JPH0952791A - Crucible for pulling up silicon single crystal - Google Patents

Crucible for pulling up silicon single crystal

Info

Publication number
JPH0952791A
JPH0952791A JP20700395A JP20700395A JPH0952791A JP H0952791 A JPH0952791 A JP H0952791A JP 20700395 A JP20700395 A JP 20700395A JP 20700395 A JP20700395 A JP 20700395A JP H0952791 A JPH0952791 A JP H0952791A
Authority
JP
Japan
Prior art keywords
crucible
cristobalite
single crystal
pulling
silicon single
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20700395A
Other languages
Japanese (ja)
Inventor
Koji Watanabe
宏二 渡邉
Yukimoto Tanaka
幸基 田中
Masami Hasebe
政美 長谷部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Nippon Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Corp filed Critical Nippon Steel Corp
Priority to JP20700395A priority Critical patent/JPH0952791A/en
Publication of JPH0952791A publication Critical patent/JPH0952791A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/09Other methods of shaping glass by fusing powdered glass in a shaping mould

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a long-life crucible which is suppressed in inside surface corrosion at the time of pulling up a silicon single crystal. SOLUTION: This crucible for pulling up the silicon single crystal is formed of a quartz material which is obtd. by melting high-purity quartz at >=1,750 deg.C, solidifying the melt and converting into 100% cristobalite.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明が属する技術分野】本発明は、シリコン単結晶引
き上げ用坩堝、特に、劣化防止、長寿命化を図ることが
できる坩堝に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a crucible for pulling a silicon single crystal, and more particularly to a crucible capable of preventing deterioration and extending its life.

【0002】[0002]

【従来の技術】シリコン単結晶引き上げ用坩堝には、一
般に石英坩堝が使用されている。その石英坩堝にも、製
造法によって透明石英ガラス坩堝と半透明石英ガラス坩
堝とがある。実用上は、強度の面から半透明石英ガラス
坩堝が広く利用されているが、この半透明石英ガラス坩
堝にもその中に含まれる気泡による影響が問題視されて
いる。そのひとつに坩堝の溶解に伴う坩堝内面の肌荒れ
の影響がある。気泡部分は坩堝の溶解にともない微細な
突起を生じ、これが結晶核となり斑点状のクリストバラ
イトを形成する。このようにして形成されたクリストバ
ライトは、坩堝から脱離して溶融シリコン内に落ち、引
き上げられる単結晶の成長に悪影響を与えることが知ら
れている。
2. Description of the Related Art A quartz crucible is generally used as a crucible for pulling a silicon single crystal. The quartz crucible also has a transparent quartz glass crucible and a semitransparent quartz glass crucible depending on the manufacturing method. Practically, a semitransparent quartz glass crucible is widely used from the viewpoint of strength, but this semitransparent quartz glass crucible is also regarded as a problem due to the effect of bubbles contained therein. One of them is the effect of rough skin on the inner surface of the crucible due to melting of the crucible. The bubble portions generate fine projections as the crucible melts, and these become crystal nuclei to form speckled cristobalite. It is known that the cristobalite thus formed is desorbed from the crucible and falls into the molten silicon to adversely affect the growth of the pulled single crystal.

【0003】これに対し特開平6−72793号公報で
は、石英ガラス坩堝内表面近傍に含まれる気泡のシリコ
ンへの溶解が結晶転位による結晶欠陥(有転位化)の原
因になるとし、内表面領域の気泡含有率を制御したもの
が考案されている。また、特開平6−92779号公報
では石英ガラスを用いた二重構造の坩堝の内層を実質的
に無気泡で表層を平滑にし、外層を半透明な気泡の径や
気泡の存在密度を制御したものが提案されているが、本
質的に坩堝に溶解やクリストバライト結晶の生成に伴う
種々な不都合を解消したものではない。
On the other hand, in Japanese Unexamined Patent Publication (Kokai) No. 6-72793, it is stated that the dissolution of bubbles contained in the vicinity of the inner surface of the silica glass crucible into silicon causes crystal defects (dislocation) due to crystal dislocations. A device having a controlled bubble content rate has been devised. Further, in JP-A-6-92779, the inner layer of a double-structured crucible made of quartz glass is made substantially bubble-free and the surface layer is made smooth, and the outer layer is controlled in the diameter of semitransparent bubbles and the presence density of bubbles. However, they do not essentially solve various inconveniences associated with melting in the crucible and formation of cristobalite crystals.

