JPH0954439A - Method for using automatic ps plate developing machine - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method for using an automatic PS plate developing machine whose running cost can be reduced and also in which developing defect and rinsing defect do not occur. SOLUTION: As to this automatic PS plate developing machine provided with a developing part 4 successively receiving an exposed PS plate 10 to be brought into contact with developing solution in which developer is replenished, and feeding the plate 10, and post processing parts 5 and 6 receiving the plate 10 passing through the developing part 4, bringing the plate 10 into contact with post processing solution, and feeding the plate 10; the change in the post processing soln. caused by mixing-in of the developing soln. which has been brought into contact with the plate 10 is measured and the cleaning term of the part 4 is decided based on the measurement information.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of using a PS plate automatic developing machine, and more particularly, to a developing unit for sequentially receiving image-exposed PS plates, bringing them into contact with a developer to be replenished with a developer, and then sending it out. The present invention relates to a method of using a PS plate automatic developing machine, which comprises a post-processing unit that receives a PS plate that has passed through a developing unit, contacts it with a post-processing liquid, and then sends it out.

[0002]

2. Description of the Related Art The PS plate automatic developing machine as described above replenishes the developer with a function of depleting the developer in the PS plate development process by, for example, replenishing a replenisher having a higher activity than the rising developer. As a result, a large number of PS plates can be developed. However, as the developer continues to develop the PS plate, it dissolves the photosensitive resin from the PS plate and absorbs carbon dioxide gas in the air. , The viscosity increases due to the increase of the resin concentration which is hardly recovered by the replenishment of the replenisher. Therefore, sludge is generated and adheres to the developer storage tank, the squeezing roller, etc. Is likely to occur. If sludge adheres to the developer storage tank or the squeezing roller, it takes time and time to clean them, and if the PS plate develops poorly or develops poor rinsing, the resulting lithographic printing plate produces an image with excellent reproducibility. Printing is no longer possible, and the number of paper stains and start-up loss sheets increases, and the durability of the planographic printing plate also decreases. Therefore, it is necessary to clean the developing section and renew the developing solution at an appropriate time.

Therefore, conventionally, the developing section is cleaned and the developing solution is renewed every certain number of PS plates processed or every certain operating time. In such a method of using the PS plate automatic developing machine, it is necessary to clean the developing section early, etc. by watching the safety too much so as not to cause the development failure and rinsing failure of the PS plate, and to increase the running cost. There was a problem that it was easy.

[0004]

SUMMARY OF THE INVENTION The present invention has been made in order to solve the above-mentioned problems, and it is possible to reduce the running cost and to prevent the development failure and the rinsing failure from occurring in the PS plate automatic development. The purpose is to provide how to use the machine.

[0005]

According to the present invention, there is a change in the properties of a post-treatment liquid after the post-treatment of a PS plate which has passed through a developing section, or a PS plate which is image-exposed with a uniform image on the entire surface. Poor development or rinsing failure of the PS plate occurs depending on the developed image state of the judgment PS plate or the degree of contamination of the transparent wall portion provided on the tank wall above the developer surface where the PS plate in the developer storage tank is submerged. This is completed as a result of the finding by the present inventors that it is possible to know relatively accurately the timing of cleaning the developing section and the time of renewing the developing solution, which can be the slowest in the non-existent range.

That is, the present invention is, firstly, that the image-exposed PS is
PS having a developing section for sequentially receiving plates and bringing them into contact with a developing solution to be replenished with a developer and then sending them out, and a post-processing section for receiving PS plates which have passed through the developing section and bringing them into contact with a post-processing solution and then sending them out In the plate automatic developing machine, the change in the post-treatment liquid that comes into contact with the PS plate due to the mixing of the developer that comes into contact with the PS plate is measured, and the cleaning time of the developing section is determined based on the measurement information. The second method is to use the PS plate automatic developing machine. Secondly, the image-exposed PS plates are sequentially received and brought into contact with a developer solution in which the developer is replenished, and then the developer solution passes along with the PS plate. The developing section that feeds through the squeezing roller that prevents
In a PS plate automatic developing machine having a post-processing unit for receiving an S plate, bringing it into contact with a post-processing liquid, and then sending it out,
In a method of using a PS plate automatic developing machine, characterized in that the cleaning time of the squeezing roller is determined from the image state of the developed judgment PS plate after passing an appropriate number of plates through the judgment PS plate, Thirdly, the imagewise exposed PS plates are sequentially received, the developing part is submerged in the developer replenished with the developer and then sent out, and the PS plate passed through the developing part is received and brought into contact with the post-treatment liquid. P that has a post-processing unit that is sent out later
In the S plate automatic developing machine, a transparent wall portion is provided on a portion of the developing solution storage tank wall of the developing section above the developing solution surface, and the contamination state of the transparent wall portion is determined to update the developing solution timing. And a method of using the PS plate automatic developing machine, which achieves the above object.

