JPH0959042A - Transparent base material having anti-mist coating - Google Patents
Transparent base material having anti-mist coatingInfo
- Publication number
- JPH0959042A JPH0959042A JP8160509A JP16050996A JPH0959042A JP H0959042 A JPH0959042 A JP H0959042A JP 8160509 A JP8160509 A JP 8160509A JP 16050996 A JP16050996 A JP 16050996A JP H0959042 A JPH0959042 A JP H0959042A
- Authority
- JP
- Japan
- Prior art keywords
- titania
- coating
- base material
- refractive index
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011248 coating agent Substances 0.000 title claims abstract description 53
- 238000000576 coating method Methods 0.000 title claims abstract description 53
- 239000000463 material Substances 0.000 title abstract description 14
- 239000003595 mist Substances 0.000 title abstract 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 114
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 22
- 239000002245 particle Substances 0.000 claims abstract description 19
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 14
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims abstract description 12
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims abstract description 12
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000000203 mixture Substances 0.000 claims abstract description 11
- 230000001699 photocatalysis Effects 0.000 claims abstract description 10
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 10
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910001887 tin oxide Inorganic materials 0.000 claims abstract description 10
- 239000005357 flat glass Substances 0.000 claims abstract description 9
- 239000000758 substrate Substances 0.000 claims description 26
- 239000006059 cover glass Substances 0.000 claims description 5
- 238000002834 transmittance Methods 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 13
- 239000011941 photocatalyst Substances 0.000 description 10
- 239000008199 coating composition Substances 0.000 description 9
- 239000011521 glass Substances 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 239000002585 base Substances 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 6
- 239000004033 plastic Substances 0.000 description 6
- 229920003023 plastic Polymers 0.000 description 6
- -1 titanium alkoxide Chemical class 0.000 description 5
- 239000003779 heat-resistant material Substances 0.000 description 4
- 238000007539 photo-oxidation reaction Methods 0.000 description 4
- 230000001443 photoexcitation Effects 0.000 description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 description 4
- 239000005020 polyethylene terephthalate Substances 0.000 description 4
- 239000002243 precursor Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 3
- 239000004447 silicone coating Substances 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 238000000149 argon plasma sintering Methods 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- 230000004313 glare Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000006068 polycondensation reaction Methods 0.000 description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 2
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 150000003609 titanium compounds Chemical class 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- JRGQKLFZSNYTDX-UHFFFAOYSA-N 3-(oxiran-2-ylmethoxy)propyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)CCCOCC1CO1 JRGQKLFZSNYTDX-UHFFFAOYSA-N 0.000 description 1
- HXLAEGYMDGUSBD-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propan-1-amine Chemical compound CCO[Si](C)(OCC)CCCN HXLAEGYMDGUSBD-UHFFFAOYSA-N 0.000 description 1
- MBNRBJNIYVXSQV-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propane-1-thiol Chemical compound CCO[Si](C)(OCC)CCCS MBNRBJNIYVXSQV-UHFFFAOYSA-N 0.000 description 1
- DOYKFSOCSXVQAN-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CCO[Si](C)(OCC)CCCOC(=O)C(C)=C DOYKFSOCSXVQAN-UHFFFAOYSA-N 0.000 description 1
- ZYAASQNKCWTPKI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCN ZYAASQNKCWTPKI-UHFFFAOYSA-N 0.000 description 1
- IKYAJDOSWUATPI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propane-1-thiol Chemical compound CO[Si](C)(OC)CCCS IKYAJDOSWUATPI-UHFFFAOYSA-N 0.000 description 1
- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 description 1
- XKQXZSHRPUFBSW-UHFFFAOYSA-N 3-[tris[(2-methylpropan-2-yl)oxy]silyl]propan-1-amine Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)CCCN XKQXZSHRPUFBSW-UHFFFAOYSA-N 0.000 description 1
- LQMCVFDSKWCIGP-UHFFFAOYSA-N 3-[tris[(2-methylpropan-2-yl)oxy]silyl]propane-1-thiol Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)CCCS LQMCVFDSKWCIGP-UHFFFAOYSA-N 0.000 description 1
- WALYBSCHCQWCPC-UHFFFAOYSA-N 3-[tris[(2-methylpropan-2-yl)oxy]silyl]propyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C WALYBSCHCQWCPC-UHFFFAOYSA-N 0.000 description 1
- OXKAXHPVFLEQHV-UHFFFAOYSA-N 3-tri(propan-2-yloxy)silylpropan-1-amine Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)CCCN OXKAXHPVFLEQHV-UHFFFAOYSA-N 0.000 description 1
- CJUFQURUUZMUOG-UHFFFAOYSA-N 3-tri(propan-2-yloxy)silylpropane-1-thiol Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)CCCS CJUFQURUUZMUOG-UHFFFAOYSA-N 0.000 description 1
- CHPNMYQJQQGAJS-UHFFFAOYSA-N 3-tri(propan-2-yloxy)silylpropyl 2-methylprop-2-enoate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)CCCOC(=O)C(C)=C CHPNMYQJQQGAJS-UHFFFAOYSA-N 0.000 description 1
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical compound CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 description 1
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- HIPOUHVMWKIMII-UHFFFAOYSA-N C(CCC)O[SiH3].C1(=CC=CC=C1)[SiH2][SiH2][SiH3] Chemical compound C(CCC)O[SiH3].C1(=CC=CC=C1)[SiH2][SiH2][SiH3] HIPOUHVMWKIMII-UHFFFAOYSA-N 0.000 description 1
- DAGDAIVNVPMTON-UHFFFAOYSA-N Cl[SiH3].C1(=CC=CC=C1)[SiH]([SiH3])C1=CC=CC=C1 Chemical compound Cl[SiH3].C1(=CC=CC=C1)[SiH]([SiH3])C1=CC=CC=C1 DAGDAIVNVPMTON-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 102100037681 Protein FEV Human genes 0.000 description 1
- 101710198166 Protein FEV Proteins 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- UWMGVIKSCFGFDR-UHFFFAOYSA-N benzyl(dibromo)silane Chemical compound Br[SiH](Br)CC1=CC=CC=C1 UWMGVIKSCFGFDR-UHFFFAOYSA-N 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- BAAAEEDPKUHLID-UHFFFAOYSA-N decyl(triethoxy)silane Chemical compound CCCCCCCCCC[Si](OCC)(OCC)OCC BAAAEEDPKUHLID-UHFFFAOYSA-N 0.000 description 1
- KQAHMVLQCSALSX-UHFFFAOYSA-N decyl(trimethoxy)silane Chemical compound CCCCCCCCCC[Si](OC)(OC)OC KQAHMVLQCSALSX-UHFFFAOYSA-N 0.000 description 1
- LILGYOCNANBWTO-UHFFFAOYSA-N decyl-tri(propan-2-yloxy)silane Chemical compound CCCCCCCCCC[Si](OC(C)C)(OC(C)C)OC(C)C LILGYOCNANBWTO-UHFFFAOYSA-N 0.000 description 1
- AGUMJWWZSTXCAM-UHFFFAOYSA-N decyl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CCCCCCCCCC[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C AGUMJWWZSTXCAM-UHFFFAOYSA-N 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000003745 diagnosis Methods 0.000 description 1
- LIQOCGKQCFXKLF-UHFFFAOYSA-N dibromo(dimethyl)silane Chemical compound C[Si](C)(Br)Br LIQOCGKQCFXKLF-UHFFFAOYSA-N 0.000 description 1
- DBUGVTOEUNNUHR-UHFFFAOYSA-N dibromo(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Br)(Br)C1=CC=CC=C1 DBUGVTOEUNNUHR-UHFFFAOYSA-N 0.000 description 1
