JPH10130371A - Adamantanes, thermoplastic resin and thermosetting resin composition containing the same - Google Patents

Adamantanes, thermoplastic resin and thermosetting resin composition containing the same

Info

Publication number
JPH10130371A
JPH10130371A JP30551496A JP30551496A JPH10130371A JP H10130371 A JPH10130371 A JP H10130371A JP 30551496 A JP30551496 A JP 30551496A JP 30551496 A JP30551496 A JP 30551496A JP H10130371 A JPH10130371 A JP H10130371A
Authority
JP
Japan
Prior art keywords
compound
group
formula
bis
adamantane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP30551496A
Other languages
Japanese (ja)
Inventor
Ryoichi Hasegawa
良一 長谷川
Yoshiro Shimamura
芳郎 嶋村
Makiko Kogo
真紀子 古後
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Kayaku Co Ltd
Original Assignee
Nippon Kayaku Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kayaku Co Ltd filed Critical Nippon Kayaku Co Ltd
Priority to JP30551496A priority Critical patent/JPH10130371A/en
Publication of JPH10130371A publication Critical patent/JPH10130371A/en
Pending legal-status Critical Current

Links

Landscapes

  • Sealing Material Composition (AREA)
  • Epoxy Resins (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a new bis(hydroixyphenyl)adamantane useful as a new polymer material excellent in terms of heat resistance, thermal conductivity, refractive index, electric characteristics, etc., and its raw material. SOLUTION: This compound is shown by the formula (X is H or glycidyl; R is an alkyl, an aryl, a halogen, hydroxyl group, glycidyloxy, etc.; with the proviso that when X is H, R is not glycidyloxy and when X is glycidyl, R is not hydroxyl group; (n) is 0-4) such as 2,2-bis(4'-hydroxyphenyl)adamantane. The compound is preferably obtained by reacting 2-adamantanone with a phenol compound such as phenol in the presence of an acid catalyst such as sulfuric acid at 30-180 deg.C. The compound in which X is glycidyl is obtained by reacting the compound of the formula in which X is hydrogen with an epithalohydrin such as epichlorohydrin in the presence of a caustic alkali, etc.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はビス(ヒドロキシフ
ェニル)アダマンタン類、ビス(グリシジルオキシフェ
ニル)アダマンタン類、及びこれらを構成成分とする、
熱可塑性樹脂、及び熱硬化性樹脂に関する。
TECHNICAL FIELD The present invention relates to bis (hydroxyphenyl) adamantanes, bis (glycidyloxyphenyl) adamantanes, and a composition comprising these as a constituent,
It relates to a thermoplastic resin and a thermosetting resin.

【0002】[0002]

【従来の技術】アダマンタン骨格を有する高分子化合物
は、耐熱性が良好であり、例えば、アダマンタンジオ−
ルを用いたポリエステル、ポリカ−ボネ−ト等が知られ
ている。
2. Description of the Related Art A polymer compound having an adamantane skeleton has good heat resistance.
Polyesters and polycarbonates using polyesters are known.

【0003】[0003]

【発明が解決しようとしている課題】本発明は耐熱性、
熱伝導性、屈折率、電気特性、等の点で優れた新規な高
分子材料及びその原料を提供することを目的とする。
SUMMARY OF THE INVENTION The present invention relates to heat resistance,
It is an object of the present invention to provide a novel polymer material excellent in thermal conductivity, refractive index, electrical characteristics, and the like, and a raw material thereof.

【0004】[0004]

【課題を解決するための手段】すなわち本発明は (1)下記式(1)で表されるビス(ヒドロキシフェニ
ル)アダマンタン類
That is, the present invention provides (1) bis (hydroxyphenyl) adamantane represented by the following formula (1):

【0005】[0005]

【化2】 Embedded image

【0006】Rは、それぞれ独立に、アルキル基、アル
キレン基、アラルキル基、アリ−ル基、ハロゲン、アル
コキシ基、水酸基又はグリシジルオキシ基を表す。n
は、0〜4の整数であり置換基Rの数を示す。但し、X
が水素原子のときRは水酸基を、Xがグリシジル基のと
きはグリシジルオキシ基を示す。 (2)式(1)においてXがグリシジル基であるエポキ
シ化合物 (3)式(1)においてXが水素原子である化合物を硬
化剤として用いたエポキシ樹脂組成物 (4)式(1)においてXが水素原子である化合物とX
がグリシジル基である化合物より構成されるエポキシ樹
脂 (5)式(1)においてXがグリシジル基である化合
物、及びまたは(4)に記載のエポキシ樹脂、硬化剤を
含有するエポキシ樹脂組成物 (6)式(1)においてXがグリシジル基である化合
物、及びまたは請求項(4)に記載のエポキシ樹脂、硬
化剤、硬化触媒、無機フィラ−を含有する、電子部品封
止用組成物 (7)(3)に示された組成物および無機フィラ−を含
有する電子部品封止用組成物 を提供する。
R independently represents an alkyl group, an alkylene group, an aralkyl group, an aryl group, a halogen, an alkoxy group, a hydroxyl group or a glycidyloxy group. n
Is an integer of 0 to 4 and represents the number of substituents R. Where X
When R is a hydrogen atom, R represents a hydroxyl group, and when X is a glycidyl group, R represents a glycidyloxy group. (2) Epoxy compound in which X is a glycidyl group in formula (1) (3) Epoxy resin composition using a compound in which X is a hydrogen atom in formula (1) as a curing agent (4) X in formula (1) X is a hydrogen atom and X
(5) An epoxy resin composition containing the compound in which X is a glycidyl group in the formula (1) and / or the epoxy resin described in (4) and a curing agent (6) A composition for sealing electronic components, comprising a compound in which X is a glycidyl group in the formula (1) and / or the epoxy resin, a curing agent, a curing catalyst, and an inorganic filler according to claim (4). An electronic component sealing composition comprising the composition described in (3) and an inorganic filler.

