JPH10209364A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH10209364A
JPH10209364A JP2216197A JP2216197A JPH10209364A JP H10209364 A JPH10209364 A JP H10209364A JP 2216197 A JP2216197 A JP 2216197A JP 2216197 A JP2216197 A JP 2216197A JP H10209364 A JPH10209364 A JP H10209364A
Authority
JP
Japan
Prior art keywords
integrated circuit
semiconductor device
layer
circuit element
circuit pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2216197A
Other languages
Japanese (ja)
Inventor
Katsufusa Fujita
勝房 藤田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui High Tec Inc
Original Assignee
Mitsui High Tec Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui High Tec Inc filed Critical Mitsui High Tec Inc
Priority to JP2216197A priority Critical patent/JPH10209364A/en
Publication of JPH10209364A publication Critical patent/JPH10209364A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To make a semiconductor device thin and improve the radiating function, by electrically inner-lead bonding inner connection pads to electrode pads on integrated circuit elements, and exposing the opposite surface of the circuit elements to the main surface through resin seals. SOLUTION: An inner connection terminal pad 14 at a first flat part 18 is protrudent to the cavity side to facilitate connecting the inner connection terminal pad 14 of a conductor lead 16 to an electrode pad 24 of an integrated circuit element 25 by the inner lead bonding. This allows a semiconductor device to be made thin. The opposite surface of the electric 25 to its main surface is exposed through a resin seal 26 to easily diffuse the heat produced in the element 25 to a heat diffusion plate of a wiring board 22, by bonding to the heat diffusion plate of the board 22 through a heat conductive adhesive 23, thereby improving the radiation performance.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、T・BGA型の半
導体装置に係る、特に、集積回路素子のボンデング・パ
ッドと外部配線基板とを電気的に接続するインターポー
ザとして、ポリイミドテープ基板の一方面に導体回路パ
ターン層、他面に導電プレーン層を設けた2層構造の導
体回路パターン層を備えた集積回路素子搭載基板を構成
部材とするT・BGA型の半導体装置の構造に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a T.BGA type semiconductor device, and more particularly, to one side of a polyimide tape substrate as an interposer for electrically connecting a bonding pad of an integrated circuit element to an external wiring substrate. And a T / BGA type semiconductor device comprising an integrated circuit element mounting substrate having a two-layered conductor circuit pattern layer provided with a conductor circuit pattern layer and a conductive plane layer on the other surface.

【0002】[0002]

【従来の技術】IC、LSI等の半導体装置は、外部配
線基板上の配線パッドに半田などを用いて接続されてい
る。近来、集積回路素子の微細化、高集積化及び小型化
に対応して、SBC法と指称される、半田ボール又はバ
ンプを用いて配線基板上の配線パッドに半導体装置を面
実装する方法が提案されている。この方法によれば、配
線基板上に半導体装置を位置決め載置した後、これを加
熱して半田ボール又はバンプをリフローすることにより
固着すればよく、半導体装置の面実装が容易なことか
ら、注目されている。
2. Description of the Related Art Semiconductor devices such as ICs and LSIs are connected to wiring pads on an external wiring board using solder or the like. In recent years, in response to miniaturization, high integration, and miniaturization of integrated circuit elements, a method of surface mounting a semiconductor device on a wiring pad on a wiring board using a solder ball or bump has been proposed, which is referred to as an SBC method. Have been. According to this method, after positioning and mounting the semiconductor device on the wiring board, the semiconductor device may be heated and fixed by reflowing the solder balls or bumps, and the surface mounting of the semiconductor device is easy. Have been.