- GNEPOXWQWFSSOU-UHFFFAOYSA-N dichloro-methyl-phenylsilane Chemical compound C[Si](Cl)(Cl)C1=CC=CC=C1 GNEPOXWQWFSSOU-UHFFFAOYSA-N 0.000 description 1
- ZZNQQQWFKKTOSD-UHFFFAOYSA-N diethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)C1=CC=CC=C1 ZZNQQQWFKKTOSD-UHFFFAOYSA-N 0.000 description 1
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 1
- MNFGEHQPOWJJBH-UHFFFAOYSA-N diethoxy-methyl-phenylsilane Chemical compound CCO[Si](C)(OCC)C1=CC=CC=C1 MNFGEHQPOWJJBH-UHFFFAOYSA-N 0.000 description 1
- VGWJKDPTLUDSJT-UHFFFAOYSA-N diethyl dimethyl silicate Chemical compound CCO[Si](OC)(OC)OCC VGWJKDPTLUDSJT-UHFFFAOYSA-N 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 1
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
- CVQVSVBUMVSJES-UHFFFAOYSA-N dimethoxy-methyl-phenylsilane Chemical compound CO[Si](C)(OC)C1=CC=CC=C1 CVQVSVBUMVSJES-UHFFFAOYSA-N 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- MABAWBWRUSBLKQ-UHFFFAOYSA-N ethenyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)C=C MABAWBWRUSBLKQ-UHFFFAOYSA-N 0.000 description 1
- BQRPSOKLSZSNAR-UHFFFAOYSA-N ethenyl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)C=C BQRPSOKLSZSNAR-UHFFFAOYSA-N 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- MYEJNNDSIXAGNK-UHFFFAOYSA-N ethyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CC)(OC(C)C)OC(C)C MYEJNNDSIXAGNK-UHFFFAOYSA-N 0.000 description 1
- ZVQNVYMTWXEMSF-UHFFFAOYSA-N ethyl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[Si](CC)(OC(C)(C)C)OC(C)(C)C ZVQNVYMTWXEMSF-UHFFFAOYSA-N 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 1
- DPTKSEHTOJHGOV-UHFFFAOYSA-N hexyl-tri(propan-2-yloxy)silane Chemical compound CCCCCC[Si](OC(C)C)(OC(C)C)OC(C)C DPTKSEHTOJHGOV-UHFFFAOYSA-N 0.000 description 1
- QECCXOBPOBIUMS-UHFFFAOYSA-N hexyl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CCCCCC[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C QECCXOBPOBIUMS-UHFFFAOYSA-N 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 150000002433 hydrophilic molecules Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- HLXDKGBELJJMHR-UHFFFAOYSA-N methyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](C)(OC(C)C)OC(C)C HLXDKGBELJJMHR-UHFFFAOYSA-N 0.000 description 1
- AHQDZKRRVNGIQL-UHFFFAOYSA-N methyl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[Si](C)(OC(C)(C)C)OC(C)(C)C AHQDZKRRVNGIQL-UHFFFAOYSA-N 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- IHVVJLCVJNNCDK-UHFFFAOYSA-N octadecyl-tri(propan-2-yloxy)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OC(C)C)(OC(C)C)OC(C)C IHVVJLCVJNNCDK-UHFFFAOYSA-N 0.000 description 1
- SLYCYWCVSGPDFR-UHFFFAOYSA-N octadecyltrimethoxysilane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OC)(OC)OC SLYCYWCVSGPDFR-UHFFFAOYSA-N 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- VPLNCHFJAOKWBT-UHFFFAOYSA-N phenyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)C1=CC=CC=C1 VPLNCHFJAOKWBT-UHFFFAOYSA-N 0.000 description 1
- 239000005054 phenyltrichlorosilane Substances 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 238000000634 powder X-ray diffraction Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- AIFMYMZGQVTROK-UHFFFAOYSA-N silicon tetrabromide Chemical compound Br[Si](Br)(Br)Br AIFMYMZGQVTROK-UHFFFAOYSA-N 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 238000001356 surgical procedure Methods 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- PCADGSDEFOMDNL-UHFFFAOYSA-N tri(propan-2-yloxy)-(3,3,3-trifluoropropyl)silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)CCC(F)(F)F PCADGSDEFOMDNL-UHFFFAOYSA-N 0.000 description 1
- MQVCTPXBBSKLFS-UHFFFAOYSA-N tri(propan-2-yloxy)-propylsilane Chemical compound CCC[Si](OC(C)C)(OC(C)C)OC(C)C MQVCTPXBBSKLFS-UHFFFAOYSA-N 0.000 description 1
- MLZOPJVPCGTFGS-UHFFFAOYSA-N tribromo(3,3,3-trifluoropropyl)silane Chemical compound FC(F)(F)CC[Si](Br)(Br)Br MLZOPJVPCGTFGS-UHFFFAOYSA-N 0.000 description 1
- LYZDWEPTQWHDLZ-UHFFFAOYSA-N tribromo(decyl)silane Chemical compound CCCCCCCCCC[Si](Br)(Br)Br LYZDWEPTQWHDLZ-UHFFFAOYSA-N 0.000 description 1
- BZAROSBWJASVBU-UHFFFAOYSA-N tribromo(ethenyl)silane Chemical compound Br[Si](Br)(Br)C=C BZAROSBWJASVBU-UHFFFAOYSA-N 0.000 description 1
- KVENDAGPVNAYLY-UHFFFAOYSA-N tribromo(ethyl)silane Chemical compound CC[Si](Br)(Br)Br KVENDAGPVNAYLY-UHFFFAOYSA-N 0.000 description 1
- VRUFDMFAHKOFOT-UHFFFAOYSA-N tribromo(hexyl)silane Chemical compound CCCCCC[Si](Br)(Br)Br VRUFDMFAHKOFOT-UHFFFAOYSA-N 0.000 description 1
- KBSUPJLTDMARAI-UHFFFAOYSA-N tribromo(methyl)silane Chemical compound C[Si](Br)(Br)Br KBSUPJLTDMARAI-UHFFFAOYSA-N 0.000 description 1
- RCEOWKUMFSNHFM-UHFFFAOYSA-N tribromo(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](Br)(Br)Br RCEOWKUMFSNHFM-UHFFFAOYSA-N 0.000 description 1
- HPTIEXHGTPSFDC-UHFFFAOYSA-N tribromo(phenyl)silane Chemical compound Br[Si](Br)(Br)C1=CC=CC=C1 HPTIEXHGTPSFDC-UHFFFAOYSA-N 0.000 description 1
- RWRKNKVDHIEKHS-UHFFFAOYSA-N tribromo(propyl)silane Chemical compound CCC[Si](Br)(Br)Br RWRKNKVDHIEKHS-UHFFFAOYSA-N 0.000 description 1
- WEUBQNJHVBMUMD-UHFFFAOYSA-N trichloro(3,3,3-trifluoropropyl)silane Chemical compound FC(F)(F)CC[Si](Cl)(Cl)Cl WEUBQNJHVBMUMD-UHFFFAOYSA-N 0.000 description 1
- HLWCOIUDOLYBGD-UHFFFAOYSA-N trichloro(decyl)silane Chemical compound CCCCCCCCCC[Si](Cl)(Cl)Cl HLWCOIUDOLYBGD-UHFFFAOYSA-N 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- ZOYFEXPFPVDYIS-UHFFFAOYSA-N trichloro(ethyl)silane Chemical compound CC[Si](Cl)(Cl)Cl ZOYFEXPFPVDYIS-UHFFFAOYSA-N 0.000 description 1
- LFXJGGDONSCPOF-UHFFFAOYSA-N trichloro(hexyl)silane Chemical compound CCCCCC[Si](Cl)(Cl)Cl LFXJGGDONSCPOF-UHFFFAOYSA-N 0.000 description 1
- PYJJCSYBSYXGQQ-UHFFFAOYSA-N trichloro(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](Cl)(Cl)Cl PYJJCSYBSYXGQQ-UHFFFAOYSA-N 0.000 description 1
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 1
- DOEHJNBEOVLHGL-UHFFFAOYSA-N trichloro(propyl)silane Chemical compound CCC[Si](Cl)(Cl)Cl DOEHJNBEOVLHGL-UHFFFAOYSA-N 0.000 description 1
- ZLGWXNBXAXOQBG-UHFFFAOYSA-N triethoxy(3,3,3-trifluoropropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC(F)(F)F ZLGWXNBXAXOQBG-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- WUMSTCDLAYQDNO-UHFFFAOYSA-N triethoxy(hexyl)silane Chemical compound CCCCCC[Si](OCC)(OCC)OCC WUMSTCDLAYQDNO-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- FZMJEGJVKFTGMU-UHFFFAOYSA-N triethoxy(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OCC)(OCC)OCC FZMJEGJVKFTGMU-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- JIOBRIJHDZBWDE-UHFFFAOYSA-N tris[(2-methylpropan-2-yl)oxy]-(3,3,3-trifluoropropyl)silane Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)CCC(F)(F)F JIOBRIJHDZBWDE-UHFFFAOYSA-N 0.000 description 1
- WUSDGIZCXCUHAI-UHFFFAOYSA-N tris[(2-methylpropan-2-yl)oxy]-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)CCCOCC1CO1 WUSDGIZCXCUHAI-UHFFFAOYSA-N 0.000 description 1
- RXKYGZRLZACSIK-UHFFFAOYSA-N tris[(2-methylpropan-2-yl)oxy]-octadecylsilane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C RXKYGZRLZACSIK-UHFFFAOYSA-N 0.000 description 1
- DIZPPYBTFPZSGK-UHFFFAOYSA-N tris[(2-methylpropan-2-yl)oxy]-propylsilane Chemical compound CCC[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C DIZPPYBTFPZSGK-UHFFFAOYSA-N 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- Y02T30/34—
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、防曇性コーティン
グを備えた透明基材に関する。TECHNICAL FIELD The present invention relates to a transparent substrate provided with an antifogging coating.