[0007]

That is, according to the method of using the PS plate automatic developing machine of the present invention, the change measurement information due to the use of the post-treatment liquid, which clearly shows the stain state of the developing portion and the susceptibility of the developing solution to sludge, or particularly the developing portion. The state of whether there is a defect in the developed image of the PS plate for judgment, which often indicates the dirt state of the squeezing roller at the exit, or above the level of the developer on the wall of the developer storage tank, which particularly indicates the ease of sludge generation of the developer. The time when the developing part is cleaned, the time when the squeezing roller is cleaned, and the time when the developer is renewed are determined depending on the contamination state of the transparent wall part provided in the area, so that the development failure and the rinsing failure of the PS plate do not occur. Thus, the cleaning of the developing portion and the renewal of the developing solution can be delayed most, the running cost can be kept low, and a lithographic printing plate capable of printing an image with excellent reproducibility can be obtained.

[0008]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to the accompanying drawings.

FIG. 1 is a schematic sectional view showing the construction of an example of a PS plate automatic developing machine to which the first and second use methods of the present invention are applied.
FIG. 2 is a schematic sectional view showing the construction of an example of a PS plate automatic developing machine to which the third method of use of the present invention is applied.

In any of the developing machines, the image-exposed P
When the S plate 10 is inserted from the insertion table 1 and detected by the plate detecting means 2, the developing machine operation is started by the pair of feed rollers 3 as a result. It is fed and developed by the developing solution in the developing section 4, then fed to the rinsing section 5 which is the first post-processing section and is rinsed by the rinsing solution of the first post-processing solution in the rinsing section 5, and then the 2 is sent to a gum processing unit 6 which is a post-processing unit, a gum solution of a second post-processing liquid is applied in the gum processing unit 6, then sent to a drying chamber 7 and dried in a drying chamber 7 for lithographic printing. It is sent out as a plate.

The PS plate 10 is made of paper, plastic sheet,
A metal sheet, a composite sheet obtained by laminating a metal on a plastic or a plastic sheet on paper, preferably an aluminum or aluminum alloy sheet provided with an anodized film on both sides by roughening one side as a support,
Photosensitive diazo compound, azide compound, a compound having an ethylenically unsaturated double bond, which changes into a curable type or a soluble type by exposure on one side of the support, an epoxy compound which causes polymerization with an acid catalyst, and decomposition with an acid It may be a negative or positive PS plate on which a layer such as a combination of a silyl ether polymer or a compound having a C—O—C group and a photo-acid generator is formed. The image exposure of the PS plate 1 is performed by a light rich in actinic rays through a transparent original image having a line image and a halftone image from a light source such as a carbon arc lamp, a mercury lamp, a metal halide lamp, a xenon lamp, a chemical lamp, and a tungsten lamp. Done.

The developing solution in the developing section 4 contains [SiO ₂ ] /
[M] (in the formula, [SiO ₂ ] represents a molar concentration of SiO ₂ , and [M] represents a molar concentration of an alkali metal) is 0.35 to 1.0, preferably 0.4 to Alkali having a SiO ₂ content of 0.5 to 5% by weight, preferably 1 to 3% by weight, and a concentration of an alkali metal silicate in the range of 0.1 to 10% by weight. An aqueous solution, an alkaline aqueous solution in which other alkaline agents such as sodium hydroxide, potassium hydroxide, tribasic sodium phosphate, dibasic sodium phosphate, sodium carbonate, and potassium carbonate are added and dissolved as necessary, and the pH An alkaline aqueous solution having a temperature (25 ° C., the same applies below) of 12 or more and 13.5 or less is used.