【0003】ところが、近年、情報処理機器の高速化に
伴い、半導体装置の作動に超高周波を用いるようになっ
てきている。そのためポリイミド基板に微細な間隔で形
成された導体回路パターンの複数の導体リード(電送
路)を超高周波信号が電送される際に、隣接する前記導
体リードに信号が漏れてしまうクロストーク現象を生じ
るという問題があった。このような問題点を解決するた
めに、ポリイミドテープ基板の前記導体回路パターンの
反対面に、別体に形成された導電性部材の導電プレーン
(支持基板)を固着し、この導体回路パターンの所定の
導体リードと導電プレーンとを貫通孔を介して接続し、
放熱及び接地機能を有する半導体装置が提案されてい
る。
However, in recent years, with the increase in the speed of information processing equipment, ultra-high frequencies have been used for the operation of semiconductor devices. Therefore, when an ultrahigh-frequency signal is transmitted through a plurality of conductor leads (transmission paths) of a conductor circuit pattern formed at fine intervals on the polyimide substrate, a crosstalk phenomenon occurs in which a signal leaks to the adjacent conductor lead. There was a problem. In order to solve such a problem, a conductive plane (support substrate) of a separately formed conductive member is fixed to the opposite surface of the polyimide tape substrate from the conductive circuit pattern, and a predetermined surface of the conductive circuit pattern is fixed. Connect the conductor lead and the conductive plane through a through hole,
A semiconductor device having a heat radiation and a ground function has been proposed.

【0004】この方式の半導体装置は、プレス加工によ
り、別体に形成された略四辺形の凹部を設けた支持基板
とその片面側に、終端部(ワイヤボンデングエリア)が
前記集積回路素子搭載部の周縁に沿って配列された状態
で固着された導体回路パターンが形成された一層構造の
ポリイミドテープ基板とで構成の集積回路素子搭載基板
と、これに固着された集積回路素子と、前記導体回路パ
ターンのワイヤボンデング・エリアと集積回路素子の電
極パッドとを電気的に接続するボンデング・ワイヤとこ
れを被覆保護する樹脂封止部を備えた構成のものが一般
的である。
In a semiconductor device of this type, a supporting substrate provided with a substantially quadrangular concave portion formed separately by press working and a terminal portion (wire bonding area) on one side thereof are provided with the integrated circuit element mounted thereon. An integrated circuit element mounting board composed of a polyimide tape substrate having a one-layer structure on which a conductor circuit pattern fixedly arranged along the periphery of the portion is formed, an integrated circuit element fixed thereto, and the conductor In general, a structure including a bonding wire for electrically connecting a wire bonding area of a circuit pattern to an electrode pad of an integrated circuit element and a resin sealing portion for covering and protecting the bonding wire is generally used.

【0005】[0005]

【発明が解決しようとする課題】しかしながら上記の半
導体装置にあっては、前記導体回路パターンと集積回路
素子の電極パッドとの接続にワイヤ・ボンデング法を用
いた構成とされているので、半導体装置の厚みが厚くな
り、半導体装置の薄型化の要求に対応するに限界が生じ
るいう問題があった。
However, in the above-described semiconductor device, since the connection between the conductor circuit pattern and the electrode pad of the integrated circuit element is made using a wire bonding method, the semiconductor device is not used. However, there is a problem that the thickness of the semiconductor device becomes large, and there is a limit in meeting the demand for thinning of the semiconductor device.

【0006】本発明は、上記の実情に鑑みてなされたも
ので、半導体装置の薄型化及び放熱機能の向上の要求に
対応することができる信頼性の高い半導体装置を低コス
トで提供することを目的とする。
SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and has as its object to provide a low-cost semiconductor device having high reliability which can meet the demands for thinning the semiconductor device and improving the heat radiation function. Aim.

【0007】[0007]

