JPH10146560A - Liquid supply device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To simplify the replenishment of a pressure tank with liquid by connecting piping for introducing pressurized gas and piping for vacuum with a tank for supplying liquid, installing piping for replenishment to reach one end near the bottom part of a tank for replenishment, and installing piping for discharge to reach one end near the bottom part in the tank for supplying liquid. SOLUTION: Each piping is opened/closed by control valves 150-153 respectively, and piping 134 for introducing pressurized gas and piping 136 for pressure reduction are connected with a tank 110 for supplying liquid on its upside not to contact treating liquid in the tank 110. Piping for replenishment 132 is installed so that one end of the piping reaches the vicinities of the bottom part 124 of a tank 120 for replenishment and of the bottom part 114 of the tank 110 respectively, and piping 130 for discharge is installed so that its one end reaches the vicinity of the bottom part of the tank 110. In this way, the tank 110, a pressure tank, can be replenished with liquid simply without manual operation.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid supply tank for discharging a liquid under pressure, and more particularly to a liquid supply tank used in a liquid spraying device used for fine processing such as a photomask. The present invention relates to a liquid supply tank for supplying a liquid that can easily replenish the liquid and generates low dust.

[0002]

2. Description of the Related Art In recent years, various LSIs represented by ASICs have been required to have higher integration and higher functions due to the trend toward higher performance and lighter and smaller electronic devices. In general, an LSI such as the above-mentioned ASIC produces a pattern for a photomask pattern through a function, a logic design, a circuit design, a layout design, and the like, and then produces a photomask using the pattern. It is manufactured through a long process of transferring a semiconductor device by a reduced projection exposure and performing a semiconductor device manufacturing process. However, as the integration and function of LSIs become higher, the pattern of the photomask becomes finer and the accuracy becomes higher. Is becoming required.

Incidentally, a photomask is generally manufactured as shown in FIG. That is, a light-shielding layer 520 mainly composed of chromium, molybdenum, or the like is formed on substantially the entire surface of a glass substrate 510 of quartz or the like (FIG. 5A), and a g-line (436 nm) or an i-line (365 nm) )
A resist 530 sensitive to ionizing radiation 540 such as ultraviolet rays or an electron beam is applied (FIG. 5B), and g-line or i-line is applied.
The resist 530 is selectively exposed using ionizing radiation 540 such as an electron beam or an electron beam to form a latent image having a desired pattern (FIG. 5C), and developed to form a resist pattern 531 having a desired shape. After obtaining (FIG. 5D), if necessary, a descum treatment is performed, a baking treatment is performed, and etching is performed using the resist pattern 531 as a corrosion-resistant film to form a light-shielding layer pattern 521 composed of a light-shielding layer 520 ( 5E, the resist pattern 531 is removed, a cleaning process and the like are performed, and a photomask 500 is manufactured. (FIG. 5 (f))

The developing process shown in FIG. 5 is performed by spraying a developing solution and a rinsing solution onto a resist surface from a spray (nozzle) while rotating a substrate when forming a resist pattern. Is performed by spraying an etchant and a rinsing liquid from a spray (nozzle) onto the light-shielding layer surface while rotating the substrate when forming the light-shielding layer pattern. ). In these wet treatments, as shown in FIG. 3, a treatment liquid 380 is supplied under pressure using a liquid supply tank 390, and is injected from a nozzle (spray) 310 through an on-off valve (control valve) 330. Injection device 300 was used. In FIG. 3, 32
0, 320A, 322 are piping, 350 is a processing tank, 360
Is a substrate holder, 370 is a photomask substrate, 380 is a processing liquid, and 390 is a liquid supply tank. The photomask substrate 370 is processed while rotating while being fixed to the substrate holder 360. Then, the on-off valve (control valve) 330
Is usually controlled by a microcomputer such as a sequencer, and the injection of the processing liquid 380 is stopped via an electromagnetic valve which opens and closes in response to a command from the microcomputer or an air valve which opens and closes using air pressure. Had control.

