JPH04132695A - Production of single crystal of alumina-based oxide having high melting point - Google Patents

Production of single crystal of alumina-based oxide having high melting point

Info

Publication number
JPH04132695A
JPH04132695A JP25393190A JP25393190A JPH04132695A JP H04132695 A JPH04132695 A JP H04132695A JP 25393190 A JP25393190 A JP 25393190A JP 25393190 A JP25393190 A JP 25393190A JP H04132695 A JPH04132695 A JP H04132695A
Authority
JP
Japan
Prior art keywords
alumina
single crystal
melting point
high melting
based high
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP25393190A
Other languages
Japanese (ja)
Other versions
JP2962795B2 (en
Inventor
Hiroaki Toshima
戸嶋 博昭
Toshiro Furutaki
敏郎 古滝
Yoichi Yaguchi
洋一 矢口
Hideta Uchiumi
秀太 内海
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Namiki Precision Jewel Co Ltd
Original Assignee
Namiki Precision Jewel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Namiki Precision Jewel Co Ltd filed Critical Namiki Precision Jewel Co Ltd
Priority to JP25393190A priority Critical patent/JP2962795B2/en
Publication of JPH04132695A publication Critical patent/JPH04132695A/en
Application granted granted Critical
Publication of JP2962795B2 publication Critical patent/JP2962795B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To obtain the subject single crystal having a large size and high quality without air bubble by performing crystal growth in a specific atmosphere in a growing method of the subject single crystal with a melt-growing method. CONSTITUTION:In a growing method of the subject single crystal with a melt- growing method, the growth is performed in a reducing gas atmosphere (e.g. Ar-20vol.% H2).

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、融液からザファイヤ等高品質なアルミナ系高
融点酸化物単結晶を育成する製造方法に関するものであ
る。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a manufacturing method for growing high-quality alumina-based high-melting point oxide single crystals such as zaphire from a melt.

[従来の技術および課題] 融液からサファイヤ等アルミナ系高融点酸化物単結晶を
育成する方法としては、ベルヌーイ法、チョクラルスキ
法、バクダサロフ法、熱交換法、EFG法等が知られて
いる。大型アルミナ系高融点酸化物単結晶を育成する方
法としては、チョクラルスキ法、バクダサロフ法、熱交
換法、E、FG法によるルツボを用いた方法があり、量
産化されている。しかしながらルツボを用いるとチョク
ラルスキ法やEFG法においては結晶中に気泡が入りや
すく、高品質化することができない。この気泡を除去す
る方法としては、結晶成長速度を遅くしたり、原材料の
前処理として粉末原料を溶融固化させることが行なわれ
ている。しかしながら結晶成長速度を遅くすることは量
産性において不利であり、原材料粉末を溶融固化させる
ことは原料単価を引上げる要因となり、高品質なアルミ
ナ系高融点酸化物単結晶を低価格で供給することはでき
ない。
[Prior Art and Problems] Known methods for growing single crystals of alumina-based high melting point oxides such as sapphire from melts include the Bernoulli method, Czochralski method, Bakudasarov method, heat exchange method, and EFG method. Methods for growing large alumina-based high-melting-point oxide single crystals include the Czochralski method, Bakdasarov method, heat exchange method, and methods using crucibles such as E and FG methods, which have been mass-produced. However, when a crucible is used, air bubbles tend to enter the crystal in the Czochralski method or the EFG method, making it impossible to achieve high quality. Methods for removing these bubbles include slowing down the crystal growth rate and melting and solidifying the powder raw material as a pretreatment of the raw material. However, slowing the crystal growth rate is disadvantageous in terms of mass production, and melting and solidifying the raw material powder increases the raw material unit price, making it difficult to supply high-quality alumina-based high-melting point oxide single crystals at low prices. I can't.

本発明はこの点を鑑みて、気泡のない大型で高品質な単
結晶を低価格で供給することを目的とする。
In view of this point, the present invention aims to supply a large, high-quality single crystal without bubbles at a low cost.

