JPH10123717A - Method for processing photosensitive planographic printing plate, and device for processing the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To decrease the amt. of generated sludge of a developer by supplying the developer to an image-exposed surface while transporting a photosensitive planographic printing plate to an approximately horizontal direction in a developing stage at a specific transportation speed. SOLUTION: The photosensitive planographic printing plate (PS plate) 10 is transported at a transportation speed of >=1000mm/min and >=8000mm/min and is subjected to development processing by supplying the developer to the image-exposed surface of the PS plate 10. In such a case, the developer stored in a developing tank 30 is controlled by a heater to a prescribed temp. The developer controlled in temp. is injected and supplied to the image-exposed surface of the PS plate 10 from a shower pipe 32 at the end of a branch pipe 16 through a filter 13, a pump 14, a head chamber 15 and the branch pipe 16 from a circulating path inlet opened in the bottom of the developing tank 30 while the PS plate 10 is transported in a development processing section 3 by an inlet transporting roller 32 and an outlet transporting roller 38, by which the PS plate is subjected to the development processing.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photosensitive lithographic printing plate processing method for rapidly developing a photosensitive lithographic printing plate (hereinafter, also referred to as a PS plate) and a processing apparatus therefor.

[0002]

2. Description of the Related Art Conventionally, a photosensitive lithographic printing plate is image-exposed, developed with a developing solution, and washed with water (also called a rinsing solution).
A photosensitive lithographic printing plate processing method for performing a water-washing process, followed by a further treatment with a gum solution or the like, followed by drying, is known. In recent years, improvements have been made to increase the processing capacity of PS plates in order to improve the work efficiency of processing of PS plates. In order to increase the processing capacity, for example, the activity of a developer is increased to shorten the processing time of a PS plate.

[0003]

However, as a problem of the prior art, increasing the activity of the developing solution means processing with a high pH developing solution. There is a problem to be solved, such as an increase in the amount of generation and shortening of the life of the processing solution. Further, in order to increase the processing capacity, it is necessary to efficiently remove the sludge brought into the washing section, and there is a problem to be solved, such as performing washing with a small amount of washing water more efficiently.

The present invention has been made in view of the above problems, and an object of the present invention is to increase the processing speed by increasing the transport speed of a PS plate, and to reduce the amount of sludge eluted from the PS plate to reduce the processing liquid. An object of the present invention is to provide a photosensitive lithographic printing plate processing method and a processing apparatus thereof that have a long service life and a reduced amount of developer waste. Another object of the present invention is to increase the processing speed by increasing the transport speed of the PS plate, to efficiently remove sludge from adhering to the PS plate in the water washing process, and to increase the washing efficiency by a multi-stage countercurrent washing method. Another object of the present invention is to provide a method for processing a photosensitive lithographic printing plate and a processing apparatus therefor, wherein the amount of waste water of washing water is reduced.

[0005]

The above objects are achieved by the following means. That is, (1) the photosensitive lithographic printing plate is transported at a transport speed of 1000 mm / min or more and 8000 mm / min or less, and the photosensitive lithographic printing plate is transported substantially horizontally through a developing step. A method for processing a photosensitive lithographic printing plate, comprising supplying a developing solution to the image-exposed surface and performing a developing process.

(2) The photosensitive lithographic printing plate is transported at a transport speed of 100
Conveying means for conveying the photosensitive lithographic printing plate at a speed of 0 mm / min or more and 8000 mm / min or less, and a developer on the image-exposed surface of the photosensitive lithographic printing plate while conveying the photosensitive lithographic printing plate substantially horizontally by the conveying means. A photosensitive lithographic printing plate processing apparatus, comprising: a developing section for supplying and developing the lithographic printing plate.

