JPH10115925A5 - - Google Patents
Info
- Publication number
- JPH10115925A5 JPH10115925A5 JP1997200017A JP20001797A JPH10115925A5 JP H10115925 A5 JPH10115925 A5 JP H10115925A5 JP 1997200017 A JP1997200017 A JP 1997200017A JP 20001797 A JP20001797 A JP 20001797A JP H10115925 A5 JPH10115925 A5 JP H10115925A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- methacrylate
- acrylate
- tricyclo
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20001797A JP3865474B2 (ja) | 1996-08-20 | 1997-07-25 | ポジ型レジスト組成物 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8-218803 | 1996-08-20 | ||
| JP21880396 | 1996-08-20 | ||
| JP20001797A JP3865474B2 (ja) | 1996-08-20 | 1997-07-25 | ポジ型レジスト組成物 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004171742A Division JP3932195B2 (ja) | 1996-08-20 | 2004-06-09 | ２‐ヒドロキシ‐３‐ピナノンのアクリレート又はメタクリレートの共重合体 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH10115925A JPH10115925A (ja) | 1998-05-06 |
| JPH10115925A5 true JPH10115925A5 (https=) | 2004-10-21 |
| JP3865474B2 JP3865474B2 (ja) | 2007-01-10 |
Family
ID=26511910
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20001797A Expired - Fee Related JP3865474B2 (ja) | 1996-08-20 | 1997-07-25 | ポジ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3865474B2 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6303266B1 (en) | 1998-09-24 | 2001-10-16 | Kabushiki Kaisha Toshiba | Resin useful for resist, resist composition and pattern forming process using the same |
| JP3856270B2 (ja) * | 1998-09-24 | 2006-12-13 | 富士フイルムホールディングス株式会社 | ポジ型レジスト組成物 |
| KR100520181B1 (ko) * | 1999-10-11 | 2005-10-10 | 주식회사 하이닉스반도체 | 신규한 포토레지스트 단량체, 그의 중합체 및 이를 함유하는 포토레지스트 조성물 |
| US6482567B1 (en) * | 2000-08-25 | 2002-11-19 | Shipley Company, L.L.C. | Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same |
| JP4841823B2 (ja) * | 2004-10-04 | 2011-12-21 | 東京応化工業株式会社 | 高分子化合物、ポジ型レジスト組成物およびレジストパターン形成方法 |
-
1997
- 1997-07-25 JP JP20001797A patent/JP3865474B2/ja not_active Expired - Fee Related
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