JPH10177253A - Processing method and device for photosensitive planographic printing plate in automatic developing machine - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a processing method and device for a photosensitive planographic printing plate (PS plate) which can be stably developed, without the fluctuation of the activity of a developer by reducing the ratio of a replenishing liquid amount, in accordance with the stopping time of an automatic developing machine. SOLUTION: The processing device is composed of an insertion part A for inserting the PS plate, a developing part B, a dryer part E, a replenishment control part F for a daily compensatory liquid for compensating the fatigue of the developer, etc. A replenishing liquid amount H(ml) for compensating the decrease of the activity of the developer during the stopping time of the automatic developing machine is expressed by the replenishing liquid amount H(ml) = the stopping time (hr) of the automatic developing machine × a replenishing liquid amount A (ml/hr) per unit hour × a coefficient of fluctuation with respect to the stopping time C (reduced according to the stopping time of the automatic developing machine) and the coefficient of fluctuation C is employed to supply a replenishing liquid. The replenishing liquid is previously supplied with a memory 60 storing the kind of developer, the kind of PS plate, the coefficient of fluctuation C measured in each stopping time of the automatic developing machine and a data group on the replenishing liquid amount and a control mechanism 61, based on a large number of experiments.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of replenishing a developer and a developing method during the period when the operation of the automatic developing machine is stopped when the photosensitive lithographic printing plate is developed using an automatic developing machine. Related to the device.

[0002]

2. Description of the Related Art Conventionally, when a photosensitive lithographic printing plate (hereinafter simply referred to as a PS plate) is developed with a developing solution that is repeatedly used using an automatic developing machine, the activity of the developing solution due to the developing process is reduced. A method of compensating for the decrease in the activity of the developer due to the decrease and the aging (that is, the decrease in the activity due to absorption of carbon dioxide in the air) by adding a replenisher has been adopted.

Further, when the automatic developing machine is stopped (in a state where the power is not turned on), replenishment of the developing solution with the lapse of time is as follows.
A method of replenishing a fixed amount of replenisher per unit time, for example, the time required for stopping the automatic processor (hr) x the amount of replenisher per unit time (ml / hr), the amount of replenisher per unit time, A method of replenishing a product multiplied by a coefficient in consideration of temperature and room temperature has been performed.

[0004]

However, in these systems, it is difficult to keep the activity of the developer constant when the stop time is prolonged, and as a result, immediately after replenishment, the activity of the developer is reduced. There is a drawback that the developing process becomes unstable because the degree is much higher than the original level.

As a result of intensive studies, the present inventors have realized that there is a need for further improvement in the amount of the replenisher when the automatic developing machine is stopped, and have completed the present invention.

The present invention has been proposed in view of the above circumstances, and an object of the present invention is to provide a long-term processing of a PS plate with a developer repeatedly used by an automatic developing machine. Even when the automatic developing machine is stopped, there is no fluctuation in the activity of the developing solution, and a stable developing process is achieved.
An object of the present invention is to provide a processing method of an S plate in an automatic developing machine and a processing apparatus of the PS plate.

[0007]

SUMMARY OF THE INVENTION The above objects of the present invention are as follows.
This is achieved by the following configuration.

[0008] 1. An automatic compensator for compensating for a decrease in the activity of the developer from the stop of operation of the automatic developing machine for developing the photosensitive lithographic printing plate with the developer repeatedly used until the restart, by adding a replenisher for the developer. A method for processing a photosensitive lithographic printing plate in an automatic developing machine, wherein the ratio of the amount of replenisher is reduced according to the stop time of the automatic developing machine.

[0009] 2. 2. The method for processing a photosensitive lithographic printing plate in an automatic processor according to the above item 1, wherein a replenisher amount H represented by the following general formula (I) is replenished.

General formula (I) Replenisher amount H = T × A × CT T: Stopping time of automatic developing machine (hr) A: Replenisher amount per unit time (ml / hr) C: Coefficient of variation with respect to stop time (Reduced according to the stoppage time of the automatic processor) In a photosensitive lithographic printing plate processing apparatus in an automatic developing machine for automatically transporting a photosensitive lithographic printing plate, replenishing a replenisher and developing with a developer used repeatedly, the photosensitive lithographic printing plate is represented by the general formula (I). An apparatus for processing a photosensitive lithographic printing plate in an automatic developing machine, comprising means for replenishing with a replenishing solution amount.

The present invention is an improvement of a method and an apparatus for processing a PS plate in an automatic developing machine, in which the activity of a developing solution is reduced while the automatic developing machine is stopped (mainly due to absorption of carbon dioxide gas in the air). It is characterized in that the amount of replenisher for compensating for the decrease in the activity is corrected by a variation coefficient (C) which decreases in accordance with (almost in proportion to) the stop time of the automatic developing machine.

That is, in the method and apparatus for processing a PS plate used in the present invention, the amount of replenisher for compensating for the decrease in the activity of the developer during the downtime of the automatic developing machine is H (ml).
, The replenisher amount H (ml) = the stop time T (hr) of the automatic processor × the replenisher amount A per unit time (ml / h)
r) × variation coefficient C to the stop time (reduced according to the stop time of the automatic developing machine).

The coefficient of variation (C) is the conventional replenisher amount H
(Ml) = introduced in order to improve the drawbacks of the PS plate processing method based on the automatic developing machine stop time T (hr) x the amount of replenisher per unit time A (ml / hr)
By introducing the coefficient of variation and replenishing the replenisher, even if the automatic developing machine is stopped for a long time and then the development is restarted, the activity of the developer does not fluctuate and a stable developing process can be achieved. it can.

The present inventors use a specific processing device to
The above coefficient of variation (C) was determined by changing the type of the S plate, the type of the developing solution, the stop time of the processing apparatus, and the like, and repeating several other experiments. The variation coefficient (C) obtained as described above can take any value in the range of 0 <C ≦ 1.0.

The developer and replenisher used in the present invention are:
By contacting with air during storage, it has a property of absorbing carbon dioxide and reducing alkalinity, and has a property of decreasing activity. Preferably, the pH is 8.0 or more, and more preferably the pH is 12 or more. Things.

Next, specific configurations of the developer and the replenisher used in the present invention will be described below.

[Developer and Replenisher] A typical developer and replenisher used in the present invention is an alkaline solution containing water as a main solvent (50% by weight or more of the solvent of the developer is water). The composition of the developer and the replenisher can be a developer and a replenisher usually used for developing a PS plate having an o-quinonediazide compound or a diazo resin as a photosensitive component. It may contain an organic reducing agent, an organic solvent, a surfactant, an antifoaming agent, a water softener, an organic acid, and the like. Further, other known additives can be added to enhance the developability of the developer.