(3) The photosensitive lithographic printing plate is transported at a transport speed of 100
The photosensitive lithographic printing plate is transported at a speed of 0 mm / min or more and 8000 mm / min or less, and the photosensitive lithographic printing plate is subjected to a developing process. Wherein the photosensitive lithographic printing plate is subjected to a washing treatment in a washing treatment step in which the washing water is sequentially overflowed into the tank. Or (4) conveying means for conveying the photosensitive lithographic printing plate at a conveying speed of 1000 mm / min or more and 8000 mm / min or less, a developing section for developing the photosensitive lithographic printing plate, and the photosensitive section after the developing processing. A washing unit that supplies washing water to a tank on the downstream side in the transport direction of the photosensitive lithographic printing plate and overflows the washing water sequentially to the tank on the upstream side to wash the photosensitive lithographic printing plate with water. Is a photosensitive lithographic printing plate processing apparatus.

In each of the above inventions (1) to (4), the photosensitive lithographic printing plate is conveyed at a speed of at least 1000 mm / min.
0 mm / min or less. PS plate transport speed is 1000m
If the transport speed is lower than m / min, for example, the processing capacity of the PS plate is reduced. In addition, the transport speed of the PS plate is 8000 mm
If the transfer speed is higher than / min, the PS plate processing apparatus will become larger. The reason for this is that the development time of the PS plate requires a minimum time even if the activity of the processing solution is increased, and in order to secure the minimum processing time, the PS plate transport path becomes longer and the processing time becomes longer. The device becomes larger. The transport speed of the PS plate is more preferably 1500 mm / min or more,
000 mm / min or less.

[0009]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A photosensitive lithographic printing plate processing method and a processing apparatus according to embodiments of the present invention will be described below with reference to the drawings, but the present invention is not limited to these embodiments. FIG. 1 is a front sectional view showing the structure of an example of a photosensitive lithographic printing plate processing apparatus. FIG. 2 is a front sectional view showing the structure of a developing section shown in FIG. 1. FIG. FIG. 4 is an enlarged cross-sectional view of the configuration shown in FIG. 4A, and FIG. 4B is a cross-sectional front view of the configuration showing another water-washing processing unit of the embodiment, and FIG. FIG. 6 is a front cross-sectional view illustrating a configuration of another washing processing unit according to another embodiment of the present invention. FIG. 7 is a front cross-sectional view illustrating a configuration of another developing unit according to the embodiment. It is.

In FIG. 1, when the PS plate 10 subjected to image exposure is inserted from the insertion table 1, the insertion of the PS plate is detected by the plate detecting means 2 and the operation of the PS plate processing apparatus is started. The PS plate 10 is sent to the developing section 3 and is developed by a developer. Next, the PS plate 10 is conveyed to the water washing section 4 for processing, further conveyed to the gum processing section 5 and treated with the gum solution, and further conveyed to the drying chamber 6 for drying. This is disclosed in JP-A-6-2360.
No. 41, JP-A-3-59666 and the like.

The PS plate 10 is preferably made of a metal sheet, paper, a plastic sheet, a composite sheet obtained by laminating a plastic on a paper or a metal on a plastic sheet, or the like. Or an aluminum alloy sheet as a support, a photosensitive diazo compound that changes to a curable or soluble type by exposure on the one surface side of the support, an azide compound, a compound having an ethylenically unsaturated double bond, an acid catalyst. Either a negative or positive PS plate, which has formed a layer of an epoxy compound that causes polymerization, a silyl ether polymer that decomposes with an acid, or a compound having a C—O—C— group and a photoacid generator. There may be.

In the image exposure of the PS plate 10, any image exposure is performed by using a transparent image having a line image or a halftone image from a light source such as a carbon arc lamp, a mercury lamp, a metal halide lamp, a xenon lamp, a chemical lamp, and a tungsten lamp. It is performed by actinic rays through the original drawing.