【0007】[0007]

【発明の実施形態】以下本発明を詳細に説明する。本発
明で得られる前記式(1)においてXが水素原子である
化合物の具体例としては、2,2−ビス(4’−ヒドロ
キシフェニル)アダマンタン、2,2−ビス(2’−ヒ
ドロキシフェニル)アダマンタン、2,2−ビス(3’
4’−ジヒドロキシフェニル)アダマンタン、2,2−
ビス(2’4’−ジヒドロキシフェニル)アダマンタ
ン、2,2−ビス(3’,5’−ジメチル−4’−ヒド
ロキシフェニル)アダマンタン、2,2−ビス(3’−
ブロモ−4’−ヒドロキシフェニル)アダマンタン、
2,2−ビス(2’−メチル−4’−ヒドロキシフェニ
ル)アダマンタン、2,2−ビス(3’−メチル−4’
−ヒドロキシフェニル)アダマンタン、2,2−ビス
(3’−t−ブチル−4’−ヒドロキシフェニル)アダ
マンタン、2,2−ビス(3’−t−ブチル−6’−メ
チル−4’−ヒドロキシフェニル)アダマンタン、2,
2−ビス(4’−ヒドロキシ−3’−フェニルフェニ
ル)アダマンタン、前記式(1)においてXがグリシジ
ル基である化合物の具体例としては、、2,2−ビス
(4’−グリシジルオキシフェニル)アダマンタン、
2,2−ビス(2’−グリシジルオキシフェニル)アダ
マンタン、2,2−ビス(3’4’−ジグリシジルオキ
シフェニル)アダマンタン、2,2−ビス(2’4’−
ジグリシジルオキシフェニル)アダマンタン、2,2−
ビス(3’,5’−ジメチル−4’−グリシジルオキシ
フェニル)アダマンタン、2,2−ビス(3’−ブロモ
−4’−グリシジルオキシフェニル)アダマンタン、
2,2−ビス(2’−メチル−4’−グリシジルオキシ
フェニル)アダマンタン、2,2−ビス(3’−メチル
−4’−グリシジルオキシフェニル)アダマンタン、
2,2−ビス(3’−t−ブチル−4’−グリシジルオ
キシフェニル)アダマンタン、2,2−ビス(3’−t
−ブチル−6’−メチル−4’−グリシジルオキシフェ
ニル)アダマンタン、2,2−ビス(4’−グリシジル
オキシ−3’−フェニルフェニル)アダマンタン、等が
あげられるがこれらの具体例に限定されるものではな
い。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail. Specific examples of the compound in which X is a hydrogen atom in the formula (1) obtained in the present invention include 2,2-bis (4′-hydroxyphenyl) adamantane and 2,2-bis (2′-hydroxyphenyl) Adamantane, 2,2-bis (3 '
4'-dihydroxyphenyl) adamantane, 2,2-
Bis (2′4′-dihydroxyphenyl) adamantane, 2,2-bis (3 ′, 5′-dimethyl-4′-hydroxyphenyl) adamantane, 2,2-bis (3′-
Bromo-4′-hydroxyphenyl) adamantane,
2,2-bis (2'-methyl-4'-hydroxyphenyl) adamantane, 2,2-bis (3'-methyl-4 '
-Hydroxyphenyl) adamantane, 2,2-bis (3'-t-butyl-4'-hydroxyphenyl) adamantane, 2,2-bis (3'-t-butyl-6'-methyl-4'-hydroxyphenyl Adamantane, 2,
Specific examples of 2-bis (4′-hydroxy-3′-phenylphenyl) adamantane and the compound in which X in the above formula (1) is a glycidyl group include 2,2-bis (4′-glycidyloxyphenyl) Adamantane,
2,2-bis (2'-glycidyloxyphenyl) adamantane, 2,2-bis (3'4'-diglycidyloxyphenyl) adamantane, 2,2-bis (2'4'-
Diglycidyloxyphenyl) adamantane, 2,2-
Bis (3 ′, 5′-dimethyl-4′-glycidyloxyphenyl) adamantane, 2,2-bis (3′-bromo-4′-glycidyloxyphenyl) adamantane,
2,2-bis (2′-methyl-4′-glycidyloxyphenyl) adamantane, 2,2-bis (3′-methyl-4′-glycidyloxyphenyl) adamantane,
2,2-bis (3′-t-butyl-4′-glycidyloxyphenyl) adamantane, 2,2-bis (3′-t
-Butyl-6'-methyl-4'-glycidyloxyphenyl) adamantane, 2,2-bis (4'-glycidyloxy-3'-phenylphenyl) adamantane, and the like, but are not limited to these specific examples. Not something.

【0008】上記式(1)においてXが水素原子である
化合物はリエステル、ポリウレタン、ポリカーボネート
等の原料として用いることができ又エポキシ樹脂の硬化
剤として好適に用いることが出来る。この際に使用でき
るエポキシ樹脂としては、例えばクレゾ−ルノボラック
型のエポキシ樹脂、フェノ−ルノボラック型エポキシ樹
脂、ビスフェノ−ル型エポキシ樹脂、3,3’5,5’
−テトラメチルビフェノ−ルのエポキシ化物、ナフタレ
ン基含有のエポキシ化物、トリスフェノ−ル系エポキシ
樹脂等が用いられる。また、シリカ、アルミナ、チッカ
アルミニウム等の無機フィラ−と上記組成物を含有する
封止剤は電子部品の封止用に用いることが出来る。硬化
剤として他の一般的に知られた硬化剤、例えば多価フェ
ノ−ル化合物、酸無水物類、アミン類等と組み合わせて
使用することが出来る。
In the above formula (1), the compound in which X is a hydrogen atom can be used as a raw material for esters, polyurethanes, polycarbonates and the like and can be suitably used as a curing agent for epoxy resins. Epoxy resins that can be used at this time include, for example, cresol novolak type epoxy resin, phenol novolak type epoxy resin, bisphenol type epoxy resin, 3,3'5,5 '
Epoxidized tetramethylbiphenol, epoxidized naphthalene group, and trisphenol-based epoxy resin. In addition, a sealing agent containing an inorganic filler such as silica, alumina, or titanium aluminum and the above composition can be used for sealing electronic components. As the curing agent, it can be used in combination with other generally known curing agents such as polyhydric phenol compounds, acid anhydrides and amines.