【0004】[0004]

【発明が解決しようとする課題】本発明は、このような
シリコン単結晶引き上げ時において、坩堝の溶解やクリ
ストバライト結晶の生成による生じる不都合を取り除
き、内表面腐食を抑制した長寿命の坩堝を提供すること
を目的とする。
DISCLOSURE OF THE INVENTION The present invention provides a crucible having a long service life in which internal disadvantages such as melting of the crucible and formation of cristobalite crystals at the time of pulling a silicon single crystal are eliminated, and inner surface corrosion is suppressed. The purpose is to

【0005】[0005]

【課題を解決するための手段】この目的を達成するため
の本発明に係るシリコン単結晶引き上げ用坩堝は、高純
度石英を1750℃以上の温度で溶融して凝固させて得
られる、100%クリストバライト化した石英材質から
成ることを特徴とする。
A crucible for pulling a silicon single crystal according to the present invention for attaining this object is a 100% cristobalite obtained by melting and solidifying high-purity quartz at a temperature of 1750 ° C. or higher. It is characterized in that it is made of quartized quartz material.

【0006】シリコン結晶はその使用目的から不純物の
混入は極力避けなければならない。従って、その作製に
用いる坩堝は必然的に石英となる。後述するようにシリ
コン結晶の引上げ温度(約1500℃)では、坩堝材の
シリコンへの溶解とともに結晶性物質のクリストバライ
トの生成は避け難い。シリコン単結晶引き上げ時に生じ
る種々の不都合は、坩堝材の溶解に伴う不純物の混入
と、この生成したクリストバライトが微結晶であるため
坩堝表面から剥がれ落ちることによるものである。従っ
て、本発明の構成を採用して、坩堝材がシリコンに溶解
しない、不融物がシリコンに混入しないようにする、こ
とがこれら問題点を解決することになる。
From the purpose of use of silicon crystals, the inclusion of impurities must be avoided as much as possible. Therefore, the crucible used for the production is necessarily quartz. As will be described later, at the pulling temperature of silicon crystal (about 1500 ° C.), it is inevitable that the crucible material is dissolved in silicon and cristobalite, which is a crystalline material, is generated. Various inconveniences that occur during the pulling of a silicon single crystal are due to the inclusion of impurities that accompany the melting of the crucible material and the fact that the generated cristobalite is fine crystals that peel off from the crucible surface. Therefore, adopting the configuration of the present invention prevents the crucible material from being dissolved in silicon and the infusible material from being mixed into silicon, thereby solving these problems.

【0007】[0007]

【発明の実施の形態】本発明は、従来シリコン単結晶引
き上げ時に生じる問題点が坩堝の溶解や結晶性物質(ク
リストバライト)の生成に伴うことによるものであるこ
とに着目し、坩堝の溶解を制御することにより従来生じ
ていた不都合を取り除くものである。即ち、坩堝の腐食
現象として生じる面荒れは坩堝の溶解に伴い坩堝表面に
生成する結晶性物質(クリストバライト)の形成に起因
する。この物質は融点が1720℃であるため、一旦生
成すると当該シリコン単結晶育成温度(約1500℃)
では溶解しない。一方、この温度域は石英の熱平衡状態
図から分かるように、クリストバライトの生成領域であ
るため、石英は熱変態でいつクリストバライト結晶が発
生してもおかしくない。その結晶化のきっかけは石英中
に含まれる微量の不純物や半透明ガラス中に存在する気
泡であることが言われている。事実、不純物の多い天然
石英の腐食は、純度の高い人工石英のものより数段大き
い。しかし、純度の高い人工石英といえども、長時間当
該温度のシリコンに浸漬しておくと腐食が生じる。この
腐食時にクリストバライト微結晶の形成がなく、溶解の
みであれば単結晶育成に与えるダメージは少ないが、シ
リコン結晶特性付与の条件からみてクリストバライトの
生成が避けられないことがある。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention focuses on the fact that the conventional problems that occur when pulling a silicon single crystal are due to the melting of the crucible and the formation of a crystalline substance (cristobalite), and the melting of the crucible is controlled. By doing so, the conventional inconvenience is eliminated. That is, the surface roughness caused by the corrosion phenomenon of the crucible is due to the formation of a crystalline substance (cristobalite) generated on the crucible surface as the crucible is melted. Since this substance has a melting point of 1720 ° C, once it is formed, the silicon single crystal growth temperature (about 1500 ° C)
Does not dissolve in. On the other hand, as can be seen from the thermal equilibrium diagram of quartz, this temperature range is a cristobalite generation region, so that it is not uncommon for quartz to undergo cristobalite crystals due to thermal transformation. It is said that the reason for the crystallization is a trace amount of impurities contained in quartz and bubbles present in the semitransparent glass. In fact, the corrosion of natural quartz, which is rich in impurities, is several times greater than that of synthetic quartz of high purity. However, even high-purity artificial quartz is corroded if it is immersed in silicon at the temperature for a long time. If there is no formation of cristobalite microcrystals at the time of this corrosion, and only dissolution causes little damage to single crystal growth, the formation of cristobalite may be unavoidable in view of the conditions for imparting silicon crystal characteristics.

