JPH0982828A - Vacuum sealed device and its manufacture - Google Patents

Vacuum sealed device and its manufacture

Info

Publication number
JPH0982828A
JPH0982828A JP26087695A JP26087695A JPH0982828A JP H0982828 A JPH0982828 A JP H0982828A JP 26087695 A JP26087695 A JP 26087695A JP 26087695 A JP26087695 A JP 26087695A JP H0982828 A JPH0982828 A JP H0982828A
Authority
JP
Japan
Prior art keywords
vacuum
valve closing
element substrate
opening
lid member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP26087695A
Other languages
Japanese (ja)
Other versions
JP3139339B2 (en
Inventor
Yoichi Mochida
洋一 持田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Priority to JP07260876A priority Critical patent/JP3139339B2/en
Publication of JPH0982828A publication Critical patent/JPH0982828A/en
Application granted granted Critical
Publication of JP3139339B2 publication Critical patent/JP3139339B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
  • Micromachines (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a compact vacuum sealed device and its manufacturing method at low cost having excellent operational element characteristics. SOLUTION: An operation element 4 and a communication path 8 are provided on an element substrate 3 while a cover member 6 is junctioned with the upper side of the element substrate 3. The cover member 6 is provided with recessions 17 and 16, besides, an actuator valve 13 composed of a beam part 11 whose base terminal side is fix-supported on the peripheral surface and valve closing surface 12 connecting to the front end of the beam part 11 and opposing to an outer side aperture part 9 is provided on the peripheral surface of the recession 16. In the state of valve closing surface 12 not blocking the outer side aperture part 9, the space 7 containing the operation element 4 is vacuum-exhausted from the communication path 8. Later, the space between the actuator valve 13 and the element substrate 3 is impressed with voltage to make the beam part 11 bent-deformed by static electricity for making the valve closing surface 12 block the outer side aperture part 9 so that the element substrate 3 in such a state may be heated to melt-junction the contact surface between the valve closing surface 12 and the element substrate 3 by the eutectic reaction producing no gas at all.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、マイクロマシニン
グ技術を用いて作製される真空封止デバイスおよびその
製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum sealed device manufactured by using a micromachining technique and a manufacturing method thereof.

【0002】[0002]

【従来の技術】周知のように、近年において、マイクロ
マシニング技術を用いた非常に微細なジャイロや共振子
等の振動素子や、アクチエータ等が作製されており、そ
れら振動素子やアクチエータ等の動作素子は、空気のダ
ンピングに起因した動作特性の悪化を防止するために、
例えば、基台と蓋部材とを接合して形成されたパッケー
ジ内の真空空間に収容され、前記空気のダンピングに起
因した動作特性の悪化を回避する策が講じられている。
上記のように動作素子をパッケージ内の真空空間に収容
したものは真空封止デバイスとして知られている。
2. Description of the Related Art As is well known, in recent years, very fine vibration elements such as gyros and resonators using micromachining technology and actuators have been manufactured. In order to prevent deterioration of operating characteristics due to air damping,
For example, measures have been taken to avoid deterioration of operating characteristics due to the air damping, which is housed in a vacuum space in a package formed by joining a base and a lid member.
The one in which the operating element is housed in the vacuum space in the package as described above is known as a vacuum sealed device.

【0003】[0003]

【発明が解決しようとする課題】ところで、動作素子を
収容した空間を真空状態に封止する手法としては様々な
手法が提案されている。例えば、真空装置における真空
状態(例えば、動作素子の動作特性が良好となる真空状
態(圧力が低い状態、例えば、0.1 Pa以下))の排気室
内で、動作素子を設けた基台と、蓋部材とを半田を用い
て接合し、パッケージ内の空間を真空状態に封止する手
法が提案されている。しかしながら、この手法では、動
作素子の動作特性が良好となる真空状態の中で基台と蓋
部材とを接合しても、接合時に半田からガスが発生し、
このガスの一部がパッケージ内に封止されパッケージ内
の真空状態は上記動作特性が良好となる真空状態よりも
悪くなってしまう。したがって、上記ガスのダンピング
作用を受け、動作素子の動作特性が悪化してしまうとい
う問題がある。
By the way, various methods have been proposed as a method for sealing a space accommodating an operating element in a vacuum state. For example, in an exhaust chamber in a vacuum state (for example, a vacuum state (a state where the pressure is low, for example, 0.1 Pa or less) where the operating characteristics of the operating element are good) in the vacuum device, a base provided with the operating element and a lid member There has been proposed a method of joining and using solder to seal the space inside the package in a vacuum state. However, in this method, even when the base and the lid member are joined in a vacuum state where the operating characteristics of the operating element are good, gas is generated from the solder at the time of joining,
A part of this gas is sealed in the package, and the vacuum state in the package becomes worse than the vacuum state in which the operation characteristics are good. Therefore, there is a problem that the operating characteristics of the operating element are deteriorated due to the damping action of the gas.

【0004】そこで、パッケージ内の真空状態を良くす
るために、パッケージ内にガスを吸着するゲッター材を
動作素子と共に収容する手法も提案されている。この手
法では、パッケージ内の真空状態は大変良くなるが、個
々のパッケージ内に上記ゲッター材を収容させる作業が
必要となり、その分、手間がかかり、つまり、作製工程
が増え、量産性を失ってしまい、製品の価格が高価にな
ってしまう。また、ゲッター材を収容する分、パッケー
ジが大型化してしまうという問題がある。
Therefore, in order to improve the vacuum state in the package, a method of accommodating a getter material that adsorbs gas in the package together with the operating element has also been proposed. With this method, the vacuum condition in the package becomes very good, but the work of accommodating the getter material in each package is required, which is time-consuming, that is, the number of manufacturing steps increases and mass productivity is lost. Therefore, the price of the product becomes expensive. Further, there is a problem that the package becomes large in size because the getter material is accommodated therein.

【0005】本発明は上記課題を解決するためになされ
たものであり、その目的は、動作素子が収容される収容
空間の真空状態を良くし、ダンピングによる動作素子の
動作特性の悪化を回避し、しかも、安価かつ小型の真空
封止デバイスおよびその製造方法を提供することにあ
る。
The present invention has been made to solve the above problems, and an object thereof is to improve the vacuum state of the accommodation space in which the operating element is accommodated and to avoid the deterioration of the operating characteristics of the operating element due to damping. Moreover, it is to provide an inexpensive and small-sized vacuum sealing device and a manufacturing method thereof.

【0006】[0006]

【課題を解決するための手段】上記目的を達成するため
に、本発明は次のような構成をもって課題を解決するた
めの手段としている。すなわち、真空封止デバイスの第
1の発明は、素子基板面に動作素子が形成され、この動
作素子が形成されている素子基板面上に蓋部材が接合さ
れてパッケージが形成され、素子基板と蓋部材の接合境
界領域に形成されたパッケージ内真空空間に前記動作素
子が収容されている真空封止デバイスにおいて、該真空
封止デバイスには前記真空空間内と外部とを連通する連
通路が形成され、この連通路の外部側開口の近傍には少
くとも一端がパッケージに固定支持された梁部と、この
梁部に連接されて前記外部側開口に対向するバルブ閉止
面とをもつアクチエータバルブが設けられ、このアクチ
エータバルブの梁部が外部側開口側に撓曲変形した動作
状態で外部側開口がアクチエータバルブのバルブ閉止面
によって閉止されている構成をもって前記課題を解決す
る手段としている。
In order to achieve the above object, the present invention has the following constitution as means for solving the problem. That is, the first invention of the vacuum-sealed device is such that an operating element is formed on a surface of an element substrate, and a lid member is joined to a surface of the element substrate on which the operating element is formed to form a package. A vacuum sealing device in which the operating element is housed in a package vacuum space formed in a bonding boundary region of a lid member. In the vacuum sealing device, a communication path is formed to connect the vacuum space and the outside. An actuator valve having a beam portion at least one end of which is fixedly supported by the package in the vicinity of the outer opening of the communication passage, and a valve closing surface which is connected to the beam portion and faces the outer opening. Is provided, and the external opening is closed by the valve closing surface of the actuator valve in an operating state in which the beam portion of the actuator valve is flexibly deformed toward the external opening side. And a means for solving the problems.