Here, the developing solution in the developing section 3 will be described. The developing solution is an aqueous alkali developing solution containing an alkali metal silicate, preferably [SiO ₂ ] / [M].
(Wherein [SiO ₂ ] represents the molar concentration of SiO ₂ ,
[M] indicates the molar concentration of the alkali metal. ) Is 0.5
~ 1.2, the content of SiO ₂ is 0.5 ~
The concentration of the alkali metal silicate of 7% by weight is 0.1-1.
An alkaline aqueous solution in a range of 0% by weight, and other alkaline agents such as sodium hydroxide, potassium hydroxide, sodium phosphate tribasic, sodium phosphate dibasic, sodium carbonate and potassium carbonate were added and dissolved as needed. An alkaline aqueous solution having a pH (25 ° C., the same applies hereinafter) of 12 or more,
An aqueous alkaline solution of 13.5 or less is used.

Next, the replenisher will be described. As the replenisher replenished to the developer in order to recover the deterioration of the developing ability due to the use of the developer and the like, the concentration of the alkali agent containing an alkali metal silicate is used as the replenisher. The above alkaline aqueous solution,
Preferably, [SiO ₂ ] / [M] is in the range of 0.15 to 0.8, and the concentration of the alkali metal silicate in which the content of SiO ₂ is 0.5 to 7% by weight is the concentration in the developer. The above alkaline aqueous solution, and, if necessary, potassium hydroxide, sodium hydroxide, lithium hydroxide, tribasic sodium phosphate, dibasic sodium phosphate, tribasic potassium phosphate, dibasic potassium phosphate, tertiary phosphoric acid Inorganic alkaline agents such as ammonium, dibasic ammonium phosphate, sodium metasilicate, sodium bicarbonate, sodium carbonate, potassium carbonate, ammonium carbonate and the like, mono-, di- or triethanolamine, tetraalkylammonium hydroxide, organic ammonium silicate, etc. Organic alkaline agent 0.05 ~
An alkaline aqueous solution added and dissolved in a range of 20% by weight, wherein the pH is equal to or higher than the pH of the developer, preferably the pH of the developer;
An aqueous alkaline solution 0.5 or more higher than that is used.

The above-mentioned developer and replenisher may contain various surfactants or organic solvents for the purpose of accelerating or suppressing development, dispersing development residue or enhancing the ink affinity of the lithographic printing plate, if necessary. The replenisher may be added in the range of 0.01 to 10% by weight, but when an aqueous alkaline solution having a pH or a concentration of alkali metal silicate higher than that of the developer is used for the replenisher, the replenisher is often replenished to the developer. At this time, the diluting water is also supplied so that the pH and the concentration are close to those of the developing solution. Therefore, a surfactant or an organic solvent may be added to the diluting water. In addition, additives such as an antifoaming agent and a water softener may be added to the developer and the replenisher.

Next, the rinsing water (rinse liquid) of the rinsing section 4
Is water containing water or a surfactant. Also,
A liquid containing gum arabic and a starch derivative is used as the gum solution in the gum processing section 5.

Returning to FIG. 1, the development processing section according to claims 1 to 6 will be described. As a preparation before the start of operation of the PS plate processing apparatus, the above-mentioned replenisher and dilution water are supplied to the developer tank 30 of the development processor 3 from the replenisher tank 11 and the dilution water tank 12 at an appropriate ratio, respectively. Store to a predetermined concentration. A floating lid 39 is floated on the stored developer in order to reduce the contact area with air and prevent oxidative deterioration. The temperature of the developer stored in the developing tank 30 is adjusted to a predetermined temperature by a heater (not shown).
While being transported by the entrance transport roller 32 and the exit transport roller 38, the filter 13, the pump 14, the head chamber 15,
Shower pipe 3 at the end of branch pipe 16 via branch pipe 16
The developing solution whose temperature has been adjusted from 1 is ejected onto the image-exposed surface of the PS plate 10 and supplied to be developed. Then, the used developer is stored in the developing tank 30 again and circulated for use. P
The developer is supplied to the S plate 10 by spraying it through a shower pipe 31. In addition, you may make it apply and supply from a slit nozzle.