【課題を解決するための手段】本発明は上記の目的を達
成する請求項1記載の半導体装置は、集積回路素子のボ
ンディング・パッドと外部配線基板とを電気的に接続す
るインターポーザとして、ポリイミドテープ基板の一方
の面に導体回路パターン層を、該ポリイミドテープ基板
の他の面に導電プレーン層を設けた3層構造とし、さら
に前記導体回路パターンと外部配線基板のパッドに接続
して電気的導通回路を形成する外部接続端子を設けた集
積回路素子搭載基板を構成部材とする半導体装置におい
て、前記集積回路素子搭載基板は第1の平坦部と第2の
平坦部とこれら連結する傾斜部とを有する円形皿状にデ
ィプレスされ、前記導体回路パターン層側に形成された
集積回路素子搭載キャビティと前記第1の平坦部に形成
され、前記キャビティ側に突出せしめた導体回路パター
ンの内部接続パッドの領域とを設けた構成とされてお
り、前記集積回路素子搭載基板の前記キャビティ内に前
記集積回路素子を弾性接着剤層を介して固着すると共
に、前記内部接続パッドと集積回路素子の電極パッドと
をインナーリード・ボンディングにより電気的に接続せ
しめられ、さらに少なくとも前記集積回路素子の主面の
反対面が樹脂封止部から露出せしめられた構成とするこ
とで達成される。
According to a first aspect of the present invention, there is provided a semiconductor device comprising a polyimide tape as an interposer for electrically connecting a bonding pad of an integrated circuit element to an external wiring board. A conductive circuit pattern layer is provided on one surface of the substrate, and a three-layer structure in which a conductive plane layer is provided on the other surface of the polyimide tape substrate. In a semiconductor device comprising an integrated circuit element mounting substrate provided with an external connection terminal for forming a circuit, the integrated circuit element mounting substrate includes a first flat portion, a second flat portion, and an inclined portion connecting the first flat portion and the second flat portion. The integrated circuit element mounting cavity formed on the conductive circuit pattern layer side and the first flat portion, wherein the cavity is formed. And a region of the internal connection pad of the conductor circuit pattern protruding toward the integrated circuit element, and the integrated circuit element is fixed in the cavity of the integrated circuit element mounting substrate via an elastic adhesive layer. A structure in which the internal connection pads and the electrode pads of the integrated circuit element are electrically connected by inner lead bonding, and at least a surface opposite to the main surface of the integrated circuit element is exposed from a resin sealing portion. Is achieved.

【0008】従って、上記の様に構成される請求項1記
載の半導体装置は、前記第1の平坦部の前記内部接続パ
ッド領域がキャビティ側に突出した構成とされているの
で、容易に前記内部接続パッドと集積回路素子の電極パ
ッドとをインナーリード・ボンデングにより接続するこ
とができる。その結果として半導体装置の薄型化が可能
となる。
Therefore, in the semiconductor device according to the first aspect of the present invention, since the internal connection pad region of the first flat portion is protruded toward the cavity, the internal device can be easily formed. The connection pad and the electrode pad of the integrated circuit element can be connected by inner lead bonding. As a result, the thickness of the semiconductor device can be reduced.

【0009】さらに、前記集積回路素子の主面の反対面
が樹脂封止部から露出せしめられた構成とされているの
で、配線基板の熱拡散プレートに熱伝導性接着剤を介し
て接合することにより、前記集積回路素子の発生する熱
を容易に配線基板の熱拡散プレートに熱拡散させること
ができる。その結果として放熱機能の向上が可能とな
る。
Further, since the surface opposite to the main surface of the integrated circuit element is configured to be exposed from the resin sealing portion, the integrated circuit element is bonded to the heat diffusion plate of the wiring board via a heat conductive adhesive. Thereby, the heat generated by the integrated circuit element can be easily diffused to the thermal diffusion plate of the wiring board. As a result, the heat dissipation function can be improved.

【0010】更に、前記集積回路素子を弾性を有する接
着剤層を用いて固着した構成としているので、前記集積
回路素子と前記基板との接合応力を緩衝する機能を有す
ることがことができる。その結果として半導体装置のク
ラック等の損傷や変形を防止することが可能となる。
Further, since the integrated circuit element is fixed by using an adhesive layer having elasticity, the integrated circuit element can have a function of buffering a bonding stress between the integrated circuit element and the substrate. As a result, damage and deformation such as cracks of the semiconductor device can be prevented.

【0011】また、請求項2記載の半導体装置は、請求
項1記載の半導体装置にあって、前記樹脂封止部はポッ
ティングモールド又はインジェクション・モールドによ
り、少なくとも前記第2の平坦面と同一平面となるよう
に封止用樹脂部材を充填した構成とすることによって達
成される。
According to a second aspect of the present invention, in the semiconductor device according to the first aspect, the resin sealing portion is at least flush with the second flat surface by potting molding or injection molding. This is achieved by a configuration in which the sealing resin member is filled.

