JPH0967188A - Quartz crucible transfer device - Google Patents
Quartz crucible transfer deviceInfo
- Publication number
- JPH0967188A JPH0967188A JP25441995A JP25441995A JPH0967188A JP H0967188 A JPH0967188 A JP H0967188A JP 25441995 A JP25441995 A JP 25441995A JP 25441995 A JP25441995 A JP 25441995A JP H0967188 A JPH0967188 A JP H0967188A
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- quartz crucible
- quartz
- cap
- frame
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010453 quartz Substances 0.000 title claims abstract description 63
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 63
- 239000004809 Teflon Substances 0.000 claims description 6
- 229920006362 Teflon® Polymers 0.000 claims description 6
- 239000002210 silicon-based material Substances 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- 239000013078 crystal Substances 0.000 abstract description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 7
- 229910052710 silicon Inorganic materials 0.000 abstract description 7
- 239000010703 silicon Substances 0.000 abstract description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 6
- 229910002804 graphite Inorganic materials 0.000 abstract description 6
- 239000010439 graphite Substances 0.000 abstract description 6
- 239000011261 inert gas Substances 0.000 abstract description 3
- 230000002093 peripheral effect Effects 0.000 abstract description 3
- 239000007789 gas Substances 0.000 description 9
- 239000002994 raw material Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000003028 elevating effect Effects 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、石英ルツボにシリ
コン素材を装填した後、単結晶シリコン引上げ装置に装
填するために使用される移載装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transfer device used for loading a quartz crucible with a silicon material and then loading it into a single crystal silicon pulling device.
【０００２】[0002]
【従来の技術】シリコン素材を装填した石英ルツボを単
結晶引上げ装置にセットするに際し、石英ルツボに蓋を
被せ、内部を減圧して吸着させた状態で、吊下げ機によ
り蓋と石英ルツボとを一体的に懸吊して単結晶引上げ装
置に載置する方法が採られている。2. Description of the Related Art When setting a quartz crucible loaded with a silicon material in a single crystal pulling apparatus, the quartz crucible is covered with a lid, and the interior of the quartz crucible is depressurized for adsorption. The method of suspending integrally and mounting on a single crystal pulling apparatus is adopted.
【０００３】[0003]
【発明が解決しようとする課題】しかしながら、石英ル
ツボ内の真空状態が破壊されてルツボが落下したり、ま
た、ルツボが障害物に直に接触してしまうことによる破
損のおそれは避け難い。本発明は、従来技術の前記問題
点に鑑み、単結晶引上げ装置への石英ルツボの載置作業
中のルツボの破損を防止すると共に、作業性を向上さ
せ、しかも安全に作業することができる石英ルツボ移載
装置を提供することを目的とするものである。However, it is unavoidable that the vacuum state in the quartz crucible is broken and the crucible falls, and that the crucible is directly contacted with an obstacle and is damaged. In view of the above problems of the prior art, the present invention prevents breakage of the crucible during the work of placing the quartz crucible on the single crystal pulling apparatus, improves workability, and allows quartz to be operated safely. It is an object of the present invention to provide a crucible transfer device.
【０００４】[0004]
【課題を解決するための手段】このため本発明では、石
英ルツボ破損防止治具を、内部にシリコン素材を装填し
た石英ルツボに減圧吸着させて閉蓋すると共に前記石英
ルツボを懸吊する真空チャキング蓋と、該真空チャキン
グ蓋に着脱可能に係止されると共に前記石英ルツボを包
囲する枠体と、該枠体の底部に着脱可能に設けられたル
ツボ受部とから構成したことを第１の特徴とし、枠体に
帯電防止板を備えたことを第２の特徴とし、これらに加
えて表面にテフロンコーティング或いはテフロンライニ
ングが施してあることを第３の特徴とするものである。Therefore, according to the present invention, a quartz crucible breakage preventing jig is vacuum-chucked to a quartz crucible having a silicon material loaded therein under reduced pressure to close the lid and suspend the quartz crucible. A first structure is composed of a lid, a frame body that is detachably locked to the vacuum chucking lid and surrounds the quartz crucible, and a crucible receiving portion that is detachably provided on a bottom portion of the frame body. The second feature is that the frame body is provided with an antistatic plate, and the third feature is that the surface is coated with Teflon or Teflon lining.