As a replenisher for replenishing the developing solution in order to recover the deterioration of the developing ability due to the use of the developing solution,
[SiO ₂ ] / [M] is in the range of 0.2 to 0.8, preferably 0.3 to 0.7, and the content of SiO ₂ is 0.5 to 5% by weight, preferably 1 to An alkali aqueous solution having a concentration of the alkali metal silicate of 4% by weight or more in the developer, and optionally potassium hydroxide, sodium hydroxide, lithium hydroxide, sodium triphosphate, sodium diphosphate, Inorganic alkaline agents such as potassium triphosphate, dibasic potassium phosphate, tribasic ammonium phosphate, dibasic ammonium phosphate, sodium metasilicate, sodium bicarbonate, sodium carbonate, potassium carbonate, ammonium carbonate, mono, di or Add and dissolve an organic alkaline agent such as triethanolamine, tetraalkylammonium hydroxide, or organic ammonium silicate in the range of 0.05 to 20% by weight. An alkaline aqueous solution, p
H is equal to or higher than the pH of the developer, preferably from the pH of the developer to 0.
An alkaline aqueous solution having a higher level of 5 or more is used.

If necessary, various surfactants and organic solvents may be added to the above-mentioned developing solution and replenishing solution for the purpose of accelerating or suppressing the developing property, dispersing the development residue or enhancing the ink affinity.
Although it may be added in the range of 01 to 10% by weight,
Or, when using an alkaline aqueous solution in which the concentration of the alkali metal silicate is higher than that of the developer, in most cases, when replenishing the replenisher with the developer, diluting water should also be replenished so that the pH and concentration approach those of the developer. Therefore, a surfactant or an organic solvent may be added to the dilution water and the diluted water may be placed. In addition, additives such as an antifoaming agent and a water softener may be added to the developer and the replenisher.

Water or water containing a surfactant or the like is used as the rinse liquid in the rinsing part 5, and a gum arabic or starch derivative containing liquid is used as the gum liquid in the gum treatment part 6. The developing machine is not limited to the illustrated example, and the rinsing and gum treatment may be performed simultaneously with an aqueous solution of gum arabic, starch derivative or the like in the post-treatment section in which the rinsing section and gum treatment section are combined.

The above-mentioned treatment liquid and the like are disclosed in, for example, JP-A-6-236.
041, JP-A-6-35174, and JP-A-5-818
No. 42, JP-A-3-59666, JP-A-62-288.
It is the same as that used in the PS plate automatic developing machine described in JP-A No. 845 and JP-A-61-162049.

In each of the developing machines, a replenishing solution tank 41 and a diluting water tank 42 are provided in the developing solution storage tank 40 of the developing section 4 when starting up.
By supplying the above-mentioned replenishing solution and dilution water in appropriate proportions, the above-mentioned developing solution is stored so as to maintain a predetermined level, and is heated to a predetermined temperature by the heater 43. And as mentioned above, PS version 10
When the developer is sent to the developing unit 4, the developer is stored in the developer storage tank 4
Filter 44 and pump 45 from the opening opened at the bottom of 0
The PS plate 10 is circulated through the developing solution circulating path that returns to the developing solution storage tank 40 and is conveyed in the developing solution by the conveying roller 46, and is rubbed by the rotating brush 47 in the meantime to be developed. The developed PS plate 10 is sent out from the developing unit 4 and is sent to the rinsing unit 5 by a pair of squeezing rollers 49 that prevent the developing solution from passing together with the PS plate 1.

The developing solution in the developing solution storage tank 40 is deteriorated by dissolving the photosensitive resin in the above-mentioned development and also by absorbing carbon dioxide gas in the air, so that the developing ability is lowered. Become. The replenisher is replenished from the replenisher tank 41 to compensate for the decrease in the developing ability. However, the developer that is circulated and used gradually deteriorates as the PS plate 10 is continuously developed, its viscosity increases, its fluidity decreases, and sludge is generated, which causes the sludge to adhere to the squeezing roller 49 and the like.

