JPH10104596A - Production of liquid crystal display device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent the decrease of an aperture ratio by the misalignment between the light shielding film and TFT electrodes of the liquid crystal display device, the light escape by the faults of the TFTs, the peripheral parts of the TFT electrodes of the spacers for spacing control dispersed in liquid crystals and the increase in the working time for the purpose of correcting the liquid escape in an active matrix type liquid crystal display device. SOLUTION: A photographic emulsion contg. photosensitive silver halide is applied via a protective film 10 made of a UV curing acrylic resin copolymer on the outside surface of the liquid crystal display device and is used as a photosensitive film 11. The photosensitive films of the parts of the bright display where light is transmitted are exposed with respect to the regions 6 of the abnormally bright display and the regions of the TFTs among the pixels of the liquid crystal display device set at the black display, by which the silver is precipitated and the photosensitive films are converted to the light shielding films 9 of low light transmittance. The liquid passing the TFTs allowing the easy flow of light currents and the pixels of the bright display which induces the degradation in contrast is thus shut off, by which the rapid production of the bright and distinct liquid crystal display device by self-alignment is made possible.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a light shielding film for a liquid crystal display.

[0002]

2. Description of the Related Art FIG. 10 is a sectional view of a conventional liquid crystal display device having a light shielding film inside a pair of substrates of the liquid crystal display device.
As shown in FIG. 10, between the TFT substrate 1 and the counter substrate 2, a TN type liquid crystal 3 whose major axis rotates by 90 degrees in a section from the upper interface to the lower interface is sealed.

On the other hand, a TFT polarizing plate 4 having a polarization axis in a direction parallel to the cross section is arranged on the outer surface of the TFT substrate 1, and the polarizing axis is orthogonal to the TFT polarizing plate 4 and polarized in a direction perpendicular to the cross section. A counter polarizer 5 having an axis is arranged on the outer surface of the counter substrate 2. When polarizing plates whose polarization axes are orthogonal to each other are arranged on both sides of the TN type liquid crystal, the transparent TF on the TFT substrate becomes transparent.
When there is no electric field between the T electrode 6 and the transparent counter electrode 7 on the counter substrate, the liquid crystal display device transmits light.

When an electric field is present between the TFT electrode 6 and the counter electrode 7, the liquid crystal display blocks light at the position of the polarizing plate. The liquid crystal display device of such a mode is called a normally white (a bright display in a normal case where no electric field is applied) mode liquid crystal display device. Conversely, when polarizing plates whose polarization axes are parallel to each other are arranged on both sides of the TN type liquid crystal, it is called a normally black (dark display in a normal case where no electric field is applied) mode liquid crystal display device. .

A pair of alignment films 8 sandwiching the liquid crystal determine the direction of the interface of the liquid crystal 3 in accordance with the mode described above. Here, in the liquid crystal display device, a lattice-shaped light shielding film 9 surrounding the periphery of the TFT electrode is provided on the counter substrate 2 in order to allow light to pass only through the TFT electrode 6. Light shielding film 9 and T
Since the FT electrode 6 and the FT electrode 6 are provided on different substrates, they are aligned when two substrates are bonded to each other.

FIG. 11 is a sectional view of another conventional liquid crystal display device. As shown in FIG.
It is provided on the inner side surface of the FT substrate 1 and above the TFT. FIG. 12 is a cross-sectional view of another conventional liquid crystal display device. As shown in FIG. 12, the light shielding film 9 is a TFT
It is formed on the outer surface of the substrate 1 and on the inner surface of the TFT polarizing plate 4 (JP-A-3-148637).

As shown in FIGS. 10, 11 and 12, the TFT electrode 6 and the light-shielding film 9 are designed to overlap each other at both ends of the TFT electrode. As described above, the liquid crystal display device usually improves its display quality.
A light-shielding film is formed on a TFT substrate or a counter substrate using an organic material such as a metal such as Cr or a dye.

