JPH10139584A - Method for pulling up single crystal and device therefor - Google Patents

Method for pulling up single crystal and device therefor

Info

Publication number
JPH10139584A
JPH10139584A JP29900796A JP29900796A JPH10139584A JP H10139584 A JPH10139584 A JP H10139584A JP 29900796 A JP29900796 A JP 29900796A JP 29900796 A JP29900796 A JP 29900796A JP H10139584 A JPH10139584 A JP H10139584A
Authority
JP
Japan
Prior art keywords
single crystal
holding
pulling
holding frame
frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP29900796A
Other languages
Japanese (ja)
Inventor
Teruo Izumi
輝郎 和泉
Yoichi Yamamoto
洋一 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Sumitomo Sitix Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Sitix Corp filed Critical Sumitomo Sitix Corp
Priority to JP29900796A priority Critical patent/JPH10139584A/en
Publication of JPH10139584A publication Critical patent/JPH10139584A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a method by which the single crystal can safely be pulled up without causing falling of the crystal at the time of producing a single crystal having a great weight and also to provide the device for the method. SOLUTION: (1) This method for pulling up a single crystal by a Czochralski method comprises: forming a neck part in a single crystal 3 by a single crystal pulling-up means 4; then, gripping the neck part by using a pair of holding jigs 9 moveably engaged with a holding frame 8; and thereafter, pulling up the single crystal 3 in cooperation with the single crystal pulling-up means 4. (2) This device is provided with: the single crystal pulling-up means 4 for forming the neck part; a holding frame adjustment means 5 for adjusting the height of the holding frame 8; and a holding jig adjustment means 6 for adjusting the position of the holding jigs 9 moveably engaged with the holding frame 8; wherein these means 4, 5 and 6 are coaxially arranged with each other and the neck part of the single crystal 3 is gripped with the holding jigs 9 to pull up the holding frame 8 and holding jigs 9 in cooperation with the single crystal pulling-up means 4. In the device, desirably, the fixed frame 8d is formed into a staircase shape and the position adjustment of the holding jigs 9 movably engaged with the holding frame 8 is performed by elevating/lowering the pair of jigs 9 with two wires 10 respectively.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はチョクラルスキー法
(以下、「CZ法」という)によって単結晶を製造する
引上方法およびその装置に関し、さらに詳しくは大重量
の単結晶を製造する際に単結晶の落下を生ずることなく
安全に引き上げることができる単結晶引上方法および装
置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a pulling method for producing a single crystal by the Czochralski method (hereinafter referred to as "CZ method") and an apparatus therefor. The present invention relates to a method and apparatus for pulling a single crystal that can be safely pulled without causing the single crystal to fall.

【0002】[0002]

【従来の技術】単結晶の製造方法は種々あるが、なかで
も、シリコン単結晶の育成に関し、工業的に量産が可能
な方式で広く応用されているものとしてCZ法がある。
この方法による単結晶の製造は、坩堝内に収容された結
晶原料の溶融液の表面に種結晶を接触させ、坩堝を回転
させるとともに、この種結晶を反対方向に回転させなが
ら上方へ引上げることによって、種結晶の下端に溶融液
が凝固した単結晶を育成していく。
2. Description of the Related Art There are various methods for producing a single crystal. Among them, the CZ method is widely applied in a method capable of industrial mass production for growing a silicon single crystal.
In the production of a single crystal by this method, the seed crystal is brought into contact with the surface of the melt of the crystal raw material contained in the crucible, and the crucible is rotated, and the seed crystal is pulled upward while rotating in the opposite direction. Thereby, a single crystal in which the melt is solidified grows at the lower end of the seed crystal.

【0003】CZ法によって単結晶を製造する場合に、
種結晶を溶融液に接触させたとき熱ショックで発生した
転位を完全に除去し、育成される単結晶の本体に及ばな
いようにする必要がある。通常、この方策として、転位
を結晶表面から排除して単結晶を無転位化するために、
直径を細長く絞る、所謂「ネックプロセス」が採用され
ている。このときの無転位化に必要なネック部の直径は
3〜4mmで、その機械的強度は略 200Kg程度である。
When a single crystal is produced by the CZ method,
When the seed crystal is brought into contact with the melt, it is necessary to completely remove dislocations generated by the thermal shock so that the dislocation does not reach the main body of the grown single crystal. Usually, as this measure, in order to eliminate dislocations from the crystal surface and make the single crystal dislocation-free,
A so-called "neck process" is employed in which the diameter is narrowed and elongated. At this time, the diameter of the neck portion necessary for eliminating dislocations is 3 to 4 mm, and its mechanical strength is about 200 kg.

【0004】従来、CZ法によって製造される単結晶の
重量は、 120〜 130Kg程度に限定されていたが、近年に
おいて半導体製造の効率化の要請が強く、単結晶の大径
化と共に長尺化の傾向が顕著となり、単結晶の重量が 2
00Kgを超える場合も想定されるようになってきた。上述
の通り、単結晶のネック部で負担できる荷重に限界があ
り、単結晶が重くなり過ぎて引上中に捩じれまたは曲げ
応力が加わると、単結晶のネック部が破損し、単結晶が
坩堝内の溶融液に落下することになり、引上装置の損傷
や溶融液の流出、さらには水蒸気爆発等の事態が発生
し、人身事故を招く恐れもある。
Conventionally, the weight of a single crystal produced by the CZ method has been limited to about 120 to 130 kg, but in recent years there has been a strong demand for more efficient semiconductor production. And the weight of the single crystal becomes 2
Cases exceeding 00 kg have come to be assumed. As described above, the load that can be borne by the neck portion of the single crystal is limited, and if the single crystal becomes too heavy and torsion or bending stress is applied during pulling, the neck portion of the single crystal is broken and the single crystal is crucible. It may fall into the melt inside, causing damage to the lifting device, outflow of the melt, and even a steam explosion, which may lead to personal injury.