【0002】[0002]
【従来の技術】寒冷時に自動車その他の乗物の風防ガラ
スや窓ガラス、建物の窓ガラス、眼鏡のレンズ、および
各種計器盤のカバーガラスが凝縮湿分で曇るのはしばし
ば経験されることである。また、浴室や洗面所の鏡や眼
鏡のレンズが湯気で曇ることも良く遭遇される。2. Description of the Related Art It is often experienced that in cold weather, windshields and windows of automobiles and other vehicles, window glasses of buildings, lenses of glasses, and cover glasses of various instrument panels are fogged by condensed moisture. In addition, the lenses of mirrors and glasses in bathrooms and washrooms are often fogged by steam.
【0003】曇りの発生は安全性や種々の作業の能率に
深い影響を与える。例えば、車両の風防ガラスや窓ガラ
スやバックミラーが曇ると車両や交通の安全性が損なわ
れる。内視鏡レンズや歯科用歯鏡が曇ると、的確な診
断、手術、処置の障害となる。計器盤のカバーガラスが
曇るとデータの読みが困難となる。従来用いられている
防曇性組成物は、ポリエチレングリコールのような親水
性化合物からなる。しかし、この種の防曇性組成物はあ
くまで一時的なもので、水や接触によって容易に取り除
かれ、早期に効果を失うという難点がある。The occurrence of fogging has a profound effect on safety and efficiency of various operations. For example, if the windshield, the window glass, or the rearview mirror of the vehicle becomes cloudy, the safety of the vehicle or the traffic is impaired. Fogging of the endoscopic lens or the dental ophthalmoscope is an obstacle to accurate diagnosis, surgery and treatment. If the cover glass of the instrument panel becomes cloudy, it will be difficult to read the data. Conventionally used antifogging compositions consist of hydrophilic compounds such as polyethylene glycol. However, this kind of anti-fogging composition is only a temporary one, and it is easily removed by water or contact, and there is a drawback that the effect is lost early.
【0004】本発明者は、半導体光触媒を光励起すると
その表面が高度に親水化されることを発見した。この発
見を応用し、光触媒の粒子を含有する透明なコーティン
グによってガラスやレンズのような透明基材の表面を被
覆すれば、高度の防曇効果が恒久的に得られる。防曇性
コーティングに使用する光触媒としては、チタニア(Ti
O2)が最も好ましい。チタニアは、無害であり、化学的
に安定である。更に、チタニアはバンドギャップエネル
ギが高く、従って、光励起には紫外線を必要とし、光励
起の過程で可視光を吸収しないので、補色成分による発
色が起こらない。従って、ガラスやレンズや鏡のような
透明部材にコーティングするのに特に適している。The present inventor has discovered that when a semiconductor photocatalyst is photoexcited, its surface is highly hydrophilized. Applying this finding and coating the surface of a transparent substrate such as glass or lens with a transparent coating containing photocatalyst particles, a high degree of antifogging effect is permanently obtained. As a photocatalyst used for anti-fog coating, titania
O 2 ) is most preferred. Titania is harmless and chemically stable. Furthermore, since titania has a high band gap energy and therefore requires ultraviolet light for photoexcitation and does not absorb visible light in the process of photoexcitation, color development by a complementary color component does not occur. Therefore, it is particularly suitable for coating transparent members such as glass, lenses and mirrors.
【0005】[0005]
【発明が解決しようとする課題】しかし、チタニアの屈
折率はガラスやプラスチックよりもかなり高いので、チ
タニアを含有する防曇性コーティングによって透明基材
を被覆すると、防曇性コーティングと空気との界面、並
びに、防曇性コーティングと基材との界面における光の
反射が顕著になる。However, since the refractive index of titania is much higher than that of glass or plastic, when a transparent substrate is coated with an antifogging coating containing titania, the interface between the antifogging coating and air is increased. In addition, the reflection of light at the interface between the antifogging coating and the substrate becomes remarkable.
【0006】本発明の目的は、チタニア含有防曇性コー
ティングによる光の反射を低減することにある。An object of the present invention is to reduce the reflection of light by an antifogging coating containing titania.
【0007】[0007]
【課題を解決するための手段】本発明は、光触媒性チタ
ニアの粒子を含有する透明な防曇性コーティングで被覆
された透明基材において、防曇性コーティングは屈折率
が約2より小さな媒体にチタニア粒子を配合してなり、
チタニア粒子の平均結晶子径(粒子の粉末X線回折の2
θ=25.3゜付近の最強ピークの積分幅からScherrer式に
よって求められる)は約0.1μm以下であることを特
徴とする。好ましくは、この防曇性コーティングの屈折
率は約2以下であり、屈折率が2より小さな媒体は、シ
リカ、シリコーン、フッ化マグネシウム、アルミナ、酸
化錫から選ばれる。SUMMARY OF THE INVENTION The present invention is a transparent substrate coated with a transparent antifogging coating containing particles of photocatalytic titania, wherein the antifogging coating is on a medium having a refractive index of less than about 2. Made of titania particles,
Average crystallite size of titania particles (2 in powder X-ray diffraction of particles)
The value obtained from the integral width of the strongest peak around θ = 25.3 ° by the Scherrer equation) is about 0.1 μm or less. Preferably, the antifogging coating has a refractive index of about 2 or less, and the medium having a refractive index of less than 2 is selected from silica, silicone, magnesium fluoride, alumina and tin oxide.