【0007】また、真空封止デバイスの第2の発明は、
素子基板面に動作素子が形成され、この動作素子が形成
されている素子基板面上に蓋部材が接合されてパッケー
ジが形成され、素子基板と蓋部材の接合境界領域に形成
されたパッケージ内真空空間に前記動作素子が収容され
ている真空封止デバイスにおいて、該真空封止デバイス
には前記真空空間内と外部とを連通する連通路が形成さ
れ、この連通路の外部側開口の近傍には少くとも一端が
パッケージに固定支持された梁部と、この梁部に連接さ
れて前記外部側開口に対向するバルブ閉止面とをもつア
クチエータバルブが設けられ、このアクチエータバルブ
の梁部が外部側開口側に撓曲変形した動作状態で外部側
開口がアクチエータバルブのバルブ閉止面にガス発生の
ない接合によって閉止されている構成をもって前記課題
を解決する手段としている。
The second invention of the vacuum sealed device is
The operating element is formed on the surface of the element substrate, the lid member is joined to the surface of the element substrate on which the operating element is formed to form a package, and the vacuum inside the package formed in the junction boundary region between the element substrate and the lid member. In a vacuum sealing device in which the operating element is housed in a space, a communication passage that communicates the inside of the vacuum space with the outside is formed in the vacuum sealing device, and the communication passage is provided in the vicinity of an outside opening. An actuator valve having a beam portion, at least one end of which is fixedly supported by the package, and a valve closing surface, which is connected to the beam portion and faces the external opening, is provided, and the beam portion of the actuator valve is external. And a means for solving the above-mentioned problem in a configuration in which the outer side opening is closed to the valve closing surface of the actuator valve by a joint that does not generate gas in an operating state in which the side opening side is flexibly deformed. To have.

【0008】さらに、真空封止デバイスの第3の発明
は、上記真空封止デバイスの第2の発明を構成するガス
発生のない接合は、接触面の共晶反応による溶融接合
と、共晶反応以外の溶融接合と、接触面を清浄にするこ
とにより生じる物理、化学的反応による接合と、加熱に
よって生じる拡散反応による接合とのうちのいずれかの
接合である構成をもって前記課題を解決する手段として
いる。
Further, the third invention of the vacuum sealing device, which constitutes the second invention of the above-mentioned vacuum sealing device, includes gas-free bonding, melt bonding by eutectic reaction of contact surfaces, and eutectic reaction. As a means for solving the above-mentioned problems, it is possible to use any one of fusion bonding other than the above, a physical and chemical reaction caused by cleaning the contact surface, and a diffusion reaction caused by heating. There is.

【0009】さらに、真空封止デバイスの第4の発明
は、上記真空封止デバイスの第1又は第2又は第3の発
明を構成する連通路の外部側開口の形成側とアクチエー
タバルブとの間には電圧印加によってアクチエータバル
ブの梁部を静電力によって撓曲変形させてバルブ閉止面
を外部側開口に加圧接触させる静電駆動手段が設けられ
ている構成をもって前記課題を解決する手段としてい
る。
Further, a fourth aspect of the vacuum sealing device is the formation of the external opening of the communication passage, which constitutes the first, second, or third aspect of the vacuum sealing device, and the actuator valve. Means for solving the above-mentioned problems by providing electrostatic drive means between which the beam portion of the actuator valve is flexibly deformed by electrostatic force by voltage application to press the valve closing surface to the external opening. I am trying.

【0010】さらに、真空封止デバイスの第5の発明
は、上記真空封止デバイスの第1又は第2又は第3又は
第4の発明を構成する素子基板と蓋部材の一方側の材料
はSiであり、他方側はガラスとSiのいずれか一方の
材料で形成されている構成をもって、さらにまた、真空
封止デバイスの第6の発明は、上記真空封止デバイスの
第1又は第2又は第3又は第4又は第5の発明を構成す
るパッケージ内に収容されている動作素子は振動素子で
ある構成をもって、前記課題を解決する手段としてい
る。
Further, in a fifth invention of the vacuum sealing device, the material of one side of the element substrate and the cover member constituting the first or second or third or fourth invention of the above vacuum sealing device is Si. And the other side is made of a material of either glass or Si, and the sixth invention of the vacuum sealing device is the first or second or the second vacuum sealing device. The operating element housed in the package of the third, fourth, or fifth invention is a vibrating element, which serves as means for solving the above problems.

【0011】また、本発明の真空封止デバイスの製造方
法は、動作素子が形成されている素子基板の基板面上に
蓋部材が接合されてパッケージが形成され、素子基板と
蓋部材の接合境界領域に形成したパッケージ内真空空間
内に前記動作素子が収容される真空封止デバイスの製造
方法において、素子基板面に動作素子を形成した素子基
板と蓋部材の少くとも一方の接合面に前記真空空間とな
る凹部を形成しておくとともに、素子基板と蓋部材の一
方側の接合面領域に前記真空空間内と外部とを連通する
連通路を形成しておき、さらに、この連通路の外部側開
口の形成面と該形成面に対向する接合相手側のアクチエ
ータ形成面との少くとも一方にアクチエータ動作間隙を
形成しておき、さらにまた、前記アクチエータ形成面に
前記連通路の外部側開口に対向するバルブ閉止面とそれ
を支持する梁部を連接して成るアクチエータバルブを少
くとも梁部の一端を固定して形成しておき、素子基板の
動作素子が形成されている基板面に蓋部材を陽極接合に
より接合してパッケージ化し、次に、真空中でパッケー
ジ内の真空空間の空気を連通路を介して真空排気し、然
る後に、真空中で前記アクチエータバルブの梁部を撓曲
変形してバルブ閉止面で連通路の外部側開口を塞いで該
バルブ閉止面と前記外部側開口の形成面とをガス発生の
ない接合手法によって接合する構成をもって、前記課題
を解決する手段としている。
Further, in the method for manufacturing a vacuum sealed device according to the present invention, a lid member is joined to the substrate surface of the element substrate on which the operating element is formed to form a package, and a junction boundary between the element substrate and the lid member is formed. In a method of manufacturing a vacuum-sealed device in which the operating element is housed in a package vacuum space formed in a region, the vacuum is applied to at least one joint surface of an element substrate having an operating element formed on an element substrate surface and a lid member. A concave portion to be a space is formed, and a communication passage that communicates the inside of the vacuum space with the outside is formed in the bonding surface region on one side of the element substrate and the lid member. An actuator operation gap is formed on at least one of the formation surface of the opening and the actuator formation surface of the mating partner opposite to the formation surface. An actuator valve formed by connecting a valve closing surface facing the opening and a beam supporting the same is formed by fixing at least one end of the beam, and the substrate surface on which the operating element of the element substrate is formed. The lid member is joined to the package by anodic bonding to form a package, and then the air in the vacuum space in the package is evacuated through a communication path in a vacuum, and then the beam portion of the actuator valve is formed in a vacuum. The above problem is solved by a configuration in which the valve closing surface is flexibly deformed to close the outer side opening of the communication passage and the valve closing surface and the surface on which the outer side opening is formed are joined by a gas-free joining method. As a means.

【0012】また、本発明の真空封止デバイスの製造方
法は、ガス発生のない接合手法は、溶融接合と、接触面
を清浄にすることにより生じる物理、化学的反応による
接合と、加熱によって生じる拡散反応による接合とのう
ちのいずれかの接合であること、バルブ閉止面と連通路
の外部側開口の形成面を接合した後に、蒸着若しくはス
パッタの膜で前記接合部を封止すること、バルブ閉止面
と連通路の外部側開口の形成面の接合は接合の接触面を
加熱して行うこと、バルブ閉止面と連通路の外部開口形
成面との溶融接合の溶融反応はAu−Siの共晶反応に
より行うこと、素子基板と蓋部材の一方側の材料はSi
であり、他方側はガラスとSiのいずれか一方の材料で
あることも課題を解決する特徴的な手段としている。
Further, in the method for manufacturing a vacuum sealed device of the present invention, the gas-free bonding method is performed by fusion bonding, bonding by a physical or chemical reaction generated by cleaning the contact surface, and heating. One of bonding by diffusion reaction, bonding the valve closing surface and the surface forming the external opening of the communication passage, and then sealing the bonding portion with a film of vapor deposition or sputtering, The closing surface and the surface forming the external opening of the communicating passage are joined by heating the contact surface of the joining, and the melting reaction of the melting joining between the valve closing surface and the surface forming the external opening of the communicating passage is performed by the Au-Si joint. Crystallization reaction, and the material on one side of the element substrate and the lid member is Si
It is also a characteristic means for solving the problem that the other side is made of either one of glass and Si.