[0008]

However, in the liquid crystal display device in which a light-shielding film is provided on the opposing substrate shown in FIG. 10, since the TFT substrate and the opposing substrate are almost displaced at the time of alignment, it is necessary to use a TFT electrode and a TFT electrode in advance. Since the overlap with the light-shielding film is set to be large to increase the alignment margin, the aperture ratio of the liquid crystal display device may be reduced.

If the TFT breaks down after a pair of substrates are attached to each other, an undesired pixel is individually filled with a light-shielding film under a microscope, and then an excess portion of the light-shielding film reaching a good pixel is obtained. Time-consuming work of shaving off the steel. The liquid crystal display device in which a light-shielding film is provided on the TFT shown in FIG. 11 has a high aperture ratio.
In this case, the contact to the source and the drain cannot be formed at the same time, and the manufacturing process on the TFT substrate, which is more difficult than the manufacturing process on the counter substrate, is further complicated, and the yield may be reduced.

Further, in the liquid crystal display device in which a light-shielding film is provided on the TFT substrate shown in FIG. 12, the alignment between the TFT substrate and the light-shielding film is required, the aperture ratio is reduced, and the same problem as in the prior art is caused. . The present invention has been made in view of the above circumstances, and has as its object to improve the throughput of a liquid crystal display device and increase the aperture ratio.

[0011]

According to a method of manufacturing a liquid crystal display device of the present invention, a liquid crystal is sandwiched between a pair of substrates, and a group of pixels provided on one of the substrates is formed by at least two of a dark display mode and a bright display mode. In a method of manufacturing a liquid crystal display device driven between two display modes, in a state in which all pixels of the liquid crystal display device are set to a dark display mode, at least one of the substrates corresponding to a light-exiting region of the liquid crystal display device is disposed. A light-shielding film is formed on the side surface.

Further, in the method of manufacturing a liquid crystal display device according to the present invention, there is provided a method of manufacturing a liquid crystal display device, comprising: Myself,
Occurs when the liquid crystal orientation is disturbed around the pixel where light leaks due to an electric field parallel to the substrate, or around the spacer that controls the distance between the pair of substrates. It is an area such as a bright spot that reaches twice the size.

Further, in the method for manufacturing a liquid crystal display device according to the present invention, the light-shielding film is formed by forming a photosensitive film whose light transmittance is reduced by exposure, and then exposing the photosensitive film by light exposed from the light-exiting region. It is characterized by being formed by performing. Alternatively, in the method of manufacturing a liquid crystal display device according to the present invention, the light-shielding film is formed by forming a positive resist type photosensitive film which is decomposed by exposure, and thereafter, the photosensitive film is developed by light exposed from the light-exiting region. Then, a photosensitive film is left in a region of the pixel in the dark display mode, an opaque deposition film is deposited on the entire surface, and the photosensitive film is peeled off.

In addition, in the method for manufacturing a liquid crystal display device according to the present invention, the light-shielding film is preferably formed by first forming a transparent film whose light transmittance is reduced by reduction, and then decomposing the outer surface of the transparent film by exposure. After forming a photosensitive film of the mold, the photosensitive film is exposed and developed by light exposed from the light-exiting region, and developed to leave the photosensitive film on the transparent film in the region of the pixel in the dark display mode. It is characterized in that it is formed by reducing a transparent film in a region through which light is not covered by a film.

In the method of manufacturing a liquid crystal display device according to the present invention, a defect on a display as an optical component is directly used for exposing a photosensitive film. That is, a photosensitive film is applied to one side of the liquid crystal display device,
After the liquid crystal display device performs black display, a light-shielding film is formed by applying light from the side of the liquid crystal display device opposite to the photosensitive film and exposing the light-exposed portion of the photosensitive film to form a grid-like BM (black matrix). ) And dot correction.

Conventionally, a light shielding film BM having a slightly larger area is used.
Was formed to eliminate light leakage. However, by using a photosensitive film, only the portion where light leakage actually occurred can be reliably blocked, and the aperture ratio increases. Further, the dot defect portion is shielded simultaneously with the light leakage, so that the throughput is improved.