【0008】[0008]
【発明の実施の形態】建物の窓ガラス、乗物の窓ガラ
ス、レンズ、鏡、透明フィルム、計器盤のカバーガラ
ス、その他防曇処理を要する透明基材の表面はチタニア
粒子を含有する防曇性コーティングによって被覆され
る。チタニアとしてはアナターゼとルチルのいづれも使
用することができる。アナターゼ型チタニアの利点は、
非常に細かな微粒子を分散させたゾルを市場で容易に入
手することができ、非常に薄い薄膜を容易に形成するこ
とができることである。他方、ルチル型チタニアは、ア
ナターゼ型よりも伝導帯準位が低いが、高温で焼結する
ことができ、強度と耐摩耗性に優れた被膜が得られると
いう利点がある。BEST MODE FOR CARRYING OUT THE INVENTION The surface of building window glass, vehicle window glass, lens, mirror, transparent film, instrument panel cover glass, and other transparent base materials that require antifogging treatment contain titania particles. Covered by coating. As titania, either anatase or rutile can be used. The advantages of anatase titania are:
A sol in which very fine particles are dispersed can be easily obtained on the market, and a very thin thin film can be easily formed. On the other hand, rutile type titania has a lower conduction band level than the anatase type, but has an advantage that it can be sintered at high temperature and a coating excellent in strength and wear resistance can be obtained.
【0009】防曇性コーティングには、チタニアに加え
て、屈折率が約2より小さな媒体として、シリカ、シリ
コーン、フッ化マグネシウム、アルミナ、酸化錫、又は
それらの混合物が配合される。これらの媒体、チタニ
ア、および透明基材の屈折率を以下に示す。素 材 屈折率 アナターゼ 2.52 ルチル 2.76 フッ化マグネシウム 1.38 シリカ 1.48 アルミナ 1.63 酸化錫 1.90 シリコーン 1.4〜1.6 ガラス 1.45〜1.96 PET 1.62 アクリル樹脂 1.49In addition to titania, the anti-fog coating incorporates silica, silicone, magnesium fluoride, alumina, tin oxide, or mixtures thereof as a medium with a refractive index of less than about 2. The refractive indexes of these media, titania, and transparent substrate are shown below. Material Refractive index Anatase 2.52 Rutile 2.76 Magnesium fluoride 1.38 Silica 1.48 Alumina 1.63 Tin oxide 1.90 Silicone 1.4-1.6 Glass 1.45-1.96 PET 1. 62 acrylic resin 1.49
【0010】防曇性コーティングにシリカ、シリコー
ン、フッ化マグネシウム、アルミナ、酸化錫のような屈
折率が約2より小さな媒体を配合することにより、防曇
性コーティングの屈折率をガラスやプラスチックのよう
な透明基材の屈折率に近づけることができ、防曇性コー
ティングと空気との界面、並びに、防曇性コーティング
と基材との界面における光の反射を低減することができ
る。シリカ、シリコーン、フッ化マグネシウム、アルミ
ナ、酸化錫のような低屈折率の媒体中に高屈折率のチタ
ニアを分散させると、光の散乱により防曇性コーティン
グが白くなり、防曇性コーティングの透明性が低下する
おそれがある。しかし、本発明に従いチタニア粒子の平
均結晶子径を約0.1μm以下にすることにより、チタ
ニア粒子による光の散乱を防止することができる。By mixing a medium having a refractive index of less than about 2 such as silica, silicone, magnesium fluoride, alumina and tin oxide into the antifogging coating, the refractive index of the antifogging coating is made to be similar to that of glass or plastic. The refractive index of the transparent substrate can be made close to that of the transparent substrate, and the reflection of light at the interface between the antifogging coating and the air and the interface between the antifogging coating and the substrate can be reduced. Dispersing high-refractive-index titania in a low-refractive-index medium such as silica, silicone, magnesium fluoride, alumina, or tin oxide makes the anti-fog coating white due to light scattering, and makes the anti-fog coating transparent. May deteriorate. However, when the average crystallite size of the titania particles is set to about 0.1 μm or less according to the present invention, light scattering by the titania particles can be prevented.
【0011】透明基材の表面にチタニアのような屈折率
の高い材料を被覆すると、光の干渉による干渉縞が現れ
るが、防曇性コーティングの屈折率を小さくすることに
より干渉縞の発現を低減することができる。When a material having a high refractive index such as titania is coated on the surface of a transparent substrate, interference fringes due to light interference appear, but the occurrence of interference fringes is reduced by reducing the refractive index of the antifogging coating. can do.
【0012】防曇性コーティングは種々の方法で基材表
面に形成することができる。基材がガラスのように耐熱
性の素材からなる場合には、基材表面に水との接触角が
10゜以下になる程度の超親水性を呈する防曇性と耐摩
耗性に優れた防曇性コーティングを形成する好ましいや
り方は、シリカゾル、フッ化マグネシウムゾル、アルミ
ナゾル、又は酸化錫ゾルとチタニアゾルとを混合し、こ
の混合物を基材表面に塗布した後、基材の軟化点以下の
温度で混合物を焼結することである。The antifogging coating can be formed on the surface of the substrate by various methods. When the base material is made of a heat-resistant material such as glass, the surface of the base material exhibits superhydrophilicity such that the contact angle with water is 10 ° or less, and the anti-fogging property and abrasion resistance are excellent. A preferred way to form a cloudy coating is to mix silica sol, magnesium fluoride sol, alumina sol, or tin oxide sol with titania sol and apply the mixture to the surface of the substrate and then at a temperature below the softening point of the substrate. Sintering the mixture.
【0013】或いは、基材がガラスのように耐熱性の素
材からなる場合には、無定形チタニアの前駆体(チタン
のアルコキシド、キレート、又はアセテートのような有
機チタン化合物、又はTiCl4又はTi(SO4)2のような無機
チタン化合物)の溶液にシリカゾル、フッ化マグネシウ
ムゾル、アルミナゾル、又は酸化錫ゾルを混合し、混合
物を基材表面に塗布した後、無定形チタニア前駆体を常
温から200℃の温度で加水分解と脱水縮重合に付すこと
により、シリカ、フッ化マグネシウム、アルミナ、又は
酸化錫の粒子が分散された無定形チタニアの薄膜を形成
する。次いで、チタニアの結晶化温度以上の温度、か
つ、基材の軟化点以下の温度に加熱することにより、無
定形チタニアを結晶性チタニアに相変化させる。Alternatively, when the substrate is made of a heat-resistant material such as glass, a precursor of amorphous titania (organic titanium compound such as titanium alkoxide, chelate or acetate, or TiCl 4 or Ti ( sO 4) silica sol solution of an inorganic titanium compound such as 2), magnesium fluoride sol, alumina sol, or a tin oxide sol is mixed, the mixture was applied to a substrate surface, the amorphous titania precursor from room 200 By subjecting to hydrolysis and dehydration polycondensation at a temperature of ° C, a thin film of amorphous titania in which particles of silica, magnesium fluoride, alumina, or tin oxide are dispersed is formed. Then, the amorphous titania is phase-changed into crystalline titania by heating the titania to a temperature above the crystallization temperature and below the softening point of the substrate.