As described above, in a liquid ejecting apparatus for performing a wet process used for fine processing of a photomask or the like, as shown in FIG. 3, the processing liquid is supplied to a liquid supply tank 390 by applying pressure to the liquid supply tank 390. I was doing it. However, as shown in FIG. 4, the liquid supply device 400 having the liquid supply tank 390 (410 in FIG. 4) for supplying the processing liquid supplies the processing liquid 470 directly from the canopy 411 by the operator. The control valve 455 is switched to the pressure reducing side, and after the inside of the tank is brought to the atmospheric pressure state, the canopy 412 is opened.
Was opened and replenished directly from the replenishing tank 420 or using a manual pump or funnel. The control valve 455 in FIG. 4 is called a three-way valve, and the three-way valve (control valve) 455 is connected to the pressure reducing pipe 43 when the pressurized gas introducing pipe 434 is connected to the connecting pipe 438.
6 is a pressurized gas introduction pipe 434 and a connection pipe 43
In the case where control is performed so as not to conduct with the side 8 and the pressure reducing pipe 436 is connected to the connecting pipe 438, the pressurized gas introducing pipe 434 is connected to the depressurizing pipe 436 and the connecting pipe 4.
This is controlled so as not to conduct with the 38 side.

[0006]

As described above, in the case of the liquid supply device 400 shown in FIG. 4, it is necessary to open the canopy 412 each time the processing liquid 470 is replenished, which is troublesome, and the canopy 412 is screwed. In the case of using for a long time, the screw portion will be worn out and shavings will be mixed in the tank when used for a long time, and the processing solution may be contaminated. Since the processing liquid in the photomask manufacturing process shown in FIG. 5 requires a high degree of cleanliness, contamination of the processing liquid becomes a serious problem. Further, in the case of the liquid supply device 400 shown in FIG. 4, when the processing liquid 470 is replenished manually, there is a concern that the processing liquid may be contaminated on a human body, and thus there is a problem in the working environment. Under such circumstances, the present invention is a liquid supply device for discharging liquid by pressurization, which is used in a liquid spraying device or the like used for photomask fine processing, in which a liquid is supplied into a pressurized tank. An object of the present invention is to provide a liquid supply device which can be easily refilled without manual operation and has low dust generation.

[0007]

According to the present invention, there is provided a liquid supply apparatus comprising: a liquid supply tank for supplying a liquid by discharging a liquid in the tank by pressurization; and a liquid supply tank for replenishing the liquid in the liquid supply tank. A tank for refilling, a tank for liquid supply and a tank for replenishment are connected, a replenishment pipe for replenishing the liquid in the tank for liquid supply, and a pipe for discharging the liquid in the tank for liquid supply A discharge pipe, a pressurized gas introducing pipe for introducing a pressurized gas (compressed gas) into the liquid supply tank for discharging a liquid in the liquid supply tank through the discharge pipe by pressurization, A decompression pipe for depressurizing the inside of the liquid supply tank by evacuation is provided.Each pipe is opened and closed by a control valve, and the pressurized gas introduction pipe and the decompression pipe are independent or shared. To the liquid supply tank via one connecting pipe The replenishing pipe is provided such that one end thereof reaches near the bottom of the replenishing tank, and the discharge pipe is provided such that one end thereof reaches near the bottom of the liquid supply tank. It is characterized by having. Then, after closing the control valve of the pressure reducing pipe, the control valve of the pressurized gas introducing pipe is opened, and the inside of the liquid supply tank is pressurized through the pressurized gas introducing pipe. After closing the control valve, the control valve of the pressure reducing pipe is opened, and the pressure in the liquid supply tank is reduced by exhausting the gas through the pressure reducing pipe. Further, the inside of the replenishing tank is maintained at atmospheric pressure. Further, the pressure reducing pipe for reducing the pressure in the liquid supply tank by evacuation in the above is characterized in that the pressure is reduced using an aspirator, and the pressure is reduced using an air pump. Wherein the pressure is reduced using a vacuum pump. Further, in the above, the pressurized gas introduction pipe,
The pressure reducing pipe is connected to the liquid supply tank via one shared pipe, and the pressurized gas introduction pipe, the reduced pressure pipe, and the shared one connecting pipe are controlled by one three-way valve. It is characterized by being a thing.

[0008]