<Alkali Agent> Alkali metal silicate is mainly used as an alkali agent contained in the above-mentioned developer and replenisher, and specific examples thereof include sodium silicate, potassium silicate, lithium silicate and the like. It may be a combination, but is preferably potassium silicate.

The molar concentration of silicon dioxide [Si] with respect to the molar concentration of alkali metal [M] in the developing solution and the replenishing solution.
O ₂ ] ratio [SiO ₂ ] / [M] is preferably 0.15
To 1.0, more preferably 0.25 to 0.75.
The content ratio by weight of silicon dioxide to the total weight in the developer or replenisher is preferably 0.5 to 5.0% by weight, more preferably 1.0 to 4.0% by weight.

The molar concentration of silicon dioxide [SiO ₂ ] relative to the molar concentration of alkali metal [M] in the developer and replenisher.
Ratio, and when the content weight ratio of silicon dioxide to the total weight in the developer or replenisher is in the above range, the developer is less deteriorated in the process of repeatedly developing the PS plate using an automatic developing machine, Advantages such as less generation of insolubles in the developer and less clogging of spray nozzles.

In the developer and replenisher used in the present invention, other alkali agents can be used in addition to the above alkali metal silicates, if necessary.

Examples of such alkaline agents include potassium hydroxide, sodium hydroxide, lithium hydroxide, potassium tertiary phosphate, sodium tertiary phosphate, lithium tertiary phosphate, sodium dibasic phosphate, ammonium dibasic phosphate, and tertiary ammonium phosphate. Ammonium phosphate, sodium metasilicate, ammonium silicate,
Potassium bicarbonate, sodium bicarbonate, potassium carbonate, sodium carbonate, potassium borate, sodium borate, ammonium borate, inorganic alkaline agents such as aqueous ammonia, and monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine,
Triethylamine, monoisopropylamine, diisopropylamine, n-butylamine, monoethanolamine, diethanolamine, triethanolamine, monoisopropanolamine, diisopropanolamine,
Organic amine compounds such as ethyleneimine, ethylenediamine, pyridine and the like can be mentioned, and these can be used alone or in combination.

<Reducing Agent> The developing solution and replenisher used in the present invention may contain a water-soluble or alkali-soluble organic or inorganic reducing agent, if necessary. Examples of the water-soluble or alkali-soluble organic or inorganic reducing agent include, for example, phenol compounds such as hydroquinone, metol and methoxyquinone, phenylenediamine, amine compounds such as phenolhydrazine, sodium sulfite,
Sulfites such as potassium sulfite, ammonium sulfite, potassium bisulfite, sodium bisulfite, sodium phosphite, potassium phosphite, sodium hydrogen phosphite, potassium hydrogen phosphite, sodium dihydrogen phosphite, potassium dihydrogen phosphite, phosphorous acid Examples thereof include phosphites such as disodium hydrogen and dipotassium hydrogen phosphite, sodium thiosulfate, potassium thiosulfate, sodium dithionite, potassium dithionite, and hydrazine. Here, the content ratio of the water-soluble or alkali-soluble organic or inorganic reducing agent with respect to the total weight of the developer is 0.01 to 10% by weight.
Is preferred.

<Organic Solvent> The developing solution and replenisher used in the present invention may contain an organic solvent, if necessary. Examples of the organic solvent include glycols such as ethylene glycol, diethylene glycol, triethylene glycol, and propylene glycol;
Glycol ethers such as ethylene glycol monobutyl ether, ethylene glycol benzyl ether, ethylene glycol monophenyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, 1-phenylethanol, 2-phenylethanol, and 3-phenyl Propanol, 1,4-phenylbutanol, 2,2-diphenylbutanol, 1,2-phenoxyethanol, 2-benzyloxyethanol,
o-methoxybenzyl alcohol, m-methoxybenzyl alcohol, p-methoxybenzyl alcohol, benzyl alcohol, cyclohexanol, 2-methylcyclohexanol, 3-methylcyclohexanol, 4-
Alcohols such as methylcyclohexanol, n-amyl alcohol and methyl amyl alcohol, such as ethyl acetate, propyl acetate, butyl acetate, benzyl acetate, ethylene glycol monobutyl acetate, methyl lactate, ethyl lactate, butyl lactate and butyl levulinate Esters, methyl ethyl ketone, ethyl butyl ketone, methyl isobutyl ketone, ketones such as cyclohexanone, alkyl-substituted aromatic hydrocarbons such as xylene and ethylbenzene, halogenated hydrocarbons such as methylene dichloride, ethylene dichloride, monochlorobenzene, etc. Is mentioned.

<Surfactant> The developer and replenisher used in the present invention may contain a surfactant, if necessary. Preferred examples of the surfactant include an anionic surfactant, a nonionic surfactant, a cationic surfactant, and an amphoteric surfactant.

Examples of the anionic surfactant include alkyl benzene sulfonates such as sodium dodecyl benzene sulfonate (preferably alkyl is C _8).
-C ₁₈₎ and sodium isopropyl naphthalene sulfonate, alkyl naphthalene sulfonate salts (preferably alkyl, such as di-naphthalene disulfonic acid is C ₃ -C
₁₀ ), sodium salt of metanitrobenzenesulfonic acid,
Formalin condensate of naphthalene sulfonate, sodium salt of lauryl alcohol sulfate, sodium salt of octyl alcohol sulfate, sulfuric ester salts of higher alcohols such as ammonium salt of lauryl alcohol sulfate (C ₆ ~C _22), fatty alcohol phosphate esters Sulfonates of dibasic fatty acid (C ₂ -C ₁₈ ) esters such as salts (eg, sodium salt of cetyl alcohol phosphate ester), dioctyl sodium sulfosuccinate, dihexyl sodium sulfosuccinate, alkyl (C ₁₁ -C ₁₇₎ ) Amidosulfonic acid salts (eg, C ₁₇ H ₃₃ CON (CH ₃ ) CH ₂ SO
₃ Na), or such as those described in Japanese Patent Application No. Hei 8-80059 specification can be mentioned.

Examples of the nonionic surfactant include, for example, JP-A-59-84241 and JP-A-62-168160.
No. 62-175758 and Japanese Patent Application No. Hei 6-175758.
190163 and 8-80059.

Further, as the above-mentioned cationic surfactant, JP-A-62-175557 and Japanese Patent Application No. 6-1901.
No. 63 can be mentioned.

Examples of the amphoteric surfactant include imidazoline derivatives such as N-alkyl-N, N, N-tris (carboxymethyl) ammonium (alkyl: C ₁₂ -C ₁₈ ), and N-alkyl-N -Carboxymethyl-
N, N-dihydroxyethylammonium (alkyl:
Betaine type compounds such as C ₁₂ -C ₁₈ ), alkylaminocarboxylic acid type compounds, and Japanese Patent Publication No.
And the like.