【0013】上記構成の発明において、真空封止デバイ
スに、動作素子が収容されている空間と外部とを連通す
る連通路を設けておき、真空中で、上記素子収容空間の
空気を連通路から真空排気して素子収容空間を真空状態
にする。然る後、真空中で、アクチエータバルブの梁部
を撓曲変形してバルブ閉止面で連通路の外部側開口を塞
ぎ、バルブ閉止面と、外部側開口の形成面とを、例え
ば、共晶反応等の溶融反応や、接触面を清浄にすること
により生じる物理、化学的反応や、拡散反応等の接合反
応を利用し接合する。その後、必要に応じ、接合部を蒸
着若しくはスパッタの膜で封止し、接合部をより一層強
固に封止する。
In the invention of the above structure, the vacuum sealing device is provided with a communication passage for communicating the space in which the operating element is housed with the outside, and air in the element housing space is evacuated from the communication passage in vacuum. The element housing space is evacuated by evacuation. Then, in a vacuum, the beam portion of the actuator valve is flexibly deformed to close the outer side opening of the communication passage with the valve closing surface, and the valve closing surface and the outer side opening forming surface are Bonding is performed by utilizing a melting reaction such as a crystallization reaction, a physical or chemical reaction generated by cleaning the contact surface, or a bonding reaction such as a diffusion reaction. Then, if necessary, the joint is sealed with a vapor-deposited or sputtered film to further firmly seal the joint.

【0014】上記のように、連通路の外部側開口をアク
チエータバルブのバルブ閉止面で接触面の接合反応によ
って閉止し、上記素子収容空間を真空状態に封止するこ
とにより、上記接合反応はガスの発生がないと見做すこ
とができるため、従来のような半田からの発生ガスによ
る動作素子収容空間の真空状態の悪化は回避され、動作
素子収容空間を動作素子の動作特性が良好となる真空状
態で封止することができ、動作素子の動作特性に優れた
真空封止デバイスを提供することが可能となる。
As described above, the outer side opening of the communication passage is closed by the bonding reaction of the contact surface at the valve closing surface of the actuator valve, and the element housing space is sealed in a vacuum state, whereby the bonding reaction is performed. Since it can be considered that no gas is generated, the deterioration of the vacuum state of the operating element housing space due to the gas generated from solder as in the past is avoided, and the operating element housing space is considered to have good operating characteristics. It is possible to provide a vacuum-sealed device that can be sealed in the following vacuum state and that has excellent operating characteristics of the operating element.

【0015】また、上記のように、動作素子収容空間は
真空状態が良好な状態で封止されるので、従来例で示し
たようなガスを吸着し真空状態を良好にするためのゲッ
ター材を動作素子収容空間に収容する必要がなく、その
ゲッター材の大きさ分、真空封止デバイスの小型化が図
れる。また、ゲッター材収容作業を省略できる分、手間
や製造工程数の低減が図れて製品の量産化につながり、
製品の価格が安価となる。
Further, as described above, since the operating element accommodating space is sealed in a good vacuum state, a getter material for adsorbing gas and improving the vacuum state as shown in the conventional example is used. Since it is not necessary to store it in the operating element housing space, the vacuum sealing device can be downsized by the size of the getter material. In addition, since the getter material accommodation work can be omitted, the labor and the number of manufacturing steps can be reduced, leading to mass production of products,
The price of the product becomes cheap.

【0016】[0016]

【発明の実施の形態】以下に、本発明に係る実施の形態
例を図面に基づいて説明する。図1には本実施の形態例
における真空封止デバイス1の主要構成が示されてい
る。この真空封止デバイス1は、ガラス基板で形成され
た蓋部材6と、動作素子4と、動作素子4が形成される
素子基板3と、梁部11とバルブ閉止面12とを有するアク
チエータバルブ13と、静電駆動手段14とを有して構成さ
れている。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 shows the main configuration of a vacuum sealed device 1 according to this embodiment. This vacuum sealing device 1 is an actuator valve having a lid member 6 formed of a glass substrate, an operating element 4, an element substrate 3 on which the operating element 4 is formed, a beam portion 11 and a valve closing surface 12. It has 13 and an electrostatic drive means 14.

【0017】同図において、単結晶シリコン(Si)の
素子基板3の表面側にはマイクロマシニング技術を用い
て動作素子(図示の例ではジャイロや共振子等の振動素
子)4が形成されており、この素子基板3の素子形成面
の上側には、動作素子4に対向する領域に凹部17が形成
されている蓋部材6が陽極接合により接合されパッケー
ジが構成されている。上記蓋部材6の凹部17によって、
同図の(b)に示すように、蓋部材6と素子基板3の接
合境界領域に動作素子4の収容空間7が形成されてお
り、この空間7は動作素子4が優れた動作特性を示す真
空状態で封止されている。
In the figure, an operating element (a vibrating element such as a gyro or a resonator in the illustrated example) 4 is formed on the surface side of an element substrate 3 made of single crystal silicon (Si) by using a micromachining technique. On the upper side of the element forming surface of the element substrate 3, a lid member 6 having a recess 17 formed in a region facing the operating element 4 is joined by anodic bonding to form a package. By the recess 17 of the lid member 6,
As shown in (b) of the same figure, a housing space 7 for the operating element 4 is formed in the joint boundary region between the lid member 6 and the element substrate 3, and this space 7 shows excellent operating characteristics of the operating element 4. It is sealed in a vacuum.

【0018】また、蓋部材6の素子基板対向面には外部
と連通する凹部16が形成されており、この凹部16によっ
て、蓋部材6と素子基板3の接合境界領域に外部と連通
する空間部23が構成される。この空間部23と、前記動作
素子4の収容空間7とを連通する連通路8が素子基板3
に設けられている。この連通路8の外部側開口9は金
(Au)、シリコン(Si)、アルミニウム(Al)等
で形成されたアクチエータバルブ13のバルブ閉止面12に
よって塞がれている。バルブ閉止面12が金(Au)の場
合は、バルブ閉止面12と、該バルブ閉止面12に接触する
素子基板3の基板面とは、金(Au)とシリコン(S
i)の共晶反応によって溶融接合されている。また、バ
ルブ閉止面12として、他の材料を用いた場合には、溶融
反応や、接触面を清浄にすることにより起こる物理、化
学的反応や、加熱により起こる拡散反応等を利用して接
合されている。
Further, a concave portion 16 communicating with the outside is formed on the surface of the lid member 6 facing the element substrate, and a space portion communicating with the outside in the joint boundary region between the lid member 6 and the element substrate 3 is formed by the concave portion 16. 23 are composed. The communication path 8 that connects the space 23 and the accommodation space 7 for the operating element 4 is formed by the element substrate 3
It is provided in. The outer opening 9 of the communication passage 8 is closed by a valve closing surface 12 of an actuator valve 13 made of gold (Au), silicon (Si), aluminum (Al) or the like. When the valve closing surface 12 is gold (Au), the valve closing surface 12 and the substrate surface of the element substrate 3 contacting the valve closing surface 12 are made of gold (Au) and silicon (S).
It is melt-bonded by the eutectic reaction of i). Further, when other materials are used for the valve closing surface 12, they are joined by utilizing a melting reaction, a physical or chemical reaction caused by cleaning the contact surface, or a diffusion reaction caused by heating. ing.