【0009】式(1)においてXがグリシジル基である
エポキシ化合物、2のエポキシ化合物と式(1)におい
てXが水素原子である化合物より構成されるエポキシ樹
脂は、硬化剤と組み合わせることにより硬化性組成物と
することが出来る。この際用いられる硬化剤としては、
フェノ−ルノボラック、クレゾ−ルノボラック、ザイロ
ックの商品名で知られるようなアラルキレンフェノ−ル
樹脂、ナフタレンジオ−ル、ビスフェノ−ル類、ビフェ
ノ−ル類、ジシクロペンタジエンフェノ−ル樹脂、等の
多価フェノ−ル類、メチルナジック酸、無水フタル酸、
テトラヒドロフタル酸無水物、等の酸無水物、ジアミノ
ジフェニルメタン、ジアミノジフェニルスルフォン、エ
チレンジアミン、トリエチレンテトラミン等アミン類、
ジシアンジアミド等のアミド類、等が使用できる。使用
量は特に制限はないが、エポキシ樹脂と等当量とするの
が好ましい。この際に、イミダゾ−ル系、フォスフィン
系、第三級アミン系の硬化触媒を使用するのが好まし
い。
An epoxy resin composed of an epoxy compound of the formula (1) wherein X is a glycidyl group, an epoxy compound of the formula (2) and a compound of the formula (1) wherein X is a hydrogen atom can be cured by combining with a curing agent. It can be a composition. As the curing agent used at this time,
Phenol novolac, cresol novolak, aralkylene phenol resins known under the trade names of Xyloc, naphthalene diol, bisphenols, biphenols, dicyclopentadiene phenol resin, etc. Phenols, methylnadic acid, phthalic anhydride,
Acid anhydrides such as tetrahydrophthalic anhydride, diaminodiphenylmethane, diaminodiphenylsulfone, ethylenediamine, amines such as triethylenetetramine,
Amides such as dicyandiamide can be used. The amount used is not particularly limited, but is preferably equivalent to the epoxy resin. In this case, it is preferable to use an imidazole-based, phosphine-based, or tertiary amine-based curing catalyst.

【0010】上記組成物を得るためには、クレゾ−ルノ
ボラック型のエポキシ樹脂、フェノ−ルノボラック型エ
ポキシ樹脂、ビスフェノ−ル型エポキシ樹脂、3,3’
5,5’−テトラメチルビフェノ−ルのエポキシ化物、
ナフタレン基含有のエポキシ化物、トリスフェノ−ル系
エポキシ樹脂等を併用することが可能である。耐熱性の
向上には顕著な効果がある。
In order to obtain the above composition, a cresol novolak type epoxy resin, a phenol novolak type epoxy resin, a bisphenol type epoxy resin, 3,3 ′
Epoxidized 5,5′-tetramethylbiphenol,
An epoxidized product containing a naphthalene group, a trisphenol-based epoxy resin, or the like can be used in combination. There is a remarkable effect in improving the heat resistance.

【0011】上記組成物を用いて電子部品封止用組成物
とするためには無機フィラ−を充填するのが望ましい。
この際用いられる無機フィラ−としては、球状、破砕
状、等の形状を有し、0.1〜100μmの平均粒径を
有する、シリカ、アルミナ、チッカアルミニウム等が使
用できる。その含有量は、組成物全体の60〜95%が
適当であり、特に75〜90%程度が好ましい。
In order to use the above composition as a composition for sealing electronic parts, it is desirable to fill an inorganic filler.
As the inorganic filler used at this time, silica, alumina, titanium aluminum or the like having a spherical, crushed, or the like shape and having an average particle size of 0.1 to 100 μm can be used. The content is suitably 60 to 95% of the whole composition, and particularly preferably about 75 to 90%.

【0012】上記式(1)の化合物の製法について述べ
る。2−アダマンタノンを酸触媒の存在下フェノ−ル化
合物と反応させて得ることが出来る。この際用いるフェ
ノ−ル化合物としては、フェノ−ル、クレゾ−ル類、キ
シレノ−ル類、ブロモフェノ−ル類、ジブロモフェノ−
ル類、クロロフェノ−ル類、アルキルフェノ−ル類、ジ
ヒドロキシベンゼン類、ビスフェノ−ル類、ビフェノ−
ル類等が使用できる。フェノ−ル化合物の使用量は、2
−アダマンタノンの2倍モル以上、好ましくは2〜10
倍モルと過剰に用いるのが好ましい。酸触媒としては、
塩酸、硫酸、リン酸、ポリリン酸、フッ酸、トルエンス
ルフォン酸、メタンスルホン酸、トリフルオロ酢酸、塩
化アルミニウム、塩化鉄、三フッ化ホウ素、等が使用で
きる。その使用量は2−アダマンタノンの0.01重量
%から20重量倍である。特に酸触媒の使用量によって
大きな影響を受けない。また、固体酸触媒を用いて気相
反応させることもできる。反応温度は通常10〜200
℃好ましくは30〜180℃である。
The method for producing the compound of the above formula (1) will be described. It can be obtained by reacting 2-adamantanone with a phenol compound in the presence of an acid catalyst. Phenol compounds used in this case include phenol, cresols, xylenols, bromophenols, and dibromophenol.
, Chlorophenols, alkylphenols, dihydroxybenzenes, bisphenols, biphenols
Can be used. The amount of the phenol compound used is 2
-At least twice as much as adamantanone, preferably 2 to 10
It is preferably used in a molar excess of twice. As the acid catalyst,
Hydrochloric acid, sulfuric acid, phosphoric acid, polyphosphoric acid, hydrofluoric acid, toluenesulfonic acid, methanesulfonic acid, trifluoroacetic acid, aluminum chloride, iron chloride, boron trifluoride, and the like can be used. The amount used is from 0.01% by weight to 20% by weight of 2-adamantanone. In particular, it is not significantly affected by the amount of the acid catalyst used. In addition, a gas phase reaction can be performed using a solid acid catalyst. The reaction temperature is usually 10 to 200
° C, preferably 30 to 180 ° C.

