JPH10106896A - Manufacturing method for electrode foil of aluminum electrolytic capacitor - Google Patents

Manufacturing method for electrode foil of aluminum electrolytic capacitor

Info

Publication number
JPH10106896A
JPH10106896A JP25612496A JP25612496A JPH10106896A JP H10106896 A JPH10106896 A JP H10106896A JP 25612496 A JP25612496 A JP 25612496A JP 25612496 A JP25612496 A JP 25612496A JP H10106896 A JPH10106896 A JP H10106896A
Authority
JP
Japan
Prior art keywords
forming
voltage
current density
chemical conversion
range
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25612496A
Other languages
Japanese (ja)
Inventor
Toshitaka Kato
寿孝 加藤
Yoshihiro Watanabe
善博 渡辺
Naomi Kurihara
直美 栗原
Koji Kamimoto
浩司 神本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP25612496A priority Critical patent/JPH10106896A/en
Publication of JPH10106896A publication Critical patent/JPH10106896A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To obtain a high electrostatic capacity by provisional processing before real forming which forms a forming film on an aluminum foil being made etching by anode oxidation, by thermal processing after forming by each specific range of a voltage and a current density and after that by the real forming. SOLUTION: As provisional processing for real forming in which a forming film is formed by anode oxidation on an aluminum foil having been made etching, forming by voltage in a range of 1-5V and electric current density of 0.01-0.08 A/cm2 is performed, and after that thermal processing is performed, the real forming is performed. Thermal processing temperature is set in a range of 300-570 deg.C and processing duration is set in a range of 2-5 minutes. By the means the forming film with a proper thickness is formed before the real forming, ineffective solution of thin holes during a first period of the real forming is suppressed and a high electrostatic capacity is obtained because crystallization of the forming film is promoted by increasing crystal nucleus in the forming film by thermal processing afterwards.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は低圧用アルミ電解コ
ンデンサに用いられるアルミ電解コンデンサ用電極箔の
製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing an electrode foil for an aluminum electrolytic capacitor used for a low-voltage aluminum electrolytic capacitor.

【0002】[0002]

【従来の技術】一般にこの種のアルミ電解コンデンサ用
電極箔は、エッチングされたアルミニウム箔を燐酸やア
ジピン酸アンモニウム等の水溶液に浸漬し、一定の電圧
を印加して、所望厚さの陽極酸化皮膜(以下化成皮膜と
称す)を生成させ、そして、数100度の高温雰囲気中
に数分間放置する熱処理工程を数回繰り返すことによっ
て製造するようにしている。
2. Description of the Related Art Generally, an electrode foil for an aluminum electrolytic capacitor of this type is formed by immersing an etched aluminum foil in an aqueous solution of phosphoric acid, ammonium adipate, or the like, applying a constant voltage to the anodic oxide film having a desired thickness. (Hereinafter, referred to as a chemical conversion film), and a heat treatment step of leaving the film in a high-temperature atmosphere of several hundred degrees for several minutes is repeated several times.

【0003】高容量の電極箔を得るためには、化成にお
いてはエッチング処理で形成された細孔が無効溶解によ
り崩れることを防ぐとともに、化成皮膜が均一に形成さ
れかつ欠陥部がないことが必要である。そのために特開
平2−216810号公報に示されているように、エッ
チングの後処理として、アミンを添加した高温の純水中
にアルミニウム箔を浸漬することによって水和皮膜を形
成して化成の際の皮膜質を向上させる方法や、特開平7
−283085号公報に示されているように、化成工程
を二回に分け、第一工程で0.05A/cm2以下の低電
流密度で15V以下の電圧を印加して化成皮膜を形成
し、第二工程で一定の電圧を印加して所望耐電圧厚さの
化成皮膜を形成することにより、欠陥部の少ない緻密な
化成皮膜を形成する方法など、化成法としても様々な提
案がなされている。
[0003] In order to obtain a high-capacity electrode foil, it is necessary to prevent the pores formed by the etching process from being collapsed by ineffective dissolution, and to form a chemical conversion film uniformly and to have no defective portions. It is. For this purpose, as disclosed in JP-A-2-216810, as a post-etching treatment, an aluminum foil is immersed in high-temperature pure water to which an amine is added to form a hydrated film. To improve the film quality of
As shown in Japanese Patent No. 283085, the chemical conversion step is divided into two steps, and in the first step, a voltage of 15 V or less is applied at a low current density of 0.05 A / cm 2 or less to form a chemical conversion film, Various proposals have also been made as a chemical conversion method, such as a method of forming a dense chemical conversion film with few defects by applying a constant voltage in the second step to form a chemical conversion film having a desired withstand voltage thickness. .