【0008】そこで、本発明ではこのような高温でも変
化しない坩堝材を提示するものである。即ち、クリスト
バライトがシリコン単結晶育成温度域でシリコンに溶解
しないことに着目し、100%クリストバライト化した
坩堝材を考案した。また、このクリストバライトも微結
晶の集合では剥離の危険性があり、融着する必要があ
る。この時、石英ガラスでの融着はその部分がシリコン
に溶解し坩堝の面荒れが生じるため、本発明の100%
クリストバライト化した坩堝材の製法は、石英の熱平衡
状態を考慮した科学的製法に基づいたものである。つま
り、高純度石英を不活性ガス下、1750℃で一旦溶融
し、降温過程でクリストバライトを析出させたものであ
る。従って、この時使用する原料はガラス状でも結晶状
(トリジマイト、クリストバライト)若しくは混合物、
いずれでも良い。
Therefore, the present invention provides a crucible material that does not change even at such a high temperature. That is, focusing on the fact that cristobalite does not dissolve in silicon in the silicon single crystal growth temperature range, a crucible material 100% cristobalite was devised. Further, this cristobalite also has a risk of peeling in the case of aggregation of microcrystals, and thus needs to be fused. At this time, the fusion with quartz glass causes 100% of the present invention because that portion is melted into silicon and the surface of the crucible is roughened.
The manufacturing method of cristobalite crucible material is based on the scientific manufacturing method considering the thermal equilibrium state of quartz. That is, high-purity quartz is once melted at 1750 ° C. under an inert gas, and cristobalite is precipitated in the temperature lowering process. Therefore, the raw material used at this time is glassy or crystalline (tridymite, cristobalite) or a mixture,
Either is fine.

【0009】[0009]

【実施例】【Example】

(実施例1)99.999%の人工石英をアルミナ坩堝
に入れ、アルゴン雰囲気中で1750℃にて十分融解
し、徐冷して結晶製の塊を得た。この塊はX線回折によ
る解析の結果、クリストバライトであることが判明し
た。この塊を30×30×5mmに切りだし、シリコン単
結晶引き上げ用人工石英ガラス製坩堝に融着し、約15
00℃でシリコン単結晶の引き上げを行った。約72時
間後、坩堝内表面を観察したところ、周辺人工石英ガラ
ス部には少量の微細なクリストバライトの生成と茶褐色
リングの生成があったものの、当該部分には茶褐色リン
グの発生も無く、溶解など腐食した様子は認められなか
った。
(Example 1) 99.999% artificial quartz was put into an alumina crucible, sufficiently melted at 1750 ° C in an argon atmosphere, and slowly cooled to obtain a lump made of crystals. As a result of X-ray diffraction analysis, this lump was found to be cristobalite. This lump is cut into 30 × 30 × 5 mm, and fused into an artificial quartz glass crucible for pulling a silicon single crystal, about 15
The silicon single crystal was pulled up at 00 ° C. After about 72 hours, when observing the inner surface of the crucible, a small amount of fine cristobalite and a brown ring were formed in the surrounding artificial quartz glass part, but no brown ring was generated in that part, and dissolution etc. No signs of corrosion were observed.

【0010】(比較例1)実施例1と同様な天然石英ガ
ラス試験片を用い、同条件でシリコン単結晶の引き上げ
試験を行った。その結果天然石英ガラス部表面は周辺人
工石英ガラス部に比し、多くの微細なクリストバライト
の形成と茶褐色リングの発生があり、溶解腐食現象が確
認された。
Comparative Example 1 Using the same natural quartz glass test piece as in Example 1, a pulling test of a silicon single crystal was conducted under the same conditions. As a result, the surface of the natural quartz glass part was found to have many fine cristobalite formations and brown rings as compared with the surrounding artificial quartz glass part, and the dissolution corrosion phenomenon was confirmed.

