JPH10209040A5 - - Google Patents

Info

Publication number
JPH10209040A5
JPH10209040A5 JP1997280574A JP28057497A JPH10209040A5 JP H10209040 A5 JPH10209040 A5 JP H10209040A5 JP 1997280574 A JP1997280574 A JP 1997280574A JP 28057497 A JP28057497 A JP 28057497A JP H10209040 A5 JPH10209040 A5 JP H10209040A5
Authority
JP
Japan
Prior art keywords
exposure apparatus
vacuum
chamber
substrate
core material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1997280574A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10209040A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP9280574A priority Critical patent/JPH10209040A/ja
Priority claimed from JP9280574A external-priority patent/JPH10209040A/ja
Priority to DE69711157T priority patent/DE69711157T2/de
Priority to EP97309445A priority patent/EP0844532B1/en
Priority to KR1019970062553A priority patent/KR19980042711A/ko
Publication of JPH10209040A publication Critical patent/JPH10209040A/ja
Priority to US09/907,763 priority patent/US6714278B2/en
Publication of JPH10209040A5 publication Critical patent/JPH10209040A5/ja
Pending legal-status Critical Current

Links

JP9280574A 1996-11-25 1997-10-14 露光装置 Pending JPH10209040A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP9280574A JPH10209040A (ja) 1996-11-25 1997-10-14 露光装置
DE69711157T DE69711157T2 (de) 1996-11-25 1997-11-24 Belichtungsapparat
EP97309445A EP0844532B1 (en) 1996-11-25 1997-11-24 Exposure apparatus
KR1019970062553A KR19980042711A (ko) 1996-11-25 1997-11-25 노광 장치
US09/907,763 US6714278B2 (en) 1996-11-25 2001-07-19 Exposure apparatus

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP31327596 1996-11-25
JP8-313275 1996-11-25
JP9280574A JPH10209040A (ja) 1996-11-25 1997-10-14 露光装置

Publications (2)

Publication Number Publication Date
JPH10209040A JPH10209040A (ja) 1998-08-07
JPH10209040A5 true JPH10209040A5 (cg-RX-API-DMAC7.html) 2005-06-30

Family

ID=26553831

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9280574A Pending JPH10209040A (ja) 1996-11-25 1997-10-14 露光装置

Country Status (4)

Country Link
EP (1) EP0844532B1 (cg-RX-API-DMAC7.html)
JP (1) JPH10209040A (cg-RX-API-DMAC7.html)
KR (1) KR19980042711A (cg-RX-API-DMAC7.html)
DE (1) DE69711157T2 (cg-RX-API-DMAC7.html)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU5529499A (en) * 1998-09-14 2000-04-03 Nikon Corporation Exposure apparatus and its manufacturing method, and device producing method
EP1124161A3 (en) * 2000-02-10 2004-01-07 ASML Netherlands B.V. Lithographic projection apparatus having a temperature controlled heat shield
TW588222B (en) * 2000-02-10 2004-05-21 Asml Netherlands Bv Cooling of voice coil motors in lithographic projection apparatus
US6630984B2 (en) 2000-08-03 2003-10-07 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
EP1178357A1 (en) * 2000-08-03 2002-02-06 Asm Lithography B.V. Lithographic apparatus
KR100689705B1 (ko) * 2001-05-04 2007-03-08 삼성전자주식회사 투영 렌즈 온도 조절 수단을 구비하는 노광장치
US6598283B2 (en) 2001-12-21 2003-07-29 Cabot Corporation Method of preparing aerogel-containing insulation article
EP1477850A1 (en) * 2003-05-13 2004-11-17 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1491955A1 (en) * 2003-06-27 2004-12-29 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
EP1510867A1 (en) 2003-08-29 2005-03-02 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7061579B2 (en) * 2003-11-13 2006-06-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US6977713B2 (en) * 2003-12-08 2005-12-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4614386B2 (ja) * 2005-02-04 2011-01-19 キヤノン株式会社 位置決め装置、露光装置およびそれを用いたデバイス製造方法
JP2006261273A (ja) * 2005-03-16 2006-09-28 Canon Inc チャンバおよびこれを用いた露光装置
NL1036433A1 (nl) * 2008-01-31 2009-08-03 Asml Netherlands Bv Lithographic apparatus, method and device manufacturing method.
NL1036596A1 (nl) * 2008-02-21 2009-08-24 Asml Holding Nv Re-flow and buffer system for immersion lithography.
CN101276150B (zh) * 2008-03-21 2010-06-02 上海微电子装备有限公司 一种步进重复曝光装置
NL2004453A (en) 2009-04-24 2010-10-26 Asml Netherlands Bv Lithographic apparatus having a substrate support with open cell plastic foam parts.
NL2005244A (en) * 2009-09-22 2011-03-23 Asml Netherlands Bv Support or table for lithographic apparatus, method of manufacturing such support or table and lithographic apparatus comprising such support or table.
JP6335480B2 (ja) * 2013-11-11 2018-05-30 キヤノン株式会社 露光装置、およびデバイスの製造方法
WO2015165639A1 (en) * 2014-04-30 2015-11-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP6400827B2 (ja) 2014-07-16 2018-10-03 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置およびデバイス製造方法
JP6467065B2 (ja) 2015-03-23 2019-02-06 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及びデバイス製造方法
JP7360308B2 (ja) * 2019-11-25 2023-10-12 キヤノン株式会社 露光装置、露光方法、および物品製造方法
CN112925175A (zh) * 2021-01-29 2021-06-08 深圳市大族数控科技股份有限公司 一种曝光机

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58119638A (ja) * 1982-01-08 1983-07-16 Seiko Epson Corp 露光装置
US4564284A (en) * 1983-09-12 1986-01-14 Canon Kabushiki Kaisha Semiconductor exposure apparatus
JPS62296135A (ja) * 1986-06-17 1987-12-23 Nec Kyushu Ltd 縮小投影型露光装置
JP2794587B2 (ja) * 1989-01-30 1998-09-10 株式会社ニコン 投影露光装置
US4989031A (en) * 1990-01-29 1991-01-29 Nikon Corporation Projection exposure apparatus
JP2753930B2 (ja) * 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
US5376449A (en) * 1993-07-09 1994-12-27 Martin Marietta Energy Systems, Inc. Silica powders for powder evacuated thermal insulating panel and method
US5601897A (en) * 1994-10-17 1997-02-11 Owens-Corning Fiberglass Technology Inc. Vacuum insulation panel having carbonized asphalt coated glass fiber filler
JP3506158B2 (ja) * 1995-04-14 2004-03-15 株式会社ニコン 露光装置及び走査型露光装置、並びに走査露光方法

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