The above-mentioned anionic surfactant, nonionic surfactant, cationic surfactant, amphoteric surfactant and the like can be used alone or in combination of two or more kinds. The content is preferably in the range of 0.003 to 5% by weight, more preferably 0.1 to 3% by weight, based on the weight.

<Antifoaming Agent> The developing solution and the replenisher used in the present invention may further contain an antifoaming agent. Suitable defoamers include US Patent 3,250,72.
7, 3,545,970, British Patent 1,382,
No. 901 and 1,387,713. Of these, organic silane compounds are preferred.

<Hard water softener> The developer and replenisher used in the present invention may contain a water softener (chelating agent). For example, Na ₂ P ₂ O ₇ , Na ₃ P ₃
O ₃ , Na ₃ P ₃ O ₉ , Na ₂ O ₄ P (NaO ₃ P) PO ₃ Na
₂ , polyphosphates such as calgon (polysodium metaphosphate), ethylenediaminetetraacetic acid and its potassium salt,
Sodium salt, diethylenetriaminepentaacetic acid and its potassium salt, its sodium salt, triethylenetetraminehexaacetic acid and its potassium salt, its sodium salt, hydroxyethylethylenediaminetriacetic acid and its potassium salt, its sodium salt, nitrilotriacetic acid and its potassium salt , Its sodium salt, 1,2-diaminocyclohexanetetraacetic acid and its potassium salt, its sodium salt, 1,3-diamino-2-propanoltetraacetic acid and its potassium salt, aminopolycarboxylic acid salts such as its sodium salt, Examples thereof include organic sulfonates such as ethylenediaminetetra (methylenephosphonic acid) and its potassium salt and its sodium salt. The optimum amount of such a water softener varies depending on the hardness of the hard water used and the amount of the water used, but a general amount of the water softener is preferably 0.1% in the developer or replenisher at the time of use. 01 to 5% by weight, more preferably 0.01 to 1%
It is contained within the range of weight%.

<Organic acid> The developer and the replenisher used in the present invention may contain an organic acid. The organic acid includes an aliphatic carboxylic acid having 6 to 20 carbon atoms and an aromatic carboxylic acid having a benzene ring or a naphthalene ring substituted with a carboxyl group. The aliphatic carboxylic acid is preferably an alkanoic acid having 6 to 20 carbon atoms, and specific examples thereof include caproic acid, enantiic acid, palmitic acid, and stearic acid, and particularly preferably C _n H _{2n + 1} COOH (n : 6 to 12). The aliphatic carboxylic acid may be an unsaturated fatty acid or a fatty acid having a branched carbon chain, and examples thereof include malic acid, citric acid, malonic acid, tartaric acid, maleic acid, fumaric acid, oxalic acid, and lactic acid.

The aliphatic carboxylic acid may be used as a sodium salt, a potassium salt or an ammonium salt.

Specific examples of the aromatic carboxylic acid include benzoic acid, o-chlorobenzoic acid, p-chlorobenzoic acid, o-hydroxybenzoic acid, p-hydroxybenzoic acid, and p-tert-butylbenzoic acid. O-aminobenzoic acid, p-aminobenzoic acid, 2,3-dihydroxybenzoic acid, 2,4-dihydroxybenzoic acid, 2,5-dihydroxybenzoic acid, 2,6-dihydroxybenzoic acid, 3,
5-dihydroxybenzoic acid, gallic acid, 1-hydroxy-2-naphthoic acid, 3-hydroxy-2-naphthoic acid,
2-hydroxy-1-naphthoic acid, 1-naphthoic acid, 2
-Naphthoic acid and the like.

The aromatic carboxylic acid may be used as a sodium salt, a potassium salt or an ammonium salt.

The content of the above-mentioned aliphatic carboxylic acid and aromatic carboxylic acid can be preferably 0.1 to 30% by weight in the developer and replenisher at the time of use.

The following additives can be added to the developing solution and the replenishing solution to enhance the developing performance.
As an example, the N-type described in JP-A-58-75152 can be used.
neutral salts such as aCl, KCl, KBr, etc .;
Complexes such as [Co (NH ₃ )] ₆ Cl ₃ described in JP-A-1336, and amphoteric polymer electrolytes such as copolymers of vinylbenzyltrimethylammonium chloride and sodium acrylate described in JP-A-56-142528. And inorganic lithium compounds such as lithium chloride described in JP-A-58-59444; organic lithium compounds such as lithium benzoate described in JP-B-50-34442;
Organic metal surfactants containing Si, Ti and the like described in JP-A-9-75255 and organic boron compounds described in JP-A-59-84241 are exemplified. Further, other known additives can be added to the developer and the replenisher.

The replenisher used in the present invention may be divided into two or more solutions and added to the developer, or the two or more solutions may be mixed in advance and added to the developer. For example, a replenisher may be used as a concentrate, and when replenishing the developer, a replenisher previously diluted with water may be added. Further, the pH of the replenisher is preferably equal to or higher than the developer, and 0.5
More preferably, it is higher.

[PS plate] As the PS plate applied to the processing method of the present invention, any of the well-known positive PS plate, negative PS plate and negative PS plate for computer (CTP) are useful. For example, as a positive PS plate, Japanese Patent Application No.
No. 15499, No. 6-190163, No. 6-3338
Nos. 05, 7-2218986 and 7-3376
The PS plate described in the specification of JP-A No. 87 is preferable.
Further, as a negative PS plate, JP-A-2-220062,
Nos. 2-219060, 2-217859, 2-
189544, JP-A-64-56442, 62-
The PS plates described in JP-A-78544, JP-B-3-56622, JP-A-4-176228, JP-A-6-331313, and JP-A-7-221986 are preferred.

The above CTP is described in Japanese Patent Application No.
Those described in JP-A-231444 and JP-A-3-87833 are particularly preferably used.

[Processing Method] As the processing method of the PS plate using the automatic developing machine of the present invention, there is a processing method which can perform processing exclusively for the positive PS plate or common processing of the positive PS plate and the negative PS plate. It is preferred that

In the above-described processing method, the insertion section A for inserting the PS plate subjected to image exposure, the development section B for development, the rinsing section C for washing and washing, the gum processing section D for gumming, and the drying section for drying. The printing plate is formed by being conveyed through steps such as E.