【0014】基材がプラスチックのように非耐熱性の素
材からなる場合には、基材表面に水との接触角が10゜
以下になる程度の超親水性を呈する防曇性と耐摩耗性に
優れた防曇性コーティングを形成する好ましいやり方
は、無定形シリカの前駆体(例えば、テトラエトキシシ
ラン、テトライソプロポキシシラン、テトラn−プロポ
キシシラン、テトラブトキシシラン、テトラメトキシシ
ラン、等のテトラアルコキシシラン;それらの加水分解
物であるシラノール; 又は平均分子量3000以下のポリ
シロキサン)と結晶性チタニアゾルとの混合物を基材の
表面に塗布し、必要に応じて加水分解させてシラノール
を形成した後、約100℃以上の温度で加熱してシラノー
ルを脱水縮重合に付すことにより、チタニアが無定形シ
リカで結着された光触媒性コーティングを形成すること
である。When the base material is made of a non-heat-resistant material such as plastic, the surface of the base material exhibits superhydrophilicity such that the contact angle with water is 10 ° or less. A preferred way to form a good anti-fog coating is to use precursors of amorphous silica (e.g. tetraalkoxysilanes such as tetraethoxysilane, tetraisopropoxysilane, tetra-n-propoxysilane, tetrabutoxysilane, tetramethoxysilane, etc. Silane; a silanol which is a hydrolyzate thereof; or a mixture of a polysiloxane having an average molecular weight of 3000 or less) and a crystalline titania sol is applied to the surface of a base material, and if necessary hydrolyzed to form silanol, A photocatalyst in which titania is bound with amorphous silica by subjecting silanol to dehydration polycondensation by heating at a temperature of about 100 ° C or higher. It is to form a coating.
【0015】更に、基材がプラスチックのように非耐熱
性の素材からなる場合には、基材表面に水との接触角が
10゜以下になる程度の超親水性を呈する防曇性と耐摩
耗性に優れた防曇性コーティングを形成する好ましいや
り方は、未硬化の若しくは部分的に硬化したシリコーン
(オルガノポリシロキサン)又はシリコーンの前駆体か
らなる塗膜形成要素にチタニアの粒子を分散させてなる
塗料用組成物を用いることである。Further, when the base material is made of a non-heat-resistant material such as plastic, the surface of the base material exhibits superhydrophilicity such that the contact angle with water is 10 ° or less and the anti-fogging property and resistance A preferred method of forming an abrasion resistant anti-fog coating is to disperse the titania particles in a film-forming element consisting of uncured or partially cured silicone (organopolysiloxane) or a precursor of the silicone. It is to use the coating composition.
【0016】塗膜形成要素としては、メチルトリクロル
シラン、メチルトリブロムシラン、メチルトリメトキシ
シラン、メチルトリエトキシシラン、メチルトリイソプ
ロポキシシラン、メチルトリt−ブトキシシラン;エチ
ルトリクロルシラン、エチルトリブロムシラン、エチル
トリメトキシシラン、エチルトリエトキシシラン、エチ
ルトリイソプロポキシシラン、エチルトリt−ブトキシ
シラン;n−プロピルトリクロルシラン、n−プロピル
トリブロムシラン、n−プロピルトリメトキシシラン、
n−プロピルトリエトキシシラン、n−プロピルトリイ
ソプロポキシシラン、n−プロピルトリt−ブトキシシ
ラン;n−ヘキシルトリクロルシラン、n−ヘキシルト
リブロムシラン、n−ヘキシルトリメトキシシラン、n
−ヘキシルトリエトキシシラン、n−ヘキシルトリイソ
プロポキシシラン、n−ヘキシルトリt−ブトキシシラ
ン;n−デシルトリクロルシラン、n−デシルトリブロ
ムシラン、n−デシルトリメトキシシラン、n−デシル
トリエトキシシラン、n−デシルトリイソプロポキシシ
ラン、n−デシルトリt−ブトキシシラン;n−オクタ
デシルトリクロルシラン、n−オクタデシルトリブロム
シラン、n−オクタデシルトリメトキシシラン、n−オ
クタデシルトリエトキシシラン、n−オクタデシルトリ
イソプロポキシシラン、n−オクタデシルトリt−ブト
キシシラン;フェニルトリクロルシラン、フェニルトリ
ブロムシラン、フェニルトリメトキシシラン、フェニル
トリエトキシシラン、フェニルトリイソプロポキシシラ
ン、フェニルトリt−ブトキシシラン;テトラクロルシ
ラン、テトラブロムシラン、テトラメトキシシラン、テ
トラエトキシシラン、テトラブトキシシラン、ジメトキ
シジエトキシシラン;ジメチルジクロルシラン、ジメチ
ルジブロムシラン、ジメチルジメトキシシラン、ジメチ
ルジエトキシシラン;ジフェニルジクロルシラン、ジフ
ェニルジブロムシラン、ジフェニルジメトキシシラン、
ジフェニルジエトキシシラン;フェニルメチルジクロル
シラン、フェニルメチルジブロムシラン、フェニルメチ
ルジメトキシシラン、フェニルメチルジエトキシシラ
ン;トリクロルヒドロシラン、トリブロムヒドロシラ
ン、トリメトキシヒドロシラン、トリエトキシヒドロシ
ラン、トリイソプロポキシヒドロシラン、トリt−ブト
キシヒドロシラン;ビニルトリクロルシラン、ビニルト
リブロムシラン、ビニルトリメトキシシラン、ビニルト
リエトキシシラン、ビニルトリイソプロポキシシラン、
ビニルトリt−ブトキシシラン;トリフルオロプロピル
トリクロルシラン、トリフルオロプロピルトリブロムシ
ラン、トリフルオロプロピルトリメトキシシラン、トリ
フルオロプロピルトリエトキシシラン、トリフルオロプ
ロピルトリイソプロポキシシラン、トリフルオロプロピ
ルトリt−ブトキシシラン;γ−グリシドキシプロピル
メチルジメトキシシラン、γ−グリシドキシプロピルメ
チルジエトキシシラン、γ−グリシドキシプロピルトリ
メトキシシラン、γ−グリシドキシプロピルトリエトキ
シシラン、γ−グリシドキシプロピルトリイソプロポキ
シシラン、γ−グリシドキシプロピルトリt−ブトキシ
シラン;γ−メタアクリロキシプロピルメチルジメトキ
シシラン、γ−メタアクリロキシプロピルメチルジエト
キシシラン、γ−メタアクリロキシプロピルトリメトキ
シシラン、γ−メタアクリロキシプロピルトリエトキシ
シラン、γ−メタアクリロキシプロピルトリイソプロポ
キシシラン、γ−メタアクリロキシプロピルトリt−ブ
トキシシラン;γ−アミノプロピルメチルジメトキシシ
ラン、γ−アミノプロピルメチルジエトキシシラン、γ
−アミノプロピルトリメトキシシラン、γ−アミノプロ
ピルトリエトキシシラン、γ−アミノプロピルトリイソ
プロポキシシラン、γ−アミノプロピルトリt−ブトキ
シシラン;γ−メルカプトプロピルメチルジメトキシシ
ラン、γ−メルカプトプロピルメチルジエトキシシラ
ン、γ−メルカプトプロピルトリメトキシシラン、γ−
メルカプトプロピルトリエトキシシラン、γ−メルカプ
トプロピルトリイソプロポキシシラン、γ−メルカプト
プロピルトリt−ブトキシシラン;β−(3、4−エポ
キシシクロヘキシル)エチルトリメトキシシラン、β−
(3、4−エポキシシクロヘキシル)エチルトリエトキシ
シラン; それらの部分加水分解物;およびそれらの混
合物を使用することができる。As the film forming element, methyltrichlorosilane, methyltribromosilane, methyltrimethoxysilane, methyltriethoxysilane, methyltriisopropoxysilane, methyltri-t-butoxysilane; ethyltrichlorosilane, ethyltribromosilane, Ethyltrimethoxysilane, ethyltriethoxysilane, ethyltriisopropoxysilane, ethyltrit-butoxysilane; n-propyltrichlorosilane, n-propyltribromosilane, n-propyltrimethoxysilane,
n-propyltriethoxysilane, n-propyltriisopropoxysilane, n-propyltri-t-butoxysilane; n-hexyltrichlorosilane, n-hexyltribromosilane, n-hexyltrimethoxysilane, n
-Hexyltriethoxysilane, n-hexyltriisopropoxysilane, n-hexyltrit-butoxysilane; n-decyltrichlorosilane, n-decyltribromosilane, n-decyltrimethoxysilane, n-decyltriethoxysilane, n -Decyltriisopropoxysilane, n-decyltri-t-butoxysilane; n-octadecyltrichlorosilane, n-octadecyltribromosilane, n-octadecyltrimethoxysilane, n-octadecyltriethoxysilane, n-octadecyltriisopropoxysilane, n-octadecyltri-t-butoxysilane; phenyltrichlorosilane, phenyltribromosilane, phenyltrimethoxysilane, phenyltriethoxysilane, phenyltriisopropoxysilane, phenyltrisilane -Butoxysilane; tetrachlorosilane, tetrabromosilane, tetramethoxysilane, tetraethoxysilane, tetrabutoxysilane, dimethoxydiethoxysilane; dimethyldichlorosilane, dimethyldibromosilane, dimethyldimethoxysilane, dimethyldiethoxysilane; diphenyldisilane Chlorosilane, diphenyldibromosilane, diphenyldimethoxysilane,