【0005】そこで、単結晶の大重量化にともなって頻
発することが予想される引上中の落下等の事故を防止す
るため、大径のネック部で転位を排除する方法、また
は引上中に単結晶を機械的に保持する方法が試みられ
ているが、従来から後者の方法に提案がなされてい
る。例えば、特開昭62−288191号公報には、単結晶に係
合部を設けて単結晶を機械的に保持する基本的な思想が
開示され、さらに特開平3−285893号公報および特開平
3−295893号公報では、単結晶の把持手段を改善した引
上装置が提案されている。すなわち、単結晶の上部に係
合段部を形成し、この係合段部を複数の爪、または爪を
有する複数の把持ホルダーで係合・把持する構造を採用
することによって、引上途中における単結晶の落下を防
いでいる。
[0005] Therefore, in order to prevent an accident such as dropping during pulling which is expected to frequently occur with the increase in the weight of the single crystal, a method of eliminating dislocations at a neck portion having a large diameter, or A method of mechanically holding a single crystal has been attempted, but the latter method has been conventionally proposed. For example, Japanese Patent Application Laid-Open No. 62-288191 discloses a basic concept of mechanically holding a single crystal by providing an engaging portion on the single crystal. Japanese Patent Application Laid-Open No. 295893 proposes a pulling apparatus in which the means for holding a single crystal is improved. That is, by forming an engaging step on the upper part of the single crystal and adopting a structure in which the engaging step is engaged and gripped by a plurality of claws or a plurality of grip holders having claws, The single crystal is prevented from falling.

【0006】このため、提案の引上装置を用いれば、大
重量の単結晶を引上げる場合であっても、単結晶の引上
を確実、かつ安全に行うことができるとしている。
For this reason, it is stated that the use of the proposed pulling apparatus makes it possible to pull the single crystal reliably and safely even when pulling a heavy single crystal.

【0007】[0007]

【発明が解決しようとする課題】CZ法による引上技術
では、単結晶の引上軸に対して均一対象のくびれ部を形
成することが困難である。ところが単結晶のくびれ部に
引上軸とのズレが生じた状態で単結晶を把持して単結晶
の育成を行った場合、単結晶の真円性が損なわれて直径
制御精度の低下を来すだけでなく、把持手段で均等に係
合・把持されず、係合している把持手段にのみ単結晶の
重量負担が加わることになる。そして、把持手段による
係合は極めて安定性が悪く、係合が外れるおそれがあ
る。このため、特開平3−285893号公報で開示された引
上装置では、これらの対応として係合が外れないように
保持する保持手段を設けて、把持手段の係合・把持を確
実なものとしている。
In the pulling technique based on the CZ method, it is difficult to form a constricted portion uniformly on the pulling axis of a single crystal. However, when the single crystal is grown while holding the single crystal in a state where the constricted portion of the single crystal is displaced from the pulling axis, the roundness of the single crystal is impaired, and the accuracy of diameter control is reduced. In addition, the single crystal is not uniformly engaged and gripped by the gripping means, and the weight burden of the single crystal is applied only to the gripping means that is engaged. Then, the engagement by the gripping means is extremely poor in stability, and may be disengaged. For this reason, in the lifting device disclosed in Japanese Patent Application Laid-Open No. 3-285893, a holding means for holding the engagement so as not to be disengaged is provided as a countermeasure for these, and the engagement and gripping of the gripping means is ensured. I have.

【0008】図6は、特開平3−285893号公報で提案さ
れた引上装置で使用される単結晶の把持手段を説明する
図である。すなわち、シードチャック7の先端に育成さ
れる単結晶3の上部にくびれ部3eを設けて係合段部を形
成し、この係合段部を複数の爪38を有するくの字状の把
持レバー39で支持する構造を採用している。そして、把
持レバーで支持する際にその支持が外れないように、把
持レバー39をリング40で保持している。このようにする
ことによって、把持レバー39に不均一に単結晶3の荷重
が加わる場合であっても、引上ワイヤーによる引上途中
における単結晶の落下を防いでいる。
FIG. 6 is a view for explaining a means for holding a single crystal used in a pulling apparatus proposed in Japanese Patent Application Laid-Open No. 3-285893. That is, a constricted portion 3e is formed on the upper part of the single crystal 3 grown at the tip of the seed chuck 7 to form an engagement step, and this engagement step is formed into an L-shaped gripping lever having a plurality of claws 38. The structure supported by 39 is adopted. Then, the grip lever 39 is held by a ring 40 so that the support is not released when the grip lever is supported by the grip lever. In this way, even when the load of the single crystal 3 is unevenly applied to the gripping lever 39, the single crystal is prevented from dropping during the pulling by the pulling wire.

【0009】確かに、提案の把持手段であれば引上途中
における単結晶の落下防止を図ることができる。しかし
ながら、複数の爪による係合・把持であるため、単結晶
の係合段部では点接触による保持となり著しい応力集中
を発生することになる。このため、単結晶の係合段部で
思わぬ破損を生じたり、引上中に単結晶に捩じれが加わ
り単結晶が大きく傾いて、爪または把持ホルダーの係合
が外れ単結晶を落下させることが危惧される。
Certainly, with the proposed gripping means, it is possible to prevent the single crystal from falling during pulling. However, since the engagement and gripping is performed by a plurality of claws, the single crystal is held by the point contact at the engagement step portion, so that significant stress concentration occurs. For this reason, unexpected breakage may occur at the engaging step portion of the single crystal, or the single crystal may be twisted during pulling and the single crystal may be greatly inclined, and the claws or grip holders may be disengaged and drop the single crystal. Is worried.