【0013】反応終了後は、酸触媒を中和や水洗によっ
て除去する。過剰のフェノ−ル類は蒸留によって、また
は溶剤に溶解して除去する。生成した目的物は、再結晶
等により精製することが出来る。
After completion of the reaction, the acid catalyst is removed by neutralization or washing with water. Excess phenols are removed by distillation or dissolved in a solvent. The produced target product can be purified by recrystallization or the like.

【0014】また、式(1)においてXがグリシジル基
である化合物は常法により、式(1)においてXが水素
原子の化合物より、苛性アルカリ、炭酸アルカリ等を用
いて、エピクロロヒドリン等のエピハロヒドリンと反応
させ製造することができる。式(1)においてXが水素
原子とエピハロヒドリンの使用割合は通常1:1〜1:
5である。この際、若干(5〜10%)、高分子化合物
も生成する。これは上記した、式(1)においてXが水
素原子である化合物とXがグリシジル基である化合物よ
り構成されるエポキシ樹脂に相当する。苛性アルカリと
しては、苛性ソ−ダ、苛性カリ、水酸化リチウム、等が
あげられ、炭酸アルカリとしては、炭酸ソ−ダ、炭酸カ
リ、重曹、等が使用できる。その使用量は水酸基と等当
量か若干過剰が好ましい。エピハロヒドリンの使用量
は、水酸基と等当量〜15倍当量用いるのが良い。
In the formula (1), the compound in which X is a glycidyl group can be prepared by a conventional method, using a compound of formula (1) in which X is a hydrogen atom, such as epichlorohydrin, using caustic alkali or alkali carbonate. By reacting with epihalohydrin. In the formula (1), X is a hydrogen atom and an epihalohydrin usually in a ratio of 1: 1 to 1:
5 At this time, a high molecular compound is also slightly generated (5 to 10%). This corresponds to the above-described epoxy resin composed of a compound in which X is a hydrogen atom and a compound in which X is a glycidyl group in the formula (1). Examples of the caustic alkali include caustic soda, caustic potash, lithium hydroxide, and the like, and examples of the alkali carbonate include soda carbonate, potash carbonate, baking soda, and the like. It is preferable that the used amount is equivalent to the hydroxyl group or slightly excessive. The amount of epihalohydrin used is preferably equivalent to the hydroxyl group to 15 times equivalent.

【0015】この際、メタノ−ル、エタノ−ル、イソプ
ロパノ−ル、ブタノ−ル、メトキシエタノ−ル、等のア
ルコ−ル類、ジオキサン、ジグライム、ジブチルエ−テ
ル、THF等のエ−テル類、ジメチルフォルムアミド、
ジメチルスルフォキシド、ジメチルイミダゾリジノン等
の非プロトン性極性溶媒、アセトン、メチルエチルケト
ン、メチルイソブチルケトン等のケトン系溶媒を使用す
ることが出来る。その使用量は、エピクロロヒドリンに
対して、0.05重量倍から50重量倍、好ましくは
0.1〜20重量倍である。相関移動触媒を使用するこ
とも可能である。
At this time, alcohols such as methanol, ethanol, isopropanol, butanol and methoxyethanol, ethers such as dioxane, diglyme, dibutyl ether and THF, Dimethylformamide,
An aprotic polar solvent such as dimethylsulfoxide and dimethylimidazolidinone, and a ketone-based solvent such as acetone, methyl ethyl ketone and methyl isobutyl ketone can be used. The amount used is 0.05 to 50 times, preferably 0.1 to 20 times the weight of epichlorohydrin. It is also possible to use a phase transfer catalyst.

【0016】反応温度は10〜120℃が良く、30〜
90℃が特に好ましい。式(1)においてXが水素原子
である化合物、エピハロヒドリン、所望により上記の有
機溶媒、相関移動触媒を撹拌している中に、上記のアル
カリ性物質をそのままないしは水溶液として徐々に添加
していくのが望ましい。系内の水は共沸脱水により追い
出すことが好ましい。反応時間は1〜10時間で実施で
きる。反応終了後は使用した、有機溶媒、エピクロロヒ
ドリン、を回収し、析出する副生物の塩を濾過等の方法
により分離する。または、水洗により除去する。この際
に、あらたに溶媒を添加することもできる。この際は、
芳香族炭化水素、ケトン系溶媒、エ−テル系溶媒、等で
水に溶解しないものが好ましい。
The reaction temperature is preferably from 10 to 120 ° C.,
90 ° C. is particularly preferred. In the formula (1), while the compound in which X is a hydrogen atom, epihalohydrin, the above-mentioned organic solvent, and the phase transfer catalyst are optionally stirred, the above-mentioned alkaline substance is gradually added as it is or as an aqueous solution. desirable. It is preferable that water in the system is driven out by azeotropic dehydration. The reaction time can be from 1 to 10 hours. After the completion of the reaction, the used organic solvent and epichlorohydrin are recovered, and a salt of a by-product precipitated is separated by a method such as filtration. Or, it is removed by washing with water. At this time, a solvent can be newly added. In this case,
Aromatic hydrocarbons, ketone solvents, ether solvents, and the like that are not soluble in water are preferred.