If the developing solution in the developing tank 30 is circulated and used, the developing performance of the developing solution is reduced due to the elution or oxidation of the photosensitive resin of the PS plate 10 or aluminum of the support. The replenisher is replenished according to the processed amount of the PS plate and the processing time in order to recover the pressure. If the developing performance of the developing solution cannot be recovered even by replenishing the replenishing solution, the developing solution in the developing section 3 is sent to the waste liquid processing tank 18 via the valve 17 to clean the developing section 3 and the developing section 3 is cleaned. After supplying the developing solution to the developing tank 30, the developing is restarted.

At this time, as a method for examining the developing performance of the developing solution, it is preferable to determine the developing performance according to the throughput of the PS plate. As for the detection of the processing amount of the PS plate, the processing amount may be detected from the size of the PS plate by the plate detecting means 2 provided near the entrance of the development processing unit 3. In addition, the linear expansion coefficient β = (dL / dt) is applied to a member such as the developing tank 30 and the entrance conveying roller 32 of the developing section 3 to which the sludge is easily fixed.
It is preferable to use a material having a large / L ₀ (where L is a length, t is a temperature, and L ₀ is a length of 0 ° C.). By heating a member made of a material having a large linear expansion coefficient β, the adhered sludge can be easily removed and removed.
Further, OH in the developer electrolytically part that stores a developing solution such as a developing tank 30 of the developing unit 3 ^- if to maintain suitable high pH Increase of sludge in that part Not only can the occurrence be reduced, but its high p
It is possible to suppress the generation of sludge at the portion where the H developer circulates.

When the PS plate 10 passes between the rotary brush 35 and the lower receiving guide 34, the rotary brush 35 slides on the surface of the image exposure, and the photosensitive resin dissolved in the developing solution is removed from the surface. It has been removed. Note that 36 in FIG.
Is the cover of the rotating brush. Further, since the developing solution is easily oxidized, a floating lid 39 is provided in the developing tank 30. However, in order to prevent the developing solution in the portion where the shower development is being performed, the developing solution is also shown in FIG. 3 (see also FIG. 1). As shown in ()), a blocking member 7 for blocking outside air is provided in the development processing section 3.
The blocking member 7 is a cover made of metal or resin, and the periphery of the cover is sealed with a rubber packing 71 or the like to prevent the developer from being oxidized by outside air. Further, in addition to preventing oxidation, the blocking member 7 also functions to prevent evaporation and prevent splashing of liquid during shower development. The moisture evaporated in the development processing unit 3 is condensed on the inner surface of the blocking member 7 and returns to the inside of the processing tank along the inclination of the inner surface to prevent concentration of the developer by evaporation.

FIG. 2 (FIG. 1)
When the PS plate 10 is inserted into the development processing unit from the PS plate development processing unit entrance 81, the PS plate 10
The plate 10 is supported by a guide member 9 along a substantially horizontal PS plate conveyance path A shown by a dashed line in FIG.
And moved to the next process from the PS plate development processing unit outlet 82.

While the PS plate is being conveyed by the entrance conveyance roller 32 and the exit conveyance roller 38, the developer is supplied from the shower pipe 31 toward the image-exposed surface of the PS plate, as described above. Developed. And
The image exposure surface of the PS plate is rubbed by the rotating brush 35, and the photosensitive resin dissolved in the developer is removed from the surface. An aperture roller 8 may be provided during the shower development. If the squeeze roller 8 is driven by the same drive shaft as the transport roller, it is not necessary to provide a new drive source. By providing the squeezing roller 8, the developer which has reacted with the photosensitive layer on the PS plate is wiped off once and a new liquid is supplied, whereby the reaction can be accelerated in a shorter time. The same effect can be obtained with the squeeze roller 8 by using a blade or air pressure. In addition, in order to promote the reaction between the photosensitive layer and the developer on the PS plate, it is necessary to increase the number of shower pipes, or to shake the PS plate to stir the developer on the plate. it can. In addition, the entrance conveyance roller 3
2. A bat 37 for immersing the lower part of the lower roller of each roller pair may be provided below the outlet conveying roller 38 and the squeezing roller 8. This is provided to prevent sludge from sticking to a transport roller or the like, and to always wet the roller to prevent sticking of the developer. The vat 37 contains a developer and dilution water, and the developer and dilution water can be circulated and used.

