100 substrate processing apparatus TR substrate transport robot BC tank controller

Claims (3)

[Claims] 1. A substrate processing apparatus for performing a plurality of substrate processings according to a predetermined processing procedure, comprising: (a) a first storage unit for storing the processing procedures in advance; 2nd processing procedure is copied
A storage unit, (c) a processing unit that performs substrate processing according to the processing procedure copied to the second storage unit, and (d) a processing procedure editing unit that edits the processing procedure stored in the first storage unit. When the processing unit performs the substrate processing, after the processing procedure is copied to the second storage unit, editing of the processing procedure stored in the first storage unit is permitted. A substrate processing apparatus characterized by the above-mentioned. 2. The substrate processing apparatus according to claim 1, wherein the second storage unit includes a plurality of storage areas, each of which can copy the processing procedure, from the first storage unit to the second storage unit. When copying the processing procedure, the substrate processing apparatus copies the processing procedure to the storage area determined in a predetermined order. 3. The substrate processing apparatus according to claim 1, wherein the second storage unit includes a plurality of storage areas, each of which can copy the processing procedure, from the first storage unit to the second storage unit. When copying the processing procedure, the processing procedure is copied to an empty area of the plurality of storage areas, and when the processing unit ends the processing according to the processing procedure copied to the empty area, the area is re-written. A substrate processing apparatus characterized by releasing.