If the sludge adheres to the squeezing roller 49, P
It becomes easy for the developer to pass along with the S plate 10. Therefore, the developer and the photosensitivity such as pH, color density, or conductivity before and after the rinse of the rinse solution for washing off the developer adhering to the PS plate 10 or the photosensitive resin dissolved in the developer in the rinsing section 5 are rinsed. The property that changes depending on the content of the resin is measured using a conventionally known measuring means, and the difference between the two measured values, that is, the amount of the developer or the like carried to the rinsing section 5 by the PS plate 10 is used to develop the PS plate 10. The time for cleaning the developing unit 4 including the squeezing roller 49, which is as slow as possible within the range that does not cause defects or rinsing defects, is determined, and the feeding of the PS plate 10 is temporarily stopped at that time, and the cleaning of the developing unit 4 and the development solution are stopped. PS version 1 after updating
Make sure to restart sending 0. When cleaning the developing section 4, the difference in the measured values for the last PS plate 10 is the difference in the measured values for the first PS plate 10, and the rinsing liquid content after rinsing does not change. 10-200
% Increase (This range is due to the fact that there is a considerable difference in the effect of development failure or rinsing failure on the actual problem due to the roughness of the image of the image exposure. A small value is taken in the case of a fine image.) Estimate and determine when the value will give a quantity. As a result, good development of the PS plate 10 can be stably performed without increasing the running cost.

Alternatively, if sludge adheres to the squeezing roller 49, a defect occurs in the developed image on the PS plate 10. Therefore, the timing of occurrence of a defect, which is a practical problem, must be known accurately before that. In order to clean the developing unit 4 including the squeezing roller 49 before that time, a PS plate for judgment which has been exposed to a uniform image which is apt to be damaged is developed, and the image appears on the image. From the state of loss PS version 10
Therefore, it is better to judge the time when a defect that actually causes a problem occurs. Therefore, the PS plate 10 for judgment is fed after an appropriate number of PS plates 10 within a range that does not cause defective development or rinsing failure, and defects such as the number of defects per fixed area recognized in the developed image are detected. From the state of, how many more PS
After the development of the plate 10, it is determined whether to clean the developing unit 4 including the squeeze roller 49 and renew the developer, and the squeeze roller 49 is cleaned according to the determination. With this, the same effect as described above can be obtained.

Alternatively, when the developing solution easily produces sludge, the sludge easily adheres to the tank wall above the developing solution surface of the developing solution storage tank 40 as dirt. As shown in FIG. 2, the tank wall portion above the surface of the developer near the transparent wall portion 40
As a, the contamination state of the portion is visually determined or determined by an optical measuring means such that a fixed amount of light is incident on the transparent wall portion 40a and the reflected light is received by the photoelectric conversion element,
From the result of the determination, the timing for cleaning the developing section 4 and updating the developing solution as late as possible within the range where the defective development or rinsing failure of the PS plate 10 does not occur is determined, and the feeding stop of the PS plate 10 and the development section 4 are accordingly determined. And cleaning of the developer, renewal of the developing solution, and resumption of the feeding of the PS plate 10. With this, the same effect as described above can be obtained.

In the rinsing section 5, the shower nozzle 52
The rinse liquid is poured onto the PS plate 10 fed between the pair of transport rollers 53 and 54 on the inlet side and the outlet side in the rinsing tank 50, but the rinse liquid in the example of FIG. Alternatively, it is sent from the rinse liquid adjusting tank to the shower nozzle 52 via a pump, and after contacting the PS plate 10, the rinse liquid is discharged from the bottom of the rinsing tank 50 to the waste rinse liquid tank 55 through a valve without being circulated. . On the other hand, Fig. 2
The rinsing liquid in the above example is supplied to the rinsing tank 50 from a rinsing liquid supplying means (not shown) before the start of use of the rinsing portion 5 and stored at a predetermined level, and at the bottom of the rinsing tank 50 when the rinsing of the PS plate 10 is started. It is circulated and used by a rinse liquid circulation path equipped with a shower nozzle 52 at a terminal that returns from the opened inlet to the inside of the rinse tank 50 through the pump 51, and from the rinse tank 50 to the waste rinse liquid tank 55 when cleaning the developing unit 4 and the like. Emitted and updated.