【0012】従って、上記の様に構成される請求項2記
載の半導体装置は、封止用樹脂部材の充填にインジェク
ション・モールドを用いているので、封止樹脂の平坦度
が向上し、後工程の前記カバー・レジスト層を形成する
作業性を著しく向上させることができる。その結果とし
て製造コストの低減が可能となる。
Therefore, in the semiconductor device according to the second aspect of the present invention, since the injection molding is used for filling the sealing resin member, the flatness of the sealing resin is improved and the post-process is performed. The workability of forming the above cover / resist layer can be significantly improved. As a result, manufacturing costs can be reduced.

【0013】また、請求項3記載の半導体装置は、請求
項1及び2記載の半導体装置にあって、前記第2の平坦
面に形成された導体回路パターン層は、エリア・アレー
状に配置したビア・ホールを設けたドライフィルム・フ
ォトレジスト層又はシルク・スクリーン印刷により形成
されたカバー・レジスト層で被覆せしめられ、前記ビア
・ホールに露出した端子ランドに突出した半田ボール又
はバンプを備えた構成とすることによって達成される。
According to a third aspect of the present invention, in the semiconductor device of the first and second aspects, the conductive circuit pattern layer formed on the second flat surface is arranged in an area array. A structure provided with a solder ball or bump which is covered with a dry film photoresist layer provided with a via hole or a cover resist layer formed by silk screen printing and protrudes from a terminal land exposed in the via hole. Is achieved by:

【0014】従って、上記の様に構成される請求項3記
載の半導体装置は、導体回路パターン層をビア・ホール
を設けたカバー・レジスト層で被覆されているので、導
体回路パターン層を外部環境から保護することができ、
且つ半田ボール又はバンプの位置決めが容易に成り半田
ボール又はバンプを形成する作業性が著しく向上させる
ことができる。
Therefore, in the semiconductor device according to the third aspect of the present invention, since the conductor circuit pattern layer is covered with the cover resist layer provided with the via hole, the conductor circuit pattern layer is covered with the external environment. Can be protected from
In addition, the positioning of the solder balls or bumps is facilitated, and the workability of forming the solder balls or bumps can be significantly improved.

【0015】[0015]

【発明の実施の形態】続いて、添付した図面に基づき本
発明の実施の態様の一例について詳細に説明する。ここ
で、図1は本発明の実施の態様の一例に係る半導体装置
の構成を示す概要説明図、図1(a)は、本発明の実施
の態様の一例に係る半導体装置の導電プレーン層側を示
す平面図、図1(b)は、本発明の実施の態様の一例に
係る半導体装置の構成を示す断面図、図1(c)は、本
発明の実施の態様の一例に係る半導体装置の導体回路パ
ターン層側を示す平面図である。
Next, an example of an embodiment of the present invention will be described in detail with reference to the accompanying drawings. Here, FIG. 1 is a schematic explanatory view showing a configuration of a semiconductor device according to an example of the embodiment of the present invention, and FIG. 1A is a side of the conductive plane layer of the semiconductor device according to the example of the embodiment of the present invention. FIG. 1B is a cross-sectional view illustrating a configuration of a semiconductor device according to an embodiment of the present invention, and FIG. 1C is a semiconductor device according to an embodiment of the present invention. 3 is a plan view showing the conductor circuit pattern layer side of FIG.