Here, the developing method of the developing section B may be any of the known developing methods, for example, Japanese Patent Application Laid-Open Nos. 57-64237 and 6-23604.
1, immersion development system described in
A developing method such as a shower developing method described in Japanese Patent Application Laid-Open No. 95349 and a slit developing method described in Japanese Patent Application Laid-Open No. 62-288845 can be used, and any of them may be used.

Further, the rinsing part C is formed by developing P
This is a step of removing and cleaning the developing solution component and the photosensitive layer eluting component adhered to the S plate, and a plurality of rinsing liquid tanks may be provided to perform a plurality of rinsing treatments.

Further, the gum processing section D is provided with the developed PS
The alkaline developer component adhering to the plate is removed, and the P
This is a step of performing gumming to increase the hydrophilicity of the S plate and protect the plate surface by forming a film that prevents scratches and stains. The gum solution includes, for example, starch, gelatin, carboxymethylcellulose, a water-soluble resin, and the like. Water-soluble polymer compound, water, and, if necessary, a surfactant, an acid, a water-soluble salt, a lipophilic substance, a wetting agent, an organic solvent, an antiseptic, a fungicide, and the like.

[Processing Apparatus] The processing apparatus of the present invention will be described below.

The processing apparatus for processing a PS plate using the automatic developing machine of the present invention includes an insertion section A for inserting a PS plate, a development section B for development, a rinsing section C for washing and washing, and a gum for gumming. Processing section D, drying section E for drying, other developer,
An automatic developing machine having a circulating device for a processing liquid such as a rinsing liquid and a gumming liquid, and a replenisher supplied to the developing section B of the automatic developing machine, a replenishing liquid amount H (ml) = a stop time T (hr) of the automatic developing machine. ) ×
There is provided a means for controlling and replenishing so as to satisfy a replenishing solution amount per unit time A (ml / hr) × a coefficient of variation C to stop time (0 <C ≦ 1.0).

As means for replenishing the replenisher, for example, a coefficient of variation C is experimentally determined for each type of developing machine, type of PS plate, and type of developer, and a replenisher amount H (ml ) Is written into the memory, and the replenisher is supplied to the developing section B based on the data.

An example of a processing apparatus for processing a PS plate using the automatic developing machine of the present invention will be described below with reference to FIG.

FIG. 1 is a schematic sectional view of an automatic developing machine processing apparatus of the immersion developing system. In this processing apparatus, an insertion section A for inserting a PS plate, a developing section B for developing, a rinsing section C for washing, Gum processing section D for gumming, drying section E for drying
The day-to-day replenishment control unit F for compensating for the fatigue of the developer which occurs during the time when the automatic developing machine is stopped is provided in the automatic developing machine including the above-mentioned.

The insertion section A includes an insertion table 1 for guiding the insertion of the PS plate, an optical sensor 2 for detecting the PS plate by reflected light, and nip conveying rollers 3A and 3B for nipping and conveying the PS plate. Developing section B transports the PS plate to nip transport rollers 3
A, 3B, and the transport roller 4 are configured to transport the developer in a curved manner in the developer tank 5 while spraying the developer onto the photosensitive layer surface of the PS plate during immersion development in the developer tank 5. Processing liquid discharge nozzles 6A and 6B to be processed, and the processing liquid ejection nozzle 6
A, a magnet pump 7 for feeding the developer to 6B, a brush roller 8 for rubbing the surface of the PS plate to promote development, a plate holding roller 9 for supporting the PS plate, and for maintaining the temperature of the developer within a predetermined temperature range. Heater 10, a concentrated developing replenisher tank 14 for storing the concentrated developing replenisher, a bellows pump 12 for feeding the concentrated developing replenisher to the developing tank 5, a dilution water tank 15 for storing the diluting water, and a bellows for feeding the diluting water to the developing tank 5. A pump 13, a bellows pump 11 for returning the developing solution overflowing from the developing tank 5 to the developing tank 5, a developing waste liquid tank 18,
It mainly comprises control means 50 for controlling the amount of replenisher in accordance with the development processing of the PS plate.

The rinsing section C includes a washing tank 2 for holding washing water.
0, magnet pump 21, processing liquid discharge nozzle 6A, 6
B and nip transport rollers 3A and 3B. The gum processing section D includes a gum solution tank 3 for containing a gum solution.
0, magnet pump 31, processing liquid discharge nozzle 6A, 6
B, nip transport rollers 3A, 3B, concentrated gum replenisher tank 16, bellows pump 33 for sending the concentrated gum replenisher to gum solution tank 30, dilution water tank 17, and diluent water in gum solution tank 3.
The bellows pump 32 for feeding to zero is mainly constituted by a replenishing circuit (not shown) for replenishing according to the processing of the PS plate. In the figure, * 1 and * 1, and * 2 and * 2 are connected by piping.

In the same figure, the concentrated gum replenisher and the dilution water are separately sent to the gum solution tank 30 and mixed in the gum solution tank 30 to form a gum replenisher. It is also possible to provide a gum replenisher by mixing a concentrated gum replenisher and dilution water in the tank in advance, and to send this gum replenisher to the gum solution tank 30.

The drying section E includes drying air discharge nozzles 40A,
0B and nip transport rollers 3A and 3B.

A large number of optical sensors 2 provided at the insertion portion A of the automatic developing machine are arranged at equal intervals over the width direction of the automatic developing machine. The reflected light from the surface of the PS plate inserted into the developing section B is detected, the detection signal is integrated by the control means 50, and the required replenishment amount is proportional to the integrated area based on the obtained integrated signal. Pump 1 so that
It is configured to control the operations of 2, 13, 32, and 33.

The concentrated replenisher tank 14 for supplying the concentrated replenisher in the daily replenisher controller F of the automatic developing machine, the bellows pump 12 for feeding the concentrated replenisher to the developing tank 5, and the diluting water. The dilution water tank 15 and the bellows pump 13 for sending the dilution water to the developing tank 5 are usually provided with the concentrated developing replenisher tank 1 controlled by the replenisher control means 50 for compensating the fatigue of the developing solution during the development.
4, the bellows pump 12, the dilution water tank 15,
And the bellows pump 13, but may have another configuration if necessary.

The replenishment of the replenisher during the stoppage time of the automatic developing machine is performed based on a number of experiments in advance, based on the type of developer and PS.
This is performed via the memory 60 and the control mechanism 61 which store a data group of the coefficient of variation C and the amount of replenisher measured at each time when the type of plate and the automatic developing machine are stopped. That is, the control unit 61 controls the bellows pump 12 and the bellows pump 13 of the dilution water tank 15 for storing the dilution water based on the program signal from the memory 60 with the variation coefficient C and the replenisher amount corresponding to the stop time of the automatic developing machine. Then, an appropriate amount of replenisher is added without excess or shortage.