【0017】塩類を除去し終わった後、溶媒を留去した
り、貧溶媒の添加、冷却等により目的物を析出させ、取
り出すことが出来る。
After removing the salts, the desired product can be precipitated and removed by distilling off the solvent, adding a poor solvent, cooling or the like.

【実施例】以下実施例で本発明を更に詳細に説明する
が、本発明はこれらの実施例に限定されるものではな
い。
EXAMPLES The present invention will be described in more detail with reference to the following examples, but the present invention is not limited to these examples.

【0018】実施例1 500ml、4口フラスコに、2−アダマンタノンを5
0g、フェノ−ルを150g、濃塩酸を150ml加え
て80℃とし、16時間反応させた。反応終了後、下層
を抜き出し、上層を残した。ここにトルエンを200m
l加えた。生成している沈殿を濾別し、アセトンで洗浄
後水洗し、乾燥した。25.3gの2,2−ビス(4’
−ヒドロキシフェニル)アダマンタンの白色結晶を得
た。このものの融点は321℃であった。13C−NM
Rスペクトルは図1の様であった。
Example 1 In a 500 ml, four-necked flask, 5-adamantanone was added.
0 g, 150 g of phenol and 150 ml of concentrated hydrochloric acid were added thereto, and the mixture was heated to 80 ° C. and reacted for 16 hours. After completion of the reaction, the lower layer was withdrawn, leaving the upper layer. 200m of toluene here
l was added. The formed precipitate was separated by filtration, washed with acetone, washed with water, and dried. 25.3 g of 2,2-bis (4 ′
White crystals of (-hydroxyphenyl) adamantane were obtained. Its melting point was 321 ° C. 13C-NM
The R spectrum was as shown in FIG.

【0019】実施例2 100ml、4口フラスコに、2,2−ビス(4’−ヒ
ドロキシフェニル)アダマンタン14g、エピクロロヒ
ドリン32.4g、ジメチルスルフォキシドを40g、
メチルイソブチルケトンを20g、水0.4gを仕込み
45℃に昇温した。ここにフレ−ク状苛性ソ−ダ、3.
5gを少量ずつ1.5時間に亘り添加した。添加終了後
反応温度を65℃に上げ、65〜75℃にて4時間反応
させた。反応終了後冷却し、ここに水50ml、メチル
イゾブチルケトン50gを添加した。水層を除去した
後、若干存在する不溶物を濾別し、メチルイソブチルケ
トンを留去した。17.1gの2,2−ビス(4’−グ
リシジルオキシフェニル)アダマンタンが白色結晶とし
て得られた。目的物の融点は、160℃であった。エポ
キシ当量は217であり理論値216とほぼ一致した。
1H−NMR−スペクトルを図2に示す。またこのもの
のアッベ屈折率は25℃において1.6であった。
Example 2 In a 100 ml, four-necked flask, 14 g of 2,2-bis (4'-hydroxyphenyl) adamantane, 32.4 g of epichlorohydrin, 40 g of dimethyl sulfoxide,
20 g of methyl isobutyl ketone and 0.4 g of water were charged and heated to 45 ° C. Here, flaky caustic soda;
5 g were added in small portions over 1.5 hours. After completion of the addition, the reaction temperature was raised to 65 ° C, and the reaction was carried out at 65 to 75 ° C for 4 hours. After the completion of the reaction, the mixture was cooled, and 50 ml of water and 50 g of methylisobutyl ketone were added thereto. After removing the aqueous layer, some insolubles were removed by filtration, and methyl isobutyl ketone was distilled off. 17.1 g of 2,2-bis (4′-glycidyloxyphenyl) adamantane was obtained as white crystals. The melting point of the target product was 160 ° C. The epoxy equivalent was 217, which almost coincided with the theoretical value of 216.
FIG. 2 shows the 1 H-NMR spectrum. The Abbe refractive index of this product was 1.6 at 25 ° C.

【0020】[0020]

【実施例3】実施例2で得られたエポキシ化合物を1
g、フェノ−ルノボラック(軟化点83℃、水酸基当
量)を0.45g、トリフェニルフォスフィンを0.0
1g取り、180℃で良く混合した後、180℃で5時
間反応させ硬化物を得た。これを微粉砕し、DSC測定
を行い、吸熱開始と終了の中間点よりTgを求めた。T
gは185℃であった。
Example 3 The epoxy compound obtained in Example 2 was replaced with 1
g, 0.45 g of phenol-novolak (softening point: 83 ° C., hydroxyl equivalent) and 0.03 g of triphenylphosphine.
After taking 1 g and mixing well at 180 ° C., the mixture was reacted at 180 ° C. for 5 hours to obtain a cured product. This was pulverized and subjected to DSC measurement, and Tg was determined from the intermediate point between the start and end of the endotherm. T
g was 185 ° C.

【0021】[0021]

【発明の効果】本発明によれば2,2−ビス(ヒドロキ
シフェニル)アダマンタン類、2,2−ビス(グリシジ
ルオキシフェニル)アダマンタン類が新しく提供され
た。またこれらは、ポリカ−ボネ−ト、ポリエステル、
ポリウレタン、エポキシ化合物または樹脂、に使用で
き、特にエポキシ化合物または樹脂は電子材料用組成物
として有用である。
According to the present invention, 2,2-bis (hydroxyphenyl) adamantane and 2,2-bis (glycidyloxyphenyl) adamantane are newly provided. These are polycarbonates, polyesters,
It can be used for polyurethane, epoxy compounds or resins, and especially epoxy compounds or resins are useful as compositions for electronic materials.