According to the above configuration, a liquid crystal display device which is brighter than the conventional one can be produced more quickly.

[0018]

BEST MODE FOR CARRYING OUT THE INVENTION

(First Embodiment) FIGS. 1 and 2 show a first embodiment of the present invention.
It will be described based on. FIG. 1 is a sectional view of the liquid crystal display device according to the first embodiment. However, the same reference numerals are used for the same components as those in the conventional example, and the detailed description is omitted.

As shown in FIG. 1, a TN type liquid crystal 3 is sealed between a TFT substrate 1 and a counter substrate 2. By disposing a pair of polarizing plates composed of a TFT polarizing plate 4 and a counter polarizing plate 5 whose polarizing axes are orthogonal to each other on both sides of the TN type liquid crystal, the transparent TFT electrodes 6L, 6R on the TFT substrate and the counter substrate When there is no electric field between the liquid crystal display device and the transparent counter electrode 7, the liquid crystal display device transmits light.

When there is an electric field between the TFT electrode 6 and the counter electrode 7, the liquid crystal display blocks light at the position of the polarizing plate. In FIG. 1, 6L is a normal TFT.
Is connected to the abnormal TFT, and 6R is a TFT electrode connected to the abnormal TFT. Here, TFT is well known,
This is a kind of pixel driving transistor.

As is characteristically shown in FIG. 1, T
Protective film 1 for protecting TFT polarizing plate on the surface of FT polarizing plate 4
0 is provided. This protective film 10 is coated with an ultraviolet-curable resin containing silicon acrylate or epoxy acrylate as a main component on a TFT polarizing plate 4 whose surface is made of cellulose triacetate, and then 1 cm from a light source of a high-pressure mercury lamp of 80 W.
It is formed by photo-curing at an energy density of 1000 mjcm ^-2 for an irradiation time of 5 seconds to 15 seconds.

Further, on the protective film 10, a photosensitive film 11 mainly composed of an organic resin and having a thickness of 2 to 40 μm, which is not exposed, is formed at the position of the TFT electrode 6L. This photosensitive film 1
1 is a method in which a photographic emulsion such as photosensitive silver halide is coated on a cured protective film 10 in a yellow room so as not to be exposed to light, and a signal input circuit is connected in the yellow room to set a dark display mode. , The wavelength of 0.3 to
After exposure with 0.1 μm parallel ultraviolet rays, development and fixing were performed to make the color hardly changed under natural light.

Similarly, on the protective film 10, the position of the TFT electrode 6R connected to the abnormal TFT and the position of each TFT are replaced by the thickness 2 having a low light transmittance converted from the photosensitive film by exposure.
A light-shielding film 9 of μm is manufactured. Further, the light shielding film 9
The photosensitive film coated on the protective film 10 in the yellow room is selectively exposed by a liquid crystal display device, and silver is deposited at a portion of the liquid crystal display device that transmits parallel ultraviolet rays, such as dot defects and thin films, to obtain a light transmittance. Is lowered.

As can be seen from FIG. 1, the light-shielding film 9 is provided on the outer surface of the liquid crystal display device, and the overlap with the TFT electrode 6L connected to the normal TFT is smaller than in the conventional case. Therefore, according to the present embodiment, the aperture ratio of the liquid crystal display device is improved as compared with the related art.

FIG. 2 is a sectional process view of a method of manufacturing a liquid crystal display device in which a photosensitive film whose light transmittance is lowered by exposure is formed. As shown in FIG. 2A, parallel ultraviolet rays 12 having a wavelength of 0.3 to 0.1 μm are irradiated from the side of the counter substrate 2 of the liquid crystal display device to the side of the TFT substrate 1 on which the protective film 10 and the photosensitive film 11 are provided.

In FIG. 2a, a TFT connected to a normal TFT
Since a dark display signal is transmitted to the electrode 6L, the parallel ultraviolet light 12 used for exposing the photosensitive film 11 is T
The light is shielded by the FT polarizing plate 4. On the other hand, in FIG.
A dark display signal is not transmitted to the TFT electrode 6R connected to T due to an abnormality of the TFT.
Is transmitted through the TFT polarizing plate 4 to change the color of the photosensitive film.