Therefore, in the example of FIG. 1, the PS plate 10 is fed to the rinsing section 5 in terms of changes in measured values such as pH, color density, and electric conductivity before and after rinsing of the rinse solution used for time determination of cleaning of the developing section 4. Before rinsing, the measured values of the rinse liquid ejected from the shower nozzle 52 and the rinse liquid rinsed with a suitable number of the last PS plates 10 within a range that does not cause development failure and rinsing failure that are empirically known. The difference is calculated as shown in FIG.
In the above example, the rinsing liquid in the rinsing tank 50 and the subsequent PS immediately before the suitable number of the last PS plates 10 within a range that does not cause development failure and rinsing failure, which are empirically known, are sent to the rinsing section 5. The rinsing tank 5 immediately before the plate 10 is sent to the rinsing section 5.
The measured value of the rinse liquid of 0 is obtained and the difference is obtained. However, the present invention is not limited to this, and the rinse liquid ejected from the shower nozzle 52 when the change in the measured values of pH and the like before and after rinsing of the rinse liquid used for determining when to clean the developing unit 4 in the example of FIG. It may be temporarily switched to a new rinse solution and obtained as in the example of FIG.

The developed PS plate 10 washed in the rinsing section 5 is sent to the gum processing section 6, and the gum solution is applied in the gum processing section 6 having the same structure as the rinsing section 5 in FIG. That is, the gum solution tank 60 of the gum processing unit 6 is also supplied with a gum solution from a gum solution supply means (not shown) and stores the gum solution at a predetermined level, and the gum solution is pumped from the inlet opening at the bottom of the gum solution tank 60 to the pump 61. A PS that is fed through a pair of conveying rollers 63 and 64 on the inlet side and the outlet side in the gum solution tank 60 from a shower nozzle 62 at the end of the gum solution circulation path that returns to the inside of the gum solution tank 60.
It is poured on the plate 10 and circulated. Since this gum solution desensitizes the PS plate 10 by cleaning the components contained in the gum solution after development, it is different from the developer or rinse solution in PS.
If the gum solution carried out together with the plate 10 or the components contained therein are replenished, it can be used for a long time without replacement.

The PS plate 10 to which the gum solution is applied in the gum processing unit 6 is sent into the drying chamber 7 via the transfer roller 67, and warm air is blown from the pair of upper and lower air nozzles 71 in the transporting path in the drying chamber 7. A pair of transport rollers 7 sprayed on the upper and lower surfaces.
2 and further, warm air is blown from the pair of air nozzles 73 to the upper and lower surfaces and is discharged to the outside of the machine by the pair of transport rollers 74, so that good development and rinsing are performed. Used as an excellent lithographic printing plate.

The following is a more particularly preferred embodiment,
The present invention is not limited to the following examples.

Example 1 The automatic processor shown in FIG. 1 is used. Developer reservoir 4 of developing section 4
0 as a developer Konica positive PS plate developer SDR-1
Image-exposed Konica Positive PS plate K
The PS plate 10 of M-3 is developed. In the rinsing section 5, shower supply is performed so that 100 ml / m ² of the rinse liquid passes the surface of the PS plate 10 through which water having a pH of 6.75 passes.
The gum solution tank 60 of the gum processing section 6 was charged with a 2-fold diluted solution of the PS plate gum solution SGW-3 manufactured by Konica Corporation, and SGW-3 and water were added so that the specific gravity of the gum solution became constant during processing. To replenish.

First, a PS plate 1 of 600 mm × 400 mm
When 0 was developed and the rinse solution after rinsing was measured, the pH was 10.85. Subsequently, development processing was performed for 2 weeks at a rate of 150 mm ² processing a day, and the pH of the rinse solution after rinsing the final PS plate 10 was measured.
It was the same as at 0. Conventionally it took 2 weeks to develop 4
Although cleaning and liquid exchange were performed, the processing was continued at the same rate as before without cleaning. After the treatment for 6 weeks from the beginning, the pH of the rinse liquid after rinsing the final PS plate 10
Was 11.01. Therefore, the developing process was stopped and the developing unit 4 including the aperture roller 49 was cleaned and the developing solution was updated. For cleaning, washing with water and simple scrubbing with a brush is sufficient, and it took 1 hour per person including liquid exchange.

Comparative Example 1 Under the same conditions as in Example 1, the PS plate 10 was developed for 9 weeks. From the latter half of the 8th week, the number of lost papers at the start of printing by the obtained lithographic printing plate gradually increased, and the final lithographic printing plate required twice as many broke sheets as the first lithographic printing plate. When the developing unit 4 was cleaned after the running, hard sludge adhered to the squeeze roller 49, and it was necessary to remove the sludge with a metal spatula so as not to scratch the roller.