【０００５】[0005]
【発明の実施の形態】以下、本発明の実施形態を図面に
基づいて説明する。図１は本発明に係る石英ルツボ移載
装置を示す分解斜視図、図２は本装置にて石英ルツボを
懸吊した状態を示す斜視図、図３は図２の正面断面図、
図４はシリコン単結晶引上げ機の概略図である。Embodiments of the present invention will be described below with reference to the drawings. 1 is an exploded perspective view showing a quartz crucible transfer device according to the present invention, FIG. 2 is a perspective view showing a state in which a quartz crucible is suspended by this device, FIG. 3 is a front sectional view of FIG.
FIG. 4 is a schematic view of a silicon single crystal pulling machine.
【０００６】先に、図４に示すシリコン単結晶引上げ機
について説明する。図４中、１はチャンバー、２は石英
ルツボ、３はヒーターを示している。チャンバー１内の
下部中央には石英ルツボ２を装填するための黒鉛ルツボ
４が支持軸４ａにて回転並びに昇降可能に支持され、ま
た、その外周に石英ルツボ２を加熱するためのヒーター
３が同心状に配設されている。チャンバー１の上部中央
にはシリコン単結晶の引き上げ及び棒状原料７の挿入・
引き上げを行う際の保護筒５が設けられており、その上
端の天板を通して昇降軸６が吊設され、この昇降軸６の
下端には多結晶シリコンの棒状原料７が吊り下げられ、
昇降軸６の昇降操作によってチャンバー１内で棒状原料
７を昇降移動できるようにされている。First, the silicon single crystal pulling machine shown in FIG. 4 will be described. In FIG. 4, 1 is a chamber, 2 is a quartz crucible, and 3 is a heater. A graphite crucible 4 for loading the quartz crucible 2 is rotatably and vertically movable by a support shaft 4a in the lower center of the chamber 1, and a heater 3 for heating the quartz crucible 2 is concentrically provided on the outer periphery thereof. Are arranged in a shape. At the center of the upper part of the chamber 1, the silicon single crystal is pulled up and the rod-shaped raw material 7 is inserted.
A protective cylinder 5 for pulling up is provided, an elevating shaft 6 is hung through a top plate of the upper end of the protective cylinder 5, and a rod-shaped raw material 7 of polycrystalline silicon is hung at the lower end of the elevating shaft 6.
The rod-shaped raw material 7 can be moved up and down in the chamber 1 by raising and lowering the raising and lowering shaft 6.
【０００７】次に、本実施例で用いられる石英ルツボ移
載装置について説明する。この石英ルツボ移載装置Ａ
は、図１乃至図３に示すように、内部にシリコン素材を
装填した石英ルツボ２に減圧吸着させて石英ルツボ２の
上端に密着される蓋８（所謂、真空チャッキング蓋）を
備えている。つまり、蓋８の縁部には外向きに張り出し
たフランジ８ａが形成されており、このフランジ８ａの
底部には石英ルツボ２の上縁部２ａが嵌合可能にされた
周溝８ｂが形成されており、その内部には吸着性を良好
にするため、例えば、シリコンゴムからなるパッキング
９が取り付けられている。また、蓋の上面にはワイヤー
１０が取付けられており、このワイヤー１０を介して持
上げ機（図示せず）を連結させることによって石英ルツ
ボ２を吸着した状態で蓋８の持上げ運搬ができるように
されている。Next, the quartz crucible transfer device used in this embodiment will be described. This quartz crucible transfer device A
As shown in FIG. 1 to FIG. 3, each of the quartz crucibles 2 has a lid 8 (so-called vacuum chucking lid) that is adsorbed under reduced pressure on the quartz crucible 2 having a silicon material loaded therein and is closely attached to the upper end of the quartz crucible 2. . That is, an outwardly projecting flange 8a is formed on the edge of the lid 8, and a peripheral groove 8b into which the upper edge 2a of the quartz crucible 2 can be fitted is formed on the bottom of the flange 8a. In order to improve the adsorptivity, a packing 9 made of, for example, silicone rubber is attached to the inside thereof. A wire 10 is attached to the upper surface of the lid, and a lifting machine (not shown) is connected through the wire 10 so that the lid 8 can be lifted and conveyed while the quartz crucible 2 is adsorbed. Has been done.