【0016】本発明の実施の形態に係る請求項1〜3記
載の半導体装置100は、図1(a)、(b)、(c)
に示すように、ポリイミド系テープの絶縁体層10の両
面に金属薄板層11を圧着した3層構造のポリイミド系
テープ基板12からエッチングにより、前記絶縁体層1
0の一方面に、放熱・接地機能を有する導電プレーン層
13を、その他面に、一端部に内部接続端子パッド14
を設け、その他端部に外部接続端子ランド15を備えた
複数の導体リード16が配列された導体回路パターン1
7を有する。そして、その中央部に第1の平坦部18と
第2の平坦部19とこれらを連結する傾斜部20とを有
し、さらに少なくとも前記内部接続端子パッド14をキ
ャビティ側に突出せしめた円形皿状の集積回路素子搭載
キャビテイ21を備えた集積回路素子搭載基板22と、
これに弾性接着剤層23を介して固着すると共に、前記
導体リード16の内部接続端子パッド14と集積回路素
子の電極パッド24とをインナーリード・ボンディング
により接続して、電気的外部導通回路が形成された集積
回路素子25と、該集積回路素子25の主面の反対面側
を露出させるように前記キャビティ21内に封止樹脂の
一例であるシリコンを主成分とする封止用樹脂がインジ
ェクション・モールドにより充填された樹脂封止部26
と、外部接続端子ランド29を露出するビア・ホール2
8を設けたドライフィルム・フォトレジストで前記導体
回路パターン17を被覆した前記カバー・レジスト層2
7と、前記ビア・ホール28に露出した外部接続端子ラ
ンド29に接続し、前記カバー・レジスト層27側に突
出した外部接続端子29の一例である半田ボール30か
ら成る外部接続端子31とを具備する構成とされてい
る。
The semiconductor device 100 according to the first to third embodiments of the present invention is shown in FIGS. 1 (a), 1 (b) and 1 (c).
As shown in FIG. 2, the insulating layer 1 is etched from a polyimide tape substrate 12 having a three-layer structure in which a metal sheet layer 11 is pressed on both sides of an insulating layer 10 of a polyimide tape.
0, a conductive plane layer 13 having a heat dissipation / grounding function is provided on one surface, and an internal connection terminal pad 14 is provided on one end.
Circuit pattern 1 in which a plurality of conductor leads 16 having external connection terminal lands 15 at the other end are arranged.
Seven. In the center thereof, there is provided a first flat portion 18, a second flat portion 19, and an inclined portion 20 for connecting the first flat portion 18, the second flat portion 19, and at least the internal connection terminal pad 14 protruding toward the cavity. An integrated circuit element mounting substrate 22 having the integrated circuit element mounting cavity 21 of
It is fixed to this via an elastic adhesive layer 23, and the internal connection terminal pads 14 of the conductor leads 16 and the electrode pads 24 of the integrated circuit element are connected by inner lead bonding to form an electrical external conduction circuit. In the cavity 21, a sealing resin mainly composed of silicon, which is an example of a sealing resin, is injected into the cavity 21 so as to expose the opposite side of the main surface of the integrated circuit element 25. Resin sealing portion 26 filled by mold
And via hole 2 exposing external connection terminal land 29
Cover resist layer 2 covering the conductor circuit pattern 17 with a dry film photoresist provided with
7 and an external connection terminal 31 formed of a solder ball 30 which is an example of the external connection terminal 29 connected to the external connection terminal land 29 exposed in the via hole 28 and protruding toward the cover resist layer 27 side. It is configured to be.

【0017】ここで、ここで、少なくとも前記導体回路
層の表面に図示していないAuメッキの保護皮膜層を形
成してもよい。これによつて導体回路層及び導電プレン
層の耐食性を向上させると共に、内部接続端子と集積回
路素子の電極パッドの接続及び外部接続端子となる半田
ボールの接続が容易になる。さらに、ポリイミド系テー
プ基板は、Ni/ポリイミド系テープ/Ni、Al/ポ
リイミド系テープ/Al、Cu/ポリイミド系テープ/
Cu等の電気的、熱的伝導製のよい金属薄板からなる3
層構造の前記基板を用いることもできる。
Here, a protective coating layer of Au plating (not shown) may be formed on at least the surface of the conductor circuit layer. This improves the corrosion resistance of the conductive circuit layer and the conductive plane layer, and facilitates the connection between the internal connection terminal and the electrode pad of the integrated circuit element and the connection of the solder ball as the external connection terminal. Further, the polyimide-based tape substrate is made of Ni / polyimide-based tape / Ni, Al / polyimide-based tape / Al, Cu / polyimide-based tape /
3 made of a thin metal sheet made of electrical or thermal conductive material such as Cu
The above-mentioned substrate having a layer structure can also be used.