【0019】同図の(a)に示すように、上記バルブ閉
止面12は片持ち梁形状の梁部11の先端側に設けられ、梁
部11の基端側は蓋部材6の凹部16底面に連接されてお
り、同図の(b)に示すように、梁部11は外部側開口9
側に撓曲変形した動作状態となっている。梁部11の基端
側は同図の(a)に示す導体パターン19を介し蓋部材6
に設けられたスルーホール21に導通接続されている。ま
た、上記スルーホール21に導通接続する電極パターン25
が蓋部材6の表面側に形成されている。上記導体パター
ン19とスルーホール21と電極パターン25とによって、ア
クチエータバルブ13に外部の電圧印加手段(図示せず)
を導通接続させる静電駆動手段14が構成されている。な
お、図中、18は動作素子4を駆動させるための導体パタ
ーンであり、20は、導体パターン18を、外部の駆動手段
(図示せず)に導通接続させて動作素子4を駆動させる
ためのスルーホールである。
As shown in FIG. 3A, the valve closing surface 12 is provided on the tip side of the cantilever-shaped beam portion 11, and the base end side of the beam portion 11 is the bottom surface of the recess 16 of the lid member 6. The beam portion 11 is connected to the outside opening 9 as shown in FIG.
It is in an operating state in which it is flexed and deformed to the side. The base end side of the beam portion 11 is provided with a lid member 6 via a conductor pattern 19 shown in FIG.
Is electrically connected to a through hole 21 provided in the. Also, an electrode pattern 25 that is conductively connected to the through hole 21.
Is formed on the front surface side of the lid member 6. An external voltage applying means (not shown) is applied to the actuator valve 13 by the conductor pattern 19, the through hole 21, and the electrode pattern 25.
An electrostatic drive means 14 for electrically connecting the above is constituted. In the figure, 18 is a conductor pattern for driving the operating element 4, and 20 is a conductive pattern for electrically connecting the conductor pattern 18 to an external driving means (not shown) to drive the operating element 4. It is a through hole.

【0020】以下に上記構成の真空封止デバイス1の製
造方法を説明する。製造手順を大まかに述べると、図2
の(c)に示すように動作素子4や連通路8等が形成さ
れる素子基板3と、図3の(d)に示すように凹部17,
16やアクチエータバルブ13等が設けられる蓋部材6とを
別々に作製し、図4の(b)に示すように素子基板3と
蓋部材6とを接合して動作素子4の収容空間7を真空状
態で封止し真空封止デバイス1を作製する。
A method of manufacturing the vacuum sealed device 1 having the above structure will be described below. The manufacturing procedure is roughly described in FIG.
3 (c), the element substrate 3 on which the operating element 4, the communication path 8 and the like are formed, and the recess 17, as shown in FIG. 3 (d),
16 and the lid member 6 provided with the actuator valve 13 and the like are separately produced, and the element substrate 3 and the lid member 6 are bonded to each other to form the accommodation space 7 for the operating element 4 as shown in FIG. 4B. The vacuum sealing device 1 is manufactured by sealing in a vacuum state.

【0021】以下に詳細な製造方法を述べる。素子基板
3において、まず、図2の(a)に示すように、単結晶
シリコン(Si)の基板26の表面側に前記連通路8を形
成するための溝27をKOH溶液等を用いたエッチングに
より形成する。次に、同図の(b)に示すように、上記
基板26の溝形成面側にシリコンの基板28を重ね、約1000
℃に加熱して基板26と28とを接合し素子基板3を構成す
る。その後、必要に応じ、素子基板3(基板28)の表面
側を研磨して基板28部分の厚みを薄くする。そして、同
図の(c)に示すように、素子基板3の表面側に、マイ
クロマシニング技術を用いて、動作素子4を形成し、ま
た、RIE(Reactive Ion Etching)等のエッチングに
より、前記溝27に貫通する貫通孔29A,29Bを開けて連
通路8を形成する。さらに、導体パターン18を設ける。
The detailed manufacturing method will be described below. In the element substrate 3, first, as shown in FIG. 2A, a groove 27 for forming the communication passage 8 is formed on the surface side of the substrate 26 of single crystal silicon (Si) by etching using a KOH solution or the like. Formed by. Next, as shown in (b) of the same figure, a silicon substrate 28 is laid over the groove forming surface side of the substrate 26, and the substrate 28
The element substrates 3 are formed by heating the substrates to join the substrates 26 and 28. Thereafter, if necessary, the surface side of the element substrate 3 (substrate 28) is polished to reduce the thickness of the substrate 28 portion. Then, as shown in (c) of the figure, the operating element 4 is formed on the surface side of the element substrate 3 by using a micromachining technique, and the groove is formed by etching such as RIE (Reactive Ion Etching). Through holes 29A and 29B penetrating through 27 are opened to form the communication passage 8. Further, a conductor pattern 18 is provided.

【0022】蓋部材6においては、まず、図3の(a)
に示すように、ガラス基板30の表面に、動作素子4に対
向する凹部17と、連通路8の外部側開口9に対向する凹
部16とをHF溶液を用いたエッチング等で形成する。次
に、同図の(b)に示すように、スルーホール20,21を
形成するための貫通孔31を炭酸ガスレーザ等のレーザビ
ームにより開け、同図の(c)に示すように、凹部16の
底面にZnO等で形成される犠牲層32を形成し、その
後、バルブ閉止面12およびその梁部11となる金(Au)
やシリコン(Si)やアルミニウム(Al)等の層を設
ける。そして、然る後、同図の(d)に示すように、犠
牲層32をエッチングにより除去し、アクチエータバルブ
13を形成する。
In the lid member 6, first, as shown in FIG.
As shown in FIG. 3, a concave portion 17 facing the operating element 4 and a concave portion 16 facing the external opening 9 of the communication passage 8 are formed on the surface of the glass substrate 30 by etching using an HF solution or the like. Next, as shown in (b) of the figure, a through hole 31 for forming the through holes 20 and 21 is opened by a laser beam such as a carbon dioxide gas laser, and as shown in (c) of the figure, the recess 16 is formed. A sacrificial layer 32 made of ZnO or the like is formed on the bottom surface of the valve, and then gold (Au) that becomes the valve closing surface 12 and its beam portion 11 is formed.
A layer of silicon, silicon (Si), aluminum (Al), or the like is provided. Then, after that, as shown in (d) of the figure, the sacrificial layer 32 is removed by etching, and the actuator valve is removed.
Form 13.

【0023】上記のように作製された素子基板3と蓋部
材6とを、図4の(a)に示すように、重ね合わせ、陽
極接合法により接合しパッケージ化する。この陽極接合
法を利用した接合時に、素子基板3とアクチエータバル
ブ13の電位を等しくなるようにしておき、バルブ閉止面
12が連通路8の外部側開口9を塞いでしまうのを防止す
る。上記陽極接合後、蓋部材6に設けられた貫通孔31の
内部周面に導体膜34を蒸着等により設けてスルーホール
20,21を形成し、また、蓋部材6の表面側にはスルーホ
ール21に導通接続する電極パターン25を形成する。
The element substrate 3 and the lid member 6 manufactured as described above are superposed on each other as shown in FIG. 4 (a) and bonded by the anodic bonding method to form a package. At the time of joining using this anodic joining method, the electric potentials of the element substrate 3 and the actuator valve 13 are set to be equal to each other, and the valve closing surface is closed.
It is prevented that 12 blocks the outside opening 9 of the communication passage 8. After the above anodic bonding, a conductor film 34 is provided on the inner peripheral surface of the through hole 31 provided in the lid member 6 by vapor deposition or the like to form a through hole.
20 and 21 are formed, and an electrode pattern 25 that is electrically connected to the through hole 21 is formed on the surface side of the lid member 6.

【0024】然る後、上記パッケージを真空装置の排気
室内に設置し、電極パターン25と素子基板3に設けた端
子部(図示せず)とに外部の電圧印加手段(図示せず)
を導通接続し、その後、排気室内を動作素子4が優れた
動作特性を示す真空状態(例えば0.1 Pa以下)にして連
通路8から素子収容空間7の空気を真空排気する。この
とき、素子基板3や蓋部材6に吸着されているガスも十
分に排気するためにパッケージを加熱しながら素子収容
空間7の真空排気を行うことが望ましい。
After that, the above-mentioned package is installed in an exhaust chamber of a vacuum apparatus, and external voltage applying means (not shown) is applied to the electrode pattern 25 and a terminal portion (not shown) provided on the element substrate 3.
Then, the exhaust chamber is placed in a vacuum state (for example, 0.1 Pa or less) in which the operating element 4 exhibits excellent operating characteristics, and the air in the element housing space 7 is evacuated from the communication passage 8. At this time, in order to sufficiently exhaust the gas adsorbed on the element substrate 3 and the lid member 6, it is desirable to evacuate the element housing space 7 while heating the package.