[課題を解決するための手段コ アルミナ系高融点酸化物単結晶をルツボを用いて育成す
る方法において、気泡の発生する原因が高温でアルミナ
(/V20:i)が分解して生成する酸素原子(0)お
よび酸素分子(02)が融液中に過飽和に存在し、それ
が析出することによることを見出した。そのため本発明
は融液中に過飽和に存在する酸素原子および酸素分子の
除去方法としては還元性ガスを用いるものであり、水素
および一酸化炭素が有効である。
[Means for Solving the Problems] In the method of growing core-alumina-based high-melting point oxide single crystals using a crucible, the cause of bubble generation is oxygen atoms (which are generated by the decomposition of alumina (/V20:i) at high temperatures). 0) and oxygen molecules (02) are present in the melt in a supersaturated state, and it has been found that this is caused by precipitation. Therefore, the present invention uses a reducing gas as a method for removing supersaturated oxygen atoms and oxygen molecules in the melt, and hydrogen and carbon monoxide are effective.

還元性ガスはルツボとの反応性があるが、不活性ガスに
より希釈することで防止でき、容量比が1/100未満
であると融液中に過飽和に存在するOおよびo2を除去
することができないので、1/100以上必要である。
Reducing gas has reactivity with the crucible, but this can be prevented by diluting it with an inert gas, and if the volume ratio is less than 1/100, O and O2 present in supersaturation in the melt cannot be removed. Since this is not possible, 1/100 or more is required.

還元性ガスにより融液中に過飽和に存在するOおよび0
2を化学反応により除去するため、希釈ガスを用いた場
合においては、引き上げる結晶およびルツボに仕込んだ
原材料に依存する。
O and 0 present in supersaturation in the melt due to reducing gas
Since 2 is removed by a chemical reaction, when a diluent gas is used, it depends on the crystal to be pulled and the raw material charged in the crucible.

[実施例1] 原料として純度9999%のアルミナを使用し、ルツボ
としてモリブデンを採用した。チョクラルスキ法により
溶融し、育成雰囲気としては静20vo1%H2とし、
育成条件としては引上げ方位<001> 、回転数3O
rpm 、引上げ速度4mm/hrで、仕込み重量の約
75%の単結晶を得た。得られた結晶は、直径約25〜
20悶φで、長さが直胴部で約100Mである。結晶の
色は無色透明であり、気泡は観察されなかった。
[Example 1] Alumina with a purity of 9999% was used as a raw material, and molybdenum was used as a crucible. It was melted by the Czochralski method, and the growth atmosphere was static 20 vol 1% H2.
The growth conditions are pulling direction <001> and rotation speed 3O.
rpm and a pulling speed of 4 mm/hr, a single crystal weighing about 75% of the charged weight was obtained. The obtained crystals have a diameter of about 25~
It has a diameter of 20 mm and a length of about 100 m at the straight body. The crystals were colorless and transparent, and no bubbles were observed.

[実施例2] 原料として純度99.99%のアルミナを使用し、ルツ
ボとしてモリブデンを採用した。チョクラルスキ法によ
り溶融し、育成雰囲気としてはAr−10vo1%H2
とし、育成条件としては引上げ方位<001> 、回転
数3Orpm 、引上げ速度4m/hrで、仕込み重量
の約15%の単結晶を得た。得られた結晶は、直径約2
5〜20摩φで、長さが直胴部で約100#である。結
晶の色は無色透明であり、気泡は観察されなかった。
[Example 2] Alumina with a purity of 99.99% was used as a raw material, and molybdenum was used as a crucible. It is melted by the Czochralski method, and the growth atmosphere is Ar-10vo1%H2.
The growth conditions were a pulling direction <001>, a rotational speed of 3 rpm, and a pulling speed of 4 m/hr, and a single crystal weighing about 15% of the charged weight was obtained. The resulting crystal has a diameter of approximately 2
The diameter is 5 to 20, and the length of the straight body is about 100#. The crystals were colorless and transparent, and no bubbles were observed.