Example 2 A PS plate automatic developing machine (PSZ-1315 manufactured by Konica Corp.) as shown in FIG. 2 was used, and a PS plate 10 was a positive PS plate PSKM-3 manufactured by Konica Corp. The positive PS plate shown below is used as the judgment PS plate.

Positive PS plate: JIS with a thickness of 0.24 mm
A 1050 aluminum sheet is immersed in a 2% aqueous solution of sodium hydroxide for degreasing treatment, electrochemically roughened in a dilute nitric acid solution, washed well, and then anodized in a dilute sulfuric acid solution. An oxide film of 0.5 g / m ² is formed on the roughened surface. This aluminum sheet was washed with water and dried, and a photosensitive composition coating solution having the following composition was dried at a weight of 4.0 g.
/ M ² and then dried to obtain a PS plate.

(Photosensitive Composition Coating Liquid) An ester compound of naphthoquinone- (1,2) -diazide- (2) -5-sulfonic acid chloride and pyrogallol-acetone resin (Synthesis of JP-A-60-143345) Compound described in Example 2) 1.1 parts by weight Copolycondensation resin of phenol, m-, p-mixed cresol and formaldehyde (the molar ratio of phenol, m-cresol and p-cresol at the time of synthesis was 10). : 54:36, weight average molecular weight M _W = 5500) 8.0 parts by weight PEG # 2000 0.1 parts by weight Victoria Pure Blue BOH (manufactured by Hodogaya Chemical Co., Ltd.) 0.08 parts by weight Methyl cellosolve 100 parts by weight For Konica PSKM-3PS plate and positive PS plate for judgment, original film with halftone dot pattern and for sensitivity measurement Step tablets (No. 2, Eastman Kodak Company, No. 2, 21-step gray scale with a density difference of 0.15 each) were adhered to each other, and a 2 kW metal halide lamp was used as a light source from a distance of 70 cm under a condition of 8.0 mW / cm ^2. The PS plate 10 to be developed and the PS plate for judgment were exposed for 60 seconds.

60 liters of the developer having the following composition is stored as a rising solution in the developer storage tank 40, and a replenisher having the following composition is prepared in the replenisher tank 41.

(Developer) A potassium silicate (SiO ₂ : 26% by weight, K ₂ O: 13% by weight) 100 parts by weight Potassium hydroxide 19 parts by weight Water 1200 parts by weight (replenisher) A potassium silicate (SiO ₂ : 26% by weight, K ₂ O: 13% by weight) 100 parts by weight Potassium hydroxide 22 parts by weight Water 40 parts by weight And, in the rinsing tank 50 of the rinsing part 5, 15 liters of washing water,
The gum solution tank 60 of the gum processing section 6 was charged with a 2-fold dilution of the gum solution SGW-3 for PS plate manufactured by Konica Corporation, and the developing solution in the developing tank 40 was heated to 30 ° C. to run the PS plate 10. To start. During processing, PS is stored in the developer storage tank 40.
The replenisher is replenished so that the sensitivity of the plate 10 becomes constant, and the SGW- is added to the gum solution tank 60 so that the specific gravity of the gum solution becomes constant.
Add 3 and water.

Every time the PS plate 10 was treated with 100 m ^{2, the} occurrence of image defects was observed through the judgment PS plate. Conventionally, the developing section 4 was cleaned after 50 m ² processing for 60 days, but no defect was found at that stage.
A large number of minute image defects were visually confirmed on the PS plate for judgment passed on the 08th day. Therefore, the developing section 4 was cleaned and the developing solution was replaced. For cleaning, only washing with water and simple rubbing with a brush is sufficient, and one person and one hour completed including liquid exchange.

Example 3 As shown in FIG. 2, the automatic processor of FIG. 1 has a width of 7 × 20 c.
An automatic developing machine in which transparent wall portions 40a made of a transparent vinyl chloride plate having a thickness of 3 mm are provided on both sides is used. Konica positive PS plate developer K as a developer in the developer storage tank 40 of the developing section 4.
10 liters of D-52 is charged, and the PS plate 10 of the image-exposed Konica Positive PS plate KM-3 is developed. In the rinsing section 5, the PS plate 10 that passes water having a pH of 6.75 as a rinse liquid
Shower is supplied so that the surface of the sample will hit 50 ml / m ² . The conditions of the gum processing part 6 are the same as in the first embodiment.