Hereinafter, another example of a processing apparatus for processing a PS plate using the automatic developing machine of the present invention will be described with reference to FIG.

FIG. 2 is a schematic sectional view of a processing apparatus of an automatic developing machine of the shower developing system.
, A PS plate 71 is inserted with the photosensitive layer face up from the left end in the drawing, and a developing section B ′ for developing processing, a rinsing section C ′ for washing and washing, and a gum processing section D ′ for gumming are transported by a pair of conveying rollers 75. While being conveyed horizontally to the right along the conveyance path P by conveyance means such as conveyance rollers 76, a developing solution or other processing liquid is applied to the photosensitive layer and processed.

In the developing section B ', the developing solution in the developing solution tank 78 is sent to the nozzle pipe 81a by the pump 79a, and is jetted from the nozzle pipe 81a to be applied to the photosensitive layer of the PS plate 71. The photosensitive layer to which the developer has been applied is a rotating brush 8
The developer is rubbed with 2a and eluted and developed, squeegeeed by a squeegee roller 83a, and sent to a rinsing section C '.

The developing section B ′ is located below the transport path P in the developing tank 8.
And a developing tank 84 sprayed from the nozzle pipe 81a.
The developer flowing down into the tank returns to the developer tank 78 and is circulated and used. In order to recover the fatigue of the developer used in circulation, the developer in the developer tank 78 is replenished by sending the concentrated developer replenisher in the concentrated developer replenisher tank 86 to the developer tank 84 by the pump 79b. It has become. Further, the developing solution in the developing solution tank 78 which has reached the limit of fatigue due to circulating use is discharged to a waste liquid tank 89.
The valve 90 can be opened to discharge.

In the developing section B 'as described above, a squeegee roller 83a, which is a roller at the rear of the developing section, has a peripheral surface of the squeegee roller 83a pumping a developing start liquid in a developing start tank 87 into a pump 79.
The diluting water in the diluting water tank 88 is supplied from the nozzle pipe 81c by the pump 79d, and the diluting water is supplied from the nozzle pipe 81c by the pump 79d.

In the PS plate 71 squeezed by the squeegee roller 83a washed with the developing solution and the dilution water, the rinsing liquid (including the rinsing liquid) in the rinsing liquid tank 91 is pumped by the pump 79e in the rinsing section C '. Nozzle pipe 81d
After being rubbed by the brush roller 82b, squeegeeed by the squeegee roller 83b, and transported to the gumming unit D ', which is the next processing step. The rinsing liquid injected from the nozzle pipe 81d and flowing down into the rinsing tank 92 returns to the rinsing liquid tank 91 and is used for circulation.

In the gum pulling section D ', the gum solution in the gum solution tank 93 is sent by the pump 79f to the nozzle pipe 81e.
After being applied to the upper surface of the PS plate 71 being conveyed from
The squeegee roller 83c squeegees and carries it out of the automatic developing machine. The gum solution sprayed from the nozzle pipe 81e and flowing down into the gumming tank 94 is returned to the gum solution tank 93 and used for circulation.

In the case of the automatic developing machine of FIG. 2 as well, while the development is in progress, the replenisher of the developing solution is replenished under the control of a control mechanism similar to the control means 50 of the automatic developing machine of FIG.

Further, the automatic developing machine is provided with a control section F 'for controlling the replenishment of the replenisher for compensating the fatigue of the developer which occurs during the stoppage time of the automatic developing machine. A concentrated developing replenisher tank 86 for storing a concentrated developing replenisher for replenishing a replenishing solution under the control of the control unit F ', and a bellows pump 79 for sending a concentrated developing replenisher to a developing tank 84
b, a diluting water tank 88 for storing the diluting water, and a bellows pump 79d for feeding the diluting water to the injection nozzle 81c are usually a replenisher concentrated developing replenishing tank 86 and a bellows pump 79b for compensating for the fatigue of the developing solution during the development. , The dilution water tank 88, and the bellows pump 79d, but may have another configuration if necessary.

The replenishment of the daily replenisher during the stoppage time of the above-mentioned automatic developing machine is carried out based on a number of experiments in advance, as in the case of the automatic developing machine shown in FIG. This is performed via the memory 100 and the control mechanism 101 which store a data group of the variation coefficient C and the amount of the replenisher measured in accordance with the time when the automatic developing machine has been stopped. That is, the bellows pump 79b for sending the concentrated developing replenisher to the developing tank 84 and the bellows for sending the diluting water to the injection nozzle 81c in accordance with the control signal from the memory 100 with the variation coefficient C and the replenishing amount corresponding to the stop time of the automatic developing machine. The pump 79d is controlled to replenish an appropriate amount of replenisher without excess or deficiency.

[0069]

EXAMPLES The present invention will be described below in more detail with reference to examples, but embodiments of the present invention are not limited thereto.

[Preparation of Positive Printing Plate (Samples 1 to 4)] <Preparation of Support A> A 0.3 mm-thick aluminum plate (material 1050, tempered H16) was kept at 85 ° C.
It was immersed in a 0% aqueous sodium hydroxide solution, degreased for 1 minute, and then washed with water. The degreased aluminum plate was immersed in a 10% sulfuric acid aqueous solution maintained at 25 ° C. for 1 minute, subjected to desmut treatment, and washed with water. The aluminum plate was then placed in a 2.0% aqueous nitric acid solution at a temperature of 3%.
The surface was roughened at 0 ° C. and a current density of 80 A / dm ² for 30 seconds. Then, it was immersed in a 1% aqueous solution of sodium hydroxide maintained at 70 ° C. for 10 seconds and washed with water. Then 25
It was immersed in a 10% aqueous sulfuric acid solution kept at 10 ° C. for 10 seconds and then washed with water. Then, in a 30% aqueous sulfuric acid solution, at a temperature of 35 ° C.
Anodizing treatment was performed for 1 minute under the condition of a current density of 3 A / dm ² , followed by washing with water. Then, after immersing in a 0.1% polyvinyl phosphonic acid aqueous solution maintained at 80 ° C. for 30 seconds, 8
After drying at 0 ° C. for 5 minutes, an aluminum support was obtained.

On the back surface of the aluminum support thus treated, a JIS No. 3 sodium silicate aqueous solution (10 g /
l) was applied and dried at 80 ° C. for 3 minutes to prepare an aluminum support A having a coating layer on the back surface. The coating layer was applied so as to have a dry weight of 10 mg / m ² to obtain a support A.

<Preparation of Support B> A support B was prepared in the same manner except that an aqueous carboxymethyl cellulose solution was used in place of the aqueous polyvinyl phosphonic acid solution of the support A.