According to the liquid supply apparatus of the present invention, a liquid supply tank for discharging a liquid by pressurization, which is used in a liquid spraying apparatus used for fine processing of a photomask or the like, is provided. It is a liquid supply device, which makes it possible to provide a liquid supply device which can easily replenish the liquid in the liquid supply tank without manual operation and has low dust generation. Specifically, a liquid supply tank that supplies the liquid by discharging the liquid in the tank by pressurization, a replenishment tank that stores a liquid to be replenished into the liquid supply tank, and a liquid supply tank And a replenishing tank for replenishing the liquid into the liquid supply tank, a discharge pipe for discharging the liquid in the liquid supply tank, and a liquid in the liquid supply tank. A pressurized gas introduction pipe for introducing a pressurized gas (compressed gas) for discharging by pressurization through a discharge pipe into the liquid supply tank, and a decompression for reducing the pressure in the liquid supply tank by exhaustion. Each of the pipes is opened and closed by a control valve, and the pressurized gas introducing pipe and the depressurizing pipe are used for supplying the liquid independently or through a single connecting pipe. Connected to the tank,
The replenishing pipe is provided such that one end thereof reaches near the bottom of the replenishing tank, and the discharge pipe is provided such that one end thereof reaches near the bottom of the liquid supply tank. Have achieved. More specifically, after closing the control valve of the pressure reducing pipe, open the control valve of the pressurized gas introducing pipe, pressurize the inside of the liquid supply tank through the pressurized gas introducing pipe, and pressurize the pressurized gas. After closing the control valve of the introduction pipe, the control valve of the pressure reduction pipe is opened, and the pressure in the liquid supply tank is reduced by exhausting the gas through the pressure reduction pipe. This is achieved by being preserved. Further, the pressure reducing pipe for reducing the pressure in the liquid supply tank by exhausting the gas is reduced by using an aspirator, an air pump or a vacuum pump, so that the liquid (treatment liquid) without the tank is brought into contact with the outside air. It can be replenished without the need. And the piping for pressurized gas introduction, the piping for decompression,
It is connected to the tank for liquid supply via one pipe that has also been used.
One connection pipe is controlled by one three-way valve, so that the entire apparatus can be made compact.

[0009]

DESCRIPTION OF THE PREFERRED EMBODIMENTS A liquid supply apparatus according to the present invention will be described with reference to the drawings. FIG. 1 is a view showing an embodiment of a liquid supply device according to the present invention. In FIG. 1, 100 and 100A are liquid supply devices, 110 is a processing liquid supply tank (also called a pressurized tank), 112 is a lid, 114 is a bottom, 120 is a replenishment tank, 124 is a bottom, and 130 is a discharge. Piping, 132 is a replenishing pipe, 134 is a pressurized gas introducing pipe, 136 is a depressurizing pipe, 138 is a connecting pipe, 150, 151, 15
2, 153 is a control valve, 155 is a three-way valve (control valve), 16
Reference numeral 0 denotes a processing apparatus (ejection apparatus), 161 denotes a nozzle, 162 denotes a mounting table, 165 denotes a processing substrate, and 170 denotes a processing liquid. As shown in FIG. 1A, the liquid supply apparatus of the present invention discharges the liquid in the tank by pressurization and supplies the liquid to the liquid supply tank 110, and replenishes the liquid into the liquid supply tank 110. Tank 120 for storing the liquid for replenishment, the tank 110 for liquid supply and the tank 120 for replenishment are connected, and a replenishing pipe 132 for replenishing the liquid into the tank 110 for liquid supply.
And a discharge pipe 130 for discharging the liquid in the liquid supply tank, and a discharge pipe 1 for discharging the liquid in the liquid supply tank 110.
A pressurized gas introduction pipe 134 for introducing a pressurized gas (compressed gas) for discharging by pressurization through the liquid supply tank 110 through the pressurized gas supply 30, and a gas supply pipe 110 for depressurizing the inside of the liquid supply tank 110 by exhaustion. And a pressure reducing pipe 136.
And each piping is a control valve 150, 151, 15 respectively.
2, 153, and the pressurized gas introducing pipe 134 and the depressurizing pipe 136 are independently connected to the liquid supply tank 110, respectively. The pressurized gas introduction pipe 134 and the decompression pipe 136 are connected to the liquid supply tank 110 above the tank so as not to come into contact with the processing liquid in the liquid supply tank 110. The replenishing pipe 132 is provided such that one end thereof reaches each of the bottom 124 of the replenishing tank 120 and the bottom 114 of the liquid supply tank 110, and the discharge pipe 130 is also provided in the liquid supply tank 1.
It is provided such that one end thereof reaches near the bottom 114 in the inside 10.

FIG. 1B is a diagram in which the one-dot chain line portion A1 shown in FIG. 1A is replaced with a structure using a three-way valve (control valve) 155, and has the same function as FIG. 1A. Have. FIG.
In the case of the device shown in FIG.
The pressure reducing pipe 136 is connected to the liquid supply tank 110 via one shared connecting pipe 138. The three-way valve (control valve) 155 is used to connect the pressurized gas introduction pipe 134 to the connection pipe 138 when the pressure reduction pipe 13
6 is a pressurized gas introduction pipe 134 and a connection pipe 13
In the case where control is performed so as not to communicate with the side 8 and the pressure reducing pipe 136 is connected to the connecting pipe 138, the pressurized gas introducing pipe 134 is connected to the depressurizing pipe 136 and the connecting pipe 1.
Control is performed so as not to conduct with the 38 side.