Further, a TFT having a thickness of 100
The Si film of about 0 ° is colored red and absorbs some light in the visible region, but transmits ultraviolet light having a wavelength of 0.3 to 0.1 μm, so that the photosensitive film in the TFT portion is discolored by the parallel ultraviolet light.
As described above, the light-transmitting thin TFT and the bright spot caused by the spacer and the periphery of the TFT electrode due to the parallel electric field are also invisible by the light shielding film.

Therefore, as shown in FIG.
A photosensitive film 11 having a high light transmittance is formed in a self-aligned manner only on a portion of the TFT electrode 6L connected to the T, and a light-shielding film 9 having a low light transmittance is automatically formed on a portion of the TFT, light leakage or dot defect. Is done. According to the first embodiment, not only the image becomes clearer, but also the outer surface of the liquid crystal display device is covered with a relatively thick layer, so that the shock resistance of the liquid crystal display device is improved.

(Second Embodiment) A second embodiment of the present invention will be described with reference to FIGS. FIG. 3 is a sectional view of a liquid crystal display device in which a light-shielding film is formed by lift-off using a positive resist type photosensitive film that is decomposed by exposure. As is characteristically shown in FIG. 3, the TFT polarizing plate 4 has a TFT
A protective film 10 for protecting the polarizing plate is provided.

The protective film 10 is made of an ultraviolet curable resin containing silicon acrylate or epoxy acrylate as a main component. Further, the position of the TFT electrode 6R connected to the abnormal TFT on the protective film 10 and each TFT
A light-shielding film 9 made of Cr and having a thickness of 1500 ° is formed at the position of. Conversely, a TFT electrode 6L connected to a normal TFT
Nothing is formed on the protective film 10 at the position of.

The light-shielding film 9 is formed on the protective film 10 by sputtering in a reduced-pressure argon atmosphere. FIG. 4 is a sectional process view of a method for manufacturing a liquid crystal display device in which a light-shielding film 9 is formed by lifting off a positive resist type photosensitive film. As shown in FIG. 4A, after forming a positive resist type photosensitive film which is decomposed by exposure on a protective film 10 on the outer surface of the liquid crystal display device, light exposed from a pixel region of a bright display form is used to expose the outer surface of the liquid crystal display device. After the exposure, the photosensitive film 11 is developed to leave the photosensitive film 11 in a region of a pixel having a normal dark display.

Subsequently, when an opaque Cr deposition film 13 is deposited on the entire surface of the liquid crystal display device, the area of the TFTs and the TFT electrodes from which light leaks is covered by the opaque protective film 10 provided on the outer surface of the liquid crystal display device. The shape is covered by the deposition film 13. Then, the region of the TFT electrode in a normal dark display form has a form in which a photosensitive film 11 having a thickness of 2 μm and a deposited film 13 having a thickness of 1500 ° are laminated on a protective film 10 provided on the outer surface of the liquid crystal display device. .

When a stripper is applied to the structure shown in FIG. 4A, the photosensitive film 11 is dissolved, and the deposited film on the photosensitive film is lifted off. Then, as shown in FIG. 4B, since the opaque deposited film remains only in the bright display mode pixel region on the outer surface of the liquid crystal display device, the light-shielding film 9 is formed in the portion where light is leaked.

The deposited film 13 is not limited to Cr only.
Any opaque and conductive metal film such as Al, Ti, Ni, W, and Mo may be used. Alternatively, the deposited film 13 may be a low-resistance film such as carbon or polypyrrole, which is a kind of conductive polymer. According to the second embodiment, not only the image becomes clear, but also the outer surface of the liquid crystal display device is covered with a lattice-like low-resistance layer, so that the electrostatic resistance of the liquid crystal display device is improved.