Next, the photosensitive composition coating solutions 1 to 4 having the following four compositions were applied to the surface of the aluminum support A or B, dried at 80 ° C. for 2 minutes, and combined with the combinations shown in Table 1. Various positive PS plates (samples 1 to 4) were obtained. At this time, the dry weight after application of the photosensitive composition was 2.0 g / m ^2.
Met.

<Preparation of Photosensitive Composition 1> Polymer Compound 1 having the following structure 0.20 g hydroxypropyl-β-cyclodextrin 0.20 g novolak resin (the molar ratio of phenol / m-cresol / p-cresol is 10 / 6.70 g Condensation product of pyrogallol acetone resin (Mw: 3000) and o-naphthoquinonediazide-5-sulfonyl chloride (esterification ratio 30%) 1.50 g Polyethylene glycol # 2000 0.20 g Victoria Pure blue BOH (manufactured by Hodogaya Chemical Co., Ltd.) 0.09 g 2,4-bis (trichloromethyl) -6- (p-methoxystyryl) -S-triazine 0.15 g Fluorinated surfactant FC-430 (Sumitomo) 3M Co., Ltd.) 0.05 g cis-1,2 cyclohexanedica Rubonic acid 0.20 g Methyl ethyl ketone / propylene glycol monomethyl ether = 3/7 100 ml

[0075]

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<Preparation of Photosensitive Composition 2> Polymer Compound 2 having the following structure 0.50 g Novolak resin (the molar ratio of phenol / m-cresol / p-cresol is 10/54/36 and Mw is 3500) 50 g Condensation product of pyrogallol acetone resin (Mw: 2000) and o-naphthoquinonediazide-5-sulfonyl chloride (esterification rate: 30%) 1.70 g Polyethylene glycol # 2000 0.20 g Victoria Pure Blue BOH (Hodogaya Chemical Co., Ltd.) 0.08 g 2,4-bis (trichloromethyl) -6- (p-methoxystyryl) -S-triazine 0.15 g FC-430 (Sumitomo 3M) 0.03 g cis-1,2 Cyclohexanedicarboxylic acid 0.15 g methyl cellosolve / ethyl cellosolve = 3/7 100 m

[0077]

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<Preparation of Photosensitive Composition 3> 6.50 g of the above polymer compound 2 novolak resin (the molar ratio of phenol / m-cresol / p-cresol is 5/57/38 and Mw is 4000) 1.20 g pyrogallol 1.40 g of a condensate of acetone resin (Mw: 2000) and o-naphthoquinonediazide-5-sulfonyl chloride (esterification rate: 30%) Condensation resin of p-cresol and formaldehyde (Mw: 1500) and o-naphthoquinonediazide-4 -Condensate of sulfonyl chloride (esterification ratio 40%) 0.30 g polyethylene glycol # 2000 0.20 g Victoria Pure Blue BOH (manufactured by Hodogaya Chemical Co., Ltd.) 0.06 g ethyl violet 0.02 g 2,4-bis ( Trichloromethyl) -6- (p-methoxystyryl)- S-triazine 0.15 g FC-430 (manufactured by Sumitomo 3M Co., Ltd.) 0.03 g cis-1,2 cyclohexanedicarboxylic acid 0.20 g methylcellosolve / ethylcellosolve = 3/7 100 ml <Preparation of photosensitive composition 4 M-cresol-formaldehyde novolak resin (Mw: 1700) 0.30 g cresol-formaldehyde novolak resin (m-cresol / p-cresol molar ratio is 60/40, Mw: 3000) 1.10 g pyrogallol acetone resin and o- Condensate of naphthoquinonediazide-5-sulfonyl chloride (described in the examples of U.S. Pat. No. 3,635,709) 0.45 g Tetrahydrophthalic anhydride 0.10 g Benzoic acid 0.02 g Oil blue # 603 (Orient Chemical Industry Co., Ltd.) ) 0.04 g 4- [p-N- (p-hydroxybenzoyl) aminophenyl] -2,6-bis (trichloromethyl) -S-triazine 0.02 g Megafac F177 (Dainippon Ink & Chemicals, Inc.) 0.02 g Methyl ethyl ketone 15.0 g Propylene glycol monomethyl ether 10.0 g [Preparation of negative PS plate (samples 5 and 6)] <Preparation of support C> A 0.30 mm thick 1S aluminum plate was prepared. Degreased with a 1% aqueous sodium hydroxide solution, and this was immersed in a 11.5 g / l hydrochloric acid bath at a bath temperature of 25 ° C. and 80 A / d.
performed for 15 seconds electropolishing at a current density of m ^2, washed with water after 30
Anodization was performed in a 30% sulfuric acid bath at 30 ° C. and 11.5 A / dm ² for 15 seconds. Next, it is immersed in a 1% sodium metasilicate aqueous solution at 85 ° C. for 30 seconds, washed with water and dried to obtain a negative P
An S-plate support C was obtained.

Next, the two types of photosensitive composition coating solutions 5 and 6 obtained by the following preparation methods were applied to the surface of the aluminum support C and dried at 85 ° C. for 3 minutes. Thus, two types of negative PS plates (samples 5 and 6) were obtained. The dry weight of the photosensitive composition after application was 1.
It was 6 g / m ² .

<Synthesis of diazo compound-1> 14.5 g (50 mmol) of p-diazodiphenylamine sulfate was dissolved in 40.9 g of concentrated sulfuric acid under ice-cooling. 1.5 g (50 mmol) of paraformaldehyde was slowly added dropwise to the reaction solution. At this time, the reaction was carefully added so that the reaction temperature did not exceed 10 ° C., and then stirring was continued under ice cooling for 2 hours.

The reaction mixture was added dropwise to 500 ml of ethanol under ice-cooling, and the resulting precipitate was filtered, washed with ethanol, and then dissolved in 100 ml of pure water. A cold concentrated aqueous solution in which 8 g of zinc chloride was dissolved was added. The resulting precipitate was filtered, washed with ethanol, and dissolved in 150 ml of pure water.

A cold concentrated aqueous solution in which 8 g of ammonium hexafluorophosphate was dissolved was added to the obtained solution, and the resulting precipitate was collected by filtration, washed with water, and dried at 30 ° C. for one day to obtain diazo compound-1. .

When the molecular weight of this diazo compound-1 was measured by GPC (gel permeation chromatography), it was found that about 50 mol% of pentamer or more was contained.