Next, the liquid supply operation and the liquid replenishment operation of the liquid supply device of the present invention will be briefly described. First, the liquid supply operation will be described. The liquid supply apparatus of the present invention shown in FIGS. 1A and 1B closes the control valve (control valve 153 to control valve 155) of the pressure reducing pipe 136 and then pressurizes the pressurized gas introducing pipe 134. The control valves (control valves 152 to 155) are opened to pressurize the inside of the liquid supply tank 110 through the pressurized gas introduction pipe 134. Then, in a state where the liquid supply tank 110 is pressurized, the control valve 150 of the discharge pipe 130 is opened, and the liquid is discharged through the discharge pipe 130, and is discharged to the processing device (injection device) 160. Is supplied.

Next, the liquid replenishment operation will be described. After closing the control valve (control valve 152 to control valve 155) of the pressurized gas introduction pipe 134, the control valve (control valve 153 to control valve 155) of the pressure reduction pipe 136 is opened, and the pressure reduction pipe 136 is closed. The pressure in the liquid supply tank 110 is reduced by exhaust. With the pressure in the liquid supply tank 110 reduced, the control valve 151 of the supply pipe 132 is opened, and the liquid in the supply tank 120 is supplied to the liquid supply tank 110 via the supply pipe 132. The inside of the replenishing tank 120 is maintained at the atmospheric pressure.

[0013]

EXAMPLES The present invention will be described in further detail with reference to examples. The liquid supply device of the embodiment is a liquid supply device used for an etching device (jetting device) for manufacturing a photomask. FIG. 2 is a schematic diagram illustrating the configuration of the liquid supply device according to the embodiment. In FIG. 2, 200 is a liquid supply device, 210 is a liquid supply tank, 212 is a lid, 214 is a bottom, 220 is a refill tank, 222 is a lid, 224 is a bottom, 230 is a discharge pipe, and 232 is a refill pipe. 234 is a pressurized gas introduction pipe, 236 is a decompression pipe, 238 is a connection pipe, 240
Is an aspirator, 242 is a compressed air pipe, 245, 2
50 and 251 are control valves, 255 is a three-way valve, 260 is an etching device (ejection device), and 270 is a processing liquid. This embodiment uses a three-way valve as in FIG. 1B, and has a structure in which a pressurized gas introduction pipe 234, a pressure reduction pipe 236, and a connection pipe 238 are connected to a three-way valve 255. Has become. As a result, the pressurized gas introduction pipe 234 and the pressure reduction pipe 236 are connected to the liquid supply tank 210 via the single connection pipe 238 that is also used.

In this embodiment, the liquid supply tank 21
The depressurizing pipe 236 for depressurizing the inside of the chamber 0 by exhaust is
The pressure is reduced by using the aspirator 240, and a compressed air pipe 242 for introducing compressed air for operating the same, a control valve 245 for controlling the introduction of compressed air in the middle of the compressed air pipe 242, Is provided. Although the aspirator 240 is used in this embodiment, the pressure may be reduced by using an air pump or a vacuum pump instead.

A pressurized compressed gas (such as nitrogen gas) was introduced into the pressurized gas introduction pipe 234 and used. Compressed air was introduced into the compressed air pipe 242 and used. The liquid supply tank 210 is made of vinyl chloride. As a material, the treatment liquid has corrosion resistance and can withstand the pressurized gas pressure supplied from the pressurized gas introduction pipe 234. Is required, and may be made of glass, stainless steel, or the like. The replenishing tank 220 is made of polyethylene, but as a material, it is necessary that the treatment liquid has corrosion resistance, and may be made of glass, polyvinyl chloride, stainless steel, or the like. Each pipe needs to withstand the processing liquid and pressure.

[0016]

As described above, according to the present invention, in a liquid supply apparatus having a liquid supply tank for discharging a liquid by pressurization, the supply of the liquid into the liquid supply tank is performed by a lid of the liquid supply tank. This makes it possible to provide a liquid supply device that can be easily operated without manual operation without opening the device. As a result, it is possible to save time and labor for replenishing the solution, and it is possible to supply a liquid supply device with low dust generation and low liquid contamination. In particular, it is possible to supply a developing device or an etching device in a photomask manufacturing process. This is effective in supplying the liquid to the spray device.