【図面の簡単な説明】[Brief description of the drawings]

【図1】実施例1で得られた2,2−ビス(4’−ヒド
ロキシフェニル)アダマンタンの13C−NMRスペク
トル
FIG. 1 is a 13 C-NMR spectrum of 2,2-bis (4′-hydroxyphenyl) adamantane obtained in Example 1.

【図2】実施例2で得られた2,2−ビス(4’−グリ
シジルオキシフェニル)アダマンタンの1H−NMRス
ペクトル
FIG. 2 is a 1H-NMR spectrum of 2,2-bis (4′-glycidyloxyphenyl) adamantane obtained in Example 2.

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】下記式(1)で表されるビス(ヒドロキシ
フェニル)アダマンタン類 【化1】 (式中Xは水素原子又はグリシジル基を表す。但し、X
が水素原子のときRはグリシジルオキシ基を含まず又、
Xがグリシジル基のときRは水酸基を含まない。Rは、
それぞれ独立にアルキル基、アルキレン基、アラルキル
基、アリ−ル基、ハロゲン、アルコキシ基、水酸基又は
グリシジルオキシ基を表す。nは、0〜4の整数であり
置換基Rの数を示す。)
A bis (hydroxyphenyl) adamantane represented by the following formula (1): (Wherein X represents a hydrogen atom or a glycidyl group, provided that X is
Is a hydrogen atom, R does not contain a glycidyloxy group,
When X is a glycidyl group, R does not include a hydroxyl group. R is
Each independently represents an alkyl group, an alkylene group, an aralkyl group, an aryl group, a halogen, an alkoxy group, a hydroxyl group or a glycidyloxy group. n is an integer of 0 to 4 and represents the number of substituents R. )
【請求項2】式(1)においてXがグリシジル基である
請求項1のエポキシ化合物
2. The epoxy compound according to claim 1, wherein X in the formula (1) is a glycidyl group.
【請求項3】式(1)においてXが水素原子である化合
物を硬化剤として用いたエポキシ樹脂組成物
3. An epoxy resin composition using a compound of the formula (1) wherein X is a hydrogen atom as a curing agent.
【請求項4】式(1)においてXが水素原子である化合
物とXがグリシジル基である化合物より構成されるエポ
キシ樹脂
4. An epoxy resin comprising a compound of the formula (1) wherein X is a hydrogen atom and a compound wherein X is a glycidyl group.
【請求項5】式(1)においてXがグリシジル基である
化合物、及びまたは請求項4に記載のエポキシ樹脂、硬
化剤を含有するエポキシ樹脂組成物
5. An epoxy resin composition comprising the compound of the formula (1) wherein X is a glycidyl group, and / or the epoxy resin according to claim 4 and a curing agent.
【請求項6】式(1)においてXがグリシジル基である
化合物、及びまたは請求項4に記載のエポキシ樹脂、硬
化剤、硬化触媒、無機フィラ−を含有する、電子部品封
止用組成物
6. A composition for sealing electronic components, comprising a compound in which X is a glycidyl group in the formula (1) and / or the epoxy resin, curing agent, curing catalyst and inorganic filler according to claim 4.
【請求項7】請求項3に示された組成物、無機フィラ−
を含有する電子部品封止用組成物
7. The composition according to claim 3, wherein the composition comprises an inorganic filler.
COMPOSITION FOR SEALING ELECTRONIC COMPONENTS CONTAINING
JP30551496A 1996-11-01 1996-11-01 Adamantanes, thermoplastic resin and thermosetting resin composition containing the same Pending JPH10130371A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30551496A JPH10130371A (en) 1996-11-01 1996-11-01 Adamantanes, thermoplastic resin and thermosetting resin composition containing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30551496A JPH10130371A (en) 1996-11-01 1996-11-01 Adamantanes, thermoplastic resin and thermosetting resin composition containing the same

Publications (1)

Publication Number Publication Date
JPH10130371A true JPH10130371A (en) 1998-05-19

Family

ID=17946079

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30551496A Pending JPH10130371A (en) 1996-11-01 1996-11-01 Adamantanes, thermoplastic resin and thermosetting resin composition containing the same

Country Status (1)

Country Link
JP (1) JPH10130371A (en)