<Synthesis of diazo compound-2> 3.5 g (0.025 mol) of p-hydroxybenzoic acid and 2.20 g (0.025 mol) of 4-diazodiphenylamine sulfate
Was dissolved in 90 g of concentrated sulfuric acid under ice cooling. After this reaction, 2.7 g of paraformaldehyde (0.09 mol) was slowly added. At this time, the reaction was carefully added so that the reaction temperature did not exceed 10 ° C. Thereafter, stirring was continued for 2 hours under ice-cooling, and the obtained reaction mixture was poured into 1 liter of ethanol under ice-cooling. The resulting precipitate was filtered, washed with ethanol, and dissolved in 200 ml of pure water. did.

A cold concentrated aqueous solution in which 10.5 g of zinc chloride was dissolved was added to this solution, and the resulting precipitate was filtered, washed with ethanol, and dissolved in 300 ml of pure water. Next, a cold concentrated aqueous solution in which 13.7 g of ammonium hexafluorophosphate was dissolved was added to this solution, the resulting precipitate was separated by filtration, washed with water, and dried at 30 ° C. for 24 hours to obtain diazo compound-2.

The molecular weight of the diazo compound-2 measured by GPC was about 2,000 in weight average molecular weight.

<Synthesis of Lipophilic Polymer Compound-1>
(4-hydroxyphenyl) methacrylamide 10.0
g, acrylonitrile 25 g, ethyl acrylate 60
g, 5 g of methacrylic acid and 2.0 g of azobisisobutyronitrile in a 1: 1 mixed solution of acetone-methanol 120
After dissolving in nitrogen and purging with nitrogen, the mixture was heated at 60 ° C. for 8 hours.

After completion of the reaction, the reaction solution was poured into 5 l of water with stirring, and the resulting white precipitate was collected by filtration and dried to obtain 90 g of polymer compound-1.

The molecular weight of this lipophilic polymer compound-1 was measured by GPC and found to be 630.
00.

<Preparation of Photosensitive Composition 5> Lipophilic polymer compound-1 5.0 g Diazo compound-1 0.5 g Julimer AC-10L (manufactured by Nippon Pure Chemical Co., Ltd.) 0.3 g Victoria Pure Blue BOH (Manufactured by Hodogaya Chemical Co., Ltd.) 0.2 g Surfactant (Reodol MO-60) 0.1 g Resin P having the following structure 0.05 g Methyl cellosolve 70 ml

[0091]

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<Preparation of Photosensitive Composition 6> Lipophilic polymer compound-1 5.0 g Diazo compound-2 0.5 g Julimer AC-10L (manufactured by Nippon Pure Chemical Co., Ltd.) 0.3 g Victoria Pure Blue BOH (Manufactured by Hodogaya Chemical Co., Ltd.) 0.2 g Surfactant (Reodol MO-60) 0.1 g Resin P 0.05 g Methyl cellosolve 70 ml

[0093]

[Table 1]

Next, the developing solutions 1 to 3 and the developing replenishers 1 to 3 used in the automatic developing machine (automatic developing machine 1) shown in FIG. 1 and the automatic developing machine (automatic developing machine 2) shown in FIG. Is shown below.

[Developer 1] 100 parts by weight of potassium A silicate (SiO ₂ : 26 wt%, K ₂ O: 13 wt%) 78 parts by weight of potassium hydroxide 17 parts by weight of ethylenediaminetetraacetic acid PEG # 1000 (manufactured by NOF Corporation) 2 parts by weight Water 1521 parts by weight [Development replenisher 1] <Concentrated developer replenisher (4 times concentrated solution)> Potassium A silicate (SiO ₂ : 26 wt%, K ₂ O: 13 wt%) 100 parts by weight Potassium hydroxide 78 parts by weight Water 14 parts by weight 3 parts of water is added to one volume of the concentrated replenisher for developing solution (4 times concentrated solution) to dilute the solution, whereby replenisher for developing solution 1 is obtained.

[Developer 2] Potassium A silicate (SiO ₂ : 26 wt%, K ₂ O: 13 wt%) 100 parts by weight Potassium hydroxide 29 parts by weight Water 448 parts by weight [Development replenisher 2] <Concentrated developer replenisher ( 4 times concentrated solution)> Potassium A silicate (SiO ₂ : 26 wt%, K ₂ O: 13 wt%) 100 parts by weight Potassium hydroxide 58 parts by weight Water 20 parts by weight 1 volume of the concentrated developing replenisher (4 times concentrated solution) The replenisher 2 is obtained by adding 3 volumes of water and diluting the mixture.

[Developer 3] <Concentrated developing mother liquor (6-fold concentrated solution)> 130 parts by weight of water 10 parts by weight of phenylpropylene glycol 20 parts by weight of propylene glycol 40 parts by weight of p-tert-butylbenzoic acid Emulgen 147 (Kao Corporation ), Nonionic surfactant) 1 part by weight Perex NB-L (anionic surfactant, manufactured by Kao Corporation) 10 parts by weight 50% aqueous potassium sulfite solution 170 parts by weight 50% gluconic acid aqueous solution 20 parts by weight Part Triethanolamine 50 parts by weight Potassium silicate aqueous solution (SiO ₂ content 26% by weight, K ₂ O content 13% by weight) 550 parts by weight 50% potassium hydroxide aqueous solution 220 parts by weight Ethylenediaminetetraacetic acid 3 parts by weight Concentrated developing mother liquor (6 times) The developer 3 is obtained by adding and diluting 5 volumes of water to 1 volume of the concentrated solution). You.

[Development replenisher 3] <Concentrated developer replenisher (4-fold concentrated solution)> Water 210 parts by weight Phenylpropylene glycol 10 parts by weight Propylene glycol 20 parts by weight p-tert-butylbenzoic acid 40 parts by weight Emulgen 147 (Kao Co., Ltd., nonionic surfactant) 5 parts by weight Perex NB-L (Kao Corporation, anionic surfactant) 10 parts by weight 50% potassium sulfite aqueous solution 200 parts by weight 50% gluconic acid aqueous solution 20 parts by weight Triethanolamine 50 parts by weight Potassium silicate aqueous solution (SiO ₂ containing 26% by weight, K ₂ O containing 13% by weight) 400 parts by weight 50% aqueous potassium hydroxide solution 350 parts by weight Ethylenediaminetetraacetic acid 3 parts by weight Concentrated replenisher (4 times concentrated solution), 3 volumes of water are added to 1 volume to dilute, and replenish the development. Liquid 3 is obtained.

(Examples 1 to 31 and Comparative Examples 1 to 5) <Gray Scale Exposure to Samples 1 to 6> First, an original (positive or negative) having a halftone dot pattern on the PS plates of Samples 1 to 6 A film and a step tablet for sensitivity measurement (No. 2, manufactured by Eastman Kodak Co., Ltd., gray scale of 21 steps each having a density difference of 0.15) are closely adhered to each other,
8.0mW using 2kW / metal halide lamp as light source
Exposure was performed for 60 seconds from a distance of 70 cm under the condition of / cm ² .