Diphenyldiethoxysilane; phenylmethyldichlorosilane, phenylmethyldibromosilane, phenylmethyldimethoxysilane, phenylmethyldiethoxysilane; trichlorohydrosilane, tribromohydrosilane, trimethoxyhydrosilane, triethoxyhydrosilane, triisopropoxyhydrosilane, tri-t -Butoxyhydrosilane; vinyltrichlorosilane, vinyltribromosilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltriisopropoxysilane,
Vinyltri-t-butoxysilane; trifluoropropyltrichlorosilane, trifluoropropyltribromosilane, trifluoropropyltrimethoxysilane, trifluoropropyltriethoxysilane, trifluoropropyltriisopropoxysilane, trifluoropropyltrit-butoxysilane; γ-glycidoxypropylmethyldimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, γ-glycidoxypropyltriisopropoxy Silane, γ-glycidoxypropyltri-t-butoxysilane; γ-methacryloxypropylmethyldimethoxysilane, γ-methacryloxypropylmethyldiethoxysilane, γ-methacryl Riloxypropyltrimethoxysilane, γ-methacryloxypropyltriethoxysilane, γ-methacryloxypropyltriisopropoxysilane, γ-methacryloxypropyltri-t-butoxysilane; γ-aminopropylmethyldimethoxysilane, γ- Aminopropylmethyldiethoxysilane, γ
-Aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-aminopropyltriisopropoxysilane, γ-aminopropyltri-t-butoxysilane; γ-mercaptopropylmethyldimethoxysilane, γ-mercaptopropylmethyldiethoxysilane , Γ-mercaptopropyltrimethoxysilane, γ-
Mercaptopropyltriethoxysilane, γ-mercaptopropyltriisopropoxysilane, γ-mercaptopropyltri-t-butoxysilane; β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, β-
(3,4-Epoxycyclohexyl) ethyltriethoxysilane; their partial hydrolysates; and their mixtures can be used.
【0017】このように透明基材の表面に形成された防
曇性コーティングには、使用の前に紫外線を照射し、光
触媒性チタニアを光励起する。光触媒性チタニアの光励
起は、太陽光が当たるような条件では、太陽光に含まれ
る紫外線を利用するのが有利である。屋内や夜間には、
殺菌ランプ、水銀ランプ、メタルハライドランプ、キセ
ノンランプ、その他の紫外線光源を使用することができ
る。蛍光灯や白熱電灯に含まれる微弱な紫外線でも光触
媒を光励起することができる。光触媒性チタニアの光励
起に伴い、防曇性コーティングの表面は水との接触角が
10゜以下になる程度に親水化され、高度の防曇性を発
揮する。防曇性コーティングがシリコーンに光触媒性チ
タニアを配合してなる場合には、紫外線により光触媒性
チタニアを光励起すると、シリコーン分子のケイ素原子
に結合した有機基は光触媒の光触媒作用により水酸基に
置換され、コーティングの表面は水との接触角が10゜
以下になる程度に超親水化され、高度の防曇性を発揮す
る。The antifogging coating thus formed on the surface of the transparent substrate is irradiated with ultraviolet rays before use to photoexcite the photocatalytic titania. For photoexcitation of the photocatalytic titania, it is advantageous to use the ultraviolet rays contained in the sunlight under the condition where the sunlight hits. Indoors and at night,
Sterilization lamps, mercury lamps, metal halide lamps, xenon lamps and other UV light sources can be used. The photocatalyst can be photoexcited by the weak ultraviolet rays contained in fluorescent lamps and incandescent lamps. Upon photoexcitation of the photocatalytic titania, the surface of the antifogging coating is hydrophilized to a degree that the contact angle with water is 10 ° or less, and exhibits a high antifogging property. When the anti-fog coating is made by mixing photocatalytic titania with silicone, when photocatalytic titania is photoexcited by ultraviolet rays, the organic group bonded to the silicon atom of the silicone molecule is replaced by the hydroxyl group by the photocatalytic action of the photocatalyst, and the coating The surface of is made super-hydrophilic so that the contact angle with water is 10 ° or less, and exhibits a high degree of antifogging property.
【0018】透明基材がプラスチックで形成されている
場合には、光触媒の光酸化作用により基材が劣化するの
を防止するため、予め基材の表面をシリコーン、フッ素
樹脂、シリカなどのコーティングで被覆しておくのが好
ましい。When the transparent substrate is made of plastic, in order to prevent the substrate from deteriorating due to the photooxidation action of the photocatalyst, the surface of the substrate is previously coated with silicone, fluororesin, silica or the like. It is preferably covered.
【0019】光触媒による超親水化現象は、光触媒によ
る光酸化作用よりも弱い光触媒作用によって実現するこ
とができる。従って、プラスチック基材の劣化を防止す
るための他のやり方は、光触媒の光酸化作用を抑制する
ことである。このため、コーティング組成物にアルカリ
金属、アルカリ土類金属、アルミナ、シリカ、ジルコニ
ア、酸化アンチモン、無定形チタニア、含水チタニアの
ような光酸化作用抑制剤を配合しておくことができる。
更に、防曇性コーティングは膜厚が0.1μm以下にな
るように出来るだけ薄くするのが好ましい。The superhydrophilic phenomenon by the photocatalyst can be realized by a photocatalytic action weaker than the photooxidation action by the photocatalyst. Therefore, another way to prevent the deterioration of the plastic substrate is to suppress the photooxidation action of the photocatalyst. Therefore, a photooxidation inhibitor such as an alkali metal, an alkaline earth metal, alumina, silica, zirconia, antimony oxide, amorphous titania, or hydrous titania can be added to the coating composition.
Furthermore, it is preferable that the antifogging coating is made as thin as possible so that the film thickness becomes 0.1 μm or less.