Here, another embodiment of the developing unit according to claims 4 to 6 will be described with reference to FIG. The developing section supplies the developing solution in an amount necessary for the development of the PS plate by a liquid immersion method and disposes of the developing solution. PS version 1
While the sheet P is conveyed by the entrance conveyance roller 32 and the exit conveyance roller 38, the PS plate conveyance path A is curved by the roller 33, immersed in a developing solution and developed, and then the rotating brush provided with the cover 36 is provided. When passing between the lower guide 35 and the lower receiving guide 34, the surface of the image exposure is slid by the rotating brush 35, and the photosensitive resin dissolved in the developer is removed from the surface. In addition, the developer is oxidized by the outside air by being sealed with a blocking member 7 that blocks the outside air. Although this configuration has the problem that the consumption of the developer tends to increase for good development, the development is always performed with a new solution, so that the development time is shortened and fixed, and the flow of the developer depends on the flow of the developer. Thus, the problem of sludge generation due to dissolved resin or oxidation of the developing solution can be solved, which is excellent in terms of stable developing performance and simplified maintenance such as cleaning of the apparatus. Also in this method, the supply amount of the developer necessary for the PS plate is adjusted to the size of the PS plate,
The determination can be made based on information such as the manufacturer and type, and the development can be performed with a relatively small consumption of the developer. The developed PS plate is transported to the rinsing section 4 by the exit transport roller 38.

Next, returning to FIG. 1, the water washing section according to claims 1 to 3 will be described. This washing section is not the embodiment of claims 4 to 6. The washing tank 40 of the washing section 4 is also washed with water (rinse liquid) before the operation of the developing machine is started.
Is supplied from a rinsing liquid supply means (not shown) and stored at a predetermined level. When the PS plate 10 passes through the rinsing section 4, the rinsing water passes through the pump 41 from the inlet opened at the bottom of the rinsing tank 40. The terminal returning to the processing tank 40 is circulated and used by a rinsing liquid circulation path provided with a shower pipe 42. That is, the washing water (rinse liquid) is supplied by being sprayed from the nozzle of the shower pipe 42 to the PS plate 10 fed by the transport roller 43 in the washing tank 40, and the developer and the developer adhering to the PS plate 10 are supplied. The photosensitive resin and the like dissolved in the water are washed off. The rinsing water is collected at the bottom of the rinsing tank 40 and is again supplied to the PS plate 10 from the nozzle of the shower pipe 42 through the rinsing liquid circulation path. The total area of the blow-out holes of the shower pipe is preferably set to be １ ／ to ３ of the cross-sectional area of the pipe. This washing water is also washed with a predetermined number of PS plates 10 and the washing ability is reduced by a developing solution or the like. If the washing ability is reduced, the washing water in the washing processing unit 4 is passed through the valve 44 without further development. The cleaning unit 4 is cleaned by dropping it to 45, and the development is restarted after the washing water is renewed. In the rinsing section 4, water containing water or a surfactant is used as rinsing water.