<Development after Gray Scale Exposure> Next, the developing solutions 1 to 3 and the developing replenishers 1 to 3 are treated with the automatic processor processing device (automatic processor 1) of FIG. P of the exposed samples 1 to 6 charged in the automatic processor 2)
In order to maintain the initial sensitivity of the S plate, for example, development processing was performed at 30 ° C. for 12 seconds while replenishing the development replenisher under the control of the control unit 50 of the automatic developing machine 1.

<Development Replenisher Replenishment Test During Automatic Developing Machine Shutdown (Examples 1 to 31 and Comparative Examples 1 to 5)> Developer 1
3, a replenisher for compensating a decrease in developing performance due to fatigue and deterioration of the developer caused during a period in which the automatic developing machine is stopped using the developing replenishers 1 to 3 and the automatic developing machine 1 and the automatic developing machine 2. The following processing test regarding the replenishment method was performed.

That is, 36 types (Examples 1 to 31 and Comparative Examples 1 to 5) of the processing tests were conducted by combining the PS plate, the developing solution, the developing replenisher and the automatic developing machine used as shown in Tables 2 and 3. Was.

In the above 36 types of processing, the positive type P
When processing one type of S version, 200 pieces of chrysanthemum size per day
Plate and two positive PS plates, 100 plates of each chrysanthemum total size. When processing both positive PS plates and negative PS plates, one day of positive PS plates is processed. 160 plates in negative size and 40 plates in negative chrysanthemum size were processed. Further, all of the 36 types of processing corresponding to the samples of Examples 1 to 31 and Comparative Examples 1 to 5 described above,
It took about 1.5 months to process 5000 plates. The detailed processing order is random.

Further, the present invention is characterized by a method for compensating the developing performance during the stoppage time of the automatic developing machine during the development processing. In the present embodiment, the method is characterized in that the stoppage time T (hr) of the automatic developing machine is reduced. The amount of the development replenisher per unit time (hereinafter simply referred to as daily replenishment amount) A (ml / hr) × the coefficient of variation (decreases according to the stoppage time of the automatic developing machine) C Was replenished when the automatic processor was restarted.

Table 2 and Table 3 show the daily replenisher amount A (ml / hr) of the development replenisher for each Example and Comparative Example.

[0106]

[Table 2]

[0107]

[Table 3]

Table 4 shows the values of the variation coefficient C with respect to the stop time of the automatic developing machine for each of the examples and the comparative examples.

[0109]

[Table 4]

During the processing test by the automatic developing machine,
The amount of developer replenishment H (ml) calculated by the daily replenishment amount A (ml / hr) in Table 2 with respect to the stop time T (hr) of the automatic processor in Table 3 × the variation coefficient C in Table 3 Replenish at the time of restarting, and each P at the time when the developer is uniformly diffused
Clear S plate (positive PS plate) or solid (negative P
S version) The sensitivity (S ₁ ) and the clear or solid sensitivity (S ₂ ) immediately before the stop of the automatic processor are evaluated, and the difference (S ₁ -S ₂ ) is evaluated.
Are shown in Tables 5 and 6.

[0111]

[Table 5]

[0112]

[Table 6]

In the comparative example, as shown in Table 4, all the variation coefficients C with respect to the stop time of the automatic developing machine are processed as 1.00 (processing is always performed irrespective of the stop time). Was processed in the same manner as in the example, and the same evaluation as in the example was performed.

As is clear from Tables 5 and 6, in Examples 1 to 31 of the present invention, the fluctuation range of the clear sensitivity (solid sensitivity for *) was small even when the stop time of the automatic developing machine was long, and It can be seen that the development characteristics are stable.
On the other hand, in Comparative Examples 1 to 5 outside the present invention, it is clear that the longer the stop time of the automatic developing machine, the larger the fluctuation range of the clear sensitivity (solid sensitivity for *), and there is a practical problem.

[0115]

Conventionally, it has been difficult to keep the activity of the developing solution constant when the stop time is long in the development processing of the PS plate by the automatic developing machine. There is a disadvantage that the developing process becomes unstable because the activity of the solution becomes considerably higher than the original level.

According to the present invention, when a PS plate is processed with a developer repeatedly used by using an automatic developing machine, even if the automatic developing machine is stopped for a long period of time, fluctuations in the activity of the developing solution are not affected. In addition, it is possible to provide a method for processing a PS plate in an automatic developing machine and a processing apparatus for the PS plate that achieve stable development processing.

[Brief description of the drawings]

FIG. 1 is a schematic sectional view of an immersion developing type automatic developing machine processing apparatus of the present invention.

FIG. 2 is a schematic cross-sectional view of a processing apparatus of an automatic developing machine of a shower developing system of the present invention.

[Explanation of symbols]

A, A 'Insertion section B, B' Developing section C, C 'Rinse section D, D' Gum processing section E Drying section F, F 'Replenishing liquid replenishment control section for 1 day 1 Insertion table 2 Optical sensor 3A, 3B Nip transport Roller 4, 76 Conveyance roller 5, 84 Developing tank 12, 13, 79a, 79b, 79c, 79d Bellows pump 14, 86 Concentrated developing replenisher tank 15, 88 Dilution water tank 50 Control means 71 PS plate 81a, 81b, 81c Nozzle Pipes 83a, 83b, 83c Squeegee roller

Continuing on the front page (72) Koji Watanabe, Inventor Konica Corporation, 1 Sakuracho, Hino-shi, Tokyo

Claims (3)

[Claims] An activity of an automatic developing machine that develops a photosensitive lithographic printing plate with a developing solution repeatedly used is reduced by adding a replenishing solution of the developing solution from the time when the operation of the automatic developing machine is stopped to the time when it is restarted. In the method for processing a photosensitive lithographic printing plate in an automatic developing machine, the ratio of the replenisher is reduced according to the stop time of the automatic developing machine. Processing method. 2. A replenisher amount H represented by the following general formula (I):
2. The method for processing a photosensitive lithographic printing plate in an automatic processor according to claim 1, wherein General formula (I) Replenisher amount H = T × A × CT T: Stop time of automatic developing machine (hr) A: Replenisher amount per unit time (ml / hr) C: Coefficient of variation with respect to stop time (automatic development (Decreases according to machine downtime) 3. A photosensitive lithographic printing plate processing apparatus in an automatic developing machine for automatically transporting a photosensitive lithographic printing plate, replenishing a replenisher and developing with a developer repeatedly used, wherein An apparatus for processing a photosensitive lithographic printing plate in an automatic developing machine, comprising means for replenishing with a replenisher amount represented by I).