【0010】また、提案された引上装置では単結晶の引
上領域に複数の爪、把持レバーおよびリングが配設さ
れ、これらは単結晶引上手段と同時に昇降するものであ
るから、引上初期に有転位化が発生した場合にその結晶
を再溶解して再び引上げを行うこと、すなわちリメルト
することができない。このため、単結晶の育成歩留に一
定の制限が生じ、前述の半導体製造の効率化の要請に反
することとなる。
In the proposed pulling apparatus, a plurality of claws, gripping levers and rings are arranged in the pulling region of the single crystal, and these are raised and lowered simultaneously with the single crystal pulling means. When dislocations occur in the initial stage, the crystals cannot be melted again and pulled up again, that is, remelting cannot be performed. For this reason, a certain limit is imposed on the yield of growing single crystals, which is contrary to the above-mentioned demand for increasing the efficiency of semiconductor manufacturing.

【0011】本発明は、上述した従来の引上装置で見ら
れる問題点を解決し、点接触による応力集中を避けて単
結晶のくびれ部の保持を確実なものとし、さらに有転位
化の発生時にはリメルト操作を可能として、大重量の単
結晶を引上げる場合であっても落下事故を発生すること
なく、単結晶を効率良く製造することができる単結晶引
上方法およびその装置を提供することを目的としてい
る。
The present invention solves the above-described problems of the conventional pulling apparatus, avoids stress concentration due to point contact, ensures the holding of the constricted portion of the single crystal, and further reduces the occurrence of dislocations. An object of the present invention is to provide a single crystal pulling method and a single crystal pulling method capable of efficiently producing a single crystal without causing a falling accident even when a heavy crystal is pulled, sometimes allowing a remelting operation. It is an object.

【0012】[0012]

【課題を解決するための手段】本発明の単結晶引上方法
および装置では、単結晶引上手段によって種結晶を溶融
液面へ接触後、回転させながら引き上げてネックプロセ
スを行い、次いで単結晶の直径を増加および減少させて
くびれ部を形成させ、単結晶の肩部および単結晶本体の
育成を行う。一方、単結晶引上の進捗にともなってその
重量が増加するが、単結晶のネック部で負担できる荷重
の限界に達する前に、保持枠および保持治具で単結晶の
くびれ部を挟持して、その後保持枠および保持治具によ
る単結晶の保持に移行する。そのため、本発明の要旨
は、図1、図 2に示すように、次の(1)単結晶引上方法
および (2)その装置である。
According to the method and apparatus for pulling a single crystal of the present invention, the seed crystal is brought into contact with the surface of the melt by the single crystal pulling means, and then pulled up while rotating to perform a neck process. Is increased or decreased to form a constricted portion, and the shoulder portion of the single crystal and the main body of the single crystal are grown. On the other hand, the weight increases with the progress of pulling the single crystal, but before reaching the limit of the load that can be borne by the neck portion of the single crystal, the holding frame and the holding jig sandwich the narrow portion of the single crystal. Then, the process shifts to holding the single crystal by the holding frame and the holding jig. Therefore, the gist of the present invention is, as shown in FIGS. 1 and 2, the following (1) a method for pulling a single crystal and (2) an apparatus therefor.

【0013】(1) CZ法によって回転させつつ引き上げ
ることによって結晶を育成させる単結晶引上方法におい
て、単結晶引上手段4によって単結晶3の直径を増加さ
せたのち減少させてくびれ部3eを形成させ、次いで該く
びれ部を保持枠8に遊嵌された一対の保持治具9で挟持
してのち、前記単結晶引上手段と同調して単結晶を引き
上げることを特徴とする単結晶引上方法。
(1) In a single crystal pulling method in which a crystal is grown by pulling while rotating by the CZ method, the diameter of the single crystal 3 is increased by the single crystal pulling means 4 and then reduced to reduce the constricted portion 3e. Forming a single crystal, and holding the constricted portion between a pair of holding jigs 9 loosely fitted to the holding frame 8 and pulling the single crystal in synchronization with the single crystal pulling means. Top method.

【0014】(2) 回転されつつ引上げられる単結晶3に
その直径を増加させてのち減少させてくびれ部3eを形成
させる単結晶引上手段4と、保持枠8を昇降させてその
高さを調整する保持枠調整手段5と、前記保持枠に遊嵌
された保持治具9の位置を調整する保持治具調整手段6
とを具備する単結晶引上装置であって、前記保持枠調整
手段5および保持治具調整手段6は単結晶引上手段4と
同軸に配設され、単結晶のくびれ部を前記保持枠8の下
部に設けられた固定枠8dに支持された保持治具9で挟持
して前記単結晶引上手段4と同調して保持枠8および保
持治具9を引き上げることを特徴とする単結晶引上装
置。
(2) A single crystal pulling means 4 for increasing the diameter of the single crystal 3, which is pulled while being rotated, and then reducing the diameter to form a constricted portion 3e, and raising and lowering the holding frame 8 to raise and lower the height. Holding frame adjusting means 5 for adjusting, and holding jig adjusting means 6 for adjusting the position of holding jig 9 loosely fitted to the holding frame.
Wherein the holding frame adjusting means 5 and the holding jig adjusting means 6 are arranged coaxially with the single crystal pulling means 4 and the constricted portion of the single crystal is fixed to the holding frame 8. Characterized in that the holding frame (8) and the holding jig (9) are pulled up in synchronism with the single crystal pulling means (4) while being held by a holding jig (9) supported by a fixed frame (8d) provided at the lower part of the frame. Upper device.

【0015】上記の引上装置において、保持枠8の下部
に設けられた固定枠8dは階段状に構成され、この保持枠
に遊嵌された保持治具9の位置調整はワイヤー10の昇降
によって行われるのが望ましい。
In the above-described lifting device, the fixed frame 8d provided below the holding frame 8 is formed in a stepped shape, and the position of the holding jig 9 loosely fitted to the holding frame is adjusted by raising and lowering the wire 10. It is desirable that this be done.

【0016】[0016]

【発明の実施の形態】本発明方法で用いる単結晶引上装
置の形態を図面に基づいて説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The form of a single crystal pulling apparatus used in the method of the present invention will be described with reference to the drawings.