【0020】[0020]
【実施例】実施例1 アナターゼ型チタニアゾル(日産化学、TA-15、平均結
晶子径12nm )と日本合成ゴムの塗料用組成物“グラス
カ”のB液(トリメトキシメチルシラン)を混合し、エ
タノールで希釈することにより、チタニア含有塗料用組
成物を調製した。チタニアとトリメトキシメチルシラン
の重量比は20:80であった。この塗料用組成物をポ
リエチレンテレフタレート(PET)のフィルム(富士ゼ
ロックス、モノクロPPC用OHPフィルム、JF-001)に塗布
し、110℃の温度で硬化させ、アナターゼ型チタニア粒
子がシリコーン塗膜中に分散された防曇性コーティング
を形成した。コーティングの膜厚は0.1μmであっ
た。この防曇性コーティングの屈折率は1.69であっ
た。この試料に20Wのブラックライトブルー(BLB)蛍光
灯(三共電気、FL20BLB)を用いて0.5mW/cm2の照度
で5日間紫外線を照射した後、この試料の表面の水との
接触角を接触角測定器(協和界面科学社製、形式CA-X15
0、低角度側検出限界1゜)で測定したところ、接触角
の読みは3゜未満であった。この試料に息を吹きかけた
ところ、曇りは観察されなかった。防曇性コーティング
による光の反射具合を肉眼で観察したところ、反射は全
く生じなかった。 Example 1 Anatase-type titania sol (Nissan Kagaku, TA-15, average crystallite diameter 12 nm) was mixed with liquid B (trimethoxymethylsilane) of coating composition "GLASCA" of Japan Synthetic Rubber, and ethanol was mixed. A titania-containing coating composition was prepared by diluting with. The weight ratio of titania to trimethoxymethylsilane was 20:80. This coating composition is applied to a polyethylene terephthalate (PET) film (Fuji Xerox, OHP film for monochrome PPC, JF-001) and cured at a temperature of 110 ° C to disperse the anatase-type titania particles in the silicone coating film. Formed an antifogging coating. The film thickness of the coating was 0.1 μm. The antifogging coating had a refractive index of 1.69. After irradiating this sample with ultraviolet rays for 5 days at a illuminance of 0.5 mW / cm 2 using a 20 W black light blue (BLB) fluorescent lamp (Sankyo Denki, FL20BLB), the contact angle of the surface of this sample with water was measured. Contact angle measuring device (Kyowa Interface Science Co., Ltd., Model CA-X15
The contact angle reading was less than 3 ° when measured at 0, the detection limit of 1 ° on the low angle side. No cloudiness was observed when the sample was blown. When the light reflection due to the anti-fog coating was observed with the naked eye, no reflection occurred.
【0021】実施例2 アナターゼ型チタニアゾル(TA-15)と前記“グラス
カ”のB液(トリメトキシメチルシラン)とフッ化マグ
ネシウムとを30:40:30の重量比で混合し、エタノール
で希釈することにより、塗料用組成物を調製した。この
塗料用組成物をポリエチレンテレフタレートフィルム
(JF-001)に塗布し、110℃の温度で硬化させ、アナタ
ーゼ型チタニア粒子とフッ化マグネシウムがシリコーン
塗膜中に分散された防曇性コーティングを形成した。コ
ーティングの膜厚は0.1μmであった。このコーティ
ングの屈折率は1.76であった。この試料に0.5mW/
cm2の照度で5日間紫外線を照射した後、この試料の表
面の水との接触角を接触角測定器(CA-X150)で測定し
たところ、接触角の読みは3゜未満であった。この試料
に息を吹きかけたところ、曇りは観察されなかった。防
曇性コーティングによる光の反射具合を肉眼で観察した
ところ、反射は全く生じなかった。 Example 2 Anatase-type titania sol (TA-15), the above-mentioned "grasca" solution B (trimethoxymethylsilane) and magnesium fluoride were mixed in a weight ratio of 30:40:30 and diluted with ethanol. Thus, a coating composition was prepared. This coating composition was applied to a polyethylene terephthalate film (JF-001) and cured at a temperature of 110 ° C to form an antifogging coating in which anatase-type titania particles and magnesium fluoride were dispersed in a silicone coating film. . The film thickness of the coating was 0.1 μm. The refractive index of this coating was 1.76. 0.5mW / for this sample
After irradiating with ultraviolet rays for 5 days at an illuminance of cm 2 , the contact angle of the surface of this sample with water was measured with a contact angle measuring instrument (CA-X150), and the contact angle reading was less than 3 °. No cloudiness was observed when the sample was blown. When the light reflection due to the anti-fog coating was observed with the naked eye, no reflection occurred.
【0022】比較例 アナターゼ型チタニアゾル(TA-15)と前記“グラス
カ”のB液(トリメトキシメチルシラン)を混合し、エ
タノールで希釈することにより、チタニア含有塗料用組
成物を調製した。チタニアとトリメトキシメチルシラン
の重量比は90:10であった。この塗料用組成物をポ
リエチレンテレフタレートフィルム(JF-001)に塗布
し、110℃の温度で硬化させ、アナターゼ型チタニア粒
子がシリコーン塗膜中に分散された防曇性コーティング
を形成した。コーティングの膜厚は0.1μmであっ
た。このコーティングの屈折率は2.42であった。こ
の試料に0.5mW/cm2の照度で5日間紫外線を照射した
後、この試料の表面の水との接触角を接触角測定器(CA
-X150)で測定したところ、接触角の読みは3゜未満で
あった。この試料に息を吹きかけたところ、曇りは観察
されなかった。しかしながら、防曇性コーティングを肉
眼で観察したところ、ギラギラと光を反射した。 Comparative Example Anatase-type titania sol (TA-15) and the above-mentioned "Glaska" solution B (trimethoxymethylsilane) were mixed and diluted with ethanol to prepare a titania-containing coating composition. The weight ratio of titania to trimethoxymethylsilane was 90:10. This coating composition was applied to a polyethylene terephthalate film (JF-001) and cured at a temperature of 110 ° C to form an antifogging coating in which anatase type titania particles were dispersed in a silicone coating film. The film thickness of the coating was 0.1 μm. The refractive index of this coating was 2.42. After irradiating this sample with ultraviolet light at an illuminance of 0.5 mW / cm 2 for 5 days, the contact angle of the surface of this sample with water was measured with a contact angle measuring device (CA
-X150), the contact angle reading was less than 3 °. No cloudiness was observed when the sample was blown. However, when the anti-fog coating was visually observed, it reflected glare.
【0023】[0023]
【発明の効果】以上から分かるように、本発明によれ
ば、チタニア含有防曇性コーティングによる光の反射を
低減することができる。従って、建物窓ガラス、乗物窓
ガラス、レンズ、鏡、又は計器盤のカバーガラスを防曇
性コーティングで被覆した場合に、それらがギラギラと
反射するのを防止することができる。また、防曇性コー
ティングによる光透過率の低下を回避し、視界を確保す
ることができる。As can be seen from the above, according to the present invention, the reflection of light by the titania-containing antifogging coating can be reduced. Therefore, when a building window glass, a vehicle window glass, a lens, a mirror, or a cover glass of an instrument panel is coated with an anti-fog coating, it is possible to prevent them from glare. In addition, it is possible to avoid a decrease in light transmittance due to the antifogging coating and to secure the visibility.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 B32B 27/00 101 B32B 27/00 101 27/18 27/18 F C03C 17/38 C03C 17/38 C08J 7/04 C08J 7/04 S // B32B 27/16 B32B 27/16 (72)発明者 渡部 俊也 福岡県北九州市小倉北区中島2丁目1番1 号 東陶機器株式会社内 (72)発明者 北村 厚 福岡県北九州市小倉北区中島2丁目1番1 号 東陶機器株式会社内─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification number Office reference number FI technical display location B32B 27/00 101 B32B 27/00 101 27/18 27/18 F C03C 17/38 C03C 17/38 C08J 7/04 C08J 7/04 S // B32B 27/16 B32B 27/16 (72) Inventor Toshiya Watanabe 2-1-1 Nakajima, Kokurakita-ku, Kitakyushu, Fukuoka Prefecture (72) Invention Atsushi Kitamura 2-1-1 Nakajima, Kokurakita-ku, Kitakyushu City, Fukuoka Prefecture Totoki Equipment Co., Ltd.
Claims (4)
な防曇性コーティングで被覆された透明基材において、
前記コーティングは屈折率が2より小さな媒体にチタニ
ア粒子を配合してなり、チタニア粒子の平均結晶子径は
約0.1μm以下であることを特徴とする透明基材。1. A transparent substrate coated with a transparent anti-fog coating containing particles of photocatalytic titania,
The coating comprises a medium having a refractive index of less than 2 and titania particles, and the titania particles have an average crystallite size of about 0.1 μm or less.