【0025】そして、素子収容空間7内を完全に真空排
気した後、引き続き真空装置の排気室内を真空に維持し
た状態でアクチエータバルブ13と素子基板3との間に電
圧を印加する。すると、静電力(クーロン力)作用によ
って、梁部11が撓曲変形しバルブ閉止面12が素子基板3
に引き寄せられ、図4の(b)に示すように、アクチエ
ータバルブ13のバルブ閉止面12が連通路8の外部側開口
9の形成面に加圧接触し、外部側開口9を塞ぐ。
Then, after the element housing space 7 is completely evacuated, a voltage is applied between the actuator valve 13 and the element substrate 3 while the exhaust chamber of the vacuum device is kept vacuum. Then, due to the electrostatic force (Coulomb force), the beam portion 11 is flexibly deformed, and the valve closing surface 12 becomes the element substrate 3.
As shown in FIG. 4B, the valve closing surface 12 of the actuator valve 13 comes into pressure contact with the surface of the communication passage 8 on which the external opening 9 is formed, and closes the external opening 9.

【0026】この状態で、例えば、バルブ閉止面12が金
(Au)で形成されている場合には、素子基板3を約40
0 ℃に加熱し素子基板3とバルブ閉止面12の接触面をシ
リコン(Si)と金(Au)の共晶反応により溶融接合
させる。また、バルブ閉止面12がSiやAl等のAu以
外の材料で形成されている場合には、共晶反応以外の溶
融反応による溶融接合や、接触面を清浄にすることによ
り生じる物理、化学的反応による接合や、加熱によって
生じる拡散反応による接合等の接合手法により接合させ
る。その後、必要に応じ、上記接合部分を金(Au)や
アルミニウム(Al)等の蒸着若しくはスパッタの膜で
封止し、より一層強固に外部側開口9を閉止する。以上
のように、真空封止デバイス1は製造される。
In this state, for example, when the valve closing surface 12 is made of gold (Au), the element substrate 3 is about 40
By heating to 0 ° C., the contact surface between the element substrate 3 and the valve closing surface 12 is melt-bonded by a eutectic reaction of silicon (Si) and gold (Au). Further, when the valve closing surface 12 is made of a material other than Au such as Si or Al, it is possible to perform fusion bonding by a melting reaction other than the eutectic reaction, or physical or chemical generated by cleaning the contact surface. The joining is performed by a joining method such as joining by reaction or joining by diffusion reaction generated by heating. After that, if necessary, the above-mentioned joint portion is sealed with a vapor-deposited or sputtered film of gold (Au), aluminum (Al) or the like, and the outer side opening 9 is closed more firmly. As described above, the vacuum sealed device 1 is manufactured.

【0027】本実施の形態例によれば、動作素子4を収
容する空間7と外部とを連通する連通路8と、連通路8
の外部側開口9に対向するバルブ閉止面12と梁部11とを
有するアクチエータバルブ13と、アクチエータバルブ13
のバルブ閉止面12を静電力によって連通路8の外部側開
口9に加圧接触させる静電駆動手段14とを設けたので、
動作素子4の収容空間7を連通路8から真空排気後、静
電駆動手段14を用いた電圧印加による静電力作用によ
り、バルブ閉止面12で連通路8の外部側開口9を塞い
で、バルブ閉止面12と素子基板3との接触面を、溶融反
応や、接触面を清浄にすることにより生じる物理、化学
的反応や、拡散反応等の接合反応により強固に接合する
ことができる。
According to this embodiment, the communication passage 8 for communicating the space 7 for accommodating the operating element 4 with the outside and the communication passage 8 are provided.
An actuator valve 13 having a valve closing surface 12 and a beam portion 11 facing the outer opening 9 of the actuator, and an actuator valve 13
Since an electrostatic drive means 14 for pressing the valve closing surface 12 of the above to the outer side opening 9 of the communication passage 8 by electrostatic force is provided,
After evacuating the accommodation space 7 of the operating element 4 from the communication passage 8, the valve closing surface 12 closes the outer side opening 9 of the communication passage 8 by the electrostatic force action by the voltage application using the electrostatic drive means 14. The contact surface between the closing surface 12 and the element substrate 3 can be firmly bonded by a melting reaction, a physical or chemical reaction generated by cleaning the contact surface, or a bonding reaction such as a diffusion reaction.

【0028】また、上記バルブ閉止面12と素子基板3と
の接触面の接合反応はガス発生がないと見做すことがで
き、接合時におけるガスの発生に起因した素子収容空間
7の真空状態の悪化を回避することができる。つまり、
動作素子4を動作特性が良好となる真空状態に封止する
ことが可能となり、動作素子4の動作特性に優れた真空
封止デバイスを提供することができる。
The bonding reaction of the contact surface between the valve closing surface 12 and the element substrate 3 can be regarded as no gas generation, and the vacuum state of the element housing space 7 caused by the gas generation at the time of bonding. Can be avoided. That is,
It is possible to seal the operating element 4 in a vacuum state in which the operating characteristics are good, and it is possible to provide a vacuum sealed device in which the operating characteristics of the operating element 4 are excellent.

【0029】さらに、上記の如く、動作素子4を動作特
性が良好となる真空状態に封止することが可能となった
ことから、従来のように個々の素子収容空間7にガスを
吸着させるためのゲッター材を収容する必要がなくな
り、ゲッター材の収容作業を省略することができ、真空
封止デバイスの量産化を図ることができる。また、ゲッ
ター材を収容しない分、真空封止デバイスの小型化を図
ることができる。
Further, as described above, since it becomes possible to seal the operating element 4 in a vacuum state in which the operating characteristics are good, in order to adsorb gas in the individual element housing space 7 as in the conventional case. It is not necessary to house the getter material, the work of housing the getter material can be omitted, and the vacuum-sealed device can be mass-produced. Further, since the getter material is not housed, the vacuum sealed device can be downsized.

【0030】ところで、連通路8の外部側開口9を蒸着
やスパッタの膜で閉止することも考えられるが、この場
合には、蒸着のガスやスパッタの雰囲気ガスが連通路8
から動作素子4の収容空間7に入り込み、空間7の真空
状態を悪化させるという問題がある。しかも、蒸着やス
パッタの膜で外部側開口9を閉止するために、外部側開
口9の開口面積を狭くしなければならず、動作素子4の
収容空間7を動作素子4の動作特性が良好となる目的の
真空状態まで真空排気するのに時間がかかる。
By the way, it is conceivable to close the outer opening 9 of the communication passage 8 with a film of vapor deposition or sputtering, but in this case, the vapor deposition gas or the atmospheric gas of sputtering is used.
Therefore, there is a problem that it enters the accommodation space 7 of the operating element 4 and deteriorates the vacuum state of the space 7. Moreover, in order to close the outer side opening 9 with a film formed by vapor deposition or sputtering, the opening area of the outer side opening 9 must be narrowed, and the operating space of the operating element 4 has a good operating characteristic. It takes time to evacuate to the desired vacuum state.

【0031】これに対し、本実施の形態例ではバルブ閉
止面12で外部側開口9を塞ぐので、外部側開口9の開口
面積を広くすることが可能で、このことにより、素子収
容空間7の真空排気時間の短縮を図ることができ、真空
封止デバイスの量産化を推し進めることができる。しか
も、バルブ閉止面12を蒸着やスパッタの膜でシール(封
止)することによって、大きな力がアクチエータバルブ
13に加わってバルブ閉止面12が外部側開口9から外れる
ということを確実に防止することができ、真空封止デバ
イスの機械的強度を高めることができる。
On the other hand, in the present embodiment, since the valve-closing surface 12 closes the outer opening 9, the opening area of the outer opening 9 can be increased. The vacuum evacuation time can be shortened, and the mass production of vacuum sealed devices can be promoted. Moreover, by sealing the valve closing surface 12 with a film of vapor deposition or sputtering, a large force can be applied to the actuator valve.
In addition to 13, it is possible to reliably prevent the valve closing surface 12 from coming off from the external opening 9, and it is possible to enhance the mechanical strength of the vacuum sealing device.

【0032】なお、本発明は上記実施の形態例に限定さ
れるものではなく、様々な実施の態様を採り得る。例え
ば、上記実施の形態例では動作素子4がジャイロや共振
子等の振動素子であったが、アクチエータ等の動作素子
でもよい。また、上記実施の形態例では蓋部材6はガラ
ス基板で形成されていたが、シリコン基板の表面(表裏
両面)にガラス膜が形成されている等、他の形態のもの
でもよい。
The present invention is not limited to the above-mentioned embodiments, but various embodiments can be adopted. For example, although the operating element 4 is a vibrating element such as a gyro or a resonator in the above-described embodiment, it may be an operating element such as an actuator. Further, although the lid member 6 is formed of the glass substrate in the above-described embodiment, other forms such as a glass film formed on the surface (both front and back surfaces) of the silicon substrate may be used.