【0018】[0018]

【発明の効果】以上説明したように、本発明の半導体装
置は、集積回路素子搭載基板をCu又はAlなどの導電
性の金属薄板材を両面に圧着したポリイミド系テープ基
板から導電プレーン層/ポリイミド系テープ/導体回路
パターン層から成る3層構造とし、前記集積回路素子搭
載基板に前記集積回路素子をインナーリード・ボンディ
ング(ワイヤ・レス)により搭載された構成とされてい
るので、半導体装置の放熱性、電気特性(寄生電流の拡
散)の向上及び小型化、薄型化の要求に対応することが
できる。
As described above, according to the semiconductor device of the present invention, the integrated circuit element mounting substrate is formed from a polyimide-based tape substrate in which a conductive metal sheet material such as Cu or Al is press-bonded to both sides thereof, and a conductive plane layer / polyimide. The integrated circuit element is mounted on the integrated circuit element mounting substrate by inner lead bonding (wireless) because of a three-layer structure composed of a system tape / conductor circuit pattern layer. It is possible to meet the demands for improved performance and electrical characteristics (diffusion of parasitic current) and for reduction in size and thickness.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施の態様の一例に係る半導体装置の
導電プレーン層側を示す平面図である。
FIG. 1 is a plan view showing a conductive plane layer side of a semiconductor device according to an example of an embodiment of the present invention.

【図2】本発明の実施の態様の一例に係る半導体装置の
構成を示す断面図である。
FIG. 2 is a cross-sectional view illustrating a configuration of a semiconductor device according to an example of an embodiment of the present invention.

【図3】本発明の実施の態様の一例に係る半導体装置の
導体回路パターン層側を示す平面図である。
FIG. 3 is a plan view showing a conductor circuit pattern layer side of a semiconductor device according to an example of an embodiment of the present invention;

【符号の説明】[Explanation of symbols]

100 半導体装置 10 ポリイミド系テープの絶縁体層 11 金属薄板層 12 3層構造のポリイミド系テープ基板 13 導電プレーン層 14 内部接続端子パッド 15 外部接続端子ランド 16 導体リード 17 導体回路パターン 18 第1の平坦部 19 第2の平坦部 20 傾斜部 21 集積回路素子搭載キャビティ 22 集積回路素子搭載基板 23 弾性接着剤層 24 集積回路路素子の電極パッド 25 集積回路素子 26 樹脂封止部 27 カバー・レジスト層 28 ビア・ホール 29 半田ボール 30 外部接続端子 DESCRIPTION OF SYMBOLS 100 Semiconductor device 10 Insulator layer of polyimide tape 11 Thin metal plate layer 12 Polyimide tape substrate of three-layer structure 13 Conductive plane layer 14 Internal connection terminal pad 15 External connection terminal land 16 Conductor lead 17 Conductor circuit pattern 18 First flat Part 19 Second flat part 20 Inclined part 21 Integrated circuit element mounting cavity 22 Integrated circuit element mounting substrate 23 Elastic adhesive layer 24 Electrode pad of integrated circuit path element 25 Integrated circuit element 26 Resin sealing part 27 Cover / resist layer 28 Via hole 29 Solder ball 30 External connection terminal