【０００８】無論、特に図示しないが、蓋にはガス給排
装置に連結されるガス給排管が連結されている。ガス給
排管は途中でガス排気管とガス供給管とに分岐され、ガ
ス排気管は真空排気装置に連結され、他方、ガス供給管
は純度の高いアルゴンガス等の不活性ガスを供給するガ
ス供給装置に連結されている。Of course, although not particularly shown, a gas supply / discharge pipe connected to the gas supply / discharge device is connected to the lid. The gas supply / exhaust pipe is branched into a gas exhaust pipe and a gas supply pipe on the way, and the gas exhaust pipe is connected to a vacuum exhaust device.On the other hand, the gas supply pipe is a gas for supplying an inert gas such as high-purity argon gas. It is connected to the feeding device.
【０００９】図中１１は、蓋８に着脱可能に嵌め込まれ
る枠体である。この枠体１１は矩形の天板１１ａと矩形
の下枠１１ｂとを４本の柱１１ｃで連結して略方形状に
組合わされると共に、石英ルツボ２が包囲可能な大きさ
に形成されている。この天板１１ａには円形孔１２が形
成され、蓋８を円形孔１２に挿通させたときに、蓋８の
フランジ８ａの外縁部が引っ掛かる大きさにされてい
る。これにより、蓋８にて吸着保持された石英ルツボ２
は枠体１１により包囲された状態で懸吊される。また、
この枠体１１の下枠には石英ルツボ２の底部が係止可能
な大きさにされたルツボ受部（底板）１３が着脱自在
（本実施例では前後に摺動可能に取付けられている。）
に設けられており、図２に示すように、枠体１１に囲ま
れた石英ルツボ２の下方に位置した状態で下枠１１ｂに
装着される。Reference numeral 11 in the figure denotes a frame body which is detachably fitted to the lid 8. The frame body 11 has a rectangular top plate 11a and a rectangular lower frame 11b connected by four columns 11c to be combined into a substantially rectangular shape, and is formed to have a size capable of enclosing the quartz crucible 2. . A circular hole 12 is formed in the top plate 11a, and is sized so that the outer edge portion of the flange 8a of the lid 8 is hooked when the lid 8 is inserted into the circular hole 12. As a result, the quartz crucible 2 suction-held by the lid 8 is held.
Is suspended while being surrounded by the frame 11. Also,
A crucible receiving portion (bottom plate) 13 having a size capable of locking the bottom portion of the quartz crucible 2 is detachably attached to the lower frame of the frame body 11 (in this embodiment, it is slidably attached to the front and rear sides). )
2 and is attached to the lower frame 11b in a state of being positioned below the quartz crucible 2 surrounded by the frame body 11, as shown in FIG.
【００１０】この枠体１１の側面部分には帯電を防止す
るためのＰＶＣ板１４が取付けられると共に、枠体の表
面には、汚染防止のためのテフロンコーティング或いは
テフロンライニング加工が施してある。A PVC plate 14 for preventing electrification is attached to a side surface portion of the frame body 11, and a Teflon coating or a Teflon lining process for preventing contamination is applied to the surface of the frame body.
【００１１】次に、本装置を用いて行われる石英ルツボ
２の移載方法を具体的に説明する。例えば、先ず、引上
げ機室外に設けられた局所的クリーンルーム若しくはク
リーンベンチ内でシリコン多結晶団塊９を石英ルツボ２
内に充填する。次に、ルツボ２をルツボ受部１３を外し
た状態の枠体１１内にセットし、引上げ機によって蓋８
を石英ルツボ２上に載せその上縁部２ａを蓋の周溝８ｂ
に嵌合させる。次に、真空排気装置により石英ルツボ２
内を真空引きし、蓋８に石英ルツボ２を吸着させ一体化
させた後、上方に引き上げ、蓋８のフランジ８ａ部分を
枠体１１の円形孔１２に嵌合させる。この操作により石
英ルツボ２の底部と下枠１１ｂとの間に隙間が生じるの
で、ルツボ受部（底板）１３を装着する。このルツボ受
部（底板）１３により、万一、蓋８と石英ルツボ２内の
真空吸着状態が崩れ切離するようなことがあってもルツ
ボ受部１３に保持されるため、石英ルツボ２が落下して
破損することはない。そして、この状態のまま、吊上げ
機によって、石英ルツボ２を単結晶シリコン引上げ機ま
で移送し、チャンバー１内の黒鉛ルツボ４に装填する。
装填に際しては、先ず、枠体１１のルツボ受部１３が黒
鉛ルツボ４に接触する寸前まで一旦下降させた後、ルツ
ボ受部１３を取り外す。そして、再度下降させると、枠
体１１のみ枠受架台（図示せず）に係止された状態とな
り蓋８との係合が解かれ、石英ルツボ２のみ黒鉛ルツボ
４に装填される。その後、真空状態の石英ルツボ２内部
に前述の不活性ガスを充たすことによって石英ルツボ２
内を常圧に戻し、蓋８と石英ルツボ２との吸着状態を解
除させて蓋と石英ルツボとを切り離す。この状態で蓋８
を上昇させると、フランジ８ａが再度、枠体天板１１ａ
の円形孔１２に引掛かるので、そのまま引き上げて枠体
１１を単結晶シリコン引上げ装置の外に移送することが
できる。Next, a method of transferring the quartz crucible 2 using this apparatus will be specifically described. For example, first, the silicon polycrystalline nodule 9 is placed in a quartz crucible 2 in a local clean room or a clean bench provided outside the puller room.