Next, a water washing section according to claims 4 to 6 will be described with reference to FIG. The rinsing section supplies rinsing water to a tank on the downstream side in the transport direction of the PS plate 10 in a two-stage multi-stage counter-current rinsing method, and overflows the tank on the upstream side to perform rinsing processing. The squeeze blade 47 is used for the washing tank 4.
For preventing backflow of the washing water provided on the upper part of the partition plate of No. 0, it is made of a flexible film such as a PET film. Below the squeeze blade 47, there is a squeeze blade receiving roller 48 also serving as a transport guide for a PS plate, which is a transport means. The bat 46 immerses the lower part of the lower roller of the transport roller 43. Further, the rinsing tank 40 is provided below the conveyance path for circulating and using the rinsing water, and a floating lid 401 is provided in the rinsing tank 40 to evaporate the liquid. A float switch (not shown) is provided to automatically supply when a drop in the liquid level is detected. As described above, by using the multi-stage countercurrent washing method, washing can be performed with a small amount of washing water, and the amount of waste liquid can be reduced. The tank for storing the final overflow liquid may be provided, for example, outside the processing apparatus (not shown).

Further, the washing section according to claims 4 to 6 will be described with reference to FIG. In this embodiment, a three-stage multi-stage countercurrent water washing system is used.
A, 40B, and 40C are provided, in which washing water is supplied to the washing tank 40A on the downstream side in the transport direction of the PS plate 10, and the washing is performed by sequentially overflowing the washing tanks 40B and 40C on the upstream side. . The washing tank is provided below the transport path A for circulating and using washing water. Also,
As the rinsing water (rinse liquid) of the rinsing section 4, water or water containing a surfactant or the like is used.

The washing tank 40A is the most downstream tank in the conveying direction of the PS plate 10, and fresh washing water is supplied to the washing tank 40A through the pipe 491. Further, the washing water is supplied from the bottom of the washing tank 40A through the pump 41 to the washing tank 40A.
A rinsing liquid circulation path having a shower pipe 42 at a terminal returning to the inside is circulated and used. Further, the washing water (rinse liquid) is jetted from the nozzle of the shower pipe 42 to the PS plate 10 fed by the transport roller 43 in the washing tank 40, and is dissolved in the developing solution and the developing solution attached to the PS plate 10. The photosensitive resin and the like are washed off. The overflowed liquid is supplied to the pipe 495.
Is sent to the next washing tank 40B on the upstream side in the transport direction of the PS plate 10. Next, in the rinsing tank 40B, the rinsing liquid circulation path is the same as that of the rinsing tank 40A.
Washing treatment tank 40C at the most upstream side in the transport direction of S plate 10
To be sent to

In the rinsing tank 40C, the rinsing liquid circulation path is the same as in the rinsing tank 40B, and the rinsing liquid is sprayed from the nozzle of the shower pipe 42 onto the PS plate 10. Further, the flush water whose overflowing washing ability has been reduced is collected in the waste rinsing liquid bottle 45 through the pipe 494. In the figure, the three-stage countercurrent washing system has been described, but three or more stages may be provided. As described above, by using the multi-stage countercurrent washing method, there is an advantage that washing can be performed with a small amount of washing water (rinse liquid) and the amount of waste liquid can be reduced.

Further, a water washing section according to claim 6 will be described with reference to FIG. The rinsing section is composed of a rinsing water receiving section for receiving the rinsing water after the lithographic printing plate is washed, and a rinsing water reservoir for storing the rinsing water from the rinsing water receiving section. I have. Further, in this embodiment, the three-stage countercurrent system shown in FIG. 5 is configured so as to be separated into a rinsing water receiving tray portion and a rinsing water liquid reservoir portion, but the present invention is not limited to this.
In FIG. 6, the flush water receiving pans are three flush water pans 49A, 4
9B and 49C, and the rinsing water reservoir is also composed of three rinsing water reservoirs 40A, 40B and 40C. First, the rinsing water receiving portion 40A will be described.
The dish is a dish for receiving the washing water sprayed on the S plate, and the washing water received by the dish is stored in a washing water reservoir 40A provided at a lower portion. The rinsing water reservoir is mechanically and functionally the same as the rinsing tank of FIG. 5, and thus the same reference numerals are used and a part of the description is omitted. Rinse water (rinse liquid) passes through the pump 41 from the bottom of the water rinsing tank 40A, and then flows into the water rinsing tank 40A.
The terminal returning to the inside is circulated and used by a rinse liquid circulation path provided with a shower pipe 42. Similarly, there are a rinsing water receiving portion 49B, a rinsing water reservoir 40B serving as a rinsing tank, a rinsing water receiving portion 49C, and a rinsing water reservoir 40C serving as a rinsing tank. As described above, the degree of freedom in arranging the mechanisms of the washing water receiving tray and the washing water reservoir is increased.