[実施例3] 原料として純度99.99%のアルミナを使用し、ルツ
ボとしてモリブデンを採用した。チョクラルスキ法によ
り溶融し、育成雰囲気としては酵5volXCOとし、
育成条件としては引上げ方位<001> 、回転数3O
rpm 、引上げ速度4m+/hrで、仕込み重量の約
75%の単結晶を得た。得られた結晶は、直径的25〜
20mmφで、長さが直胴部で約i 00Mである。結
晶の色は無色透明であり、気泡は観察されなかった。
[Example 3] Alumina with a purity of 99.99% was used as a raw material, and molybdenum was used as a crucible. It was melted by the Czochralski method, and the growth atmosphere was 5volXCO of fermentation.
The growth conditions are pulling direction <001> and rotation speed 3O.
rpm and a pulling speed of 4 m+/hr, a single crystal weighing about 75% of the charged weight was obtained. The obtained crystals have a diameter of 25~
It has a diameter of 20 mm and a length of approximately i00M at the straight body. The crystals were colorless and transparent, and no bubbles were observed.

[発明の効果] 本発明により、アルミナ系高融点酸化物単結晶をルツボ
を用いて育成する方法において、気泡の発生する原因で
ある融液中の過飽和な酸素原子および酸素分子を水素お
よび一酸化炭素等還元性ガスにより除去し、高品質なア
ルミナ系高融点酸化物大型単結晶を低価格において製造
する方法を確立することができた。
[Effects of the Invention] According to the present invention, in a method for growing an alumina-based high melting point oxide single crystal using a crucible, supersaturated oxygen atoms and oxygen molecules in the melt, which are the cause of bubble generation, are replaced with hydrogen and monoxide. We were able to establish a method for producing high-quality, large-sized single crystals of high-melting-point alumina oxides at low cost by removing them with a reducing gas such as carbon.

Claims (3)

【特許請求の範囲】[Claims] (1)融液成長法によるアルミナ系高融点酸化物単結晶
の育成方法において、還元性ガス雰囲気内にて行なうこ
とを特徴としたアルミナ系高融点酸化物単結晶の製造方
法。
(1) A method for producing an alumina-based high-melting-point oxide single crystal, which is characterized in that the growth method of an alumina-based high-melting-point oxide single crystal is carried out in a reducing gas atmosphere using a melt growth method.
(2)還元性ガス雰囲気として水素ガスを含有し、水素
混合比が少なくとも容量比で、1/100以上である請
求項(1)記載のアルミナ系高融点酸化物単結晶の製造
方法。
(2) The method for producing an alumina-based high melting point oxide single crystal according to claim (1), wherein the reducing gas atmosphere contains hydrogen gas, and the hydrogen mixing ratio is at least 1/100 or more by volume.
(3)還元性ガス雰囲気として一酸化炭素ガスを含有し
、一酸化炭素混合比が少なくとも容量比で、1/100
以上である請求項(1)記載のアルミナ系高融点酸化物
単結晶の製造方法。
(3) Contains carbon monoxide gas as a reducing gas atmosphere, and the carbon monoxide mixing ratio is at least 1/100 by volume.
The method for producing an alumina-based high melting point oxide single crystal according to claim (1).
JP25393190A 1990-09-21 1990-09-21 Method for producing alumina-based high melting point oxide single crystal Expired - Fee Related JP2962795B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25393190A JP2962795B2 (en) 1990-09-21 1990-09-21 Method for producing alumina-based high melting point oxide single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25393190A JP2962795B2 (en) 1990-09-21 1990-09-21 Method for producing alumina-based high melting point oxide single crystal

Publications (2)

Publication Number Publication Date
JPH04132695A true JPH04132695A (en) 1992-05-06
JP2962795B2 JP2962795B2 (en) 1999-10-12

Family

ID=17258011

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25393190A Expired - Fee Related JP2962795B2 (en) 1990-09-21 1990-09-21 Method for producing alumina-based high melting point oxide single crystal

Country Status (1)