Fill inside. Next, the crucible 2 is set in the frame body 11 with the crucible receiving portion 13 removed, and the lid 8 is set by the pulling machine.
Is placed on the quartz crucible 2 and its upper edge portion 2a is attached to the peripheral groove 8b of the lid.
To fit. Next, the quartz crucible 2 is evacuated by the vacuum exhaust device.
After the inside is evacuated and the quartz crucible 2 is adsorbed and integrated with the lid 8, the lid 8 is pulled up to fit the flange 8a portion of the lid 8 into the circular hole 12 of the frame 11. This operation creates a gap between the bottom of the quartz crucible 2 and the lower frame 11b, so that the crucible receiving portion (bottom plate) 13 is mounted. The crucible receiving portion (bottom plate) 13 holds the quartz crucible 2 because the crucible receiving portion 13 holds the quartz crucible 2 even if the vacuum suction state between the lid 8 and the quartz crucible 2 is broken and separated. It will not fall and be damaged. Then, in this state, the quartz crucible 2 is transferred to the single crystal silicon pulling machine by the lifting machine and loaded into the graphite crucible 4 in the chamber 1.
At the time of loading, first, the crucible receiving portion 13 of the frame body 11 is once lowered to a position just before coming into contact with the graphite crucible 4, and then the crucible receiving portion 13 is removed. Then, when it is lowered again, only the frame 11 is locked to the frame receiving stand (not shown), the engagement with the lid 8 is released, and only the quartz crucible 2 is loaded into the graphite crucible 4. After that, by filling the inside of the quartz crucible 2 in a vacuum state with the above-mentioned inert gas, the quartz crucible 2 is
The inside is returned to normal pressure, and the suction state between the lid 8 and the quartz crucible 2 is released to separate the lid and the quartz crucible. Lid 8 in this state
The flange 8a again, the frame top plate 11a
Since it is caught in the circular hole 12, the frame body 11 can be pulled up and transferred to the outside of the single crystal silicon pulling apparatus.
【００１２】[0012]
【発明の効果】本発明は以上のように構成したので、以
下の優れた効果がある。 （１）．石英ルツボを単結晶引上げ装置へセットする寸
前まで、落下や障害物に接触することによる破損を防止
できる。 （２）．吊り下げ物直下での作業がなく、安全性が高
い。 （３）．単結晶引上げ装置への石英ルツボの装填と枠体
の取外しが同時に行え作業時間を短縮できる。As described above, the present invention has the following excellent effects. (1). Just before setting the quartz crucible to the single crystal pulling device, it is possible to prevent damage due to dropping or contact with an obstacle. (2). Highly safe because there is no work right under the suspended object. (3). The quartz crucible can be loaded into the single crystal pulling device and the frame can be removed at the same time, and the working time can be shortened.
【図１】本発明に係る石英ルツボ移載装置を示す分解斜
視図である。FIG. 1 is an exploded perspective view showing a quartz crucible transfer device according to the present invention.
【図２】本装置にて石英ルツボを懸吊した状態を示す斜
視図である。FIG. 2 is a perspective view showing a state in which a quartz crucible is suspended by the present apparatus.
【図３】図２の正面断面図である。FIG. 3 is a front sectional view of FIG.
【図４】シリコン単結晶引上げ機の概略図である。FIG. 4 is a schematic view of a silicon single crystal pulling machine.