Next, returning to FIG. 1, the gum processing section 5 according to claims 1 to 6 will be described. In the gum solution tank 50, the gum solution is supplied in advance from a gum solution supply means (not shown) and stored at a predetermined level. When the PS plate 10 is fed by the transport roller 53 in the gum processing section 5, the gum solution passes through the pump 51 from the inlet opened at the bottom of the gum solution tank 50 and returns to the gum solution tank 50 through the gum solution circulation path. Is supplied to the PS plate 10 from the nozzle of the shower pipe 52 of the terminal. P
The S plate 10 is transported by the transport roller 53, during which the gum solution from the gum solution tank 50 is applied from both sides of the PS plate 10 through the shower pipe 52, and the PS plate is passed through the transfer roller 56 and the drying chamber 6 is dried. Transported to

Next, the drying chamber 6 according to the first to sixth aspects will be described.
The warped roller is used to reduce the area of the gummed PS plate in contact until it dries. Further, the discharge roller 63 is a Molton roller made of cloth. P
The S plate 10 passes through the transfer roller 56 and enters the drying chamber 6, and the PS plate 10 is sent by the conveying rollers 62 and 63. During that time, hot air from the air nozzle 61 hits the surface of the PS plate 10 to dry. Then, the dried PS plate is discharged out of the processing apparatus. In addition, drying may be performed by irradiating infrared rays in addition to the hot air, and although not shown, a stocker for stocking PS plates may be provided at the processing apparatus outlet.

[0032]

According to the above configuration, the following effects can be obtained. According to the first and second aspects of the present invention, the photosensitive lithographic printing plate is transported at a transport speed of 1000 mm / min or more and 8000 mm / min or less, and the developing step is transported substantially horizontally. Meanwhile, since the developer is supplied to the image-exposed surface of the photosensitive lithographic printing plate to perform development processing, the liquid on the back surface opposite to the image-exposed surface of the PS plate even when the transport speed of the PS plate is increased. PS is very little around
The amount of aluminum eluted from the plate is reduced, and the amount of sludge generated in the developer can be reduced. In addition, the life of the developer is extended.

According to the third aspect of the present invention, since the developing section is provided with the shut-off member for shutting off the outside air, the developing solution is prevented from being oxidized, and the life of the developing solution is prolonged. It is possible to prevent evaporation and splashing of the liquid when supplying the developer.

According to the fourth and fifth aspects of the present invention, the photosensitive lithographic printing plate is fed at a transport speed of at least 1,000 mm / min.
The photosensitive lithographic printing plate is transported at a speed of 0 mm / min or less, and the photosensitive lithographic printing plate is subjected to a developing process. After the developing process, washing water is supplied to a downstream tank in the transport direction of the photosensitive lithographic printing plate, and an upstream tank is sequentially provided. Since the washing process is performed in the washing process in which the washing water overflows, even if the conveying speed of the PS plate is increased, the carrier is over, and the sludge in the washing section increases, but by using a multi-stage countercurrent washing method, for example, By making the pH of the liquid in the washing tank different, the generation of sludge is concentrated at a predetermined location on the upstream side in the transport direction, the amount of sludge is reduced on the downstream side, and adhesion to the PS plate can be prevented. Further, since fresh water is supplied from the downstream side, it is possible to efficiently perform the washing process with a small amount of washing water, and the most fatigued washing water can be discharged from the most upstream side.