【0004】[0004]

【発明が解決しようとする課題】しかしながら、上記し
た化成法では、更なる静電容量の増大化に対して必ずし
も満足できる結果は得られていない。
However, in the above-mentioned chemical conversion method, satisfactory results have not always been obtained with respect to further increase in capacitance.

【0005】本発明は上記のような事情に鑑みてなされ
たもので、高い静電容量を得ることができるアルミ電解
コンデンサ用電極箔の製造方法を提供することを目的と
するものである。
The present invention has been made in view of the above circumstances, and has as its object to provide a method of manufacturing an electrode foil for an aluminum electrolytic capacitor capable of obtaining a high capacitance.

【0006】[0006]

【課題を解決するための手段】上記目的を達成するため
に本発明のアルミ電解コンデンサ用電極箔の製造方法
は、エッチングされたアルミニウム箔に陽極酸化により
化成皮膜を形成する本化成の前処理として、電圧が1〜
5Vの範囲で電流密度0.01〜0.08A/cm 2によ
り化成を行った後熱処理を行い、その後本化成を行うよ
うにしたもので、この製造方法によれば高い静電容量を
得ることができるものである。
[MEANS FOR SOLVING THE PROBLEMS] To achieve the above object
Method for producing electrode foil for aluminum electrolytic capacitor of the present invention
By anodizing the etched aluminum foil
As a pretreatment of the chemical conversion to form a chemical conversion film, the voltage is 1 to
Current density 0.01 to 0.08 A / cm in the range of 5V TwoBy
After performing chemical conversion, heat treatment is performed, and then
According to this manufacturing method, a high capacitance can be obtained.
What you can get.

【0007】[0007]

【発明の実施の形態】本発明の請求項1に記載の発明
は、エッチングされたアルミニウム箔に陽極酸化により
化成皮膜を形成する本化成の前処理として、電圧が1〜
5Vの範囲で、電流密度0.01〜0.08A/cm2
より化成を行った後熱処理を行い、その後本化成を行う
ようにしたもので、この製造方法によれば本化成を行う
前に適度な厚さの化成皮膜が形成されることになり、こ
れにより、本化成初期での細孔の無効溶解が抑制される
とともに、その後の熱処理により化成皮膜中の結晶核が
増加して化成皮膜の結晶化が促進されるため、高い静電
容量を得ることができるものである。
BEST MODE FOR CARRYING OUT THE INVENTION The invention according to claim 1 of the present invention provides a pretreatment for forming a chemical conversion film by anodic oxidation on an etched aluminum foil, in which a voltage of 1 to 1 is used.
In the range of 5 V, heat treatment is performed after current formation at a current density of 0.01 to 0.08 A / cm 2 , and then main formation is performed. An appropriate thickness of the chemical conversion film is formed, thereby suppressing the ineffective dissolution of the pores at the initial stage of the chemical conversion, and increasing the crystal nuclei in the chemical conversion film by the subsequent heat treatment. Since the crystallization of is accelerated, a high capacitance can be obtained.

【0008】ここで電圧が1〜5Vの範囲である理由
は、1V以下では本化成での細孔の無効溶解を抑制する
だけの化成皮膜の厚みがないからであり、一方、5V以
上では、1〜5Vの範囲の電圧で行ったものと比べそれ
以上の容量アップは図れないものであり、したがって、
本化成での無効溶解を抑制するための最適な厚みの化成
皮膜を形成するには電圧は1〜5Vの範囲が最適であ
る。
[0008] The reason why the voltage is in the range of 1 to 5 V is that if the voltage is 1 V or less, there is no thickness of the chemical conversion film enough to suppress the ineffective dissolution of pores in the present chemical conversion. It is not possible to further increase the capacity as compared with that performed at a voltage in the range of 1 to 5 V.
In order to form a chemical conversion film having an optimum thickness for suppressing ineffective dissolution in the present chemical conversion, the voltage is optimally in the range of 1 to 5V.

【0009】また、電流密度が0.01〜0.08A/
cm2である理由は、0.01A/cm2以下では所定電圧ま
で到達する時間が長くなるため生産性が悪く、一方、
0.08A/cm2以上では無効溶解が多くなって静電容
量が低下してしまうものであり、したがって、最適な電
流密度は0.01〜0.08A/cm2である。
Further, the current density is 0.01 to 0.08 A /
Why is cm 2 is, 0.01 A / cm 2 or less in poor productivity because the time to reach a longer to a predetermined voltage, whereas,
At 0.08 A / cm 2 or more, the amount of ineffective dissolution increases and the capacitance decreases. Therefore, the optimum current density is 0.01 to 0.08 A / cm 2 .