(Third Embodiment) A third embodiment of the present invention will be described with reference to FIGS. FIG. 5 shows a liquid crystal display device in which a light-shielding film is formed by partially coating a positive resist type photosensitive film which is decomposed by exposure, and selectively reducing a transparent film whose light transmittance is reduced by reduction depending on the presence or absence of the photosensitive film. It is sectional drawing.

As shown in FIG. 5, a protective film 10 is provided on the surface of the TFT polarizing plate 4 to protect the TFT polarizing plate. This protective film 10 is made of an ultraviolet curable resin obtained by adding a photocuring agent to a copolymer of an acrylic resin and another resin. Furthermore, an abnormal TFT is formed on the protective film 10.
A light-shielding film 9 made of reduced ITO and having a light transmittance of about 10% with a thickness of 500 mm is formed at the position of the TFT electrode 6R connected to the TFT and at the position of each TFT.

On the protective film at the position of the TFT electrode 6L connected to the normal TFT, a transparent film 14 made of ITO and having a thickness of 500 ° and a light transmittance of about 90% is formed. The transparent film 14 is formed by depositing a transparent ITO film having a sheet resistance of 100Ω / □ on the protective film 10 at normal temperature by sputtering under reduced pressure. The light-shielding film 9 is a transparent film 14 which is not covered with the positive resist type photosensitive film due to light leakage.
Is formed by removing oxygen from a transparent film made of ITO by plasma treatment under reduced pressure and changing the transparent state to a cloudy state.

FIG. 6 is a sectional process view of a method of manufacturing a liquid crystal display device in which a transparent film in a pixel region of a bright display form not covered with a positive resist type photosensitive film is reduced to form a light shielding film. As shown in FIG. 6A, first, a transparent film 14 whose light transmittance is reduced by reduction is formed on the outer surface of the liquid crystal display device.

Next, after forming a positive resist type photosensitive film which is decomposed by exposure on the outer surface of the transparent film 14, the photosensitive film on the outer surface of the liquid crystal display device is exposed by light exposed from a pixel region of a bright display form. By developing, the photosensitive film 11 is left in a region of a pixel having a normal dark display mode. Subsequently, the transparent film 14 in the region of the pixel in the bright display mode which is not covered with the photosensitive film 11 is reduced by the plasma 15.

Further, the photosensitive film 11 is removed by a stripping solution to expose a transparent film under the photosensitive film on the surface. As a result, as shown in FIG.
Is formed on the protective film 10 in the region of the TFT electrode 6L connected to the transparent film 14 having a high light transmittance.

In addition, a TFT or an abnormal T
On the protective film in the region of the TFT electrode 6R connected to the FT, a light-shielding film 9 having a low light transmittance and formed by reducing the transparent film is formed. The light shielding film 9 is made of not only ITO but also Zn.
It may be formed by reducing a transparent metal oxide such as O.

According to the third embodiment, not only the image becomes clear, but also the entire surface of the liquid crystal display device is covered with a layer. Therefore, even if the TFT breaks down after completion, a new film can be formed. Instead, the part can be newly reduced and made opaque. FIG. 7 is a diagram showing the relationship between the amount of exposure to ultraviolet light used in manufacturing the liquid crystal display device of the present invention and the contrast of visible light after manufacture.

In the drawing, the exposure amount is 0.1 to 0.3 μm in wavelength.
The contrast is the ratio of the light transmittance of a dark display mode to the light transmittance of a bright display mode in visible light. As shown in FIG. 7, the aperture ratio sharply decreases as the exposure amount increases, reaches a constant value, and then gradually decreases.

In the region I of FIG. 7, which is seemingly desirable, having a large aperture ratio, the exposure with ultraviolet rays is insufficient, and light leakage occurs regardless of the intensity of the voltage, so that the contrast is low. In the area II of FIG. 7, the aperture ratio and the contrast are larger than before, and the amount of light transmitted through the TFT electrode is maximized.
This is the most desirable area. From FIG. 7, it can be seen that the region II satisfies the contrast value of 300 or more desired by the liquid crystal projector.

