JPH1012541A5 - - Google Patents

Info

Publication number
JPH1012541A5
JPH1012541A5 JP1996179879A JP17987996A JPH1012541A5 JP H1012541 A5 JPH1012541 A5 JP H1012541A5 JP 1996179879 A JP1996179879 A JP 1996179879A JP 17987996 A JP17987996 A JP 17987996A JP H1012541 A5 JPH1012541 A5 JP H1012541A5
Authority
JP
Japan
Prior art keywords
photosensitive substrate
exposure
mask
light
amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP1996179879A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1012541A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP8179879A priority Critical patent/JPH1012541A/ja
Priority claimed from JP8179879A external-priority patent/JPH1012541A/ja
Publication of JPH1012541A publication Critical patent/JPH1012541A/ja
Publication of JPH1012541A5 publication Critical patent/JPH1012541A5/ja
Withdrawn legal-status Critical Current

Links

JP8179879A 1996-06-20 1996-06-20 露光条件測定方法 Withdrawn JPH1012541A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8179879A JPH1012541A (ja) 1996-06-20 1996-06-20 露光条件測定方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8179879A JPH1012541A (ja) 1996-06-20 1996-06-20 露光条件測定方法

Publications (2)

Publication Number Publication Date
JPH1012541A JPH1012541A (ja) 1998-01-16
JPH1012541A5 true JPH1012541A5 (https=) 2004-07-08

Family

ID=16073505

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8179879A Withdrawn JPH1012541A (ja) 1996-06-20 1996-06-20 露光条件測定方法

Country Status (1)

Country Link
JP (1) JPH1012541A (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114578651A (zh) * 2020-12-02 2022-06-03 株洲中车时代半导体有限公司 一种用于投影光刻最佳焦距测定的掩膜版及方法

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