Prior to the development process, one transparent wall portion 40
When a white fluorescent lamp of 36 W was irradiated from a to measure the illuminance on the transparent wall portion 40a on the opposite side, it was 300 lux. The sample was treated with 150 m ² per day for 2 weeks, and then the illuminance was measured and found to be 285 lux. Conventionally 2
Although the developing section 4 was cleaned and the liquid was exchanged for a week, the cleaning was not performed and the processing was continued at the same rate as before. After processing for 4 weeks from the beginning, and then measuring the illuminance 3
The illuminance had dropped to 0 looks. Therefore, the developing process was stopped and the developing unit 4 including the aperture roller 49 was cleaned and the developing solution was updated. For cleaning, washing with water and simple rubbing with a brush is sufficient, and one person and one hour were included including liquid exchange.

[0038]

According to the method of using the PS plate automatic developing machine of the present invention, the cleaning of the developing portion and the renewal of the developing solution can be delayed most in the range where the development failure and the rinsing failure of the PS plate do not occur, and the running cost can be reduced. It is possible to obtain a lithographic printing plate capable of printing images with excellent reproducibility.

[Brief description of drawings]

FIG. 1 is a P to which the first and second usage methods of the present invention are applied.
It is a structure outline sectional view showing an example of an S version automatic processor.

FIG. 2 is a schematic cross-sectional view of a configuration showing an example of a PS plate automatic developing machine to which a third method of use of the present invention is applied.

[Explanation of symbols]

10 PS plate 4 developing section 40 developing solution storage tank 41 replenishing solution tank 42 dilution water tank 46, 53, 54, 63, 64, 72, 74 conveying roller 47 rotating brush 48 waste developing solution tank 49 squeezing roller 5 rinsing section 50 rinsing tank 52,62 Shower nozzle 55 Waste rinse liquid tank 6 Gum processing section 7 Drying room

Claims (7)

[Claims] 1. A developing section which receives imagewise exposed PS plates in sequence and makes them contact with a developing solution in which a developer is replenished and then sends them out, and receives a PS plate which has passed through the developing section and makes them contact with a post-processing solution. In a PS plate automatic developing machine having a post-processing section that sends out after that, the change of the post-processing solution that comes into contact with the PS plate due to the mixing of the developer solution that comes into contact with the PS plate is measured, and the developing section is based on the measurement information. A method for using the PS plate automatic developing machine, characterized in that the cleaning time of is determined. 2. The method of using the PS plate automatic developing machine according to claim 1, wherein the measurement information is the pH of the post-treatment liquid. 3. The method of using a PS plate automatic developing machine according to claim 1, wherein the measurement information is a color density of a post-treatment liquid. 4. The method of using the PS plate automatic developing machine according to claim 1, wherein the measurement information is a conductivity of a post-treatment liquid. 5. A developing section for sequentially receiving the image-exposed PS plates, bringing them into contact with a developer solution for replenishing the developer, and then sending it out through a squeezing roller for preventing the developer solution from passing along with the PS plate. In a PS plate automatic developing machine having a post-processing unit that receives the PS plate that has passed through the developing unit, contacts the post-processing liquid, and then sends it out, after passing an appropriate number of the PS plates, through the PS plate for determination, A method of using an automatic PS plate developing machine, wherein the cleaning time of the squeezing roller is determined from the image state of the developed PS plate for judgment. 6. A developing section which receives imagewise-exposed PS plates in sequence and submerges them in a developer replenished with a developer and then sends them out, and receives a PS plate which has passed through the developing section and contacts it with a post-treatment liquid. In a PS plate automatic developing machine having a post-processing section for sending out after that, a transparent wall portion is provided in a portion of the developing solution storage tank wall of the developing section above the developing solution surface, and the contamination state of the transparent wall portion is prevented. A method of using a PS plate automatic developing machine, characterized by determining the update timing of the developer. 7. The automatic PS plate developing machine according to claim 6, wherein the transparent wall portion is provided in the vicinity of an installation location of a rotary brush for rubbing the upper surface of the PS plate in the developing solution. how to use.