Further, the region III in FIG.
In this case, the ratio of the light-shielding film increases due to the wraparound of light at the time of exposure, and the transmittance of the light decreases. As described above, under appropriate exposure conditions with ultraviolet light, a portion through which light leaks is shielded regardless of the presence or absence of an electric field, so that the liquid crystal display device becomes clear. Further, the overlap between the light-shielding film that does not transmit light and the TFT electrode that transmits light can be reduced, so that the liquid crystal display device becomes bright.

In the present embodiment, the light-shielding film is formed via the protective film. However, the film covering both sides of the polarizer in which iodine is dispersed in stretched polyvinyl alcohol has high chemical resistance such as polyimide. In the case of a film, an ultraviolet-curable protective film is not necessarily required. (Fourth Embodiment) FIGS. 8 and 9 show a fourth embodiment of the present invention.
It will be described based on.

In the embodiments described above, the BM and the light-shielding film other than the BM are simultaneously manufactured by ultraviolet exposure. However, as described below, the BM may be manufactured in advance before the exposure. . FIG. 8 shows BM16 on the opposite substrate.
FIG. 7 is a manufacturing process diagram of the liquid crystal display device of the present embodiment in which a light-shielding film is formed directly on the polarizing plate of the liquid crystal display device having the above.

As shown in FIG. 8A, a photosensitive film 11 colored by light is placed on a counter polarizing plate 5 whose surface is an epoxy resin.
Is deposited, and parallel ultraviolet rays 12 are irradiated from the TFT substrate 1 side. The parallel ultraviolet rays 12 pass only through the region of the TFT electrode 6R connected to the abnormal TFT.

As a result, as shown in FIG. 8B, the light-shielding film 9 is formed only in the light-exited region. Figure 9 shows a TFT
It is a manufacturing process figure of the liquid crystal display of this embodiment which forms a light-shielding film directly on the polarizing plate of the liquid crystal display having BM16 on top. As shown in FIG. 9A, a photosensitive film 1 which becomes opaque due to light on a TFT polarizing plate 4 whose surface is a polyimide resin.
After laminating 1, parallel ultraviolet rays 12 are irradiated from the counter substrate 2 side.

The parallel ultraviolet rays 12 pass through a region between the TFT electrode 6L connected to the normal TFT and the abnormal TFT, and a region of the TFT electrode 6R connected to the abnormal TFT. Then, as shown in FIG. 9B, the light-shielding film 9 is formed only in the light-exited region.

In the fourth embodiment, a normal TFT
B covering the right end of the TFT electrode 6L connected to the
Even if M16 is separated, the light-shielding film 9 can be formed in a corresponding place in a self-aligned manner. Further, in a liquid crystal display device having a TFT, a pixel through which light leaks due to a failure of the TFT always occurs.

When a pixel that leaks light is corrected by the manufacturing method of the present invention, light leak around the pixel is also automatically corrected, so that the alignment of the pair of substrates becomes easier than before. In the above embodiment, only an example of a TN type liquid crystal has been described, but the present invention may be applied to an STN type liquid crystal or a ferroelectric liquid crystal.

[0053]

As described above, according to the method of manufacturing a liquid crystal display device in which a light-shielding film is formed on the outer surface of the polarizing plate of the liquid crystal display device, the contrast of the liquid crystal display device due to light leakage or photocurrent of the TFT is reduced. Since the decrease is eliminated and the aperture ratio does not decrease due to the displacement between the TFT electrode and the light-shielding film, a brighter and clearer manufacturing method of the liquid crystal display device becomes possible.

Further, since the light transmittance is reduced by the exposure after the completion of the liquid crystal display device, the deposited film is lifted off, and the transparent film is selectively reduced, the light shielding film is formed.
Not only can light leakage in a portion where light is blocked be blocked in a self-aligned manner, but also the throughput of the liquid crystal display device can be improved.

[Brief description of the drawings]

FIG. 1 is a cross-sectional view of a liquid crystal display device using a photosensitive film whose transmittance is reduced by light according to the present invention.