【0010】請求項2に記載の発明は、熱処理温度を3
00〜570度の範囲に設定し、かつ処理時間を2〜5
分の範囲に設定したもので、熱処理温度が300〜57
0度の範囲である理由は、300度以下では化成皮膜中
に結晶核が生成されにくく、一方、570度以上ではア
ルミニウム箔が溶解してしまうからである。
[0010] According to a second aspect of the present invention, the heat treatment temperature is set at 3
Set in the range of 00 to 570 degrees and the processing time is 2 to 5
Minutes, the heat treatment temperature is 300-57.
The reason for the range of 0 degrees is that when the temperature is 300 degrees or less, crystal nuclei are hardly generated in the chemical conversion film, and when the temperature is 570 degrees or more, the aluminum foil is dissolved.

【0011】また、処理時間が2分以下では結晶核の数
が十分生成されず、一方、5分以上では結晶核数が飽和
してしまうため、静電容量の伸びが頭打ちになるととも
に生産性が悪くなってしまうもので、したがって、最適
な熱処理温度は300〜570度であり、一方、最適な
処理時間は2〜5分である。
When the treatment time is less than 2 minutes, the number of crystal nuclei is not generated sufficiently. On the other hand, when the treatment time is more than 5 minutes, the number of crystal nuclei is saturated, so that the increase in the capacitance reaches a peak and the productivity increases. Therefore, the optimal heat treatment temperature is 300 to 570 degrees, while the optimal treatment time is 2 to 5 minutes.

【0012】以下、本発明の具体的な実施の形態と比較
例について説明する。エッチング工程として、純度9
9.98%、厚さ100μmの高純度アルミニウム箔の
試料(有効面積2×5cm)を、液温が25℃である15
wt%の塩酸溶液に硫酸を1wt%添加した電解液に浸漬
し、電流密度0.5A/cm2、周波数35Hzで3分間交
流エッチングを行った。その後、このエッチング処理が
なされたアルミニウム箔を、液温が55℃である12wt
%の硫酸溶液中に2分間浸漬して脱塩素処理を行った。
その後、95℃の純水に2分間浸漬して水和処理を施し
てアルミニウム箔の表面に水和皮膜を形成し、さらにそ
の後、300℃で1分間熱処理を行った。
Hereinafter, specific embodiments of the present invention and comparative examples will be described. As an etching process, purity 9
A sample (effective area: 2 × 5 cm) of a high-purity aluminum foil having a thickness of 9.98% and a thickness of 100 μm was prepared by using a solution having a liquid temperature of 25 ° C.
The resultant was immersed in an electrolytic solution obtained by adding 1 wt% of sulfuric acid to a wt% hydrochloric acid solution, and subjected to AC etching at a current density of 0.5 A / cm 2 and a frequency of 35 Hz for 3 minutes. Thereafter, the etched aluminum foil is placed in a 12 wt.
The sample was immersed in a 2% sulfuric acid solution for 2 minutes to perform a dechlorination treatment.
Thereafter, the aluminum foil was immersed in pure water at 95 ° C. for 2 minutes to perform a hydration treatment to form a hydrated film on the surface of the aluminum foil, followed by a heat treatment at 300 ° C. for 1 minute.

【0013】そしてこの後、液温が60℃である3wt%
のアジピン酸アンモニウム水溶液中で、化成前処理を行
い、その後、化成電圧22Vを印加して定電流本化成を
行った。
Then, after that, the liquid temperature is 3 wt% at 60 ° C.
Was performed in an aqueous solution of ammonium adipate, followed by applying a formation voltage of 22 V to carry out constant current main formation.

【0014】化成前処理の条件としては、(表1)に示
すように熱処理温度を500度、処理時間を2分とし
て、電圧、電流密度を変えた。つまり、本発明の実施の
形態1では、電流密度0.01A/cm2、電圧2Vで行
った。
As shown in Table 1, the conditions for the pretreatment for chemical conversion were such that the heat treatment temperature was 500 ° C., the treatment time was 2 minutes, and the voltage and current density were changed. That is, in the first embodiment of the present invention, the current density was 0.01 A / cm 2 and the voltage was 2 V.

【0015】実施の形態2では、電流密度0.025A
/cm2、電圧2Vで行った。実施の形態3では、電流密
度0.08A/cm2、電圧2Vで行った。
In the second embodiment, the current density is 0.025 A
/ Cm 2 and a voltage of 2 V. In the third embodiment, the current density was 0.08 A / cm 2 and the voltage was 2 V.