Country Link
JP (1) JP2962795B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06199597A (en) * 1992-10-15 1994-07-19 Natl Inst For Res In Inorg Mater Production of aluminum oxide single crystal
US6788026B2 (en) 2001-08-30 2004-09-07 Yamaha Corporation Battery charger, including an amplifier for audio signals, for portable audio devices
JP2007197230A (en) * 2006-01-24 2007-08-09 Sumitomo Metal Mining Co Ltd Method for manufacturing aluminium oxide single crystal and aluminium oxide single crystal obtained by using the method
JP2011195423A (en) * 2010-03-24 2011-10-06 Sumitomo Metal Mining Co Ltd Method of manufacturing sapphire single crystal
JP2013095611A (en) * 2011-10-28 2013-05-20 Sumco Corp Method for producing sapphire single crystal
CN103194791A (en) * 2013-04-24 2013-07-10 哈尔滨工业大学 Horizontal directional region melt-crystallization preparation method of large-dimension plate-like sapphire mono-crystal

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4844429B2 (en) * 2007-02-26 2011-12-28 日立化成工業株式会社 Method for producing sapphire single crystal

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06199597A (en) * 1992-10-15 1994-07-19 Natl Inst For Res In Inorg Mater Production of aluminum oxide single crystal
US6788026B2 (en) 2001-08-30 2004-09-07 Yamaha Corporation Battery charger, including an amplifier for audio signals, for portable audio devices
JP2007197230A (en) * 2006-01-24 2007-08-09 Sumitomo Metal Mining Co Ltd Method for manufacturing aluminium oxide single crystal and aluminium oxide single crystal obtained by using the method
JP2011195423A (en) * 2010-03-24 2011-10-06 Sumitomo Metal Mining Co Ltd Method of manufacturing sapphire single crystal
JP2013095611A (en) * 2011-10-28 2013-05-20 Sumco Corp Method for producing sapphire single crystal
CN103194791A (en) * 2013-04-24 2013-07-10 哈尔滨工业大学 Horizontal directional region melt-crystallization preparation method of large-dimension plate-like sapphire mono-crystal
CN103194791B (en) * 2013-04-24 2016-05-04 哈尔滨工业大学 The horizontal orientation district clinkering crystal preparation method of the tabular sapphire monocrystal of large scale

Also Published As

Publication number Publication date
JP2962795B2 (en) 1999-10-12

Similar Documents

Publication Publication Date Title
US9243311B2 (en) Method for removing phosphorous and boron from aluminium silicon alloy for use in purifying silicon
CA2726003C (en) Halide-containing silicon, method for producing the same, and use of the same
JPH04132695A (en) Production of single crystal of alumina-based oxide having high melting point
JP5635985B2 (en) Method for removing non-metallic impurities from metallic silicon
CN113186590B (en) Preparation method of centimeter-level molybdenum trioxide single crystal
JPS61178495A (en) Method for growing single crystal
JP2507910B2 (en) Method for producing oxide single crystal
WO2007023699A1 (en) Method for producing group 13 metal nitride crystal, method for manufacturing semiconductor device, and solution and melt used in those methods
US3043671A (en) Zinc oxide crystal growth method
KR900007075B1 (en) Color display tube process and apparatus for purifying silicon
JP2739546B2 (en) Method for producing lithium borate single crystal
JP2508546B2 (en) Quartz crucible for pulling silicon single crystal
SU823272A1 (en) Method of silver iodide purification
JP3654314B2 (en) Manufacturing method of AlGaAs single crystal by flux method and manufacturing apparatus used therefor
RU1816813C (en) Process for preparing potassium and lead orthosilicate monocrystals
JPH07247200A (en) Production of titanium oxide single crystal
JPH0455396A (en) Substrate for oxide superconducting film and its production
JPH027919B2 (en)
JPH05285304A (en) Method for growing crystal
JPH09110588A (en) Production of single crystal copper
JP2002326897A (en) Silicon carbide single crystal
JPH0412082A (en) Method for growing single crystal
JPH07138016A (en) Production of lithium borate raw material
JPS6128638B2 (en)
JPS5815479B2 (en) Method for manufacturing silicon carbide single crystal

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080806

Year of fee payment: 9

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090806

Year of fee payment: 10

LAPS Cancellation because of no payment of annual fees