FIG. 2 is a cross-sectional process diagram of a liquid crystal display device using a photosensitive film which is influenced by exposure according to the present invention.

FIG. 3 is a cross-sectional view of a liquid crystal display device in which a light-shielding film of the present invention is left by lift-off.

FIG. 4 is a sectional process view of the liquid crystal display device in which a light-shielding film of the present invention is left by lift-off.

FIG. 5 is a cross-sectional view of a liquid crystal display device in which a transparent film of the present invention is reduced to a light-shielding film.

FIG. 6 is a cross-sectional process diagram of the liquid crystal display device of the present invention in which a transparent film is reduced into a light shielding film.

FIG. 7 is a diagram showing the relationship between the exposure amount of ultraviolet light and the contrast under visible light according to the present invention.

FIG. 8 is a sectional process view of a liquid crystal display device having the light-shielding film and the BM of the present invention on a counter substrate.

FIG. 9 is a process diagram of a liquid crystal display device having a light-shielding film and a BM on a TFT substrate according to the present invention.

FIG. 10 is a cross-sectional view of a conventional liquid crystal display device in which a light-shielding film is provided on an inner surface of a counter substrate.

FIG. 11 is a cross-sectional view of a conventional liquid crystal display device in which a light shielding film is provided above a TFT.

FIG. 12 is a cross-sectional view of a conventional liquid crystal display device in which a light-shielding film is provided on an inner surface of a TFT polarizing plate.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 TFT substrate 2 Counter substrate 3 Liquid crystal 4 TFT polarizing plate 5 Counter polarizing plate 6 TFT electrode 7 Counter electrode 8 Alignment film 9 Shielding film 10 Protective film 11 Photosensitive film 12 Parallel ultraviolet light 13 Deposition film 14 Transparent film 15 Plasma 16 BM 6L Normal TFT electrode connected to TFT 6R TFT electrode connected to abnormal TFT

Claims (5)

[Claims] 1. A method of manufacturing a liquid crystal display device, comprising interposing a liquid crystal between a pair of substrates and driving a pixel group provided on one substrate between at least two display modes of a dark display mode and a bright display mode. A liquid crystal display device, wherein a light-shielding film is formed on an outer surface of at least one substrate corresponding to a light-exiting region of the liquid crystal display device in a state where all pixels of the liquid crystal display device are set to a dark display mode. Manufacturing method. 2. The light-leakage region is formed by a pixel having a bright display mode irrespective of a setting state due to a defect of a pixel driving transistor portion or a wiring, or light leakage due to an electric field parallel to the transistor portion itself or a substrate. A bright spot that is generated at a specific liquid crystal thickness because the orientation of the liquid crystal is disturbed around the pixel to be controlled and around the spacer that controls the distance between the pair of substrates, and reaches several times the diameter of the spacer 2. The method for manufacturing a liquid crystal display device according to claim 1, wherein the region is a region such as 3. The light-shielding film according to claim 1, wherein the light-shielding film is formed by forming a photosensitive film whose light transmittance is reduced by exposure, and exposing the photosensitive film with light exposed from the light-exiting region. Item 2. The method for manufacturing a liquid crystal display device according to Item 1. 4. The light-shielding film, after forming a positive resist type photosensitive film that decomposes by exposure, develops the photosensitive film after exposure by light exposed from the light-exiting area,
2. The liquid crystal display device according to claim 1, wherein a photosensitive film is left in a region of the pixel in the dark display mode, an opaque deposition film is deposited on the entire surface, and the photosensitive film is peeled off. Production method. 5. The light-shielding film first forms a transparent film whose light transmittance is reduced by reduction, and then forms a positive resist type photosensitive film which is decomposed by exposure on the outer surface of the transparent film. Is developed after exposure by light exposed from the light-exiting region, a photosensitive film is left on the transparent film in the pixel region of the dark display mode, and then the transparent film in the light-exiting region not covered with the photosensitive film is exposed. 2. The method according to claim 1, wherein the film is formed by reducing the film.