【0017】図1、図2は、本発明方法で用いる単結晶
引上装置の全体構成例を説明する要部断面図であり、図
1はその正面図を、図2はその側面図をそれぞれ示して
いる。両図に示すように、真空チャンバ(図示せず)内
の中心位置には坩堝1が配設され、その内部には原料と
なる多結晶シリコンが溶融された溶融液2が保持されて
いる。坩堝1の上方には単結晶引上手段4の先端に取り
付けられたシードチャック7、および保持枠調整手段5
の下端に支持される保持枠8が配置され、この保持枠8
内には単独・個別に移動調整できる一対の保持治具9が
遊嵌されている。図1、図2では、保持治具9の高さ位
置調整を保持治具調整手段6の保持治具ワイヤー10の昇
降操作によって行うことが示されているが、本発明にお
いては、同様の作用が達成できるのであれば、保持治具
9の高さ位置調整は他の方式によってもよい。
FIGS. 1 and 2 are cross-sectional views of an essential part for explaining an entire configuration example of a single crystal pulling apparatus used in the method of the present invention. FIG. 1 is a front view and FIG. Is shown. As shown in both figures, a crucible 1 is disposed at a central position in a vacuum chamber (not shown), and a melt 2 in which polycrystalline silicon as a raw material is melted is held in the crucible 1. Above the crucible 1, a seed chuck 7 attached to the tip of the single crystal pulling means 4, and a holding frame adjusting means 5
A holding frame 8 supported at a lower end of the holding frame 8 is disposed.
A pair of holding jigs 9 that can be individually and individually moved and adjusted are loosely fitted therein. 1 and 2 show that the height position of the holding jig 9 is adjusted by raising and lowering the holding jig wire 10 of the holding jig adjusting means 6, but in the present invention, similar operations are performed. Can be achieved, other methods may be used for adjusting the height position of the holding jig 9.

【0018】単結晶の育成過程では、具体的な構造は図
示しないが、単結晶引上手段4によって単結晶に一定方
向の回転が加えられるとともに、結晶の成長速度に応じ
て上方に引き上げられる。一方、保持枠調整手段5は単
結晶の引上領域に保持枠8を支持し、さらに保持枠8の
高さ位置を調整するものであり、そのため、図示しない
機構によって昇降動作を行う。また、保持治具調整手段
6は、例えば、保持治具ワイヤー10の昇降によって、保
持枠8内の保持治具9の位置を調整する。そのため、単
結晶引上手段4、保持枠調整手段5および保持治具調整
手段6の関係は、図1、図2においてそれぞれ同軸に配
設されているが、保持枠調整手段5および保持治具調整
手段6と単結晶引上手段4とは別系統で作動する。しか
し、後述するように、保持枠8および保持治具9で単結
晶のくびれ部を保持した後は、保持枠調整手段5および
保持治具調整手段6は単結晶引上手段4と同調して回転
および上昇する構造になっている。
In the process of growing the single crystal, although the specific structure is not shown, the single crystal is rotated in a certain direction by the single crystal pulling means 4 and is pulled upward in accordance with the growth rate of the crystal. On the other hand, the holding frame adjusting means 5 supports the holding frame 8 in the pulling region of the single crystal, and further adjusts the height position of the holding frame 8, and therefore performs a lifting operation by a mechanism (not shown). The holding jig adjusting means 6 adjusts the position of the holding jig 9 in the holding frame 8 by elevating the holding jig wire 10, for example. Therefore, the relationship between the single crystal pulling means 4, the holding frame adjusting means 5 and the holding jig adjusting means 6 is coaxially arranged in FIGS. 1 and 2, respectively. The adjusting means 6 and the single crystal pulling means 4 operate in separate systems. However, as described later, after holding the constricted portion of the single crystal with the holding frame 8 and the holding jig 9, the holding frame adjusting means 5 and the holding jig adjusting means 6 are synchronized with the single crystal pulling means 4. It has a rotating and ascending structure.

【0019】本発明の装置では、単結晶および保持治具
に引上げに際し、単結晶引上手段4が保持枠調整手段5
および保持治具調整手段6と別系統になっているため、
単結晶のくびれ部に引上軸とのズレが生じても、容易に
位置ズレ調整が行え、単結晶の真円性が損なわれること
や直径制御精度が低下することを回避できる。
In the apparatus of the present invention, when the single crystal and the holding jig are pulled up, the single crystal pulling means 4 is connected to the holding frame adjusting means 5.
Since it is a separate system from the holding jig adjusting means 6,
Even if the constricted portion of the single crystal is displaced from the pull-up axis, the displacement can be easily adjusted, and the roundness of the single crystal can be prevented from being impaired and the diameter control accuracy can be prevented from being degraded.

【0020】一方、上述の通り、単結晶引上手段4、保
持枠調整手段5および保持治具調整手段6は同軸に配設
され、回転速度が同調されるので、結晶回転の不安定に
起因する単結晶の育成上のトラブルを防止することがで
きる。また、本発明の装置では、保持枠調整手段5およ
び保持治具調整手段6の動作は単結晶引上手段4と別系
統であって、保持枠8および保持治具9は単結晶引上手
段4と独立して個別に昇降移動が可能であるから、単結
晶の育成初期に有転位化した結晶をリメルトすることが
できる。
On the other hand, as described above, the single crystal pulling means 4, the holding frame adjusting means 5, and the holding jig adjusting means 6 are arranged coaxially and their rotation speeds are tuned. Trouble in growing a single crystal can be prevented. In the apparatus of the present invention, the operation of the holding frame adjusting means 5 and the holding jig adjusting means 6 is different from the operation of the single crystal pulling means 4, and the holding frame 8 and the holding jig 9 are operated by the single crystal pulling means. Since the crystal can be moved up and down independently of the crystal 4, it is possible to remelt a crystal that has undergone dislocation in the initial stage of growing a single crystal.