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 集積回路素子のボンディング・パッドと
外部配線基板とを電気的に接続するインターポーザとし
て、ポリイミドテープ基板の一方の面に導体回路パター
ン層を、該ポリイミドテープ基板の他の面に導電プレー
ン層を設けた3層構造とし、さらに前記導体回路パター
ンと外部配線基板のパッドに接続して電気的導通回路を
形成する外部接続端子を設けた集積回路素子搭載基板を
構成部材とする半導体装置において、 前記集積回路素子搭載基板は第1の平坦部と第2の平坦
部とこれら連結する傾斜部とを有する円形皿状にディプ
レスされ、前記導体回路パターン層側に形成された集積
回路素子搭載キャビティと前記第1の平坦部に形成さ
れ、前記キャビティ側に突出せしめた導体回路パターン
の内部接続パッドの領域とを設けた構成とされており、 前記集積回路素子搭載基板の前記キャビティ内に前記集
積回路素子を弾性接着剤層を介して固着すると共に、前
記内部接続パッドと集積回路素子の電極パッドとをイン
ナーリード・ボンディングにより電気的に接続せしめら
れ、さらに少なくとも前記集積回路素子の主面の反対面
が樹脂封止部から露出せしめられた構成としたことを特
徴とする半導体装置。
A conductive circuit pattern layer on one surface of a polyimide tape substrate and a conductive circuit layer on another surface of the polyimide tape substrate as an interposer for electrically connecting a bonding pad of the integrated circuit element to an external wiring substrate. A semiconductor device comprising an integrated circuit element mounting board having a three-layer structure provided with a plane layer and further provided with external connection terminals for forming an electrically conductive circuit by connecting to the conductor circuit pattern and pads of an external wiring board. The integrated circuit device mounting substrate according to claim 1, wherein the integrated circuit device mounting substrate is depressed into a circular dish shape having a first flat portion, a second flat portion, and an inclined portion connecting the first flat portion and the second flat portion, and the integrated circuit device formed on the conductive circuit pattern layer side. A structure having a mounting cavity and a region of an internal connection pad of a conductive circuit pattern formed on the first flat portion and protruding toward the cavity. The integrated circuit element is fixed in the cavity of the integrated circuit element mounting substrate via an elastic adhesive layer, and the internal connection pads and the electrode pads of the integrated circuit element are connected by inner lead bonding. A semiconductor device electrically connected to the semiconductor device, wherein at least a surface opposite to a main surface of the integrated circuit element is exposed from a resin sealing portion.
【請求項2】 前記樹脂封止部は、ポッティングモール
ド又はインジェクション・モールドにより、少なくとも
前記第2の平坦面と同一平面となるように封止用樹脂部
材を充填した構成とされたことを特徴とする請求項1記
載の半導体装置。
2. The resin sealing portion is filled with a sealing resin member by potting molding or injection molding so as to be at least flush with the second flat surface. The semiconductor device according to claim 1, wherein:
【請求項3】 前記第2の平坦面に形成された導体回路
パターン層は、エリア・アレー状に配置したビア・ホー
ルを設けたドライフィルム・フォトレジスト層又はシル
ク・スクリーン印刷により形成されたカバー・レジスト
層で被覆せしめられ、前記ビア・ホールに露出した端子
ランドに突出した半田ボール又はバンプを備えた構成と
したことを特徴とする請求項1、2記載の半導体装置。
3. The conductor circuit pattern layer formed on the second flat surface is a dry film photoresist layer provided with via holes arranged in an area array or a cover formed by silk screen printing. 3. The semiconductor device according to claim 1, further comprising a solder ball or a bump which is covered with a resist layer and protrudes from a terminal land exposed to the via hole.
JP2216197A 1997-01-20 1997-01-20 Semiconductor device Pending JPH10209364A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2216197A JPH10209364A (en) 1997-01-20 1997-01-20 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2216197A JPH10209364A (en) 1997-01-20 1997-01-20 Semiconductor device

Publications (1)

Publication Number Publication Date
JPH10209364A true JPH10209364A (en) 1998-08-07

Family

ID=12075111

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2216197A Pending JPH10209364A (en) 1997-01-20 1997-01-20 Semiconductor device

Country Status (1)

Country Link
JP (1) JPH10209364A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1126632A (en) * 1997-07-02 1999-01-29 Hitachi Cable Ltd Bga type semiconductor device
EP4191643A1 (en) * 2021-12-02 2023-06-07 Nexperia B.V. Method of forming an interconnect metallisation by panel level packaging and the corresponding device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1126632A (en) * 1997-07-02 1999-01-29 Hitachi Cable Ltd Bga type semiconductor device
EP4191643A1 (en) * 2021-12-02 2023-06-07 Nexperia B.V. Method of forming an interconnect metallisation by panel level packaging and the corresponding device

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