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1336597A1 (en) * 2002-02-15 2003-08-20 Honshu Chemical Industry Co., Ltd. Hydroxyphenyl adamantanes and process for the production of the same
US6849696B2 (en) * 2000-04-07 2005-02-01 Honeywell International Inc. Low dielectric constant organic dielectrics based on cage-like structures
WO2006077862A1 (en) * 2005-01-24 2006-07-27 Idemitsu Kosan Co., Ltd. Epoxy resin composition and optical material using same
JP2006307063A (en) * 2005-04-28 2006-11-09 Idemitsu Kosan Co Ltd Epoxy resin composition and optoelectronic member using the same
WO2007010784A1 (en) * 2005-07-15 2007-01-25 Idemitsu Kosan Co., Ltd. Fluoroadamantane derivative, resin composition containing the same, and optical electron member using the resin composition
WO2007026828A1 (en) 2005-09-01 2007-03-08 Idemitsu Kosan Co., Ltd. Adamantane derivative, resin composition containing same, and optoelectronic component using same
WO2007029598A1 (en) 2005-09-05 2007-03-15 Idemitsu Kosan Co., Ltd. Adamantane derivative, epoxy resin, and optical electronic member using resin composition comprising them
WO2007086324A1 (en) * 2006-01-27 2007-08-02 Idemitsu Kosan Co., Ltd. Adamantane derivative, resin composition containing same, and optoelectronic member and sealing agent for electronic circuit using those
WO2007094173A1 (en) 2006-02-17 2007-08-23 Idemitsu Kosan Co., Ltd. Adamantane derivative, composition comprising the derivative, and optical and electronic member using the composition
WO2007116967A1 (en) * 2006-04-10 2007-10-18 Mitsubishi Gas Chemical Company, Inc. Bisphenol compound and method for producing same
WO2007125890A1 (en) * 2006-04-28 2007-11-08 Idemitsu Kosan Co., Ltd. Adamantyl group-containing epoxy-modified (meth)acrylate and resin composition containing the same
JP2008120697A (en) * 2006-11-08 2008-05-29 Idemitsu Kosan Co Ltd Adamantyl succinic acid anhydride
JP2008174456A (en) * 2007-01-16 2008-07-31 Idemitsu Kosan Co Ltd Adamanthylcarbonyl group-containing aromatic diol, its derivative and methods for producing these
WO2008129986A1 (en) * 2007-04-20 2008-10-30 Mitsubishi Chemical Corporation Colored resin composition, color filter, liquid crystal display device, and organic el display
US7456323B2 (en) 2005-06-17 2008-11-25 Honshu Chemical Industry Co., Ltd. 1,3-bis(3-formyl-4-hydroxyphenyl)adamantanes and polynuclear polyphenols derived therefrom
WO2009041204A1 (en) 2007-09-28 2009-04-02 Konica Minolta Opto, Inc. Method for manufacturing optical device
WO2009116448A1 (en) 2008-03-19 2009-09-24 コニカミノルタオプト株式会社 Method for producing molded body or wafer lens
WO2009116371A1 (en) 2008-03-19 2009-09-24 コニカミノルタオプト株式会社 Method for producing wafer lens
WO2011136138A1 (en) 2010-04-27 2011-11-03 コニカミノルタオプト株式会社 Image capture lens, wafer lens, wafer lens laminate, method of manufacturing image capture lens, image capture lens intermediate product, method of manufacturing image capture lens intermediate product
JP2013075998A (en) * 2011-09-30 2013-04-25 Idemitsu Kosan Co Ltd Composition including adamantane derivative and fiber-reinforced composite material
JP2017524698A (en) * 2014-07-22 2017-08-31 サビック グローバル テクノロジーズ ベスローテン フェンノートシャップ High heat-resistant monomer and method of using the same
JP2019210223A (en) * 2018-05-31 2019-12-12 大阪ガスケミカル株式会社 Curable composition and its cured product