【0021】単結晶引上手段4の先端には単結晶シード
3aを保持するシードチャック7が取り付けられ、単結晶
引上手段4の引上操作によって、ネック部3b、単結晶直
径を増加させる部分3c(以下、「増径部」という)と単
結晶直径を減少させる部分3d(以下、「減径部」とい
う)からなるくびれ部3e、さらに肩部3fが形成される。
At the tip of the single crystal pulling means 4, a single crystal seed
A seed chuck 7 holding 3a is attached, and the neck portion 3b, a portion 3c for increasing the diameter of the single crystal (hereinafter referred to as "increased diameter portion") and the diameter of the single crystal are increased by the pulling operation of the single crystal pulling means 4. A constricted portion 3e composed of a reduced portion 3d (hereinafter, referred to as a "reduced diameter portion") and a shoulder 3f are formed.

【0022】一方、保持枠調整手段5の先端には保持枠
8が取り付けられ、その下部には保持治具9が高さ位置
の調整が自在になるよう遊嵌されている。
On the other hand, a holding frame 8 is attached to the tip of the holding frame adjusting means 5, and a holding jig 9 is loosely fitted below the holding frame 8 so that the height position can be adjusted freely.

【0023】保持枠8の構成は、図2および後述する図
3に示すように、保持枠の上部外観をなす保持外枠8a
と、下部に治具ガイド枠8cと固定枠8dが設けられ、これ
らの間に保持治具9が遊嵌され、その高さ位置はワイヤ
ーガイド枠8bを通って導かれる保持治具ワイヤー10の上
昇または下降によって調整される。保持治具9は、図1
および後述する図4に示すように、保持棒9aと横ずれ防
止板9bで構成されており、保持棒9aの中央部には円錐状
の切り込み部を設けるのが望ましい。
As shown in FIG. 2 and FIG. 3, which will be described later, the structure of the holding frame 8 is a holding outer frame 8a forming an upper appearance of the holding frame.
A jig guide frame 8c and a fixed frame 8d are provided at a lower portion, and a holding jig 9 is loosely fitted between the jig guide frame 8c and the fixing frame 8d. The height position of the holding jig wire 10 is guided through the wire guide frame 8b. Adjusted by ascending or descending. The holding jig 9 is shown in FIG.
As shown in FIG. 4 to be described later, it is composed of a holding rod 9a and a lateral displacement prevention plate 9b, and it is desirable to provide a conical cut in the center of the holding rod 9a.

【0024】単結晶のくびれ部3eを保持するに際し、保
持枠8は下降されその固定枠8dはくびれ部3eより下方に
位置する。次いで、比較的上方にあった保持治具9は、
保持治具ワイヤー10を巻下げることによって、固定枠8d
に沿って下方に移動し、くびれ部3eの下方に位置する。
すなわち、保持棒9aの中央部に設けられた切り込み部が
単結晶のくびれ部3eに接触する程に下降させるのが望ま
しい。そののち、保持枠調整手段5を作動させて、保持
棒9aが固定枠8dに圧縮固定されるまで保持治具9を上昇
させて、単結晶のくびれ部3eを保持する。
When holding the constricted portion 3e of the single crystal, the holding frame 8 is lowered and the fixed frame 8d is positioned below the constricted portion 3e. Next, the holding jig 9 which was relatively above,
By lowering the holding jig wire 10, the fixed frame 8d
And moves downward, and is located below the constricted portion 3e.
That is, it is desirable to lower the notch provided at the center of the holding rod 9a so that the notch contacts the constriction 3e of the single crystal. After that, the holding frame adjusting means 5 is operated to raise the holding jig 9 until the holding rod 9a is compressed and fixed to the fixed frame 8d, thereby holding the constricted portion 3e of the single crystal.

【0025】図2および図3では階段状の固定枠8dを示
しているが、本発明においてはこれに限定されるもので
はなく、保持治具調整手段6の作動によって、保持治具
9が固定枠8dに沿って適宜移動する形状であればよい。
また、保持棒9aの中央部に円錐状の切り込み部を設ける
ことによって、単結晶の重量を線状または面状の接触部
位で負担することになるので、応力集中を避けることが
でき、大重量単結晶の引上げであっても安全に育成する
ことができる。さらに、横ずれ防止板9bと保持枠8の固
定枠8dとの間に微調整空間(図1に示すs寸法)を与え
ていることから、荷重が掛かった際に荷重によって引上
軸に微調整が可能である。
Although FIGS. 2 and 3 show the stepped fixing frame 8d, the present invention is not limited to this. The holding jig 9 is fixed by the operation of the holding jig adjusting means 6. Any shape may be used as long as it can move as appropriate along the frame 8d.
In addition, by providing a conical notch in the center of the holding rod 9a, the weight of the single crystal is borne by the linear or planar contact portion, so that stress concentration can be avoided and large weight Even if a single crystal is pulled, it can be safely grown. Further, since a fine adjustment space (s dimension shown in FIG. 1) is provided between the lateral displacement prevention plate 9b and the fixing frame 8d of the holding frame 8, when the load is applied, the pulling shaft is finely adjusted by the load. Is possible.