【0016】実施の形態4では、電流密度0.1A/cm
2、電圧2Vで行った。実施の形態5では、電流密度
0.025A/cm2、電圧0.9Vで行った。
In the fourth embodiment, the current density is 0.1 A / cm
2 and a voltage of 2V. In the fifth embodiment, the current density was 0.025 A / cm 2 and the voltage was 0.9 V.

【0017】実施の形態6では、電流密度0.025A
/cm2、電圧1Vで行った。実施の形態7では、電流密
度0.025A/cm2、電圧5Vで行った。
In the sixth embodiment, the current density is 0.025 A
/ Cm 2 and a voltage of 1 V. In the seventh embodiment, the current density is 0.025 A / cm 2 and the voltage is 5 V.

【0018】実施の形態8では、電流密度0.025A
/cm2、電圧6Vで行った。比較例は、熱処理のみを行
い、その後、本化成を行った。
In the eighth embodiment, the current density is 0.025 A
/ Cm 2 and a voltage of 6 V. In the comparative example, only the heat treatment was performed, and then the chemical conversion was performed.

【0019】本発明の実施の形態1〜8および比較例に
示した処理済み箔の静電容量を測定した結果を(表1)
に示す。
The results of measuring the capacitances of the treated foils shown in the first to eighth embodiments of the present invention and the comparative examples are shown in Table 1.
Shown in

【0020】[0020]

【表1】 [Table 1]

【0021】(表1)から明らかなように、比較例の静
電容量を100とした場合、電圧1〜5V、電流密度
0.01〜0.08A/cm2の範囲において、高い静電
容量が得られるものである。なお、本化成における電流
密度は、特に規定するものではないが、0.1A/cm2
以下で行うことが望ましい。
As is clear from Table 1, when the capacitance of the comparative example is set to 100, a high capacitance is obtained at a voltage of 1 to 5 V and a current density of 0.01 to 0.08 A / cm 2. Is obtained. Although the current density in the present formation is not particularly limited, it is 0.1 A / cm 2
It is desirable to perform the following.

【0022】(表2)は、化成前処理において、熱処理
の温度と時間を変化させたものである。この化成前処理
は、液温が60℃である3wt%のアジピン酸アンモニウ
ム水溶液中で、電流密度0.01A/cm2、電圧2Vで
行い、その後、熱処理の時間と温度を変化させた後、化
成電圧22Vを印加して定電流本化成を行った。すなわ
ち、本発明の実施の形態9では、熱処理温度250℃、
処理時間2分で行った。
Table 2 shows the results of changing the temperature and time of the heat treatment in the pretreatment for chemical conversion. This chemical conversion pretreatment is performed in a 3 wt% aqueous solution of ammonium adipate having a liquid temperature of 60 ° C. at a current density of 0.01 A / cm 2 and a voltage of 2 V. After that, the heat treatment time and temperature are changed. The formation was performed at a constant current by applying a formation voltage of 22V. That is, in Embodiment 9 of the present invention, the heat treatment temperature is 250 ° C.
The processing time was 2 minutes.

【0023】実施の形態10では、熱処理温度300
℃、処理時間1分で行った。実施の形態11では、熱処
理温度300℃、処理時間2分で行った。
In the tenth embodiment, a heat treatment temperature of 300
C. and a processing time of 1 minute. In the eleventh embodiment, the heat treatment was performed at a heat treatment temperature of 300 ° C. and a treatment time of 2 minutes.

【0024】実施の形態12では、熱処理温度500
℃、処理時間1分で行った。実施の形態13では、熱処
理温度500℃、処理時間5分で行った。
In the twelfth embodiment, the heat treatment temperature is 500
C. and a processing time of 1 minute. In the thirteenth embodiment, the heat treatment is performed at a heat treatment temperature of 500 ° C. for a treatment time of 5 minutes.

【0025】実施の形態14では、熱処理温度500
℃、処理時間10分で行った。実施の形態15では、熱
処理温度570℃、処理時間1分で行った。
In the fourteenth embodiment, the heat treatment temperature is 500
C. and a treatment time of 10 minutes. In the fifteenth embodiment, the heat treatment was performed at 570 ° C. for 1 minute.

【0026】実施の形態16では、熱処理温度570
℃、処理時間5分で行った。実施の形態17では、熱処
理温度570℃、処理時間10分で行った。
In the sixteenth embodiment, the heat treatment temperature is 570
C. and a processing time of 5 minutes. In the seventeenth embodiment, the heat treatment was performed at 570 ° C. for 10 minutes.