Cited By (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6849696B2 (en) * 2000-04-07 2005-02-01 Honeywell International Inc. Low dielectric constant organic dielectrics based on cage-like structures
US6720460B2 (en) 2002-02-15 2004-04-13 Honshu Chemical Industry Co., Ltd. Hydroxyphenyl adamantanes and process for the production of the same
EP1336597A1 (en) * 2002-02-15 2003-08-20 Honshu Chemical Industry Co., Ltd. Hydroxyphenyl adamantanes and process for the production of the same
WO2006077862A1 (en) * 2005-01-24 2006-07-27 Idemitsu Kosan Co., Ltd. Epoxy resin composition and optical material using same
JP2006307063A (en) * 2005-04-28 2006-11-09 Idemitsu Kosan Co Ltd Epoxy resin composition and optoelectronic member using the same
US7456323B2 (en) 2005-06-17 2008-11-25 Honshu Chemical Industry Co., Ltd. 1,3-bis(3-formyl-4-hydroxyphenyl)adamantanes and polynuclear polyphenols derived therefrom
WO2007010784A1 (en) * 2005-07-15 2007-01-25 Idemitsu Kosan Co., Ltd. Fluoroadamantane derivative, resin composition containing the same, and optical electron member using the resin composition
WO2007026828A1 (en) 2005-09-01 2007-03-08 Idemitsu Kosan Co., Ltd. Adamantane derivative, resin composition containing same, and optoelectronic component using same
WO2007029598A1 (en) 2005-09-05 2007-03-15 Idemitsu Kosan Co., Ltd. Adamantane derivative, epoxy resin, and optical electronic member using resin composition comprising them
WO2007086324A1 (en) * 2006-01-27 2007-08-02 Idemitsu Kosan Co., Ltd. Adamantane derivative, resin composition containing same, and optoelectronic member and sealing agent for electronic circuit using those
US8084650B2 (en) 2006-01-27 2011-12-27 Idemitsu Kosan Co., Ltd. Adamantane derivative, resin composition containing same, and optoelectronic member and sealing agent for electronic circuit using those
JP5122982B2 (en) * 2006-01-27 2013-01-16 出光興産株式会社 ADAMANTAN DERIVATIVE, RESIN COMPOSITION CONTAINING THE SAME, OPTICAL ELECTRONIC MEMBER USING THEM, AND ELECTRONIC CIRCUIT SEALING AGENT
WO2007094173A1 (en) 2006-02-17 2007-08-23 Idemitsu Kosan Co., Ltd. Adamantane derivative, composition comprising the derivative, and optical and electronic member using the composition
JPWO2007094173A1 (en) * 2006-02-17 2009-07-02 出光興産株式会社 ADAMANTAN DERIVATIVE, COMPOSITION CONTAINING THE SAME, AND OPTICAL ELECTRONIC MEMBER USING THE COMPOSITION
US7960483B2 (en) 2006-02-17 2011-06-14 Idemitsu Kosan Co., Ltd. Adamantane derivative, composition comprising the derivative, and optical and electronic member using the composition
WO2007116967A1 (en) * 2006-04-10 2007-10-18 Mitsubishi Gas Chemical Company, Inc. Bisphenol compound and method for producing same
JP5123171B2 (en) * 2006-04-28 2013-01-16 出光興産株式会社 Adamantyl group-containing epoxy-modified (meth) acrylate and resin composition containing the same
WO2007125890A1 (en) * 2006-04-28 2007-11-08 Idemitsu Kosan Co., Ltd. Adamantyl group-containing epoxy-modified (meth)acrylate and resin composition containing the same
US8017800B2 (en) 2006-04-28 2011-09-13 Idemitsu Kosan Co., Ltd. Adamantyl group-containing epoxy-modified (meth)acrylate and resin composition containing the same
US7790917B2 (en) 2006-04-28 2010-09-07 Idemitsu Kosan Co., Ltd. Adamantyl group-containing epoxy-modified (meth)acrylate and resin composition containing the same
JP2008120697A (en) * 2006-11-08 2008-05-29 Idemitsu Kosan Co Ltd Adamantyl succinic acid anhydride
JP2008174456A (en) * 2007-01-16 2008-07-31 Idemitsu Kosan Co Ltd Adamanthylcarbonyl group-containing aromatic diol, its derivative and methods for producing these
JP2008287246A (en) * 2007-04-20 2008-11-27 Mitsubishi Chemicals Corp Colored resin composition, color filter, liquid crystal display device, and organic el display
WO2008129986A1 (en) * 2007-04-20 2008-10-30 Mitsubishi Chemical Corporation Colored resin composition, color filter, liquid crystal display device, and organic el display
KR101434275B1 (en) * 2007-04-20 2014-08-27 미쓰비시 가가꾸 가부시키가이샤 Colored resin composition, color filter, liquid crystal display device, and organic el dispaly
WO2009041204A1 (en) 2007-09-28 2009-04-02 Konica Minolta Opto, Inc. Method for manufacturing optical device
WO2009116371A1 (en) 2008-03-19 2009-09-24 コニカミノルタオプト株式会社 Method for producing wafer lens
WO2009116448A1 (en) 2008-03-19 2009-09-24 コニカミノルタオプト株式会社 Method for producing molded body or wafer lens
EP2759395A1 (en) 2008-03-19 2014-07-30 Konica Minolta Opto, Inc. Method for producing a wafer lens
WO2011136138A1 (en) 2010-04-27 2011-11-03 コニカミノルタオプト株式会社 Image capture lens, wafer lens, wafer lens laminate, method of manufacturing image capture lens, image capture lens intermediate product, method of manufacturing image capture lens intermediate product
EP2752687A1 (en) 2010-04-27 2014-07-09 Konica Minolta Opto, Inc. Image capture lens, wafer lens, wafer lens laminate, method of manufacturing image capture lens, image capture lens intermediate product, method of manufacturing image capture lens intermediate product
JP2013075998A (en) * 2011-09-30 2013-04-25 Idemitsu Kosan Co Ltd Composition including adamantane derivative and fiber-reinforced composite material
JP2017524698A (en) * 2014-07-22 2017-08-31 サビック グローバル テクノロジーズ ベスローテン フェンノートシャップ High heat-resistant monomer and method of using the same
US10870724B2 (en) 2014-07-22 2020-12-22 Sabic Global Technologies B.V. High heat monomers and methods of use thereof
JP2019210223A (en) * 2018-05-31 2019-12-12 大阪ガスケミカル株式会社 Curable composition and its cured product

Similar Documents

Publication Publication Date Title
JPH10130371A (en) Adamantanes, thermoplastic resin and thermosetting resin composition containing the same
JP5262389B2 (en) Epoxy resin, epoxy resin composition and cured product thereof
JPS643217B2 (en)
JP2001064340A (en) 4,4'-biphenydiyldimethylene-phenolic resin epoxy resin, epoxy resin composition, and its cured product
EP0415790B1 (en) Naphthol-based epoxy resins, process for preparing the same, and epoxy resin compositions containing the same
JP2003201333A (en) Epoxy resin composition, cured product thereof, novel epoxy resin, novel phenol compound, and method for producing the same
JP3497560B2 (en) Method for producing modified epoxy resin, modified epoxy resin produced, and composition of this epoxy resin
US20160311967A1 (en) Epoxy resin, method for producing the same, epoxy resin composition, and cured product thereof
CA1246089A (en) Glycidyl compound and process for preparing the same
JP2001329044A (en) Epoxy resin composition and its cured product
US4954603A (en) Epoxy resin
JP3573530B2 (en) Epoxy resin mixture, epoxy resin composition and cured product thereof
JP3021148B2 (en) Epoxy resin, resin composition and cured product
EP0244119A2 (en) Epoxy resins prepared from trisphenols and dicyclopentadiene
US3920683A (en) Diglycidyloxyalkyl compounds
JP3636409B2 (en) Phenolic resins, epoxy resins, epoxy resin compositions and cured products thereof
JPH04255714A (en) Polyfunctional epoxy resin and its production
JPH1180316A (en) Modified epoxy resin, epoxy resin composition and its cured product
JP2823455B2 (en) New epoxy resin and method for producing the same
JPH11166038A (en) Alkyl-substituted polyphenols, epoxy resin and epoxy resin composition containing the same
JPH09278868A (en) Trifunctional epoxy resin
JP2004346115A (en) Epoxy resin, epoxy resin composition and cured product
JP4899257B2 (en) Phenol resin, epoxy resin, epoxy resin composition and cured product thereof.
JP2823056B2 (en) Epoxy resin composition and cured product thereof
JP4186153B2 (en) Epoxy resin composition, cured product thereof, semiconductor sealing material, and resin composition for electronic circuit board