【0026】次に具体的な操作手順を説明する。単結晶
の引上開始時には、保持枠引上手段5は保持枠8を上方
に保持した状態で待機する。少なくとも、保持枠8の下
端部が単結晶シード3aの上方になるように保持する。一
方、単結晶引上手段4の先端にシードチャック7を介し
て取付けられた単結晶シード3aをシリコン溶融液2の液
面の中心部に接触させ、溶融液を安定させる。その後、
単結晶引上手段4を作動させて単結晶シード3aを回転さ
せながらゆっくり上昇させ、ネック部3bを形成させる。
次いで、単結晶の引上速度を遅くして単結晶の増径部3c
を成形し、そののち引上速度を速めて単結晶の減径部3d
を形成して単結晶のくびれ部3eを形成する。
Next, a specific operation procedure will be described. At the start of pulling the single crystal, the holding frame pulling means 5 waits while holding the holding frame 8 upward. At least the lower end of the holding frame 8 is held above the single crystal seed 3a. On the other hand, the single crystal seed 3a attached to the tip of the single crystal pulling means 4 via the seed chuck 7 is brought into contact with the center of the liquid surface of the silicon melt 2 to stabilize the melt. afterwards,
The single crystal pulling means 4 is operated to slowly raise the single crystal seed 3a while rotating it, thereby forming the neck 3b.
Next, the pulling speed of the single crystal is reduced to increase the diameter of the single crystal 3c.
Is formed, and then the pulling speed is increased to reduce the diameter of the single crystal 3d.
Is formed to form a constricted portion 3e of a single crystal.

【0027】単結晶くびれ部3eを形成したのち、再び単
結晶の直径を増大させて肩部3fを形成し、その後引上速
度、回転速度を定常条件に調整して所定直径の単結晶3
の本体引上に移行する。
After forming the constricted portion 3e of the single crystal, the diameter of the single crystal is increased again to form the shoulder 3f, and then the pulling speed and the rotation speed are adjusted to the steady conditions to adjust the single crystal 3 having a predetermined diameter.
Move to the main body pulling.

【0028】定常条件の単結晶の引上に移行後、引き上
げられる単結晶の重量が一定の重量に達した時点、また
は、一定の引上長さになる時点で、上方で待機していた
保持枠8を、その下端が単結晶のくびれ部3eより十分に
下方になるように下降させる。そののち、保持治具調整
手段6を作動させて、保持治具ワイヤー10を介して保持
治具9を治具ガイド枠8cおよび固定枠8dの間を移動させ
る。このとき、保持棒9aの中央部の切り込み部が単結晶
のくびれ部近傍まで移動させるのが望ましい。
After the transition to the pulling of the single crystal under the steady condition, when the weight of the single crystal to be pulled reaches a certain weight or when the pulling length becomes a certain length, the holding which has been waiting above is held. The frame 8 is lowered so that its lower end is sufficiently below the constriction 3e of the single crystal. Thereafter, the holding jig adjusting means 6 is operated to move the holding jig 9 between the jig guide frame 8c and the fixed frame 8d via the holding jig wire 10. At this time, it is desirable that the cut portion at the center of the holding rod 9a be moved to the vicinity of the constricted portion of the single crystal.

【0029】そして、保持枠調整手段5によって保持枠
8を徐々に上昇させて、保持治具9によって単結晶のく
びれ部3eを挟持する。その後、保持枠調整手段5および
保持治具調整手段6は、単結晶引上手段4の引上速度と
同調して保持枠8および保持治具9を上昇させる。
Then, the holding frame 8 is gradually raised by the holding frame adjusting means 5, and the constricted portion 3 e of the single crystal is held by the holding jig 9. Thereafter, the holding frame adjusting means 5 and the holding jig adjusting means 6 raise the holding frame 8 and the holding jig 9 in synchronization with the pulling speed of the single crystal pulling means 4.

【0030】[0030]

【実施例】以下、本発明方法および装置の効果を、具体
的な実施例(本発明例、比較例1〜3)に基づいて説明
する。
The effects of the method and apparatus of the present invention will be described below based on specific examples (Examples of the present invention and Comparative Examples 1 to 3).

【0031】(本発明例)図1、図2に示す引上装置を
用いて、直径12インチ( 305mm)で引上長さ1000mmのシ
リコン単結晶の育成を行った。このときの多結晶シリコ
ンは 300Kgチャージした。
(Example of the Present Invention) Using the pulling apparatus shown in FIGS. 1 and 2, a silicon single crystal having a diameter of 12 inches (305 mm) and a pulling length of 1000 mm was grown. At this time, the polycrystalline silicon was charged at 300 kg.

【0032】図3は実施例で使用した保持枠の寸法を示
す図であり、図4は実施例で使用した保持治具の寸法を
示す図である。単結晶の引上開始時には、この保持治具
を遊嵌した保持枠を上方に保持した状態で待機させた。
一方、単結晶引上手段の先端に取付けられた単結晶シー
ドをシリコン溶融液2に接触させ、その後、単結晶引上
手段6を作動させて単結晶シードを回転させながらゆっ
くり上昇させ、図5に示す形状、寸法の単結晶ネック
部、くびれ部および肩部を形成した。
FIG. 3 is a diagram showing the dimensions of the holding frame used in the embodiment, and FIG. 4 is a diagram showing the dimensions of the holding jig used in the embodiment. At the start of the pulling of the single crystal, the holding jig was made to stand by with the holding frame loosely fitted therein being held upward.
On the other hand, the single crystal seed attached to the tip of the single crystal pulling means is brought into contact with the silicon melt 2, and thereafter the single crystal pulling means 6 is operated to slowly raise the single crystal seed while rotating it. A single crystal neck portion, a constricted portion and a shoulder portion having the shape and dimensions shown in FIG.

【0033】単結晶の本体引上げに移行後、引上重量が
100Kgに達した時点で、保持枠を下降させ、保持治具で
単結晶のくびれ部を挟持して、合計30本の育成を行い、
これを一次引上とした。通常、一次引上時に有転位化が
発生すると、前述の通り、これをリメルトして再び引上
げを行い、最終引上とする。本発明例ではリメルトを行
い、一次引上と最終引上を実施した。合計30本の引上げ
を行った際の有転位化本数、落下本数および育成された
単結晶の総無転位長さの結果を表1に示す。
After shifting to pulling the main body of the single crystal, the pulling weight becomes
At the time of reaching 100 kg, the holding frame was lowered, the constricted part of the single crystal was held by the holding jig, and a total of 30 pieces were grown,
This was designated as the primary lift. Normally, when dislocations occur during the primary pulling, as described above, the dislocations are remelted and pulled up again to make the final pulling. In the example of the present invention, remelting was performed, and primary lifting and final lifting were performed. Table 1 shows the results of the number of dislocations, the number of drops, and the total dislocation-free length of the grown single crystal when a total of 30 crystals were pulled.