【0011】(比較例2)実施例1と同様な人工石英ガ
ラス試験片を用い、同条件でシリコン単結晶引き上げ試
験を行った。その結果、周辺部と同様に試験片表面にも
少量の微細なクリストバライトの形成と茶褐色リングの
発生があり、溶解腐食現象が確認された。
Comparative Example 2 Using the same artificial quartz glass test piece as in Example 1, a silicon single crystal pulling test was conducted under the same conditions. As a result, a small amount of fine cristobalite was formed and a brown ring was generated on the surface of the test piece as in the peripheral portion, and the dissolution corrosion phenomenon was confirmed.

【0012】(比較例3)結晶質50%、ガラス質50
%からなる99.999%の人工石英を良く混合し、ア
ルミナ坩堝に入れ、アルゴン雰囲気中で1400℃にて
溶融し、徐冷して塊を得た。この塊はX線回折による解
析の結果、原料混合物よりもクリストバライトの量は増
えたものの、クリストバライトとガラス質の共存物であ
った。このものを実施例1と同様な試験片にし、同条件
でシリコン単結晶引き上げ試験を行った。その結果、試
験片表面のクリストバライトの回りに大きな茶褐色リン
グの発生と周辺部と同様な微細なクリストバライトの形
成と茶褐色リングの発生があり、部分的な溶解腐食現象
が確認された。
(Comparative Example 3) 50% crystalline and 50 glassy
% 99.999% artificial quartz was mixed well, put in an alumina crucible, melted at 1400 ° C. in an argon atmosphere, and slowly cooled to obtain a lump. As a result of analysis by X-ray diffraction, this lump was a coexisting substance of cristobalite and glass although the amount of cristobalite was larger than that of the raw material mixture. This was used as a test piece similar to that of Example 1, and a silicon single crystal pulling test was conducted under the same conditions. As a result, a large brownish brown ring was generated around the cristobalite on the surface of the test piece, fine cristobalite was formed similarly to the peripheral portion, and a brownish brown ring was generated, and a partial dissolution corrosion phenomenon was confirmed.

【0013】[0013]

【発明の効果】以上説明したように、本発明は、シリコ
ン単結晶引き上げ用坩堝として腐食がほとんど無く、不
純物、不融物の混入が起きない工業上非常に有利な技術
であると言える。
Industrial Applicability As described above, the present invention can be said to be an industrially very advantageous technique as a crucible for pulling a silicon single crystal with almost no corrosion and no impurities or infusible substances are mixed.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 高純度石英を1750℃以上の温度で溶
融して凝固させて得られる、100%クリストバライト
化した石英材質から成ることを特徴とするシリコン単結
晶引き上げ用坩堝。
1. A crucible for pulling a silicon single crystal, which is made of a 100% cristobalite-made quartz material obtained by melting and solidifying high-purity quartz at a temperature of 1750 ° C. or higher.
JP20700395A 1995-08-14 1995-08-14 Crucible for pulling up silicon single crystal Pending JPH0952791A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20700395A JPH0952791A (en) 1995-08-14 1995-08-14 Crucible for pulling up silicon single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20700395A JPH0952791A (en) 1995-08-14 1995-08-14 Crucible for pulling up silicon single crystal

Publications (1)

Publication Number Publication Date
JPH0952791A true JPH0952791A (en) 1997-02-25

Family

ID=16532590

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20700395A Pending JPH0952791A (en) 1995-08-14 1995-08-14 Crucible for pulling up silicon single crystal

Country Status (1)

Country Link
JP (1) JPH0952791A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000006811A1 (en) * 1998-07-31 2000-02-10 Shin-Etsu Quartz Products Co., Ltd. Quartz glass crucible for pulling up silicon single crystal and process for producing the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000006811A1 (en) * 1998-07-31 2000-02-10 Shin-Etsu Quartz Products Co., Ltd. Quartz glass crucible for pulling up silicon single crystal and process for producing the same
US6280522B1 (en) 1998-07-31 2001-08-28 Shin-Etsu Quartz Products Co. Ltd. Quartz glass crucible for pulling silicon single crystal and production process for such crucible

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