【0033】さらに、上記実施の形態例では静電駆動手
段14を設け、この静電駆動手段14を用いて連通路8の外
部側開口9の閉止時にアクチエータバルブ13に電圧を印
加し、静電力を利用してバルブ閉止面12を外部側開口9
の形成面に加圧接触させ外部側開口9を塞いでいたが、
作業ロボット等がバルブ閉止面12を外部側開口9の形成
面に加圧接触させ外部側開口9を塞いでもよい。このよ
うな場合にはアクチエータバルブ13をガラス等の絶縁体
で形成することができる。また、圧電、熱応力、静磁
力、磁歪等を利用して梁部11を撓曲変形させバルブ閉止
面12を外部側開口9の形成面に加圧接触させ外部側開口
9を塞いでもよい。
Further, in the above-mentioned embodiment, the electrostatic drive means 14 is provided, and a voltage is applied to the actuator valve 13 when the external side opening 9 of the communication passage 8 is closed by using the electrostatic drive means 14 so as to maintain the static electricity. Use the electric power to open the valve closing surface 12 to the outside opening 9
Although the outer side opening 9 was closed by making pressure contact with the formation surface of
A work robot or the like may close the outer opening 9 by bringing the valve closing surface 12 into pressure contact with the surface on which the outer opening 9 is formed. In such a case, the actuator valve 13 can be made of an insulating material such as glass. Alternatively, the beam portion 11 may be flexibly deformed by utilizing piezoelectric force, thermal stress, static magnetic force, magnetostriction, or the like, and the valve closing surface 12 may be brought into pressure contact with the formation surface of the outer opening 9 to close the outer opening 9.

【0034】さらに、上記実施の形態例では、アクチエ
ータバルブ13の梁部11は片持ち梁形状であったが、両持
ち梁形状でもよい。さらに、上記実施の形態例では素子
基板3はシリコン(Si)で形成されていたが、シリコ
ンとは限らず、他の材料で形成してもよい。
Further, in the above embodiment, the beam portion 11 of the actuator valve 13 has a cantilever shape, but it may have a double-supported beam shape. Furthermore, although the element substrate 3 is formed of silicon (Si) in the above-described embodiment, the element substrate 3 is not limited to silicon and may be formed of another material.

【0035】さらに、上記実施の形態例では、バルブ閉
止面12を外部側開口9の形成面に加圧接触させて外部側
開口9を塞いだ状態で、バルブ閉止面12とその接触面を
溶融反応や拡散反応や物理、化学的反応等により接合さ
せていたが、例えば、バルブ閉止面12を外部側開口9の
形成面に加圧接触させ、その状態で、バルブ閉止面12
を、有機性の接着剤や、CVD等によって形成させる酸
化膜等でシールしたり、また、静電力によって、上記バ
ルブ閉止面12が外部側開口9の形成面に加圧接触してい
る状態を維持させる等して、バルブ閉止面12とその接触
面を接合せずに、バルブ閉止面12で外部側開口9を閉止
してもよい。
Further, in the above embodiment, the valve closing surface 12 and its contact surface are melted in a state in which the valve closing surface 12 is brought into pressure contact with the formation surface of the external opening 9 to close the external opening 9. Although they were joined by a reaction, a diffusion reaction, a physical, a chemical reaction, etc., for example, the valve closing surface 12 is brought into pressure contact with the formation surface of the outer side opening 9, and in that state, the valve closing surface 12
Is sealed with an organic adhesive, an oxide film formed by CVD or the like, or the state where the valve closing surface 12 is in pressure contact with the surface where the external opening 9 is formed by electrostatic force. The outer side opening 9 may be closed by the valve closing surface 12 without joining the valve closing surface 12 and its contact surface, for example, by maintaining it.

【0036】上記のようなバルブ閉止面12をシールする
ための有機性の接着剤等からガスが発生しても、バルブ
閉止面12が外部側開口9の形成面に加圧接触して外部側
開口9を塞いでおり、その上、バルブ閉止面12とその接
触面が平滑である場合にはバルブ閉止面12とその接触面
は弱い物理的接合状態となるので、上記発生ガスが外部
側開口9から連通路8に入り込むことはなく、上記実施
の形態例同様に、動作素子4を収容している空間7を動
作素子4の動作特性が良好となる真空状態に封止するこ
とができる。
Even if gas is generated from the organic adhesive or the like for sealing the valve closing surface 12 as described above, the valve closing surface 12 is brought into pressure contact with the surface on which the external opening 9 is formed and the external side is closed. When the opening 9 is closed and the valve closing surface 12 and its contact surface are smooth, the valve closing surface 12 and its contact surface are in a weak physical contact state, so that the generated gas is exposed to the outside opening. 9 does not enter the communication passage 8 and the space 7 accommodating the operating element 4 can be sealed in a vacuum state in which the operating characteristics of the operating element 4 are good, as in the above-described embodiment.

【0037】さらに、上記実施の形態例では、蓋部材6
における動作素子対向領域に凹部17を形成し、この凹部
17により蓋部材6と素子基板3の接合境界領域に動作素
子4を収容する空間7が形成されたが、これとは逆に、
素子基板3に凹部を形成して収容空間7を作成し、この
凹部の底面に動作素子4を設けるようにしてもよい。
Further, in the above embodiment, the lid member 6
A concave portion 17 is formed in a region facing the operating element in
A space 7 for accommodating the operating element 4 is formed in the joint boundary area between the lid member 6 and the element substrate 3 by 17, but conversely,
A recess may be formed in the element substrate 3 to form the accommodation space 7, and the operating element 4 may be provided on the bottom surface of this recess.

【0038】さらに、上記実施の形態例では、素子基板
3に連通路8を設けたが、蓋部材6に連通路8を設けて
もよいし、また、連通路8は必ずしも素子基板3と蓋部
材6との接合領域に設けるとは限らず、例えば、図5に
示すように蓋部材6の厚み方向に連通路8を設けたり、
あるいは鎖線で示すような形態で、素子基板3に連通路
8を設ける等、様々な実施の形態を採り得る。もちろ
ん、連通路8をどのように設けても、連通路8の外部側
開口9に対向してアクチエータバルブ13のバルブ閉止面
12が形成される。
Further, in the above embodiment, the communication passage 8 is provided in the element substrate 3, but the communication passage 8 may be provided in the lid member 6, and the communication passage 8 is not necessarily the element substrate 3 and the lid. It is not limited to be provided in the joining region with the member 6, and for example, as shown in FIG. 5, a communication passage 8 may be provided in the thickness direction of the lid member 6,
Alternatively, various embodiments such as providing the communication path 8 in the element substrate 3 in a form shown by a chain line can be adopted. Of course, no matter how the communication passage 8 is provided, the valve closing surface of the actuator valve 13 faces the outer opening 9 of the communication passage 8.
12 are formed.

【0039】[0039]

【発明の効果】本発明によれば、連通路の外部側開口を
アクチエータバルブのバルブ閉止面でガスの発生のない
接合反応によって閉止しているものにおいては、接合時
にガス発生がなく、従来のように半田を用いた接合によ
ってガスが発生し動作素子を収容した空間の真空状態を
悪化することはなく、動作素子収容空間を動作素子の動
作特性が良好となる真空状態に封止することが可能とな
り、動作素子の動作特性に優れた真空封止デバイスを提
供することができる。
According to the present invention, in the case where the outer side opening of the communication passage is closed at the valve closing surface of the actuator valve by the bonding reaction without gas generation, no gas is generated at the time of bonding, Sealing the operating element accommodating space in a vacuum state in which the operating characteristics of the operating element are good without causing deterioration of the vacuum state of the space accommodating the operating element due to the generation of gas due to soldering as in It is possible to provide a vacuum sealed device having excellent operating characteristics of the operating element.