【0027】比較例は電流密度0.01A/cm2、電圧
2Vで化成を行った後、熱処理は行わず、化成電圧22
Vを印加して定電流本化成を行った。
In the comparative example, after forming at a current density of 0.01 A / cm 2 and a voltage of 2 V, no heat treatment was performed, and a forming voltage of 22
V was applied to perform constant current main formation.

【0028】本発明の実施の形態9〜17および比較例
に示した処理済み箔の静電容量を測定した結果を(表
2)に示す。
The results of measuring the capacitance of the treated foils shown in the ninth to seventeenth embodiments of the present invention and the comparative examples are shown in Table 2 below.

【0029】[0029]

【表2】 [Table 2]

【0030】(表2)から明らかなように、比較例の静
電容量を100とした場合、熱処理温度300〜570
℃、処理時間2〜10分の範囲において、高い静電容量
が得られるものである。なお、本化成における電流密度
は特に規定するものではないが、0.1A/cm2以下で
行うことが望ましい。
As is clear from Table 2, when the capacitance of the comparative example is set to 100, the heat treatment temperature is 300 to 570.
A high capacitance can be obtained in a temperature range of 2 to 10 minutes. Although the current density in the present chemical formation is not particularly limited, it is preferable that the current density be 0.1 A / cm 2 or less.

【0031】[0031]

【発明の効果】以上のように本発明のアルミ電解コンデ
ンサ用電極箔の製造方法は、エッチングされたアルミニ
ウム箔に陽極酸化により化成皮膜を形成する本化成の前
処理として、電圧が1〜5Vの範囲で、電流密度0.0
1〜0.08A/cm2により化成を行った後熱処理を行
い、その後本化成を行うようにしたもので、この製造方
法によれば、本化成を行う前に適度な厚さの化成皮膜が
形成されることになり、これにより、本化成初期での細
孔の無効溶解が抑制されるとともにその後の熱処理によ
り化成皮膜中の結晶核が増加して化成皮膜の結晶化が促
進されるため、高い静電容量を得ることができるもので
ある。
As described above, the method for producing an electrode foil for an aluminum electrolytic capacitor according to the present invention comprises a pretreatment for forming a chemical conversion film by anodic oxidation on an etched aluminum foil. Range, current density 0.0
After performing chemical conversion at 1 to 0.08 A / cm 2, heat treatment is performed, and then main chemical conversion is performed. According to this manufacturing method, a chemical conversion film having an appropriate thickness is formed before performing main chemical conversion. In this way, the ineffective dissolution of the pores in the initial stage of the chemical conversion is suppressed, and the subsequent heat treatment increases the crystal nuclei in the chemical conversion film to promote the crystallization of the chemical conversion film. A high capacitance can be obtained.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 神本 浩司 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Koji Kamimoto 1006 Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 エッチングされたアルミニウム箔に陽極
酸化により化成皮膜を形成する本化成の前処理として、
電圧が1〜5Vの範囲で、電流密度0.01〜0.08
A/cm2により化成を行った後熱処理を行い、その後本
化成を行うようにしたアルミ電解コンデンサ用電極箔の
製造方法。
1. A pre-treatment for forming a chemical conversion film on an etched aluminum foil by anodic oxidation,
When the voltage is in the range of 1 to 5 V, the current density is 0.01 to 0.08
A method for producing an electrode foil for an aluminum electrolytic capacitor in which a chemical treatment is performed at A / cm 2, a heat treatment is performed, and then the chemical formation is performed.
【請求項2】 熱処理温度を300〜570度の範囲に
設定し、かつ処理時間を2〜5分の範囲に設定した請求
項1に記載のアルミ電解コンデンサ用電極箔の製造方
法。
2. The method for producing an electrode foil for an aluminum electrolytic capacitor according to claim 1, wherein the heat treatment temperature is set in a range of 300 to 570 degrees and the processing time is set in a range of 2 to 5 minutes.
JP25612496A 1996-09-27 1996-09-27 Manufacturing method for electrode foil of aluminum electrolytic capacitor Pending JPH10106896A (en)

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Application Number Priority Date Filing Date Title
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JPH10106896A true JPH10106896A (en) 1998-04-24

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013190756A1 (en) 2012-06-22 2013-12-27 昭和電工株式会社 Capacitor production method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013190756A1 (en) 2012-06-22 2013-12-27 昭和電工株式会社 Capacitor production method
US9607770B2 (en) 2012-06-22 2017-03-28 Show A Denko K.K. Method for producing capacitor

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