ある請求項1に基づく透明基材。2. The transparent substrate according to claim 1, wherein the coating has a refractive index of about 2 or less.
化マグネシウム、アルミナ、酸化錫、およびそれらの混
合物からなる群から選ばれた1種である請求項1又は2
に基づく透明基材。3. The medium is one selected from the group consisting of silica, silicone, magnesium fluoride, alumina, tin oxide, and a mixture thereof.
Based transparent substrates.
ス、レンズ、鏡、透明フィルム、又は計器盤のカバーガ
ラスである請求項1から3のいづれかに基づく透明基
材。4. The transparent substrate according to any one of claims 1 to 3, wherein the substrate is a building window glass, a vehicle window glass, a lens, a mirror, a transparent film, or a cover glass for an instrument panel.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8160509A JPH0959042A (en) | 1995-06-14 | 1996-05-31 | Transparent base material having anti-mist coating |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18202095 | 1995-06-14 | ||
JP7-182020 | 1995-12-22 | ||
JP8160509A JPH0959042A (en) | 1995-06-14 | 1996-05-31 | Transparent base material having anti-mist coating |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0959042A true JPH0959042A (en) | 1997-03-04 |
Family
ID=26486990
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8160509A Pending JPH0959042A (en) | 1995-06-14 | 1996-05-31 | Transparent base material having anti-mist coating |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0959042A (en) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998005413A1 (en) * | 1996-08-05 | 1998-02-12 | Nippon Sheet Glass Co., Ltd. | Photocatalyst and process for the preparation thereof |
JPH11240112A (en) * | 1997-12-25 | 1999-09-07 | Sumika Plastech Kk | Anti-fogging laminate |
US6071623A (en) * | 1998-02-13 | 2000-06-06 | Central Glass Company, Limited | Hydrophilic article and method for producing same |
EP1101748A1 (en) | 1999-11-19 | 2001-05-23 | Central Glass Company, Limited | Article with antifogging film and process for producing same |
US6531215B2 (en) | 1999-11-19 | 2003-03-11 | Central Glass Company, Limited | Article with antifogging film and process for producing same |
DE10325768A1 (en) * | 2003-06-05 | 2004-12-23 | Chemetall Gmbh | Coating system for glass surfaces, process for its production and its application |
JP2008501557A (en) * | 2004-06-08 | 2008-01-24 | ライプニッツ−インスティトゥート フィア ノイエ マテリアーリエン ゲマインニュッツィゲ ゲゼルシャフト ミット ベシュレンクタ ハフトゥンク | Abrasion and scratch resistant coating with low refractive index on support |
WO2009038150A1 (en) | 2007-09-20 | 2009-03-26 | Fujifilm Corporation | Antifog cover and meter cover using the antifog cover |
US7695774B2 (en) | 2002-01-31 | 2010-04-13 | Fuji Xerox Co., Ltd. | Titanium oxide photocatalyst thin film and production method of titanium oxide photocatalyst thin film |
CN111437803A (en) * | 2020-04-07 | 2020-07-24 | 合肥宝发动力技术股份有限公司 | Nano TiO with grain size less than 10nm2Method for preparing a coating structure |
CN114717542A (en) * | 2022-04-02 | 2022-07-08 | 湖南理东科技有限公司 | Bowl-shaped titanium alloy surface modification method for photocatalysis and photo-thermal dual-mechanism antibiosis |
CN114717542B (en) * | 2022-04-02 | 2024-05-03 | 理东新材料科技(山东)有限公司 | Bowl-shaped titanium alloy surface modification method with photocatalysis and photo-thermal dual mechanism antibacterial function |
-
1996
- 1996-05-31 JP JP8160509A patent/JPH0959042A/en active Pending
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998005413A1 (en) * | 1996-08-05 | 1998-02-12 | Nippon Sheet Glass Co., Ltd. | Photocatalyst and process for the preparation thereof |
JPH11240112A (en) * | 1997-12-25 | 1999-09-07 | Sumika Plastech Kk | Anti-fogging laminate |
US6071623A (en) * | 1998-02-13 | 2000-06-06 | Central Glass Company, Limited | Hydrophilic article and method for producing same |
US6800365B2 (en) | 1999-11-19 | 2004-10-05 | Central Glass Company, Limited | Article with antifogging film and process for producing the same |
US6420020B1 (en) | 1999-11-19 | 2002-07-16 | Central Glass Company Limited | Article with antifogging film and process for producing same |
US6531215B2 (en) | 1999-11-19 | 2003-03-11 | Central Glass Company, Limited | Article with antifogging film and process for producing same |
EP1101748A1 (en) | 1999-11-19 | 2001-05-23 | Central Glass Company, Limited | Article with antifogging film and process for producing same |
EP1477466A1 (en) | 1999-11-19 | 2004-11-17 | Central Glass Company, Limited | Article with antifogging film and process for producing same |
US7695774B2 (en) | 2002-01-31 | 2010-04-13 | Fuji Xerox Co., Ltd. | Titanium oxide photocatalyst thin film and production method of titanium oxide photocatalyst thin film |
DE10325768A1 (en) * | 2003-06-05 | 2004-12-23 | Chemetall Gmbh | Coating system for glass surfaces, process for its production and its application |
JP2008501557A (en) * | 2004-06-08 | 2008-01-24 | ライプニッツ−インスティトゥート フィア ノイエ マテリアーリエン ゲマインニュッツィゲ ゲゼルシャフト ミット ベシュレンクタ ハフトゥンク | Abrasion and scratch resistant coating with low refractive index on support |
WO2009038150A1 (en) | 2007-09-20 | 2009-03-26 | Fujifilm Corporation | Antifog cover and meter cover using the antifog cover |
CN111437803A (en) * | 2020-04-07 | 2020-07-24 | 合肥宝发动力技术股份有限公司 | Nano TiO with grain size less than 10nm2Method for preparing a coating structure |
CN114717542A (en) * | 2022-04-02 | 2022-07-08 | 湖南理东科技有限公司 | Bowl-shaped titanium alloy surface modification method for photocatalysis and photo-thermal dual-mechanism antibiosis |
CN114717542B (en) * | 2022-04-02 | 2024-05-03 | 理东新材料科技(山东)有限公司 | Bowl-shaped titanium alloy surface modification method with photocatalysis and photo-thermal dual mechanism antibacterial function |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP1304366B1 (en) | Use of a photocatalytically rendered superhydrophilic surface with antifogging properties | |
JP3930591B2 (en) | Photocatalytic hydrophilic coating composition, method for forming hydrophilic film and coated article | |
US6830785B1 (en) | Method for photocatalytically rendering a surface of a substrate superhydrophilic, a substrate with a superhydrophilic photocatalytic surface, and method of making thereof | |
JP4107050B2 (en) | Coating material composition and article having a coating formed thereby | |
JPH09230493A (en) | Camera | |
JPH0956549A (en) | Anti-fogging mirror | |
JPH0959042A (en) | Transparent base material having anti-mist coating | |
JPH0959041A (en) | Anticlouding coating composition containing photocatalyst | |
JP2003226842A (en) | Photocatalytic coating agent | |
JP3191259B2 (en) | Method of making substrate surface hydrophilic | |
JPH09230104A (en) | Lens for eye and its hydrophilic treatment | |
JP3596834B2 (en) | Road sign reflector with self-cleaning surface | |
JP2000044886A (en) | Hygroscopic coating composition and hygroscopic composite material | |
JP2003226825A (en) | Photocatalytic coating agent | |
JPH1158629A (en) | Fog-resistant film for agriculture | |
JPH0956742A (en) | Goggles with defogging function | |
JPH1085100A (en) | Anti-clouding heat-insulated showcase |