【0040】また、上記の如く、動作素子収容空間を動
作素子の動作特性が良好となる真空状態に封止すること
ができることから、従来のようなガスを吸着するための
ゲッター材を動作素子収容空間に収容する必要がなく、
その分、真空封止デバイスの小型化を図ることができ
る。また、ゲッター材を収容する作業が省略されるた
め、手間や作業工程数が低減され、製品の量産化を図る
ことができ、安価な真空封止デバイスを提供することが
できる。
Further, as described above, since the operating element accommodating space can be sealed in a vacuum state in which the operating characteristics of the operating element are good, the getter material for adsorbing gas as in the conventional case is accommodated in the operating element. You do n’t have to store it in space
Therefore, the vacuum sealed device can be downsized. Further, since the work of housing the getter material is omitted, the labor and the number of working steps can be reduced, the product can be mass-produced, and the inexpensive vacuum sealing device can be provided.

【0041】さらに、バルブ閉止面と外部側開口の形成
面とを接合させずに、バルブ閉止面が外部側開口を閉止
しているものにおいては、例えば、バルブ閉止面が外部
側開口の形成面に加圧接触している状態で、バルブ閉止
面をガスが発生する有機性の接着剤等でシールし外部側
開口を閉止する場合、上記バルブ閉止面をシールする際
にガスが発生しても、バルブ閉止面が外部側開口の形成
面に加圧接触して外部側開口を完全に塞いでいるので、
上記発生ガスが外部側開口から連通路に入り込むことは
なく、上記同様に、動作素子を収容している空間を動作
素子の動作特性が良好となる真空状態に封止することで
きる。また、上記のように、バルブ閉止面をシールする
ことにより、機械的強度を高めることができる。
Further, in the case where the valve closing surface closes the outer opening without joining the valve closing surface and the outer opening forming surface, for example, the valve closing surface is the outer opening forming surface. Even if gas is generated when the valve closing surface is sealed when the valve closing surface is sealed with an organic adhesive that generates gas and the external opening is closed under pressure contact with Since the valve closing surface pressurizes the outer opening forming surface to completely close the outer opening,
The generated gas does not enter the communication passage through the external opening, and the space containing the operating element can be sealed in a vacuum state in which the operating characteristics of the operating element are good in the same manner as described above. Further, as described above, the mechanical strength can be increased by sealing the valve closing surface.

【図面の簡単な説明】[Brief description of drawings]

【図1】本実施の形態例の真空封止デバイスの主要構成
を示す説明図である。
FIG. 1 is an explanatory diagram showing a main configuration of a vacuum sealed device according to an embodiment of the present invention.

【図2】図1に示す動作素子や連通路等が形成された素
子基板の作製順序を示す説明図である。
FIG. 2 is an explanatory diagram showing a manufacturing sequence of an element substrate on which the operating elements and communication paths shown in FIG. 1 are formed.

【図3】図1に示すアクチエータバルブや凹部等が形成
された蓋部材の作製順序を示す説明図である。
3A and 3B are explanatory views showing the order of manufacturing the lid member in which the actuator valve and the concave portion shown in FIG. 1 are formed.

【図4】素子基板と蓋部材とを接合した後のアクチエー
タバルブの動作例を示す説明図である。
FIG. 4 is an explanatory diagram showing an operation example of the actuator valve after the element substrate and the lid member are joined.

【図5】その他の実施の形態例を示す説明図である。FIG. 5 is an explanatory diagram showing another embodiment example.

【符号の説明】[Explanation of symbols]

1 真空封止デバイス 3 素子基板 4 動作素子 6 蓋部材 8 連通路 11 梁部 12 バルブ閉止面 13 アクチエータバルブ 14 静電駆動手段 17 凹部 1 Vacuum Sealing Device 3 Element Substrate 4 Operating Element 6 Lid Member 8 Communication Path 11 Beam Section 12 Valve Closing Surface 13 Actuator Valve 14 Electrostatic Driving Means 17 Recess

Claims (12)