【0034】(比較例1)単結晶の機械的な保持方法の
比較例として、図6に示す把持手段(前記特開平3−28
5893号公報で提案された保持治具)を用いて、本発明例
と同様のシリコン単結晶の育成を行った。
(Comparative Example 1) As a comparative example of a mechanical holding method of a single crystal, a gripping means shown in FIG.
Using a holding jig proposed in Japanese Patent No. 5893, a silicon single crystal similar to that of the present invention was grown.

【0035】図5に示す形状、寸法の単結晶ネック部、
くびれ部および肩部を形成して、単結晶の本体引上げに
移行後、引上重量が 100Kgに達した時点で、2個の爪を
有する把持レバーを作動させ、2本の爪で単結晶くびれ
部を係合・把持して、合計30本の育成を行った。比較例
1では、リメルトができないため、最終引上は実施せ
ず、一次引上のみを実施した。このときの引上結果を表
1に示す。
A single crystal neck portion having the shape and dimensions shown in FIG.
After forming the constricted part and shoulder, and moving to pulling the main body of the single crystal, when the pulling weight reaches 100 kg, the gripping lever with two claws is operated and the constriction of the single crystal is made with two claws. The parts were engaged and gripped, and a total of 30 plants were grown. In Comparative Example 1, since remelting was not possible, final pulling was not performed, but only primary pulling was performed. Table 1 shows the pulling results at this time.

【0036】(比較例2)本発明例と同様に、図1およ
び図2に示す引上装置を用いて、直径12インチ(305m
m)で引上長さ1000mmのシリコン単結晶を合計30本育成
した。しかし、図5に示す単結晶ネック部(直径3mm、
長さ30mm)を形成したのち、くびれ部を形成することな
く、肩部を形成して単結晶の本体引上げを行った。この
ため、本発明例で使用した保持枠および保持治具は全く
使用しなかった。このとき、一次引上および最終引上を
実施し、その結果を表1に示す。
(Comparative Example 2) As in the case of the present invention, a 12-inch diameter (305 m
In m), a total of 30 silicon single crystals with a pulling length of 1000 mm were grown. However, the single crystal neck shown in FIG.
After forming a length of 30 mm), the shoulder was formed and the main body of the single crystal was pulled without forming a constricted portion. Therefore, the holding frame and the holding jig used in the example of the present invention were not used at all. At this time, the primary pull-up and the final pull-up were performed, and the results are shown in Table 1.

【0037】(比較例3)本発明例と同様に、図1およ
び図2に示す引上装置を用いて、直径12インチ(305m
m)で引上長さ1000mmのシリコン単結晶を合計30本育成
した。しかし、大径の単結晶ネック部(直径8mm、長さ
200mm)を形成したのち、くびれ部を形成することな
く、肩部を形成して単結晶の本体引上げを行った。この
ため、本発明例で使用した保持枠および保持治具は全く
使用しなかった。このとき、一次引上および最終引上を
実施し、その結果を表1に示す。
(Comparative Example 3) As in the case of the present invention, a 12 inch diameter (305 m
In m), a total of 30 silicon single crystals with a pulling length of 1000 mm were grown. However, a large diameter single crystal neck (diameter 8 mm, length
200 mm), the shoulder was formed, and the main body of the single crystal was pulled without forming a constricted portion. Therefore, the holding frame and the holding jig used in the example of the present invention were not used at all. At this time, the primary pull-up and the final pull-up were performed, and the results are shown in Table 1.

【0038】[0038]

【表1】 [Table 1]

【0039】表1から明らかなように、比較例1では単
結晶3本の落下が発生し、比較例2では保持治具を使用
しなかったため、ネック部で破損し全ての単結晶が落下
し、さらに、比較例3では落下がなかったものの、大径
のネック部であるため全ての単結晶が有転位化した。こ
れに対し、本発明例では一次引上時に5本の有転位化が
発生したが、最終引上時には全て無転位で引上げられ
た。しかも、引上途中で単結晶の落下はなく、リメルト
操作が可能であるから、育成された単結晶の総無転位長
さは良好な結果を得ることができた。
As is clear from Table 1, in Comparative Example 1, three single crystals dropped, and in Comparative Example 2, no holding jig was used. Further, in Comparative Example 3, although no drop occurred, all single crystals were dislocated due to the large diameter neck portion. On the other hand, in the example of the present invention, five dislocations occurred during the primary pulling, but all of the dislocations were pulled without dislocation at the final pulling. In addition, since the single crystal did not drop during the pulling and the remelting operation was possible, a good result was obtained with respect to the total dislocation-free length of the grown single crystal.

【0040】[0040]

【発明の効果】本発明の単結晶引上方法および装置によ
れば、点接触による応力集中を避けて単結晶のくびれ部
の保持を確実なものとし、さらに有転位化の発生時には
リメルト操作を可能として、大重量の単結晶を引上げる
場合であっても落下事故を発生することなく、単結晶を
効率良く製造することができる。
According to the method and apparatus for pulling a single crystal of the present invention, stress concentration due to point contact can be avoided to ensure the holding of the constricted portion of the single crystal, and the remelting operation can be performed when dislocations occur. It is possible to efficiently manufacture a single crystal without causing a fall accident even when a heavy crystal is pulled.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明方法で用いる単結晶引上装置の全体構成
例を説明する要部断面を示す正面図である。
FIG. 1 is a front view showing a cross section of a main part for explaining an example of the entire configuration of a single crystal pulling apparatus used in a method of the present invention.