[Brief description of the drawings]

FIG. 1 shows an embodiment.

FIG. 2 is a schematic configuration diagram of an embodiment.

FIG. 3 is a diagram for explaining a use state of the liquid supply device.

FIG. 4 is a diagram for explaining liquid replenishment in a conventional liquid supply device.

FIG. 5 is a manufacturing process diagram of a photomask.

[Explanation of symbols]

100, 100A Liquid supply device 110 Processing liquid supply tank (also referred to as pressurized tank) 112 Lid 114 Bottom 120 Refill tank 124 Bottom 130 Discharge pipe 132 Refill pipe 134 Pressurized gas introduction pipe 136 Depressurization pipe 138 Connection piping 150, 151, 152, 153 Control valve 155 Three-way valve 160 Processing device (injection device) 161 Nozzle 162 Mounting table 165 Processing substrate 170 Processing liquid 200 Liquid supply device 210 Liquid supply tank 212 Lid 214 Bottom 220 Refill tank 222 cover 224 bottom 230 discharge pipe 232 replenishment pipe 234 pressurized gas introduction pipe 236 decompression pipe 238 connection pipe 240 aspirator 242 compressed air pipe 245 control valve 250, 251 control valve 255 three-way valve 260 etching equipment (injection equipment) 261 Nozzle 262 Mounting table 265 Processing substrate 270 Processing liquid 300 Injection device 310 Nozzle (spray) 320, 322 Piping 330 Open / close valve 350 Processing tank 360 Substrate holder 370 Photomask substrate 380 Processing liquid 390 Liquid supply tank 400 Liquid supply device 410 (390) Supply tank 411 Canopy 420 Replenishment tank 430 Discharge pipe 434 Pressurized gas introduction pipe 436 Decompression pipe 438 Connection pipe 450 Control valve 470 Treatment liquid 500 Photomask 510 Glass substrate 520 Light shielding layer 521 Light shielding layer pattern 530 resist 531 resist pattern 540 ionizing radiation

Claims (7)

[Claims] 1. A liquid supply tank for supplying a liquid by discharging a liquid in the tank by pressurization, a replenishment tank for storing a liquid for replenishment in the liquid supply tank, and a liquid supply tank. And a replenishing tank for replenishing the liquid into the liquid supply tank, a discharge pipe for discharging the liquid in the liquid supply tank, and a liquid in the liquid supply tank. A pressurized gas introduction pipe for introducing a pressurized gas (compressed gas) for discharging by pressurization through a discharge pipe into the liquid supply tank, and a decompression for reducing the pressure in the liquid supply tank by exhaustion. Each of the pipes is opened and closed by a control valve, and the pressurized gas introducing pipe and the depressurizing pipe are used for supplying the liquid independently or through a single connecting pipe. It is connected to the tank. A liquid supply device, wherein one end of the liquid supply device is provided near the bottom of the tank, and the discharge pipe is provided such that one end of the discharge pipe is provided near the bottom of the liquid supply tank. 2. After the control valve of the pressure reducing pipe is closed, the control valve of the pressurized gas introducing pipe is opened, and the inside of the liquid supply tank is pressurized through the pressurized gas introducing pipe to introduce the pressurized gas. 2. The method according to claim 1, wherein the control valve of the pressure reducing pipe is opened after the control valve of the pressure pipe is closed, and the pressure in the liquid supply tank is reduced by exhausting the gas through the pressure reducing pipe. Feeding device. 3. The liquid supply device according to claim 1, wherein the inside of the replenishing tank is maintained at an atmospheric pressure. 4. A liquid supply device according to claim 1, wherein the pressure reducing pipe for reducing the pressure in the liquid supply tank by exhausting the gas is reduced by using an aspirator. 5. The liquid supply device according to claim 1, wherein the pressure reducing pipe for reducing the pressure in the liquid supply tank by exhausting the air is reduced by using an air pump. 6. A liquid supply device according to claim 1, wherein the pressure reducing pipe for reducing the pressure in the liquid supply tank by exhausting the gas is reduced by using a vacuum pump. 7. The pressurized gas introducing pipe and the depressurizing pipe according to claim 1, wherein the pressurized gas introducing pipe and the depressurizing pipe are connected to the liquid supply tank via one shared pipe. The liquid supply device, wherein the connection pipe and the one connection pipe that is also used are controlled by one three-way valve.