【特許請求の範囲】[Claims] 【請求項1】 素子基板面に動作素子が形成され、この
動作素子が形成されている素子基板面上に蓋部材が接合
されてパッケージが形成され、素子基板と蓋部材の接合
境界領域に形成されたパッケージ内真空空間に前記動作
素子が収容されている真空封止デバイスにおいて、該真
空封止デバイスには前記真空空間内と外部とを連通する
連通路が形成され、この連通路の外部側開口の近傍には
少くとも一端がパッケージに固定支持された梁部と、こ
の梁部に連接されて前記外部側開口に対向するバルブ閉
止面とをもつアクチエータバルブが設けられ、このアク
チエータバルブの梁部が外部側開口側に撓曲変形した動
作状態で外部側開口がアクチエータバルブのバルブ閉止
面によって閉止されていることを特徴とする真空封止デ
バイス。
1. An operating element is formed on a surface of an element substrate, and a lid member is joined on the surface of the element substrate on which the operating element is formed to form a package, which is formed in a joining boundary region between the element substrate and the lid member. In the vacuum sealed device in which the operating element is housed in the vacuum space inside the package, a communication path that communicates the inside of the vacuum space with the outside is formed in the vacuum sealed device, and the outside of the communication path. An actuator valve having a beam portion at least one end of which is fixedly supported by the package and a valve closing surface which is connected to the beam portion and faces the outer side opening is provided near the opening. The vacuum-sealing device, wherein the outer opening is closed by the valve closing surface of the actuator valve in an operating state in which the beam portion is flexibly deformed toward the outer opening side.
【請求項2】 素子基板面に動作素子が形成され、この
動作素子が形成されている素子基板面上に蓋部材が接合
されてパッケージが形成され、素子基板と蓋部材の接合
境界領域に形成されたパッケージ内真空空間に前記動作
素子が収容されている真空封止デバイスにおいて、該真
空封止デバイスには前記真空空間内と外部とを連通する
連通路が形成され、この連通路の外部側開口の近傍には
少くとも一端がパッケージに固定支持された梁部と、こ
の梁部に連接されて前記外部側開口に対向するバルブ閉
止面とをもつアクチエータバルブが設けられ、このアク
チエータバルブの梁部が外部側開口側に撓曲変形した動
作状態で外部側開口がアクチエータバルブのバルブ閉止
面にガス発生のない接合によって閉止されていることを
特徴とする真空封止デバイス。
2. An operating element is formed on a surface of an element substrate, and a lid member is bonded on the surface of the element substrate on which the operating element is formed to form a package, which is formed in a bonding boundary region between the element substrate and the lid member. In the vacuum sealed device in which the operating element is housed in the vacuum space inside the package, a communication path that communicates the inside of the vacuum space with the outside is formed in the vacuum sealed device, and the outside of the communication path. An actuator valve having a beam portion at least one end of which is fixedly supported by the package and a valve closing surface which is connected to the beam portion and faces the outer side opening is provided near the opening. The vacuum sealing, characterized in that the outer opening is closed to the valve closing surface of the actuator valve by a gas-free joint in an operating state in which the beam portion is flexibly deformed to the outer opening side. device.
【請求項3】 ガス発生のない接合は、接触面の共晶反
応による溶融接合と、共晶反応以外の溶融接合と、接触
面を清浄にすることにより生じる物理、化学的反応によ
る接合と、加熱によって生じる拡散反応による接合との
うちのいずれかの接合である請求項2記載の真空封止デ
バイス。
3. Gas-free bonding includes melt bonding by eutectic reaction of contact surfaces, melt bonding other than eutectic reaction, and bonding by physical and chemical reactions caused by cleaning the contact surfaces. The vacuum sealed device according to claim 2, which is one of bonding by a diffusion reaction caused by heating.
【請求項4】 連通路の外部側開口の形成側とアクチエ
ータバルブとの間には電圧印加によってアクチエータバ
ルブの梁部を静電力によって撓曲変形させてバルブ閉止
面を外部側開口に加圧接触させる静電駆動手段が設けら
れている請求項1又は請求項2又は請求項3記載の真空
封止デバイス。
4. A beam closing portion is applied to the outer side opening by bending the beam portion of the actuator valve by electrostatic force by applying a voltage between the side where the outer side opening of the communication passage is formed and the actuator valve. The vacuum sealing device according to claim 1, 2 or 3, wherein electrostatic drive means for making pressure contact is provided.
【請求項5】 素子基板と蓋部材の一方側の材料はSi
であり、他方側はガラスとSiのいずれか一方の材料で
形成されている請求項1又は請求項2又は請求項3又は
請求項4記載の真空封止デバイス。
5. The material for one side of the element substrate and the lid member is Si
The vacuum sealing device according to claim 1, 2 or 3 or 4, wherein the other side is formed of one material of glass and Si.
【請求項6】 パッケージ内に収容されている動作素子
は振動素子である請求項1乃至請求項5のいずれか1つ
に記載の真空封止デバイス。
6. The vacuum sealing device according to claim 1, wherein the operating element housed in the package is a vibrating element.
【請求項7】 動作素子が形成されている素子基板の基
板面上に蓋部材が接合されてパッケージが形成され、素
子基板と蓋部材の接合境界領域に形成したパッケージ内
真空空間内に前記動作素子が収容される真空封止デバイ
スの製造方法において、素子基板面に動作素子を形成し
た素子基板と蓋部材の少くとも一方の接合面に前記真空
空間となる凹部を形成しておくとともに、素子基板と蓋
部材の一方側の接合面領域に前記真空空間内と外部とを
連通する連通路を形成しておき、さらに、この連通路の
外部側開口の形成面と該形成面に対向する接合相手側の
アクチエータ形成面との少くとも一方にアクチエータ動
作間隙を形成しておき、さらにまた、前記アクチエータ
形成面に前記連通路の外部側開口に対向するバルブ閉止
面とそれを支持する梁部を連接して成るアクチエータバ
ルブを少くとも梁部の一端を固定して形成しておき、素
子基板の動作素子が形成されている基板面に蓋部材を陽
極接合により接合してパッケージ化し、次に、真空中で
パッケージ内の真空空間の空気を連通路を介して真空排
気し、然る後に、真空中で前記アクチエータバルブの梁
部を撓曲変形してバルブ閉止面で連通路の外部側開口を
塞いで該バルブ閉止面と前記外部側開口の形成面とをガ
ス発生のない接合手法によって接合することを特徴とす
る真空封止デバイスの製造方法。
7. A package is formed by joining a lid member on a substrate surface of an element substrate on which an operating element is formed, and the operation is performed in a vacuum space inside the package formed in a joining boundary region between the element substrate and the lid member. In a method of manufacturing a vacuum-sealed device in which an element is housed, a recess serving as the vacuum space is formed on a joint surface of at least one of an element substrate on which an operation element is formed on an element substrate surface and a lid member. A communication path that communicates the inside of the vacuum space with the outside is formed in the bonding surface region on one side of the substrate and the lid member, and the bonding surface facing the formation surface of the external opening of the communication path is formed. An actuator operation gap is formed on at least one of the mating side actuator forming surfaces, and further, the actuator forming surface supports the valve closing surface facing the external opening of the communication passage. An actuator valve made by connecting beams is formed by fixing at least one end of the beam, and then a lid member is joined by anodic bonding to the substrate surface on which the operating element of the element substrate is formed to form a package. Next, in a vacuum, the air in the vacuum space in the package is evacuated through the communication passage, and after that, the beam portion of the actuator valve is flexibly deformed in the vacuum and the communication passage is formed at the valve closing surface. A method for manufacturing a vacuum sealed device, characterized in that the valve closing surface and the surface on which the external opening is formed are bonded by a bonding method that does not generate gas by closing the external opening.
【請求項8】 ガス発生のない接合手法は、溶融接合
と、接触面を清浄にすることにより生じる物理、化学的
反応による接合と、加熱によって生じる拡散反応による
接合とのうちのいずれかの接合である請求項7記載の真
空封止デバイスの製造方法。
8. A gas-free joining method is one of fusion joining, joining by a physical or chemical reaction produced by cleaning a contact surface, and joining by a diffusion reaction produced by heating. The method for manufacturing a vacuum sealed device according to claim 7, wherein
【請求項9】 バルブ閉止面と連通路の外部側開口の形
成面を接合した後に、蒸着若しくはスパッタの膜で前記
接合部を封止することを特徴とする請求項7又は請求項
8記載の真空封止デバイスの製造方法。
9. The method according to claim 7, wherein after the valve closing surface and the surface on which the external opening of the communication passage is formed are bonded, the bonding portion is sealed with a film formed by vapor deposition or sputtering. Manufacturing method of vacuum sealed device.
【請求項10】 バルブ閉止面と連通路の外部側開口の形
成面の接合は接合の接触面を加熱して行うことを特徴と
する請求項7又は請求項8又は請求項9記載の真空封止
デバイスの製造方法。
10. The vacuum seal according to claim 7, 8 or 9, wherein the valve closing surface and the surface on which the outer side opening of the communication path is formed are joined by heating the contact surface of the joining. Method for manufacturing stop device.
【請求項11】 バルブ閉止面と連通路の外部開口形成面
との溶融接合の溶融反応はAu−Siの共晶反応により
行うことを特徴とする請求項8又は請求項9又は請求項
10記載の真空封止デバイスの製造方法。
11. The melting reaction of the fusion bonding between the valve closing surface and the outer opening forming surface of the communication passage is carried out by a eutectic reaction of Au—Si.
10. The method for manufacturing a vacuum sealed device according to 10.
【請求項12】 素子基板と蓋部材の一方側の材料はSi
であり、他方側はガラスとSiのいずれか一方の材料で
ある請求項7乃至請求項11のいずれか1つに記載の真空
封止デバイスの製造方法。
12. The material for one side of the element substrate and the lid member is Si
12. The method for manufacturing a vacuum sealed device according to claim 7, wherein the other side is made of one of glass and Si.
JP07260876A 1995-09-13 1995-09-13 Vacuum sealing device and manufacturing method thereof Expired - Fee Related JP3139339B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP07260876A JP3139339B2 (en) 1995-09-13 1995-09-13 Vacuum sealing device and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP07260876A JP3139339B2 (en) 1995-09-13 1995-09-13 Vacuum sealing device and manufacturing method thereof

Publications (2)

Publication Number Publication Date
JPH0982828A true JPH0982828A (en) 1997-03-28
JP3139339B2 JP3139339B2 (en) 2001-02-26

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ID=17353987

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JP2003512723A (en) * 1999-10-19 2003-04-02 イメーゴ・アー・ベー Method for anodic bonding
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JP2003512723A (en) * 1999-10-19 2003-04-02 イメーゴ・アー・ベー Method for anodic bonding
JP2003516634A (en) * 1999-12-10 2003-05-13 シェルケース リミティド Manufacturing method of packaged integrated circuit device and packaged integrated circuit device manufactured by the manufacturing method
JP2004502374A (en) * 2000-06-30 2004-01-22 セントレ・ナショナル・デ・ラ・レシェルシェ・サイエンティフィーク Nano-sized electromechanical filters
JP2002261188A (en) * 2001-03-05 2002-09-13 Omron Corp Package structure for electronic component
GB2384622A (en) * 2001-10-31 2003-07-30 Agilent Technologies Inc Method of eliminating Brownian noise in micromachined varactors
GB2384622B (en) * 2001-10-31 2005-07-20 Agilent Technologies Inc A method of eliminating brownian noise in micromachined varactors
JP2007522648A (en) * 2003-12-29 2007-08-09 ハネウェル・インターナショナル・インコーポレーテッド Integrated upper vacuum package
JP2006270398A (en) * 2005-03-23 2006-10-05 Sony Corp Micro-vibrator, semiconductor device and communication device
JP2007165496A (en) * 2005-12-13 2007-06-28 Dainippon Printing Co Ltd Sensor package and method of manufacturing same
JP2009521335A (en) * 2005-12-27 2009-06-04 ローベルト ボツシユ ゲゼルシヤフト ミツト ベシユレンクテル ハフツング Micromachining component with cap with closure
US8154094B2 (en) 2005-12-27 2012-04-10 Robert Bosch Gmbh Micromechanical component having a cap having a closure
JP2007216309A (en) * 2006-02-14 2007-08-30 Seiko Epson Corp Electronic device and its manufacturing method
JP2007245339A (en) * 2006-03-16 2007-09-27 Commiss Energ Atom Microelectronic composite, especially packaging structure in sealing cavity of mems
JP2008091417A (en) * 2006-09-29 2008-04-17 Seiko Instruments Inc Vacuum package and electronic device, and method of manufacturing the vacuum package
JP2009142976A (en) * 2007-09-28 2009-07-02 Commissariat A L'energie Atomique Manufacturing method of microfluidic component comprising at least one microchannel filled with nanostructures
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JP2010251568A (en) * 2009-04-16 2010-11-04 Dainippon Printing Co Ltd Seal type device and method of manufacturing the same

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