１ チャンバー ２ 石英ルツボ ２ａ 上縁部 ３ ヒーター ４ 黒鉛ルツボ ４ａ 支持軸 ５ 保護筒 ６ 昇降軸 ７ 棒状原料 ８ 蓋（真空チャッキング蓋） ９ シリコン多結晶団塊 １０ ワイヤー １１ 枠体 １２ 円形孔 １３ ルツボ受部（底板） １４ ＰＶＣ板（帯電防止板） 1 Chamber 2 Quartz Crucible 2a Upper Edge 3 Heater 4 Graphite Crucible 4a Support Shaft 5 Protective Cylinder 6 Lifting Shaft 7 Rod-shaped Raw Material 8 Lid (Vacuum Chucking Lid) 9 Silicon Polycrystalline Nodule 10 Wire 11 Frame 12 Circular Hole 13 Crucible Receiver Part (bottom plate) 14 PVC plate (antistatic plate)
Claims (3)
に減圧吸着させて閉蓋すると共に前記石英ルツボを懸吊
する真空チャキング蓋と、該真空チャキング蓋に着脱可
能に係止されると共に前記石英ルツボを包囲して設けら
れた枠体と、該枠体の底部に着脱可能に設けられたルツ
ボ受部とからなることを特徴とする石英ルツボ移載装
置。1. A vacuum crucible for suspending the quartz crucible while suspending the quartz crucible with a silicon material loaded therein under reduced pressure, and a quartz chuck which is detachably locked to the vacuum chuck lid and which has the quartz structure. A quartz crucible transfer device comprising a frame body surrounding the crucible and a crucible receiving portion detachably provided on a bottom portion of the frame body.
る請求項１記載の石英ルツボ移載装置。2. The quartz crucible transfer device according to claim 1, wherein the frame body is provided with an antistatic plate.
ンライニングを施したことを特徴とする請求項１又は請
求項２記載の石英ルツボ移載装置。3. The quartz crucible transfer device according to claim 1, wherein a Teflon coating or a Teflon lining is applied to the surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25441995A JP3678472B2 (en) | 1995-08-25 | 1995-08-25 | Quartz crucible transfer equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25441995A JP3678472B2 (en) | 1995-08-25 | 1995-08-25 | Quartz crucible transfer equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0967188A true JPH0967188A (en) | 1997-03-11 |
| JP3678472B2 JP3678472B2 (en) | 2005-08-03 |
Family
ID=17264723
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25441995A Expired - Fee Related JP3678472B2 (en) | 1995-08-25 | 1995-08-25 | Quartz crucible transfer equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3678472B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010208874A (en) * | 2009-03-09 | 2010-09-24 | Japan Siper Quarts Corp | Closure for silica glass crucible, silica glass crucible and method of handling the same |
| WO2010140352A1 (en) * | 2009-06-02 | 2010-12-09 | ジャパンスーパークォーツ株式会社 | Lid for fused quartz crucible, fused quartz crucible and method for handling same |
-
1995
- 1995-08-25 JP JP25441995A patent/JP3678472B2/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010208874A (en) * | 2009-03-09 | 2010-09-24 | Japan Siper Quarts Corp | Closure for silica glass crucible, silica glass crucible and method of handling the same |
| US9260795B2 (en) | 2009-03-09 | 2016-02-16 | Japan Super Quartz Corporation | Closure for silica glass crucible, silica glass crucible and method of handling the same |
| WO2010140352A1 (en) * | 2009-06-02 | 2010-12-09 | ジャパンスーパークォーツ株式会社 | Lid for fused quartz crucible, fused quartz crucible and method for handling same |
| JP2010280518A (en) * | 2009-06-02 | 2010-12-16 | Japan Siper Quarts Corp | Lid for quartz glass crucible, quartz glass crucible, and method for handling the same |
| CN102171388A (en) * | 2009-06-02 | 2011-08-31 | 日本超精石英株式会社 | Lid for fused quartz crucible, fused quartz crucible and method for handling same |
| KR101325637B1 (en) * | 2009-06-02 | 2013-11-07 | 가부시키가이샤 섬코 | Cover for vitreous silica crucible, vitreous silica crucible and handling method thereof |
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| Publication number | Publication date |
|---|---|
| JP3678472B2 (en) | 2005-08-03 |
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