【図2】本発明方法で用いる単結晶引上装置の全体構成
例を説明する要部断面を示す側面図である。
FIG. 2 is a side view showing a cross section of a main part for explaining an example of the entire configuration of a single crystal pulling apparatus used in the method of the present invention.

【図3】実施例で使用した保持枠の形状および具体的な
寸法を示す図である
FIG. 3 is a diagram showing the shape and specific dimensions of a holding frame used in an example.

【図4】実施例で使用した保持治具の形状および具体的
な寸法を示す図である
FIG. 4 is a view showing the shape and specific dimensions of a holding jig used in the embodiment.

【図5】実施例で形成した単結晶ネック部、くびれ部お
よび肩部の形状、寸法を示す図である。
FIG. 5 is a view showing shapes and dimensions of a single crystal neck, a constricted portion, and a shoulder formed in an example.

【図6】先願の公開公報で提案された引上装置で使用さ
れる単結晶の把持手段を説明する図である。
FIG. 6 is a view for explaining a means for holding a single crystal used in a pulling up device proposed in the prior application.

【符号の説明】[Explanation of symbols]

1…坩堝、 2…溶融液、 3…単結晶 3a…単結晶シード、 3b…ネック部 3c…増径部、 3d…減径部 3e…くびれ部、 3f…肩部 4…単結晶引上手段、 5…保持枠調整手段 6…保持治具調整手段、 7…シードチャック 8…保持枠、 8a…保持外枠 8b…ワイヤーガイド枠、 8c…治具ガイド枠 8d…固定枠 9…保持治具 9a…保持棒、 9b…横ずれ防止板 38…爪、 39…把持レバー 40…リング DESCRIPTION OF SYMBOLS 1 ... Crucible, 2 ... Melt, 3 ... Single crystal 3a ... Single crystal seed, 3b ... Neck 3c ... Increased diameter part, 3d ... Reduced diameter part 3e ... Constriction part, 3f ... Shoulder part 4 ... Single crystal pulling means 5: holding frame adjusting means 6: holding jig adjusting means 7: seed chuck 8: holding frame, 8a: holding outer frame 8b: wire guide frame, 8c: jig guide frame 8d: fixing frame 9: holding jig 9a: Holding rod, 9b: Side slip prevention plate 38: Claw, 39: Grip lever 40: Ring

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】チョクラルスキー法によって回転させつつ
引き上げることによって結晶を育成させる単結晶引上方
法において、単結晶引上手段によって単結晶の直径を増
加させたのち減少させてくびれ部を形成させ、次いで該
くびれ部を保持枠に遊嵌された一対の保持治具で挟持し
てのち、前記単結晶引上手段と同調して単結晶を引き上
げることを特徴とする単結晶引上方法。
In a single crystal pulling method for growing a crystal by rotating and pulling it by a Czochralski method, a diameter of the single crystal is increased by a single crystal pulling means and then reduced to form a constricted portion. Then, the constricted portion is sandwiched between a pair of holding jigs loosely fitted to a holding frame, and the single crystal is pulled up in synchronization with the single crystal pulling means.
【請求項2】回転されつつ引上げられる単結晶にその直
径を増加させてのち減少させてくびれ部を形成させる単
結晶引上手段と、保持枠を昇降させてその高さを調整す
る保持枠調整手段と、前記保持枠に遊嵌された保持治具
の位置を調整する保持治具調整手段とを具備する単結晶
引上装置であって、前記保持枠調整手段および保持治具
調整手段は単結晶引上手段と同軸に配設され、単結晶の
くびれ部を前記保持枠の下部に設けられた固定枠に支持
された保持治具で挟持して前記単結晶引上手段と同調し
て保持枠および保持治具を引き上げることを特徴とする
単結晶引上装置。
2. A single crystal pulling means for forming a constricted portion by increasing the diameter of a single crystal which is pulled while being rotated and forming a constricted portion, and a holding frame adjusting means for raising and lowering the holding frame to adjust its height. And a holding jig adjusting means for adjusting the position of the holding jig loosely fitted to the holding frame, wherein the holding frame adjusting means and the holding jig adjusting means are The constricted portion of the single crystal is disposed coaxially with the crystal pulling means, and is held in synchronization with the single crystal pulling means by holding a narrow portion of the single crystal by a holding jig supported by a fixed frame provided at a lower portion of the holding frame. A single crystal pulling apparatus characterized by pulling up a frame and a holding jig.
【請求項3】上記保持枠の下部に設けられた固定枠は階
段状に構成され、この保持枠に遊嵌された保持治具の位
置調整はワイヤーの昇降によって行われることを特徴と
する請求項2に記載の単結晶引上装置。
3. A fixing frame provided at a lower portion of the holding frame is formed in a step shape, and a position of the holding jig loosely fitted to the holding frame is adjusted by lifting and lowering a wire. Item 3. A single crystal pulling apparatus according to Item 2.
JP29900796A 1996-11-11 1996-11-11 Method for pulling up single crystal and device therefor Pending JPH10139584A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29900796A JPH10139584A (en) 1996-11-11 1996-11-11 Method for pulling up single crystal and device therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29900796A JPH10139584A (en) 1996-11-11 1996-11-11 Method for pulling up single crystal and device therefor

Publications (1)

Publication Number Publication Date
JPH10139584A true JPH10139584A (en) 1998-05-26

Family

ID=17867033

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29900796A Pending JPH10139584A (en) 1996-11-11 1996-11-11 Method for pulling up single crystal and device therefor

Country Status (1)

Country Link
JP (1) JPH10139584A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021508665A (en) * 2018-01-19 2021-03-11 エスケイ・シルトロン・カンパニー・リミテッド Silicon single crystal growth method and equipment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021508665A (en) * 2018-01-19 2021-03-11 エスケイ・シルトロン・カンパニー・リミテッド Silicon single crystal growth method and equipment
US11332848B2 (en) 2018-01-19 2022-05-17 Sk Siltron Co., Ltd. Silicon single crystal growth method and apparatus

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