According to the sixth aspect of the present invention, the washing section receives the washing water after the washing processing of the photosensitive lithographic printing plate, and the washing water reservoir for storing the washing water from the receiving section. Since the washing water receiving section is separated from the washing water reservoir, the maintenance and inspection of the washing processing section is easy, and the degree of freedom of arrangement of the washing processing section mechanism is increased.

[Brief description of the drawings]

FIG. 1 is a cross-sectional front view showing an example of a photosensitive lithographic printing plate.

FIG. 2 is a front cross-sectional view illustrating a configuration of a development processing unit in FIG. 1;

3A is an enlarged configuration cross-sectional view illustrating a blocking member of the development processing unit of FIG. 1; FIG. 3B is a configuration side cross-sectional view illustrating a blocking member of the development processing unit;

FIG. 4 is a front sectional view showing the configuration of another water-washing processing unit according to the embodiment.

FIG. 5 is a front cross-sectional view illustrating the configuration of another water-washing processing unit according to the embodiment.

FIG. 6 is a front sectional view showing the configuration of another water-washing processing unit according to the embodiment.

FIG. 7 is a front cross-sectional view illustrating a configuration of another developing unit according to the embodiment.

[Explanation of symbols]

 Reference Signs List 3 developing processing section 4 washing processing section 7 blocking member 8 squeezing roller 10 PS plate 11 replenisher tank 30 developing tank 31 shower pipe 32 inlet transport roller 33 roller 34 under receiving guide 35 rotating brush 38 outlet transport roller 40 washing processing tank 40A, 40B, 40C Rinse treatment tank (rinse water reservoir) 81 PS plate development part entrance 82 PS plate development part exit A PS plate conveyance path

 ──────────────────────────────────────────────────続 き Continuing from the front page (72) Inventor Kazumi Tsukiwa 591-7 Kamihirose, Sayama City, Saitama Prefecture San Seiki Seisakusho Co., Ltd.

Claims (6)

[Claims] 1. A photosensitive lithographic printing plate is transported at a conveying speed of 1000 m.
The photosensitive lithographic printing plate is transported at a speed of not less than 8000 mm / minute and the photosensitive lithographic printing plate is transported substantially horizontally while a developing solution is supplied to the image-exposed surface of the photosensitive lithographic printing plate to perform development. A method for processing a photosensitive lithographic printing plate, comprising: 2. The photosensitive lithographic printing plate is transported at a speed of 1000 m.
a transporting means for transporting the photosensitive lithographic printing plate substantially horizontally by the transporting means, and a developing solution on the image-exposed surface of the photosensitive lithographic printing plate. A photosensitive lithographic printing plate processing apparatus, comprising: a developing section for supplying and developing the lithographic printing plate. 3. The photosensitive lithographic printing plate processing apparatus according to claim 2, wherein the developing unit includes a blocking member that blocks outside air. 4. The photosensitive lithographic printing plate is transported at a conveying speed of 1000 m.
The photosensitive lithographic printing plate is transported at a speed of not less than m / min and 8000 mm / min. Wherein the photosensitive lithographic printing plate is subjected to a washing treatment in a washing treatment step in which the washing water is sequentially overflowed into the tank. 5. The photosensitive lithographic printing plate is transported at a conveying speed of 1000 m.
conveying means for conveying the photosensitive lithographic printing plate at a speed of at least m / min and 8000 mm / min, a developing section for developing the photosensitive lithographic printing plate, and a tank downstream of the conveying direction of the photosensitive lithographic printing plate after the developing process. A photosensitive lithographic printing plate processing apparatus, comprising: a rinsing section that supplies rinsing water and causes the lithographic printing plate to be rinsed by sequentially overflowing the rinsing water into an upstream tank. 6. The rinsing section comprises a rinsing water receiving section for receiving rinsing water after the lithographic printing plate has been subjected to rinsing processing, and a rinsing water reservoir for storing rinsing water from the rinsing water receiving section. The photosensitive lithographic printing plate processing apparatus according to claim 5, wherein