JPH10213897A - Mask protecting device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent deposition of foreign matters on a liner by laminating a spare liner to the liner with an adhesive material interposed. SOLUTION: A pellicle film 1 is stretched and adhered to one end face of a pellicle frame 2, while a liner 4 is adhered with an adhesive 3 applied on the other end face. Moreover, a release agent 5 and an adhesive 6 are applied on the liner 4 and then a spare liner 7 is adhered. Therefore, since the spare liner 7 is adhered to protect the liner 4, deposition of foreign matters such as dust is prevented. Even when foreign matters deposit on the liner 4, the foreign matters can be removed with the adhesive when the spare liner 7 is peeled off, which prevents deposition of foreign matters on the liner 4 and intrusion of foreign matters by the liner 4 when the pellicle is adhered to a mask. By forming the liner 4 and the spare liner 7 from a material which hardly causes electrostatic charges, deposition of foreign matters due to electrostatic charges can be prevented when the liners are peeled.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention aims to prevent foreign matter such as dust from adhering to a mask or a reticle (hereinafter, simply referred to as "mask") used in a photolithography process in an integrated circuit manufacturing process. The present invention relates to a mask protection device used in the above.

[0002]

2. Description of the Related Art In a photolithography process, when dust or the like adheres to a mask or the like, it is projected on a semiconductor wafer and tends to be defective. The mask protection device is used for the purpose of solving this problem and preventing foreign substances such as dust from adhering to a mask or the like. A pellicle frame having a size surrounding a mask pattern and a mask on one side end surface of the frame are used. It consists of a transparent thin film to be provided and an adhesive or adhesive tape attached to the other end surface of the frame, and a liner is attached to the adhesive or adhesive tape. Is peeled off and pasted.

[0003]

If foreign matter such as dust adheres to the surface of the liner, the foreign matter on the liner may come off and adhere to the mask when the liner is peeled off and attached to a mask or the like. is there. Therefore, a high degree of cleaning is required on the liner surface. Therefore, the liner itself is cleaned and inspected to remove foreign matter.However, foreign matter may not be completely removed, or new foreign matter may adhere after removing the foreign matter. When the protective device is attached to a mask or the like, it may be mixed on the mask or the like.

[0004] It is an object of the present invention to provide a mask protection device capable of preventing foreign matter from adhering to a liner.

[0005]

A mask protection device according to the present invention comprises a pellicle frame, a transparent thin film stretched on one end face of the frame, and an adhesive or an adhesive tape attached to the other end face of the frame. And a liner attached to a pressure-sensitive adhesive or a pressure-sensitive adhesive tape, wherein a spare liner is laminated on the liner, and a pressure-sensitive adhesive is interposed between the liners.

According to the mask protection device of the present invention, since the liner is covered with the spare liner, no foreign matter adheres. At the time of use, the spare liner is first peeled off in the clean room, and then the liner is peeled off immediately before sticking to a mask or the like, and the liner is sticked to a mask or the like. When the preliminary liner is peeled off, foreign matter adhering to the liner adheres to the adhesive and is removed.

It is desirable that the liner and the spare liner be made of a material that does not easily generate static electricity so that foreign substances are hardly attached thereto.

[0008]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows a cross section of a main part of a mask protection device according to the present invention. A pellicle frame 2 having a pellicle film 1 stretched on one end face is adhered to another end face. Agent 3
Is applied, and the liner 4 is adhered. A spare liner 7 is further adhered on the liner 4 via a release material 5 and an adhesive 6.

[0009]

According to the mask protection device of the present invention, since the spare liner is adhered and protected on the liner, no foreign matter such as dust adheres thereto, and the foreign matter adheres to the liner. Even when the extra liner is removed, it adheres to the adhesive and is removed.Therefore, there is no possibility that foreign matter will adhere to the liner. There is no.

When the liner and the spare liner are made of a material that does not easily generate static electricity, foreign substances due to the generation of static electricity are less likely to adhere when peeled off.

[Brief description of the drawings]

FIG. 1 is an enlarged sectional view of a main part of a mask protection device according to the present invention.

[Explanation of symbols]

 1. Pellicle film 2. Pellicle frame 3, 6. Adhesive 4. Liner 5. Release material 7. Spare liner

Claims (2)

[Claims] 1. A pellicle frame, a transparent thin film stretched on one end of the frame, an adhesive or an adhesive tape attached to the other end of the frame, and an adhesive or an adhesive tape attached to the adhesive. A mask protection device comprising: a liner; and a preliminary liner laminated on the liner, and an adhesive is interposed between the liners. 2. The mask protection device according to claim 1, wherein the liner and the spare liner are made of a material that does not easily generate static electricity.